Photoresist bubble eliminating device and photoetching system

Abstract

The utility model provides a photoresist bubble eliminating device and a photoetching system.The device comprises a photoresist bottle, a first liquid storage tank and a suction device which are sequentially connected through a connecting pipeline, the photoresist bottle and the first liquid storage tank are used for storing photoresist, and the first liquid storage tank is provided with a first connector, a second connector, a third connector and a fourth connector; the first interface is lower than the photoresist liquid level in the first liquid storage tank, and the second interface, the third interface and the fourth interface are higher than the photoresist liquid level in the first liquid storage tank; the suction device is connected to the first liquid storage tank from the first interface and is used for sucking the photoresist stored in the first liquid storage tank; the pressure balance pipeline is connected with the second interface of the first liquid storage tank and is used for providing pressure for the first liquid storage tank so as to push the photoresist in the first liquid storage tank to flow to the suction device through the connecting pipeline; and the photoresist bottle is connected to the first liquid storage tank from the third interface. According to the embodiment of the invention, the product yield is improved, and the adverse effect on the product is reduced.

Description

Technical Field

[0001] Embodiments of the present application relate to the field of semiconductor technology, and in particular, to a photoresist bubble elimination device and a lithography system. Background Art

[0002] In semiconductor manufacturing processes, the lithography process has always been regarded as a key step in integrated circuit manufacturing, and its stability and reliability have an important impact on the quality, yield, and cost of products.

[0003] Therefore, how to reduce the adverse effects on products in the lithography process is a technical problem that needs to be solved urgently by those skilled in the art. Utility Model Content

[0004] In view of this, embodiments of the present application provide a photoresist bubble elimination device and a lithography system to reduce the adverse effects on products in the lithography process.

[0005] To achieve the above object, embodiments of the present application provide the following technical solutions.

[0006] In a first aspect, embodiments of the present application provide a photoresist bubble elimination device, including:

[0007] A photoresist bottle, a first liquid storage tank, and a suction device connected in sequence through a connecting pipeline. The photoresist bottle and the first liquid storage tank are used to store photoresist. Among them, the first liquid storage tank has a first interface, a second interface, a third interface, and a fourth interface. The first interface is lower than the liquid level of the photoresist in the first liquid storage tank, and the second interface, the third interface, and the fourth interface are higher than the liquid level of the photoresist in the first liquid storage tank;

[0008] The suction device is connected to the first liquid storage tank from the first interface and is used to suck the photoresist stored in the first liquid storage tank. Among them, the pressure in the photoresist bottle, the first liquid storage tank, and the connecting pipeline between the photoresist bottle and the first liquid storage tank is a first pressure, and the pressure of the suction device and the connecting pipeline between the suction device and the first liquid storage tank is a second pressure. The first pressure is greater than the second pressure;

[0009] A pressure balance pipeline connected to the second interface of the first liquid storage tank. The pressure balance pipeline is used to provide pressure for the first liquid storage tank to push the photoresist in the first liquid storage tank to flow through the connecting pipeline to the suction device;

[0010] Among them, the photoresist bottle is connected to the first liquid storage tank from the third interface.

[0011] Optionally, a first pressure regulating valve, a first pressure gauge, a check valve, and an electromagnetic solenoid valve are provided in the pressure balancing pipeline; wherein, the first pressure regulating valve is used to regulate the pressure in the pressure balancing pipeline; the first pressure gauge is used to detect the pressure value in the pressure balancing pipeline; the check valve is used to prevent the photoresist in the first liquid storage tank from flowing back; and the electromagnetic solenoid valve is used to control the on-off state of the pressure balancing pipeline.

[0012] Optionally, it further includes:

[0013] An intake pipeline connected to the photoresist bottle, and the intake pipeline is used to provide pressure for the photoresist bottle to push the photoresist in the photoresist bottle to flow through the connecting pipeline to the first liquid storage tank.

[0014] Optionally, a second pressure regulating valve, a second pressure gauge, and a first switch valve are provided in the intake pipeline; wherein, the second pressure regulating valve is used to regulate the pressure in the intake pipeline; the second pressure gauge is used to detect the pressure value in the intake pipeline; and the first switch valve is used to control the on-off state of the intake pipeline.

