Plasma generating device and electrical equipment

Abstract

The utility model discloses a plasma generating device and electrical equipment, and relates to the plasma technology field, the plasma generating device comprises a dielectric medium structure, a first electrode and a second electrode, the dielectric medium structure wraps the second electrode, a part of the dielectric medium structure is arranged to be a plane dielectric layer, and the first electrode wraps the second electrode. The first electrode is arranged on the side, away from the second electrode, of the plane dielectric layer. According to the technical scheme, the plasma generating device can be prevented from being too large in size under the condition that the plasma generating device is safely used.

Description

Technical Field

[0001] The utility model relates to the technical field of plasma, in particular to a plasma generating device and electrical equipment. Background Art

[0002] Plasma sterilization and purification uses the energy and active components generated by discharge between two electrodes to kill VOCs (volatile organic compounds) and viruses and bacteria in the air, generating water and carbon dioxide, which has advantages over other air purification technologies.

[0003] In the related art, in order to improve the safety of use, it is necessary to increase the distance between the two electrodes, which easily leads to the plasma generating device being too large and difficult to use in a small space. Utility Model Content

[0004] The main purpose of the utility model is to provide a plasma generating device and an electrical appliance, aiming to avoid the plasma generating device being too large in size under the condition of safe use of the plasma generating device.

[0005] To achieve the above-mentioned purpose, the utility model proposes a plasma generating device, which includes a dielectric structure, a first electrode and a second electrode, wherein the dielectric structure covers the second electrode, a portion of the dielectric structure is configured as a planar dielectric layer, and the first electrode is disposed on a side of the planar dielectric layer away from the second electrode.

[0006] The present application also provides a plasma generating device, the plasma generating device comprising a dielectric structure, a first electrode and a second electrode, at least a portion of the dielectric structure is located between the first electrode and the second electrode, the first electrode and the second electrode overlap at the orthographic projection portion of the dielectric structure, and the maximum circumscribed circle diameter of the overlapped area is L;

[0007] A first creepage distance D is defined between the first electrode and the second electrode. min and the second creepage distance D max , the radius R of the maximum inscribed circle when the dielectric structure is spread into a planar structure satisfies (D min +L) / 2≤R≤(D max +L) / 2.

[0008] In one embodiment, the second creepage distance D between the first electrode and the second electrode max ≥3D min .

[0009] In one embodiment, the dielectric structure is a planar dielectric structure;

[0010] Or, the dielectric structure covers the second electrode, and at least a part of the surface of the second electrode facing away from the first electrode is exposed outside the dielectric structure.

[0011] In one embodiment, at least one of the first electrode and the second electrode is disposed on the surface of a part of the dielectric structure between the first electrode and the second electrode;

[0012] And / or, at least one of the first electrode and the second electrode is spaced apart from a part of the dielectric structure between the first electrode and the second electrode.

[0013] In one embodiment, the distance between the first electrode and the second electrode is H, and the thickness of a part of the dielectric structure between the first electrode and the second electrode is d, satisfying 0 ≤ H - d ≤ 5 mm;

[0014] And / or, the thickness d of a part of the dielectric structure between the first electrode and the second electrode is d ≤ 2 mm.

[0015] In one embodiment, at least a part of the first electrode disposed opposite to the dielectric structure is a sheet-like electrode structure;

[0016] Or, the first electrode is a conductive film;

[0017] Or, the first electrode is a conductive coating disposed on the surface of the dielectric structure;

[0018] Or, the plasma generating device further includes a first carrier disposed opposite to the dielectric structure, and the first electrode is a conductive coating disposed on the surface of the first carrier;

[0019] Or, the first electrode is a wire.

[0020] In one embodiment, at least a part of the second electrode disposed opposite to the dielectric structure is a sheet-like electrode structure;

[0021] Or, at least a part of the second electrode disposed opposite to the dielectric structure is a conductive film;

[0022] Or, at least a part of the second electrode is a conductive coating disposed on the surface of the dielectric structure;

[0023] Or, the plasma generating device further includes a second carrier disposed opposite to the dielectric structure, and at least a part of the second electrode is a conductive coating disposed on the surface of the second carrier.

[0024] In one embodiment, the dielectric structure includes an insulating sheet;

[0025] and / or, the dielectric structure at least includes an insulating coating layer;

[0026] and / or, the material of the dielectric structure is at least one of ceramics, quartz, and polytetrafluoroethylene.

[0027] In one embodiment, at least part of the first electrode is arranged as a first extension section, and the first extension section is arranged on the surface of the dielectric structure or is arranged parallel to the dielectric structure at an interval.

[0028] In one embodiment, the plasma generating device further includes a housing, an accommodation space is formed in the housing, and at least one outlet communicating with the accommodation space is provided;

[0029] The dielectric structure, at least part of the first electrode, and at least part of the second electrode are arranged in the accommodation space, and the first extension section extends towards one of the outlets.

[0030] In one embodiment, one of the outlets is arranged opposite to the surface of the dielectric structure, and the end of the first extension section is exposed at the outlet.

[0031] In one embodiment, the housing is further provided with a diversion structure, the diversion structure extends from the edge of the outlet towards the outside of the housing, and the end of the first extension section faces the diversion structure.

[0032] In one embodiment, a first installation groove is arranged on the inner surface of the housing, and at least part of the first extension section is arranged in the first installation groove;

[0033] and / or, a first limiting groove is arranged on the inner surface of the housing, a first limiting section protrudes from the side of the first extension section, and the first limiting section is arranged in the first limiting groove;

[0034] and / or, part of the first electrode extends to the outside of the housing to form a first power connection section.

[0035] This application also provides a plasma generating device, which includes a dielectric structure, a first electrode, and a second electrode. At least part of the dielectric structure is arranged as a planar dielectric layer, and the first electrode and the second electrode are respectively arranged on both sides of the planar dielectric layer;

[0036] The distance between the first electrode and the second electrode in the thickness direction of the planar dielectric layer is H, and the thickness of the planar dielectric layer is d, satisfying 0≤H - d≤5mm.

[0037] In one embodiment, the thickness d of the planar dielectric layer ≤2mm.

[0038] The present application also provides an electrical device, which is provided with the plasma generating device as described in any of the foregoing embodiments.

[0039] In the technical solution of the present utility model, the first electrode and the second electrode are separated by a dielectric structure. Among them, the dielectric structure can completely cover the second electrode to insulate between the first electrode and the second electrode. At this time, the creepage distance between the two electrodes is infinite, and there will be no creepage problem. Then, the dielectric structure can be set according to the size of the second electrode, without setting a too large dielectric structure, so as to control the volume of the plasma generating device, avoid the plasma generating device from being too large in volume, and is beneficial to the use of the plasma generating device in a small space.

