Ohmic electrode manufacturing jig
By designing ohmic electrodes to make fixtures, the problem of difficult to control the size and position of Hall sample electrodes is solved, and the stability and efficiency of Hall detection results are improved.
Patent Information
- Application Number
- CN202421364863.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-14
- Publication Date
- 2025-09-02
- Estimated Expiration
- 2034-06-14
AI Technical Summary
In the prior art, the ohmic electrode production method of a semiconductor wafer Hall sample is difficult to control the electrode size and position, which affects the linearity of the IV curve of Hall detection and the stability of the detection result.
A ohmic electrode making fixture is designed, including a lower body, an upper body, a sleeve group and a baffle. The precise positioning of the Hall sample in the three-dimensional direction is ensured through the limiting and positioning structure, and the material particles inserted into the corner of the Hall sample are annealed and alloyed.
The precise control of the size and position of the ohmic electrode is achieved, the consistency and stability of the Hall detection result are improved, and the production efficiency of the ohmic electrode is improved, reducing costs.
Smart Images
Figure CN223295921U_ABST
Abstract
Description
Technical Field
[0001] The present disclosure relates to the field of semiconductor testing, and more particularly to an ohmic electrode manufacturing jig. Background Art
[0002] The Hall sample of a semiconductor chip has a specification of 6mm×6mm×1mm. The ohmic electrode requires contact electrodes with a size of 1mm or less to be prepared on the four corners. The current method for making contact electrodes is to directly place gold / indium / tin particles on the four corners of the Hall sample and then anneal and alloy them, or to apply tin-gallium alloy / indium-gallium alloy to the four corners. The current production method will make it difficult to control the size of the four electrodes and the position is inaccurate, which affects the linearity of the IV curve of the Hall detection and affects the results of the Hall detection. Utility Model Content
[0003] In view of the problems existing in the background technology, an object of the present disclosure is to provide an ohmic electrode manufacturing jig, which can make the size of the manufactured ohmic electrode easy to control and the position accurate.
[0004] Thus, an ohmic electrode manufacturing jig is provided, which includes a lower body, an upper body, multiple sleeve groups, and multiple baffles; the lower body is provided with a groove with left and right upper openings and front and back lower closed, the groove is provided with multiple lower baffle grooves extending in the front-to-back direction and arranged in parallel in the left-to-right direction, the bottom surface between two adjacent lower baffle grooves of the groove is a supporting surface, the supporting surface is used to support a single Hall sample, the supporting surface matches the Hall sample in size and shape, and the groove is greater than the thickness of the Hall sample in depth; the upper body is provided with multiple upper baffle grooves and multiple hole groups, the multiple upper baffle grooves extend in the front-to-back direction, are arranged in parallel in the left-to-right direction and pass through the upper body in the up-down direction, and each upper baffle groove is connected to the corresponding lower baffle groove. The slots correspond in position and size, each hole group includes four through holes, and the projections of the four through holes in the up and down directions are located in the four corners of the corresponding support surface of the lower body; each sleeve group includes four sleeves, and the four sleeves correspond to the four through holes of the corresponding hole group. Each sleeve is used to be inserted into a through hole of the corresponding hole group, pressed against the corresponding corner of the single Hall sample supported by the corresponding support surface, and to accommodate material particles for making ohmic electrodes; each baffle is used to be inserted into the corresponding upper baffle slot and the corresponding lower baffle slot to limit one side of the single Hall sample supported by the corresponding support surface in the left and right directions, and the two adjacent baffles are used to limit the single Hall sample supported by the corresponding support surface from both sides in the left and right directions.
[0005] The beneficial effects of the present disclosure are as follows: in the ohmic electrode manufacturing jig according to the present disclosure, the upper and lower and front and rear position limits of the individual Hall sample on each supporting surface are realized by cooperating with the lower body and the upper body, and the left and right position limits of the individual Hall sample on each supporting surface are realized by two adjacent baffles. As a result, the individual Hall sample on each supporting surface is limited in three dimensions. Furthermore, the four sleeves of each sleeve group are inserted into the four through holes of the corresponding hole group and pressed against the four corresponding corners of the individual Hall sample supported by the corresponding supporting surface, thereby realizing the production of the Hall sample. The material particles for the ohmic electrodes are positioned at the four corresponding corners of a single Hall sample. After the material particles for making the ohmic electrodes are put into the four sleeves of each sleeve group, the ohmic electrode manufacturing jig can be annealed and alloyed, thereby forming ohmic electrodes at the four corresponding corners of each Hall sample. Because the material particles for the ohmic electrodes put into the four sleeves of each sleeve group are restricted by the sleeves and the supporting surface, the size of the ohmic electrodes formed at the four corresponding corners of each Hall sample is easy to control and the position is accurate, thereby ensuring the consistency and stability of the Hall detection results. BRIEF DESCRIPTION OF THE DRAWINGS
[0006] Figure 1 1 is an exploded view of an example of an ohmic electrode manufacturing jig according to the present disclosure.
