Ion implanter beam channel calibration jig and ion implanter

Abstract

The utility model relates to an ion implanter beam channel calibration jig and an ion implanter. Comprising a reference positioning seat which is fixedly installed on a first end plate where an injection port of an arc chamber of the ion implanter is located; a first through hole for opening an ejection opening of the arc chamber and a positioning structure positioned on the first end plate are formed in the middle of the reference positioning seat; the movable positioning seat can move along the beam direction relative to the reference positioning seat; a second through hole extending in the beam direction is formed in the movable positioning seat, and the second through hole is consistent with an ejection opening of the arc chamber in size; in the process that the movable positioning seat moves along the beam direction, the second through hole is kept aligned with the ejection opening of the arc chamber, so that an acceleration channel inlet of the ion implanter is calibrated through the second through hole; one end of the guide piece is fixedly connected to the reference positioning seat, and the other end extends along the beam direction; the mobile positioning seat is provided with a guide part which is slidably matched with the guide piece, and the mobile positioning seat can move along the beam direction based on the matching of the guide piece and the guide part. According to the technical scheme, the uniformity of the beam current can be improved.

Description

Technical Field

[0001] This application relates to the technical field of semiconductor device doping, and particularly to an ion implanter beam channel calibration fixture and an ion implanter. Background Art

[0002] Ion implantation is a very important doping technology in semiconductor device manufacturing. Ion implantation is implemented by an ion implanter that can form a high-speed ion beam. With the gradual increase in the integration of semiconductor devices, higher requirements are put forward for the uniformity of the beam current in ion implantation. Summary of the Invention

[0003] In view of this, to solve at least one problem in the background art, this application provides an ion implanter beam channel calibration fixture and an ion implanter.

[0004] To achieve the above object, the technical solution of this application is realized as follows:

[0005] In a first aspect, an embodiment of this application provides an ion implanter beam channel calibration fixture, including:

[0006] A reference positioning seat, fixedly installed on the first end plate where the arc chamber ejection port of the ion implanter is located; a first through hole for opening the arc chamber ejection port is formed in the middle of the reference positioning seat, and a positioning structure for positioning on the first end plate;

[0007] A moving positioning seat, capable of moving relative to the reference positioning seat along the beam current direction; a second through hole extending along the beam current direction is formed in the moving positioning seat, and the second through hole has the same size as the arc chamber ejection port; during the movement of the moving positioning seat along the beam current direction, the second through hole remains aligned with the arc chamber ejection port to calibrate the acceleration channel inlet of the ion implanter through the second through hole;

[0008] A guiding member, one end fixedly connected to the reference positioning seat, and the other end extending along the beam current direction; a guiding portion slidably fitted to the guiding member is formed in the moving positioning seat, and the moving positioning seat can move along the beam current direction based on the cooperation between the guiding member and the guiding portion.

[0009] Optionally, the guiding member is a guide rod, and the guiding portion is a guiding hole adapted to the guide rod.

[0010] Optionally, the number of the guide rods is two, symmetrically fixedly connected on both sides of the first through hole.

[0011] Optionally, the positioning structure includes a positioning pin for inserting into a positioning hole on the first end plate.

[0012] Optionally, the outer shape of the movable positioning seat is circular to fit the end face where the acceleration channel inlet of the ion implanter is located.

[0013] Optionally, the size of the first through hole is much larger than the size of the arc chamber ejection port.

[0014] Optionally, the movable positioning seat is further provided with a third through hole configured to allow a screw tool to pass through, so as to adjust the size of the acceleration channel inlet of the ion implanter by tightening or loosening the screw.

[0015] In a second aspect, an embodiment of the present application further provides an ion implanter, including:

[0016] An arc chamber configured to eject an ion beam;

[0017] An acceleration electrode located in front of the arc chamber in the direction of the beam and configured to accelerate the beam; the acceleration electrode includes a graphite member forming an acceleration channel inlet; the graphite member is formed by at least two graphite plates closing together in the transverse direction and leaving a gap in the transverse direction when closing together to form the acceleration channel inlet; at least one of the graphite plates or a part of at least one of the graphite plates can move in the transverse direction to adjust the size of the acceleration channel inlet according to the position of the arc chamber ejection port of the ion implanter; the transverse direction is perpendicular to the direction of the beam.

