Pattern erasing device for organic thin film of solar cell

Abstract

The utility model discloses a pattern erasing device for an organic thin film of a solar cell, which comprises a supporting seat, a fixing module, a pattern erasing module, a pattern erasing module and a pattern erasing module, wherein the supporting seat is provided with a fixing module for fixing the thin film to be erased; the height adjusting mechanism is slidably mounted on the supporting seat through a first horizontal adjusting mechanism and reciprocates in the first horizontal direction under the action of the first horizontal adjusting mechanism; the erasing assembly is in transmission connection with the height adjusting mechanism, the erasing assembly moves along with the height adjusting mechanism in the first horizontal direction, and the erasing assembly moves in the direction close to or away from the fixed module under the action of the height adjusting mechanism. According to the pattern erasing device, adjustment in the vertical direction and the horizontal direction is achieved through combination of at least two degrees of freedom so as to be close to or away from the film and achieve erasing operation within a certain range of a plane, and therefore pattern elimination on the organic film is achieved, and the pattern elimination difficulty of the organic film is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of solar cell processing equipment, in particular to a pattern erasing device for an organic thin film of a solar cell. Background Art

[0002] In the fabrication of large-area organic solar cells, patterning of organic thin films primarily relies on laser evaporation, but this is costly, risky, and difficult to obtain. Therefore, providing a pattern erasing device to erase patterns on organic thin films and reduce the difficulty of pattern erasure has become a pressing issue for those skilled in the art. Utility Model Content

[0003] The purpose of this utility model is to provide a pattern erasing device for an organic thin film of a solar cell, so as to achieve pattern erasure on the organic thin film and reduce the difficulty of pattern erasure of the organic thin film. This purpose is achieved through the following technical solutions:

[0004] The utility model provides a pattern erasing device for an organic thin film of a solar cell, the pattern erasing device comprising:

[0005] A support base, on which a fixing module for fixing the film to be erased is installed;

[0006] a height adjustment mechanism, the height adjustment mechanism being slidably mounted on the support seat via a first horizontal adjustment mechanism and reciprocating along a first horizontal direction under the action of the first horizontal adjustment mechanism;

[0007] An erasing assembly is in transmission connection with the height adjustment mechanism, the erasing assembly moves along the first horizontal direction with the height adjustment mechanism, and the erasing assembly moves toward or away from the fixing module under the action of the height adjustment mechanism.

[0008] During operation, the height adjustment mechanism is used to adjust the height of the erasing component so that the erasing component can contact the film that needs to be erased, and the horizontal position of the erasing component is adjusted by the first horizontal adjustment mechanism, thereby realizing the erasing operation at different positions on the film plane; in this way, the pattern erasing device realizes adjustment in the vertical and horizontal directions through a combination of at least two degrees of freedom, so as to approach or move away from the film and realize the erasing operation within a certain range of the plane, thereby realizing the pattern elimination on the organic film and reducing the difficulty of pattern elimination of the organic film.

[0009] In some embodiments, the first level adjustment mechanism comprises:

[0010] a first level adjustment motor;

[0011] a first horizontal adjustment screw, the first horizontal adjustment screw being in transmission connection with the first horizontal adjustment motor, and two ends of the first horizontal adjustment screw being respectively mounted on the support seat;

[0012] a first horizontal adjustment slider, the first horizontal adjustment slider being engaged with the first horizontal adjustment screw and being movable along the first horizontal adjustment screw in a first horizontal direction;

[0013] The height adjustment mechanism is installed on the first level adjustment slider.

[0014] In some embodiments, the first level adjustment mechanism further comprises:

[0015] A first horizontal guide rail, both ends of which are respectively mounted on the support seat, and the first horizontal adjustment slider is slidably mounted on the first horizontal guide rail.

