Photoresist filtering device

Abstract

The utility model provides a photoresist filtering device which is arranged on a pipeline between a furnace body and a butterfly valve and at least comprises a main body, a flow blocking piece and a filtering piece, and the main body comprises an air inlet end communicated with the furnace body and an output end communicated with the butterfly valve; a flow blocking piece and a filtering piece are sequentially arranged in the main body in a sleeved mode, the flow blocking piece and the filtering piece are both of a hollow cylindrical structure, the side wall of the flow blocking piece and the side wall of the filtering piece are arranged opposite to the air inlet end, and the hollow cavity of the flow blocking piece and the hollow cavity of the filtering piece are arranged opposite to the output end. The photoresist filtering device is arranged in the equipment pipeline, and the airflow mixed with photoresist is blocked and deposited by the flow blocking piece and the filtering piece so as to filter the photoresist airflow from the furnace body, so that the purity of the airflow in the downstream pipeline is ensured, the downstream butterfly valve is prevented from being blocked, the service life of the butterfly valve is prolonged, and the stable operation of the equipment is maintained.

Description

Technical Field

[0001] The present application relates to the field of semiconductor technology, and in particular to a photoresist filtering device. Background Art

[0002] Currently, the existing 6-inch silicon carbide (SIC) 2000°C ultra-high temperature activation equipment on the market has a significant technical flaw: the lack of effective auxiliary devices to prevent deposits. In actual production, this can easily cause the butterfly valves in the equipment pipelines to become clogged with deposits, preventing the pressure inside the equipment from returning to a stable state. This instability in pressure control not only occurs frequently but also seriously affects product production quality, leading to an increase in product scrap rates. In addition, due to the accumulation of deposits, the equipment needs to be manually cleaned approximately every 15 days. This frequent maintenance requirement greatly reduces the equipment's operating time, which in turn leads to a significant decrease in production capacity.

[0003] Therefore, there is an urgent need to provide an improved technical solution for the above technical problems. Utility Model Content

[0004] In view of the above-mentioned defects and deficiencies in the prior art, the purpose of this application is to provide a photoresist filtering device to solve the practical technical problems of the existing equipment in photoresist deposition blocking and improve the stability and production capacity of the equipment.

[0005] The present application provides a photoresist filtering device, which is arranged on a pipeline between a furnace body and a butterfly valve. The photoresist filtering device at least comprises:

[0006] a main body, comprising an air inlet end communicating with the furnace body, and an output end communicating with the butterfly valve;

[0007] In the radial direction from the edge to the center of the main body, a flow blocker and a filter are sequentially sleeved inside the main body, and both the flow blocker and the filter are hollow cylindrical structures, wherein:

[0008] The side walls of the flow-blocking component and the filter component are arranged opposite to the air inlet end, and the hollow cavities of the flow-blocking component and the filter component are arranged opposite to the output end.

[0009] In some embodiments, the baffle comprises a first baffle and a second baffle sequentially sleeved in a radial direction, the first baffle is provided with a plurality of first holes, and the second baffle is provided with a plurality of second holes, wherein:

[0010] The diameter of the first hole is greater than that of the second hole, and the diameter of the second hole is greater than or equal to 1 mm.

[0011] In some embodiments, the shapes of the first hole and the second hole are circular, elliptical, or polygonal, or a combination thereof.

[0012] In some embodiments, the second spoiler is attached to the inner wall of the first spoiler; or, an airflow buffer area is formed between the second spoiler and the first spoiler.

[0013] In some embodiments, the first hole has a minimum width D1, 2mm≤D1≤6mm;

[0014] The second hole has a minimum width D2, 0.5 mm ≤ D2 ≤ 2 mm.

[0015] In some embodiments, the main body includes a shell and a cover, and the cover is disposed at the top opening of the shell, wherein:

[0016] The flow blocking member is located inside the housing and connected to the cover;

[0017] The output end is arranged on the cover body, and the output end falls within the axial range of the hollow cavity of the filter element.

[0018] In some embodiments, there is a minimum distance L between the outer side wall of the baffle and the inner side wall of the main body, and L is ≥ 10 mm.