[0018] Optionally, the graphite member is formed by two graphite plates closing together in the transverse direction; at least one of the graphite plates includes a bottom plate and a movable block, and the movable block can move transversely relative to the bottom plate and cooperate to form the acceleration channel inlet; one side surface of the movable block facing the other graphite plate is the side wall of the acceleration channel inlet in the width direction.

[0019] Optionally, at least two threaded holes are provided on the bottom plate, and screw through holes corresponding to the threaded holes are provided on the movable block; the movable block can be fixed on the bottom plate by screwing screws into the threaded holes to form the acceleration channel inlet.

[0020] The beam current channel calibration fixture and ion implanter provided by the embodiments of the present application include: a reference positioning seat fixedly installed on the first end plate where the arc chamber ejection port of the ion implanter is located; a first through hole for opening the arc chamber ejection port and a positioning structure for positioning on the first end plate are provided in the middle of the reference positioning seat; a moving positioning seat capable of moving relative to the reference positioning seat along the beam current direction; a second through hole extending along the beam current direction is provided in the moving positioning seat, and the second through hole is the same size as the arc chamber ejection port; during the process of the moving positioning seat moving along the beam current direction, the second through hole remains aligned with the arc chamber ejection port to calibrate the acceleration channel inlet of the ion implanter through the second through hole; a guiding member, one end of which is fixedly connected to the reference positioning seat and the other end extends along the beam current direction; a guiding portion slidably fitted to the guiding member is provided in the moving positioning seat, and the moving positioning seat can move along the beam current direction based on the cooperation between the guiding member and the guiding portion. It can be seen that for the beam current channel calibration fixture and ion implanter of the embodiments of the present application, the reference positioning seat is positioned on the first end plate where the arc chamber ejection port is located, the moving positioning seat is provided with a second through hole that is the same size as the arc chamber ejection port, and can move relative to the reference positioning seat along the beam current direction and remain aligned with the arc chamber ejection port during the movement. In this way, when the moving positioning seat moves to the acceleration channel inlet, the acceleration channel inlet can be calibrated corresponding to the arc chamber ejection port, reducing the collision of the beam current on the acceleration channel inlet and improving the uniformity of the beam current. Therefore, the beam current channel calibration fixture and ion implanter of the embodiments of the present application can improve the uniformity of the beam current.

[0021] Additional aspects and advantages of the present application will be given in part in the following description, become apparent in part from the following description, or be learned through the practice of the present application. Brief Description of the Drawings

[0022] The drawings described herein are used to provide a further understanding of the present application, and constitute a part of the present application. The schematic embodiments and descriptions thereof of the present application are used to explain the present application and do not constitute an improper limitation to the present application. In the drawings:

[0023] Figure 1 It is a schematic diagram of the trajectory of the beam current in the ion implanter provided by the embodiments of the present application;

[0024] Figure 2 It is a schematic diagram of the arc chamber and the ejection port in the ion implanter provided by the embodiments of the present application;

[0025] Figure 3 It is a schematic diagram of the beam current channel calibration fixture of the ion implanter provided by the embodiments of the present application;

[0026] Figure 4Schematic diagram of the graphite component in the ion implanter provided by the embodiment of the present application Figure 1 (not fixed);

[0027] Figure 5 Schematic diagram of the graphite component in the ion implanter provided by the embodiment of the present application Figure 2 (fixed).

[0028] Explanation of reference numerals:

[0029] 10. Arc chamber; 11. Chamber; 12. First end plate; 13. Ejection port; 20. Acceleration electrode; 21. Acceleration channel inlet; 22. Bottom plate; 23. Movable block; 24. Screw; 30. Shortened beam line assembly; 40. Deflection magnet; 50. Cooling and decomposition housing; 61. Reference positioning seat; 611. First through hole; 612. Positioning pin; 62. Moving positioning seat; 621. Second through hole; 622. Guide hole; 623. Third through hole; 63. Guide rod. Detailed implementation manners

[0030] To make the technical solutions and beneficial effects of the present application more obvious and understandable, the following will be described in detail by listing specific embodiments. Among them, the drawings are not necessarily drawn to scale, and local features can be enlarged or reduced to more clearly show the details of local features; unless otherwise defined, the technical and scientific terms used herein have the same meanings as those in the technical and scientific fields to which the present application belongs.

