Solvent annealing device

Abstract

The utility model provides a solvent annealing device which can uniformly provide solvent steam and carrier gas for a sample loaded in a processing chamber for solvent annealing and can also realize in-situ tracking test of solvent annealing treatment. The device is compact and flat in structure and easy to assemble and maintain. The processing chamber of the solvent annealing device comprises a chamber body and a chamber cover covering the chamber body, and the chamber body comprises a bottom plate used for carrying a sample; the grooves are formed in the two sides of the bottom plate in the long edge direction respectively and extend in the short edge direction of the bottom plate, one side face of each groove is coupled with the side of the bottom plate in the long edge direction so that the inner space of each groove can communicate with the space above the bottom plate, and the other side face of each groove is provided with an air vent; the flow guide component is coupled with the opening end of the groove and is used for guiding the gas entering the inner space of the groove through the air vent to the sample; and the side wall is matched with the other side surface of the groove and the cavity cover to surround the bottom plate and the groove so as to form the processing cavity.

Description

Technical Field

[0001] The present disclosure relates to a solvent annealing device, and particularly to a device for solvent annealing a high-χ block copolymer to achieve microphase separation and thus realize directed self-assembly. Background Art

[0002] High-χ block copolymers are a class of polymers that can form patterns with characteristic sizes below 10 nm through microphase separation. In particular, directed self-assembly based on high-χ block copolymers on a wafer is a highly promising patterning process. By achieving high-resolution patterning through molecular self-assembly, it can break through the diffraction limit of traditional lithography and find applications in advanced semiconductor lithography technology, well meeting the current requirements of integrated circuit manufacturing.

[0003] However, due to their relatively high glass transition temperature, such high-χ block copolymers require a solvent annealing process to achieve microphase separation patterning. During the solvent annealing process, solvent molecules diffuse into the block copolymer, reducing its glass transition temperature, thereby endowing the molecular chains with a certain degree of mobility. By means of a solvent vapor microenvironment at an appropriate temperature, the surface energy difference between polymer chains is reduced, enabling the molecular chains to rearrange and form a structure perpendicular to the substrate, presenting a nanoscale pattern on the wafer.

[0004] In addition, solvent annealing of specific block copolymers requires the use of solvents with different properties. Different solvents, as the annealing carriers for block copolymers, can make the high-χ block copolymer more easily reach an equilibrium state and help reduce the defect density in the self-assembled patterns on the wafer. It is also necessary to regulate and explore the temperature of solvent annealing, the flow rate of solvent vapor, and the reaction time, and combine with detection equipment such as a film thickness gauge to achieve in-situ tracking and observation of the swelling and dissolution of the block copolymer inside the sample during the solvent annealing process.

[0005] However, current solvent annealing devices cannot well match wafer-level block copolymer thin film samples and generally have many problems, such as low utilization rate and high consumption of solvent vapor, dead corners and local gas shortage in the solvent annealing device, lack of uniform gas flow distribution inside the device, inability to adjust the gas flow direction and speed, incompatibility between the film thickness gauge and the device, absence of a large viewing window monitoring port, and difficulty in cleaning and maintenance. These problems limit the development of the lithography process based on directed self-assembly of block copolymer thin films on a wafer. Therefore, there is an urgent need for a solvent annealing device that can improve its internal flow guiding system, enhance the absorption efficiency of the solvent by the block copolymer thin film sample on the wafer, and be compatible with a commonly used film thickness gauge to monitor the in-situ tracking and observation of the block copolymer thin film sample on the wafer. Summary of the Utility Model

[0006] Technical Problems to be Solved by the Present Utility Model

[0007] In view of the above, the present utility model aims to provide a solvent annealing device capable of annealing various (especially high-χ) block copolymer thin films on a wafer under solvent vapor with a simple and compact structure, enabling the solvent vapor to uniformly diffuse in the processing chamber and fully react with the block copolymer thin film sample on the wafer, achieving solvent annealing through precise temperature control, and being able to perform in-situ tracking observation on the sample.

