Gas flow monitoring system

Abstract

According to the gas flow monitoring system, when the gas flow monitoring system works, an electromagnetic valve corresponding to a gas inlet channel needing to be monitored is opened, gas enters a cavity from a gas inlet and a gas outlet of the electromagnetic valve and the gas inlet channel, and a bypass opening of the electromagnetic valve is communicated with the gas inlet; therefore, the pressure intensity generated by the flowing gas can reach the pressure gauge through the gas inlet and the bypass port, the pressure gauge can accurately obtain the gas flow of the flowing gas, and due to the fact that all the chambers of the cavity are mutually isolated and not communicated, the flow of the flowing gas can be accurately measured. When the gas flow of the gas inlet channel in one cavity is monitored through the pressure gauge, the gas flow is not easily interfered by the other cavity, so that the gas inflow amount of the gas inlet channel needing to be monitored can be more accurately obtained.

Description

Technical Field

[0001] The embodiments of the present utility model relate to the field of semiconductor equipment, and particularly to a gas flow monitoring system. Background Art

[0002] In the process of semiconductor manufacturing, wafer processing is a key process, which involves a variety of precision semiconductor equipment, especially in plasma etching, chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes.

[0003] During the wafer processing, the types, proportions, and flow rates of gases must be strictly controlled to ensure the accuracy and repeatability of key steps such as thin film deposition, etching, and cleaning. Therefore, the monitoring of gas flow is related to the correct progress of chemical reactions in the semiconductor manufacturing process and directly affects the wafer processing quality and the performance stability of subsequent electronic products.

[0004] As can be seen from the background art, although the prior art has been able to monitor the average gas flow in the entire chamber through devices such as pressure gauges, if a chamber includes multiple compartments that are connected to each other, it is difficult to accurately monitor the gas flow in each compartment of the chamber. Summary of the Utility Model

[0005] The problem solved by the embodiments of the present utility model is to provide a gas flow monitoring system for accurately obtaining the gas flow.

[0006] To solve the above problems, the embodiments of the present utility model provide a gas flow monitoring system, including: a chamber, including a plurality of mutually isolated compartments, and one or more intake channels are provided in each of the compartments; a pressure gauge; a plurality of solenoid valves, the solenoid valves including an intake port, an outlet port, and a bypass port, each of the bypass ports is connected to the pressure gauge, the intake port is used to supply gas to the solenoid valve, and the intake port is connected to the bypass port; the outlet port is used to be connected to the intake channel in the chamber for supplying gas to the chamber, and the solenoid valve is used to open or close the channel between the intake port and the outlet port.

[0007] Optionally, the gas flow monitoring system further includes: a structural body, the pressure gauge and the plurality of solenoid valves are arranged in the structural body, and the structural body includes: a first channel, located between the bypass port and the pressure gauge, for connecting each of the bypass ports and the pressure gauge; a second channel, one end of the second channel is connected to the intake port of the solenoid valve, and the other end of the second channel communicates with the outside of the structural body for supplying gas to each of the solenoid valves; a third channel, one end of the third channel is connected to the outlet port of the solenoid valve, and the other end of the third channel communicates with the intake channel of the chamber for discharging the gas in each of the solenoid valves.

[0008] Optionally, the pressure gauge is located at the top of the structural body, and the plurality of solenoid valves are located in the structural body and below the side of the pressure gauge.

[0009] Optionally, the cavity includes two chambers, and each chamber is provided with an air inlet channel. When monitoring the gas flow rate of one chamber, the corresponding solenoid valve is opened, and the solenoid valve corresponding to the other chamber is closed.

[0010] Optionally, each chamber is provided with a plurality of air inlet channels, and each air inlet channel communicates with the air outlet of one of the solenoid valves. When monitoring the gas flow rate, the plurality of solenoid valves are configured to open only one.

[0011] Optionally, the cavity includes two chambers, and each chamber is provided with two air inlet channels; the number of the solenoid valves is four, and each solenoid valve communicates with one of the air inlet channels.

[0012] Optionally, when each chamber has a plurality of air inlet channels, different air inlet channels are used to introduce different gases

[0013] Optionally, the number of the air inlet channels in each chamber is multiple; the multiple air inlet channels are all located at the top of the chamber; or, the multiple air inlet channels are all located on the side wall of the chamber; or, some of the air inlet channels are located at the top of the chamber, and some of the air inlet channels are located on the side wall of the chamber.