[0040] In addition, a part of the conductive surfaces of both the first electrode and the second electrode can be exposed to the outside. For example, the dielectric structure can be set as a planar dielectric structure located between the first electrode and the second electrode, or the dielectric structure can form a covering structure with an opening for covering the second electrode; the first creepage distance D between the first electrode and the second electrode can be determined according to the operating voltage range of the plasma generating device. min and the second creepage distance D max , the first creepage distance is set according to the usage requirements of the plasma generating device under the first working condition, and can be the minimum creepage distance that limits no creepage phenomenon between the first electrode and the second electrode under the first working condition; the second creepage distance is set according to the usage requirements of the plasma generating device under the second working condition, and can be the minimum creepage distance that limits no creepage phenomenon between the first electrode and the second electrode under the second working condition; the first working condition and the second working condition are different usage environments of the plasma generating device, and the first working condition and the second working condition can be differences in temperature, air pressure, humidity, dust concentration, and environmental pollution level, etc. It is defined that the radius R of the largest inscribed circle when the dielectric structure is spread into a planar structure satisfies (D min +L) / 2≤R≤(D max +L) / 2, which can not only obtain stable and stronger-energy plasma under the condition of ensuring the usage safety of the plasma generating device, but also avoid the dielectric structure size and the plasma generating device from being too large in volume, and is beneficial to the use of the plasma generating device in a small space. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] In order to more clearly illustrate the technical solutions in the embodiments of the present utility model or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the following drawings are only some embodiments of the present utility model. For those of ordinary skill in the art, other drawings can be obtained based on the structures shown in these drawings without creative efforts.

[0042] Figure 1 Structural diagram of the first embodiment of the plasma generating device provided by this application;

[0043] Figure 2 Structural diagram of the second embodiment of the plasma generating device provided by this application;

[0044] Figure 3 Structural diagram of the third embodiment of the plasma generating device provided by this application;

[0045] Figure 4 Schematic diagram of an embodiment of the dielectric structure spread into a planar structure in the plasma generating device provided by this application;

[0046] Figure 5 Structural diagram of the fourth embodiment of the plasma generating device provided by this application;

[0047] Figure 6 Structural diagram of the fifth embodiment of the plasma generating device provided by this application;

[0048] Figure 7 Structural diagram of the sixth embodiment of the plasma generating device provided by this application;

[0049] Figure 8 Structural diagram of the seventh embodiment of the plasma generating device provided by this application;

[0050] Figure 9 Structural diagram of the eighth embodiment of the plasma generating device provided by this application;

[0051] Figure 10 For Figure 9 Exploded view of the plasma generating device in

[0052] Figure 11 For Figure 10 Structural diagram of the first half shell in

[0053] Explanation of the reference numerals in the drawings:

[0054] 100, plasma generating device; 1, dielectric structure; 2, first electrode; 21, first extension section; 22, first power connection section; 23, first limiting section; 3, second electrode; 31, second extension section; 32, second power connection section; 33, second limiting section; 4, housing; 41, accommodating space; 42, outlet; 43, first half shell; 44, second half shell; 45, first installation groove; 46, second installation groove; 47, first limiting groove; 48, second limiting groove; 49, flow guiding structure.

[0055] The realization of the purpose, functional features and advantages of the utility model will be further explained in conjunction with embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION

[0056] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0057] Plasma sterilization and purification uses the energy and active components generated by discharge between two electrodes to kill VOCs (volatile organic compounds) and viruses and bacteria in the air, generating water and carbon dioxide, which has advantages over other air purification technologies.

[0058] In the related art, the generation of plasma requires the application of AC high voltage between two electrodes. As the applied voltage increases, in order to improve the safety of use, it is necessary to increase the air creepage distance between the two electrodes, which easily leads to the plasma generating device being too large and difficult to use in a small space.

[0059] In order to solve the above problems, the present application proposes a plasma generating device 100 .

[0060] Please refer to Figure 1 The present application also proposes a plasma generating device 100, which includes a dielectric structure 1, a first electrode 2 and a second electrode 3. The dielectric structure 1 covers the second electrode 3, a portion of the dielectric structure 1 is configured as a planar dielectric layer, and the first electrode 2 is configured on a side of the planar dielectric layer away from the second electrode 3.

[0061] The dielectric structure 1 can be made of ceramic, quartz or other insulating materials, can be a planar dielectric structure, or can form a covering space for covering at least part of the second electrode 3 or the first electrode 2. The first electrode 2 and the second electrode 3 are separated by the dielectric structure 1.

[0062] When the plasma generating device 100 is used, an AC voltage is input between the first electrode 2 and the second electrode 3, so that a dielectric barrier discharge is formed on the surface of the dielectric structure 1, and acts on the fluid (for example, air, exhaust gas or liquid from certain processes) flowing through the first electrode 2 and the second electrode 3, so that the fluid and the substances in the fluid are charged and become a plasma state, so as to generate plasma, so as to kill VOCs and viruses and bacteria in the fluid, generate water and carbon dioxide, and thus achieve a purification effect.

[0063] In the plasma generating device 100, it is necessary to ensure insulation between the first electrode 2 and the second electrode 3. In this embodiment, the dielectric structure 1 completely wraps the second electrode 3 so that there is no exposed conductive surface on the second electrode 3. The first electrode 2 and the second electrode 3 are insulated by the dielectric structure 1, and the creepage distance between the two electrodes is infinite, so there will be no creepage problem, improving the safety of use of the plasma generating device 100; at this time, the dielectric structure 1 can be set according to the size of the second electrode 3 without setting an overly large dielectric structure 1, thereby controlling the volume of the plasma generating device 100 and avoiding the plasma generating device 100 from being too large, which is beneficial for the plasma generating device 100 to be used in a small space.

[0064] With reference to Figures 2 to 4 , the present application also proposes a plasma generating device 100, which includes a dielectric structure 1, a first electrode 2, and a second electrode 3. At least part of the dielectric structure 1 is located between the first electrode 2 and the second electrode 3, and the orthographic projections of the first electrode 2 and the second electrode 3 on the dielectric structure 1 partially overlap, and the maximum circumscribed circle diameter of the overlapping area is L; it is defined that there is a first creepage distance D min and a second creepage distance D max between the first electrode 2 and the second electrode 3, and the radius R of the largest inscribed circle when the dielectric structure 1 is spread into a planar structure satisfies (D min +L) / 2 ≤ R ≤ (D max +L) / 2.

[0065] In this embodiment, the dielectric structure 1 can be set as a planar dielectric structure or a covering structure with an opening and covering one of the electrodes, so that both the first electrode 2 and the second electrode 3 have partial surfaces exposed to the air. In order to avoid creepage between the first electrode 2 and the second electrode 3 along the surface of the air or the dielectric structure 1, it is necessary to make the electrical clearance or creepage distance between the first electrode 2 and the second electrode 3 not less than the first creepage distance D min ; the first creepage distance D min refers to the shortest distance between the first electrode 2 and the second electrode 3 along the surface of the dielectric structure 1 that needs to be satisfied to avoid creepage when both the first electrode 2 and the second electrode 3 are provided on the surface of the dielectric structure 1. Among them, the first creepage distance between the first electrode 2 and the second electrode 3 can be determined according to the operating voltage range of the plasma generating device 100.

