Etching liquid tail section impurity filtering tank

Abstract

An etching liquid tail section impurity filtering tank comprises a middle pipe, end rings are arranged at the upper end and the lower end of the middle pipe respectively, fixing rings are rotationally arranged at the upper ends and the lower ends of the end rings respectively, a connecting cover is arranged on the fixing rings, and the other end of the connecting cover is communicated with a connecting pipe. A plurality of inner rings are arranged in the middle pipe, convex parts are arranged at the upper ends of the peripheries of the inner rings, T-shaped rods are arranged on the lower walls of the convex parts, a filter cover is arranged at the lower ends of the inner rings, a plurality of holes are formed in the filter cover, and a filter membrane is arranged in the filter cover. The T-shaped rod is sleeved with a placing arc plate, an arc-shaped groove is formed in the placing arc plate, and the T-shaped rod is arranged in the arc-shaped groove in a penetrating mode. In the filtering process, the etching liquid is conveyed into the middle pipe through the conveying pipeline, then sequentially passes through the filtering covers in the middle pipe and is sequentially subjected to multi-stage filtering operation through the filtering membranes on the middle pipe, the filtering effect of the etching liquid is improved in a filtering mode, the content of solid impurities accumulated on the filtering membranes can be reduced in the mode, and therefore the filtering effect of the etching liquid is improved. Therefore, the filtering capacity of the filtering membrane is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of etching liquid processing, in particular to an etching liquid tail section filtering tank. Background Art

[0002] Etching fluid is a chemical solution used to remove specific parts of a material's surface. It is widely used in semiconductor manufacturing, microelectronics processing, printed circuit board manufacturing, and other manufacturing processes. In order to improve the quality of the etching fluid and reduce the content of solid impurities in it, it needs to be filtered before being discharged and packaged in barrels. This is because when the etching fluid contains a large amount of solid impurities, it is easy to cause damage to electronic devices or circuit boards during the etching process, or the etching may not be ideal. However, the filter tanks currently used are large in size, and in actual production, there is also the problem of inconvenience in cleaning the inner wall of the filter tank. The existing filtration capacity regeneration is through reverse water cleaning, which will suspend the filtration work of the filter tank, and this backwashing also has the problem of incomplete cleaning. At the same time, the existing filter tanks have the problem of poor filtration effect. Utility Model Content

[0003] The utility model provides an etching liquid tail section filter tank to solve the above-mentioned deficiencies in the prior art, improves the filtering effect through multi-stage filtration, and also facilitates the thorough cleaning operation of the filter tank, and has strong practicality.

[0004] In order to achieve the purpose of this utility model, the following technologies are proposed:

[0005] A tail-end filter tank for etching liquid comprises a middle tube, end rings are provided at the upper and lower ends of the middle tube, fixed rings are rotatably provided at the upper and lower ends of the end rings, a connecting cover is provided on the fixed ring, the other end of the connecting cover is connected to a connecting pipe, and the connecting pipe is connected to the etching liquid delivery pipeline. The middle tube is provided with multiple inner rings, the upper ends of the outer peripheries of the inner rings are provided with convex portions, the lower walls of the convex portions are provided with T-shaped rods, the lower ends of the inner rings are provided with filter covers, the outer periphery of the filter covers are provided with multiple holes, a filter membrane is attached to the inner periphery of the filter covers, and the particle size of solid impurities that can pass through the filter membrane decreases from top to bottom. A placement arc plate is sleeved on the T-shaped rod, the placement arc plate is provided with an arc groove, the T-shaped rod is inserted into the arc groove, the placement arc plate is located on the lower side of the convex portion, and the placement arc plate is welded to the inner wall of the middle tube. During filtration, the etching liquid is delivered to the middle tube through a delivery pipe, then passes through the filter cover inside the middle tube, and is filtered through the filter membrane thereon in a multi-stage filtration operation. This filtration improves the filtration effect of the etching liquid and reduces the content of solid impurities accumulated on the filter membrane, thereby improving the filtration capacity of the filter membrane. At the same time, to facilitate the removal and cleaning of the filter membrane, the filter cover is detachably installed in the middle tube. To facilitate the cleaning of the filter membrane in the middle tube, the middle tube is rotatably mounted on a fixed ring. When cleaning, the middle tube is rotated outward and the filter covers are removed one by one for cleaning.

[0006] Furthermore, in order to facilitate the discharge of the etching liquid, the connecting cover is provided with a conical structure, and the end facing the fixing ring is the large end.

[0007] Furthermore, in order to facilitate the rotation of the middle tube, a connecting rod is provided on the fixing ring. The connecting rod is installed on the fixing ring through a nut, and the end rings are rotatably provided at the upper and lower ends of the connecting rod.

[0008] Furthermore, in order to improve the filter cover's capacity to hold solid impurities and increase the filtering area, the filter cover is configured to have a conical structure, with the lower end of the filter cover being the small end.

