Water treatment device for removing photoresist

Abstract

A water treatment device for removing photoresist comprises a collecting unit, an adjusting unit, an air floatation unit, a water producing unit and a scum unit, the bottom of the collecting unit is communicated with the upper portion of the adjusting unit through a conveying pipeline, a conveying water pump is installed on the conveying pipeline, stirring equipment is arranged in the adjusting unit, and the air floatation unit is connected with the water producing unit. The top of the adjusting unit is also communicated with an acid solution adding pipe and an alkaline solution adding pipe; a water inlet of the air floatation unit is communicated with a water outlet of the adjusting unit, the top of the air floatation unit is communicated with an air supply pipeline and a tap water supply pipe, the water production unit is communicated with the upper part of the air floatation unit through an overflow pipeline, the bottom of the water production unit is also communicated with a water production pipeline, and a water production pump is mounted on the water production pipeline; the top of the scum unit is communicated with the bottom of the air floatation unit, and the bottom of the scum unit is also communicated with a scum pipeline. The device can efficiently remove photoresist, is energy-saving and environment-friendly, and is favorable for improving the operation stability and prolonging the service life of a wastewater system.

Description

Technical Field

[0001] The utility model relates to the technical field of water treatment, in particular to a water treatment device for removing photoresist. Background Art

[0002] Photoresist is a key material used in the semiconductor and optoelectronic fields. It is generally composed of high molecular polymers, solvents, photosensitizers and other ingredients. Existing water treatment processes do not pay enough attention to the treatment of photoresist. The density of this type of macromolecular organic matter is lower than that of water and its precipitated state has extremely high viscosity. If it stays in the original system, it will affect the equipment and pipelines in the system, and may cause blockage of the pipelines and damage to the equipment. Direct discharge without treatment will cause environmental pollution.

[0003] The water treatment system for removing photoresist is applied in the field of wastewater treatment to not only solve the problem of environmental protection, but also effectively avoid the damage of photoresist to the equipment and pipelines in the system, and improve the stability and service life of the wastewater system operation; in addition, the water treatment system for removing photoresist is applied in the field of recycled water to effectively improve the recovery rate of organic recycled water, reduce the waste of water resources, achieve the goal of energy conservation and emission reduction, and has certain economic benefits.

[0004] In summary, building a water treatment system that can efficiently remove photoresist is an issue that technical personnel in this field urgently need to solve. Summary of the invention

[0005] The technical problem to be solved by the utility model is to provide a water treatment device for removing photoresist, which can efficiently remove photoresist, save energy and protect the environment, and help improve the stability of wastewater system operation and service life, in view of the shortcomings of the existing technology.

[0006] The technical problem to be solved by the utility model is achieved through the following technical scheme: a water treatment device for removing photoresist, comprising a collecting unit, a regulating unit, an air flotation unit, a water production unit and a scum unit, wherein the bottom of the collecting unit is connected to the upper part of the regulating unit through a conveying pipeline, a water delivery pump is installed on the conveying pipeline, a stirring device is arranged in the regulating unit, and an acid solution adding pipe and an alkaline solution adding pipe are also connected to the top of the regulating unit; the water inlet of the air flotation unit is connected to the water outlet of the regulating unit, an air supply pipeline and a tap water supply pipe are connected to the top of the air flotation unit, the water production unit is connected to the upper part of the air flotation unit through an overflow pipeline, a water production pipeline is also connected to the bottom of the water production unit, and a water production pump is installed on the water production pipeline; the top of the scum unit is connected to the bottom of the air flotation unit, a scum pipeline is also connected to the bottom of the scum unit, and a scum pump is installed on the scum pipeline.

[0007] Furthermore, a pH online measuring instrument is installed on the regulating unit.

[0008] Furthermore, the stirring device is a vertical stirrer.

[0009] Furthermore, the air supply pipeline is externally connected to a CDA supply pipe or an air compressor.

[0010] Furthermore, the collection unit, the regulating unit, the air flotation unit, the water production unit and the scum unit are all tank structures, pool structures or trough structures.

[0011] Furthermore, the collection unit, the water production unit and the scum unit are all in the shape of a rectangular parallelepiped as a whole.

[0012] Furthermore, the regulating unit and the air flotation unit are both cylindrical in shape as a whole.