[0016] In some embodiments, the height adjustment mechanism comprises:

[0017] Height adjustment motor;

[0018] a height adjustment screw, the height adjustment screw being in driving connection with the height adjustment motor, and the two ends of the height adjustment screw being respectively mounted on the first horizontal adjustment slider;

[0019] a height-adjusting slider, the height-adjusting slider being engaged with the height-adjusting lead screw and being capable of moving in a height direction along the height-adjusting lead screw;

[0020] The erasing assembly is mounted on the height-adjusting slider.

[0021] In some embodiments, the height adjustment mechanism further comprises:

[0022] The vertical guide rail, the first horizontal adjustment slider is a U-shaped structure, both ends of the vertical guide rail are respectively installed on the first horizontal adjustment slider, and the height adjustment slider is slidably installed on the vertical guide rail.

[0023] In some embodiments, the erasing component includes:

[0024] a first fixing plate, the first fixing plate being mounted on the height-adjusting slider, and having a guide bar hole formed therein;

[0025] a clamping head, one end of which is rotatably connected to the first fixing plate, and the other end of which is provided with a guide pin, which is movably mounted in the guide bar hole;

[0026] a spring buffer clip, the spring buffer clip being mounted on the clamping head;

[0027] An erasing head is installed in the spring buffer clip.

[0028] In some embodiments, the pattern erasing device for an organic thin film of a solar cell further comprises:

[0029] a second horizontal adjustment mechanism, wherein the fixing module is mounted on the support seat through the second horizontal adjustment mechanism and reciprocates along a second horizontal direction under the action of the second horizontal adjustment mechanism;

[0030] The first horizontal direction is perpendicular to the second horizontal direction.

[0031] In some embodiments, the second level adjustment mechanism comprises:

[0032] Second level adjustment motor;

[0033] a second horizontal adjustment screw, the second horizontal adjustment screw being in transmission connection with the second horizontal adjustment motor, and the two ends of the second horizontal adjustment screw being respectively mounted on the support seat;

[0034] a second horizontal adjustment slider, the second horizontal adjustment slider being engaged with the second horizontal adjustment screw and being movable along the second horizontal adjustment screw in a second horizontal direction;

[0035] The fixing module is installed on the second level adjustment slider.

[0036] In some embodiments, the fixing module includes:

[0037] a second fixing plate, the bottom of which is connected to the second level-adjusting slider;

[0038] a fixing frame, wherein the film to be erased is installed in the fixing frame and exposed from a central opening of the fixing frame;

[0039] A pressing claw, one end of which is rotatably mounted on the second fixing plate, and the pressing claw presses the fixing frame against the upper surface of the second fixing plate when the pressing claw is rotated to a pressing position.

[0040] In some embodiments, the fixing frame includes:

[0041] a bottom plate, the bottom plate being fixed to the second fixing plate;

[0042] The frame plate is detachably mounted on the bottom plate, and an accommodating space is defined between the bottom plate and the frame plate, wherein the film to be erased is inserted into the accommodating space. BRIEF DESCRIPTION OF THE DRAWINGS

[0043] Various other advantages and benefits will become apparent to those skilled in the art upon reading the detailed description of the preferred embodiment below. The accompanying drawings are for illustration purposes only and are not to be considered as limiting the present invention. The same reference numerals are used throughout the accompanying drawings to denote the same components. In the accompanying drawings:

[0044] Figure 1 Schematically shows one of the structural diagrams of a pattern erasing device for an organic thin film of a solar cell according to an embodiment of the present utility model;

[0045] Figure 2 Schematically shows a second structural diagram of a pattern erasing device for an organic thin film of a solar cell according to an embodiment of the present utility model;

[0046] Figure 3 The third structural diagram of the pattern erasing device for the organic thin film of a solar cell according to an embodiment of the present utility model is schematically shown;

[0047] Figure 4 The fourth structural diagram of the pattern erasing device for the organic thin film of a solar cell according to an embodiment of the present invention is schematically shown;

[0048] Figure 5 Schematically shows a fifth structural diagram of a pattern erasing device for an organic thin film of a solar cell according to an embodiment of the present utility model;

[0049] Figure 6 Schematically shows the sixth structural diagram of the pattern erasing device for the organic thin film of a solar cell according to an embodiment of the present utility model;

[0050] Figure 7 The seventh structural diagram of the pattern erasing device for the organic thin film of a solar cell according to the embodiment of the present utility model is schematically shown.