[0019] In some embodiments, there is a space height H between the bottom of the baffle and the bottom of the main body, where H>0 mm.

[0020] In some embodiments, a plurality of filter holes are defined on the sidewall of the filter element, and each of the filter holes has a minimum width D3, where 0.5 mm ≤ D3 ≤ 2 mm.

[0021] In some embodiments, the main body, the flow blocking element, and the filter element are all right cylindrical structures, and the axes of the main body, the flow blocking element, and the filter element are all located on the same straight line.

[0022] Compared with the existing technology, the technical solution provided by this application has the following beneficial effects:

[0023] In the technical solution of the present application, a photoresist filtering device is added to the equipment pipeline system. The device is arranged on the pipeline between the furnace body and the butterfly valve. It includes a main body, and a baffle and a filter arranged in sequence in the main body. The airflow mixed with photoresist is blocked and deposited by the baffle and the filter to filter the photoresist airflow from the furnace body, thereby ensuring the purity of the airflow in the downstream pipeline, preventing the downstream butterfly valve from being blocked, extending the service life of the butterfly valve, and maintaining the stable operation of the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 A schematic diagram of the photoresist airflow direction of a high-temperature activation device in the prior art;

[0025] Figure 2 Schematic diagram of the high-temperature activation equipment system provided for this application;

[0026] Figure 3 A schematic diagram of the internal structure of the photoresist filtering device provided in this application;

[0027] Figure 4 A schematic diagram of the cross-sectional structure of the photoresist filtering device provided in this application;

[0028] Figure 5 A schematic cross-sectional view of the photoresist filter device provided in this application, viewed from above;

[0029] Figure 6 This is a schematic structural diagram of the baffle provided in this application.

[0030] Description of reference numerals:

[0031] 1. Furnace body; 2. Pump body; 3. Butterfly valve; 4. Photoresist filter device; 40. Main body; 410. Shell; 420. Cover; 50. Baffle; 510. First baffle; 511. First hole; 520. Second baffle; 521. Second hole; 60. Filter element; 610. Filter hole; 70. Air inlet; 80. Output. DETAILED DESCRIPTION

[0032] like Figure 1 As shown, in the prior art, under the operation of the pump body 2 of the high-temperature activation equipment, the airflow mixed with photoresist and other impurities generated in the furnace body 1 flows along the pipeline and is output. A butterfly valve 3 is set in the pipeline to control the stability of the system airflow. However, when the airflow flows through the butterfly valve 3, it will be partially deposited on the surface of the butterfly valve 3. Over time, it will cause the butterfly valve 3 to be blocked, and the pressure inside the equipment cannot be adjusted to a stable state, which greatly affects the production quality of the product. Manual cleaning of the butterfly valve 3 and related pipelines is time-consuming and labor-intensive, resulting in a significant decrease in production capacity.

[0033] To improve product quality, equipment stability, and production capacity, this application provides a photoresist filtering device. The following examples illustrate the implementation of this application. Those skilled in the art can easily understand the other advantages and benefits of this application based on the content disclosed in this specification. This application can also be implemented or applied through different specific implementations, and the details in this specification can be modified or changed based on different viewpoints and applications without departing from the spirit of this application.

[0034] See also Figures 2 to 6The photoresist filtering device 4 is arranged on the pipeline between the furnace body 1 and the butterfly valve 3, and the device at least includes:

[0035] The main body 40 includes an air inlet end 70 connected to the furnace body 1 and an output end 80 connected to the butterfly valve 3. When the air inlet end 70 and the output end 80 are in a closed state, the main body 40 as a whole has a sealed cylindrical structure. That is, after the airflow enters the main body 40 from the air inlet end 70, it undergoes sedimentation filtration inside the main body 40, and then the high-purity clean airflow flows from the output end 80 to the downstream pipeline. Furthermore, the shape of the main body 40 can be cylindrical, cubic, or multi-sided, and any other shape with a suitable cavity structure. Furthermore, the main body 40, the flow blocker 50, and the filter 60 are all right cylindrical structures, and the axes of the main body 40, the flow blocker 50, and the filter 60 are all located on the same straight line. Figures 3 to 6 The main body 40 shown has a shell 410 with a cylindrical structure. The inner cavity of the cylindrical structure makes the airflow more uniform, which can avoid the generation of vortices and deposition dead corners. The airflow passing through the device can be filtered through a reasonable airflow filtration path, ultimately improving the airflow purity at the output end 80.

