Thermosensitive film storage rack
By designing a thermal film storage rack with cleaning board and temperature and humidity control, the problems of dust pollution and temperature and humidity control are solved to ensure the stability and imaging effect of the film.
Patent Information
- Application Number
- CN202422589359.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-25
- Publication Date
- 2025-09-02
- Estimated Expiration
- 2034-10-25
AI Technical Summary
Thermal-sensitive films are easily contaminated by dust during storage and the temperature and humidity are not easy to control, which affects the imaging effect. The existing storage equipment is difficult to meet the dry, cool and dust-free storage requirements.
A storage rack including a frame, a placement groove and a placement mechanism is designed, with a cleaning board and a temperature and humidity control system, which cleans dust by sliding the cleaning board to maintain a suitable temperature and humidity environment.
Effectively prevent dust pollution, maintain appropriate temperature and humidity, ensure the stability of thermal films, avoid physical damage and chemical reactions, and improve imaging effects.
Smart Images
Figure CN223291340U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of thermal film storage, in particular to a thermal film storage rack. Background Art
[0002] Medical film refers to the medium used to carry medical imaging information. Currently, most radiology films are chemical imaging films, including laser film and thermal film. Thermal film should be stored in a dry, cool, dust-free environment, away from direct sunlight. Thermal film should be stored flat or vertically, avoiding bending or folding to reduce the risk of physical damage.
[0003] During the storage process, thermal film should be protected from dust contamination. At the same time, attention should be paid to temperature and humidity. The temperature should be maintained between 20℃ and 25℃ to ensure that the chemical substances in the film remain stable and to avoid accelerated chemical reactions caused by high temperature or hardening of the film caused by low temperature. At the same time, the humidity of the storage environment should be maintained between 50% and 60% RH (relative humidity). Too high humidity may cause the film to get damp and affect the imaging effect, while too low humidity may make the film brittle.
[0004] Therefore, solve the above problems by a thermal film storage rack. Summary of the Invention
[0005] The purpose of the utility model is to provide a thermal film storage rack to solve the problems raised in the above background technology.
[0006] To achieve the above purpose, the present invention provides the following technical solution: comprising a frame, the interior of the frame is divided into multiple placement slots, a placement mechanism is provided inside the placement slot, the placement mechanism slides inside the placement slot and is used to place the thermal sheet.
[0007] Preferably, a plurality of support plates are provided inside the frame, and sliding grooves are symmetrically provided on the top ends of the support plates, and the sliding grooves are slidably connected to the placement mechanism.
[0008] Preferably, the placement mechanism includes a placement frame, and sliders are symmetrically provided at the bottom end of the placement frame, and the sliders are engaged with the sliding grooves.
[0009] Preferably, second grooves are symmetrically provided on both side walls of the placement frame, a cleaning plate is provided inside the placement frame, two second grooves are connected to the cleaning plate, and a reset member is provided between the cleaning plate and the inner side walls of the placement frame.
[0010] Preferably, there is a baffle at one end of the placement frame away from the cleaning plate, and the baffle is semicircular and arranged at the bottom end of the placement frame.
[0011] Preferably, a through hole is opened at the bottom end of the placement frame, and the through hole is located on the other side of the baffle.
[0012] Preferably, a ventilation hole is provided on the inner side wall of the placement groove, and a temperature and humidity control device is extended on one side of the frame body, and the temperature and humidity control device is connected to the ventilation hole.
[0013] Preferably, the height of the placement groove is higher than the height of the placement mechanism.
[0014] Preferably, a sealing door is provided on the front side of the frame.
[0015] Technical effects and advantages of this utility model:
[0016] 1. The utility model pulls the cleaning plate, which moves along the direction of the second groove and slides inside the placement frame to clean the dust at the bottom of the placement frame to prevent the dust from contaminating the thermal film and making the thermal film unusable. After cleaning, the reset member retracts and the cleaning plate is pulled down to return to its original position, making it easy to pull and clean next time.
[0017] 2. The height of the placement slot of the utility model is higher than the placement mechanism, which facilitates the pulling and pulling of the placement mechanism and avoids the placement slot from obstructing the placement mechanism. At the same time, the temperature and humidity released by the temperature and humidity control flow through the gap between the placement slot and the placement mechanism, enhancing the fluidity of the air and making the temperature and humidity inside the frame uniform. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] Figure 1 This is a schematic diagram of the internal structure of the frame of the utility model.
[0019] Figure 2 This is a schematic diagram of the overall structure of the frame of the utility model.
[0020] Figure 3 This is a schematic diagram of the internal structure of the placement tank of the utility model.
[0021] Figure 4 This is a schematic diagram of the connection structure between the placement mechanism and the support plate of the utility model.
[0022] Figure 5 This is a schematic diagram of the placement mechanism structure of the utility model.
[0023] In the figure: 1. frame; 101. support plate; 102. slide; 2. temperature and humidity control; 3. vent; 4. placement slot; 5. placement mechanism; 501. placement frame; 502. second groove; 503. cleaning plate; 504. slider; 505. baffle; 506. through hole; 507. reset part. DETAILED DESCRIPTION
[0024] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.