[0008] Technical means for solving technical problems

[0009] To solve the above technical problems, according to some exemplary embodiments of the present disclosure, there is provided a solvent annealing device for performing solvent annealing on a sample loaded in a processing chamber. The processing chamber includes a chamber body and a chamber cover covering the chamber body. It is characterized in that the chamber body includes:

[0010] A bottom plate for placing the sample;

[0011] Grooves are respectively provided on both sides in the long side direction of the bottom plate and extend along the short side direction of the bottom plate. One side of the groove is coupled to the long side direction side of the bottom plate so that the internal space of the groove is communicated with the space above the bottom plate, and the other side of the groove is provided with a ventilation port;

[0012] A guiding member is coupled to the open end of the groove for guiding the gas entering the internal space of the groove through the ventilation port to the sample; and

[0013] Side walls cooperate with the other side of the groove and the chamber cover to surround the bottom plate and the groove to form the processing chamber.

[0014] In some embodiments, the cross-section of the groove in the short side direction of the bottom plate is V-shaped.

[0015] In some embodiments, the groove and the bottom plate are integrally formed.

[0016] In some embodiments, the guiding member is provided with a shower structure formed by a plurality of channels, and the guiding member covers the open end of the groove.

[0017] In some embodiments, the channels are uniformly arranged in the entire area of the guiding member.

[0018] In some embodiments, the size of the guiding member in the short side direction of the bottom plate is at least 10 times the size of the guiding member in the long side direction of the bottom plate.

[0019] In some embodiments, the guiding member is substantially flush with the surface of the bottom plate.

[0020] In some embodiments, the cavity cover is provided with an observation window, the size of the observation window is greater than or equal to the size of the sample, and the observation window is configured to provide an optical channel for obtaining the spectrum of the sample.

[0021] In some embodiments, the vent is communicated with a ventilation pipeline to convey gas to or discharge gas from the processing chamber.

[0022] In some embodiments, a heating device is provided below the bottom plate and / or below the groove.

[0023] In some embodiments, the heating device is in close contact with the bottom surface of the cavity.

[0024] In some embodiments, the distance from the bottom of the cavity cover to the upper surface of the bottom plate is less than or equal to 10 mm.

[0025] Utility model effect

[0026] According to the solvent annealing device of the present utility model, it can uniformly provide solvent vapor and carrier gas to the sample loaded in the processing chamber for solvent annealing, and has a compact and flattened structure, which is easy to assemble and maintain, and can also realize in-situ tracking and testing of the solvent annealing process. Description of the drawings

[0027] The drawings are used to provide a further understanding of the present disclosure, and constitute a part of the specification. They are used together with the embodiments of the present disclosure to explain the present disclosure, and do not constitute a limitation to the present disclosure. In the drawings:

[0028] Figure 1 is an external view of the solvent annealing device of the present utility model.

[0029] Figure 2 is an overall exploded view of the solvent annealing device of the present utility model.

[0030] Figure 3 is a vertical sectional view of the solvent annealing device of the present utility model.

[0031] Figure 4 is a schematic diagram of the groove inside the processing chamber of the solvent annealing device of the present utility model.

[0032] Figure 5 is a schematic structural diagram of the flow guiding member inside the processing chamber of the solvent annealing device of the present utility model.

[0033] Figure 6 is a schematic diagram of the combination of the solvent annealing device of the present utility model and a film thickness meter. Detailed implementation manners

[0034] Specific embodiments of the present disclosure will be described below. It should be noted that in the specific description of these embodiments, for the sake of concise description, the present specification may not describe all features of the actual embodiments in detail. It should be understood that in the actual implementation of any embodiment, just as in the process of any engineering project or design project, in order to achieve the specific goals of the developer and to meet system-related or business-related restrictions, various specific decisions are often made, and these may vary from one embodiment to another. In addition, it should also be understood that although the efforts made in such a development process may be complex and lengthy, for those of ordinary skill in the art related to the content disclosed in the present disclosure, some design, manufacturing, or production changes based on the technical content disclosed in the present disclosure are only conventional technical means and should not be construed as insufficient content of the present disclosure.

