Optical filter assembly for etching machine end point detection system

Abstract

The utility model provides an optical filter assembly for an etching machine end point detection system, which relates to the field of etching machines and comprises a shell with a cylindrical through hole, a cylindrical optical filter and an annular clamp spring. An annular baffle plate is arranged at the opening part of the cylindrical through hole of the shell; an annular groove is formed in the inner wall of the cylindrical through hole of the shell; the circular ring outer diameter of the clamp spring is equal to that of the groove; the inner diameter of the ring of the snap spring is smaller than the diameter of the cylindrical through hole of the shell; the clamp spring is detachably fixed in the groove; the optical filter is arranged between the clamp spring and the circular ring baffle plate; and the two cylindrical bottom surfaces of the optical filter respectively abut against the snap springs and are fixed with the circular ring baffle plate. The optical filter assembly for the etching machine end point detection system provided by the utility model solves the problem that the optical filter is easy to deviate in angle and even fall off in the prior art, and the optical filter can be stably fixed.

Description

Technical Field

[0001] The utility model relates to the field of etching machines, in particular to a filter assembly for an end point detection system of an etching machine. Background Art

[0002] The etcher is a key device widely used in microelectronics manufacturing and the semiconductor industry. Its main function is to etch fine patterns on the surface of thin film materials through chemical or physical methods to form the desired pattern or structure.

[0003] During the laser etching process, key parameters such as etching depth and uniformity need to be detected in real time. At this time, the filter can be combined with the detection system to form an etcher endpoint detection system. Its purpose is to filter out interfering light signals and improve the signal-to-noise ratio and accuracy of the detection system.

[0004] In the prior art, such as the method of using laser to etch an organic film on the surface of a metal film disclosed in Chinese patent application No. 202410168538.7, it is mentioned that the optical power detector collects the reflected light beam through a filter, that is, the filter is used to filter out the interfering light signal to improve the signal-to-noise ratio and accuracy of the detection system.

[0005] The filter will be worn out during use. After the filter in the endpoint detection system has been used for a period of time, it needs to be replaced to ensure the stability of the filter optical system.

[0006] The existing optical filter is usually fixed by a shell structure to form a filter assembly, and then the shell of the filter assembly is matched with the rest of the structure of the endpoint detection system to achieve the fixation of the filter in the endpoint detection system. Figure 1 and Figure 2 As shown, it consists of a shell 01 with a cylindrical through hole and a cylindrical filter 02; a circular abutment plate 03 is provided in the cylindrical through hole of the shell 01, and the filter 02 is arranged inside the through hole of the shell 01. The bottom surface of one side of the filter 02 is adhered to the filter 02 by glue, and the cylindrical side wall of the filter 02 is in contact with the inner wall of the cylindrical through hole of the shell 01. However, gluing the filter 02 to the abutment plate 03 with glue may, on the one hand, cause the cylindrical bottom surface of the filter 02 to be non-parallel to the plate surface of the abutment plate 03, because the presence of glue may cause the angle of the filter 02 (the angle refers to the angle between the axis of the cylindrical filter 02 and the axis of the through hole of the shell 01) to deviate. Due to the angular dispersion phenomenon, the filter will have different performance at different angles, and the change in the filter angle may also affect the transmittance of the filter and affect the end point detection system's reception of light passing through the filter; on the other hand, the filter 02 may also fall off from the abutment plate 03 due to the failure of the glue. Utility Model Content

[0007] In response to the above technical problems, the utility model provides a filter assembly for an end point detection system of an etching machine, which can stably fix the filter.

