Monitoring system for rapid annealing equipment

Abstract

The utility model discloses a monitoring system for rapid annealing equipment, which relates to the technical field of heat treatment monitoring, and is characterized in that the monitoring system comprises a temperature sensor and a relay module which are arranged inside the rapid annealing equipment, and a recorder arranged outside the rapid annealing equipment; the temperature sensor is connected with the recorder; the recorder comprises a controller, and the controller is used for setting a temperature threshold range formed by an upper limit temperature threshold and a lower limit temperature threshold; and the controller is connected with the relay module, and sends a control signal for turning off the rapid annealing equipment to the relay module when the real-time temperature data exceed the temperature threshold range. The rapid annealing equipment can be externally connected with the recorder to record the temperature change data in the production process in real time, the upper limit threshold value and the lower limit threshold value of the temperature are monitored, the heat treatment equipment is controlled to be shut down in time when the threshold values are exceeded, the production safety is improved, and the temperature change data in the production process can be traced conveniently.

Description

Technical Field

[0001] The utility model relates to the technical field of heat treatment monitoring, and particularly to a monitoring system for a rapid annealing device. Background Art

[0002] In the process of manufacturing semiconductor devices, it is necessary to monitor the internal temperature of a rapid annealing device in real time and promptly alarm in case of abnormal conditions to avoid product scrapping. The direct temperature measurement and monitoring system of the existing rapid annealing device includes a temperature control system, a temperature control interlock, gas / power control, a main control unit, and a display. For low-temperature processes, a directly contacting thermocouple (hereinafter referred to as TC) needs to be installed on the surface of the temperature control wafer of the silicon wafer (Siwafer). The temperature signal is transmitted to the temperature control system through the millivolt change of the thermocouple and processed in the main control unit of the rapid annealing device. However, only an upper temperature threshold is set in the main control unit of the existing rapid annealing device. Only when the real-time temperature data of the thermocouple received by the main control unit exceeds the upper temperature threshold, the heating will stop; the damage of the TC or the low-temperature use scenario is not considered. When the TC is damaged, the real-time temperature data obtained by the main control unit is 0 and does not exceed the internally set upper temperature threshold. Therefore, the main control unit will neither alarm nor stop heating, which may cause the internal temperature of the rapid annealing device to continue heating when it far exceeds the threshold, resulting in ultra-high temperature inside the rapid annealing device, easily causing the melting of the temperature control wafer of the silicon wafer, and the melting and evaporation products of the silicon wafer will adhere to the product and cause product scrapping. Therefore, the existing rapid annealing device cannot monitor the lower temperature, cannot effectively monitor in case of TC damage, cannot realize the monitoring and control of the lower temperature, and affects production safety.

[0003] The rapid annealing device in the prior art can only display the temperature change based on its own display. The main control unit will display the average temperature data after one power-on and power-off based on the production process data on the machine table, and cannot objectively show the temperature change during the whole production process. Therefore, the whole production process cannot be traced back. Summary of the Utility Model

[0004] The utility model provides a monitoring system for a rapid annealing device, which can externally connect a recorder to the rapid annealing device to record the temperature change data during the production process in real time, monitor the upper and lower thresholds of the temperature, realize the timely control of the shutdown of the heat treatment device when the threshold is exceeded, improve production safety, and facilitate the tracing of the temperature change data during the production process.

[0005] The utility model provides a monitoring system for a rapid annealing device, which includes a temperature sensor and a relay module arranged inside the rapid annealing device, and a recorder arranged outside the rapid annealing device; the temperature sensor is connected to the recorder and is used to send the real-time temperature data inside the rapid annealing device to the recorder; the recorder includes a controller with a threshold judgment function, and the controller is used to set a temperature threshold range composed of an upper temperature threshold and a lower temperature threshold; the controller is connected to the relay module, and when the controller judges that the real-time temperature data exceeds the temperature threshold range, it sends a control signal for shutting down the rapid annealing device to the relay module.

