Mechanism for measuring film thickness of opaque substrate sample

Abstract

The utility model relates to the field of optical detection equipment, in particular to a mechanism for measuring the film thickness of an opaque substrate sample, which comprises an equipment frame, a sample table, a linear driving piece and a rotary driving piece, and is characterized in that the equipment frame is provided with a detection head and a projection module; the sample table is installed on the equipment frame, the linear driving part is used for driving the sample table to move in the linear direction, and the rotary driving part is used for driving the sample table to rotate. The device has the effects that the sample can be conveniently detected, and the working intensity of detection personnel is reduced.

Description

Technical Field

[0001] The present application relates to the field of optical detection equipment, and particularly to a mechanism for measuring the film thickness of an opaque substrate sample. Background Art

[0002] A sample refers to a transparent or opaque object to be detected, such as a wafer. To ensure the product quality of the sample, it is necessary to detect the transparency of the transparent sample or the thickness of the opaque sample through a sample detection device.

[0003] In the existing related technologies, a sample detection device includes a device frame, a sample stage, a detection head, and a projection module. The sample stage, the detection head, and the projection module are all fixedly installed on the device frame. The sample stage is used to place the sample, the detection head is used to emit detection light to the sample, and the projection module is used to receive the detection light emitted by the detection head.

[0004] When using the sample detection device to measure the transparency of a transparent sample, the tester needs to place the transparent sample on the sample stage, and then emit detection light to the sample through the detection head. The detection light passes through the sample and is received by the projection module. The detection light is continuously reflected in the integrating sphere of the projection module and then transmitted into the spectrometer through an optical fiber, and then the transmittance of the sample, that is, the transparency, is calculated through the spectrometer.

[0005] When using the detection device to measure the thickness of an opaque sample, after the tester places the opaque sample on the sample stage, the detection head emits detection light to the sample. The detection light is reflected by the opaque sample and then received by the detection head and the thickness of the opaque sample is obtained through calculation by the terminal.

[0006] To ensure the accuracy of the detection, after a single detection is completed, the tester needs to pick up the sample and change the angle and / or position of the sample and then place it on the sample stage again, so that the detection head can detect the transparency or thickness of different positions of the sample, and thus a more accurate detection result can be obtained through multiple sets of detection data.

[0007] In view of the above related technologies, as the production indexes of samples are increasing day by day, the requirements for the detection accuracy of samples are also increasing, which makes the tester need to repeatedly adjust the position of the sample, resulting in inconvenient detection of the film thickness of the sample and increasing the work intensity of the tester. Summary of the Invention

[0008] In order to facilitate the detection of samples and reduce the work intensity of the tester, the present application provides a mechanism for measuring the film thickness of an opaque substrate sample.

[0009] The mechanism for measuring the film thickness of an opaque substrate sample provided by the present application adopts the following technical solutions:

[0010] A mechanism for measuring the film thickness of an opaque substrate sample, comprising an equipment rack, a sample stage, a linear drive, and a rotary drive. The equipment rack is equipped with a detection head and a projection module;

[0011] The sample stage is installed on the equipment rack. The linear drive is used to drive the sample stage to move in a linear direction, and the rotary drive is used to drive the sample stage to rotate.

[0012] By adopting the above technical solution, after the tester places the sample on the sample stage, the linear drive and the rotary drive move according to the set parameters, so that the detection head can be aligned with different positions of the sample, and then different positions of the sample can be detected, which is convenient for detecting the sample, reduces the work intensity of the tester, and reduces the situation where the tester needs to frequently change the angle and position of the sample.

[0013] Optionally, the type of the linear drive is a linear module.

[0014] By adopting the above technical solution, it is convenient to accurately control the displacement of the slide of the linear drive through the control terminal, so as to ensure the detection accuracy.

[0015] Optionally, the type of the rotary drive is a servo motor.

[0016] By adopting the above technical solution, it is convenient to accurately control the rotation angle of the slide of the rotary drive through the control terminal, so as to ensure the detection accuracy.

[0017] Optionally, the rotary drive drives the sample stage to rotate through a synchronous belt.

[0018] By adopting the above technical solution, it is convenient to install the rotary drive at an appropriate position according to needs, thereby reducing the assembly difficulty of the mechanism for measuring the film thickness of an opaque substrate sample.

[0019] Optionally, the mechanism for measuring the film thickness of an opaque substrate sample further includes a mounting plate, and the mounting plate is movably fitted with a tensioning member, and the tensioning member is tightly fitted to the synchronous belt.

[0020] By adopting the above technical solution, adjusting the position of the tensioning member adjusts the tightness of the synchronous belt, so that the sample stage rotates to the accurate position under the action of the rotary drive.