[0031] In the description of the present application, the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "height", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. It is only for the convenience of simplifying the description of the present application, rather than indicating that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, that is, it cannot be understood as a limitation to the present application.

[0032] In the present application, the terms "first" and "second" are only used for the purpose of clear description and cannot be understood as the relative importance of the indicated features or the quantity of the indicated technical features. Therefore, the features defined with "first" and "second" can clearly include at least one such feature. In the description of the present application, the meaning of "a plurality" is at least two, such as two, three, etc.; the meaning of "several" is at least one, such as one, two, three, etc.; unless otherwise clearly and specifically defined.

[0033] In this application, unless otherwise clearly defined, terms such as "installation", "connection", "attachment", "fixation", "setting", etc. shall be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral one; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can also be the communication inside two components or the interaction relationship between two components. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0034] In this application, unless otherwise clearly defined, a first feature being "on", "above", "over", or "upon" a second feature, or "under", "beneath", "below", or "underneath" the second feature can be that the first feature and the second feature are in direct contact, or the first feature and the second feature are in indirect contact through an intermediate medium. Moreover, a first feature being "above", "over", or "upon" a second feature can be that the first feature is directly above or obliquely above the second feature, or simply means that the horizontal height of the first feature is higher than the horizontal height of the second feature. A first feature being "under", "beneath", "below", or "underneath" a second feature can be that the first feature is directly below or obliquely below the second feature, or simply means that the horizontal height of the first feature is lower than the horizontal height of the second feature.

[0035] To thoroughly understand this application, detailed steps and structures will be presented in the following description to illustrate the technical solutions of this application. The preferred embodiments of this application are described in detail below. However, in addition to these detailed descriptions, this application can also have other implementation manners.

[0036] In view of the technical problems in the related art, an embodiment of this application provides an ion implanter beam current channel calibration fixture (hereinafter referred to as the calibration fixture).

[0037] Before introducing the calibration fixture, first briefly introduce the trajectory of the beam current in the ion implanter. Refer to Figure 1 , first, an ion source forms an ion current in the arc chamber 10, which is emitted through the emission port 13 to form a beam current. Then, the beam current enters the acceleration electrode 20 through the acceleration channel inlet 21, and then enters the shortening beam line assembly 30, the deflection magnet 40, the cooling and decomposition housing 50... and so on, which will not be elaborated in detail.

[0038] Refer to Figure 2 , the arc chamber 10 includes a chamber 11 and a first end plate 12. The first end plate 12 covers the chamber 11 to form the arc chamber 10. An emission port 13 is opened on the first end plate 12. The emission port 13 is generally expressed as an arc-shaped slit (Arcslit), that is, the ratio of the length to the width is relatively large, and there is a small amount of curvature in the length direction. In Figure 2 , the length direction of the emission port 13 is along the vertical direction, and the width direction is along the horizontal direction.

[0039] Reference Figure 3 , the calibration fixture includes:

[0040] A reference positioning seat 61, fixedly installed on the first end plate 12 where the ejection port 13 of the arc chamber 10 of the ion implanter is located; a first through hole 611 that opens the ejection port 13 of the arc chamber 10 and a positioning structure for positioning on the first end plate 12 are provided in the middle of the reference positioning seat 61;

[0041] A moving positioning seat 62, capable of moving relative to the reference positioning seat along the beam current direction; a second through hole 621 extending along the beam current direction is provided in the moving positioning seat 62, and the second through hole 621 is the same size as the ejection port 13 of the arc chamber 10; during the process of the moving positioning seat 62 moving along the beam current direction, the second through hole 621 maintains alignment with the ejection port 13 of the arc chamber 10 to calibrate the acceleration channel inlet 21 of the ion implanter through the second through hole 621;

[0042] A guiding member, one end of which is fixedly connected to the reference positioning seat 61 and the other end extends along the beam current direction; a guiding portion that is slidably fitted to the guiding member is provided in the moving positioning seat 62, and the moving positioning seat 62 can move along the beam current direction based on the cooperation between the guiding member and the guiding portion.