[0006] In some embodiments, the recorder is connected to the rapid annealing device and is used to receive the real-time gas flow rate data of the rapid annealing device, and the controller is further used to set a gas flow rate threshold range composed of an upper gas flow rate threshold and a lower gas flow rate threshold; when the controller judges that the real-time gas flow rate data exceeds the gas flow rate threshold range, it sends a control signal for shutting down the rapid annealing device to the relay module.

[0007] In some embodiments, the relay module includes an over-temperature relay module and an over-flow relay module; the over-temperature relay module is used to execute the control signal issued when the controller judges over-temperature; the over-flow relay module is used to execute the control signal issued when the controller judges over-temperature.

[0008] In some embodiments, an alarm is further included and arranged inside the rapid annealing device; the alarm is connected to and controlled by the relay module and starts to alarm based on the conduction of the relay module.

[0009] In some embodiments, the rapid annealing device includes a main control unit connected to the temperature sensor, and the main control unit is used to receive the production process data of the rapid annealing device, and the production process data includes the start and stop times of the rapid annealing device, the real-time temperature data inside the rapid annealing device, and the real-time gas flow rate data of the rapid annealing device.

[0010] In some embodiments, the recorder is connected to the main control unit and is used to receive the real-time temperature data and the real-time gas flow rate data in the production process data of the rapid annealing device, and continuously record the above data.

[0011] In some embodiments, a data diagnosis system is further included; the data diagnosis system is connected to the recorder and the main control unit; the data diagnosis system is configured to receive the real-time temperature data continuously recorded by the recorder and the start and stop times of the rapid annealing equipment sent by the main control unit; the data diagnosis system is configured to process the above data and output the production process temperature data during the process from the start to the stop of the rapid annealing equipment.

[0012] In some embodiments, the temperature sensor is a thermocouple for realizing direct contact measurement.

[0013] In some embodiments, the recorder is a paperless recorder with a display unit, and the paperless recorder is configured to display the temperature data of the rapid annealing equipment in real time through the display unit.

[0014] Compared with the prior art, one or more of the above embodiments may have the following advantages or beneficial effects:

[0015] A monitoring system for a rapid annealing equipment provided by the present utility model, by externally connecting a recorder to the rapid annealing equipment and using the recorder to record the temperature data of the rapid annealing equipment in real time, realizes the recording of the temperature data throughout the production process, and combines the temperature threshold range composed of the upper temperature threshold and the lower temperature threshold set by the controller to be able to monitor the upper and lower limits of the temperature. Thus, when the detected temperature exceeds the upper or lower limit of the temperature threshold range, the controller can send a control signal to the relay module to turn off the rapid annealing equipment in a timely manner, stop heating, protect the rapid annealing equipment, and avoid the melting of the silicon wafer temperature control sheet. Even in the case of TC damage, the lower limit temperature can be monitored and controlled to ensure production safety. Moreover, the recorder can record the temperature data of the rapid annealing equipment in real time, can display the temperature changes of the entire production process, and realizes the traceability of the entire production process.

[0016] In addition, by setting the gas flow threshold range, it is possible to synchronously monitor whether the gas flow data of the rapid annealing equipment is normal to ensure that the product is produced in a normal protective gas environment. If the gas flow data exceeds the gas flow threshold range, it is easy to cause product defects. Therefore, in the technical solution of the present application, the heat treatment equipment is turned off in a timely manner through the controller to control the relay module, so as to facilitate the maintenance by the staff;

[0017] Meanwhile, when the rapid annealing equipment is turned off at ultra-high temperature or low temperature, an alarm can also be provided to alarm, so as to facilitate the rapid maintenance and processing by the staff and improve the service life of the heat treatment equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Hereinafter, the present utility model will be described in more detail based on embodiments and with reference to the drawings:

[0019] Figure 1 Schematic diagram of the connection relationship of a monitoring system for a rapid annealing device provided by an embodiment of the present utility model;

[0020] Figure 2 Schematic diagram of a further connection relationship of the monitoring system provided by an embodiment of the present utility model;

[0021] Figure 3 Exemplary block diagram of a relay module in an embodiment of the present utility model;

[0022] Figure 4 Specific circuit schematic diagram of the monitoring system in the second embodiment of the present utility model.