[0007] Figure 2 yes Figure 1 A partial three-dimensional image of the lower body of the ohmic electrode production jig.
[0008] Figure 3 yes Figure 1 A partially assembled perspective view showing a Hall effect chip.
[0009] Figure 4 FIG. 4 is an exploded view of another example of an ohmic electrode manufacturing jig according to the present disclosure.
[0010] Figure 5 yes Figure 4 A partially assembled perspective view showing a Hall effect chip.
[0011] The description of the accompanying drawings is as follows:
[0012] 100 ohm electrode production fixture 22 upper baffle groove
[0013] D1 front and rear direction 23 hole group
[0014] D2 231 through holes in left and right directions
[0015] D3 positioning hole 24 in the up and down direction
[0016] 1 lower body 25 tool slots
[0017] 11 groove 3 socket set
[0018] 111 lower baffle groove 31 sleeve
[0019] 112 support surface 4 baffle
[0020] 12 lower positioning holes 5 positioning columns
[0021] 2 upper body 200 Hall samples
[0022] 21 lower surface DETAILED DESCRIPTION
[0023] The accompanying drawings show embodiments of the present disclosure, and it will be understood that the disclosed embodiments are merely examples of the present disclosure, which can be implemented in various forms. Therefore, the specific details disclosed herein should not be interpreted as limiting, but merely as a basis for the claims and as a representative basis for teaching one of ordinary skill in the art to implement the present disclosure in various ways.
[0024] Reference Figures 1 to 5 According to the present disclosure, the ohmic electrode manufacturing jig 100 includes a lower body 1, an upper body 2, a plurality of sleeve groups 3, and a plurality of baffles 4.
[0025] The lower body 1 is provided with a recess 11, open at the left and right upper ends and closed at the front and back lower ends. This recess 11 is provided with multiple lower baffle grooves 111 extending along the front-to-back direction D1 and arranged in parallel along the left-to-right direction D2. The bottom surface between two adjacent lower baffle grooves 111 in the recess 11 serves as a support surface 112, which is used to support a single Hall effect chip 200. The support surface 112 matches the size and shape of the Hall effect chip 200, and the depth of the recess 11 is greater than the thickness of the Hall effect chip 200. The upper body 2 is provided with multiple upper baffle grooves 22 and multiple hole groups 23. The multiple upper baffle grooves 22 extend along the front-to-back direction D1, are arranged in parallel along the left-to-right direction D2, and pass through the upper body 2 in the vertical direction D3. Each upper baffle groove 22 corresponds in position and size to the corresponding lower baffle groove 111. Each hole group 23 includes four through-holes 231, whose projections in the vertical direction D3 are located within the four corners of the corresponding support surface 112 of the lower body 1. Each sleeve assembly 3 includes four sleeves 31, corresponding to the four through-holes 231 of the corresponding hole assembly 23. Each sleeve 31 is inserted into a through-hole 231 of the corresponding hole assembly 23, pressed against a corresponding corner of a single Hall effect chip 200 supported by the corresponding support surface 112, and used to receive material particles (not shown) for making an ohmic electrode. Each baffle 4 is inserted into the corresponding upper baffle groove 22 and the corresponding lower baffle groove 111 to limit the position of the single Hall effect chip 200 supported by the corresponding support surface 112 on one side in the left-right direction D2. Two adjacent baffles 4 are used to limit the position of the single Hall effect chip 200 supported by the corresponding support surface 112 from both sides in the left-right direction D2.
[0026] In the ohmic electrode manufacturing jig 100 according to the present disclosure, the upper and lower and front and rear position limits of the individual Hall sample 200 on each support surface 112 are achieved through the cooperation of the lower body 1 and the upper body 2. The left and right position limits of the individual Hall sample 200 on each support surface 112 are achieved through the two adjacent baffles 4. As a result, the individual Hall sample 200 on each support surface 112 is limited in three dimensions. Furthermore, the four sleeves 31 of each sleeve group 3 are inserted into the four through holes 231 of the corresponding hole group 23 and pressed against the four corresponding corners of the individual Hall sample 200 supported by the corresponding support surface 112, thereby achieving the goal of The material particles for making the ohmic electrodes are positioned at the four corresponding corners of a single Hall sample 200. After the material particles for making the ohmic electrodes are put into the four sleeves 31 of each sleeve group 3, the ohmic electrode making jig 100 can be annealed and alloyed, thereby forming ohmic electrodes at the four corresponding corners of each Hall sample 200. Because the material particles for the ohmic electrodes put into the four sleeves 31 of each sleeve group 3 are restricted by the sleeves 31 and the supporting surface 112, the size of the ohmic electrodes formed at the four corresponding corners of each Hall sample 200 is easy to control and the position is accurate, thereby ensuring the consistency and stability of the Hall detection results.