[0036] In the radial direction from the edge to the center of the main body 40, a baffle 50 and a filter 60 are sequentially arranged inside the main body 40 to realize the deposition and filtering function of the device on the photoresist airflow. The baffle 50 and the filter 60 are both hollow cylindrical structures, wherein the side walls of the baffle 50 and the filter 60 are arranged opposite to the air inlet end 70, and the hollow cavities of the baffle 50 and the filter 60 are arranged opposite to the output end 80. When the airflow enters the interior of the main body 40 from the air inlet end 70, the airflow first passes through the baffle 50 for a primary buffer, and the flow rate is reduced. After passing through the baffle 50, it continues to flow through the filter 60 inside the baffle 50 for a secondary buffer. The photoresist and other impurities in the airflow are simultaneously filtered or deposited at the filter 60. Then, the clean airflow passes through the side walls of the filter 60 and enters the hollow cavity inside it, and is transported upward from the output end 80 to the downstream pipeline and equipment.

[0037] In an optional embodiment, the air inlet end 70 is arranged in the middle and upper part of the main body 40. When the air flow flows through the surface of the baffle 50, the flow resistance increases, and part of the air flow enters the interior of the baffle 50 through the holes of the baffle 50, and the other part of the air flow changes direction and flows downward along the space between the baffle 50 and the inner wall of the main body 40. In the process of the air flow flowing downward, the air flow gradually penetrates from the holes of the baffle 50 into the internal cavity and enters the filter element 60 for deposition filtration, so as to achieve efficient filtration of the photoresist.

[0038] In an optional embodiment, the output end 80 falls within the axial range of the hollow cavity of the filter element 60 . Furthermore, the output end 80 is located at the center of the main body 40 .

[0039] In some embodiments, the baffle 50 includes a first baffle 510 and a second baffle 520 sequentially arranged radially. The first baffle 510 defines a plurality of first holes 511, and the second baffle 520 defines a plurality of second holes 521. The multiple baffles are sequentially arranged to achieve multiple buffering and pre-filtration of the airflow. The diameter of the first holes 511 is larger than that of the second holes 521, and the diameter of the second holes 521 is greater than or equal to 1 mm. It is understood that in order to improve the airflow buffering and pre-filtration effect of the baffle 50, two layers of baffles with decreasing apertures are provided from the outside to the inside. The aperture of the second hole 521 is greater than or equal to the filter hole 610 of the filter element 60. When a filter element 60 with an aperture of 1 mm is selected, the aperture of the second hole 521 is greater than or equal to 1 mm to achieve the effect of layer-by-layer filtration of the airflow. If the aperture of the second hole 521 or the filter element 60 is less than 0.5 mm, the resistance to the airflow is too large, which will reduce the filtration efficiency of the airflow. The aperture of the second hole 521 is between 0.5 mm and 4 mm. Furthermore, the aperture of the second hole 521 is between 1 mm and 2 mm to match the aperture of the filter element 60 and the aperture of the first hole 511 of the first baffle 510, achieving a better filtering effect and a good control effect on the airflow flow rate.

[0040] In some embodiments, the shapes of the first hole 511 and the second hole 521 are circular, elliptical or polygonal, or a combination thereof. Figure 6 The present application provides a first baffle 510 in which the first hole 511 is a regular hexagon, and a plurality of first holes 511 are arranged in an array on the side wall of the first baffle 510; the second hole 521 of the second baffle 520 is a quadrilateral, and can be a suitable structure such as a punching plate or a filter basket. The second baffle 520 is sleeved inside the first baffle 510. Furthermore, the first hole 511 has a minimum width D1, 2mm≤D1≤6mm. As an example, the minimum width of the first hole 511 can be 2mm, 3mm, 4mm, 5mm or 6mm. Preferably, the aperture of the first hole 511 is 4mm. The second hole 521 has a minimum width D2, 0.5mm≤D2≤2mm. As an example, the minimum width of the second hole 521 can be 0.5mm, 1mm, 1.5mm or 2mm. Preferably, the aperture of the second hole 521 is 1mm. It can be understood that when the first hole 511 and the second hole 521 are circular, their minimum width or aperture is their diameter.