[0015] Optionally, it further includes:

[0016] A vent pipeline connected to the intake pipeline, which is used to relieve pressure from the photoresist bottle;

[0017] A vent valve located in the vent pipeline, which is used to control the on-off state of the vent pipeline.

[0018] Optionally, a second switch valve is provided in the connecting pipeline between the photoresist bottle and the first liquid storage tank; wherein, the second switch valve is used to control the on-off state of the connecting pipeline between the photoresist bottle and the first liquid storage tank.

[0019] Optionally, it further includes:

[0020] A discharge pipeline connected to the fourth interface of the first liquid storage tank, and the discharge pipeline is used to discharge the photoresist containing bubbles in the first liquid storage tank; wherein, a third switch valve is provided in the discharge pipeline to control the on-off state of the discharge pipeline.

[0021] Optionally, a filter and a second liquid storage tank are provided between the first liquid storage tank and the suction device; wherein, the filter is used to filter the bubbles in the photoresist; and the second liquid storage tank is used to store the filtered photoresist.

[0022] Optionally, it further includes:

[0023] An output pipeline connected to the suction device, and a nozzle is provided at one end of the output pipeline away from the suction device for coating the photoresist.

[0024] In a second aspect, an embodiment of the present application provides a lithography system, which includes the photoresist bubble elimination device described in the first aspect above.

[0025] Compared with the prior art, the technical solution of the embodiment of the present application has the following advantages:

[0026] An embodiment of the present application provides a photoresist bubble elimination device and a lithography system. The photoresist bubble elimination device includes a photoresist bottle, a first liquid storage tank, and a suction device that are sequentially connected through a connection pipeline. The photoresist bottle and the first liquid storage tank are used to store photoresist. The first liquid storage tank has a first interface, a second interface, a third interface, and a fourth interface. The first interface is lower than the liquid level of the photoresist in the first liquid storage tank, and the second interface, the third interface, and the fourth interface are higher than the liquid level of the photoresist in the first liquid storage tank. The suction device is connected to the first liquid storage tank from the first interface and is used to suck the photoresist stored in the first liquid storage tank. The pressure in the photoresist bottle, the first liquid storage tank, and the connection pipeline between the photoresist bottle and the first liquid storage tank is a first pressure, and the pressure in the suction device and the connection pipeline between the suction device and the first liquid storage tank is a second pressure. The first pressure is greater than the second pressure. A pressure balance pipeline connected to the second interface of the first liquid storage tank, and the pressure balance pipeline is used to provide pressure for the first liquid storage tank to push the photoresist in the first liquid storage tank to flow through the connection pipeline to the suction device. The photoresist bottle is connected to the first liquid storage tank from the third interface.

[0027] It can be seen that the photoresist bubble elimination device provided by the embodiment of the present application, by setting a pressure balance pipeline connected to the second interface of the first liquid storage tank, when the suction device sucks the photoresist in the first liquid storage tank, the pressure balance pipeline can provide pressure for the first liquid storage tank to push the photoresist in the first liquid storage tank to flow through the connection pipeline to the suction device. By balancing the pressure difference generated when the suction device sucks the photoresist through the pressure balance pipeline, the phenomenon of generating bubbles in the photoresist due to unbalanced pressure is avoided, thereby improving the product yield and reducing the adverse impact on the product. Description of the Drawings

[0028] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings required for the description of the embodiments or the prior art. Obviously, the drawings in the following description are only the embodiments of the present application. For those of ordinary skill in the art, other drawings can be obtained according to the provided drawings without creative efforts.

[0029] Figure 1It is a schematic diagram of the photoresist bubble elimination device provided by the embodiment of the present application.