[0008] In order to achieve the above purpose, the technical solution adopted by the utility model is:

[0009] The utility model provides a filter assembly for an end point detection system of an etching machine, comprising a shell with a cylindrical through hole, a cylindrical filter and an annular retaining spring; a circular baffle is provided at the mouth of the cylindrical through hole of the shell; the plate surface of the circular baffle is perpendicular to the hole axis of the cylindrical through hole of the shell; the inner diameter of the circular baffle is smaller than the diameter of the cylindrical through hole of the shell; a circular groove is provided on the inner wall of the cylindrical through hole of the shell; the circular axis of the groove is coaxial with the axis of the cylindrical through hole of the shell; the outer diameter of the circular baffle is smaller than the diameter of the cylindrical through hole of the shell; the inner wall of the cylindrical through hole of the shell is provided with a circular groove; the circular axis of the groove is coaxial with the cylindrical through hole axis of the shell; the outer diameter of the circular ring of the retaining spring is smaller than the inner ... The diameter is equal to the outer diameter of the ring of the groove; the inner diameter of the ring of the retaining spring is smaller than the diameter of the cylindrical through hole of the shell; the retaining spring is detachably fixed in the groove; when the retaining spring is fixed in the groove; the distance between the annular baffle and the groove is equal to the length of the cylindrical height of the filter; the cylindrical diameter of the filter is equal to the diameter of the cylindrical through hole of the shell; the cylindrical axis of the filter coincides with the hole axis of the cylindrical through hole of the shell; the filter is arranged between the retaining spring and the annular baffle.

[0010] In the optical filter assembly for the endpoint detection system of the etching machine provided by the present invention, preferably, the inner diameter of the circular ring of the retaining spring is equal to the inner diameter of the circular ring of the circular baffle.

[0011] The above technical solution has the following advantages or beneficial effects:

[0012] The utility model provides a filter assembly for an end point detection system of an etching machine, which relates to the field of etching machines and comprises a shell with a cylindrical through hole, a cylindrical filter and an annular retaining spring; an annular baffle is provided at the mouth of the cylindrical through hole of the shell; the plate surface of the annular baffle is perpendicular to the hole axis of the cylindrical through hole of the shell; the inner diameter of the annular baffle is smaller than the diameter of the cylindrical through hole of the shell; an annular groove is provided on the inner wall of the cylindrical through hole of the shell; the annular axis of the groove is coaxial with the axis of the cylindrical through hole of the shell; the retaining spring The outer diameter of the spring ring is equal to the outer diameter of the groove ring; the inner diameter of the spring ring is less than the diameter of the cylindrical through hole of the housing; the spring is detachably fixed in the groove; when the spring is fixed in the groove, the distance between the ring baffle and the groove is equal to the length of the cylindrical height of the filter; the cylindrical diameter of the filter is equal to the diameter of the cylindrical through hole of the housing; the cylindrical axis of the filter coincides with the axis of the cylindrical through hole of the housing; the filter is arranged between the spring and the ring baffle. The filter assembly for the endpoint detection system of the etching machine provided by the utility model solves the problem of the filter being easily offset or even falling off in the prior art, and can stably fix the filter. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] The present invention and its features, features, configurations, and advantages will become more apparent upon reading the detailed description of the following non-limiting embodiments with reference to the accompanying drawings. Like reference numerals indicate like parts throughout the drawings. The drawings are not drawn to scale, with emphasis placed on illustrating the subject matter of the present invention.

[0014] Figure 1 It is a schematic diagram of the overall structure of the prior art filter assembly provided by the background technology.

[0015] Figure 2 It is a schematic diagram of the exploded structure of the prior art filter assembly provided in the background art.

[0016] Figure 3 It is a schematic diagram of the overall structure of the filter assembly for the etcher endpoint detection system provided in Example 1 of the present utility model.

[0017] Figure 4 This is a schematic diagram of the exploded structure of the filter assembly for the end point detection system of the etching machine provided in Example 1 of the present utility model.

[0018] Figure 5 It is a structural schematic diagram of the housing of the filter assembly for the endpoint detection system of the etching machine provided in Example 1 of the present utility model. DETAILED DESCRIPTION

[0019] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of this application can be combined with each other. It should be noted that the terms used in this utility model are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to this application.

[0020] The following describes the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. It is obvious that the embodiments described are only some of the embodiments of the present invention, rather than all of the embodiments. Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative work are within the scope of protection of the present invention.

