Radio frequency plasma device and vacuum system

Abstract

The utility model provides a radio frequency plasma device and a vacuum system, and the device comprises an electromagnetic field generator which is used for generating an electromagnetic field after being powered on; and the plasma generation cavity is coupled with the electromagnetic field generator and is used for accommodating working gas and plasma generated by the working gas under the action of the electromagnetic field.

Description

Technical Field

[0001] The present disclosure relates to the technical field of vacuum equipment, and in particular to a radio frequency plasma device and a vacuum system. Background Art

[0002] At present, plasma technology has been widely used in various fields. For example, in the manufacture of semiconductor integrated circuits, the growth of thin films of different materials and the etching of circuits are generally completed by plasma technology; for example, the growth of nano-titanium tubes, the development of micro-electromechanical systems, etc. The research and application of plasma are inseparable from the plasma generating equipment, such as plasma sources.

[0003] Traditional plasma sources require the use of high voltage during production and experimentation, which has a high risk factor and poor safety. In addition, traditional plasma sources use high-voltage direct current, which has low gas ionization efficiency, long production time, and high production and maintenance costs. Utility Model Content

[0004] The present disclosure provides a radio frequency plasma device, comprising:

[0005] an electromagnetic field generator for generating an electromagnetic field when powered; and

[0006] The plasma generating chamber is coupled with the electromagnetic field generator and is used to contain the working gas and the plasma generated by the working gas under the action of the electromagnetic field.

[0007] In some embodiments of the present disclosure, the electromagnetic field generator comprises:

[0008] Conducting lines, including:

[0009] A feeding line, used for connecting to a radio frequency power source;

[0010] An inductor coil is connected to the feed line and is wound around the plasma generating chamber to generate an electromagnetic field;

[0011] The ground line is connected to the inductor coil.

[0012] In some embodiments of the present disclosure, the electromagnetic field generator further comprises:

[0013] an electrode feedthrough for connecting a feed-in circuit to a radio frequency power source;

[0014] a first connector, disposed between the feed line and the electrode feedthrough, for connecting the feed line and the electrode feedthrough; and

[0015] The second connecting member is arranged between the electrode feedthrough and the radio frequency power supply, and is used to connect the electrode feedthrough and the radio frequency power supply.

[0016] In some embodiments of the present disclosure, the conductive line includes a first conductive line and a second conductive line.

[0017] The first conductive wire and the second conductive wire are connected at a feeding end of the feeding line, and form a double winding structure at the inductor coil.

[0018] In some embodiments of the present disclosure, the electromagnetic field generator further comprises:

[0019] At least one protective member is sleeved on the feeding line and the grounding line for insulation.

[0020] In some embodiments of the present disclosure, the plasma generating chamber includes a chamber body and a contraction section, and the inductor coil is wound around the chamber body.

[0021] The radio frequency plasma device also includes a gas introduction component,

[0022] Gas introduction assembly, comprising:

[0023] External pipe;

[0024] A separator block is sealingly connected to the outer tube and defines a proximal end portion at the proximal end of the outer tube;

[0025] The inlet inner tube has a proximal end which is sealed and penetrates the outer tube through a partition block, and is connected to a gas source through a proximal end portion, so as to introduce gas generated by the gas source;

[0026] The air inlet inner tube comprises a main body and an expansion section at the far end, and the expansion section is engaged with the far end of the outer tube for inputting the gas into the cavity.

[0027] In some embodiments of the present disclosure, the gas introduction assembly further includes:

[0028] The flow limiting tube is at least partially arranged in the expansion section, and its distal end extends into the contraction section of the plasma generating chamber. The proximal outer diameter of the flow limiting tube is larger than the inner diameter of the main body of the air intake inner tube, and the inner diameter of the flow limiting tube is smaller than the inner diameter of the main body of the air intake inner tube.

[0029] In some embodiments of the present disclosure, the gas introduction component also includes a diverter tube, which is sleeved on the distal end of the flow limiting tube, and the proximal end extends into the expansion section and the distal end extends into the contraction section. The distal end of the diverter tube is provided with at least one diverter hole for diverting the introduced gas.

[0030] In some embodiments of the present disclosure, the conductive line includes a first wire and a second wire which are hollow inside, and the radio frequency plasma device further includes a cooling device, wherein the cooling device includes:

[0031] a liquid inlet, connected to the first conductor at the proximal end of the grounding circuit, for introducing cooling liquid into the conducting circuit;

[0032] The liquid outlet pipe is connected to the second wire at the proximal end of the grounding line and is used for discharging the cooling liquid.

[0033] In some embodiments of the present disclosure, the conductive line includes a first conductive line and a second conductive line which are hollow inside, and the first conductive line and the second conductive line are connected at a feeding end of the feeding line.

[0034] The radio frequency plasma device also includes a water cooling device.

[0035] Cooling device, comprising:

[0036] a liquid inlet, connected to the first conductor at the proximal end of the grounding circuit, for introducing cooling liquid into the conducting circuit;

[0037] The first connecting tube is connected to the second conductor at the proximal end of the grounding line and is connected to the portion of the outer tube located at the distal end of the partition block;

[0038] A second connecting tube extends along the outer tube and the distal end of the connecting tube is connected to the outer tube.

[0039] The liquid outlet is connected to the proximal end of the second connecting tube and is used to discharge the coolant in the outer tube.