[0030] In the accompanying drawings:

[0031] 1 - photoresist bottle; 2 - first liquid storage tank; 21 - first interface; 22 - second interface; 23 - third interface; 24 - fourth interface; 3 - suction device; 4 - first switching valve; 5 - second switching valve; 6 - third switching valve; 7 - air release valve; 8 - filter; 9 - second liquid storage tank; 10 - nozzle; A1 - first pressure regulating valve; A2 - second pressure regulating valve; B1 - first pressure gauge; B2 - second pressure gauge; C - check valve; D - electromagnetic switching valve. Specific embodiments

[0032] Next, the technical solutions in the embodiments of the present application will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present application.

[0033] As described in the background art, in the semiconductor manufacturing process, the lithography process has always been considered a key step in integrated circuit manufacturing, and its stability and reliability have an important impact on the quality, yield, and cost of products.

[0034] The inventor believes that in the lithography process, the photoresist coating process is essential. The photoresist coating process is to spray the photoresist on the wafer to form a photoresist layer, and a preset lithography pattern is formed based on the photoresist layer. However, as a high-viscosity liquid, the photoresist is prone to generate bubbles during the coating process, ultimately affecting the product yield and having an adverse impact on the product.

[0035] In view of this, the embodiments of the present application provide a photoresist bubble elimination device and a lithography system. Among them, the photoresist bubble elimination device includes a photoresist bottle, a first liquid storage tank, and a suction device connected in sequence through a connecting pipeline. The photoresist bottle and the first liquid storage tank are used to store photoresist. Among them, the first liquid storage tank has a first interface, a second interface, a third interface, and a fourth interface. The first interface is lower than the liquid level of the photoresist in the first liquid storage tank, and the second interface, the third interface, and the fourth interface are higher than the liquid level of the photoresist in the first liquid storage tank; the suction device is connected to the first liquid storage tank from the first interface and is used to suck the photoresist stored in the first liquid storage tank; among them, the pressure in the photoresist bottle, the first liquid storage tank, and the connecting pipeline between the photoresist bottle and the first liquid storage tank is the first pressure, and the pressure in the suction device and the connecting pipeline between the suction device and the first liquid storage tank is the second pressure, and the first pressure is greater than the second pressure; a pressure balance pipeline connected to the second interface of the first liquid storage tank, and the pressure balance pipeline is used to provide pressure for the first liquid storage tank to push the photoresist in the first liquid storage tank to flow through the connecting pipeline to the suction device; among them, the photoresist bottle is connected to the first liquid storage tank from the third interface.

[0036] It can be seen that for the photoresist bubble elimination device provided by the embodiments of the present application, by setting a pressure balance pipeline connected to the second interface of the first liquid storage tank, when the suction device sucks the photoresist in the first liquid storage tank, the pressure balance pipeline can provide pressure for the first liquid storage tank to push the photoresist in the first liquid storage tank to flow through the connecting pipeline to the suction device. By balancing the pressure difference generated when the suction device sucks the photoresist through the pressure balance pipeline, the phenomenon of generating bubbles in the photoresist due to unbalanced pressure is avoided, thereby improving the product yield and reducing the adverse impact on the product.

[0037] Next, the technical solutions in the embodiments of the present application will be clearly and completely described in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments.

[0038] Refer to Figure 1 , Figure 1 which is a schematic diagram of the photoresist bubble elimination device provided by the embodiments of the present application. As Figure 1As shown, the photoresist bubble elimination device may include: a photoresist bottle 1, a first liquid storage tank 2, and a suction device 3 such as a pump, which are sequentially connected through a connecting pipeline. The photoresist bottle 1 and the first liquid storage tank 2 are used to store photoresist. Among them, the first liquid storage tank 2 has a first interface 21, a second interface 22, a third interface 23, and a fourth interface 24. The first interface 21 is lower than the liquid level of the photoresist in the first liquid storage tank 2, and the second interface 22, the third interface 23, and the fourth interface 24 are higher than the liquid level of the photoresist in the first liquid storage tank 2.

[0039] The suction device 3 is connected to the first liquid storage tank 2 from the first interface 21 and is used to suck the photoresist stored in the first liquid storage tank 2. Among them, the pressures in the photoresist bottle 1, the first liquid storage tank 2, and the connecting pipeline between the photoresist bottle 1 and the first liquid storage tank 2 are the first pressure, and the pressure of the suction device 3 and the connecting pipeline between the suction device 3 and the first liquid storage tank 2 is the second pressure. The first pressure is greater than the second pressure.