[0051] The reference numerals are as follows:

[0052] 1-Support seat;

[0053] 21-first level adjustment motor, 22-first level adjustment screw, 23-first level adjustment slider, 24-first level

[0054] guide;

[0055] 31-height adjustment motor, 32-height adjustment screw, 33-height adjustment slider, 34-vertical guide rail;

[0056] 41-first fixing plate, 42-guide bar hole, 43-clamping head, 44-spring buffer clamp, 45-erasing head;

[0057] 51-second level adjustment motor, 52-second level adjustment screw, 53-second level adjustment slider, 54-second level

[0058] guide;

[0059] 61- second fixing plate, 62- fixing frame. DETAILED DESCRIPTION

[0060] Exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although exemplary embodiments of the present disclosure are shown in the accompanying drawings, it should be understood that the present disclosure can be implemented in various forms and should not be limited by the embodiments described herein. Rather, these embodiments are provided to enable a more thorough understanding of the present disclosure and to fully convey the scope of the present disclosure to those skilled in the art.

[0061] It should be understood that the terms used herein are for the purpose of describing specific example embodiments only and are not intended to be limiting. Unless the context clearly indicates otherwise, the singular forms "one", "an" and "said" as used herein may also be meant to include plural forms. The terms "comprise", "include", "contain" and "have" are inclusive and therefore specify the presence of stated features, steps, operations, elements and / or parts, but do not exclude the presence or addition of one or more other features, steps, operations, elements, parts, and / or combinations thereof. The method steps, processes, and operations described herein are not to be construed as necessarily requiring them to be performed in the specific order described or illustrated, unless the order of execution is clearly indicated. It should also be understood that additional or alternative steps may be used.

[0062] Although the terms first, second, third, etc. can be used in the text to describe multiple elements, components, regions, layers and / or sections, these elements, components, regions, layers and / or sections should not be limited by these terms. These terms can only be used to distinguish an element, component, region, layer or section from another region, layer or section. Unless the context clearly indicates otherwise, terms such as "first", "second" and other numerical terms do not imply order or sequence when used in the text. Therefore, the first element, component, region, layer or section discussed below can be referred to as the second element, component, region, layer or section without departing from the teaching of the example embodiments.

[0063] For ease of description, spatially relative terms may be used herein to describe the relationship of one element or feature relative to another element or feature as shown in the figures, such as "inside," "outside," "inside," "outside," "below," "beneath," "above," and the like. Such spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is flipped over, an element described as "below" or "beneath" another element or feature would then be oriented "above" or "above" the other element or feature. Thus, the example term "below" can encompass both above and below orientations.

[0064] Please refer to Figure 1-Figure 7 The pattern erasing device provided by the present invention is used for organic thin films of solar cells, and the pattern erasing device includes a support base 1, a height adjustment mechanism and an erasing assembly; wherein, a fixing module for fixing the film to be erased is installed on the support base 1, and the support base 1 may specifically include a bottom frame and an upper frame, the fixing module is installed on the bottom frame, and the first horizontal adjustment mechanism is installed on the upper frame, for example, on the two side arms of the upper frame. The support base 1 is the basic structure of the pattern erasing device, and is made of sturdy and durable materials to ensure that the entire erasing process is stable and vibration-free. The bottom frame is responsible for bearing the weight of the entire device and providing a stable operating platform, and the upper frame is used to install the first horizontal adjustment mechanism. The fixing module is located on the bottom frame of the support base 1, and its function is to firmly fix the organic film to be erased to prevent displacement during the erasing process; theoretically speaking, the fixing module can be a vacuum adsorption device, a clamp or a magnetic adsorption device, etc., to adapt to films of different thicknesses.