[0014] Optionally, the number of the air inlet channels in the chamber is two; the two air inlet channels are all located at the top of the chamber; or, the two air inlet channels are all located on the side wall of the chamber; or, one air inlet channel is located at the top of the chamber, and one air inlet channel is located on the side wall of the chamber.

[0015] Optionally, the pressure gauge includes: a controller, electrically connected to the solenoid valve, for closing the solenoid valve after the gas volume passing through the solenoid valve reaches a preset volume.

[0016] Optionally, the pressure gauge includes: a pressure sensing element, exposed in the first channels corresponding to the respective solenoid valves, and the number of the pressure sensing elements is the same as the number of the solenoid valves.

[0017] Compared with the prior art, the technical solution of the embodiment of the present invention has the following advantages:

[0018] The gas flow monitoring system provided by the embodiment of the present utility model, the cavity, includes a plurality of mutually isolated chambers, and one or more intake channels are provided in each of the chambers; a pressure gauge; a plurality of solenoid valves, the solenoid valves include an intake port, an outlet port and a bypass port, each of the bypass ports is communicated with the pressure gauge, the intake port is used to supply gas to the solenoid valve, and the intake port is communicated with the bypass port; the outlet port is used to be communicated with the intake channel in the chamber to supply gas to the chamber, and the solenoid valve is used to open or close the channel between the intake port and the outlet port. When the gas flow monitoring system of the embodiment of the present utility model works, the solenoid valve corresponding to the intake channel to be monitored is opened, and the gas enters the chamber from the intake port, the outlet port and the intake channel of the solenoid valve. Because the bypass port of the solenoid valve is communicated with the intake port, the pressure energy generated by the flowing gas can reach the pressure gauge through the intake port and the bypass port. Therefore, the pressure gauge can accurately obtain the gas flow rate of the flowing gas, and because the chambers of the cavity are mutually isolated and not communicated, when monitoring the gas flow rate of the intake channel in one chamber through the pressure gauge, it is not easily interfered by another chamber. Therefore, the gas inflow rate of the intake channel to be monitored can be obtained more accurately. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 is a schematic structural diagram of a gas flow monitoring system;

[0020] Figure 2 is a schematic structural diagram of the first embodiment of the gas flow monitoring system in the present utility model;

[0021] Figure 3 is a schematic structural diagram of the second embodiment of the gas flow monitoring system in the present utility model;

[0022] Figure 4 is a schematic structural diagram of the third embodiment of the gas flow monitoring system in the present utility model. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0023] As can be seen from the background art, although the prior art has been able to monitor the average gas flow rate in the entire cavity through devices such as a pressure gauge, if a cavity includes a plurality of chambers and the chambers are connected to each other, it is difficult to accurately monitor the gas flow rate in each chamber of the cavity. Now, in combination with Figure 1 to specifically illustrate.

[0024] Figure 1 is a schematic structural diagram of a gas flow monitoring system.

[0025] The gas flow monitoring system includes: a cavity, which includes a left cavity 1 and a right cavity 2, and the left cavity 1 and the right cavity 2 are connected; an air intake channel 3, which connects the left cavity 1 and the right cavity 2 at the same time; a first pressure gauge 4 and a second pressure gauge 5, which are both arranged on the air intake channel 3, the first pressure gauge 4 is used to detect the gas flow of the left cavity 1, and the second pressure gauge 5 is used to detect the gas flow of the right cavity 2.

[0026] When the gas flow monitoring system is working, because the left chamber 1 and the right chamber 2 are connected, when the first pressure gauge 4 is used to monitor the gas flow of the left chamber 1, it will be affected by the right chamber 2; when the second pressure gauge 5 is used to monitor the gas flow of the right chamber 2, it will be affected by the left chamber 1. Therefore, what is monitored by the first pressure gauge 4 or the second pressure gauge 5 is the average flow of the left chamber 1 and the right chamber 2, which makes it difficult to accurately monitor the gas flow in each chamber in the cavity.