[0066] It should be noted that in the embodiments of the present application, the first electrode 2 and the second electrode 3 can be disposed on two opposite surfaces of the dielectric structure 1, or at least one of the first electrode 2 and the second electrode 3 can be spaced apart from the surface of the dielectric structure 1 that faces away from the other electrode. When both the first electrode 2 and the second electrode 3 are disposed on the surface of the dielectric structure 1, it is necessary to prevent creepage between the first electrode 2 and the second electrode 3 along the surface of the dielectric structure 1, that is, it is necessary to insulate the first electrode 2 and the second electrode 3 from each other to improve the use safety. When the plasma generating device 100 is used under different working conditions, the creepage distance requirements for preventing creepage between the first electrode 2 and the second electrode 3 are different. For example, in a working condition with a relatively high environmental pollution level, the creepage distance that the first electrode 2 and the second electrode 3 need to meet is greater than that in a working condition with a relatively low environmental pollution level. Among them, the working condition differences can also be temperature differences, air pressure differences, humidity differences, dust concentrations, etc. The creepage distance requirements under different working conditions can be obtained based on experiments, experience, safety regulations requirements, etc.

[0067] In the embodiments of the present application, it is defined that the minimum creepage distance that needs to be met between the first electrode 2 and the second electrode 3 when the plasma generating device 100 is used in the first working condition is the first creepage distance D min , and the minimum creepage distance that needs to be met between the first electrode 2 and the second electrode 3 when the plasma generating device 100 is used in the second working condition is the second creepage distance D max , where the second creepage distance is not less than the first creepage distance, and the environment in the second working condition is relatively deteriorated compared with the first working condition, such as being too humid or having a relatively high pollution level, etc.

[0068] In addition, when at least one of the first electrode 2 and the second electrode 3 is spaced apart from the dielectric structure 1, the shortest distance measured along the air between the first electrode 2 and the second electrode 3, that is, the electrical clearance, is greater than the creepage distance when both the first electrode 2 and the second electrode 3 are disposed on the dielectric structure 1. Therefore, when the size of the dielectric structure 1 is set according to the condition that both electrodes are disposed on the dielectric structure 1 and the creepage distance between the two electrodes is not less than the first creepage distance, even if at least one of the first electrode 2 and the second electrode 3 is spaced apart from the dielectric structure 1, the plasma generating device 100 can be used safely.

[0069] In the embodiments of the present application, the projection areas of the first electrode 2 and the second electrode 3 on the dielectric structure 1 can be partially overlapped, so that the linear distance between the first electrode 2 and the second electrode 3 can be reduced, thereby reducing the excitation voltage of the plasma generating device 100, which can not only improve the use safety of the plasma generating device 100, but also correspondingly reduce the first creepage distance that needs to be met.

[0070] Further, the overlapping position of the electrodes should be at or near the center of the dielectric structure 1. It can be understood that when the dielectric structure 1 is a planar dielectric structure, it is always in a spread state. When the dielectric structure 1 is set as a covering structure with an opening, its spread state is to spread each surface forming the covering structure of the dielectric structure 1 to the same surface. The embodiment of the present application also makes a limitation in combination with the size of the electrodes. It is defined that the maximum circumscribed circle diameter of the overlapping projection area of the first electrode 2 and the second electrode 3 on the surface of the dielectric structure 1 is L, and the radius R of the maximum inscribed circle of the planar structure formed when the dielectric structure 1 is spread satisfies (D min +L) / 2 ≤ R ≤ (D max +L) / 2. This setting method can not only meet the safety use requirements of the plasma generating device 100, but also reasonably set the size of the dielectric structure 1 to avoid the over - large size of the dielectric structure 1. According to the plasma energy requirement to be generated, an appropriate excitation voltage can be adopted, and the dielectric structure 1 with an appropriate size can be set according to the above - mentioned size range, improving the flexibility of the structural design of the plasma generating device 100. In some embodiments, when the plasma generating device 100 is provided with multiple electrodes, for example, at least two first electrodes 2 can be set to overlap with the same second electrode 3, or at least two first electrodes 2 and at least two second electrodes 3 can be set to correspond one by one. After calculating the corresponding minimum and maximum inscribed circles respectively, the radius of the maximum inscribed circle of the planar structure formed by spreading the dielectric structure 11 is defined as R.

[0071] Therefore, it can be understood that in the technical solution of the present utility model, the first electrode 2 and the second electrode 3 are separated by the dielectric structure 1. Among them, part of the conductive surfaces of both the first electrode 2 and the second electrode 3 can be exposed to the outside. For example, the dielectric structure 1 can be set as a planar dielectric structure located between the first electrode 2 and the second electrode 3, or the dielectric structure 1 can form a covering structure with an opening for covering the second electrode 3; the first creepage distance D min between the first electrode 2 and the second electrode 3 and the second creepage distance D maxThe first creepage distance is set according to the use requirements of the plasma generator 100 under the first working condition, and can be the minimum creepage distance limited to prevent creepage between the first electrode 2 and the second electrode 3 under the first working condition; the second creepage distance is set according to the use requirements of the plasma generator 100 under the second working condition, and can be the minimum creepage distance limited to prevent creepage between the first electrode 2 and the second electrode 3 under the second working condition; the first working condition and the second working condition are different use environments of the plasma generator 100, and the first working condition and the second working condition can be differences in temperature, pressure, humidity, dust concentration, and environmental pollution level. Define the radius of the maximum inscribed circle when the dielectric structure 1 is spread into a planar structure (D min +L) / 2≤R≤(D max +L) / 2, it is possible to obtain a stable and more energetic plasma while ensuring the safety of the plasma generator 100, and it is possible to avoid the dielectric structure 1 and the plasma generator 100 from being too large, which is conducive to the use of the plasma generator 100 in a small space.

[0072] In one embodiment, the second creepage distance D of the first electrode 2 and the second electrode 3 is max ≥3D min This setting method can use the first creepage distance under normal use environment as the basis for setting the second creepage distance, so as to set the size of the dielectric structure 1 accordingly, ensure the performance stability of the plasma generator 100 when used in harsh environments, and facilitate the structural design of the plasma generator 100.

[0073] Please refer to Figure 2 and Figure 3 In one embodiment, the dielectric structure 1 is a planar dielectric structure; or the dielectric structure 1 forms an encapsulating space with an opening, the second electrode 3 is arranged in the encapsulating space, and the opening is located on a side of the second electrode 3 away from the first electrode 2.

