Wet etching equipment

Abstract

The utility model relates to wet etching equipment. The wet etching equipment comprises a mixing tank, a tank and a first pH meter, wherein the mixing tank is provided with a mixing cavity for mixing etching liquid, a texturing additive and water; a mixed liquid outlet communicated with the mixing cavity is formed in the mixing tank. The tank is arranged on one side of the mixing tank and is provided with an etching tank; and the mixed liquid outlet is configured to be operably communicated with the etching groove. And the first Ph meter is arranged on the groove wall of the etching groove and extends into the etching groove so as to detect the Ph value of the liquid in the etching groove. The etching liquid, the texturing additive and the water with the corresponding amount can be well supplemented into the etching groove, so that the etching liquid in the etching groove can more accurately meet the etching requirement of the next batch of battery pieces, and the etching effect of the next batch of battery pieces can better meet the expected requirement.

Description

Technical Field

[0001] The present application relates to the technical field of solar cells, and in particular to a wet etching device. Background Art

[0002] The manufacturing process of solar cells usually includes the etching process of the cells. In the related art, the cells are usually placed in an etching tank filled with etching liquid to perform wet etching on the cells. If the next batch of cells is to be wet-etched, the etching liquid consumed by the wet etching of a batch of cells is roughly added to the etching tank. However, this rough addition of etching liquid will make it difficult for the etching effect of the next batch of cells to meet the expected requirements. Utility Model Content

[0003] Based on this, it is necessary to provide a wet etching device to address the problem that the rough addition of etching solution will make it difficult for the etching effect of the next batch of battery cells to meet the expected requirements.

[0004] The present application provides a wet etching device, comprising:

[0005] A mixing tank having a mixing chamber for mixing etching solution, texturing additive and water; the mixing tank is provided with a mixed liquid outlet connected to the mixing chamber;

[0006] A tank is provided at one side of the mixing tank and has an etching groove; the mixed liquid outlet is configured to be operably connected to the etching groove; and

[0007] The first Ph meter is arranged on the groove wall of the etching groove and extends into the etching groove to detect the Ph value of the liquid in the etching groove.

[0008] In one embodiment, the wet etching device further comprises a mixed liquid outlet pipe provided on the mixed liquid outlet, one end of the mixed liquid outlet pipe is connected to the mixed liquid outlet, and the other end of the mixed liquid outlet pipe is connected to the etching tank;

[0009] The mixed liquid outlet pipe is provided with a liquid outlet valve.

[0010] In one embodiment, one end of the mixed liquid outlet pipe away from the mixed liquid outlet port extends into the etching groove through the groove opening of the etching groove to communicate with the etching groove.

[0011] In one embodiment, the wet etching equipment further comprises:

[0012] A first supplement tank is connected to the mixing tank and has a first accommodating chamber for accommodating the etching liquid; the first accommodating chamber is communicated with the mixing chamber;

[0013] a second supplement tank connected to the mixing tank and having a second containing chamber for containing the texturing additive; the second containing chamber is connected to the mixing chamber; and

[0014] The third supplementary tank is connected to the mixing tank and has a third containing chamber for containing water; the third containing chamber is communicated with the mixing chamber.

[0015] In one of the embodiments, the wet etching equipment further includes a second Ph meter, which is disposed on the mixing tank and extends into the mixing chamber to detect the Ph value of the liquid in the mixing chamber.

[0016] In one of the embodiments, the wet etching equipment further includes a mixing mechanism, and the mixing mechanism is at least partially disposed in the mixing chamber to mix the etching solution, texturing additive and water in the mixing chamber.

[0017] In one embodiment, the mixing mechanism includes a bubbling reactor partially disposed in the mixing chamber.

[0018] In one embodiment, the mixing mechanism includes a motor disposed on the mixing tank, and a stirring paddle connected to the motor at one end, and the stirring paddle extends into the mixing chamber at one end away from the motor.

[0019] In one of the embodiments, the wet etching equipment further includes a heating mechanism, wherein the heating mechanism includes a heating element disposed in the mixing chamber, and the heating element is used to heat the etching solution, texturing additive and water in the mixing chamber.

[0020] In one of the embodiments, the heating mechanism also includes a temperature sensor and a controller, wherein the temperature sensor is used to sense the temperature of the liquid in the mixing chamber, and the controller is electrically connected to the temperature sensor and the heating element, respectively, to control the heating element to stop heating when the temperature of the liquid in the mixing chamber reaches a preset value.