[0040] In some embodiments of the present disclosure, the partition block includes a first connecting channel and a second connecting channel, the first connecting channel is used to connect the first connecting tube with the outer tube, and the second connecting channel connects the second connecting tube with the liquid outlet.

[0041] In some embodiments of the present disclosure, the radio frequency plasma device further comprises:

[0042] A supporting flange, on which the outer pipe is passed;

[0043] The limit block is arranged at the far end of the outer tube, and the grounding line is passed through the limit block.

[0044] In some embodiments of the present disclosure, the radio frequency plasma device further comprises:

[0045] Seal kit, comprising:

[0046] A sealing ring is sleeved on the contraction section and is partially located in the expansion section of the intake inner pipe;

[0047] The sealing nut is threadedly connected to the expansion section and is used to compress the sealing ring to seal the contraction section and the expansion section of the intake inner pipe.

[0048] In some embodiments of the present disclosure, the outer side surface of the sealing ring includes a conical surface or an arcuate surface, and the expansion section and the sealing nut include a conical concave surface or an arcuate concave surface matching the outer side surface of the sealing ring; and / or

[0049] The sealing ring includes pyrolytic boron nitride and / or boron nitride.

[0050] In some embodiments of the present disclosure, the radio frequency plasma device further includes a shielding shell, which is mounted on the electromagnetic field generator and is used to shield electromagnetic signals.

[0051] In some embodiments of the present disclosure, the radio frequency plasma device further comprises:

[0052] Restricted components, including:

[0053] A first limiting member is sleeved on the contraction section of the plasma generating chamber;

[0054] A second limiting member is disposed at a distal end of the shielding shell,

[0055] The first limiting member and the second limiting member cooperate with each other to limit the plasma generated by the plasma generating chamber from moving toward the proximal end of the shielding shell.

[0056] In some embodiments of the present disclosure, the radio frequency plasma device further comprises:

[0057] The ion filter is arranged at the far end of the shielding shell and covers the far end of the cavity body of the plasma generating cavity, and is used for filtering plasma.

[0058] The present disclosure provides a vacuum system, comprising:

[0059] Vacuum chamber;

[0060] According to any one of the embodiments of the present disclosure, the radio frequency plasma device is at least partially disposed in a vacuum chamber, and is used to emit plasma into the vacuum chamber.

[0061] According to some embodiments of the present disclosure, the radio frequency plasma device and vacuum system can bring beneficial technical effects. For example, in some embodiments of the present disclosure, the radio frequency plasma device and vacuum system, the electrons in the plasma generating chamber perform cyclotron motion under the action of the electromagnetic field, which increases the probability of collision with gas molecules and the ionization efficiency of gas molecules, thereby generating a plasma with a higher density. For another example, in some embodiments of the present disclosure, the radio frequency plasma device and vacuum system, the radio frequency power supply is electrically connected to the conductive line, and the radio frequency current is transmitted to the conductive line, so that the inductor generates an alternating magnetic field. As the radio frequency current is continuously transmitted, the alternating magnetic field of the inductor will excite an induced electric field in the space around it, which can produce a cyclotron acceleration effect on the electrons in the plasma generating chamber surrounding it, increase the probability of collision with gas molecules, increase the ionization efficiency of gas molecules, thereby generating a plasma with a higher density. In addition, the working gas is cracked into plasma by radio frequency inductive coupling, thereby providing a more active working gas source, which can increase the proportion of gas participating in the reaction, thereby reducing the flow of the working gas in the vacuum chamber and increasing the film growth rate. As another example, in the RF plasma devices of some embodiments of the present disclosure, the working gas flows from the first gas channel through the second gas channel and then enters the plasma generating chamber, which can limit the flow of the working gas to fully ionize the gas molecules and improve the ionization efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0062] In order to more clearly illustrate the embodiments of the present disclosure or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only one embodiment of the present disclosure. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0063] Figure 1 A schematic structural diagram of a radio frequency plasma device according to some embodiments of the present disclosure is shown;

[0064] Figure 2A A partial structural schematic diagram of a radio frequency plasma device according to some embodiments of the present disclosure is shown;

[0065] Figure 2B Show Figure 2A AA section view;

[0066] Figure 3 A partial structural schematic diagram of an electromagnetic field generator according to some embodiments of the present disclosure is shown;

[0067] Figure 4 An enlarged view of a part of the structure of an electromagnetic field generator according to some embodiments of the present disclosure is shown;

[0068] Figure 5 According to some embodiments of the present disclosure Figure 2B A magnified schematic diagram of part A;

[0069] Figure 6 According to some embodiments of the present disclosure Figure 2B A magnified schematic diagram of part B;

[0070] Figure 7 A schematic cross-sectional view of a flow restricting tube according to some embodiments of the present disclosure is shown;

[0071] Figure 8 A schematic diagram showing the structure of a shunt tube according to some embodiments of the present disclosure is shown;

[0072] Fig.9A According to some embodiments of the present disclosure Figure 2B An enlarged schematic diagram of part A from another angle;

[0073] Fig. 9B According to some embodiments of the present disclosure Figure 2B An enlarged schematic diagram of a third angle of part A;

[0074] Fig.10 According to some embodiments of the present disclosure Figure 2B An enlarged schematic diagram of part B from another angle;

[0075] Fig.11 A schematic cross-sectional view showing a separator block according to some embodiments of the present disclosure;

[0076] Fig.12 A partial cross-sectional schematic diagram showing a radio frequency plasma device according to some embodiments of the present disclosure;

[0077] Fig.13 A top view of a radio frequency plasma device according to some embodiments of the present disclosure is shown;

[0078] Fig.14 A schematic structural diagram of a vacuum system according to some embodiments of the present disclosure is shown;

[0079] Fig.15 A schematic diagram of a sealing structure is shown in which the outer side surface of the sealing ring according to some embodiments of the present disclosure includes a tapered surface;

[0080] Fig.16 A schematic diagram of a sealing structure is shown in which the outer side surface of the sealing ring according to some embodiments of the present disclosure includes a curved surface.