[0074] In this embodiment, the dielectric structure 1 can be set as a planar dielectric structure, such as an insulating sheet, an insulating coating, etc., and the first electrode 2 and the second electrode 3 are respectively arranged on two sides of the planar dielectric structure that are back to back. Using a planar dielectric structure as the dielectric structure 1 has a simple structure and is convenient for disassembly and assembly of the plasma generating device 100.

[0075] In addition, the dielectric structure 1 can form a covered space with an opening, and the second electrode 3 is disposed in the covered space. For example, the dielectric structure 1 includes a connected planar layer and a side portion. The planar layer is sandwiched between the first electrode 2 and the second electrode 3, and the side portion extends from the planar layer to the side away from the first electrode 2 and is disposed at an angle with the planar layer, or the dielectric structure 1 can extend to the surface of the second electrode 3 facing away from the first electrode 2. In some embodiments, it can be considered that the dielectric structure 1 uses a sheet structure as a raw material, and the edge of the sheet structure is folded in the direction away from the first electrode 2 to cover a part of the surface of the second electrode 3. Setting the dielectric structure 1 as a covered structure can reduce the cross-sectional size of the dielectric structure 1, thereby reducing the volume of the plasma generating device 100, which is beneficial to using the plasma generating device 100 in a smaller space.

[0076] Please refer to Figures 2 to 4 , in an embodiment, the distance between the first electrode 2 and the second electrode 3 is H, and the thickness of the part of the dielectric structure 1 between the first electrode 2 and the second electrode 3 is d, satisfying 0 ≤ H - d ≤ 5 mm.

[0077] In this embodiment, the relationship between the distance H between the first electrode 2 and the second electrode 3 and the distance d of the thickness of the dielectric structure 1 is defined to satisfy 0 ≤ H - d ≤ 5 mm. Specifically, the first electrode 2 and the second electrode 3 can be respectively disposed on two opposite surfaces of the dielectric structure 1. At this time, the distance between the first electrode 2 and the second electrode 3 is approximately the thickness of the dielectric structure 1. In addition, one of the first electrode 2 and the second electrode 3 can be disposed on the surface of the dielectric structure 1, and the other of the first electrode 2 and the second electrode 3 is spaced apart from the dielectric structure 1. At this time, the distance between the electrode spaced apart from the dielectric structure 1 and the dielectric structure 1 does not exceed 5 mm. Or both the first electrode 2 and the second electrode 3 are spaced apart from the dielectric structure 1. At this time, the sum of the distances between the two electrodes and the dielectric structure 1 does not exceed 5 mm. This setting method makes both the first electrode 2 and the second electrode 3 close to the dielectric structure 1, which can reduce the thickness and volume of the plasma generating device 100.

[0078] In an embodiment, the thickness d of the part of the dielectric structure 1 between the first electrode 2 and the second electrode 3 is d ≤ 2 mm.

[0079] In this embodiment, the dielectric structure 1 can be an insulating layer with a thickness not exceeding 2 mm, or can be set as an insulating coating coated on the surface of the electrode, so that the thickness of the dielectric structure 1 is almost negligible. Such a setting makes the thickness and volume of the plasma generating device 100 relatively small, which is beneficial to applying the plasma generating device 100 in a smaller space.

[0080] Please refer toFigure 2 , Figure 7 and Figure 8 , in one embodiment, at least one of the first electrode 2 and the second electrode 3 is disposed on the surface of a partial dielectric structure 1 between the first electrode 2 and the second electrode 3;

[0081] And / or, at least one of the first electrode 2 and the second electrode 3 is spaced apart from a partial dielectric structure 1 between the first electrode 2 and the second electrode 3.

[0082] In this embodiment, the partial dielectric structure 1 located between the first electrode 2 and the second electrode 3 is a dielectric layer. At least one of the first electrode 2 and the second electrode 3 can be disposed on the surface of the dielectric layer. For example, the first electrode 2 and the second electrode 3 are respectively disposed on two opposite surfaces of the dielectric layer, or one of the first electrode 2 and the second electrode 3 is disposed on the surface of the dielectric layer, and the other is spaced apart from the dielectric layer. Among them, when the electrode is disposed on the surface of the dielectric layer, any electrode can be attached to the surface of the dielectric structure 1, or the electrode can be a coating on the surface of the dielectric structure 1, or the electrode and the dielectric structure 1 can be a conductive coating and an insulating coating laminated on the substrate. Such a setting can reduce the thickness and volume of the plasma generating device 100.

[0083] In some embodiments, the first electrode 2 and the second electrode 3 can also be spaced apart from the dielectric layer located between the first electrode 2 and the second electrode 3. At this time, the contact area between the electrode and the air in the plasma generating device 100 is increased, and the plasma generation efficiency is improved.

[0084] Please refer to Figure 1 , Figure 2 , Figure 7 and Figure 8 , this application also provides a plasma generating device 100, including a dielectric structure 1, a first electrode 2, and a second electrode 3. At least a part of the dielectric structure 1 is configured as a planar dielectric layer, and the first electrode 2 and the second electrode 3 are respectively disposed on both sides of the planar dielectric layer; the distance between the first electrode 2 and the second electrode 3 in the thickness direction of the planar dielectric layer is H, and the thickness of the planar dielectric layer is d, satisfying 0 ≤ H - d ≤ 5 mm.

[0085] In this embodiment, the first electrode 2 and the second electrode 3 are respectively arranged on two opposite sides of the planar dielectric layer of the dielectric structure 1, and the projection profiles of the first electrode 2 and the second electrode 3 on the surface of the planar dielectric layer may or may not overlap. Among them, the relationship between the distance H between the first electrode 2 and the second electrode 3 in the thickness direction of the planar dielectric layer and the distance d between the thicknesses of the dielectric structure 1 satisfies 0 ≤ H - d ≤ 5 mm; specifically, the first electrode 2 and the second electrode 3 can be respectively arranged on two opposite surfaces of the dielectric structure 1. At this time, the distance between the first electrode 2 and the second electrode 3 is approximately the thickness of the dielectric structure 1; in addition, one of the first electrode 2 and the second electrode 3 can also be arranged on the surface of the dielectric structure 1, so that one of the first electrode 2 and the second electrode 3 is arranged at an interval from the dielectric structure 1. At this time, the distance between the electrode arranged at an interval from the dielectric structure 1 and the dielectric structure 1 does not exceed 5 mm; or both the first electrode 2 and the second electrode 3 are arranged at intervals from the dielectric structure 1. At this time, the sum of the distances between the two electrodes and the dielectric structure 1 does not exceed 5 mm. With this setting method, the first electrode 2 and the second electrode 3 are separated by the dielectric structure 1, and both the first electrode 2 and the second electrode 3 are close to the dielectric structure 1, which can reduce the thickness and volume of the plasma generating device 100.

[0086] Please refer to Figures 6 to 8 , in an embodiment, the thickness d of a part of the dielectric structure 1 located between the first electrode 2 and the second electrode 3 is ≤ 2 mm.

