Silicon powder fluidizer of trichlorosilane synthetic furnace

Abstract

The utility model relates to the technical field of trichlorosilane synthetic furnaces, and provides a silicon powder fluidizer of a trichlorosilane synthetic furnace, which comprises an original distributor of the trichlorosilane synthetic furnace, a silicon powder fluidizer of the trichlorosilane synthetic furnace and a silicon powder fluidizer of the silicon powder fluidizer, the plurality of nozzles form a circle, are positioned above the distributor and are used for spraying second hydrogen chloride gas flow which axially flows around the trichlorosilane synthetic furnace; wherein each nozzle hermetically penetrates through the side wall of the trichlorosilane synthetic furnace from outside to inside, and an included angle is formed between the spraying direction of each nozzle and the radial direction of the trichlorosilane synthetic furnace. The fluidization effect of the silicon powder in the trichlorosilane synthesis furnace can be obviously improved and enhanced under the dual action of the first hydrogen chloride gas flow and the second hydrogen chloride gas flow, and the silicon powder can be fluidized in a short time even if the amount of the supplemented silicon powder is large; meanwhile, the second hydrogen chloride gas flow can also remove impurities such as carbon bodies attached to the surfaces of silicon powder particles, so that a clean silicon powder reaction surface is exposed, the catalyst and the silicon powder can be combined to generate a silicon-copper contact body, and the space time yield of the reaction is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of trichlorosilane synthesis furnaces, in particular to a silicon powder fluidizer of a trichlorosilane synthesis furnace. Background Art

[0002] Currently, waste silicon powder can be reused by reacting hydrogen chloride with silicon powder in a synthesis furnace to produce trichlorosilane. The reaction mechanism is as follows: silicon powder (Si) and hydrogen chloride (HCl) react at a temperature of 300-370°C and a pressure of 50-180 kPa, with the help of a catalyst to produce trichlorosilane (SiHCl3) and hydrogen (H2). The specific chemical equation is:

[0003] Main reaction: Si+3HCl→SiHCl3+H2;

[0004] Side reactions: Si+2HCl→SiH2Cl2, Si+4HCl→SiCl4+2H2.

[0005] However, existing trichlorosilane synthesis furnaces fluidize the material within the furnace solely through a constant flow of hydrogen chloride gas flowing through a distributor. If excessive silicon powder is added to the furnace at once, causing a significant rise in the material layer, and the hydrogen chloride flow rate is insufficient to fluidize the excess silicon powder, the fluidization of the material within the furnace deteriorates, leading to uneven reaction and inefficient removal of the heat released by the reaction. This can cause the silicon powder to accumulate within the furnace. In more severe cases, the silicon powder can sinter and form large lumps, causing localized overheating within the furnace and deteriorating the fluidization of the silicon powder within the furnace. This ultimately impacts the silicon powder conversion rate and reduces the yield of the target product. Utility Model Content

[0006] In view of the deficiencies of the prior art, the utility model provides a silicon powder fluidizer for a trichlorosilane synthesis furnace to solve the problem that the fluidization state of the material in the trichlorosilane synthesis furnace deteriorates when too much silicon powder is added to the prior trichlorosilane synthesis furnace.

[0007] To achieve the above objectives, the present invention provides the following technical solutions:

[0008] A silicon powder fluidizer for a trichlorosilane synthesis furnace, comprising:

[0009] The distributor originally provided by the trichlorosilane synthesis furnace is used to eject the rising first hydrogen chloride gas stream; and

[0010] a plurality of nozzles arranged in a circle and located above the distributor, for spraying a second hydrogen chloride gas flow flowing axially around the trichlorosilane synthesis furnace;

[0011] Wherein, each of the nozzles is sealed and passes through the side wall of the trichlorosilane synthesis furnace from the outside to the inside, and the injection direction thereof forms an angle with the radial direction of the trichlorosilane synthesis furnace.

[0012] In one embodiment disclosed in the present application, a plurality of nozzles arranged in a circle are located 20 to 50 cm above the distributor.

[0013] In one embodiment disclosed in the present application, intersection points of the plurality of nozzles with the side wall of the trichlorosilane synthesis furnace are distributed at equal angles around the center of the trichlorosilane synthesis furnace.