[0027] In order to solve the technical problem, the gas flow monitoring system provided by the embodiment of the present invention includes a cavity, comprising a plurality of chambers isolated from each other, and each of the chambers is provided with one or more air inlet channels; a pressure gauge; a plurality of solenoid valves, the solenoid valves including an air inlet, an air outlet and a bypass port, each of the bypass ports being connected to the pressure gauge, the air inlet being used to provide gas to the solenoid valve, and the air inlet being connected to the bypass port; the air outlet being used to be connected to the air inlet channel in the chamber, for providing gas to the chamber, and the solenoid valve being used to open or close the channel between the air inlet and the air outlet. When the gas flow monitoring system of the embodiment of the present invention is working, the solenoid valve corresponding to the air inlet channel to be monitored is opened, and the gas enters the chamber from the air inlet, air outlet and air inlet channel of the solenoid valve. Because the bypass port of the solenoid valve is connected to the air inlet, the pressure generated by the flowing gas can reach the pressure gauge through the air inlet and the bypass port. Therefore, the pressure gauge can accurately obtain the gas flow of the flowing gas. Moreover, because the various chambers of the cavity are isolated from each other and not connected, when the gas flow of the air inlet channel in one of the chambers is monitored by the pressure gauge, it is not easy to be interfered with by another chamber. Therefore, the gas inflow into the air inlet channel to be monitored can be obtained more accurately.

[0028] In order to make the above-mentioned purposes, features and advantages of the embodiments of the present invention more obvious and easy to understand, the specific embodiments of the present invention are described in detail below with reference to the accompanying drawings.

[0029] Figure 2 It is a structural diagram of a gas flow monitoring system according to the first embodiment of the present utility model.

[0030] A gas flow monitoring system, comprising: a cavity 100, including a plurality of mutually isolated chambers 101, and an intake channel 102 is provided in each of the chambers 101; a pressure gauge 103; a plurality of solenoid valves 104, the solenoid valve 104 including an intake port, an outlet port, and a bypass port, each of the bypass ports being communicated with the pressure gauge 103, the intake port being used to supply gas to the solenoid valve 104, and the intake port being communicated with the bypass port; the outlet port being used to communicate with the intake channel 102 in the chamber 101 for supplying gas to the chamber 101, and the solenoid valve 104 being used to open or close the channel between the intake port and the outlet port.

[0031] When the gas flow monitoring system of the embodiment of the present utility model works, the solenoid valve 104 corresponding to the intake channel 102 to be monitored is opened, and gas enters the chamber 101 from the intake port, the outlet port, and the intake channel 102 of the solenoid valve 104. Since the bypass port of the solenoid valve 104 is communicated with the intake port, the pressure energy generated by the flowing gas can reach the pressure gauge 103 through the intake port and the bypass port. Therefore, the pressure gauge 103 can accurately obtain the gas flow rate of the flowing gas, and because the chambers 101 of the cavity 100 are mutually isolated and not communicated, when monitoring the gas flow rate of the intake channel 102 in one chamber 101, it is not easily interfered by another chamber 101. Therefore, the gas inflow rate of the intake channel 102 to be monitored can be obtained more accurately.

[0032] In this embodiment, the cavity 100 includes a plurality of mutually isolated chambers 101, and an intake channel 102 is provided in each of the chambers 101.

[0033] The plurality of mutually isolated chambers 101 enable each chamber 101 to independently supply gas and monitor the flow rate, avoiding the mutual interference of gases between different chambers 101 and ensuring the accuracy and reliability of gas flow monitoring.

[0034] In this embodiment, the cavity 100 includes two chambers 101, namely a left chamber 101a and a right chamber 101b. An intake channel 102 is provided in each of the chambers 101. When monitoring the gas flow rate of one chamber 101, the corresponding solenoid valve 104 is opened, and the solenoid valve 104 corresponding to the other chamber 101 is closed.

[0035] Since the left chamber 101a and the right chamber 101b are mutually isolated, and only the solenoid valve 104 corresponding to one chamber 101 is in the open state at any moment, the gas flow rate data obtained based on the pressure gauge 103 is not affected by the other chamber 101, significantly improving the accuracy of flow rate monitoring.

[0036] As an example, when it is necessary to monitor the gas flow rate in the left chamber 101a, the solenoid valve 104 corresponding to the left chamber 101a is opened, and at the same time, the solenoid valve 104 corresponding to the right chamber 101b is closed. At this time, the gas passes through the inlet and outlet of the solenoid valve 104 corresponding to the left chamber 101a and is delivered to the left chamber 101a through the intake passage 102 of the left chamber 101a. Conversely, when it is necessary to monitor the gas flow rate in the right chamber 101b, the solenoid valve 104 corresponding to the right chamber 101b is opened, and at the same time, the solenoid valve 104 corresponding to the left chamber 101a is closed. At this time, the gas passes through the inlet and outlet of the solenoid valve 104 corresponding to the right chamber 101b and is delivered to the left chamber 101a through the intake passage 102 of the right chamber 101b.