[0041] In an optional embodiment, see Figure 5The second baffle 520 is attached to the inner wall of the first baffle 510, that is, the second baffle 520 is in contact with the first baffle 510, and the airflow passes through the first hole 511 of the first baffle 510 and the second hole 521 of the second baffle 520 almost simultaneously, completing two pre-filtration depositions. After the pre-filtration, some impurities in the airflow are deposited and attached to the baffle 50, and some small particles of impurities and photoresist continue to enter the filter 60 through the baffle 50 for filtration. Furthermore, the first baffle 510 and the second baffle 520 are both made of stainless steel. After the second baffle 520 is welded, riveted, etc., it can be assembled with the first baffle 510 to form a baffle 50, and then the baffle 50 can be installed as a whole into the interior of the main body 40.

[0042] In an optional embodiment, an airflow buffer area is formed between the second baffle 520 and the first baffle 510. That is, there is no contact surface between the second baffle 520 and the first baffle 510. After being buffered and pre-filtered by the first holes 511 of the first baffle 510, the airflow passes through the airflow buffer area and is then filtered by the second baffle 520. Furthermore, a plurality of second baffles 520 can be sequentially installed inside the first baffle 510. The filter apertures of the plurality of second baffles 520 can be the same or can decrease in size. The plurality of second baffles 520 can contact each other or be independently arranged at a certain distance to provide a more multi-stage pre-filtration effect.

[0043] In some embodiments, the main body 40 is a split structure, including a shell 410 and a cover 420. The shell 410 is a hollow cylindrical structure with a top opening formed by the side wall and the bottom surface. The cover 420 is arranged at the top opening of the shell 410. The flow blocking member 50 is located inside the shell 410 and connected to the cover 420. The output end 80 is arranged on the cover 420 and falls within the axial range of the hollow cavity of the filter element 60. It should be noted that Figure 4 The illustrated connection methods for the filter 60 and the flow blocker 50, respectively, to the cover 420 are merely schematic and schematic, and the illustrated structures are not intended to limit the specific features of the aforementioned connection structures. It will be appreciated that, depending on the different cavities within the flow blocker 50, the filter 60, and the main body 40, the number and arrangement of the connection mechanisms may be varied based on the cavity size and structure to ensure secure installation of the flow blocker 50 and the filter 60. This embodiment does not impose any specific limitations on this.

[0044] In some embodiments, see Figure 4A minimum distance L is defined between the outer wall of the spoiler 50 and the inner wall of the main body 40, where L is ≥ 10 mm. In this embodiment, the diameter of the main body 40 ranges from 200 mm to 300 mm, and further, the diameter ranges from 240 mm to 260 mm. The height of the main body 40 ranges from 250 mm to 350 mm, and further, the height ranges from 380 mm to 320 mm.

[0045] In some embodiments, there is a space height H between the bottom of the baffle 50 and the bottom of the main body 40, where H>0 mm. That is, the bottom of the baffle 50 does not contact the main body 40. When the airflow flows through the surface of the baffle 50, the flow resistance increases, and part of the airflow enters the interior of the baffle 50 through the holes of the baffle 50, while the other part of the airflow changes direction and flows downward along the space between the baffle 50 and the inner wall of the main body 40. During the downward flow of the airflow, the airflow gradually penetrates from the holes of the baffle 50 into the internal cavity and enters the filter element 60 for deposition and filtration. This space height allows the remaining airflow to flow downward along the outer wall of the first baffle 510 to the bottom of the first baffle 510, enter the hollow cavity of the filter element 60, and then upward along the hollow cavity through the output end 80 to be discharged into the downstream pipeline. This space height makes the airflow state inside the main body 40 more stable.