[0081] In the above drawings, the reference numerals represent:

[0082] 100 radio frequency plasma device,

[0083] 10 electromagnetic field generator, 11 radio frequency power supply, 12 conducting circuit, 121 feeding circuit, 1211 feeding end, 122 inductor coil, 123 grounding circuit, 13 electrode feed-through, 14 first connecting member

[0084] 20 plasma generating chamber, 21 chamber body, 22 contraction section

[0085] 30 gas introduction assembly, 31 outer tube, 311 proximal end, 32 partition block, 321 first connecting channel, 322 second connecting channel, 33 air intake inner tube, 331 main body, 332 expansion section, 34 flow limiting tube, 341 first gas channel, 342 second gas channel, 35 flow dividing tube

[0086] 40 cooling device, 41 liquid inlet, 42 first connecting pipe, 43 second connecting pipe, 44 liquid outlet, 45 third connecting pipe, 46 fourth connecting pipe

[0087] 50 Support flange

[0088] 60 limit block

[0089] 70 sealing assembly, 71 sealing ring, 72 sealing nut

[0090] 80 shielding shell

[0091] 90 limiting component, 91 first limiting member, 92 second limiting member, 93 ion filter

[0092] 1000 vacuum systems, 200 vacuum chambers, 300 sample racks DETAILED DESCRIPTION

[0093] Some embodiments of the present disclosure will be described below in conjunction with the accompanying drawings. Obviously, the described embodiments are only exemplary embodiments of the present disclosure, rather than all embodiments.

[0094] In the description of the present disclosure, it should be noted that the terms "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", "outside", "top", "bottom" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present disclosure. In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance. In the description of the present disclosure, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", and "coupled" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be the internal connection of two elements. In the description of the present disclosure, the distal end or the distal side refers to an end or a side that penetrates into a vacuum environment (e.g., a vacuum chamber), and the proximal end or the proximal side refers to an end or a side opposite to the distal end or the distal side (e.g., an end or a side that is away from the vacuum chamber, or an end or a side that is close to the vacuum chamber wall in the vacuum chamber, etc.). For those of ordinary skill in the art, the specific meanings of the above terms in the present disclosure can be understood according to specific circumstances.

[0095] Figure 1 A schematic structural diagram of a radio frequency plasma device 100 according to some embodiments of the present disclosure is shown. Figure 2A A partial structural schematic diagram of a radio frequency plasma device according to some embodiments of the present disclosure is shown. Figure 2B Show Figure 2A AA cross-section diagram.

[0096] like Figure 1 , Figure 2A and Figure 2B As shown, the radio frequency plasma device 100 may include an electromagnetic field generator 10 and a plasma generating chamber 20. The electromagnetic field generator 10 can be used to generate an electromagnetic field after being powered on, and the plasma generating chamber 20 is coupled to the electromagnetic field generator 10 and can be used to contain the working gas and the plasma generated by the working gas under the action of the electromagnetic field. The electrons in the plasma generating chamber 20 perform cyclotron motion under the action of the electromagnetic field, which increases the probability of collision with gas molecules and increases the ionization efficiency of gas molecules, thereby generating a plasma with a higher density.

[0097] Figure 3 A partial structural schematic diagram of an electromagnetic field generator 10 according to some embodiments of the present disclosure is shown.

[0098] like Figure 1-Figure 3As shown, in some embodiments of the present disclosure, the electromagnetic field generator 10 may include a conductive line 12. In some embodiments, the electromagnetic field generator 10 may also include a radio frequency power source 11. Those skilled in the art may understand that the electromagnetic field generator 10 may not include the radio frequency power source 11, but may be separated from the radio frequency power source 11 and connected to an external radio frequency power source 11 during use.

[0099] like Figure 1-Figure 3 As shown, the conducting line 12 may include a feeding line 121, an inductor 122 and a grounding line 123. The feeding line 121 may be used to connect to the RF power supply 11, and the inductor 122 is connected to the feeding line 121 and is wound around the plasma generating chamber 20, and can be used to generate an electromagnetic field. The grounding line 123 is connected to the inductor 122 and can be used for grounding. The RF power supply 11 is electrically connected to the conducting line 12, and transmits a radio frequency current, such as a radio frequency current with a relatively low frequency (e.g., 13.56 MHz), to the conducting line 12, so that the inductor 122 generates an alternating magnetic field. As the radio frequency current is continuously transmitted, the alternating magnetic field of the inductor 122 will excite an induced electric field in the space around it, which can produce a cyclotron acceleration effect on the electrons in the plasma generating chamber 20 surrounding it, thereby increasing the probability of collision with gas molecules and increasing the ionization efficiency of gas molecules, thereby generating a plasma with a higher density. In addition, the working gas is cracked into plasma by radio frequency inductive coupling, thereby providing a more active working gas source, which can increase the proportion of gas participating in the reaction, thereby reducing the flow of the working gas in the vacuum chamber and increasing the film growth rate.