[0025] The utility model provides Figures 1 to 5 The thermal film storage rack shown includes a frame 1, the interior of the frame 1 is divided into multiple placement slots 4, and a placement mechanism 5 is provided inside the placement slots 4. The placement mechanism 5 slides inside the placement slots 4 and is used to place thermal films.
[0026] When in use, the frame 1 is divided into multiple placement slots 4 through the support plate 101. The placement mechanism 5 inside the placement slot 4 is used to place the thermal film. The placement mechanism 5 slides inside the placement slot 4. The placement mechanism 5 is slid out of the placement slot 4 by sliding, and the thermal film is placed inside the placement mechanism 5.
[0027] A plurality of support plates 101 are provided inside the frame 1 , and sliding grooves 102 are symmetrically provided on the top ends of the support plates 101 . The sliding grooves 102 are slidably connected to the placement mechanism 5 .
[0028] When in use, the support plate 101 divides the interior of the frame 1 into multiple placement grooves 4. The sliding groove 102 of the support plate 101 is used to slide and limit the position of the placement mechanism 5 to prevent the placement mechanism 5 from sliding out of the sliding groove 102 due to excessive sliding.
[0029] The placement mechanism 5 includes a placement frame 501 , and a slider 504 is symmetrically provided at the bottom end of the placement frame 501 , and the slider 504 is engaged with the slide groove 102 .
[0030] When in use, the slider 504 at the bottom of the placement frame 501 is engaged with the slide groove 102 , the slider 504 slides and connects in the slide groove 102 , and the slide groove 102 limits and guides the slider 504 .
[0031] The inner side walls of the placement frame 501 are symmetrically provided with second grooves 502 , the inner side walls of the placement frame 501 are provided with a cleaning plate 503 , the two second grooves 502 are connected to the cleaning plate 503 , and a reset member 507 is provided between the cleaning plate 503 and the inner side walls of the placement frame 501 .
[0032] When in use, the cleaning plate 503 slides inside the second groove 502 inside the placement frame 501. The cleaning plate 503 is limited and guided in the second groove 502. The cleaning plate 503 moves along the direction of the second groove 502. The cleaning plate 503 moves inside the placement frame 501 and is then reset by the reset member 507 to prevent the cleaning plate 503 from being unable to move back and forth.
[0033] Pull the cleaning plate 503, the cleaning plate 503 moves along the direction of the second groove 502, and the cleaning plate 503 slides inside the placement frame 501 to clean the dust at the bottom end of the placement frame 501 to prevent the dust from contaminating the thermal film and making the thermal film unusable. After cleaning, the reset member 507 retracts and the cleaning plate 503 is pulled down to return to its original position, making it convenient to pull and clean next time.
[0034] There is a baffle 505 at one end of the placement frame 501 away from the cleaning plate 503. The baffle 505 is semicircular and is arranged at the bottom end of the placement frame 501.
[0035] A through hole 506 is formed at the bottom of the placement frame 501 , and the through hole 506 is located on the other side of the baffle 505 .
[0036] When in use, the baffle 505 is located inside the placement frame 501 , and the dust cleaned by the cleaning plate 503 passes over the baffle 505 and flows into the placement frame 501 through the through hole 506 .
[0037] The top of the baffle 505 is semicircular, which facilitates the passage of dust without blocking the dust.
[0038] The cleaning plate 503 drives the dust to the baffle 505, and the cleaning plate 503 continues to clean the dust. The brush of the cleaning plate 503 bends, driving the dust over the baffle 505, and bringing the dust to the through hole 506, and the dust flows out.
[0039] A vent 3 is formed on the inner side wall of the placement slot 4 , and a temperature and humidity control mechanism 2 is extended from one side of the frame 1 , and the temperature and humidity control mechanism 2 is connected to the vent 3 .
[0040] When in use, the vent 3 is connected to the temperature and humidity control 2, and the temperature and humidity control 2 controls the temperature and humidity inside the frame 1 through the vent 3. The temperature should be maintained between 20°C and 25°C. In order to ensure that the chemical substances in the film remain stable and avoid accelerated chemical reactions caused by high temperature or hardening of the film caused by low temperature, the humidity of the storage environment should be maintained between 50% and 60% RH. Too high humidity may cause the film to get damp and affect the imaging effect, while too low humidity may make the film brittle.
[0041] The height of the placement groove 4 is higher than the height of the placement mechanism 5 .
[0042] When in use, the height of the placement slot 4 is higher than the placement mechanism 5, which facilitates the pulling and drawing of the placement mechanism 5 and avoids the placement slot 4 from obstructing the placement mechanism 5. At the same time, the temperature and humidity released by the temperature and humidity control 2 flow through the gap between the placement slot 4 and the placement mechanism 5, enhancing the fluidity of the air and making the temperature and humidity inside the frame 1 uniform.