[0065] The height adjustment mechanism is slidably mounted on the support seat 1 through a first horizontal adjustment mechanism, and reciprocates along the first horizontal direction under the action of the first horizontal adjustment mechanism. The height direction can be understood as the Z-axis direction of the three-dimensional coordinate system, and the first horizontal direction can be understood as the Y-axis direction of the three-dimensional coordinate system. The height adjustment mechanism is connected to the support seat 1 through the first horizontal adjustment mechanism, and can perform precise reciprocating motion along the first horizontal direction (Y-axis direction) under the action of the first horizontal adjustment mechanism. The height adjustment mechanism can include a servo motor, a screw or a pneumatic system drive to ensure the smoothness and repeatability of the motion. The erasing component is connected to the height adjustment mechanism in a transmission manner. The erasing component moves along the first horizontal direction with the height adjustment mechanism, and the erasing component moves toward or away from the fixed module under the action of the height adjustment mechanism; the height adjustment mechanism can also be height-adjusted in the Z-axis direction of the three-dimensional coordinate system, thereby controlling the distance between the erasing component and the surface of the film, so that the erasing component can contact the film and avoid damaging the film.

[0066] During operation, the height adjustment mechanism is used to adjust the height of the erasing component so that the erasing component can contact the film that needs to be erased, and the horizontal position of the erasing component is adjusted by the first horizontal adjustment mechanism, thereby realizing the erasing operation at different positions on the film plane; in this way, the pattern erasing device realizes adjustment in the vertical and horizontal directions through a combination of at least two degrees of freedom, so as to approach or move away from the film and realize the erasing operation within a certain range of the plane, thereby realizing the pattern elimination on the organic film and reducing the difficulty of pattern elimination of the organic film.

[0067] In some embodiments, the first horizontal adjustment mechanism includes a first horizontal adjustment motor 21, a first horizontal adjustment screw 22 and a first horizontal adjustment slider 23; wherein, the first horizontal adjustment screw 22 is transmission-connected to the first horizontal adjustment motor 21, and both ends of the first horizontal adjustment screw 22 are respectively installed on the support seat 1; the first horizontal adjustment slider 23 is engaged with the first horizontal adjustment screw 22 and can move in the first horizontal direction along the first horizontal adjustment screw 22; the height adjustment mechanism is installed on the first horizontal adjustment slider 23.

[0068] During operation, the first horizontal adjustment motor 21 is started, and the motor is connected to the first horizontal adjustment screw 22 through a transmission device (such as a gear or a belt), driving the first horizontal adjustment screw 22 to rotate, and the first horizontal adjustment slider 23 engaged with the first horizontal adjustment screw 22 moves along the length direction of the first horizontal adjustment screw 22 (the first horizontal direction, i.e., the Y-axis direction), bringing the height adjustment mechanism and the erasing assembly thereon to the working starting position; the height of the erasing assembly is adjusted by the height adjustment mechanism to ensure that the erasing assembly maintains an appropriate distance from the film surface. After confirming that the erasing assembly is in the correct position, the erasing assembly is started to start erasing the pattern on the film; the first horizontal adjustment motor 21 continues to work, driving the first horizontal adjustment slider 23 to move along the first horizontal adjustment screw 22 at a uniform speed or variable speed in the first horizontal direction, so that the erasing assembly performs continuous or intermittent erasing action on the film surface; during the erasing process, the operator adjusts the height and horizontal position of the erasing assembly in real time according to the erasing effect to ensure that the pattern is erased evenly and thoroughly.