[0027] In the ohmic electrode manufacturing jig 100 according to the present disclosure, ohmic electrodes can be manufactured for a plurality of Hall effect samples 200 at one time, thereby improving the manufacturing efficiency of the ohmic electrodes and reducing the cost.
[0028] In the ohmic electrode manufacturing jig 100 according to the present disclosure, after the lower body 1 and the upper body 2 are matched, the groove 11 is open in the left-right direction D2. On the one hand, this can be used to accommodate the Hall sample 200, and on the other hand, the flow of the annealing atmosphere during annealing and alloying improves the efficiency of annealing and alloying.
[0029] The material particles for making the ohmic electrode include, but are not limited to, gold, indium, tin, tin-gallium alloy, indium-gallium alloy, and the like.
[0030] In actual design, the supporting surface 112 may be slightly larger in size and shape than the Hall effect chip 200 so that the Hall effect chip 200 can move freely along the left-right direction D2.
[0031] In actual design, the depth of the groove 11 may be slightly greater than the thickness of the Hall sample 200 so that the Hall sample 200 can move freely along the left-right direction D2.
[0032] like Figure 3As shown, in one example, the upper body 2 and the lower body 1 are integrally formed. At this time, the Hall sample 200 will be inserted from the opening of the groove 11 in the left-right direction D2. A baffle 4 on one side in the left-right direction D2 is first inserted, and then the Hall sample 200 is inserted and the Hall sample 200 is pushed against the baffle 4 (for example, by pushing the side of the Hall sample 200 with a needle), and then a baffle 4 on the other side in the left-right direction D2 is inserted to limit the Hall sample 200. After all the Hall samples 200 are installed, the sleeve 31 is inserted into the through hole 231 of the corresponding hole group 23 and the material particles for making the ohmic electrode are put into the sleeve 31.
[0033] like Figure 5 As shown, in one example, the upper body 2 and the lower body 1 are formed separately, and the lower surface 21 of the upper body 2 is flat. In this case, the Hall effect chip 200 can be placed on the corresponding support surface 112 of the groove 11 before the upper body 2 and the lower body 1 are assembled. Of course, as with the upper body 2 and the lower body 1 formed integrally, the Hall effect chip 200 can also be inserted through the opening of the groove 11 in the left-right direction D2 after the upper body 2 and the lower body 1 are assembled.
[0034] like Figure 4 and Figure 5 As shown, in one example, the ohmic electrode manufacturing jig 100 also includes a plurality of positioning posts 5; the lower body 1 is provided with a plurality of lower positioning holes 12; the upper body 2 is provided with a plurality of upper positioning holes 24 that pass through; each positioning post 5 is used to be inserted into the corresponding upper positioning hole 24 and the lower positioning hole 12 to position the upper body 2 and the lower body 1 together.
[0035] Each positioning column 5 is, for example, but not limited to, a graphite component or an aluminum component. Similarly, the lower body 1, the upper body 2, the plurality of sleeve assemblies 3, and the plurality of baffles 4 are, for example, but not limited to, graphite components or aluminum components. The higher the purity of the aluminum component, the better.
[0036] like Figure 1 、 Figures 3 to 5 As shown, the upper body 2 also has a tool groove 25 extending between multiple upper baffle grooves 22 along the left-right direction D2 and passing through the upper body 2 along the up-down direction D3. The tool groove 25 is used for a tool (such as a needle-like object (such as tweezers)) to be inserted to move the Hall sample 200 located in the groove 11 along the left-right direction D2 in the groove 11.
[0037] like Figure 1 、 Figures 3 to 5 As shown, in one example, the lower body 1 and the upper body 2 are both symmetrical left to right and front to back.
[0038] Similarly, in one example, the projections of the four through holes 231 of each hole group 23 in the vertical direction D3 are bilaterally and front-to-back symmetrical relative to the center of the corresponding support surface 112 of the lower body 1. The four ohmic electrodes thus fabricated are also bilaterally and front-to-back symmetrical relative to the center of the corresponding support surface 112 of the lower body 1. Furthermore, all sleeves 31 have the same inner diameter, all support surfaces 12 have the same dimensions, and all lower baffle grooves 111 have the same dimensions. In other words, all Hall effect samples 200 also have the same dimensions.