[0040] A pressure balance pipeline connected to the second interface 22 of the first liquid storage tank 2, and the pressure balance pipeline is used to provide pressure for the first liquid storage tank 2 to push the photoresist in the first liquid storage tank 2 to flow through the connecting pipeline to the suction device.

[0041] Among them, the photoresist bottle 1 is connected to the first liquid storage tank 2 from the third interface 23.

[0042] It can be seen that for the photoresist bubble elimination device provided in the embodiment of the present application, by setting a pressure balance pipeline connected to the second interface of the first liquid storage tank, when the suction device sucks the photoresist in the first liquid storage tank, the pressure balance pipeline can provide pressure for the first liquid storage tank to push the photoresist in the first liquid storage tank to flow through the connecting pipeline to the suction device. By balancing the pressure difference generated when the suction device sucks the photoresist through the pressure balance pipeline, the phenomenon of generating bubbles in the photoresist due to unbalanced pressure is avoided, thereby improving the product yield and reducing the adverse effects on the product.

[0043] In a specific implementation, the pressure balance pipeline may be provided with a first pressure regulating valve A1, a first pressure gauge B1, a check valve C, and an electromagnetic solenoid valve D. Among them, the first pressure regulating valve A1 is used to regulate the pressure in the pressure balance pipeline; the first pressure gauge B1 is used to detect the pressure value in the pressure balance pipeline, including but not limited to pointer pressure gauges, digital pressure gauges, etc.; the check valve C is used to prevent the photoresist in the first liquid storage tank 2 from flowing back, including but not limited to lift check valves, swing check valves, butterfly check valves, etc.; the electromagnetic solenoid valve D is used to control the on-off state of the pressure balance pipeline, including but not limited to direct-acting electromagnetic solenoid valves, step-by-step direct-acting electromagnetic solenoid valves, and pilot-operated electromagnetic solenoid valves, etc.

[0044] In this embodiment, the pressure balance pipeline may be filled with nitrogen to provide pressure for the first liquid storage tank. In other embodiments, other gases may also be filled into the pressure balance pipeline, and the present application does not limit this. When the suction device sucks the photoresist in the first liquid storage tank, the first electromagnetic solenoid valve D is opened, and nitrogen enters the first liquid storage tank 2 from the pressure balance pipeline to provide pressure for the first liquid storage tank, pushing the photoresist in the first liquid storage tank to flow through the connecting pipeline to the suction device. The pressure difference generated when the suction device sucks the photoresist is balanced through the pressure balance pipeline, thereby avoiding the phenomenon of bubbles generated in the photoresist due to unbalanced pressure, improving the product yield, and reducing the adverse effects on the product.

[0045] Among them, the pressure value of the pressure balance pipeline should not be too large or too small. In an alternative implementation, the pressure value of the pressure balance pipeline may be, for example, 75 kPa.

[0046] Continue to refer to Figure 1 , the photoresist bubble elimination device may further include: an air inlet pipeline connected to the photoresist bottle 1, and the air inlet pipeline is used to provide pressure for the photoresist bottle 1 to push the photoresist in the photoresist bottle 1 to flow through the connecting pipeline to the first liquid storage tank 2.

[0047] In this embodiment, the air inlet pipeline may be filled with nitrogen to provide pressure for the photoresist bottle. In other embodiments, other gases may also be filled into the air inlet pipeline, and the present application does not limit this.

[0048] Among them, the pressure value of the air inlet pipeline should not be too large or too small. In an alternative implementation, the pressure value of the air inlet pipeline may be, for example, 75 kPa.

[0049] In an alternative implementation, a second pressure regulating valve A2, a second pressure gauge B2, and a first on-off valve 4 are provided in the intake pipeline; wherein, the second pressure regulating valve A2 is used to regulate the pressure in the intake pipeline; the second pressure gauge B2 is used to detect the pressure value in the intake pipeline, including but not limited to pointer pressure gauges, digital pressure gauges, etc.; the first on-off valve 4 is used to control the on-off state of the intake pipeline.