[0069] The first horizontal adjustment mechanism also includes a first horizontal guide rail 24, the ends of which are mounted on the support base 1. The first horizontal adjustment slider 23 is slidably mounted on the first horizontal guide rail 24. When the first horizontal adjustment slider 23 moves along the Y-axis, it can follow the first horizontal guide rail 24 to improve the guidance of horizontal movement. Specifically, two sets of first horizontal guide rails 24 can be provided, with the two first horizontal guide rails 24 arranged in parallel and located on either side of the first horizontal adjustment screw 22.

[0070] Specifically, the height adjustment mechanism includes a height adjustment motor 31, a height adjustment screw 32, and a height adjustment slider 33. The height adjustment screw 32 is in driving connection with the height adjustment motor 31, and both ends of the height adjustment screw 32 are mounted on the first horizontal adjustment slider 23. The height adjustment slider 33 engages with the height adjustment screw 32 and is capable of moving in the height direction along the height adjustment screw 32. The erasing assembly is mounted on the height adjustment slider 33. During operation, starting the height adjustment motor 31 drives the height adjustment screw 32 to rotate, thereby driving the height adjustment slider 33 and the components thereon to move along the height adjustment screw 32.

[0071] To improve guidance capabilities, the height adjustment mechanism further includes vertical guide rails 34. The first horizontal adjustment slider 23 has a U-shaped structure, with both ends of the vertical guide rails 34 mounted on the first horizontal adjustment slider 23. The height adjustment slider 33 is slidably mounted on the vertical guide rails 34. Specifically, two sets of height adjustment guide rails can be provided, with the two height adjustment guide rails arranged in parallel and located on either side of the height adjustment screw.

[0072] In some embodiments, the erasing assembly includes a first fixed plate 41, a clamping head 43, a spring buffer clamp 44 and an erasing head 45; wherein, the first fixed plate 41 is installed on the height adjustment slider 33, and a guide bar hole 42 is provided on the first fixed plate 41, one end of the clamping head 43 is rotatably connected to the first fixed plate 41, and the other end of the clamping head 43 is provided with a guide pin, and the guide pin can be movably installed in the guide bar hole 42; the spring buffer clamp is installed on the clamping head 43, and the erasing head 45 is installed in the spring buffer clamp 44, and the spring buffer clamp can adjust the inclination angle by a knob; adjust the position of the spring buffer clamp 44 to ensure that the erasing head 45 maintains an appropriate distance from the film surface and the spring can provide appropriate buffering effect. Specifically, the first fixed plate 41 is installed on the height adjustment slider 33 to ensure that the first fixed plate 41 is stable and will not be displaced during the erasing process; one end of the clamping head 43 is rotatably connected to the first fixed plate 41, and the guide pin at the other end is movably installed in the guide strip hole 42 on the first fixed plate 41, so that the clamping head 43 can rotate freely in the guide strip hole 42.

[0073] In order to expand the erasing range, the relative movement between the erasing head 45 and the fixed module may include other horizontal directions in addition to the above-mentioned first horizontal direction; for example, the pattern erasing device for organic thin film of solar cell also includes a second horizontal adjustment mechanism, and the fixed module is installed on the support seat 1 through the second horizontal adjustment mechanism, and reciprocates along the second horizontal direction under the action of the second horizontal adjustment mechanism. The first horizontal direction is perpendicular to the second horizontal direction, that is, the second horizontal direction is the X-axis direction of the three-dimensional coordinate system.

[0074] Specifically, the second horizontal adjustment mechanism includes a second horizontal adjustment motor 51, a second horizontal adjustment screw 52, and a second horizontal adjustment slider 53. The second horizontal adjustment screw 52 is in transmission connection with the second horizontal adjustment motor 51, and both ends of the second horizontal adjustment screw 52 are respectively mounted on the support base 1. The second horizontal adjustment slider 53 is engaged with the second horizontal adjustment screw 52 and is capable of moving along the second horizontal adjustment screw 52 in a second horizontal direction. The fixing module is mounted on the second horizontal adjustment slider 53. During operation, the second horizontal adjustment motor 51 is started to drive the second horizontal adjustment screw 52 to rotate, thereby driving the second horizontal adjustment slider 53 engaged with the screw and the fixing module thereon to move horizontally, thereby adjusting the relative position between the film and the erasing head 45 and expanding the erasing range.