[0021] In the technical solution of the present application, when the wet etching equipment is used, the Ph value of the etching solution in the etching tank before and after the etching reaction of the current batch of battery cells can be detected according to the first Ph meter, and then the amount of etching solution consumed in the etching tank can be calculated, and then the etching solution, the corresponding amount of texturing additive and the corresponding amount of water are added into the mixing chamber of the mixing tank according to the amount of etching solution consumed in the etching tank, and then the etching solution, texturing additive and water are mixed by using the mixing tank, and then the mixed solution obtained by mixing the etching solution, texturing additive and water is added into the etching tank through the mixed solution outlet, so as to replenish the etching tank with the corresponding amount of etching solution, texturing additive and water, so that the etching solution in the etching tank can more accurately meet the etching requirements of the next batch of battery cells, so that the etching effect of the next batch of battery cells can better meet the expected requirements. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 A schematic structural diagram of a wet etching device according to an embodiment of the present application is shown.

[0023] Figure 2 A circuit block diagram of a controller, a temperature sensor and a heating element according to an embodiment of the present application is shown.

[0024] Reference numerals:

[0025] 110, mixing tank; 1101, mixing chamber; 1102, mixed liquid outlet;

[0026] 120, tank; 1201, etching tank;

[0027] 130, first Ph meter;

[0028] 141. a mixed liquid outlet pipe; 142. a liquid outlet valve;

[0029] 151. first supplementary tank; 1511. first accommodating chamber;

[0030] 152, second supplementary tank; 1521, second accommodating chamber;

[0031] 153. a third supplementary tank; 1531. a third containing chamber;

[0032] 160. Second Ph Meter

[0033] 170. Mixing mechanism; 171. Exhaust pipe;

[0034] 180. Heating mechanism; 181. Heating element; 182. Temperature sensor; 183. Controller. DETAILED DESCRIPTION

[0035] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.

[0036] In the description of the present application, it should be understood that if the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. appear, the orientation or position relationship indicated by these terms is based on the orientation or position relationship shown in the accompanying drawings, which is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application.

[0037] In addition, if the terms "first" or "second" appear, these terms are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of the features. In the description of this application, if the term "plurality" appears, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0038] In this application, unless otherwise clearly specified and limited, if the terms "installed", "connected", "connected", "fixed" and the like appear, these terms should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integrated connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0039] In the present application, unless otherwise clearly specified and limited, if there is a description that a first feature is "above" or "below" a second feature, etc., or similar descriptions appear, it may mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature being "above", "above" and "above" the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. The first feature being "below", "below" and "below" the second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0040] It should be noted that if an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be a central element. If an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. If any, the terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used in this application are for illustrative purposes only and do not represent the only implementation method.

[0041] Figure 1 A schematic structural diagram of a wet etching device according to an embodiment of the present application is shown.

[0042] See also Figure 1 An embodiment of the present application provides a wet etching device including a mixing tank 110 , a tank 120 and a first Ph meter 130 .

[0043] The mixing tank 110 has a mixing chamber 1101 for mixing etching solution, texturing additives and water. The mixing tank 110 is provided with a mixed liquid outlet 1102 which is connected to the mixing chamber 1101 .

[0044] The mixing tank 110 can be used to mix the etching solution, the texturing additive and the water in the mixing chamber 1101 to obtain a mixed solution, and then the mixed solution is discharged through the mixed solution outlet 1102 .

[0045] The tank 120 is disposed at one side of the mixing tank 110 and has an etching groove 1201 . The mixed liquid outlet 1102 is configured to be operably connected to the etching groove 1201 .

[0046] The etching groove 1201 is used to contain etching solution, texturing additives and water that can etch the battery cells. A batch of battery cells can be put into the etching groove 1201 for etching reaction. After the etching reaction is completed, the current batch of battery cells is removed. During the etching reaction of the current batch of battery cells, the etching solution and texturing additives will be consumed, resulting in a change in the Ph value of the liquid in the etching groove 1201. Therefore, it is necessary to add an appropriate amount of etching solution, texturing additives and water.

[0047] Optionally, the mixed liquid outlet 1102 is located at the top side of the groove opening of the etching groove 1201 .