[0100] Those skilled in the art will appreciate that, although an RF current with a frequency of 13.56 MHz is selected in some embodiments of the present disclosure, this is merely exemplary, and in other embodiments of the present disclosure, an RF current with a frequency of 27.12 MHz or other suitable frequencies may be passed through the inductor to generate an electromagnetic field.

[0101] Figure 4 A partial enlarged view of the structure of the electromagnetic field generator 10 according to some embodiments of the present disclosure is shown.

[0102] like Figure 4As shown, in some embodiments of the present disclosure, the electromagnetic field generator 10 may also include an electrode feedthrough 13, a first connector 14 and a second connector (not shown in the figure). The electrode feedthrough 13 connects the feed line 121 to the RF power supply 11, and the first connector 14 is arranged between the feed line 121 and the electrode feedthrough 13, and can be used to connect the feed line 121 and the electrode feedthrough 13. The first connector 14 is "L" shaped, and the feed end 1211 of the feed line 121 is fitted with the short side of the first connector 14, and abuts against the long side of the first connector 14 to form a conductive path. The distal end of the electrode feedthrough 13 is connected to the long side of the first connector 14 by bolts, and the RF current generated by the RF power supply 11 can be introduced into the feed line 121 through the first connector 14, and the electrode feedthrough 13 and the feed line 121 are detachably connected by bolts, which is convenient for maintenance and replacement. The second connector is arranged between the electrode feedthrough 13 and the RF power supply 11, and can be used to connect the electrode feedthrough 13 and the RF power supply 11. One end of the second connector is connected to the proximal end of the electrode feedthrough 13, and the other end is connected to the RF power source 11 through a bolt, and can be used to introduce the RF current generated by the RF power source 11 into the feed line 121. In some embodiments, the electrode feedthrough 13 can pass through the support flange 50 to achieve electrical feeding between the vacuum environment and the outside world.

[0103] Those skilled in the art will appreciate that, although in some embodiments of the present disclosure, the first connecting member 14 is in an "L" shape, this is merely exemplary, and the first connecting member 14 may also be in other suitable shapes, such as an "I" shape, an "S" shape, or a straight shape.

[0104] like Figure 1-Figure 3 As shown, in some embodiments of the present disclosure, the conductive line 12 may include a first conductive line and a second conductive line. The first conductive line and the second conductive line are connected at the feed end 1211 of the feed line 121 (for example, forming a U-shaped connection structure), and form a double winding structure at the inductor 122. The first conductive line and the second conductive line are wound to form the feed line 121, the inductor 122, and the ground line 123 connected in sequence. In order to avoid confusion, the first conductive line and the second conductive line are no longer separately marked in the figure.

[0105] like Figure 1-Figure 3 As shown, in some embodiments of the present disclosure, the electromagnetic field generator 10 may further include a protective member, which may be, for example, at least one insulating ceramic tube, which may be sleeved on the feed line 121 and the ground line 123 and may be used for insulation. The insulating ceramic tube may be composed of a plurality of small ceramic tubes, which may facilitate direction adjustment, and the insulating ceramic tube may also be composed of a whole ceramic tube.

[0106] Figure 5 According to some embodiments of the present disclosure Figure 2B An enlarged schematic diagram of part A. Figure 6According to some embodiments of the present disclosure Figure 2B An enlarged schematic diagram of part B.

[0107] like Figure 2A , Figure 2B , Figure 6 As shown, in some embodiments of the present disclosure, the plasma generating chamber 20 may include a cavity 21 and a contraction section 22, and the inductor 122 is wound around the cavity 21. The induced electric field generated by the inductor 122 covers the cavity 21, so that the working gas is ionized into plasma in the cavity 21.

[0108] like Figure 1-Figure 5 As shown, in some embodiments of the present disclosure, the RF plasma device 100 may further include a gas introduction component 30. The gas introduction component 30 may include an outer tube 31, a partition block 32, and an air intake inner tube 33. The partition block 32 is sealedly connected to the outer tube 31, and is located at the proximal end of the outer tube 31, and defines a proximal end portion 311 at the proximal end of the outer tube 31. The proximal end of the air intake inner tube 33 is sealedly penetrated in the outer tube 31 through the partition block 32, and is connected to a gas source (not shown in the figure) through the proximal end portion 311, and can be used to introduce gas generated by the gas source. At the same time, the partition block 32 also forms a watertight state between the interior of the outer tube 31 and its proximal end portion 311, preventing the coolant around the air intake inner tube 33 from penetrating into the proximal end portion 311. The air intake inner tube 33 may include a main body 331 and an expansion section 332 located at the distal end, and the expansion section 332 is engaged with the distal end of the outer tube 31, and can be used to input gas into the cavity 21.

[0109] Those skilled in the art will appreciate that, although in some embodiments of the present disclosure, the outer tube 31 is in two sections and connected together by the separator 32, this is only exemplary. The outer tube may also be integrally formed, with the separator disposed inside the outer tube and defining the proximal end at the proximal end of the outer tube.