[0023] In the drawings, the same components are denoted by the same reference numerals, and the drawings are not drawn to actual scale.

[0024] In the figure, 1, temperature sensor; 2, relay module; 21, over-temperature relay module; 22, over-flow relay module; 23, alarm relay module; 3, recorder; 31, controller; 311, temperature threshold range; 312, gas flow threshold range; 4, alarm; 5, main control unit; 6, data diagnosis system. Detailed implementation manners

[0025] In order to enable those skilled in the art to better understand the technical solutions disclosed by the present utility model, and to fully understand and implement how the present utility model applies technical means to solve technical problems and achieve corresponding technical effects, the following will clearly and completely describe the technical solutions in the embodiments of the present utility model with reference to the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all of the embodiments. The embodiments of the present utility model and each feature in the embodiments can be combined with each other without conflict, and the formed technical solutions are all within the protection scope of the present utility model. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0026] It should be noted that the terms "first", "second", etc. in the specification, claims and above-mentioned drawings disclosed by the present utility model are used to distinguish similar objects, and do not necessarily have to be used to describe a specific order or sequence. It should be understood that the data used in this way can be interchanged under appropriate circumstances, so that the embodiments disclosed by the present utility model described here can be implemented in an order other than those illustrated or described here. In addition, the terms "comprising" and "having" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device comprising a series of steps or units does not necessarily have to be limited to those steps or units clearly listed, but may include other steps or units not clearly listed or inherent to these processes, methods, products or devices.

[0027] It should be noted that the steps shown in the flowchart of the drawings can be executed in a computer system such as a set of computer-executable instructions, and although the logical order is shown in the flowchart, in some cases, the steps shown or described can be executed in a different order than here.

[0028] With the rapid development of semiconductor technology, as the basic material of semiconductor devices, the market demand for wafer chips is increasing. The applications of semiconductor devices are also becoming more and more extensive, and more stringent requirements are imposed on semiconductor equipment.

[0029] During the preparation process of semiconductor devices, it is necessary to monitor the internal temperature of the rapid annealing equipment in real time and alarm in time for abnormal situations to avoid product scrapping. The direct temperature measurement and monitoring system of the rapid annealing equipment in the prior art includes a temperature control system, a temperature control interlock, gas / power control, a main control unit, and a display. For low-temperature processes, a directly contacting thermocouple (hereinafter referred to as TC) needs to be installed on the surface of the silicon wafer temperature control chip, and the temperature signal is transmitted to the temperature control system through the millivolt change of the thermocouple and processed in the main control unit of the rapid annealing equipment.

[0030] In the prior art, only an upper temperature threshold is set in the main control unit of the rapid annealing equipment. Only when the real-time temperature data of the thermocouple received by the main control unit exceeds the upper temperature threshold, the heating will stop; the scenarios of TC damage or low-temperature use are not considered. The thermocouple of the rapid annealing equipment is in direct contact with the silicon wafer temperature control chip and is the only signal source of the temperature control system. If the TC is damaged during the production process, the temperature signal will be 0. At this time, the real-time temperature data obtained by the main control unit is 0 and does not exceed the internally set upper temperature threshold. Therefore, the main control unit will not alarm nor stop heating, which may cause the internal temperature of the rapid annealing equipment to continue heating far beyond the threshold, resulting in an ultra-high temperature inside the rapid annealing equipment, easily causing the silicon wafer temperature control chip to melt, and the molten and evaporated substances of the silicon wafer will adhere to the product and cause the product to be scrapped. Therefore, the existing rapid annealing equipment cannot monitor the lower temperature, cannot achieve effective monitoring in the case of TC damage, cannot achieve the monitoring and control of the lower temperature, and affects the production safety.

[0031] In addition, the rapid annealing equipment in the prior art can only display the temperature change based on its own display. The main control unit will display the average temperature data after one power-on and power-off on the machine table according to the production process data, and cannot objectively show the temperature change of the entire production process. Therefore, the entire production process cannot be traced back.