[0037] The pressure gauge 103 is used to measure the pressure change of the gas in the gas flow monitoring system in real time, so as to indirectly obtain the information of the gas flow rate. Specifically, there is a specific relationship between the gas flow rate and the pressure, and the pressure gauge 103 can accurately calculate the gas flow rate in real time by measuring the pressure.

[0038] In this embodiment, the pressure gauge 103 includes: a controller (not shown in the figure), which is electrically connected to the solenoid valve 104 and is used to close the solenoid valve 104 after the gas volume passing through the solenoid valve 104 reaches a preset amount.

[0039] First, the controller is set in the pressure gauge 103 and can monitor the gas flow rate through the solenoid valve 104 in real time, accurately control the total amount of gas entering the chamber 101, so that the gas volume received by each chamber 101 meets the process requirements, avoiding the situation of excessive or insufficient gas in the chamber 101. Second, the electrical connection between the controller and the solenoid valve 104 enables the pressure gauge 103 to also have the ability to actively control the gas flow rate. When the gas volume entering the chamber 101 reaches a preset value, the controller issues an instruction to close the solenoid valve 104. Specifically, when the solenoid valve 104 is opened, the gas enters the chamber 101 through the inlet and outlet, and at the same time, the bypass port transmits the pressure of the gas to the pressure gauge 103, and the pressure gauge 103 collects the pressure signal it senses. The controller calculates the gas flow rate according to the pressure signal collected by the pressure gauge 103 to achieve precise control of the solenoid valve 104.

[0040] As an example, the controller in the pressure gauge 103 includes a microprocessor, which is electrically connected to a plurality of solenoid valves 104. The controller receives the pressure data collected by the pressure gauge 103 in real time, and uses the known pressure-flow relationship to calculate the instantaneous gas flow rate and the cumulative gas volume passing through the solenoid valve 104. When the cumulative gas volume reaches a preset threshold, the controller sends a control signal to close the corresponding solenoid valve 104 and stop the gas supply, achieving the purpose of accurately controlling the gas supply volume of each chamber 101. In other embodiments, the controller may further include a control circuit, and the control circuit is electrically connected to the solenoid valve 104.

[0041] In this embodiment, the types of the pressure gauge 103 include piezoresistive pressure gauges. Piezoresistive pressure gauges are based on the piezoresistive effect of semiconductor materials. A change in pressure will cause a change in the resistance value, and the pressure is measured through a bridge circuit. It has the characteristics of small volume, fast response, and easy integration, and is suitable for use in a gas flow monitoring system. Moreover, the piezoresistive pressure gauge can be equipped with the controller and can be electrically connected to the solenoid valve 104 to realize the monitoring and adjustment of the gas flow. In other embodiments, the types of the pressure gauge 103 can also include capacitive pressure gauges. Capacitive pressure gauges utilize the fact that a sensitive diaphragm generates a small displacement under the action of pressure, resulting in a change in capacitance, thereby measuring the pressure.

[0042] The gas flow monitoring system includes: a plurality of solenoid valves 104. The solenoid valve 104 includes an air inlet, an air outlet, and a bypass port. Each bypass port is communicated with the pressure gauge 103. The air inlet is used to supply gas to the solenoid valve 104, and the air inlet is communicated with the bypass port; the air outlet is used to be communicated with the air inlet passage 102 in the chamber 101 to supply gas to the chamber 101, and the solenoid valve 104 is used to open or close the passage between the air inlet and the air outlet.

[0043] Since each solenoid valve 104 corresponds to the air inlet passage 102 of a chamber 101, the pressure gauge 103 can obtain the pressure information on the inlet side of each solenoid valve 104 through the bypass port, realizing the independent monitoring of the gas flow in each chamber 101; the communication between the air inlet and the bypass port enables the pressure gauge 103 to obtain the pressure of the gas when it enters the solenoid valve 104 in real time. Combining the relationship between pressure and flow, the actual flow of the gas can be accurately calculated; since the chambers 101 of the cavity 100 are isolated from each other, when monitoring the gas flow in a certain chamber 101, it will not be affected by the gas flow in other chambers 101, improving the measurement accuracy.