[0110] Those skilled in the art will appreciate that, although in some embodiments of the present disclosure, the main body 331 and the expansion section 332 of the inner intake pipe 33 are divided into two sections and connected by processes such as welding, this is merely exemplary, and the main body 331 and the expansion section 332 may also be formed as one piece.

[0111] Figure 7 FIG. 4 is a schematic structural diagram of a flow restricting tube 34 according to some embodiments of the present disclosure.

[0112] like Figure 2A , Figure 2B , Figure 6 , Figure 7As shown, in some embodiments of the present disclosure, the gas introduction assembly 30 may further include a flow limiting tube 34. The flow limiting tube 34 is at least partially disposed in the expansion section 332, and the distal end extends into the contraction section 22 of the plasma generating chamber 20. The proximal outer diameter of the flow limiting tube 34 is greater than the inner diameter of the main body 331 of the air inlet inner tube 33, and the inner diameter of the flow limiting tube 34 is smaller than the inner diameter of the main body 331 of the air inlet inner tube 33. The flow limiting tube 34 includes a first gas channel 341 and a second gas channel 342, and the diameter of the first gas channel 341 may be greater than the diameter of the second gas channel 342. The working gas flows from the first gas channel 341 through the second gas channel 342 and then enters the plasma generating chamber 20, which can limit the flow of the working gas so that the gas molecules are fully ionized and the ionization efficiency is improved.

[0113] Figure 8 A schematic structural diagram of a shunt tube 35 according to some embodiments of the present disclosure is shown.

[0114] like Figure 2A , Figure 2B , Figure 6 , Figure 8 As shown, in some embodiments of the present disclosure, the gas introduction assembly 30 may further include a shunt tube 35. The shunt tube 35 is sleeved at the distal end of the flow limiting tube 34, and the proximal end extends into the expansion section 332, and the distal end extends into the contraction section 22. The shunt tube 35 is provided at the distal end with at least one shunt hole 351 (e.g., shunt hole 351a, shunt hole 351b, shunt hole 351c, shunt hole 351d), which can be used to shunt the introduced working gas to increase the disorder between the gas molecules, fully ionize the gas molecules, and improve the ionization efficiency.

[0115] Fig.9A According to some embodiments of the present disclosure Figure 2B An enlarged schematic diagram of part A from another angle. Fig. 9B According to some embodiments of the present disclosure Figure 2B An enlarged schematic diagram of the third angle of part A.

[0116] Fig.10 According to some embodiments of the present disclosure Figure 2B An enlarged schematic diagram of part B from another angle.

[0117] like Figure 1-Figure 10As shown, the RF plasma device 100 may also include a cooling device 40. The cooling device 40 may include a liquid inlet 41 (liquid inlet pipe is not shown), a first connecting pipe 42, a second connecting pipe 43, a liquid outlet 44 (liquid outlet pipe is not shown), a third connecting pipe 45 and a fourth connecting pipe 46. The conductive circuit 12 may include a hollow first wire and a second wire, and the first wire and the second wire are connected at the feeding end of the feeding circuit. The liquid inlet 41 is connected to the first wire through the third connecting pipe 45 at the proximal end of the grounding circuit 123, and can be used to pass the cooling liquid into the conductive circuit 12. The first connecting pipe 42 is connected to the second wire at the proximal end of the grounding circuit 123, and is connected to the part of the outer tube 31 located at the distal end of the partition block 32. The cooling liquid enters the outer tube 31, and the second connecting pipe 43 extends along the outer tube 31 and is connected to the outer tube 31 at the distal end. When the liquid level of the cooling liquid in the outer tube 31 is higher than the second connecting pipe 43, it can be discharged from the second connecting pipe 43 to ensure the cooling effect of the cooling liquid on the gas introduction component 30. The liquid outlet pipe 44 is connected to the proximal end of the second connecting pipe 43 through the fifth connecting pipe 46 , and can be used to discharge the cooling liquid in the outer pipe 31 .

[0118] In some embodiments of the present disclosure, the coolant passes through the hollow first and second conductors to cool the feed line 121, the inductor 122, and the ground line 123, and then cools the gas introduction component 30. The coolant circulation route is long and the cooling is sufficient to prevent the equipment from being damaged due to overheating, effectively extending the service life of the equipment. In some embodiments of the present disclosure, low-frequency low-voltage alternating current is used, and even if the coolant is passed into the conductive line 12, there will be no conductive problem.

[0119] Those skilled in the art will appreciate that, although in some embodiments of the present disclosure, the cooling device 40 cools both the conductive line 12 and the gas introduction assembly 30, this is only a preferred embodiment. In some embodiments, only the conductive line 12 may be cooled, or only the gas introduction assembly 30 may be cooled, or the conductive line 12 or the gas introduction assembly 30 may be cooled independently. For example, the conductive line may also include a first conductive line and a second conductive line that are hollow inside, and the radio frequency plasma device may further include a cooling device. The cooling device may include: a liquid inlet pipe, connected to the first conductive line at the proximal end of the grounding line, for introducing a coolant into the conductive line; and a liquid outlet pipe, connected to the second conductive line at the proximal end of the grounding line, for discharging the coolant.

[0120] Fig.11 A schematic cross-sectional view of a separator block 32 according to some embodiments of the present disclosure is shown.