[0032] In order to be able to carry out real-time monitoring of the heating process of the rapid annealing equipment and alarm for abnormalities to avoid product scrapping, the present utility model designs the following novel and creative structured devices:

[0033] An embodiment disclosed by the present utility model provides a monitoring system for a rapid annealing device, which includes a temperature sensor and a relay module disposed inside the rapid annealing device, and a recorder disposed outside the rapid annealing device; the temperature sensor is connected to the recorder and is used to send real-time temperature data inside the rapid annealing device to the recorder; the recorder includes a controller with a threshold judgment function, and the controller is used to set a temperature threshold range composed of an upper temperature threshold and a lower temperature threshold; the controller is connected to the relay module, and when the controller determines that the real-time temperature data exceeds the temperature threshold range, it sends a control signal for shutting down the rapid annealing device to the relay module. By externally connecting a recorder to the rapid annealing device and using the recorder to record the temperature data of the rapid annealing device in real time, the temperature data throughout the production process can be recorded. Combining with the temperature threshold range composed of the upper temperature threshold and the lower temperature threshold set by the controller, the upper and lower limits of the temperature can be monitored. Thus, when the detected temperature exceeds the upper or lower limit of the temperature threshold range, the controller can send a control signal for shutting down the rapid annealing device to the relay module in a timely manner to stop the equipment, thereby stopping heating, protecting the rapid annealing device, and preventing the silicon wafer temperature control sheet from melting. Even in the case of TC damage, the lower limit temperature can be monitored and controlled to ensure production safety. Moreover, the recorder can record the temperature data of the rapid annealing device in real time, display the temperature changes during the entire production process, and trace the entire production process.

[0034] Example 1

[0035] Figure 1 It is a schematic structural diagram of a monitoring system for a rapid annealing device provided by an embodiment disclosed by the present utility model.

[0036] As Figure 1 shown, a monitoring system for a rapid annealing device includes a temperature sensor 1 and a relay module 2 disposed inside the rapid annealing device, and a recorder 3 disposed outside the rapid annealing device. Among them, the temperature sensor 1 is used to collect the temperature data of the rapid annealing device in real time, and the relay module 2 is used to control the start and stop of the rapid annealing device; the recorder 3 is connected to the temperature sensor 1 and is used to receive the real-time temperature data inside the rapid annealing device fed back by the temperature sensor 1. The recorder 3 includes a controller 31 with a threshold judgment function. The controller 31 is used to set a temperature threshold range 311 composed of an upper temperature threshold and a lower temperature threshold, and the controller 31 is connected to the relay module 2. When the controller 31 determines that the real-time temperature data exceeds the temperature threshold range 311, it sends a control signal for shutting down the rapid annealing device to the relay module 2.

[0037] Among them, the rapid annealing equipment includes a main control unit 5 connected to the temperature sensor 1. The main control unit is used to receive the production process data of the rapid annealing equipment, and the production process data includes the start and stop times of the rapid annealing equipment, the real-time temperature data inside the rapid annealing equipment, and the real-time gas flow data of the rapid annealing equipment, so as to facilitate the recording of relevant production process data through the main control unit.

[0038] Furthermore, a recorder 3 is connected to the main control unit 5, which is used to receive the real-time temperature data and real-time gas flow data in the production process data of the rapid annealing equipment, and continuously record the above data, facilitating the recorder 3 to further obtain the real-time temperature data inside the rapid annealing equipment and the real-time gas flow data of the rapid annealing equipment, so as to realize the continuous recording of multiple data.

[0039] Regarding temperature monitoring, only an upper temperature threshold is set in the main control unit 5. When the main control unit 5 receives that the real-time temperature data inside the rapid annealing equipment exceeds the upper temperature threshold, a control signal for shutting down the rapid annealing equipment is sent to the relay module 2. For the monitoring of the temperature upper limit, it can be directly realized through the main control unit 5 in the existing rapid annealing equipment, so as to directly control the relay module 2 to shut down the rapid annealing equipment when the upper temperature threshold is exceeded, improve the response speed of the temperature upper limit monitoring, and protect production safety.

[0040] Furthermore, the temperature sensor 1 is a thermocouple for direct contact measurement; the input end of the recorder 3 is connected to the extended output line of the thermocouple, so as to facilitate the acquisition of the temperature data continuously collected by the temperature sensor 1.