[0013] Compared with the prior art, the utility model has the following beneficial effects:

[0014] 1. The utility model does not need to add other toxic and harmful chemical reagents when removing photoresist, and only needs to add acid and alkaline solutions to control the pH value, which will not cause secondary pollution to the environment;

[0015] 2. Since the specific gravity of photoresist is less than that of water, it rises faster than other pollutants in the flotation unit. Therefore, the surface load required for the flotation equipment of the utility model can be higher, and a smaller model can be selected, so that the required floor space is small and the initial design cost is low;

[0016] 3. Each processing unit of the utility model has a simple structure, simple operation, high operating stability and low maintenance cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a device flow chart of the utility model;

[0018] Figure 2 It is a structural schematic diagram of the utility model. DETAILED DESCRIPTION

[0019] In order to make the purpose, technical solution and advantages of the embodiment of the utility model clearer, the technical solution in the embodiment of the utility model will be clearly and completely described below in conjunction with the drawings of the utility model. Obviously, the described embodiment is a part of the embodiment of the utility model, not all of the embodiments. Based on the embodiment of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0020] Reference Figure 1-2A water treatment device for removing photoresist comprises a collecting unit 1, a regulating unit 2, a flotation unit 3, a water production unit 5 and a scum unit 4, wherein the collecting unit 1 is used to collect wastewater containing photoresist, the regulating unit 2 is used to adjust the pH value of the wastewater containing photoresist, the flotation unit 3 is used to receive the photoresist wastewater after pH adjustment and perform solid-liquid two-phase separation, the scum unit 4 is used to receive the photoresist scum after phase separation by the flotation unit 3, and the water production unit 5 is used to receive the clean water after phase separation by the flotation unit 3, specifically:

[0021] The bottom of the collecting unit 1 is connected to the upper part of the regulating unit 2 through a delivery pipeline, so that the photoresist wastewater in the collecting unit 1 can be delivered to the regulating unit 2 by the delivery pipeline. A delivery water pump 6 is installed on the delivery pipeline to provide power for the delivery of the photoresist wastewater.

[0022] A stirring device 9 is provided in the regulating unit 2, which is used to quickly stir the photoresist wastewater in the regulating unit 2, so as to make it tumble up and down and move in an interlaced manner, so as to achieve the purpose of rapid and uniform mixing. Preferably, the stirring device 9 is a vertical stirrer, and an acid solution adding pipe 10 and an alkaline solution adding pipe 11 are also connected to the top of the regulating unit 2, which are used to add an acid solution or an alkaline solution into the regulating unit 2 as needed to adjust the pH value of the photoresist wastewater. Preferably, the alkaline solution is a sodium hydroxide solution with a mass percentage concentration of 30%, and the acidic solution is a sulfuric acid solution with a mass percentage concentration of 50%. At the same time, in order to better control the pH value of the photoresist wastewater in the regulating unit 2, a pH online measuring instrument 14 is also installed on the regulating unit 2;

[0023] The water inlet of the air flotation unit 3 is connected to the water outlet of the regulating unit 2, so that the photoresist wastewater in the regulating unit 2 can enter the air flotation unit 3 after the pH value is adjusted. The top of the air flotation unit 3 is connected with an air supply pipe 12 and a tap water supply pipe 13, which is convenient for inflating or adding water into the air flotation unit 3 to separate the clean water and scum in the photoresist wastewater. Preferably, the air supply pipe 12 is externally connected to a CDA supply pipe (clean dry air supply pipe) or an air compressor;

[0024] The water production unit 5 is connected to the upper part of the air flotation unit 3 through an overflow pipe, and is used to receive the clean water output from the air flotation unit 3. The bottom of the water production unit 5 is also connected to a water production pipe, and a water production pump 8 is installed on the water production pipe to facilitate the output of clean water.

[0025] The top of the scum unit 4 is connected to the bottom of the air flotation unit 3 for receiving the scum output from the air flotation unit 3. The bottom of the scum unit 4 is also connected to a scum pipeline, on which a scum pump 7 is installed for outputting the scum.

[0026] In actual use, the collecting unit 1, regulating unit 2, flotation unit 3, water production unit 5 and scum unit 4 are all tank structures, pool structures or trough structures. The collecting unit 1, water production unit 5 and scum unit 4 are all rectangular as a whole, and the regulating unit 2 and flotation unit 3 are all cylindrical as a whole.

[0027] The working principle of the water treatment device for removing photoresist of the utility model is based on the fact that the dissolution and precipitation of photoresist are different under different pH conditions. In particular, under acidic conditions, photoresist is gradually precipitated. The lower the pH of the solution, the higher the degree of photoresist precipitation. To prove this principle, photoresist precipitation and dissolution experiments are also carried out:

[0028] First, take the photoresist waste liquid, then dilute it 10 times, and measure the pH value to be 11.3. Then add sulfuric acid to make the pH = 2.2, and the photoresist precipitates. Then add liquid alkali to make the pH = 10. The photoresist is not completely dissolved. Continue to heat the liquid alkali to make the pH = 12, and the photoresist is dissolved.