[0035] Unless otherwise defined, technical terms or scientific terms used in the claims and the specification shall have the ordinary meanings understood by those of ordinary skill in the technical field to which the present disclosure pertains. The terms "first", "second", and similar terms used in the specification and claims of the present patent application do not denote any order, quantity, or importance, but are only used to distinguish different components. The terms "a" or "an" and the like do not denote a quantity limitation, but rather denote the presence of at least one. The terms "comprising" or "including" and the like are intended to mean that the elements or items appearing before "comprising" or "including" cover the elements or items listed after "comprising" or "including" and their equivalent elements, and do not exclude other elements or items. The terms "connected", "coupled", or "linked" and the like are not limited to physical or mechanical connections, nor are they limited to direct or indirect connections.

[0036] In the present disclosure, if not otherwise specified, all the embodiments and preferred embodiments mentioned herein can be combined with each other to form new technical solutions. In the present disclosure, if not otherwise specified, all the technical features and preferred features mentioned herein can be combined with each other to form new technical solutions.

[0037] In the description of the embodiments of the present disclosure, the term "and / or" is only a description of the association relationship of the associated objects, indicating that three relationships may exist. For example, A and / or B may represent: A exists alone, A and B exist simultaneously, and B exists alone. In addition, the character " / " in this article generally represents an "or" relationship between the associated objects before and after.

[0038] The solvent annealing device provided according to the embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings.

[0039] Figure 1 The figure shows an external view of a solvent annealing apparatus 100 of the present utility model. The basic structure of the solvent annealing apparatus 100 generally includes a cavity 1, a cavity cover 2, a heating device 3, and a ventilation pipeline 4.

[0040] In the figure, the direction parallel to the long side direction of the cavity 1 (or the cavity cover 2) is set as the X direction, the direction parallel to the short side direction of the cavity 1 (or the cavity cover 2) is set as the Y direction, and the direction orthogonal to the X direction and the Y direction is set as the Z direction.

[0041] The internal space surrounded by the cavity 1 and the cavity cover 2 constitutes the processing chamber of the solvent annealing apparatus 100 of the present utility model, and a sample (not shown) is loaded in this processing chamber. The heating device 3 is arranged below the cavity 1 (i.e., below the Z direction), and can be closely attached to the cavity 1, and is used for heating the sample loaded in the cavity 1 to perform solvent annealing treatment. The ventilation pipeline 4 is respectively arranged on the side walls at both ends of the cavity 1 in the X direction, and is used for transporting or discharging gases such as solvent vapor and carrier gas to or from the processing chamber. In addition, the connection between the ventilation pipeline 4 and the cavity 1 can be realized through an adapter to transfer the gas path and pumps, etc.

[0042] As Figure 1 shown, the solvent annealing apparatus 100 of the present utility model may further include an observation window 20 on the cavity cover 2 for observing the annealing process of the internal sample, providing an optical channel for obtaining the spectrum of the sample, and the observation window 20 can be opened and closed to facilitate the loading and unloading of the sample. Details of the observation window 20 will be further described later.

[0043] Figure 2 is an overall exploded view of the solvent annealing apparatus 100 of the present utility model.