[0041] In some embodiments, as Figure 2 shown, the monitoring system further includes a data diagnosis system 6; the data diagnosis system 6 is arranged outside the rapid annealing equipment and is signal-connected to the recorder 3 and the main control unit 5. The data diagnosis system 6 is used to receive the real-time temperature data continuously recorded by the recorder 3, and the start and stop times of the rapid annealing equipment sent by the main control unit 5; the data diagnosis system 6 is used to process the above data so that the real-time temperature data corresponds to the production time of the rapid annealing equipment, and thus output the production process temperature data during the process of the rapid annealing equipment from start to stop. By cooperating with the recorder 3 through the data diagnosis system 6, the temperature change during the entire production process of the rapid annealing equipment can be corresponded with time, recorded and displayed. Therefore, not only can the average value of the temperature data be displayed through the main control unit of the rapid annealing equipment, but also the temperature change during the entire production process can be displayed by using the data diagnosis system 6, realizing the traceability of the entire production process.

[0042] Among them, the data diagnosis system 6 is signal-connected to the recorder 3 and the main control unit 5. An RS232 relay converter can be used, and data acquisition is performed through the Moudle BUS protocol.

[0043] In some embodiments, the input end of the recorder 3 is connected to the rapid annealing equipment for receiving real-time gas flow rate data of the rapid annealing equipment. The controller 31 of the recorder 3 is further configured to set a gas flow rate threshold range 312 composed of an upper limit gas flow rate threshold and a lower limit gas flow rate threshold. When the controller 31 determines that the real-time gas flow rate data exceeds the gas flow rate threshold range 312, a control signal for shutting down the rapid annealing equipment is sent to the relay module 2. By receiving the real-time gas flow rate data and temperature data of the rapid annealing equipment through the recorder 3, the upper and lower limits of the gas flow rate and temperature can be monitored simultaneously, and when the threshold range is exceeded, the relay module 2 can be timely controlled to shut down the rapid annealing equipment to ensure production safety, and it is convenient for the staff to directly view the temperature and gas flow rate data on the recorder 3, improving the operation convenience.

[0044] For gas flow rate monitoring, a gas flow rate threshold range composed of an upper limit gas flow rate threshold and a lower limit gas flow rate threshold is also set in the main control unit 5. When the main control unit determines that the real-time gas flow rate data exceeds the gas flow rate threshold range, a control signal for shutting down the rapid annealing equipment is sent to the relay module 2. By performing dual monitoring of the gas flow rate through the main control unit 5 and the recorder 3, the reliability of gas flow rate monitoring can be improved, accurately controlling the gas flow rate, and ensuring the production effect of the product.

[0045] In this embodiment, the gas flow rate of the rapid annealing equipment refers to the conveying flow rate of the protective gas. The protective gas includes nitrogen, which is used to make the product react in a pure nitrogen environment in the heat treatment equipment, ensuring the production quality of the product. Based on this, in this embodiment, the lower limit of the gas flow rate can be mainly monitored to avoid insufficient protective gas in the heat treatment equipment, ensuring that the product is always in a pure nitrogen environment during the production process. Once the gas flow rate data exceeds the gas flow rate threshold range 312, the controller 31 controls the relay module 2 to shut down the rapid annealing equipment, so that the staff can quickly repair it, ensuring the production quality of the product.

[0046] According to the embodiments disclosed by the present utility model, the recorder 3 can be, for example, a paperless recorder 3 with a display unit. The paperless recorder 3 uses the display unit to display the content related to the heat treatment equipment in real time. For example, it can receive the temperature data feedback by the temperature sensor 1 and the gas flow rate data of the rapid annealing equipment in real time and display them. That is, the paperless recorder 3 uses the display unit to display the temperature data of the rapid annealing equipment in real time, so that the staff can view it at any time, solving the problem that the traditional rapid annealing equipment cannot record data in real time, and this monitoring system can be independently installed outside the rapid annealing equipment for connection and can be directly applied, improving the use convenience.