[0121] like Fig.11As shown, in some embodiments of the present disclosure, the partition block 32 includes a first connecting channel 321 and a second connecting channel 322. The first connecting channel 321 and the second connecting channel 322 are L-shaped channels, and the first connecting channel 321 can be used to connect the first connecting tube 42 with the outer tube 31, and the second connecting channel 322 connects the second connecting tube 43 with the liquid outlet tube 44.

[0122] Those skilled in the art can understand that, although the first connection channel 321 and the second connection channel 322 of the partition block 32 are L-shaped channels in some embodiments of the present disclosure, this is only exemplary, and the first connection channel and the second connection channel can also be S-shaped channels or Z-shaped channels. Similarly, although the first connection channel 321 and the second connection channel 322 are provided in the partition block 32 in some embodiments of the present disclosure, this is only exemplary, and the first connection hole and the second connection hole can also be provided in the partition block, and the first connection hole can be used to connect the first connection tube 42 with the outer tube 31, and the second connection hole can be used to connect the second connection tube 43 with the liquid outlet tube 44.

[0123] like Figure 1-Figure 4 As shown, in some embodiments of the present disclosure, the RF plasma device 100 may further include a support flange 50 and a stopper 60. The outer tube 31 is passed through the support flange 50, the stopper 60 is arranged at the distal end of the outer tube 31, and the grounding line 123 is passed through the stopper 60. The stopper 60 can be used to fix the position of the grounding line 123, and when adjusting the angle and / or position of the conductive line 12, only the feed line 121 needs to be adjusted. The support flange 50 can be used to install the RF plasma device 100 on the vacuum chamber to achieve vacuum sealing.

[0124] like Figure 2A , Figure 2B , Figure 6 and Fig.10 As shown, in some embodiments of the present disclosure, the RF plasma device 100 may further include a sealing assembly 70. The sealing assembly 70 may include a sealing ring 71 and a sealing nut 72. The sealing ring 71 is sleeved on the contraction section 22 and is partially located in the expansion section 332 of the intake inner tube 33. The sealing nut 72 is threadedly connected to the expansion section 332 and can be used to compress the sealing ring 71 to seal the contraction section 22 and the expansion section 332 of the intake inner tube 33.

[0125] Existing vacuum seals are mainly divided into seals made of synthetic materials such as rubber and metal materials such as sealing indium wire parts based on the materials of the sealing ring. Rubber synthetic materials have the advantages of high elasticity, high wear resistance and suitable mechanical strength, which makes them widely used in vacuum seals. However, they have large gas outflow rate and permeability, and cannot be baked at high temperature and are not resistant to radiation. The melting point of metal indium wire seals is low, and the baking temperature cannot be higher than 150°C. It is often used for vacuum sealing in low-temperature environments, and the indium wire is easy to flow after being pressed. In plasma research, due to the increase of different plasma powers or the observation of different plasma test effects for a long time, there have been phenomena of burning of sealing rubber ring parts and melting of sealing indium wire parts into the vacuum chamber, causing vacuum environmental pollution, thus affecting the results of plasma research.

[0126] Therefore, in some embodiments of the present disclosure, the sealing ring 71 may include pyrolytic boron nitride (PBN) and / or boron nitride (BN). For example, the sealing ring 71 may be made of pyrolytic boron nitride (PBN) material, or made of boron nitride (BN) material. The melting point of pyrolytic boron nitride (PBN) is 1750°C-2300°C, and the melting point of boron nitride (BN) can be as high as 2700°C, which can prevent the equipment from melting and deforming due to overheating, thereby greatly improving the sealing effect. In addition, PBN and BN are non-metallic materials. Parts using PBN and / or BN as sealing materials also have the characteristics of high temperature resistance, corrosion resistance, high resistance, good electrical insulation performance, smooth surface, no pores, and non-wetting with most semiconductor melts, good oxidation resistance and thermal shock resistance, so that the equipment will not interfere with the vacuum degree of the vacuum chamber when in use, and can better maintain the vacuum degree of the vacuum environment. At the same time, during the loading and unloading process, it can also protect the internal parts of the present invention.

[0127] Fig.15 A schematic diagram of a sealing structure is shown in which the outer side surface of the sealing ring 71 includes a conical surface according to some embodiments of the present disclosure. Fig.16 A schematic diagram of a sealing structure is shown in which the outer side surface of the sealing ring 71 according to some embodiments of the present disclosure includes a curved surface.

[0128] like Fig.15 and Fig.16 As shown, the sealing nut 72 and the sealing ring 71 cooperate with each other and are sleeved on the contraction section 22. The sealing nut 72 and the expansion section 332 are threaded to pre-tighten the sealing ring 71, so that the sealing ring 71 forms a line seal on the contact surface of the sealing nut 72, the expansion section 332 and the contraction section 22, thereby preventing the leakage of the medium on both sides and allowing the medium to flow in from the middle, with the characteristics of good sealing performance and easy disassembly.

[0129] In some embodiments of the present disclosure, Fig.15As shown, the outer side surface of the sealing ring 71 includes a conical surface, and the expansion section 332 and the sealing nut 72 include a conical concave surface that matches the outer side surface of the sealing ring 71. Those skilled in the art will understand that the outer side surface of the sealing ring 71 may include two conical surfaces that are arranged opposite to each other, and the cross section may be a triangle, a trapezoid, a triangle or a trapezoid with a truncated bottom angle, etc.