[0048] In the present application, the first Ph meter 130 is arranged on the groove wall of the etching groove 1201 and extends into the etching groove 1201 to detect the Ph value of the liquid in the etching groove 1201. In this way, when the wet etching equipment is used, the Ph value of the etching liquid in the etching groove 1201 before and after the etching reaction of the current batch of battery cells can be detected by the first Ph meter 130, and then the amount of etching liquid consumed in the etching groove 1201 can be calculated, and then the etching liquid, the corresponding amount of texturing additives and the corresponding amount of water are added into the mixing chamber 1101 of the mixing tank 110 according to the amount of etching liquid consumed in the etching groove 1201, and then the mixing tank 110 is used to mix these etching liquids, texturing additives and water. , and then connect the mixed liquid outlet 1102 with the etching tank 1201, and add the mixed liquid obtained by mixing the etching liquid, texturing additive and water into the etching tank 1201 through the mixed liquid outlet 1102, so as to replenish the corresponding amount of etching liquid, texturing additive and water into the etching tank 1201, so that the etching liquid in the etching tank 1201 can more accurately meet the etching requirements of the next batch of battery cells, so that the etching effect of the next batch of battery cells can better meet the expected requirements.

[0049] For example, taking the etching liquid including acid as an example, in the initial state, the volume of the etching liquid in the etching tank 1201 is a, the volume of the texturing additive is b, and the volume of water is c. The first Ph meter 130 can detect that the Ph value of the liquid in the etching tank 1201 before the etching reaction of the current batch of battery cells is X1. After the etching reaction of the current batch of battery cells is completed, the first Ph meter 130 can detect that the Ph value of the liquid in the etching tank 1201 is X2. Then the amount of etching liquid consumed in the etching tank 1201 is (X2-X1)*a / X1. Correspondingly, the corresponding amount of texturing additive can be calculated according to the ratio of a to b, and the corresponding amount of water can also be calculated according to the ratio of a to c. In this way, the amount of etching liquid consumed in the etching tank 1201 and the corresponding amount of texturing additive can be calculated.

[0050] For another example, taking the etching solution including alkali as an example, the first Ph meter 130 can detect that the Ph value of the liquid in the etching tank 1201 before the etching reaction of the current batch of battery cells is X3, and after the etching reaction of the current batch of battery cells is completed, the first Ph meter 130 can detect that the Ph value of the liquid in the etching tank 1201 is X4, then the amount of etching solution consumed in the etching tank 1201 is (X3-X4)*a / X3, correspondingly, the corresponding amount of texturing additive can be calculated according to the ratio of a to b, and the corresponding amount of water can also be calculated according to the ratio of a to c. In this way, the amount of etching solution consumed in the etching tank 1201 and the corresponding amount of texturing additive, etc. can be calculated.

[0051] Of course, the present application is not limited to this. The etching solution may also include alkali and hydrogen peroxide, acid and hydrogen peroxide, or alkali and alkali-polishing additives. Since acid or alkali dominates the etching reaction, and hydrogen peroxide and alkali-polishing additives have little effect on the etching reaction, these etching solutions may also be applicable to the above-mentioned calculation method.

[0052] In some embodiments, the wet etching equipment also includes a mixed liquid outlet pipe 141 disposed on the mixed liquid outlet port 1102, one end of the mixed liquid outlet pipe 141 is connected to the mixed liquid outlet port 1102, and the other end of the mixed liquid outlet pipe 141 is connected to the etching groove 1201, and a liquid outlet valve 142 is provided on the mixed liquid outlet pipe 141.

[0053] In this way, after the etching reaction of the current batch of battery cells is completed, the amount of etching liquid, the corresponding amount of texturing additive and the corresponding amount of water that need to be added to the etching tank 1201 can be calculated, the liquid outlet valve 142 can be closed, and the corresponding amount of etching liquid, the corresponding amount of texturing additive and the corresponding amount of water can be mixed in the mixing chamber 1101. After the corresponding amount of etching liquid, the corresponding amount of texturing additive and the corresponding amount of water are evenly mixed, the liquid outlet valve 142 can be opened, and the corresponding amount of etching liquid, the corresponding amount of texturing additive and the corresponding amount of water can be added into the etching tank 1201 through the mixed liquid outlet pipe 141 to meet the etching requirements of the next batch of battery cells.

[0054] In some embodiments, one end of the mixed liquid outlet pipe 141 away from the mixed liquid outlet port 1102 extends into the etching groove 1201 through the groove opening of the etching groove 1201 to communicate with the etching groove 1201 .