[0047] In some embodiments, as Figure 1 shown, in order to conveniently prompt the staff that the rapid annealing equipment has an abnormality, the monitoring system further includes an alarm 4 disposed inside the rapid annealing equipment; the alarm 4 is connected to and controlled by the relay module 2, and is activated based on the conduction of the relay module 2. In this embodiment, when the monitoring data of the recorder 3 exceeds the threshold range, the controller 31 issues a control signal to shut down the rapid annealing equipment to the relay module 2. At this time, after the relay module 2 shuts down the rapid annealing equipment, it synchronously conducts the alarm 4 to activate the alarm 4 for alarm prompting to alert the staff, which is conducive to the staff to quickly perform maintenance and processing.

[0048] In some embodiments, as shown in FIGS. 1 and Figure 3 shown, the relay module 2 includes an over-temperature relay module 21 and an over-flow relay module 22; the over-temperature relay module 21 is used to execute the control signal issued by the controller 31 when it determines over-temperature; the over-flow relay module 22 is used to execute the control signal issued by the controller 31 when it determines over-temperature. Through the settings of the over-temperature relay module 21 and the over-flow relay module 22, the two situations of over-temperature and over-flow can be distinguished, so as to shut down for the corresponding over-threshold control signal, which is convenient for the staff to perform corresponding maintenance and processing.

[0049] Specifically, for example, the control terminals of the over-temperature relay module 21 and the over-flow relay module 22 can both be connected to the controller 31, and are used to switch their own states according to the control signal issued by the controller 31. In this embodiment, the over-temperature relay module 21 and the over-flow relay module 22 are connected in series. By controlling respectively according to the over-temperature signal and the over-flow signal, power-off processing can be performed respectively, and when the staff repairs and restores, the corresponding relay module 2 is controlled to close and conduct the circuit. By controlling respectively, it is convenient for the staff to distinguish the monitoring alarm information for corresponding processing and reduce the failure rate.

[0050] Among them, the relay module 2 further includes an alarm relay module 23. When the over-temperature relay module 21 and / or the over-flow relay module 22 execute the control signal to shut down the rapid annealing equipment, the alarm relay module 23 conducts the alarm 4 to provide an alarm prompt.

[0051] In some embodiments, the alarm 4 includes an over-temperature alarm module and an over-flow alarm module, and both can use an audible and visual alarm device for alarm. By setting different colors of flashes and / or different audible alarm voices for the over-temperature alarm module and the over-flow alarm module, different alarm information is provided, which is convenient for the staff to distinguish.

[0052] In some embodiments, the signal processing system is used to transmit signals between the recorder 3 and the rapid annealing device and the temperature sensor 1. Specifically, for example, the signal processing system uses an RS232 relay converter and captures data through the Modle BUS protocol.

[0053] The disclosed embodiment of the utility model provides a monitoring system for rapid annealing equipment. By connecting an external recorder to the rapid annealing equipment, the recorder is used to record the temperature data of the rapid annealing equipment in real time, so as to realize the recording of the temperature data of the whole production process. In combination with the temperature threshold range composed of the upper temperature threshold and the lower temperature threshold set by the controller, the upper and lower temperature limits can be monitored. Therefore, when the detected temperature exceeds the upper or lower limit of the temperature threshold range, the controller can send a control signal to shut down the rapid annealing equipment to the relay module, and the equipment can be shut down in time, so as to stop heating, protect the rapid annealing equipment, and avoid melting of the silicon wafer temperature control piece. Even when the TC is damaged, the lower temperature limit monitoring and control can be performed to ensure production safety. In addition, the recorder can record the temperature data of the rapid annealing equipment in real time, and can show the temperature changes of the whole production process, so as to realize the traceability of the whole production process.