[0130] In some embodiments of the present disclosure, Fig.16 As shown, the outer side surface of the sealing ring 71 includes an arc surface, and the expansion section 332 and the sealing nut 72 include an arc concave surface that matches the outer side surface of the sealing ring 71. Those skilled in the art will understand that the arc surface may include a circular arc surface or an elliptical arc surface.

[0131] In some embodiments of the present disclosure, when the outer side surface of the sealing ring 71 includes a conical surface or an arc surface, it can withstand the pressure on both sides of the sealing nut 72 and the expansion section 332 without breaking or deforming, and at the same time, the contraction section 22 and the expansion section 332 of the intake inner tube 33 can be sealed and connected to prevent the working gas from escaping to the vacuum chamber 200 (such as Fig.14 ), resulting in a decrease in vacuum degree and affecting the effect of vacuum processing (e.g., coating).

[0132] like Figure 1 , Figure 2A and Figure 2B As shown, in some embodiments of the present disclosure, the RF plasma device 100 may further include a shielding shell 80. The shielding shell 80 is sleeved on the electromagnetic field generator 10 and can be used to shield electromagnetic signals. The proximal end of the shielding shell 80 is fixedly connected to the support flange 50.

[0133] Those skilled in the art will appreciate that, although in some embodiments of the present disclosure, the shielding shell 80 is only an integral shell, this is merely exemplary, and the shielding shell 80 may also be composed of multiple shells, for example, the shielding shell 80 may include a first shell and a second shell.

[0134] Fig.12 A partial cross-sectional schematic diagram of a radio frequency plasma device 100 according to some embodiments of the present disclosure is shown.

[0135] like Fig.12As shown, in some embodiments of the present disclosure, the RF plasma device 100 may further include a limiting component 90. The limiting component 90 may include a first limiting member 91 and a second limiting member 92. The first limiting member 91 is sleeved on the contraction section 22 of the plasma generating chamber 20, and the second limiting member 92 is arranged at the far end of the shielding shell 80. The first limiting member 91 and the second limiting member 92 may be made of high melting point metals such as tantalum or molybdenum, which can block the electric field from spreading outward, so that the plasma can converge within the range of the plasma generating chamber 20, limit the movement of the plasma to the proximal end of the shielding shell 80, prevent ion corrosion of the equipment, and extend the service life of the equipment.

[0136] Fig.13 A top view of a radio frequency plasma device 100 according to some embodiments of the present disclosure is shown.

[0137] like Fig.13 As shown, in some embodiments of the present disclosure, the RF plasma device 100 may further include an ion filter 93. The ion filter 93 is disposed at the distal end of the shielding shell 80 and covers the distal end of the cavity 21 of the plasma generating chamber 20, and can be used to filter plasma. Through the screening of the ion filter 93, high-energy ions can be suppressed from reaching the sample surface, reducing damage, and can be widely used in the growth of nitrides, nitrogen atom implantation and doping, oxide growth, oxygen atom implantation and doping, hydride growth, and hydrogen atom surface cleaning in vacuum systems (e.g., molecular beam epitaxy systems).

[0138] According to some embodiments of the present disclosure, the radio frequency plasma device can bring beneficial technical effects. For example, the radio frequency plasma device of some embodiments of the present disclosure can solve one or more of the following problems in conventional technologies: the need to use high voltage during production and experiments, high risk factor, poor safety, and low gas ionization efficiency when using high voltage direct current, and can achieve the technical effects of using low voltage alternating current, high safety, and improved gas ionization efficiency, simple structure, and reduced cost.

[0139] Fig.14 A schematic structural diagram of a vacuum system 1000 according to some embodiments of the present disclosure is shown.

[0140] like Fig.14 As shown, the vacuum system 1000 may include a vacuum chamber 200, a radio frequency plasma device 100 and a sample holder 300. The radio frequency plasma device 100 may be at least partially disposed in the vacuum chamber 200 via a support flange 50, and may be used to emit plasma to the sample holder 300 in the vacuum chamber 200, thereby performing various vacuum processes, such as coating, cleaning, implantation, and the like.

[0141] The vacuum system according to some embodiments of the present disclosure can bring beneficial technical effects. For example, the vacuum system according to some embodiments of the present disclosure can solve one or more of the following problems in conventional technologies: long system production time, low production efficiency, and high production cost, and can achieve the technical effects of improving system production efficiency, reducing costs, and having a wider range of applications.

[0142] It should be pointed out that the above are only exemplary embodiments of the present disclosure and are not intended to limit the present disclosure. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present disclosure should be included in the protection scope of the present disclosure.

Claims

1. A radio frequency plasma device, characterized in that: include: An electromagnetic field generator, used for generating an electromagnetic field after being powered on; as well as The plasma generating chamber is coupled with the electromagnetic field generator and is used to contain the working gas and the plasma generated by the working gas under the action of the electromagnetic field.

2. The radio frequency plasma device according to claim 1, characterized in that: The electromagnetic field generator comprises: Conductive lines, including: A feeding line, used for connecting to a radio frequency power source; An inductor coil connected to the feed line and wound around the plasma generating chamber for generating an electromagnetic field; A grounding circuit is connected to the inductor.

3. The radio frequency plasma device according to claim 2, characterized in that: The electromagnetic field generator also includes: an electrode feedthrough for connecting the feed-in circuit to the radio frequency power source; a first connector, disposed between the feed line and the electrode feedthrough, for connecting the feed line and the electrode feedthrough; and The second connector is disposed between the electrode feedthrough and the radio frequency power source and is used to connect the electrode feedthrough and the radio frequency power source.