[0043] It can be understood that the first through hole 611 of the reference positioning seat 61 opens the ejection port 13 of the arc chamber 10, that is, the reference positioning seat 61 does not block the beam current.

[0044] It can be understood that the positioning structure can limit the position of the reference positioning seat 61, for example, limit six degrees of freedom and keep the position relatively fixed with respect to the arc chamber 10. There are many limiting structures and will not be elaborated.

[0045] It can be understood that the reference positioning seat 61 is fixedly installed on the first end plate 12 where the ejection port 13 of the arc chamber 10 of the ion implanter is located, that is, the reference positioning seat 61 plays a role of being fixed relative to the ejection port 13 of the arc chamber 10 and serves as the moving reference for the moving positioning seat 62. The position of the second through hole 621 after the moving positioning seat 62 moves maintains a correspondence with the reference positioning seat 61, and thus maintains a correspondence with the ejection port 13 of the arc chamber 10.

[0046] It can be understood that during the alignment of the second through hole 621 with the ejection port 13 of the arc chamber 10, the alignment is relative to the beam current. For example, the connection line between the second through hole 621 and the ejection port 13 of the arc chamber 10 can be parallel to the center line of the beam current.

[0047] Understandably, the guiding member extends along the beam direction, so that during the movement of the movable positioning seat 62 along the guiding member, the correspondence with the beam outlet 13 of the arc chamber 10 can be maintained.

[0048] For the beam channel calibration fixture and the ion implanter according to the embodiments of the present application, the reference positioning seat 61 is positioned on the first end plate 12 where the beam outlet 13 of the arc chamber 10 is located. The movable positioning seat 62 is provided with a second through hole 621 having the same size as the beam outlet 13 of the arc chamber 10, and can move relative to the reference positioning seat along the beam direction and maintain alignment with the beam outlet 13 of the arc chamber 10 during the movement. In this way, when the movable positioning seat 62 moves to the entrance 21 of the acceleration channel, the entrance 21 of the acceleration channel can be calibrated corresponding to the beam outlet 13 of the arc chamber 10, reducing the collision of the beam on the entrance 21 of the acceleration channel and improving the uniformity of the beam.

[0049] In some other embodiments of the present application, the guiding member is a guide rod 63, and the guiding portion is a guiding hole 622 adapted to the guide rod 63.

[0050] Through the cooperation of the hole and the shaft, the guiding function can be obtained, and the structure is simple and the cost is low.

[0051] In some other embodiments of the present application, the number of the guide rods 63 is two, which are symmetrically and fixedly connected to both sides of the first through hole 611.

[0052] Understandably, both the guide rod 63 and the guiding hole 622 can be circular, so that the processing cost is low. By providing two, the problem that a simple circle cannot limit the circumferential rotation can be solved, and further the problem of the circumferential position change of the movable positioning seat 62 during the movement along the beam direction can be limited. Of course, three or more can also be provided.

[0053] In some other embodiments of the present application, the positioning structure includes a positioning pin 612 to be inserted into the positioning hole on the first end plate 12.

[0054] The positioning pin 612 is a common positioning part used for positioning various equipment and fixture in the processing process. The size and allowable tolerance of the positioning pin 612 have certain standards to refer to, and it has the advantages of reliable positioning and low cost. Specifically, the positioning pin 612 can be in various forms such as a cylindrical pin or a conical pin.

[0055] In some other embodiments of the present application, the outer shape of the movable positioning seat 62 is circular to adapt to the end face where the entrance 21 of the acceleration channel of the ion implanter is located.

[0056] It is understandable that the end surface of the accelerating electrode 20 where the accelerating channel entrance 21 is arranged may be circular, so setting the shape of the movable positioning seat 62 to be circular can better adapt and facilitate adjustment of the accelerating channel entrance 21 with reference to the second through hole 621 of the movable positioning seat 62.

[0057] In some other embodiments of the present application, the size of the first through hole 611 is much larger than the size of the ejection port 13 of the arc chamber 10 .

[0058] In this way, on the one hand, the blocking of the beam by the first through hole 611 can be reduced. On the other hand, the weight of the reference positioning seat 61 can be reduced, so that it can be positioned and fixed more stably. Here, much larger than can be more than 3 times the area.