[0087] In this embodiment, the dielectric structure 1 can be an insulating layer with a thickness not exceeding 2 mm, or can be set as an insulating coating coated on the surface of the electrode, so that the thickness of the dielectric structure 1 is almost negligible. With such a setting, the thickness and volume of the plasma generating device 100 are relatively small, which is beneficial to applying the plasma generating device 100 in a small space.

[0088] In an embodiment, the projection regions of the first electrode 2 and the second electrode 3 on the planar dielectric layer partially overlap. With such a setting, the linear distance between the first electrode 2 and the second electrode 3 can be reduced, thereby reducing the excitation voltage of the plasma generating device 100. This can not only improve the use safety of the plasma generating device 100, but also correspondingly reduce the required creepage distance.

[0089] In an embodiment, at least a part of the first electrode 2 opposite to the dielectric structure 1 is a sheet-like electrode structure; or, the first electrode 2 is a conductive film; or, the first electrode 2 is a conductive coating provided on the surface of the dielectric structure 1; or, the plasma generating device 100 further includes a first carrier opposite to the dielectric structure 1, and the first electrode 2 is a conductive coating provided on the surface of the first carrier; or, the first electrode 2 is a wire.

[0090] In this embodiment, the first electrode 2 can be one of a sheet electrode structure, a conductive film, a conductive coating, and a wire. When the first electrode 2 is a sheet electrode structure, its thickness can be set according to actual needs and can generally be made of metal materials such as silver, gold, and copper, carbon materials, conductive polymers, or other materials, so that the first electrode 2 has relatively good structural strength and good performance stability. When the first electrode 2 is made in the form of a conductive film or a conductive coating, the thickness of the first electrode 2 is small, which is beneficial to reducing the thickness and volume of the plasma generating device 100, facilitating the application of the plasma generating device 100 in a small space, and improving applicability and usage flexibility. Among them, the conductive coating can be directly provided on the surface of the dielectric structure 1 to further reduce the overall thickness of the first electrode 2 and the dielectric structure 1. In addition, a first carrier can be provided to set the conductive coating to form the first electrode 2. The sheet electrode structure, the conductive film, and the conductive coating can all set the first electrode 2 into the required shape and structure according to actual needs. For example, a part of the first electrode 2 opposite to the dielectric structure 1 can be set as a strip structure to control the plasma generation area and diffusion direction. When the first electrode 2 is made of a wire, the end of the first electrode 2 is approximately a tip, which can cause the plasma to be concentrated in the end area.

[0091] In one embodiment, at least a part of the second electrode 3 opposite to the dielectric structure 1 is a sheet electrode structure; or, at least a part of the second electrode 3 opposite to the dielectric structure 1 is a conductive film;

[0092] or, at least a part of the second electrode 3 is a conductive coating provided on the surface of the dielectric structure 1; or, the plasma generating device 100 further includes a second carrier opposite to the dielectric structure 1, and at least a part of the second electrode 3 is a conductive coating provided on the surface of the second carrier.

[0093] In this embodiment, at least a part of the second electrode 3 disposed opposite to the dielectric structure 1 can be set as one of a sheet electrode structure, a conductive film, a conductive coating layer, etc. When the second electrode 3 is set as a sheet electrode structure, its thickness can be set according to actual requirements, and it can generally be made of metal materials such as silver, gold, copper, carbon materials, conductive polymers or other materials, so that the structural strength of the second electrode 3 is relatively good and the performance stability is good; when the second electrode 3 is made in the form of a conductive film and a conductive coating layer, etc., the thickness of the second electrode 3 is smaller, which is beneficial to reducing the thickness and volume of the plasma generating device 100, facilitating the application of the plasma generating device 100 in a small space, and improving the applicability and use flexibility; among them, the conductive coating layer can be directly disposed on the surface of the dielectric structure 1 to further reduce the overall thickness of the second electrode 3 and the dielectric structure 1. In addition, a second carrier can also be provided for disposing the conductive coating layer to form a part of the second electrode 3 disposed opposite to the dielectric structure 1. Among them, the sheet electrode structure, the conductive film, the conductive coating layer, etc. can all set the second electrode 3 into the required shape and structure according to actual requirements. For example, in the above embodiment, the second electrode 3 is provided with a second extension section 31, and the end of the second extension section 31 can be set as an arc, etc., so that the field strength on one side of the second electrode 3 is lower than that of the first extension section 21, playing a role in controlling the plasma generation region.

[0094] In an embodiment, the dielectric structure 1 includes an insulating sheet; the insulating sheet can be a ceramic sheet, a quartz sheet, etc., which has a certain structural strength and is not easily deformed or damaged; the thickness of the insulating sheet can be set according to actual requirements, the installation space of the application environment of the plasma generating device 100, or conditions such as the required working voltage. In some embodiments, the insulating sheet can also be used as a carrier for the first electrode 2 and the second electrode 3 to reduce the thickness of the plasma generating device 100.

[0095] In an embodiment, the dielectric structure 1 includes at least one insulating coating. Among them, the insulating coating can be a polytetrafluoroethylene coating, insulating paint, etc. The dielectric structure 1 can only include one insulating coating. Disposing the insulating coating on the surface of the second electrode 3 is beneficial to reducing the thickness and volume of the plasma generating device 100, facilitating the application of the plasma generating device 100 in a small space, and improving the applicability and use flexibility. Among them, in some embodiments, the dielectric structure 1 covers the second electrode 3, and the insulating coating can be coated on each surface of the second electrode 3; in addition, at least a part of the surface of the second electrode 3 facing away from the first electrode 2 can also be not covered by the insulating coating.

[0096] In addition, the dielectric structure 1 may also include an insulating carrier layer and at least one insulating coating. The insulating carrier layer may be the insulating sheet in the foregoing embodiments. At least one insulating coating is provided on the surface of the insulating carrier layer, which can not only improve the insulation performance of the dielectric structure 1, but also reduce the thickness of the dielectric structure 1, thereby reducing the thickness and volume of the plasma generating device.

[0097] Please refer to Figure 9 and Figure 10 , in an embodiment, at least a part of the first electrode 2 is arranged as a first extension section 21, and the first extension section 21 is arranged on the surface of the dielectric structure 1 or is arranged in parallel with a space from the dielectric structure 1.

[0098] In this embodiment, at least a part of the first electrode 2 is arranged as the first extension section 21. The first extension section 21 can be arranged on the surface of the dielectric structure 1 or arranged at a distance from the dielectric structure 1. The first extension section 21 can be a linear structure or a strip structure with a certain width and length. The second electrode 3 only needs to be arranged opposite to at least a part of the surface of the dielectric structure 1. The second electrode 3 can be a sheet electrode, a mesh electrode, a conductive film or a conductive coating arranged opposite to the dielectric structure 1, etc. The shape of the second electrode 3 can cover most of the surface of the dielectric structure 1 or can be a sheet strip structure provided with a second extension section 31 as in the following embodiments. The arrangement of the first extension section 21 can make the plasma on one side of the first electrode 2 be concentratedly generated in the end area of the first extension section 21, and control the generation position of the plasma on one side of the first electrode 2.