[0029] The water treatment device for removing photoresist of the utility model can make the photoresist precipitate by adjusting the pH value of the photoresist wastewater, and finally separate it from the wastewater, thereby realizing the removal of the photoresist. The specific use process is as follows:

[0030] When the factory produces wastewater containing photoresist, the wastewater is first stored in the collection unit 1. The collection unit 1 determines the volume of the water pool according to the water volume and the residence time. The residence time is usually controlled at 20-30 minutes. When the wastewater needs to be treated, the wastewater is transported to the regulating unit 2 by the delivery pump 6 in the form of pressure flow;

[0031] In the regulating unit 2, the volume of the water pool is determined by the water volume and the residence time, and the residence time is usually controlled at 15-20 minutes; during this period, the pH value of the wastewater is detected by the pH online measuring instrument 14, and the amount of alkaline solution or acidic solution added is adjusted according to the result of the pH value detection to accurately control the pH value of the wastewater, and the pH is usually controlled between 3-7, wherein the alkaline solution adopts a sodium hydroxide solution with a mass percentage concentration of 30%, and the acidic solution adopts a sulfuric acid solution with a mass percentage concentration of 50%; the wastewater is hydraulically stirred by a vertical agitator so that the added chemicals are fully mixed with the wastewater to shorten the reaction time and avoid waste of chemicals;

[0032] In the conditioning unit 2, the wastewater becomes acidic after sufficient reaction, and the photoresist gradually changes from a dissolved state to a precipitated state, and then the wastewater is transported to the flotation unit 3 by gravity flow for the next stage of treatment;

[0033] In the air flotation unit 3, the equipment size is determined by the water volume and surface load, and the surface load is usually controlled at 5-10m 3 / m2 *h;

[0034] The factory's existing CDA supply pipe is used to ensure the stable operation of the dissolved air system. If there is no existing CDA supply pipe, an air compressor can be configured as a substitute. The factory's existing tap water supply is used for the inspection and cleaning of the flotation unit 3.

[0035] In the flotation unit 3, bubbles of a certain size are introduced into the wastewater through the dissolved air release device. Since the precipitated photoresist is hydrophobic, it will be adsorbed on the bubbles to form a three-phase foam layer formed by bubbles, water and photoresist. The three-phase foam layer has a specific gravity less than water and rises to the water surface. The foam layer is collected by a scraper device to separate the photoresist from the water. The separated photoresist scum is transported to the scum unit 4 for storage by gravity flow, and the treated clean water is transported to the water production unit 5 for storage by gravity flow, and finally the whole water treatment step of removing the photoresist is completed;

[0036] In the water production unit 5, the volume of the water pool is determined by the water volume and the retention time. The retention time is usually controlled at 20-30 minutes. The effluent can be equipped with a water production pump 8 to transport the produced water to the subsequent treatment process;

[0037] A delivery pump can be configured after the scum unit 4 to deliver the photoresist scum to the sludge concentration tank for subsequent treatment;

[0038] In this way, the water treatment operation for removing the photoresist can be achieved.

Claims

1. A water treatment device for removing photoresist, characterized in that: It includes a collecting unit, a regulating unit, an air flotation unit, a water production unit and a scum unit. The bottom of the collecting unit is connected to the upper part of the regulating unit through a conveying pipe, a water delivery pump is installed on the conveying pipe, a stirring device is arranged in the regulating unit, and an acid solution adding pipe and an alkaline solution adding pipe are also connected to the top of the regulating unit; the water inlet of the air flotation unit is connected to the water outlet of the regulating unit, an air supply pipe and a tap water supply pipe are connected to the top of the air flotation unit, the water production unit is connected to the upper part of the air flotation unit through an overflow pipe, a water production pipe is also connected to the bottom of the water production unit, and a water production pump is installed on the water production pipe; the top of the scum unit is connected to the bottom of the air flotation unit, a scum pipe is also connected to the bottom of the scum unit, and a scum pump is installed on the scum pipe; the collecting unit, regulating unit, air flotation unit, water production unit and scum unit are all tank structures, pool structures or trough structures.

2. The water treatment device for removing photoresist according to claim 1, characterized in that: A pH online measuring instrument is also installed on the regulating unit.

3. The water treatment device for removing photoresist according to claim 1 or 2, characterized in that: The stirring device is a vertical stirrer.

4. The water treatment device for removing photoresist according to claim 1, characterized in that: The air supply pipeline is externally connected to a CDA supply pipe or an air compressor.

5. The water treatment device for removing photoresist according to claim 1, characterized in that: The collecting unit, the water producing unit and the scum unit are all in the shape of a rectangular parallelepiped as a whole.

6. The water treatment device for removing photoresist according to claim 1 or 5, characterized in that: The regulating unit and the air flotation unit are both cylindrical in shape as a whole.

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