[0044] Figure 2 In it, reference numerals 20 to 29 are components after the cavity cover 2 is disassembled. Among them, the observation window 20 is formed of quartz glass resistant to high temperature and high pressure (for example, with a diameter of 250 mm and a thickness of 5 mm), and is clamped from above and below by an upper flange ring 21 and a lower flange ring 23 with a gasket (for example, a perfluoroether rubber gasket with a maximum outer diameter of 245 mm and a wire diameter of 3.5 mm) 22 in between, and is fixed by screws 24 ( Figure 2The two flange rings 21 and 23 are clamped together to fix the observation window 20 and seal it. The observation window unit composed of the observation window 20, the upper flange ring 21, the gasket 22, the lower flange ring 23, and the screw 24 can be installed with a cavity cover handle 25 at one end, and the other end can be connected to the lower hinge 26B fixed to the cavity 1 via the upper hinge 26A, wherein the upper hinge 26A is connected to the lower hinge 26B through the rotating shaft 26C, and the lower hinge 26B fixed to the cavity 1 via the joint plate 26D is provided with, for example, a 120-degree opening and closing baffle to maintain the opening state of the cavity cover 2, so as to prevent the cavity cover 2 from turning over excessively, and to facilitate the insertion or removal of the sample. In addition, the cavity cover handle 25 is designed as an extended handle to prevent burns to personnel during the opening and closing of the cavity cover, and thermosetting plastic can be coated on the outside of the cavity cover handle to further prevent burns to personnel.

[0045] The observation window unit is fixed to the chamber cover bottom plate 28 via a gasket 27, and a hole corresponding to the size of the quartz glass of the observation window 20 is formed in the center of the chamber cover bottom plate 28. A negative pressure gauge 29 can also be installed on the chamber cover bottom plate 28 to measure the pressure in the chamber 1 or perform a leak test.

[0046] Thus, the chamber cover bottom plate 28 with the observation window 20 fixed thereon constitutes the chamber cover 2 of the solvent annealing device 100. Through the chamber cover 2 provided with the observation window 20, the changes in the morphology, color, etc. of the sample in the chamber can be observed during the solvent annealing process, and in-situ tracking tests can also be performed with devices such as a film thickness meter or a spectrometer, which will be described in detail later.

[0047] The exterior of the cavity 1 presents an inverted trapezoidal structure (such as Figure 1 As shown), a trapezoidal space is formed inside, including a bottom plate 11, a groove 12, a side wall 13 and a flow guide member 14. These components and the space surrounded by the chamber cover 2 covering the chamber body 1 constitute a processing chamber for performing solvent annealing treatment on the sample.

[0048] The bottom plate 11 is made of a flat plate, protruding upward (upward in the Z direction) relative to the middle of the cavity, and its upper surface is a loading surface for loading samples. The length and width of the bottom plate 11 are set to be greater than 300 mm, for example, so that it can be used for 8-inch wafer samples and has the scalability for 12-inch wafer samples.

[0049] The grooves 12 are arranged at both ends of the long side direction of the bottom plate 11, that is, at both ends of the X direction, that is, a groove 12 is arranged on the left and right sides of the bottom plate 11. Figure 2The cross-section in the Y direction thereof is V-shaped and can be formed by bending a plate into a V shape. The groove 12 has two side walls 12A and 12B, one of the side walls 12A being an inclined surface that is connected to one end of the long side direction of the bottom plate 11, such that the internal space of the groove 12 communicates with the space above the bottom plate 11, and the other side wall 12B constitutes the side wall of the cavity 1 in the X direction. An air vent 40 is provided on the side wall 12B and is connected to the gas pipeline 4 by welding or the like, and can supply solvent vapor and / or carrier gas to the processing chamber of the solvent annealing device 100, so as to perform solvent annealing treatment on the sample. In the present utility model, the depth of the V-shaped groove 12, i.e., the height of the side wall 12B, should be greater than the pipe diameter of the gas pipeline.

[0050] The bottom plate 11 and the two grooves 12 can form the bottom of the cavity 1 by welding. Of course, the bottom plate 11 and the grooves 12 can also be integrally formed, for example, formed from a single plate through stamping and bending processes.