[0099] Please refer to Figure 10 , in an embodiment, at least a part of the second electrode 3 is arranged as a second extension section 31, and the second extension section 31 is arranged on the surface of the dielectric structure 1 or is arranged in parallel with a space from the dielectric structure 1. The end of the second extension section 31 is blunt compared with the end of the first extension section 21.

[0100] In this embodiment, the part of the second electrode 3 arranged opposite to the dielectric structure 1 is arranged as the second extension section 31, and the end of the second extension section 31 is blunt compared with the end of the first extension section 21. For example, the end size of the first extension section 21 can be made smaller than the end size of the second extension section 31, or the end of the first extension section 21 can be set as a tip, and the end of the second extension section 31 can be set as an arc profile to increase the field strength on one side of the first extension section 21, so that the plasma in the plasma generating device 100 is concentratedly generated on one side of the first electrode 2.

[0101] Please refer to Figure 9 , in an embodiment, the cross-sectional size at the end of the first extension section 21 is arranged in a tapered manner, and at least one side surface of the first extension section 21 is arranged as an inclined surface inclined with respect to the extension direction of the first extension section 21.

[0102] In this embodiment, one side surface of the first extension section 21 is an inclined surface that is inclined relative to the extension direction of the first extension section 21, and the cross-sectional dimension at the end of the first extension section 21 gradually shrinks; at this time, the shape of the end of the first extension section 21 can be approximately a frustum of a cone, a frustum of a pyramid, a trapezoid, or a tip. With this setting method, by designing the shape of the end of the first extension section 21, the local electric field strength at the end of the first extension section 21 can be increased, so that more plasma can be generated at the end of the first extension section 21, and through the guidance of the inclined surface, the plasma generated in the area of the first extension section 21 can diffuse towards the end direction of the first extension section 21, that is, control the diffusion direction of the ion wind generated by the plasma aerodynamic effect, thereby forming a directional ion wind, so that the plasma diffusion area generated by the plasma generating device 100 from one side of the first electrode 2 is controllable, and the plasma generated by the plasma generating device 100 can be diffused to the required area according to the demand, achieving a better sterilization and purification effect.

[0103] In addition, in some embodiments, it is necessary to make the shapes of the first extension section 21 and the second electrode 3 different. Through the above-mentioned tapered shape setting, the electric field strength difference between the first extension section 21 and the second electrode 3 can be made larger, so that more plasma is generated on one side of the first extension section 21.

[0104] Please refer to Figure 9 , in some embodiments, a tip is formed at the end of the first extension section 21. With this setting method, the radius of curvature at the end of the first extension section 21 is further reduced, which is beneficial to increasing the electric field strength difference between the first electrode 2 and the second electrode 3, making the electric field strength of the first electrode 2 higher than that of the second electrode 3, so that the plasma in the plasma generating device 100 is concentrated on one side of the first electrode 2.

[0105] Among them, the tip formed by the first extension section 21 can make the first extension section 21 a linear needle-like structure, or the shape of the end of the first extension section 21 can be approximately a pyramid structure. For example, the end of the first extension section 21 has two side surfaces in the width direction and two side surfaces in the thickness direction, and the four side surfaces converge at a point at the end to form a tip.

[0106] Please refer to Figure 9 , in one embodiment, at least in the end region of the first extension section 21, the width of the first extension section 21 is tapered along the extension direction of the first extension section 21.

[0107] In this embodiment, the width direction of the first extension section 21 is perpendicular to the length direction of the first extension section 21 and is in the plane direction of the dielectric layer 1. The projection of the first extension section 21 on the dielectric layer 1 is generally a strip-shaped profile with a certain width, having two side edges spaced in the width direction. At least within a certain length range near the end of the first extension section 21, at least one side edge gradually extends obliquely towards the direction of approaching the other side edge, so that the width and cross-sectional dimensions of the first extension section 21 gradually shrink. This can not only reduce the curvature radius of the end of the first extension section 21, increase the local electric field strength of the first extension section 21, and better enable the plasma in the plasma generating device 100 to be concentratedly generated on one side of the first electrode 2, but also control the diffusion of the plasma towards the end direction of the first extension section 21.

[0108] It should be noted that in the embodiment of the present application, the first extension section 21 can be a sheet electrode, a conductive film, a columnar electrode, etc. that are independent of the dielectric layer 1, and can be arranged at intervals with the dielectric layer 1 or combined by bonding or other means; the first extension section 21 can also be a conductive coating provided on the surface of the dielectric layer 1. In this embodiment, it is only necessary to make the projection of the first extension section 21 on the dielectric layer 1 be a strip-shaped structure, and the width gradually shrinks at least at the end.

[0109] Please refer to Figure 9 , in an embodiment, the thickness of the end of the first extension section 21 is tapered along the extension direction of the first extension section 21.

[0110] In this embodiment, the first extension section 21 has a certain thickness, and at least within a certain length range near the end of the first extension section 21, the thickness of the first extension section 21 is tapered towards the direction of approaching the end face, so that at least one of the two surfaces in the thickness direction is inclined towards the direction of approaching the other surface. This can not only reduce the thickness of the end of the first extension section 21, which is beneficial to reducing the overall thickness of the plasma generating device 100, but also control the diffusion of the plasma towards the end direction of the first extension section 21, realizing controllable ion wind flow direction. Among them, the two surfaces of the first extension section 21 in the thickness direction can converge to form an edge at the end, or the two surfaces can be connected through the end face.

[0111] In some embodiments, the surface of the first extension section 21 away from the dielectric layer 1 is inclined towards the direction of approaching the dielectric layer 1, and the surface of the first extension section 21 close to the dielectric layer 1 is attached to or parallel to the dielectric layer 1. This can avoid increasing the distance between the first extension section 21 and the second electrode 3 while making the thickness of the first extension section 21 tapered, which is beneficial to reducing the excitation voltage of the plasma generating device 100 and improving the use safety.

[0112] Please refer to Figure 9, in one embodiment, the plasma generating device 100 further includes a housing 4. An accommodation space is formed inside the housing 4, and at least one outlet 42 communicating with the accommodation space is provided; the dielectric structure 1, at least part of the first electrode 2, and at least part of the second electrode 3 are disposed in the accommodation space, and the first extension section 21 extends towards one of the outlets 42.

[0113] In this embodiment, the plasma generating device 100 is provided with a housing 4. An accommodation space 41 is formed inside the housing 4 to integrate structures such as the first electrode 2, the second electrode 3, and the dielectric structure 1 into an integral structure, and can protect the first electrode 2, the second electrode 3, and the dielectric structure 1, etc. In addition, an outlet 42 communicating with the accommodation space 41 is provided on the housing 4, and the generated plasma can diffuse outwards from the outlet 42, so that the plasma diffusion area of the plasma generating device 100 can be controlled.