[0021] Optionally, the tensioning member includes a sliding seat and a tensioning wheel. The sliding seat is slidably fitted to the mounting plate, the tensioning wheel is rotatably fitted to the sliding seat, and the tensioning wheel is tightly pressed against the synchronous belt.

[0022] By adopting the above technical solution, the tensioning wheel is tightly pressed against the synchronous belt, reducing the friction between the synchronous belt and the tensioning member, so that both the tensioning member and the synchronous belt are not easily worn.

[0023] Optionally, the sample stage includes a rotating ring and a support member, and the support member is provided with negative pressure adsorption holes.

[0024] By adopting the above technical solution, the sample is adsorbed and fixed by the negative pressure at the location of the negative pressure adsorption holes, so that the sample is not easily shaken during the movement of the sample stage.

[0025] Optionally, an elastic washer is installed on the support member.

[0026] By adopting the above technical solution, the elastic washer prevents the sample from being scratched and defective due to collision with the support member.

[0027] In summary, the present application includes at least one of the following beneficial technical effects:

[0028] 1. After the tester places the sample on the sample stage, the linear driving member and the rotary driving member move according to the set parameters, so that the detection head can be aligned with different positions of the sample, and then different positions of the sample can be detected, thereby facilitating the detection of the sample, reducing the working intensity of the tester, and reducing the situation where the tester needs to frequently change the angle and position of the sample. Description of the Drawings

[0029] Figure 1 is the overall schematic diagram of the overall structure of the embodiment of the present application.

[0030] Figure 2 is the implementation schematic diagram of the overall structure of the embodiment of the present application.

[0031] Figure 3 is the first partial explosion schematic diagram of the overall structure of the embodiment of the present application.

[0032] Figure 4 is the second partial explosion schematic diagram of the overall structure of the embodiment of the present application.

[0033] Figure 5 is the distribution schematic diagram of the support members in the embodiment of the present application.

[0034] Figure 6 is the cross-sectional schematic diagram of the sample stage in the embodiment of the present application.

[0035] Figure 7 is the overall schematic diagram of the support member in the embodiment of the present application.

[0036] Figure 8 is the overall schematic diagram of the tensioning member in the embodiment of the present application.

[0037] Description of reference numerals: 1, equipment rack; 11, detection head; 12, projection module; 2, mounting plate; 3, sample stage; 301, negative pressure adsorption hole; 31, annular frame; 32, rotating ring; 33, support member; 331, elastic washer; 4, linear drive member; 5, rotary drive member; 51, synchronous pulley; 52, synchronous belt; 6, tensioning member; 601, keyway; 61, sliding seat; 62, tensioning pulley. Detailed implementation manners

[0038] The following further elaborates on this application Figure 1-8 in conjunction with the accompanying drawings.

[0039] An embodiment of this application discloses a mechanism for measuring the film thickness of an opaque substrate sample, and the mechanism for measuring the film thickness of an opaque substrate sample disclosed in the embodiment of this application is used for detecting wafers. Referring to Figure 1 and Figure 2 , the mechanism for measuring the film thickness of an opaque substrate sample includes an equipment rack 1, a mounting plate 2, a sample stage 3, a linear drive member 4, and a rotary drive member 5. The equipment rack 1 is fixedly installed with a detection head 11 and a projection module 12. The detection head 11 is located at the top of the sample stage 3, and the projection module 12 is located at the bottom of the detection head 11, and the projection module 12 and the detection head 11 are distributed along the vertical direction.

[0040] Referring to Figure 3 and Figure 4 , the type of the linear drive member 4 is a linear module. The linear drive member 4 is fixedly installed on the equipment rack 1. The linear drive member 4 is arranged in the horizontal direction, and the mounting plate 2 is fixedly installed on the top of the slide of the linear drive member 4.

[0041] Referring to Figure 5 and Figure 6 , the sample stage 3 includes an annular frame 31, a rotating ring 32, and a support member 33. The annular frame 31 is fixedly installed on the top of the mounting plate 2. The rotating ring 32 is sleeved on the annular frame 31 and is rotationally matched with the annular frame 31. There are three support members 33. The three support members 33 are circumferentially distributed around the axis of the annular frame 31, and the three support members 33 are all fixedly installed on the rotating ring 32, so that the sample stage 3 moves linearly together with the mounting plate 2. The support member 33 is provided with three negative pressure adsorption holes 301. The three negative pressure adsorption holes 301 are all connected to an external negative pressure generating device (not shown in the figure), so as to generate negative pressure at the position where the negative pressure adsorption hole 301 is located through the negative pressure generating device, thereby adsorbing and fixing the sample. In addition, three elastic washers 331 are fixedly installed on the top of the support member 33. The three elastic washers 331 are respectively wound around each negative pressure adsorption hole 301, so that the sample is not easily scratched and defective due to collision with the support member 33.