[0075] To improve guiding performance, the second horizontal adjustment mechanism further includes a second horizontal guide rail 54. Both ends of the second horizontal guide rail 54 are fixed to the support base 1 via mounting brackets. A guide block is provided at the bottom of the second fixing plate 61. The guide block is sleeved on the second horizontal guide rail 54 and can slide along the second horizontal guide rail 54. Two sets of second horizontal guide rails 54 can be provided, one on each side of the second horizontal adjustment screw 52.

[0076] The fixing module includes a second fixing plate 61, a fixing frame 62, and a pressure claw. The bottom of the second fixing plate 61 is connected to the second horizontal adjustment slider 53. The film to be erased is installed in the fixing frame 62 and is exposed from the central opening of the fixing frame 62. One end of the pressure claw is rotatably mounted on the second fixing plate 61. When the pressure claw is rotated to the pressing position, it presses the fixing frame 62 against the upper surface of the second fixing plate 61. The fixing frame 62 includes a bottom plate and a frame plate. The bottom plate is fixed to the second fixing plate 61. The frame plate is detachably mounted on the bottom plate, and there is a accommodating space between the bottom plate and the frame plate. The film to be erased is inserted into the accommodating space. In other words, the fixing frame 62 is composed of two pieces, the upper part is the frame plate, and the film is exposed through the central opening in the middle of the frame plate. The lower part is the bottom plate, and the film is fixed between the upper and lower pieces.

[0077] Theoretically speaking, the first horizontal adjustment mechanism, the height adjustment mechanism and the second horizontal adjustment mechanism are not limited to the structural form provided in this embodiment. As long as each adjustment mechanism can realize linear motion, it can also be a telescopic cylinder or other structure. In order to facilitate adjustment and control, the motors used in each adjustment mechanism can all be stepper motors or servo motors.

[0078] It should be understood that the ordinal numbers such as "first" and "second" mentioned herein are only used to distinguish different structures with the same name and are merely for the convenience of description. They do not indicate any order and should not be understood as any limitation.

[0079] The pattern erasing device provided by the present invention has a three-axis moving mechanism that can move in three directions, XYZ. The erasing component includes a clamping head 43 with an adjustable inclination angle, a spring buffer clamp 44 that can be extended and retracted up and down, and a replaceable erasing head 45 of different widths. During erasing, a fixing module is used to fix the film (such as a glass sheet) so that the part to be erased is exposed on the surface without damaging the film. It can erase the pattern, erase width, and erase force while leaving the substrate intact. It plays an important role in the preparation of large-area organic solar cell modules and has potential industrial application value and development prospects.

[0080] The above description is merely a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any changes or substitutions that can be easily conceived by a person skilled in the art within the technical scope disclosed in the present invention should be included in the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be based on the scope of protection of the claims.

Claims

1. A pattern erasing device for an organic thin film of a solar cell, characterized in that: The pattern erasing device comprises: A support base, on which a fixing module for fixing the film to be erased is installed; a height adjustment mechanism, the height adjustment mechanism being slidably mounted on the support seat via a first horizontal adjustment mechanism and reciprocating along a first horizontal direction under the action of the first horizontal adjustment mechanism; An erasing assembly is in transmission connection with the height adjustment mechanism, the erasing assembly moves along the first horizontal direction with the height adjustment mechanism, and the erasing assembly moves toward or away from the fixing module under the action of the height adjustment mechanism.