[0050] In an alternative implementation, a second on-off valve 5 may be provided in the connecting pipeline between the photoresist bottle 1 and the first liquid storage tank 2; wherein, the second on-off valve 5 is used to control the on-off state of the connecting pipeline between the photoresist bottle 1 and the first liquid storage tank 2. For example, when the second on-off valve 5 is opened, the connecting pipeline between the photoresist bottle 1 and the first liquid storage tank 2 is open, and at this time, the photoresist in the photoresist bottle 1 can flow to the first liquid storage tank 2 through the connecting pipeline; when the second on-off valve 5 is closed, the connecting pipeline between the photoresist bottle 1 and the first liquid storage tank 2 is closed, and at this time, the photoresist in the photoresist bottle 1 cannot flow to the first liquid storage tank 2 through the connecting pipeline.

[0051] Continue to refer to Figure 1 , the photoresist bubble elimination device may further include: a discharge pipeline connected to the fourth interface 24 of the first liquid storage tank 2, and the discharge pipeline is used to discharge the photoresist containing bubbles in the first liquid storage tank 2; wherein, a third on-off valve 6 is provided in the discharge pipeline to control the on-off state of the discharge pipeline. For example, when the third on-off valve 6 is opened, the discharge pipeline is open, and at this time, the photoresist containing bubbles in the first liquid storage tank 2 can be discharged through the discharge pipeline; when the third on-off valve 6 is closed, the discharge pipeline is closed, and at this time, the photoresist containing bubbles in the first liquid storage tank 2 cannot be discharged through the discharge pipeline.

[0052] Continue to refer to Figure 1 , the photoresist bubble elimination device may further include: a vent pipeline connected to the intake pipeline, which is used to relieve pressure on the photoresist bottle; a vent valve 7 located in the vent pipeline, which is used to control the on-off state of the vent pipeline. For example, when the photoresist bottle is in a high-pressure state (for example, when it is necessary to open or replace the photoresist bottle), the vent valve 7 is opened to relieve pressure on the photoresist bottle through the vent pipeline.

[0053] In an alternative implementation, a filter 8 and a second liquid storage tank 9 may be provided between the first liquid storage tank 2 and the suction device 3; wherein, the filter 8 is used to filter the bubbles in the photoresist; the second liquid storage tank 9 is used to store the filtered photoresist. By the filter, a small amount of fine bubbles that may still remain can be discharged to further filter out the bubbles in the photoresist and ensure the quality of the photoresist.

[0054] Continue to refer toFigure 1 The photoresist bubble elimination device may further include an output pipeline connected to the suction device 3. A nozzle 10 is provided at one end of the output pipeline away from the suction device 3 for coating the photoresist. In an alternative implementation, the output pipeline may be provided with a flow sensor (not shown in the figure) to detect the flow rate of the photoresist in the output pipeline, so as to ensure that the conveying rate of the photoresist is within a predetermined rate range, avoid the photoresist being conveyed too fast or too slow, ensure the nozzle 10 sprays the photoresist smoothly, and ensure uniform coating.

[0055] It can be seen that for the photoresist bubble elimination device provided by the embodiments of the present application, by providing a pressure balance pipeline connected to the second interface of the first liquid storage tank, when the suction device sucks the photoresist in the first liquid storage tank, the pressure balance pipeline can provide pressure for the first liquid storage tank, and push the photoresist in the first liquid storage tank to flow through the connection pipeline to the suction device. By balancing the pressure difference generated when the suction device sucks the photoresist through the pressure balance pipeline, the phenomenon of generating bubbles in the photoresist due to unbalanced pressure is avoided, thereby improving the product yield and reducing the adverse effects on the product.

[0056] The embodiments of the present application further provide a lithography system, and the lithography system includes the above-mentioned photoresist bubble elimination device.

[0057] The above describes multiple embodiment solutions provided by the embodiments of the present application. The optional methods described in each embodiment solution can be combined and cross-referenced with each other without conflict, so as to extend a variety of possible embodiment solutions, and these can all be considered as the embodiment solutions disclosed and made public by the embodiments of the present application.