[0114] Among them, the outlet 42 on the housing 4 can be disposed opposite to the surface of the dielectric structure 1, or the outlet 42 can be located on the side of the dielectric structure 1, for example, opened on the side surface of the housing 4 pointed by the first extension section 21. In addition, one outlet 42 can be provided on the housing 4, and the end of the first extension section 21 extends towards the direction close to the outlet 42, so that the plasma diffused to the end of the first extension section 21 can diffuse to the outlet 42 and diffuse outwards; in some embodiments, two or more outlets 42 can also be provided. For example, two outlets 42 can be provided and disposed opposite to the first extension section 21 and the second electrode 3 on both sides of the dielectric structure 1 respectively. It can be understood that when part of the structure of the second electrode 3 is also exposed to the air, part of the plasma is also generated in the area of the second electrode 3. Providing the outlet 42 corresponding to the second electrode 3 facilitates the outward diffusion of the plasma generated on one side of the second electrode 3 and improves the efficiency of the plasma discharging outwards.

[0115] With reference to Figures 9 to 11 , in some embodiments, the housing 4 includes a first half-shell 43 and a second half-shell 44 which are oppositely disposed. The first half-shell 43 and the second half-shell 44 can be opened and closed relative to each other to facilitate the disassembly and assembly of structures such as the first electrode 2, the second electrode 3, and the dielectric structure 1.

[0116] Please refer to Figure 9 , in one embodiment, one of the outlets 42 is disposed opposite to the surface of the dielectric structure 1, and the end of the first extension section 21 is exposed at the outlet 42. With such a setting, it is beneficial for the plasma to discharge outwards from the outlet 42, improves the plasma discharging efficiency, and is beneficial to improving the disinfection and purification effects of the plasma generating device 100.

[0117] Please refer to Figure 9, in one embodiment, the housing 4 is further provided with a flow guiding structure 49. The flow guiding structure 49 extends from the edge of the outlet 42 towards the outside of the housing 4, and the end of the first extension section 21 is arranged towards the flow guiding structure 49.

[0118] In this embodiment, a flow guiding structure 49 is arranged on the housing 4. The flow guiding structure 49 is located on the front side of the end of the first extension section 21 and extends from the edge of the outlet 42 in a direction away from the housing 4. With such an arrangement, when the plasma diffuses from the first extension section 21 to the end and continues to diffuse forward, it will be blocked by the flow guiding structure 49, and then diffuse along the surface of the flow guiding structure 49 in a direction away from the housing 4. Among them, the extending direction of the flow guiding structure 49 can be consistent with the axial direction of the outlet 42, or can be inclined relative to the axial direction of the outlet 42. This is not limited herein. The setting of the flow guiding structure 49 further adjusts the diffusion direction of the plasma, and can make the application of the plasma generating device 100 more flexible.

[0119] In one embodiment, the second electrode 3 is not completely covered by the dielectric structure 1, and there are also some structures directly exposed to the air. At this time, at least two outlets 42 can be opened on the housing 4. Two of the outlets 42 are respectively located on both sides of the dielectric structure 1 and are respectively arranged opposite to the first electrode 2 and the second electrode 3; thus, plasma can be generated on both the first electrode 2 and the second electrode 3 and discharged outward from the outlets 42 on both sides of the housing 4 respectively, improving the plasma generation efficiency and utilization efficiency.

[0120] In one embodiment, a first installation groove 45 is arranged on the inner surface of the housing 4, and at least part of the first extension section 21 is arranged in the first installation groove 45.

[0121] In this embodiment, a first installation groove 45 can be arranged on the inner surface of the housing 4 for installing the first extension section 21 to limit the first extension section 21, improve the stability of the installation position of the first extension section 21, and thus accurately control the plasma generation and diffusion regions.

[0122] In one embodiment, a first limiting groove 47 is arranged on the inner surface of the housing 4, and a first limiting section 23 protrudes from the side of the first extension section 21. The first limiting section 23 is arranged in the first limiting groove 47; in this embodiment, a first limiting section 23 can be arranged on the first electrode 2. The first limiting section 23 can protrude from the surface of the first extension section 21 or from the side of the first extension section 21. At the same time, a first limiting groove 47 for limiting and installing the first limiting section 23 is arranged on the inner surface of the housing 4, improving the bonding strength between the first electrode 2 and the housing 4, and can limit the first electrode 2, improve the stability of the installation position of the first extension section 21, and thus accurately control the plasma generation and diffusion regions.

[0123] In some embodiments, a part of the first electrode 2 extends outside the housing 4 to form a first power connection section 22; that is, the first electrode 2 penetrates through the housing 4, and the part of the first electrode 2 located outside the housing 4 forms the first power connection section 22, which is used to connect an external power source to apply a voltage to the first electrode 2. With this arrangement, when applying the plasma generating device 100, it is not necessary to disassemble the housing 4 to connect the first electrode 2 and the external power source. When it is necessary to remove the plasma generating device 100, the connection between the first electrode 2 and the external power source can also be directly disconnected outside the housing 4, improving the convenience of using the plasma generating device 100.

[0124] In one embodiment, the dielectric structure 1 is a planar dielectric structure. A part of the second electrode 3 is disposed opposite to the planar dielectric structure, and can be disposed on the surface of the planar dielectric structure or be arranged parallel to the planar dielectric structure at an interval. Based on this, a second installation groove 46 can be provided on the inner surface of the housing 4, and at least a part of the second electrode 3 is disposed in the second installation groove 46, which can improve the position installation accuracy of the second electrode 3 and prevent the second electrode 3 from being displaced.

[0125] In addition, a part of the second electrode 3 can be configured as a second extension section 31. The second extension section 31 is disposed on the surface of the planar dielectric structure or is arranged parallel to the planar dielectric structure at an interval. A second limiting section 33 extends outward from the side of the second extension section 31. Correspondingly, a second limiting groove 48 is provided on the inner surface of the housing 4, and the second limiting section 33 is installed in the second limiting groove 48 in a limiting manner, so as to improve the bonding strength between the second electrode 3 and the housing 4, prevent problems such as displacement and shaking of the second electrode 3 in the housing 4, and improve the overall structural integrity and performance stability of the plasma generating device 100. Among them, the second installation groove 46 and the second limiting groove 48 can be simultaneously provided on the inner surface of the housing 4. The second extension section 31 is arranged in the second installation groove 46, and the second limiting section 33 is arranged in the second limiting groove 48, so that the position installation accuracy and stability of the second electrode 3 are better.