[0021] Example 1:

[0022] The filter assembly for the etching machine endpoint detection system provided in Example 1 of the present utility model is as follows: Figures 1 to 5 As shown, it includes a housing 1 with a cylindrical through hole, a cylindrical filter 2 and an annular retaining ring 3; a circular baffle 11 is provided at the mouth of the cylindrical through hole of the housing 1; the plate surface of the circular baffle 11 is perpendicular to the hole axis of the cylindrical through hole of the housing 1; the inner diameter of the circular baffle 11 is smaller than the diameter of the cylindrical through hole of the housing 1; a circular groove 12 is provided on the inner wall of the cylindrical through hole of the housing 1; the axis of the groove 12 is coaxial with the axis of the cylindrical through hole of the housing 1; the outer diameter of the ring of the retaining ring 3 is the same as that of the groove 1 2; the inner diameter of the ring of the retaining ring 3 is smaller than the diameter of the cylindrical through hole of the housing 1; the retaining ring 3 is detachably fixed in the groove 12; when the retaining ring 3 is fixed in the groove 12; the distance between the annular baffle 11 and the groove 12 is equal to the length of the cylindrical height of the filter 2; the cylindrical diameter of the filter 2 is equal to the diameter of the cylindrical through hole of the housing 1; the cylindrical axis of the filter 2 coincides with the hole axis of the cylindrical through hole of the housing 1; the filter 2 is arranged between the retaining ring 3 and the annular baffle 11.

[0023] When assembling the filter assembly for the end point detection system of the etching machine provided in Example 1 of the present invention, the filter 2 is first limited by the cylindrical through hole of the housing 1, so that the filter 2 can only move along the axis of the cylindrical through hole of the housing 1, and the cylindrical side surface of the filter 2 slides against the inner wall of the cylindrical through hole of the housing 1; when the bottom surface of the filter 2 contacts the bottom surface of the annular baffle 11 (the bottom surface of the annular baffle 11 facing the cylindrical through hole of the housing 1), the filter stops moving; at this time, the retaining spring 3 (the retaining spring is a prior art, which can be elastically shaped by extrusion within a certain range) is inserted. The clamping spring 3 is fixed in the annular groove 12. After the clamping spring 3 is in the groove 12, the force exerted on the clamping spring 3 to deform it is stopped, and the clamping spring 3 is restored and fixed in the groove 12. Since the inner diameter of the annular structure of the restored clamping spring 3 is smaller than the diameter of the cylindrical through hole of the housing 1, the inner diameter of the annular ring of the clamping spring 3 is smaller than the diameter of the filter 2. Therefore, after the clamping spring 3 is in the groove 12, the structure of the clamping spring 3 will prevent the filter 2 from moving along the axis of the cylindrical through hole of the housing 1. The length of the distance between them is just equal to the height of the filter 2. Therefore, when the bottom surface of one side of the filter 2 is against the bottom surface of the annular baffle 11, the retaining spring 3 in the groove 12 can just clamp the filter 2, so that the filter 2 is between the annular baffle 11 and the retaining spring 3 (in the direction of the axis of the cylindrical through hole of the shell 1); compared with the prior art, the filter 02 is fixed to the abutment plate 03 in the shell 01 by glue. The glue adhesion may cause the filter 02 to fall off the abutment plate 03 due to the instability of the glue properties, and the glue as a The presence of such substances may cause the angle of the filter 02 to change (the glue on the surface of the abutment plate 03 is uneven, causing the surface of the abutment plate 03 to tilt, causing the cylindrical bottom surface of the filter 02 fixed on the abutment plate to tilt); in this embodiment, the mechanical structure of the retaining spring 3 is used to squeeze and fix the filter 2 toward the annular baffle 11, so there will be no situation where the glue sticks and falls off, and there will be no situation where the filter angle changes due to the unevenness of the abutment plate caused by the glue. Therefore, the structure provided by the utility model can fix the filter more stably.

[0024] When the filter assembly for the etcher endpoint detection system provided in Example 1 of the utility model is in use, the external received light enters the cylindrical through hole of the shell 1, and is filtered by the filter 2 from the inner circle of the ring of the retaining spring 3. The filtered light passes through the inner circle hole of the ring baffle 11 and enters the subsequent processing structure of the etcher endpoint detection system.

[0025] The filter assembly for the end point detection system of the etching machine provided in the embodiment of the present invention solves the problem in the prior art that the filter is easily angularly offset or even falls off by changing the structure of the shell 1 and the way the filter 2 is fixed in the shell 1, and can stably fix the filter.