[0051] The side walls 13 are provided on both sides of the short side direction of the bottom plate 11, i.e., in the Y direction, and together with the side walls 12B of the grooves 12, surround the bottom plate 11 to form the internal space of the cavity 1. The distance from the bottom plate 11 to the tops (upper ends in the Z direction) of these side walls 13 and side walls 12B is set to be, for example, 10 mm or less, which is sufficient to accommodate, for example, a high χ-block copolymer thin film sample, and can also ensure the compactness of the overall structure of the cavity, save the usage of organic solvent vapor and carrier gas used during the solvent annealing treatment, and can maintain the solvent annealing for a long reaction time without worrying about the excessive consumption of organic solvents. At the same time, the small cavity volume can also enable rapid evacuation and filling of gas, saving the sample introduction and sampling time.

[0052] In the cavity 1 having the bottom plate 11, the grooves 12, and the side walls 13, the gas fed through the gas pipeline 4 and the air vent 40 is first buffered or mixed in the V-shaped internal space of the groove 12, and then gradually diffuses along the side wall 12A of the groove 12 to the sample carried on the bottom plate 11. In order to enable the gas to uniformly diffuse and fully react with the sample, the present utility model further provides a flow guiding member 14 in the cavity 1.

[0053] The flow guiding member 14 is arranged to cover the opening of the V-shaped groove 12, for example, it is composed of a plate material uniformly or periodically formed with a plurality of flow guiding channels (such as a shower structure). The flow guiding member 14 is symmetrically arranged on the left and right sides of the bottom plate 11 and is substantially flush with the bottom plate 11, that is, the flow guiding member 14 is substantially flush with the sample arranged on the bottom plate 11. Therefore, it can guide the gas in the internal space of the V-shaped groove 12 to flow through the flow guiding holes on the flow guiding member 14 along the inclined surface 12A of the groove 12 to the sample on the bottom plate 11, so that the gas diffuses uniformly in the space in the cavity 1, that is, the space between the bottom plate 11 and the cavity cover 2, ensuring the uniform diffusion of the gas and its sufficient reaction with the sample. The specific structure of the flow guiding member 14 will be further described later.

[0054] The heating device 3 is arranged in a trapezoidal structure matching the inverted trapezoidal cavity 1. As Figure 2 shown, the heating device 3 can be arranged in close contact with the lower surfaces of both the bottom plate 11 and the side surface 12A of the groove 12. Electric heating wires, thermocouples, etc. can be arranged inside the heating device 3, and the sample placed on the bottom plate 11 can be heated symmetrically and uniformly.

[0055] Figure 3 is a vertical sectional view of the solvent annealing device 100 of the present utility model. For the sake of simplifying the description, Figure 3 only some components are shown, and the illustrations of other components are omitted.

[0056] As Figure 3 shown, the solvent annealing device 100 is composed of a cavity cover 2, a cavity 1 having a bottom plate 11 and a groove 12, a heating device 3, and a ventilation pipeline 4. The upper part of the cavity 1 is covered by the cavity cover 2. Only a short distance between the observation window 20 of the cavity cover 2 and the bottom plate 11 is required to ensure the solvent annealing treatment of the sample, which not only improves the utilization efficiency of the solvent vapor in the treatment chamber but also promotes the uniform distribution of the solvent vapor. The cavity 1 is composed of a bottom plate 11 and a V-shaped groove 12 with one end of the inclined surface connected to the bottom plate 11, and a flow guiding member 14 is covered at the opening of the groove 12. The solvent vapor, carrier gas, etc. entering the cavity 1 from the ventilation pipeline 4 are first mixed and buffered in the V-shaped space inside the groove 12, and then under the guiding action of the flow guiding member 14 with a plurality of flow guiding channels, they diffuse along the inclined surface of the groove 12 to the sample loaded on the bottom plate 11, so that the direction of the air flow can be controlled to ensure the uniformity of the air flow. In addition, by changing the distribution, shape, size, etc. of the flow guiding holes on the flow guiding member 14, the speed of the air flow can also be controlled.