[0009] Furthermore, in order to prevent the etching liquid from flowing downward from the gap between the filter cover and the middle tube during filtration, a placement ring is provided at the upper end of the inner part of the middle tube, and an upper extension ring is provided on the inner periphery of the placement ring. A guide cone ring is provided on the upper end of the upper extension ring, and the lower end of the guide cone ring is a small end. The placement ring is placed on the upper end of the inner ring of the filter cover located on the top layer.

[0010] Furthermore, in order to facilitate the removal of the filter cover, an upper extension rod is provided at the bottom of the filter cover, and a perforation is opened on the upper extension rod.

[0011] Furthermore, in order to facilitate the connection between the end ring and the fixed ring, and the sealing effect between the middle pipe and the connecting cover after connection, a constraint arc plate is provided on the outer periphery of the end ring and the fixed ring, and mounting protrusions are provided at both ends of the constraint arc plate. Each pair of mounting protrusions is fixed by bolts, and the longitudinal section of the constraint arc plate is a C-shaped structure.

[0012] In order to further improve the sealing effect, elastic washers are provided on the outer wall of the fixed ring and the end ring, and the upper and lower sides of the inner part of the constrained arc plate act on the elastic washers.

[0013] Furthermore, in order to facilitate the removal of the filter cover, an outward protrusion is provided on the constraining arc plate, a waist-shaped hole is opened on the outward protrusion, an L-shaped rod is passed through the waist-shaped hole, and an end ball is provided at the lower end of the L-shaped rod.

[0014] The advantages of the above technical solution are:

[0015] The utility model improves the filtering effect of the tail section of the etching liquid by means of multi-stage filtration, and facilitates the cleaning of the internal filter membrane during the window period. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to make the purpose, technical solutions and advantages of the present invention more clear, the present invention will be described in further detail below with reference to the accompanying drawings.

[0017] Figure 1 A three-dimensional structural diagram of one embodiment is shown.

[0018] Figure 2 Shown is a three-dimensional structural diagram of the middle tube.

[0019] Figure 3 Shows the three-dimensional structure of the filter cover Figure 1 .

[0020] Figure 4 Shows the three-dimensional structure of the filter cover Figure 2 . DETAILED DESCRIPTION

[0021] like Figures 1 to 4 As shown, a tail-stage filter tank for etching liquid includes a central tube 1, with end rings 10 at each end. Fixed rings 20 are rotatably mounted on the upper and lower ends of the end ring 10. A connecting hood 2 is mounted on the fixed ring 20. The connecting hood 2 has a conical structure, with the end facing the fixed ring 20 being the larger end. The other end of the connecting hood 2 is connected to a connecting pipe 21, which is connected to the etching liquid delivery pipeline. Specifically, a connecting rod 4 is mounted on the fixed ring 20 via a nut, and the end rings 10 are rotatably mounted on the upper and lower ends of the connecting rod 4.

[0022] Multiple inner rings 3 are installed within the central tube 1. The upper ends of the outer circumferences of the inner rings 3 are provided with protrusions 31. The lower walls of the protrusions 31 are provided with T-shaped rods 32. A filter cover 30 is installed at the lower ends of the inner rings 3. An upper extension rod 33 is provided at the bottom of the filter cover 30. The upper extension rod 33 is perforated. The filter cover 30 has a conical structure, with the lower end of the filter cover 30 being the smaller end. The outer circumference of the filter cover 30 is provided with multiple holes. A filter membrane is attached to the inner circumference of the filter cover 30. A placement arc plate 12 is sleeved onto the T-shaped rods 32. The placement arc plate 12 has an arc groove 13 formed therein. The T-shaped rods 32 extend through the arc groove 13. The placement arc plate 12 is located below the protrusions 31 and is welded to the inner wall of the central tube 1.

[0023] A placement ring 34 is provided at the inner upper end of the middle tube 1, an upper extension ring 35 is provided on the inner periphery of the placement ring 34, a guide cone ring 36 is provided at the upper end of the upper extension ring 35, and the lower end of the guide cone ring 36 is a small end. The placement ring 34 is placed on the upper end of the inner ring 3 of the filter cover 30 located on the top layer.

[0024] The outer periphery of the end ring 10 and the fixed ring 20 is provided with a constraining arc plate 5, and both ends of the constraining arc plate 5 are respectively provided with mounting protrusions 50. Each pair of mounting protrusions 50 are fixed by bolts. The longitudinal section of the constraining arc plate 5 is a C-shaped structure. Elastic washers are provided on the outer wall of the fixed ring 20 and the end ring 10. The upper and lower sides of the inner part of the constraining arc plate 5 act on the elastic washers.

[0025] The constraining arc plate 5 is provided with an outwardly extending protrusion 51 , which is provided with a waist-shaped hole. An L-shaped rod 52 is passed through the waist-shaped hole, and an end ball 53 is provided at the lower end of the L-shaped rod 52 .