[0026] As a preferred solution, in this embodiment, the inner diameter of the ring of the retaining spring 3 is equal to the inner diameter of the ring of the annular baffle 11. In a projection perpendicular to the axis of the cylindrical through hole of the housing 1, the inner circular hole of the retaining spring 3 and the projection of the inner circular hole of the annular baffle 11 overlap. Therefore, when external light passes through the filter 2 between the retaining spring 3 and the annular baffle 11 in a straight line, the portions blocked by the retaining spring 3 and the annular baffle 11 overlap, preventing the retaining spring 3 or the annular baffle 11 from individually blocking part of the light and affecting light collection (the smaller the aperture of the inner circular hole of the retaining spring 3, the larger the contact surface of the retaining spring 3 on the filter 2, thereby more stably applying pressure to the filter 2. When the aperture of the inner circular hole of the retaining spring 3 is the same as the aperture of the inner circular hole of the annular baffle 11, the retaining spring 3 can provide maximum structural support for the filter 2 while additionally blocking light).

[0027] In summary, the utility model provides a filter assembly for an end point detection system of an etching machine, which relates to the field of etching machines, and comprises a shell with a cylindrical through hole, a cylindrical filter and an annular retaining spring; an annular baffle is provided at the mouth of the cylindrical through hole of the shell; the plate surface of the annular baffle is perpendicular to the hole axis of the cylindrical through hole of the shell; the inner diameter of the annular baffle is smaller than the diameter of the cylindrical through hole of the shell; an annular groove is provided on the inner wall of the cylindrical through hole of the shell; the annular axis of the groove is coaxial with the axis of the cylindrical through hole of the shell; The outer diameter of the circular ring of the retaining spring is equal to the outer diameter of the circular ring of the groove; the inner diameter of the circular ring of the retaining spring is less than the diameter of the cylindrical through hole of the housing; the retaining spring is detachably fixed in the groove; when the retaining spring is fixed in the groove, the distance between the circular baffle and the groove is equal to the length of the cylindrical height of the filter; the cylindrical diameter of the filter is equal to the diameter of the cylindrical through hole of the housing; the cylindrical axis of the filter coincides with the axis of the cylindrical through hole of the housing; the filter is arranged between the retaining spring and the circular baffle. The filter assembly for the endpoint detection system of the etching machine provided by the utility model solves the problem of the filter being easily offset or even falling off in the prior art, and can ensure that the filter is stably fixed.

[0028] The above description is only a preferred embodiment of the present invention and does not limit the patent scope of the present invention. Any equivalent structural transformation made using the contents of the description and drawings of the present invention, or directly or indirectly applied in other related technical fields, is also included in the patent protection scope of the present invention.

Claims

1. A filter assembly for an end point detection system of an etching machine, characterized in that: The invention comprises a shell with a cylindrical through hole, a cylindrical filter and an annular retaining spring; The mouth of the cylindrical through hole of the shell is provided with an annular baffle; the plate surface of the annular baffle is perpendicular to the hole axis of the cylindrical through hole of the shell; the inner diameter of the annular baffle is smaller than the diameter of the cylindrical through hole of the shell; A circular groove is formed on the inner wall of the cylindrical through hole of the housing; the axis of the groove is coaxial with the axis of the cylindrical through hole of the housing; the outer diameter of the ring of the circlip is equal to the outer diameter of the ring of the groove; the inner diameter of the ring of the circlip is shorter than the diameter of the cylindrical through hole of the housing; the circlip is detachably fixed in the groove; When the retaining ring is fixed in the groove, the distance between the annular baffle and the groove is equal to the length of the cylindrical height of the filter; The cylindrical diameter of the filter is equal to the diameter of the cylindrical through hole of the housing; the cylindrical axis of the filter coincides with the hole axis of the cylindrical through hole of the housing; and the filter is arranged between the retaining spring and the annular baffle.

2. The filter assembly for an end point detection system of an etching machine according to claim 1, wherein: The inner diameter of the circular ring of the retaining spring is equal to the inner diameter of the circular ring of the circular baffle.

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