[0057] The inverted trapezoidal cavity 1 is matched with the trapezoidal heating device 3, making the overall structure of the cavity more compact, which is beneficial to the miniaturization of the entire device. The heating device 3 is provided with multiple groups of heating wires 31 (the illustrations of thermocouples, temperature controllers, etc. are omitted). These heating wires 31 can extend along the short side direction of the bottom plate, i.e., the Y direction, and are arranged side by side at equal intervals at the position of the trapezoidal top of the heating device 3 opposite to the bottom plate 11, so as to uniformly heat the bottom plate 11 and the sample placed thereon. In addition, the heating wires 31 can also be arranged opposite to the inclined surface 12A of the groove 12, that is, along the trapezoidal inclined surface of the heating device 3, to heat the internal space of the groove 12, so that the solvent vapor and carrier gas entering the processing chamber can be mixed and buffered at a certain temperature inside the groove 12 before diffusing onto the sample, making the temperature and distribution of the gas diffusing onto the sample via the guiding member 14 more uniform later. By setting the heating device 3 in this way, precise temperature control can be achieved within the solvent annealing temperature range of the sample, for example, 50°C to 250°C.

[0058] Next, the specific structure of the groove 12 in the cavity 1 will be described. Figure 4 It is a schematic diagram of two V-shaped grooves 12 inside the cavity 1.

[0059] As Figure 4 shown, the side surface 12A of the groove 12 located on the right side of the bottom plate 11 slopes downward from the right end of the bottom plate 11 relative to the X direction at an inclination angle α. Similarly, the side surface 12A of the groove 12 located on the left side of the bottom plate 11 also slopes downward from the left end of the bottom plate 11 relative to the X direction at an inclination angle α. The inclination angle α can be a value within the range of 0 to 90°, as long as the gas in the groove 12 can smoothly climb along the side surface 12A to the bottom plate 11. If the inclination angle α = 0°, the groove 12 disappears, and the gas flow such as the solvent vapor and carrier gas entering the cavity 1 from the gas pipeline 4 blows directly onto the sample, which will cause the absorption effect of the block copolymer thin film sample on the solvent to deteriorate and result in waste of the solvent. If the inclination angle α = 90°, the cross-section of the groove 12 is, for example, rectangular, and the gas flow sent from the gas pipeline 4 directly impacts the side surface 12A of the groove 12, and it is difficult for the gas flow to climb along the vertical side surface 12A, which will also lead to a decrease in the utilization rate of the solvent and uneven gas flow diffusion. Therefore, in the present utility model, the inclination angle of the side surface 12A of the groove 12 connected to the bottom plate 11 is set within the range of 0 to 90°, and can be set accordingly according to the type of solvent, requirements of the annealing treatment, gas flow rate, etc., and is preferably below 45°.

[0060] Figure 5 It is a schematic diagram of the structure of the guiding member 14 inside the processing chamber of the solvent annealing device 100 of the present utility model. Only some components are shown in this figure, and the illustrations of other components are omitted.

[0061] As Figure 5As shown, the flow guiding member 14 is arranged to cover the open end of the V-shaped groove 12 and is substantially flush with the plane of the bottom plate 11. The flow guiding member 14 can be formed by densely punching holes in a plate to form a shower structure having a plurality of uniformly distributed channels (such as round holes with a diameter of 4 mm). Let the length of the shower structure of the flow guiding member 14 in the long side direction of the bottom plate 11, i.e., the X direction, be L, and the width in the short side direction of the bottom plate 11, i.e., the Y direction, be W. Then, the aspect ratio W / L of the shower structure is set to W / L≥10. That is, the flow guiding member 14 adopts a wide-body shower structure with a width at least 10 times the length. In addition, since the plate of the flow guiding member 14 is coupled to the open end of the groove 12, the airflow entering the V-shaped groove 12 via the ventilation pipe 4 can uniformly flow along the side surface 12A (ramp) of the groove 12 through the channels in the shower structure of the flow guiding member 14 to the bottom plate 11 and the sample mounted thereon.