[0042] Referring to Figure 3 and Figure 4, the rotation driving member 5 is a servo motor, and the rotation driving member 5 is fixedly installed at the bottom of the mounting plate 2. A synchronous pulley 51 is coaxially and fixedly installed on the output shaft of the rotation driving member 5, and a synchronous belt 52 is wound between the synchronous pulley 51 and the rotating ring 32, so that the rotation driving member 5 can drive the rotating ring 32 of the sample stage 3 to rotate through the synchronous belt 52.

[0043] Referring to Figure 3 and Figure 8 , a tensioning member 6 is movably fitted to the mounting plate 2. The tensioning member 6 includes a sliding seat 61 and a tensioning pulley 62. The way of the movable fit between the sliding seat 61 and the mounting plate 2 can be: crank rotation fit, eccentric wheel rotation fit, sliding fit and / or adjustable disassembly fit. Specifically, in the embodiment of the present application, the sliding seat 61 is slidably fitted to the mounting plate 2 through a key slot 601 formed through itself. When it is necessary to adjust the position of the sliding seat 61, rotate the bolt passing through the key slot 601 to loosen the sliding seat 61 and then it can be adjusted. After the sliding seat 61 is adjusted to the required position, rotate the bolt passing through the key slot 601 to make the sliding seat 61 tightly fit against the mounting plate 2 to complete the locking, and the structure is simple and easy to use. The tensioning pulley 62 is rotatably fitted to the sliding seat 61, and the tensioning pulley 62 is tightly fitted against one side of the synchronous belt 52, so as to adjust the tightness of the synchronous belt 52, so that the sample stage 3 can rotate to the accurate position under the action of the rotation driving member 5.

[0044] The implementation principle of the mechanism for measuring the film thickness of an opaque substrate sample in the embodiment of the present application is as follows: After the tester places the sample on the sample stage 3, the linear driving member 4 moves the mounting plate 2 in a linear direction according to the set parameters, and the rotation driving member 5 rotates the mounting plate 2 according to the set parameters, so that the detection head 11 can be aligned with different positions of the sample, and then detect different positions of the sample, so as to facilitate the detection of the sample, reduce the working intensity of the tester, and reduce the situation that the tester needs to frequently change the angle and position of the sample.

[0045] The above are all the preferred embodiments of the present application. The protection scope of the present application is not limited by this. Therefore, all equivalent changes made according to the structure, shape and principle of the present application should be covered within the protection scope of the present application.

Claims

1. A mechanism for measuring the film thickness of an opaque substrate sample, characterized in that: It comprises an equipment frame (1), a sample stage (3), a linear drive member (4) and a rotary drive member (5), wherein the equipment frame (1) is equipped with a detection head (11) and a projection module (12); The sample stage (3) is installed on the equipment frame (1), the linear drive component (4) is used to drive the sample stage (3) to move along a linear direction, and the rotary drive component (5) is used to drive the sample stage (3) to rotate.

2. A mechanism for measuring film thickness of an opaque substrate sample according to claim 1, characterized in that: The type of the linear drive component (4) is a linear module.

3. The mechanism for measuring the film thickness of an opaque substrate sample according to claim 1, characterized in that: The type of the rotary drive member (5) is a servo motor.

4. The mechanism for measuring the film thickness of an opaque substrate sample according to claim 3, characterized in that: The rotating driving member (5) drives the sample stage (3) to rotate via a synchronous belt (52).

5. The mechanism for measuring the film thickness of an opaque substrate sample according to claim 4, characterized in that: The mechanism for measuring the film thickness of an opaque substrate sample further comprises a mounting plate (2), the mounting plate (2) being movably matched with a tensioning member (6), and the tensioning member (6) being closely matched with a synchronous belt (52).

6. The mechanism for measuring the film thickness of an opaque substrate sample according to claim 5, characterized in that: The tensioning member (6) comprises a sliding seat (61) and a tensioning wheel (62); the sliding seat (61) is slidingly matched with the mounting plate (2); the tensioning wheel (62) is rotationally matched with the sliding seat (61); and the tensioning wheel (62) is tightly matched with the synchronous belt (52).

7. The mechanism for measuring the film thickness of an opaque substrate sample according to claim 1, characterized in that: The sample stage (3) comprises a rotating ring (32) and a support member (33), and the support member (33) is provided with a negative pressure adsorption hole (301).

8. The mechanism for measuring the film thickness of an opaque substrate sample according to claim 7, characterized in that: The support member (33) is provided with an elastic washer (331).

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