[0126] In some embodiments, the second electrode 3 penetrates through the housing 4, and the part of the second electrode 3 located outside the housing 4 forms a second power connection section 32, which is used to connect an external power source to apply a voltage to the second electrode 3. With this arrangement, when applying the plasma generating device 100, it is not necessary to disassemble the housing 4 to connect the second electrode 3 and the external power source. When it is necessary to remove the plasma generating device 100, the connection between the second electrode 3 and the external power source can also be directly disconnected outside the housing 4, improving the convenience of using the plasma generating device 100.

[0127] In one embodiment, the extending directions of the first power connection section 22 and the second power connection section 32 are different. With this arrangement, problems such as short circuit caused by too short a distance when the first power connection section 22 and the second power connection section 32 are arranged on the same side are avoided, improving the use safety.

[0128] The present application also provides an electrical appliance, which is provided with the plasma generating device 100 in any of the foregoing embodiments. For the specific structure of the plasma generating device 100, reference may be made to the above embodiments. Since the electrical appliance adopts all the technical solutions of all the above embodiments, it has at least all the beneficial effects brought by the technical solutions of the above embodiments, which will not be elaborated herein one by one. Among them, the electrical appliance may be, but is not limited to, an air conditioner, an air purifier, a floor washer, etc. The plasma generated by the plasma generating device 100 provided in the electrical appliance can reduce the toxic and harmful substances contained in the air blown out by the air conditioner and the air purifier, and can also purify, sterilize and disinfect the water used for cleaning in the floor washer.

[0129] The above is only an exemplary embodiment of the present invention, and does not limit the patent scope of the present invention. Any equivalent structural transformation made under the technical concept of the present invention by using the content of the specification and drawings of the present invention, or any direct / indirect application in other related technical fields is included in the patent protection scope of the present invention.

Claims

1. A plasma generating device, characterized in that: The plasma generating device comprises a dielectric structure, a first electrode and a second electrode. The dielectric structure covers the second electrode. Part of the dielectric structure is configured as a planar dielectric layer. The first electrode is disposed on a side of the planar dielectric layer away from the second electrode.

2. A plasma generating device, characterized in that: A device comprising a dielectric structure, a first electrode and a second electrode, wherein at least a portion of the dielectric structure is located between the first electrode and the second electrode, the first electrode and the second electrode overlap with the orthographic projection of the dielectric structure, and the maximum circumscribed circle diameter of the overlapped area is L; A first creepage distance D is defined between the first electrode and the second electrode. min and the second creepage distance is D max , the radius R of the maximum inscribed circle when the dielectric structure is spread into a planar structure satisfies (D min +L) / 2≤R≤(D max +L) / 2.

3. The plasma generating device according to claim 2, characterized in that: A second creepage distance D between the first electrode and the second electrode max ≥3D min .

4. The plasma generating device according to claim 2, characterized in that: The dielectric structure is a planar dielectric structure; Alternatively, the dielectric structure is coated on the second electrode, and a surface of the second electrode facing away from the first electrode is at least partially exposed outside the dielectric structure.

5. The plasma generating device according to any one of claims 1 to 4, characterized in that: At least one of the first electrode and the second electrode is disposed on a surface of a portion of the dielectric structure between the first electrode and the second electrode; And / or, at least one of the first electrode and the second electrode is spaced apart from a portion of the dielectric structure between the first electrode and the second electrode.

6. The plasma generating device according to any one of claims 1 to 4, characterized in that: The distance between the first electrode and the second electrode is H, the thickness of the portion of the dielectric structure between the first electrode and the second electrode is d, and 0≤Hd≤5mm is satisfied; And / or, a thickness d≤2 mm of a portion of the dielectric structure located between the first electrode and the second electrode.

7. The plasma generating device according to any one of claims 1 to 4, characterized in that: At least a portion of the first electrode disposed opposite to the dielectric structure is a sheet-shaped electrode structure; Or, the first electrode is a conductive film; Or, the first electrode is a conductive coating provided on the surface of the dielectric structure; Alternatively, the plasma generating device further comprises a first carrier disposed opposite to the dielectric structure, and the first electrode is a conductive coating disposed on a surface of the first carrier; Alternatively, the first electrode is a wire.

8. The plasma generating device according to any one of claims 1 to 4, characterized in that: At least a portion of the second electrode disposed opposite to the dielectric structure is a sheet-shaped electrode structure; Or, at least a portion of the second electrode disposed opposite to the dielectric structure is a conductive film; Or, at least part of the second electrode is a conductive coating disposed on the surface of the dielectric structure; Alternatively, the plasma generating device further comprises a second carrier disposed opposite to the dielectric structure, and at least a portion of the second electrode is a conductive coating disposed on a surface of the second carrier.

9. The plasma generating device according to any one of claims 1 to 4, characterized in that: The dielectric structure includes an insulating sheet; and / or, the dielectric structure comprises at least one insulating coating layer; And / or, the material of the dielectric structure is at least one of ceramic, quartz and polytetrafluoroethylene.

10. The plasma generating device according to any one of claims 1 to 4, characterized in that: At least a portion of the first electrode is configured as a first extension segment, and the first extension segment is disposed on the surface of the dielectric structure or is spaced apart and parallel to the dielectric structure.

11. The plasma generating device according to claim 10, characterized in that: The plasma generating device further comprises a shell, wherein a placement space is formed in the shell, and at least one outlet communicating with the placement space is opened; The dielectric structure, at least a portion of the first electrode, and at least a portion of the second electrode are disposed in the placement space, and the first extension section is extended toward one of the outlets.

12. The plasma generating device according to claim 11, characterized in that: One of the outlets is disposed opposite to the surface of the dielectric structure, and an end of the first extension section is exposed at the outlet.

13. The plasma generating device according to claim 12, characterized in that: The shell is further provided with a flow guiding structure, and the flow guiding structure extends from the edge of the outlet toward the outside of the shell, and the end of the first extension section is arranged toward the flow guiding structure.

14. The plasma generating device according to claim 11, characterized in that: The inner surface of the housing is provided with a first mounting groove, and at least a portion of the first extension section is arranged in the first mounting groove; And / or, a first limiting groove is provided on the inner surface of the shell, a first limiting section is protruding from the side of the first extension section, and the first limiting section is arranged in the first limiting groove; And / or, part of the first electrode extends to the outside of the shell to form a first power connection section.

15. A plasma generating device, characterized in that: It comprises a dielectric structure, a first electrode and a second electrode, at least a part of the dielectric structure is configured as a planar dielectric layer, and the first electrode and the second electrode are respectively arranged on two sides of the planar dielectric layer; The distance between the first electrode and the second electrode along the thickness direction of the planar dielectric layer is H, and the thickness of the planar dielectric layer is d, satisfying 0≤Hd≤5mm.

16. The plasma generating device according to claim 15, characterized in that: The thickness d of the planar dielectric layer is ≤ 2 mm.

17. An electrical device, characterized in that: The electrical equipment is provided with a plasma generating device as described in any one of claims 1 to 16.

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