[0059] In other embodiments of the present application, the movable positioning seat 62 is further provided with a third through hole 623, and the third through hole 623 is configured for a screw tool to pass through, so as to adjust the size of the acceleration channel entrance 21 of the ion implanter by tightening or loosening the screw.

[0060] In this way, when the positioning seat 62 is moved close to the acceleration channel entrance 21, the size of the acceleration channel entrance 21 can also be adjusted.

[0061] Specifically, the screw can be a hexagon socket screw to reduce the wrench space. The screw tool can be an L-shaped hexagon socket wrench, and the wrench working part can pass through the third through hole 623 conveniently.

[0062] The present application also provides an ion implanter, referring to Figure 1 and Figure 2 , the ion implanter includes:

[0063] An arc chamber 10 configured to emit a beam of ions;

[0064] An accelerating electrode 20, located in front of the arc chamber 10 in the direction of the beam, configured to accelerate the beam; the accelerating electrode 20 includes a graphite member forming an accelerating channel entrance 21;

[0065] refer to Figure 4 and Figure 5 The graphite member is formed by at least two graphite plates being closed in a transverse direction, and a transverse gap is retained when closing to form an acceleration channel entrance 21; at least one of the graphite plates or a portion of at least one of the graphite plates can move in a transverse direction to adjust the size of the acceleration channel entrance 21 according to the position of the ejection port 13 of the arc chamber 10 of the ion implanter; the transverse direction is perpendicular to the direction of the beam.

[0066] That is, corresponding to the calibration fixture, the graphite part of the acceleration electrode 20 is modified to be able to adjust the size of the acceleration channel inlet 21 as needed.

[0067] Specifically, the graphite part is arranged to be formed by at least two graphite plates closing together in the transverse direction. In this way, the size of the acceleration channel inlet 21 can be adjusted by moving in the transverse direction.

[0068] In the ion implanter according to the embodiment of the present application, the reference positioning seat 61 is positioned on the first end plate 12 where the ejection port 13 of the arc chamber 10 is located. The moving positioning seat 62 is provided with a second through hole 621 having the same size as the ejection port 13 of the arc chamber 10, and can move relative to the reference positioning seat along the beam direction and maintain alignment with the ejection port 13 of the arc chamber 10 during the movement. In this way, when the moving positioning seat 62 moves to the acceleration channel inlet 21, the acceleration channel inlet 21 can be calibrated corresponding to the ejection port 13 of the arc chamber 10, reducing the collision of the beam on the acceleration channel inlet 21 and improving the uniformity of the beam.

[0069] In some other embodiments of the present application, the graphite part is formed by two graphite plates closing together in the transverse direction.

[0070] It can be understood that the size adjustment of the acceleration channel inlet 21 is mainly in the width direction. Compared with a larger number, the structure of two graphite plates can meet the adjustment requirements, and has a simple structure, low cost, and is also convenient for adjustment.

[0071] At least one of the graphite plates includes a bottom plate 22 and a movable block 23. The movable block 23 can move transversely relative to the bottom plate 22 and cooperate to form the acceleration channel inlet 21.

[0072] Compared with the movement of the whole graphite plate, dividing the graphite plate into the bottom plate 22 and the movable block 23 and adjusting by the movement of the movable block 23 is more flexible and easier.

[0073] One side of the movable block 23 facing the other graphite plate is the side wall of the acceleration channel inlet 21 in the width direction.

[0074] That is, the side surface of the movable block 23 constitutes the side wall of the acceleration channel inlet 21. In this way, compared with other parts of the graphite plate, the movable block 23 can bear some collisions of the beam on the acceleration channel inlet 21, reducing the damage of the graphite bottom plate 22. And the damage of the movable block 23 itself can be easily replaced.

[0075] In some other embodiments of the present application, at least two threaded holes are provided on the bottom plate 22, and the movable block 23 is provided with screw through holes corresponding to the threaded holes; the movable block 23 can be fixed on the bottom plate 22 by screwing screws 24 into the threaded holes to form the acceleration channel inlet 21.

[0076] In the form of screws and threaded holes, the fixation is reliable, and both connection and disassembly are convenient.

[0077] Specifically, a counterbore can be formed in the screw through-hole of the movable block 23 to facilitate the movement of the movable positioning seat 62.