[0044] In addition, it should be noted that when the solenoid valve 104 is opened, the air inlet, the air outlet, the bypass port, and the gas passage form an air path. The bypass ports of a plurality of solenoid valves 104 are all communicated with the same pressure gauge 103. By controlling the opening or closing of each solenoid valve 104, a pressure gauge 103 can independently monitor and control the gas flow in multiple different air paths and the gas inflow in the corresponding chambers 101, simplifying the structure of the device, reducing the cost, and at the same time ensuring the effective monitoring of multiple air paths.

[0045] In this embodiment, the gas flow monitoring system further includes: a structural main body 105, and the pressure gauge 103 and the plurality of solenoid valves 104 are arranged in the structural main body 105.

[0046] The structural body 105 serves as a bearing platform for the gas flow monitoring system, integrating a pressure gauge 103 and multiple solenoid valves 104, making the connection between the pressure gauge 103 and the solenoid valves 104 more compact and reliable.

[0047] Specifically, the structural body 105 includes: a first channel 106, located between the bypass port and the pressure gauge 103, for connecting each bypass port and the pressure gauge 103. When gas passes through the solenoid valve 104, part of the gas reaches the pressure gauge 103 via the bypass port and the first channel 106, reflecting the pressure change of the current gas flow in real time.

[0048] In this embodiment, the gas introduced into the first channel 106 is a single gas or a mixed gas.

[0049] It should be noted that the sensing element of the pressure gauge 103 is exposed in the first channel 106.

[0050] Specifically, the structural body 105 includes: a second channel 107, one end of the second channel 107 is connected to the intake port of the solenoid valve 104, and the other end of the second channel 107 communicates with the outside of the structural body 105, for supplying gas to each solenoid valve 104.

[0051] Specifically, the structural body 105 includes: a third channel 108, one end of the third channel 108 is connected to the outlet port of the solenoid valve 104, and the other end of the third channel 108 communicates with the intake channel 102 of the chamber 101, for leading the gas in each solenoid valve 104 to the chamber 101.

[0052] The structural body 105 not only physically connects the pressure gauge 103 and the solenoid valves 104, but also realizes the functional association of gas flow and signal transmission through the internal channel system. The structural body 105 enables the entire gas flow monitoring system to have the characteristics of high precision and high reliability, meeting the strict requirements for gas control in the semiconductor manufacturing process.

[0053] In this embodiment, the pressure gauge 103 is located at the top of the structural body 105, and the multiple solenoid valves 104 are located in the structural body 105 and below the side of the pressure gauge 103.

[0054] The pressure gauge 103 is located at the top of the structural body 105, which helps to reduce the resistance and turbulence during gas flow and improve the accuracy of pressure measurement. A plurality of solenoid valves 104 are located below the side of the pressure gauge 103, which helps to achieve independent control and monitoring of the gas flow in each chamber 101 and avoid interference between the gas flows in different chambers 101. Through such a spatial layout of the pressure gauge 103 and the plurality of solenoid valves 104, the mutual interference is reduced, enabling the pressure gauge 103 and the solenoid valves 104 to work in coordination under different working conditions.

[0055] When the gas flow monitoring system is working, when it is necessary to monitor the gas flow in a certain chamber 101, the controller instructs the corresponding solenoid valve 104 to open. The gas enters the inlet of the solenoid valve 104 through the second channel 107. A part of the gas reaches the pressure gauge 103 through the bypass port and the first channel 106, and the pressure gauge 103 monitors the gas pressure in real time. Another part of the gas enters the designated chamber 101 through the outlet of the solenoid valve 104 and the third channel 108. Since each solenoid valve 104 controls a gas path respectively, that is to say, the gas flows in other chambers 101 will not interfere with the reading of the pressure gauge 103 in the currently monitored chamber 101, thus realizing high-precision independent gas flow monitoring.

[0056] In this embodiment, the pressure gauge 103 includes: a pressure sensing element, which is exposed in the first channel 106 corresponding to each solenoid valve 104, and the number of the pressure sensing elements is the same as the number of the solenoid valves 104.