[0054] By connecting an external recorder 3 to the rapid annealing device, the recorder is used to record the temperature data of the rapid annealing device in real time, and the data is recorded throughout the process, so that the controller 31 is used to set the temperature threshold range 311 composed of the upper temperature threshold and the lower temperature threshold for monitoring, and the upper and lower temperature limits can be monitored to solve the problem that the rapid annealing device has no lower temperature monitoring. When the detected temperature exceeds the upper or lower limit of the temperature threshold range, the controller 31 can send a control signal for shutting down the rapid annealing device to the relay module 2, so that the heat treatment equipment is shut down through the relay module 2, thereby stopping heating, protecting the rapid annealing equipment, and avoiding melting of the silicon wafer temperature control piece. Even in the case of TC damage, the lower limit temperature can be monitored and controlled to avoid continuous heating and ensure production safety. The recorder can record the temperature data of the rapid annealing device in real time, and can show the temperature changes of the entire production process, so as to realize the traceability of the entire production process. At the same time, when shutting down the heat treatment equipment, the relay module 2 turns on the alarm 4, and the alarm 4 is enabled to alarm, so as to provide a warning to the staff and improve production safety. The present application scheme can also synchronously monitor whether the gas flow data of the rapid annealing equipment is normal to ensure that the product is produced in a normal protective gas environment. If the gas flow data exceeds the gas flow threshold range 312, it is easy to cause product defects. Therefore, the controller 31 is used to control the relay module 2 to shut down the rapid annealing equipment in time, and production is stopped to facilitate maintenance by the staff. At the same time, the alarm 4 is provided to alarm, so that the staff can quickly carry out maintenance and increase the service life of the rapid annealing equipment.

[0055] Example 2

[0056] Based on the above embodiments, this embodiment provides a circuit example of the monitoring system.

[0057] As Figure 4 shown is a schematic diagram of the connection relationship between the monitoring system and the heat treatment equipment. Figure 4 In it, EAP represents the controller of the recorder, GAS CONTROL represents the gas flow controller of the rapid annealing equipment, ATP represents the protection system of the rapid annealing equipment, that is, it is used to send the gas flow data and temperature data of the heat treatment equipment to the recorder, RMS represents the temperature control system of the rapid annealing equipment; P1 and P2 represent data interfaces; TC represents the temperature sensor of the rapid annealing equipment.

[0058] Among them, the overtemperature relay module includes the heat treatment equipment temperature relay K18, the overtemperature alarm interlock relay K2, and the external relay K1. Specifically, as Figure 4 shown, intercept the AC24V N of the overtemperature alarm relay coil and connect it to one end of the normally closed terminal of the external relay K1, and the other end is connected to the K18 coil; one end of the K1 coil is connected to AC24V L, and the other end is connected to one end of the paperless recorder K2, and the other end of K2 is connected to AV24V N. When the equipment is lower than the lower limit (the displayed temperature in the case of TC damage), trigger the paperless recorder relay K2 to turn on. The normally open point of K2 becomes normally closed, the K1 relay is attracted, and the normally closed point of K1 becomes normally open; the K18 coil loses power, K2 closes the circuit, the overtemperature alarm is triggered, and the machine stops operating to avoid further deterioration of the abnormality.

[0059] The over-flow relay module includes the heat treatment equipment gas flow relay K14 and the over-flow alarm interlock relay K3. Among them, the normally closed terminal of K14 is connected to the circuit where the heat treatment equipment is located. The normally open terminal of K14 is connected to AC24V L, and the other end is connected to one end of the paperless recorder K3. The other end of K3 is connected to AV24V N. When the equipment exceeds the upper or lower limit of the gas flow threshold range, trigger the paperless recorder relay K3 to turn on. The normally open point of K3 becomes normally closed, the normally closed point of the K14 relay becomes normally open, and the normally open point of K14 becomes normally closed; the K14 coil loses power, K3 closes the circuit, the over-flow alarm is triggered, and the machine stops operating to avoid further deterioration of the abnormality.

[0060] In the embodiments provided by the present utility model, it should be understood that the disclosed devices and methods can also be implemented in other ways. The device embodiments described above are merely illustrative. For example, the flowcharts and block diagrams in the accompanying drawings show the possible architectures, functions, and operations of devices, methods, and computer program products according to multiple embodiments disclosed by the present utility model. In this regard, each block in the flowchart or block diagram may represent a module, a program segment, or a part of code, and the above-mentioned module, program segment, or part of code includes one or more executable instructions for implementing the specified logical function. It should also be noted that in some alternative implementations, the functions marked in the blocks may occur in a different order than that marked in the accompanying drawings. For example, two consecutive blocks may actually be executed substantially in parallel, and they may sometimes be executed in the reverse order, depending on the functions involved. It should also be noted that each block in the block diagram and / or flowchart, as well as the combination of blocks in the block diagram and / or flowchart, can be implemented by a dedicated hardware-based system that performs the specified functions or actions, or can be implemented by a combination of dedicated hardware and computer instructions.