[0026] During filtration in this embodiment, the etching liquid is transported into the middle tube 1 through the etching liquid delivery pipe. When the etching liquid enters, the filter membrane on the filter cover 30 filters the solid impurities in the etching liquid. The filtered etching liquid then passes through the filter membranes on other filter covers 30 and is finally discharged outward through the etching liquid delivery pipe. During filtration, solid impurities enter the bottom of the filter cover 30 due to the scouring of the etching liquid and accumulate at the bottom of the filter cover 30. This method can avoid the accumulation of a large amount of solid impurities on the effectively utilized surface of the filter membrane, and the filter membrane on the conical surface of the filter cover 30 will not cause solid impurity accumulation due to scouring. Through multi-stage filtration and the avoidance of solid impurity accumulation, the filtering capacity, filtering effect and filtering volume can be significantly improved.

[0027] In this embodiment, when cleaning the filter cover 30, the restraining arc plate 5 is removed, and then the middle tube 1 is rotated outward, and then the hook portion of the L-shaped rod 52 is inserted into the through-hole on the upper extension rod 33 on each filter cover 30, and then the filter cover 30 is rotated by the L-shaped rod 52 to move the T-shaped rod 32 out of the arc groove 13, and then the filter cover 30 is taken out upward, and the filter membrane on the filter cover 30 is cleaned after taking it out. After cleaning, the filter cover 30 is placed in the middle tube 1 again, and the middle tube 1 is sealed and fixed.

[0028] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Obviously, those skilled in the art may make various modifications and variations to the present invention without departing from the spirit and scope of the present invention. Therefore, if such modifications and variations fall within the scope of the claims and their equivalents, the present invention is intended to include such modifications and variations.

Claims

1. An etching liquid tail section filter tank, characterized in that: It comprises a middle tube (1), and end rings (10) are respectively provided at the upper and lower ends of the middle tube (1); The upper and lower ends of the end ring (10) are rotatably provided with fixed rings (20), the fixed ring (20) is provided with a connecting cover (2), the other end of the connecting cover (2) is connected to a connecting pipe (21), and the connecting pipe (21) is connected to the etching liquid delivery pipeline; A plurality of inner rings (3) are provided inside the middle tube (1), a convex portion (31) is provided at the upper end of the outer periphery of the inner ring (3), a T-shaped rod (32) is provided on the lower wall of the convex portion (31), a filter cover (30) is provided at the lower end of the inner ring (3), a plurality of holes are provided on the outer periphery of the filter cover (30), a filter membrane is attached to the inner periphery of the filter cover (30), a placement arc plate (12) is sleeved on the T-shaped rod (32), an arc groove (13) is provided on the placement arc plate (12), the T-shaped rod (32) is passed through the arc groove (13), the placement arc plate (12) is located on the lower side of the convex portion (31), and the placement arc plate (12) is welded to the inner wall of the middle tube (1).

2. The etching liquid tail section filter tank according to claim 1, characterized in that: The connecting cover (2) has a conical structure, and the end facing the fixing ring (20) is the large end.

3. The etching liquid tail section filter tank according to claim 1, characterized in that: A connecting rod (4) is provided on the fixing ring (20), and the connecting rod (4) is mounted on the fixing ring (20) through a nut. The end rings (10) are rotatably provided at the upper and lower ends of the connecting rod (4).

4. The etching liquid tail section filter tank according to claim 1, characterized in that: The filter cover (30) has a conical structure, and the lower end of the filter cover (30) is a small end.

5. The etching liquid tail section filter tank according to claim 1, characterized in that: A placement ring (34) is provided at the inner upper end of the middle tube (1), an upper extension ring (35) is provided on the inner periphery of the placement ring (34), a guide cone ring (36) is provided at the upper end of the upper extension ring (35), the lower end of the guide cone ring (36) is a small end, and the placement ring (34) is placed on the upper end of the inner ring (3) of the filter cover (30) located at the top layer.

6. The etching liquid tail section filter tank according to claim 1, characterized in that: An upper extension rod (33) is provided at the bottom of the filter cover (30), and a perforation is provided on the upper extension rod (33).

7. The etching liquid tail section filter tank according to claim 1, characterized in that: The outer peripheries of the end ring (10) and the fixed ring (20) are sleeved with a constrained arc plate (5), and mounting convex plates (50) are respectively provided at both ends of the constrained arc plate (5). Each pair of mounting convex plates (50) are fixed by bolts, and the longitudinal section of the constrained arc plate (5) is a C-shaped structure.

8. The etching liquid tail section filter tank according to claim 7, characterized in that: Elastic washers are provided on the outer wall of the fixing ring (20) and the end ring (10), and the upper and lower sides of the inner part of the constrained arc plate (5) act on the elastic washers.

9. The etching liquid tail section filter tank according to claim 1, characterized in that: The constrained arc plate (5) is provided with an outwardly extending protrusion (51), a waist-shaped hole is opened on the outwardly extending protrusion (51), an L-shaped rod (52) is passed through the waist-shaped hole, and an end ball (53) is provided at the lower end of the L-shaped rod (52).

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