2. The pattern erasing device for organic thin films of solar cells according to claim 1, characterized in that: The first level adjustment mechanism comprises: a first level adjustment motor; a first horizontal adjustment screw, the first horizontal adjustment screw being in transmission connection with the first horizontal adjustment motor, and two ends of the first horizontal adjustment screw being respectively mounted on the support seat; a first horizontal adjustment slider, the first horizontal adjustment slider being engaged with the first horizontal adjustment screw and being movable along the first horizontal adjustment screw in a first horizontal direction; The height adjustment mechanism is installed on the first level adjustment slider.

3. The pattern erasing device for an organic thin film of a solar cell according to claim 2, characterized in that: The first level adjustment mechanism further includes: A first horizontal guide rail, both ends of which are respectively mounted on the support seat, and the first horizontal adjustment slider is slidably mounted on the first horizontal guide rail.

4. The pattern erasing device for an organic thin film of a solar cell according to claim 2, characterized in that: The height adjustment mechanism comprises: Height adjustment motor; a height adjustment screw, the height adjustment screw being in driving connection with the height adjustment motor, and the two ends of the height adjustment screw being respectively mounted on the first horizontal adjustment slider; a height-adjusting slider, the height-adjusting slider being engaged with the height-adjusting lead screw and being capable of moving in a height direction along the height-adjusting lead screw; The erasing assembly is mounted on the height-adjusting slider.

5. The pattern erasing device for organic thin films of solar cells according to claim 4, characterized in that: The height adjustment mechanism further comprises: The vertical guide rail, the first horizontal adjustment slider is a U-shaped structure, both ends of the vertical guide rail are respectively installed on the first horizontal adjustment slider, and the height adjustment slider is slidably installed on the vertical guide rail.

6. The pattern erasing device for an organic thin film of a solar cell according to claim 4, characterized in that: The erasing component includes: a first fixing plate, the first fixing plate being mounted on the height-adjusting slider, and having a guide bar hole formed therein; a clamping head, one end of which is rotatably connected to the first fixing plate, and the other end of which is provided with a guide pin, which is movably mounted in the guide bar hole; a spring buffer clip, the spring buffer clip being mounted on the clamping head; An erasing head is installed in the spring buffer clip.

7. The pattern erasing device for an organic thin film of a solar cell according to any one of claims 1 to 6, characterized in that: Also includes: a second horizontal adjustment mechanism, wherein the fixing module is mounted on the support seat through the second horizontal adjustment mechanism and reciprocates along a second horizontal direction under the action of the second horizontal adjustment mechanism; The first horizontal direction is perpendicular to the second horizontal direction.

8. The pattern erasing device for an organic thin film of a solar cell according to claim 7, characterized in that: The second level adjustment mechanism includes: Second level adjustment motor; a second horizontal adjustment screw, the second horizontal adjustment screw being in transmission connection with the second horizontal adjustment motor, and the two ends of the second horizontal adjustment screw being respectively mounted on the support seat; a second horizontal adjustment slider, the second horizontal adjustment slider being engaged with the second horizontal adjustment screw and being movable along the second horizontal adjustment screw in a second horizontal direction; The fixing module is installed on the second level adjustment slider.

9. The pattern erasing device for an organic thin film of a solar cell according to claim 8, characterized in that: The fixing module includes: a second fixing plate, the bottom of which is connected to the second level-adjusting slider; a fixing frame, wherein the film to be erased is installed in the fixing frame and exposed from a central opening of the fixing frame; A pressing claw, one end of which is rotatably mounted on the second fixing plate, and the pressing claw presses the fixing frame against the upper surface of the second fixing plate when the pressing claw is rotated to a pressing position.

10. The pattern erasing device for an organic thin film of a solar cell according to claim 9, characterized in that: The fixed frame includes: a bottom plate, the bottom plate being fixed to the second fixing plate; The frame plate is detachably mounted on the bottom plate, and an accommodating space is defined between the bottom plate and the frame plate, wherein the film to be erased is inserted into the accommodating space.

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