[0078] Specifically, a groove for placing the movable block 23 is formed in the bottom plate 22 so that after the movable block 23 is fixed, it is flush with the outer surface of the bottom plate 22.

[0079] Specifically, through holes with larger sizes are formed in the middle of the two bottom plates 22 corresponding to the entrance 21 of the acceleration channel to increase the adjustment range of the size of the entrance 21 of the acceleration channel.

[0080] It should be understood that the above embodiments are all exemplary and do not cover all possible implementation manners included in the claims. Without departing from the scope of the disclosure of the present application, various deformations and changes can also be made on the basis of the above embodiments. Similarly, the technical features of the above embodiments can also be arbitrarily combined to form additional embodiments of the present application that may not be clearly described. Therefore, the above embodiments only represent several implementation manners of the present application and do not limit the protection scope of the patent of the present application.

Claims

1. An ion implanter beam channel calibration fixture, characterized in that, Comprising: A reference positioning seat, fixedly installed on the first end plate where the arc chamber ejection port of the ion implanter is located; a first through hole for opening the arc chamber ejection port and a positioning structure for positioning on the first end plate are formed in the middle of the reference positioning seat; A moving positioning seat, capable of moving relative to the reference positioning seat along the beam current direction; a second through hole extending along the beam current direction is formed in the moving positioning seat, and the second through hole is the same size as the arc chamber ejection port; during the process of the moving positioning seat moving along the beam current direction, the second through hole keeps aligned with the arc chamber ejection port to calibrate the acceleration channel entrance of the ion implanter through the second through hole; A guiding member, one end fixedly connected to the reference positioning seat, and the other end extending along the beam current direction; a guiding portion slidably fitted to the guiding member is formed in the moving positioning seat, and the moving positioning seat can move along the beam current direction based on the cooperation between the guiding member and the guiding portion.

2. The beam current channel calibration fixture of the ion implanter according to claim 1, wherein The guiding member is a guide rod, and the guiding portion is a guiding hole adapted to the guide rod.

3. The beam current channel calibration fixture for an ion implanter according to claim 2, characterized in that, The number of the guide rods is two, symmetrically fixedly connected to both sides of the first through hole.

4. The beam current channel calibration fixture for an ion implanter according to claim 1, wherein The positioning structure includes a positioning pin for inserting into a positioning hole on the first end plate.

5. The beam current channel calibration fixture of the ion implanter according to claim 4, wherein The outer shape of the moving positioning seat is circular to adapt to the end face where the acceleration channel entrance of the ion implanter is located.

6. The ion implanter beam channel calibration fixture according to claim 4, wherein The size of the first through hole is much larger than the size of the arc chamber ejection port.

7. The beam current channel calibration fixture of the ion implanter according to claim 4, characterized in that The moving positioning seat is further provided with a third through hole configured to allow a screw tool to pass through, so as to adjust the size of the acceleration channel entrance of the ion implanter by tightening or loosening the screw.

8. An ion implanter, characterized in that, Comprising: The ion implanter beam channel calibration fixture according to any one of claims 1-7; An arc chamber configured to eject an ion beam; An acceleration electrode, located in front of the arc chamber in the direction of the beam current, configured to accelerate the beam current; the acceleration electrode includes a graphite member forming an acceleration channel entrance; The graphite member is at least formed by two graphite plates closing together in the transverse direction, and a gap in the transverse direction is reserved when closing together to form the acceleration channel entrance; at least one of the graphite plates or a part of at least one of the graphite plates can move in the transverse direction to adjust the size of the acceleration channel entrance according to the position of the arc chamber ejection port of the ion implanter; the transverse direction is perpendicular to the direction of the beam current.

9. The ion implanter according to claim 8, characterized in that, The graphite member is formed by two graphite plates closing together in the transverse direction; at least one of the graphite plates includes a bottom plate and a movable block, the movable block can move transversely relative to the bottom plate and cooperate to form the acceleration channel entrance; one side surface of the movable block facing the other graphite plate is the side wall of the acceleration channel entrance in the width direction.

10. The ion implanter according to claim 9, wherein, At least two threaded holes are provided on the bottom plate, and screw through holes corresponding to the threaded holes are formed in the movable block; the movable block can be fixed on the bottom plate by screwing screws into the threaded holes to form the acceleration channel entrance.

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