[0057] By arranging independent pressure sensing elements in each first channel 106, the interference between the pressures of different gas paths is avoided, and the accuracy and reliability of gas flow measurement are improved. The one-to-one correspondence between the pressure sensing elements and the solenoid valves 104 enables the pressure data measured by each pressure sensing element to be fed back to the controller in real time. The controller can accurately adjust the opening and closing states of each solenoid valve 104, thereby realizing precise control of the gas flow in each gas flow channel.

[0058] Figure 3 and Figure 4 are the structural schematic diagrams of the gas flow monitoring systems of the second and third embodiments of the present utility model. The similarities between the second and third embodiments and the first embodiment will not be described in detail here. The differences are as follows:

[0059] In this embodiment, each chamber 101 is provided with a plurality of intake channels 102, and each intake channel 102 communicates with the outlet of one solenoid valve 104. When monitoring the gas flow, a plurality of solenoid valves 104 are configured to only open one.

[0060] By providing a plurality of intake channels 102 in each chamber 101, and each intake channel 102 being respectively connected to the outlet of a solenoid valve 104, precise monitoring of the gas flow rate at different positions within different chambers 101 is achieved. When the gas flow rate monitoring system monitors the gas flow rate, only one of the plurality of solenoid valves 104 is opened, which can avoid the airflow interference caused by the simultaneous opening of multiple intake channels 102, enabling precise control and monitoring of the gas flow rate in a single channel even in a complex structure with multiple chambers 101 and multiple intake channels 102.

[0061] Specifically, the inlet of the solenoid valve 104 is connected to a gas source, and the bypass port is connected to a pressure gauge 103. When it is necessary to monitor the gas flow rate of a certain intake channel 102, only the corresponding solenoid valve 104 is opened, and the other solenoid valves 104 remain closed. The gas enters from the gas source through the inlet of the solenoid valve 104, and a part of the gas reaches the pressure gauge 103 through the bypass port for monitoring the gas flow rate, and the remaining gas enters the chamber 101 through the outlet of the solenoid valve 104 and the intake channel 102. Since only one solenoid valve 104 is opened, the gas flow rate measured by the pressure gauge 103 only comes from the monitored intake channel 102, avoiding the interference of other intake channels 102. This enables precise gas flow rate monitoring of a single intake channel 102 even in the case of multiple channels and multiple positions, meeting the requirements for precise control of the gas flow rate in the semiconductor manufacturing process.

[0062] As Figure 3 and Figure 4 shown, the cavity 100 includes two chambers 101, and each chamber 101 is provided with two intake channels 102; the number of the solenoid valves 104 is four ( Figure 3 and Figure 4 only two are schematically shown), and each solenoid valve 104 is connected to one of the intake channels 102. In other embodiments, the cavity may further include three, four or five chambers.

[0063] In this embodiment, the cavity 100 includes two chambers 101, namely a left chamber 101a and a right chamber 101b. The left chamber 101a includes an intake channel 102A and an intake channel 102B, and the right chamber 101b includes an intake channel 102C and an intake channel 102D. The intake channel 102A, the intake channel 102B, the intake channel 102C and the intake channel 102D respectively correspond to a solenoid valve 104. During the process of gas flow rate monitoring, only one of the four solenoid valves 104 can be opened.

[0064] In this embodiment, when monitoring the gas flow using the gas flow monitoring system, the solenoid valve corresponding to the intake passage 102A is opened, and the other solenoid valves are closed. A predetermined amount of gas is set for the intake passage 102A through the pressure gauge 103. Since the controller in the pressure gauge 103 is electrically connected to the solenoid valve 104, the pressure gauge 103 can also actively control the gas flow in the intake passage 102A. When the amount of gas entering the chamber 101 reaches the preset value, the controller issues an instruction to close the solenoid valve 104.

[0065] It should be noted that in this embodiment, when each chamber 101 has multiple intake passages 102, different intake passages 102 are used to introduce different gases. In other embodiments, when each chamber has multiple intake passages, different intake passages may also be used to introduce the same gas.

[0066] In the semiconductor manufacturing process, different types and proportions of gases are required in different stages and different processes. For example, etching processes such as dry etching, deposition processes such as chemical vapor deposition (CVD) and physical vapor deposition (PVD), all require different gas combinations to optimize the process effect. Having each chamber 101 with multiple intake passages 102, and each passage introducing a different gas, can adjust the input gas and the ratio between gases in real time according to different process requirements in the same chamber 101, improving the quality of thin film deposition; in addition, each intake passage 102 is used to introduce a different gas, which can reduce the risk of gas cross-contamination and make the supply of each gas more stable and controllable.