[0014] In one embodiment disclosed in the present application, the plurality of nozzles are inclined in the same direction, and the angles between their spraying directions and the radial direction of the trichlorosilane synthesis furnace increase successively.

[0015] In one embodiment disclosed in the present application, as the angle between the injection direction and the radial direction of the trichlorosilane synthesis furnace increases successively, the lengths of the plurality of nozzles extending into the trichlorosilane synthesis furnace decrease successively.

[0016] In one embodiment disclosed in the present application, there are 20 nozzles in total.

[0017] In one embodiment disclosed in the present application, the angles between the spray directions of the 20 nozzles and the radial direction of the trichlorosilane synthesis furnace increase from 16° to 35° in increments of 1°.

[0018] In one embodiment disclosed in the present application, the lengths of the 20 nozzles extending into the trichlorosilane synthesis furnace are 57 cm, 55 cm, 53 cm, 51 cm, 49 cm, 47 cm, 45 cm, 43 cm, 41 cm, 39 cm, 37 cm, 35 cm, 34 cm, 32 cm, 30 cm, 28 cm, 26 cm, 24 cm, 22 cm, and 20 cm, respectively.

[0019] In one embodiment disclosed in the present application, one end of each of the nozzles located outside the trichlorosilane synthesis furnace is connected to a branch pipe provided on a main pipe through a flange;

[0020] The air inlet of the main pipe is communicated with an external hydrogen chloride gas source.

[0021] In one embodiment disclosed in the present application, the main pipe comprises two symmetrically arranged pieces;

[0022] Each of the main pipes is in a semicircular structure.

[0023] Compared with the prior art, the beneficial effects of the present invention are:

[0024] 1. The dual effects of the first and second hydrogen chloride gas flows can significantly improve and enhance the fluidization effect of silicon powder in the trichlorosilane synthesis furnace. Even if a large amount of silicon powder is added, its fluidization can be achieved in a short time. At the same time, the second hydrogen chloride gas flow can also disturb the silicon powder particles from the side to make them collide with each other, thereby removing impurities such as carbon attached to the surface of the silicon powder particles, exposing the clean silicon powder reaction surface, which is conducive to the combination of catalyst and silicon powder to form silicon-copper contacts, improving the reaction space-time yield, and obtaining more target products.

[0025] 2. The inclination angle of each nozzle increases in the same direction and the length decreases in the same direction, which can complement and enhance the multiple second hydrogen chloride gas flows ejected, thereby forming a strong vortex in the trichlorosilane synthesis furnace, further improving the fluidization effect of the silicon powder in the trichlorosilane synthesis furnace, and at the same time facilitating the removal of impurities on the surface of the silicon powder particles.

[0026] 3. By supplying gas to several nozzles simultaneously through two main pipes (with two air inlets), it is possible to ensure that each nozzle sprays a second hydrogen chloride gas flow with sufficient flow, thereby further improving the fluidization effect of silicon powder in the trichlorosilane synthesis furnace. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following is a brief introduction to the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0028] Figure 1 It is a schematic diagram of the top structure of the utility model. DETAILED DESCRIPTION

[0029] Hereinafter, only certain exemplary embodiments are briefly described. As will be appreciated by those skilled in the art, the described embodiments may be modified in various ways without departing from the spirit or scope of the present invention. Therefore, the drawings and description are to be regarded as illustrative in nature and not restrictive.

[0030] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like to indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0031] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature specified as "first" or "second" may explicitly or implicitly include one or more of such features. In the description of this utility model, "plurality" means two or more, unless otherwise specifically defined.

[0032] In this utility model, unless otherwise specified or limited, the terms "installed," "connected," "connect," "fixed," etc. should be understood in a broad sense. For example, they can refer to fixed connection, detachable connection, or integration; they can refer to direct connection or indirect connection through an intermediate medium; they can refer to internal communication between two components or interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on specific circumstances.

[0033] In the present invention, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may include the first and second features being in direct contact, or may include the first and second features being in contact not directly but through another feature between them. Moreover, a first feature being "above," "above," and "above" a second feature may include the first feature being directly above or obliquely above the second feature, or may simply mean that the first feature is higher in level than the second feature. A first feature being "below," "below," and "below" a second feature may include the first feature being directly below or obliquely below the second feature, or may simply mean that the first feature is lower in level than the second feature.