[0055] In this way, the mixed solution formed by mixing a corresponding amount of etching solution, a corresponding amount of texturing additive and a corresponding amount of water can be put deeper into the etching groove 1201, reducing the possibility of splashing of the mixed solution and improving the safety of the etching operation.

[0056] In some embodiments, the wet etching equipment also includes a first replenishing tank 151, a second replenishing tank 152 and a third replenishing tank 153. The first replenishing tank 151 is connected to the mixing tank 110, and has a first containing chamber 1511 for containing etching liquid, and the first containing chamber 1511 is connected to the mixing chamber 1101. The second replenishing tank 152 is connected to the mixing tank 110, and has a second containing chamber 1521 for containing texturing additives, and the second containing chamber 1521 is connected to the mixing chamber 1101. The third replenishing tank 153 is connected to the mixing tank 110, and has a third containing chamber 1531 for containing water, and the third containing chamber 1531 is connected to the mixing chamber 1101.

[0057] The required dosage of etching liquid can be added to the first accommodating chamber 1511, the required dosage of texturing additive can be added to the second accommodating chamber 1521, and the required dosage of water can be added to the third accommodating chamber 1531. In this way, the corresponding amount of etching liquid, the corresponding amount of texturing additive and the corresponding amount of water can be respectively flowed into the mixing chamber 1101 of the mixing tank 110, and then the corresponding amount of etching liquid, the corresponding amount of texturing additive and the corresponding amount of water are mixed evenly and then added to the etching tank 1201 to meet the etching requirements of the next batch of battery cells.

[0058] Optionally, the first accommodating chamber 1511 is connected to the mixing chamber 1101 through a first dosing pump (not shown in the figure), the second accommodating chamber 1521 is connected to the mixing chamber 1101 through a second dosing pump (not shown in the figure), and the third accommodating chamber 1531 is connected to the mixing chamber 1101 through a third dosing pump (not shown in the figure).

[0059] In this way, a large amount of etching liquid can be put into the first accommodating chamber 1511, a large amount of texturing additive can be put into the second accommodating chamber 1521, and a large amount of water can be put into the third accommodating chamber 1531. After calculating the amount of etching liquid, the corresponding amount of texturing additive and the corresponding amount of water that need to be added to the etching groove 1201, the corresponding amount of etching liquid can be pumped into the mixing chamber 1101 through the first dosing pump, and the corresponding amount of texturing additive can be pumped into the mixing chamber 1101 through the second dosing pump, and the corresponding amount of water can be pumped into the mixing chamber 1101 through the third dosing pump. In this way, the corresponding amount of etching liquid, the corresponding amount of texturing additive and the corresponding amount of water can be more accurately put into the mixing chamber 1101, which is conducive to more accurately putting the corresponding amount of etching liquid, the corresponding amount of texturing additive and the corresponding amount of water into the etching groove 1201, so as to better meet the etching requirements of the next batch of battery cells.

[0060] In some embodiments, the wet etching equipment further includes a second Ph meter 160 , which is disposed on the mixing tank 110 and extends into the mixing chamber 1101 to detect the Ph value of the liquid in the mixing chamber 1101 .

[0061] Specifically, a second sealing ring is provided between the portion of the second Ph meter 160 that passes through the mixing tank 110 and the mixing tank 110 .

[0062] After adding a corresponding amount of etching liquid, a corresponding amount of texturing additive and a corresponding amount of water into the mixing chamber 1101, these etching liquid, texturing additive and water can be mixed evenly, and then the second Ph meter 160 can be used to detect the Ph value of the liquid in the mixing tank 110 to see whether the Ph value of the mixed liquid after mixing reaches the Ph value of the liquid in the etching tank 1201 in the initial state, so as to fine-tune the dosage of etching liquid, texturing additive and / or water according to the Ph value detected by the second Ph meter 160, until the Ph value of the mixed liquid after mixing reaches the Ph value of the liquid in the etching tank 1201 in the initial state. In this way, a corresponding amount of etching liquid, a corresponding amount of texturing additive and a corresponding amount of water can be more accurately added to the etching tank 1201.

[0063] In some embodiments, the wet etching equipment further includes a mixing mechanism 170 , which is at least partially disposed in the mixing chamber 1101 to mix the etching solution, the texturing additive, and the water in the mixing chamber 1101 .