[0046] In some embodiments, the sidewall of the filter element 60 defines a plurality of filter holes 610. Each filter hole 610 has a minimum width D3, where 0.5 mm ≤ D3 ≤ 2 mm. For example, the minimum width of the filter holes 610 can be 0.5 mm, 1 mm, 1.5 mm, or 2 mm. Preferably, the diameter of the filter holes 610 is 1 mm. The diameter of the filter holes 610 of the filter element 60 is no larger than the size of the second hole 521 of the second spoiler 520.

[0047] In summary, the present application provides a photoresist filtering device, which is arranged on the pipeline between the furnace body and the butterfly valve, and includes a main body, and a flow blocker and a filter element sequentially arranged inside the main body. The airflow mixed with photoresist passes through the flow blocker and the filter element to block and deposit, thereby filtering the photoresist airflow from the furnace body, ensuring the purity of the airflow in the downstream pipeline, preventing the downstream butterfly valve from clogging, extending the service life of the butterfly valve, and maintaining the stable operation of the equipment. After actual working condition testing, the design scheme using a 1mm round hole filter element can effectively filter 80% or more of the photoresist, greatly extending the cleaning cycle of the butterfly valve. Therefore, the technical solution of the present application has a high industrial utilization value because it effectively overcomes the various shortcomings of the existing technology.

[0048] The above embodiments are merely illustrative of the principles and effects of this application and are not intended to limit this application. Anyone skilled in the art may modify or alter the above embodiments without departing from the spirit and scope of this application. Therefore, all equivalent modifications or alterations made by one of ordinary skill in the art without departing from the spirit and technical concepts disclosed in this application shall be covered by the claims of this application.

Claims

1. A photoresist filtering device, arranged on the pipeline between the furnace body and the butterfly valve, characterized in that: At least: a main body, comprising an air inlet end communicating with the furnace body, and an output end communicating with the butterfly valve; In the radial direction from the edge to the center of the main body, a flow blocker and a filter are sequentially sleeved inside the main body, and both the flow blocker and the filter are hollow cylindrical structures, wherein: The side walls of the flow-blocking component and the filter component are arranged opposite to the air inlet end, and the hollow cavities of the flow-blocking component and the filter component are arranged opposite to the output end.

2. The photoresist filtering device according to claim 1, characterized in that: The baffle comprises a first baffle plate and a second baffle plate which are sequentially sleeved in a radial direction, wherein the first baffle plate is provided with a plurality of first holes, and the second baffle plate is provided with a plurality of second holes, wherein: The diameter of the first hole is greater than that of the second hole, and the diameter of the second hole is greater than or equal to 1 mm.

3. The photoresist filtering device according to claim 2, characterized in that: The shapes of the first hole and the second hole are circular, elliptical or polygonal, or a combination of these.

4. The photoresist filtering device according to claim 2, characterized in that: The second spoiler is attached to the inner wall of the first spoiler; or an airflow buffer area is formed between the second spoiler and the first spoiler.

5. The photoresist filtering device according to claim 2, characterized in that: The first hole has a minimum width D1, 2mm≤D1≤6mm; The second hole has a minimum width D2, 0.5 mm ≤ D2 ≤ 2 mm.

6. The photoresist filtering device according to claim 1, characterized in that: The main body includes a shell and a cover, and the cover is arranged at the top opening of the shell, wherein The flow blocking member is located inside the housing and connected to the cover; The output end is arranged on the cover body, and the output end falls within the axial range of the hollow cavity of the filter element.

7. The photoresist filtering device according to claim 1, characterized in that: There is a minimum distance L between the outer side wall of the baffle and the inner side wall of the main body, and L is greater than or equal to 10 mm.

8. The photoresist filtering device according to claim 7, characterized in that: There is a space height H between the bottom of the baffle and the bottom of the main body, where H>0 mm.

9. The photoresist filtering device according to claim 1, characterized in that: The side wall of the filter element is provided with a plurality of filter holes, each of which has a minimum width D3, 0.5 mm ≤ D3 ≤ 2 mm.

10. The photoresist filtering device according to any one of claims 1 to 9, characterized in that: The main body, the flow-blocking element, and the filter element are all regular cylindrical structures, and the axes of the main body, the flow-blocking element, and the filter element are all located on the same straight line.

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