[0034] The disclosure below provides many different embodiments or examples for realizing different structures of the present invention. In order to simplify the disclosure of the present invention, the components and settings of specific examples are described below. Of course, they are only examples and are not intended to limit the present invention.

[0035] The embodiments of the present invention are described in detail below with reference to the accompanying drawings.

[0036] See also Figure 1 As shown, the utility model provides a silicon powder fluidizer for a trichlorosilane synthesis furnace, comprising:

[0037] The original distributor (not shown in the figure) of the trichlorosilane synthesis furnace 1 is used to spray the rising first hydrogen chloride gas flow; and

[0038] A plurality of nozzles 2 arranged in a circle and located above the distributor are used to spray a second hydrogen chloride gas flow flowing axially around the trichlorosilane synthesis furnace 1;

[0039] Each nozzle 2 is sealed and passes through the side wall of the trichlorosilane synthesis furnace 1 from the outside to the inside, and the spraying direction thereof forms an angle with the radial direction of the trichlorosilane synthesis furnace 1 .

[0040] Specifically, a number of nozzles 2 arranged in a circle are located 20 to 50 cm above the distributor. Silicon powder entering the trichlorosilane synthesis furnace 1 rises upward under the influence of the first hydrogen chloride flow, achieving initial fluidization. It then encounters the second hydrogen chloride flow flowing axially around the trichlorosilane synthesis furnace 1, achieving secondary fluidization. Simultaneously, the second hydrogen chloride flow laterally disturbs the silicon powder particles, causing them to collide with subsequent rising silicon powder particles, thereby removing impurities such as carbon attached to the silicon powder particles' surfaces. In other words, the dual effects of the first and second hydrogen chloride flows significantly improve and enhance the fluidization of the silicon powder within the trichlorosilane synthesis furnace 1. Even with large amounts of added silicon powder, fluidization can be achieved in a short period of time. Furthermore, the second hydrogen chloride flow also laterally disturbs the silicon powder particles, causing them to collide with each other, thereby removing impurities such as carbon attached to the silicon powder particles' surfaces and exposing a clean silicon powder reaction surface. This facilitates the formation of silicon-copper contacts by the catalyst and silicon powder, improving the reaction space-time yield and yielding a higher yield of the target product.

[0041] The intersection points of the nozzles 2 and the side wall of the trichlorosilane synthesis furnace 1 are distributed at equal angles around the center of the trichlorosilane synthesis furnace 1. That is, these intersection points constitute equal division points of the circumference of the side wall of the trichlorosilane synthesis furnace 1.

[0042] The plurality of nozzles 2 are tilted in the same direction, and the angle between their spraying direction and the radial direction of the trichlorosilane synthesis furnace 1 (i.e., the tilt angle of each nozzle 2) increases in sequence. Specifically, when looking down from the top of the trichlorosilane synthesis furnace 1, the plurality of nozzles 2 are tilted in the counterclockwise direction ( Figure 1As the angle between the injection direction and the radial direction of the trichlorosilane synthesis furnace 1 increases, the lengths of the nozzles 2 extending into the trichlorosilane synthesis furnace 1 decrease. The increasing inclination angles and decreasing lengths of each nozzle 2 in the same direction enable the multiple second hydrogen chloride gas streams ejected therefrom to complement each other and enhance each other, thereby forming a strong vortex within the trichlorosilane synthesis furnace 1. This further enhances the fluidization of the silicon powder within the trichlorosilane synthesis furnace 1 and facilitates the removal of impurities from the surface of the silicon powder particles.

[0043] In this embodiment, there are 20 nozzles 2. The angles between the spray directions of the 20 nozzles 2 and the radial direction of the trichlorosilane synthesis furnace 1 increase from 16° to 35° in increments of 1° (see Figure 1 The lengths of the 20 nozzles 2 extending into the trichlorosilane synthesis furnace 1 are 57 cm, 55 cm, 53 cm, 51 cm, 49 cm, 47 cm, 45 cm, 43 cm, 41 cm, 39 cm, 37 cm, 35 cm, 34 cm, 32 cm, 30 cm, 28 cm, 26 cm, 24 cm, 22 cm, and 20 cm, respectively.