[0039] The above detailed description is used to describe a number of exemplary embodiments, but this document is not intended to be limited to the explicitly disclosed combinations. Therefore, unless otherwise stated, the various features disclosed herein may be combined to form multiple additional combinations that are not shown for the sake of brevity.
Claims
1. An ohmic electrode manufacturing jig, characterized in that: The ohmic electrode manufacturing jig (100) comprises a lower body (1), an upper body (2), a plurality of sleeve groups (3), and a plurality of baffles (4); The lower body (1) is provided with grooves (11) which are open on the left and right sides and closed on the front and back sides. The groove (11) is provided with a plurality of lower baffle grooves (111) extending along the front-back direction (D1) and arranged in parallel along the left-right direction (D2); the bottom surface between two adjacent lower baffle grooves (111) of the groove (11) is a support surface (112); the support surface (112) is used to support a single Hall sample (200); the support surface (112) matches the Hall sample (200) in size and shape; the depth of the groove (11) is greater than the thickness of the Hall sample (200); The upper body (2) is provided with a plurality of upper baffle grooves (22) and a plurality of hole groups (23). A plurality of upper baffle grooves (22) extend along the front-back direction (D1), are arranged in parallel along the left-right direction (D2), and penetrate the upper body (2) along the up-down direction (D3). Each upper baffle groove (22) corresponds to the corresponding lower baffle groove (111) in position and size. Each hole group (23) includes four through holes (231), and the projections of the four through holes (231) in the up-down direction (D3) are located within the four corners of the corresponding support surface (112) of the lower body (1); Each sleeve group (3) includes four sleeves (31), and the four sleeves (31) correspond to the four through holes (231) of the corresponding hole group (23). Each sleeve (31) is used to be inserted into a through hole (231) of the corresponding hole group (23), pressed against a corresponding corner of a single Hall sample (200) supported by a corresponding support surface (112), and to accommodate material particles for making an ohmic electrode. Each baffle (4) is used to be inserted into a corresponding upper baffle groove (22) and a corresponding lower baffle groove (111) to limit one side of a left-right direction (D2) of a single Hall sample (200) supported by a corresponding support surface (112); two adjacent baffles (4) are used to limit the single Hall sample (200) supported by the corresponding support surface (112) from both sides of the left-right direction (D2).
2. The ohmic electrode manufacturing jig according to claim 1, characterized in that: The upper body (2) and the lower body (1) are integrally formed.
3. The ohmic electrode manufacturing jig according to claim 1, characterized in that: The upper body (2) and the lower body (1) are formed separately, and the lower surface (21) of the upper body (2) is a plane.
4. The ohmic electrode manufacturing jig according to claim 3, characterized in that: The ohmic electrode manufacturing jig (100) further includes a plurality of positioning posts (5); The lower body (1) is provided with a plurality of lower positioning holes (12); The upper body (2) is provided with a plurality of upper positioning holes (24) extending therethrough; Each positioning column (5) is used to be inserted into the corresponding upper positioning hole (24) and lower positioning hole (12) to position the upper body (2) and the lower body (1) together.
5. The ohmic electrode manufacturing jig according to claim 4, characterized in that: Each positioning column (5) is a graphite component or an aluminum component.
6. The ohmic electrode manufacturing jig according to claim 1, characterized in that: The upper body (2) further comprises a tool groove (25) extending between the plurality of upper baffle grooves (22) in the left-right direction (D2) and penetrating the upper body (2) in the up-down direction (D3). The tool groove (25) is used for inserting a tool to move the Hall sample (200) located in the groove (11) in the left-right direction (D2) in the groove (11).
7. The ohmic electrode manufacturing jig according to claim 1, characterized in that: The lower body (1), the upper body (2), the plurality of sleeve groups (3), and the plurality of baffles (4) are all graphite components or aluminum components.
8. The ohmic electrode manufacturing jig according to claim 1, characterized in that: The lower body (1) and the upper body (2) are both bilaterally symmetrical and front-to-back symmetrical.
9. The ohmic electrode manufacturing jig according to claim 1, characterized in that: The projections of the four through holes (231) of each hole group (23) in the up-down direction (D3) are symmetrical left-right and front-back relative to the center of the corresponding support surface (112) of the lower body (1).
10. The ohmic electrode manufacturing jig according to claim 9, characterized in that: The inner diameters of all sleeves (31) are the same, the dimensions of all supporting surfaces (112) are the same, and the dimensions of all lower baffle grooves (111) are the same.