[0061] It should be noted that in the present utility model, the terms "include", "comprise", or any other variant thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or device including a series of elements not only includes those elements but also includes other elements not explicitly listed, or further includes elements inherent to such process, method, article, or device. Without further limitation, the element limited by the statement "including one..." does not exclude the existence of additional identical elements in the process, method, article, or device including the element.

[0062] Although the disclosed embodiments of the present utility model are as above, the above content is only an embodiment adopted for the convenience of understanding the present disclosure, and is not intended to limit the present disclosure. Any person skilled in the art within the technical field to which the present disclosure pertains may make any modifications and changes in the form of implementation and details without departing from the spirit and scope disclosed by the present utility model. However, the scope of patent protection of the present utility model shall still be subject to the scope defined by the appended claims.

Claims

1. A monitoring system for a rapid annealing device, characterized in that, It includes a temperature sensor and a relay module disposed inside the rapid annealing device, and a recorder disposed outside the rapid annealing device; the temperature sensor is connected to the recorder and is used to send the real-time temperature data inside the rapid annealing device to the recorder; the recorder includes a controller with a threshold judgment function, and the controller is used to set a temperature threshold range composed of an upper temperature threshold and a lower temperature threshold; the controller is connected to the relay module, and when the controller judges that the real-time temperature data exceeds the temperature threshold range, it sends a control signal for shutting down the rapid annealing device to the relay module.

2. The monitoring system for a rapid annealing device according to claim 1, characterized in that, The recorder is connected to the rapid annealing device and is used to receive the real-time gas flow rate data of the rapid annealing device. The controller is also used to set a gas flow rate threshold range composed of an upper gas flow rate threshold and a lower gas flow rate threshold; when the controller judges that the real-time gas flow rate data exceeds the gas flow rate threshold range, it sends a control signal for shutting down the rapid annealing device to the relay module.

3. The monitoring system for a rapid annealing device according to claim 2, wherein, The relay module includes an over-temperature relay module and an over-flow relay module; the over-temperature relay module is used to execute the control signal issued when the controller judges over-temperature; the over-flow relay module is used to execute the control signal issued when the controller judges over-temperature.

4. A monitoring system for a rapid annealing device according to claim 1 or 2, characterized in that, It also includes an alarm disposed inside the rapid annealing device; the alarm is connected to and controlled by the relay module and is activated based on the conduction of the relay module.

5. A monitoring system for a rapid annealing device according to claim 1 or 2, characterized in that, The rapid annealing device includes a main control unit connected to the temperature sensor. The main control unit is used to receive the production process data of the rapid annealing device, and the production process data includes the start and stop times of the rapid annealing device, the real-time temperature data inside the rapid annealing device, and the real-time gas flow rate data of the rapid annealing device.

6. The monitoring system for a rapid annealing device according to claim 5, characterized in that, The recorder is connected to the main control unit and is used to receive the real-time temperature data and the real-time gas flow rate data in the production process data of the rapid annealing device and continuously record the above data.

7. The monitoring system for a rapid annealing device according to claim 6, wherein, It also includes a data diagnosis system; the data diagnosis system is connected to the recorder and the main control unit; the data diagnosis system is used to receive the real-time temperature data continuously recorded by the recorder and the start and stop times of the rapid annealing device sent by the main control unit; the data diagnosis system is used to process the above data and output the production process temperature data during the process of the rapid annealing device from start to stop.

8. The monitoring system for a rapid annealing device according to claim 1, wherein The temperature sensor is a thermocouple for direct contact measurement.

9. The monitoring system for a rapid annealing device according to claim 1, characterized in that, The recorder is a paperless recorder with a display unit, and the paperless recorder uses the display unit to display the temperature data of the rapid annealing device in real time.

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