[0064] After adding a corresponding amount of etching liquid, a corresponding amount of texturing additive and a corresponding amount of water into the mixing chamber 1101, the mixing mechanism 170 can be used to mix these etching liquids, texturing additives and water more evenly, so as to reduce the degree of difference between the mixed liquid put into the etching tank 1201 and the liquid in the etching tank 1201, thereby reducing the probability of uneven etching reaction of the next batch of battery cells in the etching tank 1201.

[0065] In some embodiments, the mixing mechanism 170 includes a bubbling reactor partially disposed within the mixing chamber 1101 .

[0066] Specifically, the bubbling reactor includes an outlet pipe 171 extending into the mixing chamber 1101. The outlet pipe 171 is provided with a plurality of outlet holes connected to the mixing chamber 1101. An inert gas such as nitrogen can be introduced into the outlet pipe 171. The inert gas does not react with the liquid in the mixing chamber 1101, but can generate a large number of bubbles in the mixing chamber 1101. The stirring effect of the bubbles can make the corresponding amount of etching liquid, the corresponding amount of texturing additive and the corresponding amount of water put into the mixing chamber 1101 mixed evenly.

[0067] In other embodiments, the mixing mechanism 170 includes a motor (not shown in the figure) disposed on the mixing tank 110, and a stirring paddle (not shown in the figure) connected to the motor at one end, and the stirring paddle extends into the mixing chamber 1101 at one end away from the motor.

[0068] The stirring paddle can be driven by a motor to rotate around the axis direction of the parallel mixing chamber 1101, thereby driving the stirring paddle to stir the corresponding amount of etching liquid, the corresponding amount of texturing additive and the corresponding amount of water put into the mixing chamber 1101, so that the corresponding amount of etching liquid, the corresponding amount of texturing additive and the corresponding amount of water can be more fully and evenly mixed.

[0069] In some embodiments, the wet etching device further includes a heating mechanism 180 , and the heating mechanism 180 includes a heating element 181 disposed in the mixing chamber 1101 , and the heating element 181 is used to heat the etching solution, texturing additives and water in the mixing chamber 1101 .

[0070] Optionally, the heating element 181 may be sealed through the side wall of the mixing chamber 1101 to facilitate connection to an external electrical device such as a power supply.

[0071] The heating element 181 of the heating mechanism 180 can be used to heat the mixed liquid of the etching liquid, texturing additive and water in the mixing chamber 1101, so that the temperature of the mixed liquid added from the mixing chamber 1101 to the etching tank 1201 can be close to the temperature of the liquid in the etching tank 1201, thereby reducing the temperature fluctuation of the liquid in the etching tank 1201 during the replenishment process, which is beneficial to improving the uniformity of the etching reaction of the next batch of battery cells in the etching tank 1201.

[0072] In some embodiments, Figure 2 As shown, the heating mechanism 180 also includes a temperature sensor 182 and a controller 183. The temperature sensor 182 is used to sense the temperature of the liquid in the mixing chamber 1101. The controller 183 is electrically connected to the temperature sensor 182 and the heating element 181 respectively to control the heating element 181 to stop heating when the temperature of the liquid in the mixing chamber 1101 reaches a preset value.

[0073] Among them, the probe of the temperature sensor 182 can be extended into the liquid in the mixing chamber 1101, and the end of the temperature sensor 182 away from the probe is connected to the controller 183 outside the mixing chamber 1101 through a first wire. The heating element 181 is electrically connected to the controller 183 through a second wire, and the second wire passes through the side wall of the mixing chamber 1101 and is sealed and connected to the side wall of the mixing chamber 1101.

[0074] It can be understood that the controller 183 is used to control the heating element 181 to be in a heating state when the temperature of the liquid in the mixing chamber 1101 is lower than a preset value.

[0075] The preset value can be set according to the etching reaction temperature required for the liquid in the etching tank 1201 in the initial state. In this way, the temperature sensor 182 and the controller 183 can be used to make the temperature of the liquid in the mixing chamber 1101 reach the preset value, so that the temperature of the mixed liquid added from the mixing chamber 1101 to the etching tank 1201 can be roughly equal to the temperature of the liquid in the etching tank 1201, thereby better reducing the temperature fluctuation of the liquid in the etching tank 1201 during the liquid replenishment process, which is conducive to better improving the etching reaction uniformity of the next batch of battery cells in the etching tank 1201.