[0043] A sealing door is provided on the front side of the frame 1 .
[0044] When in use, the sealing door seals the frame 1 to prevent the temperature and humidity inside the frame 1 from being lost too quickly, thereby affecting the storage environment of the thermal film.
[0045] How it works
[0046] First, the cleaning plate 503 slides inside the second groove 502 inside the placement frame 501. The cleaning plate 503 is limited and guided in the second groove 502. The cleaning plate 503 moves along the direction of the second groove 502. The cleaning plate 503 moves inside the placement frame 501, and then is reset by the reset member 507 to prevent the cleaning plate 503 from being unable to reciprocate.
[0047] Pull the cleaning plate 503, the cleaning plate 503 moves along the direction of the second groove 502, and the cleaning plate 503 slides inside the placement frame 501 to clean the dust at the bottom end of the placement frame 501 to prevent the dust from contaminating the thermal film and making the thermal film unusable. After cleaning, the reset member 507 retracts and the cleaning plate 503 is pulled down to return to its original position, making it convenient to pull and clean next time.
[0048] Before being stored in the placement frame 501 , the thermal film is located inside the placement frame 501 through the baffle 505 . The dust cleaned by the cleaning plate 503 passes over the baffle 505 and flows into the placement frame 501 through the through hole 506 .
[0049] The top of the baffle 505 is semicircular, which facilitates the passage of dust without blocking the dust.
[0050] The cleaning plate 503 drives the dust to the baffle 505, and the cleaning plate 503 continues to clean the dust. The brush of the cleaning plate 503 bends, driving the dust over the baffle 505 and bringing the dust to the through hole 506. The dust flows out and cleans the inside of the placement frame 501.
[0051] Afterwards, the thermal film is placed inside the placement frame 501, and the thermal film placement position is between the cleaning plate 503 and the baffle 505. The thermal film should be placed flat to avoid bending or folding to reduce the risk of physical damage.
[0052] Finally, the temperature and humidity inside the frame 1 are detected by a temperature and humidity detector set inside the frame 1, and then connected to the temperature and humidity control 2 through the vent 3. The temperature and humidity control 2 controls the temperature and humidity inside the frame 1 through the vent 3. The temperature should be maintained between 20°C and 25°C. In order to ensure that the chemical substances in the film remain stable and avoid accelerated chemical reactions caused by high temperature or hardening of the film caused by low temperature, at the same time, the humidity of the storage environment should be maintained between 50% and 60% RH relative humidity. Too high humidity may cause the film to get damp and affect the imaging effect. Too low humidity may make the film brittle. The sealing door seals the frame 1 to prevent the temperature and humidity inside the frame 1 from losing too quickly and affecting the storage environment of the thermal film.
[0053] Finally, it should be noted that the above is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art can still modify the technical solutions described in the aforementioned embodiments or make equivalent replacements for some of the technical features therein. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.
Claims
1. A thermal film storage rack, characterized by: The invention comprises a frame (1), wherein the interior of the frame (1) is divided into a plurality of placement grooves (4), wherein a placement mechanism (5) is provided inside the placement groove (4), and the placement mechanism (5) slides inside the placement groove (4) and is used for placing a thermal sheet.
2. A thermal film storage rack according to claim 1, characterized in that: A plurality of support plates (101) are provided inside the frame (1), and sliding grooves (102) are symmetrically provided at the top ends of the support plates (101), and the sliding grooves (102) are slidably connected to the placement mechanism (5).
3. A thermal film storage rack according to claim 2, characterized in that: The placement mechanism (5) comprises a placement frame (501), and a slider (504) is symmetrically provided at the bottom end of the placement frame (501), and the slider (504) is engaged with the slide groove (102).
4. A thermal film storage rack according to claim 3, characterized in that: The inner side walls of the placement frame (501) are symmetrically provided with second grooves (502), the inner side walls of the placement frame (501) are provided with a cleaning plate (503), the two second grooves (502) are connected to the cleaning plate (503), and a reset member (507) is provided between the cleaning plate (503) and the inner side walls of the placement frame (501).
5. The thermal film storage rack according to claim 4, characterized in that: A baffle (505) is provided at one end of the placement frame (501) away from the cleaning plate (503). The baffle (505) is semicircular and is arranged at the bottom end of the placement frame (501).
6. The thermal film storage rack according to claim 5, characterized in that: A through hole (506) is provided at the bottom of the interior of the placement frame (501), and the through hole (506) is located on the other side of the baffle (505).
7. The thermal film storage rack according to claim 1, characterized in that: A vent (3) is provided on the inner side wall of the placement slot (4), and a temperature and humidity control (2) is extended from one side of the frame (1), and the temperature and humidity control (2) is connected to the vent (3).
8. The thermal film storage rack according to claim 1, characterized in that: The height of the placement groove (4) is higher than the height of the placement mechanism (5).
9. The thermal film storage rack according to claim 3, characterized in that: A sealing door is provided on the front side of the frame (1).