4. The radio frequency plasma device according to claim 2, characterized in that: The conductive line includes a first conductive line and a second conductive line, The first conductive wire and the second conductive wire are connected at a feeding end of the feeding line, and form a double winding structure at the inductor.

5. The radio frequency plasma device according to claim 4, characterized in that: The electromagnetic field generator also includes: At least one protective member is sleeved on the feeding line and the grounding line for insulation.

6. The radio frequency plasma device according to claim 2, characterized in that: The plasma generating chamber comprises a chamber body and a contraction section, and the inductor coil is wound around the chamber body. The radio frequency plasma device also includes a gas introduction component, The gas introduction component comprises: External pipe; A separator block is sealingly connected to the outer tube and defines a proximal end portion at the proximal end of the outer tube; An air inlet inner tube, the proximal end of which is sealedly inserted into the outer tube through the partition block, and is connected to the gas source through the proximal end, for introducing the gas generated by the gas source; The inner air intake tube comprises a main body and an expansion section at a distal end, wherein the expansion section is engaged with the distal end of the outer tube and is used for inputting gas into the cavity.

7. The radio frequency plasma device according to claim 6, characterized in that: The gas introduction component further comprises: The flow limiting tube is at least partially arranged in the expansion section, and the distal end thereof extends into the contraction section of the plasma generating chamber, the proximal outer diameter of the flow limiting tube is larger than the inner diameter of the main body of the air intake inner tube, and the inner diameter of the flow limiting tube is smaller than the inner diameter of the main body of the air intake inner tube.

8. The radio frequency plasma device according to claim 7, characterized in that: The gas introduction component further comprises: The shunt tube is sleeved on the distal end of the flow limiting tube, and the proximal end extends into the expansion section, and the distal end extends into the contraction section. The distal end of the shunt tube is provided with at least one shunt hole for shunt the introduced gas.

9. The radio frequency plasma device according to claim 6, characterized in that: The conductive line includes a first conductive wire and a second conductive wire which are hollow inside. The radio frequency plasma device also includes a cooling device, The cooling device comprises: a liquid inlet, connected to the first conductive wire at the proximal end of the grounding circuit, and used for introducing cooling liquid into the conducting circuit; A liquid outlet pipe is connected to the second wire at the proximal end of the grounding line and is used for discharging cooling liquid.

10. The radio frequency plasma device according to claim 6, characterized in that: The conductive line includes a first wire and a second wire which are hollow inside, and the first wire and the second wire are connected at a feeding end of the feeding line. The radio frequency plasma device also includes a cooling device, The cooling device comprises: a liquid inlet, connected to the first conductive wire at the proximal end of the grounding circuit, and used for introducing cooling liquid into the conducting circuit; The first connecting tube is connected to the second wire at the proximal end of the grounding line and is connected to the portion of the outer tube located at the distal end of the partition block; A second connecting tube extends along the outer tube and the distal end of the second connecting tube is connected to the outer tube. The liquid outlet is connected to the proximal end of the second connecting tube and is used to discharge the coolant in the outer tube.

11. The radio frequency plasma device according to claim 10, characterized in that: The partition block includes a first connecting channel and a second connecting channel, the first connecting channel is used to connect the first connecting tube with the outer tube, and the second connecting channel connects the second connecting tube with the liquid outlet.

12. The radio frequency plasma device according to claim 9 or 10, characterized in that: Also includes: A supporting flange, wherein the outer tube is passed through the supporting flange; A limit block is arranged at the distal end of the outer tube, and the grounding line is passed through the limit block.

13. The radio frequency plasma device according to claim 12, characterized in that: Also includes: Seal kit, comprising: A sealing ring, sleeved on the contraction section and partially located in the expansion section of the intake inner pipe; A sealing nut is threadedly connected to the expansion section and is used to compress the sealing ring to seal the contraction section and the expansion section of the intake inner pipe.

14. The radio frequency plasma device according to claim 13, characterized in that: The outer side surface of the sealing ring includes a conical surface or an arcuate surface, and the expansion section and the sealing nut include a conical concave surface or an arcuate concave surface matching the outer side surface of the sealing ring; and / or The sealing ring comprises pyrolytic boron nitride and / or boron nitride.

15. The radio frequency plasma device according to claim 12, characterized in that: It also includes a shielding shell, which is sleeved on the electromagnetic field generator and is used for shielding electromagnetic signals.

16. The radio frequency plasma device according to claim 15, characterized in that: Also includes: Restricted components, including: A first limiting member, sleeved on the contraction section of the plasma generating chamber; A second limiting member is disposed at the distal end of the shielding shell, The first limiting member and the second limiting member cooperate with each other to limit the plasma generated by the plasma generating chamber from moving toward the proximal end of the shielding shell.

17. The radio frequency plasma device according to claim 15, characterized in that: Also includes: The ion filter is arranged at the far end of the shielding shell and covers the far end of the cavity body of the plasma generating cavity, and is used for filtering plasma.

18. A vacuum system, characterized in that: include: Vacuum chamber; as well as The radio frequency plasma device according to any one of claims 1 to 17, wherein the radio frequency plasma device is at least partially disposed in the vacuum chamber and is used to emit plasma into the vacuum chamber.

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