[0067] In this embodiment, the number of the intake passages 102 in each chamber 101 is multiple; multiple intake passages 102 are all located at the top of the chamber 101; or, multiple intake passages 102 are all located on the side wall of the chamber 101; or, some of the intake passages 102 are located at the top of the chamber 101, and some of the intake passages 102 are located on the side wall of the chamber 101.

[0068] Each chamber 101 has multiple intake passages 102, enabling gas supply and gas flow monitoring at different positions within the same chamber 101. As Figure 3 shown, when multiple intake passages 102 are all located at the top of the chamber 101, the gas can enter the chamber 101 evenly from the top, which is suitable for processes that require gas supply from above, such as chemical vapor deposition (CVD), improving the uniformity of gas distribution. As Figure 4As shown, when multiple intake channels 102 are all located on the side walls of the chamber 101, gas enters from the side walls, enabling lateral gas supply, which is suitable for specific etching processes. When some of the intake channels 102 are located at the top and some are located on the side walls, greater flexibility is provided, and the entry direction and position of the gas can be adjusted according to different process requirements.

[0069] Although the present utility model is disclosed as above, the present utility model is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present utility model. Therefore, the protection scope of the present utility model should be subject to the scope defined by the claims.

Claims

1. A gas flow monitoring system, characterized in that, Comprising: A cavity, including a plurality of mutually isolated chambers, and one or more intake channels are provided in each of the chambers; A pressure gauge; A plurality of solenoid valves, the solenoid valves including an intake port, an outlet port, and a bypass port, each bypass port communicating with the pressure gauge, the intake port being used to supply gas to the solenoid valve, and the intake port communicating with the bypass port; the outlet port is used to communicate with the intake channel in the chamber for supplying gas to the chamber, and the solenoid valve is used to open or close the channel between the intake port and the outlet port.

2. The gas flow monitoring system according to claim 1, wherein The gas flow monitoring system further includes: a structural body, in which the pressure gauge and the plurality of solenoid valves are provided, and the structural body includes: A first channel, located between the bypass port and the pressure gauge, for connecting each bypass port and the pressure gauge; A second channel, one end of the second channel is connected to the intake port of the solenoid valve, and the other end of the second channel communicates with the outside of the structural body for supplying gas to each solenoid valve; A third channel, one end of the third channel is connected to the outlet port of the solenoid valve, and the other end of the third channel communicates with the intake channel of the chamber for discharging the gas in each solenoid valve.

3. The gas flow monitoring system according to claim 2, characterized in that, The pressure gauge is located at the top of the structural body, and the plurality of solenoid valves are located in the structural body and below the side of the pressure gauge.

4. The gas flow monitoring system according to claim 1, characterized in that, The cavity includes two chambers, each chamber is provided with an intake channel, and when monitoring the gas flow of one chamber, the corresponding solenoid valve is opened and the solenoid valve corresponding to the other chamber is closed.

5. The gas flow monitoring system according to claim 1, wherein, Each chamber is provided with a plurality of intake channels, and each intake channel communicates with the outlet port of one of the solenoid valves. When monitoring the gas flow, the plurality of solenoid valves are configured to only open one.

6. The gas flow monitoring system according to claim 5, characterized in that, The cavity includes two chambers, and each chamber is provided with two intake channels; The number of the solenoid valves is four, and each solenoid valve communicates with one of the intake channels.

7. The gas flow monitoring system according to claim 5, characterized in that, When each chamber has a plurality of intake channels, different intake channels are used to introduce different gases.

8. The gas flow monitoring system according to claim 1, characterized in that, The number of the intake channels in each chamber is multiple; A plurality of the intake channels are all located at the top of the chamber; Or, a plurality of the intake channels are all located on the side wall of the chamber; Or, some of the intake channels are located at the top of the chamber and some of the intake channels are located on the side wall of the chamber.

9. The gas flow monitoring system according to claim 8, characterized in that, The number of the intake channels in the chamber is two; [[ID= ​ ​ 10. The gas flow monitoring system according to claim 1, characterized in that ​ 11. The gas flow monitoring system according to claim 2, wherein, ​

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