[0076] When the wet etching equipment of the present application is used, the first Ph meter 130 can be used to detect the Ph value of the etching solution in the etching tank 1201 before and after the etching reaction of the current batch of battery cells, and then the amount of etching solution consumed in the etching tank 1201 is calculated, and then the etching solution, the corresponding amount of texturing additives and the corresponding amount of water are added to the mixing chamber 1101 of the mixing tank 110 according to the amount of etching solution consumed in the etching tank 1201, and then the mixing mechanism 170 is used to make these etching solutions, texturing additives and water more evenly mixed, so as to reduce the mixing of the mixed solution and the etching solution in the etching tank 1201. The degree of differentiation of the liquid in the groove 1201 is determined, and the heating element 181 of the heating mechanism 180 is used to heat the mixed liquid of the etching liquid, the texturing additive and the water in the mixing chamber 1101, and then the mixed liquid that meets the process temperature and the Ph value in the etching groove 1201 is added to the etching groove 1201. This can reduce the temperature fluctuation of the liquid in the etching groove 1201 during the liquid replenishment process, and can also add a mixed liquid with a suitable Ph value. Finally, the etching reaction of the next batch of battery cells is carried out, which is beneficial to improve the uniformity of the etching reaction of the next batch of battery cells in the etching groove 1201.

[0077] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0078] The above-described embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be construed as limiting the scope of the patent application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent application shall be subject to the attached claims.

Claims

1. A wet etching device, characterized in that: include: A mixing tank having a mixing chamber for mixing etching solution, texturing additive and water; the mixing tank is provided with a mixed liquid outlet connected to the mixing chamber; A tank is provided at one side of the mixing tank and has an etching groove; the mixed liquid outlet is configured to be operably connected to the etching groove; and The first Ph meter is arranged on the groove wall of the etching groove and extends into the etching groove to detect the Ph value of the liquid in the etching groove.

2. The wet etching equipment according to claim 1, characterized in that: The wet etching device further includes a mixed liquid outlet pipe provided on the mixed liquid outlet, one end of the mixed liquid outlet pipe is connected to the mixed liquid outlet, and the other end of the mixed liquid outlet pipe is connected to the etching tank; The mixed liquid outlet pipe is provided with a liquid outlet valve.

3. The wet etching equipment according to claim 2, characterized in that: One end of the mixed liquid outlet pipe away from the mixed liquid outlet extends into the etching groove through the groove opening of the etching groove to communicate with the etching groove.

4. The wet etching equipment according to claim 1, characterized in that: The wet etching equipment also includes: A first supplement tank is connected to the mixing tank and has a first accommodating chamber for accommodating the etching liquid; the first accommodating chamber is communicated with the mixing chamber; a second supplement tank connected to the mixing tank and having a second containing chamber for containing the texturing additive; the second containing chamber is connected to the mixing chamber; and The third supplementary tank is connected to the mixing tank and has a third containing chamber for containing water; the third containing chamber is communicated with the mixing chamber.

5. The wet etching equipment according to claim 1, characterized in that: The wet etching equipment also includes a second Ph meter, which is arranged on the mixing tank and extends into the mixing chamber to detect the Ph value of the liquid in the mixing chamber.

6. The wet etching equipment according to any one of claims 1 to 5, characterized in that: The wet etching equipment further comprises a mixing mechanism, which is at least partially disposed in the mixing chamber to mix the etching solution, the texturing additive and the water in the mixing chamber.

7. The wet etching equipment according to claim 6, characterized in that: The mixing mechanism includes a bubbling reactor partially disposed in the mixing chamber.

8. The wet etching equipment according to claim 6, characterized in that: The mixing mechanism comprises a motor arranged on the mixing tank, and a stirring paddle connected to the motor at one end, and the stirring paddle extends into the mixing chamber at one end away from the motor.

9. The wet etching equipment according to any one of claims 1 to 5, characterized in that: The wet etching equipment further comprises a heating mechanism, wherein the heating mechanism comprises a heating element arranged in the mixing chamber, and the heating element is used for heating the etching solution, the texturing additive and the water in the mixing chamber.

10. The wet etching equipment according to claim 9, characterized in that: The heating mechanism also includes a temperature sensor and a controller. The temperature sensor is used to sense the temperature of the liquid in the mixing chamber. The controller is electrically connected to the temperature sensor and the heating element respectively to control the heating element to stop heating when the temperature of the liquid in the mixing chamber reaches a preset value.

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