[0062] The flow guiding channels provided on the flow guiding member 14 are not limited to Figure 5 the structure of the densely arranged round holes shown, and can also adopt, for example, a grid-shaped channel, or multiple parallel grooves, etc., as long as it can guide the airflow inside the V-shaped groove 12 at its open end and make it uniformly diffuse to the sample.

[0063] The solvent annealing device 100 of the present utility model forms an inverted trapezoidal cavity 1 by using the bottom plate 11 and the groove 12, and uses the inclined surface 12A of the groove 12 and the flow guiding member 14 coupled to the open end of the groove 12 to guide the airflow composed of the solvent vapor and the carrier gas in the internal space of the groove 12 to uniformly diffuse in multiple directions along the inclined surface 12A through the shower hole structure on the flow guiding member 14 to the sample placed on the bottom plate 11. The space inside the groove 12 can enable the solvent vapor and the carrier gas to first gather and form a certain buffer, avoiding the direct blowing of the airflow on the sample, thereby causing the absorption effect of the sample film on the solvent to deteriorate. The heating components arranged directly below the bottom plate 11 and / or directly below the inclined surface 12A of the groove 12 facilitate annealing of the sample and / or preheating of the solvent vapor / carrier gas in the groove 12, thereby improving the absorption efficiency of the sample film on the solvent.

[0064] In addition, the cavity cover 2 of the solvent annealing device 100 can be opened and closed by a hinge, thereby increasing the operation convenience of sample injection and sampling. The transparent large viewing window formed by sealing and fixing quartz glass through a flange ring increases the visualization of the solvent annealing of the sample film, and can be paired with a film thickness meter or other spectroscopic equipment to intuitively measure the microscopic thickness changes, etc. of the block copolymer film on the wafer as the sample during the solvent annealing process.

[0065] Figure 6It is a schematic diagram of the solvent annealing device 100 of the present utility model in combination with a film thickness meter. Since the solvent annealing device 100 has a transparent observation window 20, which provides an optical channel for obtaining the sample spectrum, therefore, by arranging the film thickness meter on the upper part of the observation window 20 so that the measurement range of the film thickness meter covers the visible area of the observation window 20, the microscopic film thickness change of the sample during the solvent annealing treatment in the solvent annealing device 100 can be measured. Of course, other spectral devices can also be set to replace Figure 6 the film thickness meter in

[0066] In other embodiments, the components included in the cavity cover 2 (except the observation window 20) and the cavity body 1 of the solvent annealing device 100 can be formed of 316L stainless steel material. The components made of stainless steel material can ensure the overall sealing performance of the solvent annealing device 100 through welding and assembly, so that the whole device can maintain a vacuum state.

[0067] In other embodiments, the solvent vapor entering the processing chamber of the solvent annealing device 100 through the gas pipeline 4 can be one or more of methanol, acetone, carbon disulfide, tetrahydrofuran, chlorobenzene, benzene, dichloromethane, water, ethanol, chloroform, tetrachloroethane, N, N-dimethylacetamide, N, N-dimethylformamide, ether, ethylene glycol, isopropanol, n-heptane, petroleum ether, n-hexane, dioxane, carbon tetrachloride, acetonitrile, phenyl ether, xylene, pyridine and triethylamine.

[0068] In other embodiments, the carrier gas entering the processing chamber of the solvent annealing device 100 through the gas pipeline 4 can be an inert gas such as argon.

[0069] In other embodiments, the heating device 3 arranged below the cavity body 1 is not limited to the trapezoidal structure matching the inverted trapezoidal cavity body 1. As long as the internal heating components can uniformly heat the bottom plate 11 or the sample, the heating device 3 can also adopt any other shape. For example, a plurality of heating rods can also be directly attached below the bottom plate 11 for heating.