[0058] Although the embodiments of the present application are disclosed as above, the present application is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present application. Therefore, the protection scope of the present application should be subject to the scope defined by the claims.

Claims

1. A photoresist bubble elimination device, characterized in that, Comprising: A photoresist bottle, a first liquid storage tank, and a suction device connected in sequence through a connecting pipeline. The photoresist bottle and the first liquid storage tank are used for storing photoresist. Among them, the first liquid storage tank has a first interface, a second interface, a third interface, and a fourth interface. The first interface is lower than the liquid level of the photoresist in the first liquid storage tank, and the second interface, the third interface, and the fourth interface are higher than the liquid level of the photoresist in the first liquid storage tank; The suction device is connected to the first liquid storage tank from the first interface and is used for sucking the photoresist stored in the first liquid storage tank; among them, the pressure in the photoresist bottle, the first liquid storage tank, and the connecting pipeline between the photoresist bottle and the first liquid storage tank is a first pressure, and the pressure of the suction device and the connecting pipeline between the suction device and the first liquid storage tank is a second pressure. The first pressure is greater than the second pressure; A pressure balance pipeline connected to the second interface of the first liquid storage tank. The pressure balance pipeline is used to provide pressure for the first liquid storage tank to push the photoresist in the first liquid storage tank to flow through the connecting pipeline to the suction device; Among them, the photoresist bottle is connected to the first liquid storage tank from the third interface.

2. The photoresist bubble elimination device according to claim 1, characterized in that, The pressure balance pipeline is provided with a first pressure regulating valve, a first pressure gauge, a check valve, and an electromagnetic switch valve; among them, the first pressure regulating valve is used to regulate the pressure in the pressure balance pipeline; the first pressure gauge is used to detect the pressure value in the pressure balance pipeline; the check valve is used to prevent the photoresist in the first liquid storage tank from flowing back; the electromagnetic switch valve is used to control the on-off state of the pressure balance pipeline.

3. The photoresist bubble elimination device according to claim 1, characterized in that, Also comprising: An air inlet pipeline connected to the photoresist bottle. The air inlet pipeline is used to provide pressure for the photoresist bottle to push the photoresist in the photoresist bottle to flow through the connecting pipeline to the first liquid storage tank.

4. The photoresist bubble elimination device according to claim 3, wherein The air inlet pipeline is provided with a second pressure regulating valve, a second pressure gauge, and a first switch valve; among them, the second pressure regulating valve is used to regulate the pressure in the air inlet pipeline; the second pressure gauge is used to detect the pressure value in the air inlet pipeline; the first switch valve is used to control the on-off state of the air inlet pipeline.

5. The photoresist bubble elimination device according to claim 4, characterized in that, Also comprising: A vent pipeline connected to the air inlet pipeline for venting the photoresist bottle; A vent valve located in the vent pipeline for controlling the on-off state of the vent pipeline.

6. The photoresist bubble elimination device according to claim 1, wherein A second switch valve is provided in the connecting pipeline between the photoresist bottle and the first liquid storage tank; among them, the second switch valve is used to control the on-off state of the connecting pipeline between the photoresist bottle and the first liquid storage tank.

7. The photoresist bubble elimination device according to claim 1, wherein Also comprising: A discharge pipeline connected to the fourth interface of the first liquid storage tank. The discharge pipeline is used to discharge the photoresist containing bubbles in the first liquid storage tank; among them, the discharge pipeline is provided with a third switch valve for controlling the on-off state of the discharge pipeline.

8. The photoresist bubble elimination device according to claim 1, wherein A filter and a second liquid storage tank are provided between the first liquid storage tank and the suction device; among them, the filter is used to filter the bubbles in the photoresist; the second liquid storage tank is used to store the filtered photoresist.

9. The photoresist bubble elimination device according to claim 1, characterized in that, Also comprising: An output pipeline connected to the suction device, and a nozzle is provided at one end of the output pipeline away from the suction device for coating photoresist.

10. A lithography system, characterized in that, The lithography system includes the photoresist bubble elimination device according to any one of claims 1-9.

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