[0044] One end of each nozzle 2, located outside the trichlorosilane synthesis furnace 1, is connected via a flange 3 to a branch pipe 41 provided on a main pipe 4. An air inlet 42 of the main pipe 4 is connected to an external hydrogen chloride gas source (not shown). Specifically, the external hydrogen chloride gas enters the main pipe 4 through the air inlet 42 and is then distributed through the branch pipe 41 to each nozzle 2.

[0045] To facilitate assembly and disassembly between main pipe 4 and nozzles 2, two main pipes 4 are symmetrically arranged, each in a semicircular configuration. This allows multiple nozzles 2 to be supplied simultaneously via two main pipes 4 (each with two air inlets 42), ensuring that each nozzle 2 delivers a sufficient flow of the second hydrogen chloride gas stream, further enhancing the fluidization of the silicon powder within the trichlorosilane synthesis furnace 1.

[0046] The above embodiments are only preferred embodiments of the present invention and are not limitations on the technical solutions of the present invention. Any technical solution that can be implemented on the basis of the above embodiments without creative work should be deemed to fall within the scope of protection of the patent of the present invention.

Claims

1. A silicon powder fluidizer for a trichlorosilane synthesis furnace, characterized in that: include: The original distributor of the trichlorosilane synthesis furnace is used to spray the rising first hydrogen chloride gas flow; and a plurality of nozzles arranged in a circle and located above the distributor, for spraying a second hydrogen chloride gas flow flowing axially around the trichlorosilane synthesis furnace; Wherein, each of the nozzles is sealed and passes through the side wall of the trichlorosilane synthesis furnace from the outside to the inside, and the injection direction thereof forms an angle with the radial direction of the trichlorosilane synthesis furnace.

2. The silicon powder fluidizer of the trichlorosilane synthesis furnace according to claim 1, characterized in that: Several nozzles arranged in a circle are located 20 to 50 cm above the distributor.

3. The silicon powder fluidizer of the trichlorosilane synthesis furnace according to claim 1 or 2, characterized in that: The intersection points of the plurality of nozzles and the side wall of the trichlorosilane synthesis furnace are distributed at equal angles around the center of the trichlorosilane synthesis furnace.

4. The silicon powder fluidizer of the trichlorosilane synthesis furnace according to claim 3, characterized in that: The plurality of nozzles are inclined in the same direction, and the angles between their spraying directions and the radial direction of the trichlorosilane synthesis furnace increase successively.

5. The silicon powder fluidizer of the trichlorosilane synthesis furnace according to claim 4, characterized in that: When the angle between the injection direction and the radial direction of the trichlorosilane synthesis furnace increases successively, the lengths of the plurality of nozzles extending into the trichlorosilane synthesis furnace decrease successively.

6. The silicon powder fluidizer of the trichlorosilane synthesis furnace according to claim 5, characterized in that: There are 20 nozzles in total.

7. The silicon powder fluidizer of the trichlorosilane synthesis furnace according to claim 6, characterized in that: The angles between the spray directions of the 20 nozzles and the radial direction of the trichlorosilane synthesis furnace increase from 16° to 35° in increments of 1°.

8. The silicon powder fluidizer for trichlorosilane synthesis furnace according to claim 7, characterized in that: The lengths of the 20 nozzles extending into the trichlorosilane synthesis furnace are 57 cm, 55 cm, 53 cm, 51 cm, 49 cm, 47 cm, 45 cm, 43 cm, 41 cm, 39 cm, 37 cm, 35 cm, 34 cm, 32 cm, 30 cm, 28 cm, 26 cm, 24 cm, 22 cm, and 20 cm, respectively.

9. The silicon powder fluidizer for a trichlorosilane synthesis furnace according to any one of claims 1, 2, 4 to 8, characterized in that: One end of each of the nozzles located outside the trichlorosilane synthesis furnace is connected to a branch pipe provided on a main pipe through a flange; The air inlet of the main pipe is communicated with an external hydrogen chloride gas source.

10. The silicon powder fluidizer for the trichlorosilane synthesis furnace according to claim 9, characterized in that: The main pipe is symmetrically arranged with two pieces; Each of the main pipes is in a semicircular structure.

Images