[0070] The solvent annealing device according to the present utility model is not only applicable to 8-inch wafer samples, but also has the scalability for 12-inch wafers. Moreover, the internal space is compact, which can save the consumption of organic solvent vapor and carrier gas, and can maintain the solvent annealing for a long reaction time without worrying about the too fast consumption of organic solvents. At the same time, the small cavity volume enables rapid evacuation and inflation, saving the sample injection and sampling time. The solvent annealing device of the present utility model is small in size and overall flattened. The chamber and the heating and temperature control components are structurally coupled. The heating and temperature control components and the flange ring-sealed transparent window chamber cover are both detachable connection structures, having the advantages of convenient assembly and disassembly, flexible use, easy maintenance during later cleaning, etc. A film thickness meter or other spectral equipment is configured on the transparent window for in-situ testing, and the film thickness, microscopic morphology or structure of the block copolymer film on the wafer can be adjusted during the solvent annealing process at different annealing temperatures and with different organic solvents.

[0071] It should be understood that the above description is illustrative and not restrictive. For example, the above embodiments (and / or aspects thereof) can be used in combination with each other. In addition, many modifications can be made without departing from the scope of the present disclosure to adapt a particular situation or material to the teachings of various embodiments of the present disclosure. Although the size and type of the materials described herein are used to define the parameters of various embodiments of the present disclosure, each embodiment is not meant to be restrictive, but rather an exemplary embodiment. Many other embodiments will be apparent to those skilled in the art upon reading the above description. Therefore, the scope of each embodiment of the present disclosure should be determined with reference to the appended claims and the full scope of the equivalent forms claimed thereby.

Claims

1. A solvent annealing device, used for performing solvent annealing on a sample loaded in a processing chamber, wherein the processing chamber comprises a chamber body and a chamber cover covering the chamber body, characterized in that: The cavity comprises: A bottom plate, used for placing the sample; Grooves are respectively arranged on both sides of the long side direction of the bottom plate and extend along the short side direction of the bottom plate, one side of the groove is coupled with the long side direction side of the bottom plate so that the inner space of the groove is connected with the upper space of the bottom plate, and the other side of the groove is provided with a vent; a flow guide member coupled to the open end of the groove and configured to guide the gas entering the inner space of the groove through the vent to the sample; and The side wall cooperates with the other side of the groove and the chamber cover to surround the bottom plate and the groove to form the processing chamber.

2. The solvent annealing device according to claim 1, characterized in that The cross section of the groove in the short side direction of the bottom plate is V-shaped.

3. The solvent annealing device according to claim 1 or 2, characterized in that: The groove is formed integrally with the bottom plate.

4. The solvent annealing device according to claim 1 or 2, characterized in that: The flow guiding component is provided with a shower structure formed by a plurality of channels, and the flow guiding component covers the open end of the groove.

5. The solvent annealing device according to claim 4, characterized in that: The holes are evenly distributed over the entire area of ​​the flow guiding member.

6. The solvent annealing device according to claim 5, characterized in that: A dimension of the air guide member in a short side direction of the bottom plate is at least 10 times a dimension of the air guide member in a long side direction of the bottom plate.

7. The solvent annealing device according to claim 5 or 6, characterized in that: The flow guiding member is substantially flush with a surface of the bottom plate.

8. The solvent annealing device according to claim 1 or 2, characterized in that: The cavity cover is provided with an observation window, the size of which is greater than or equal to the size of the sample, and the observation window is configured to provide an optical channel for acquiring the spectrum of the sample.

9. The solvent annealing device according to claim 1 or 2, characterized in that: The vent is in communication with a vent line to deliver gas to or exhaust gas from the processing chamber.

10. The solvent annealing device according to claim 1 or 2, characterized in that: A heating device is provided below the bottom plate and / or below the groove.

11. The solvent annealing device according to claim 10, characterized in that: The heating device is tightly fitted to the bottom surface of the cavity.

12. The solvent annealing device according to claim 1 or 2, characterized in that: The distance from the bottom of the cavity cover to the upper surface of the bottom plate is less than or equal to 10 mm.

Images