Conductive patterned glass with high light transmittance

Abstract

The utility model discloses conductive patterned glass with high light transmittance, the bending strength of the conductive patterned glass is greater than 90.0 MPa, the light transmittance of the conductive patterned glass is greater than 85%, the conductive patterned glass comprises a glass substrate, the glass substrate is provided with a light-in surface and a light-out surface which are opposite, the light-in surface is provided with a light-in surface pattern structure, and the light-out surface is provided with a light-out surface pattern structure; the at least one antireflection layer is sequentially stacked on the light incident surface pattern structure; the interface layer is stacked on the light-emitting surface pattern structure; the at least one conductive function layer is sequentially stacked on the interface layer; the interface layer is used for improving the adhesive force between the conductive functional layer and the glass substrate, and the conductive functional layer can reflect near-infrared light with the wave band of 1100-2500nm.

Description

Technical Field

[0001] The utility model relates to the technical field of photovoltaic glass, in particular to a conductive patterned glass with high light transmittance. Background Art

[0002] TCO glass is usually formed by coating a transparent conductive film on a smooth glass surface through physical and chemical coating methods. Due to its excellent light transmittance and conductivity, it is used as the front electrode of photovoltaic thin-film cells. At present, in order to maintain good conductivity, the conductive glass used in thin-film battery modules is restricted by the thickness of the conductive layer, resulting in low light transmittance, which leads to reduced light utilization of thin-film batteries. At the same time, the combination of thin-film battery modules and buildings, such as roofs of large commercial buildings, building wall facades and office buildings, has a poor heat dissipation effect of photovoltaic thin-film battery modules, because the transmittance of its photoelectric response band is concentrated in the visible light band and the transmittance of the mid-infrared light band is relatively high. This increases the operating temperature and reduces the system efficiency. In addition, this heat conduction will continue to spread indoors, increasing the indoor cooling energy consumption. Utility Model Content

[0003] The purpose of the utility model is to design a conductive patterned glass with high light transmittance to address the problems of low light transmittance and poor heat dissipation effect of existing conductive glass. The conductive patterned glass has the advantages of good light transmittance, high light utilization rate, good heat dissipation effect and high mechanical strength.

[0004] In order to achieve the above-mentioned purpose, the present invention is realized through the following technical solutions:

[0005] The utility model designs a conductive patterned glass with high light transmittance, wherein the conductive patterned glass has a bending strength greater than 90.0 MPa and a light transmittance greater than 85%, and comprises:

[0006] A glass substrate having a light incident surface and a light emitting surface opposite to each other, wherein the light incident surface is provided with a light incident surface pattern structure, and the light emitting surface is provided with a light emitting surface pattern structure;

[0007] At least one anti-reflection layer, which is sequentially stacked on the light incident surface pattern structure;

[0008] an interface layer, which is stacked on the light-emitting surface pattern structure;

[0009] and at least one conductive functional layer, which is sequentially stacked on the interface layer; the interface layer is used to improve the adhesion between the conductive functional layer and the glass substrate, and the conductive functional layer can reflect near-infrared light in the 1100-2500nm band.

[0010] Specifically, the glass substrate of the present invention is a double-sided patterned glass substrate.

[0011] Furthermore, a conductive patterned glass with high light transmittance is provided: the patterned structure on the light incident surface is obtained by roll forming or chemical etching, and the patterned structure on the light incident surface is arranged as a regular hexagonal structure.

[0012] Furthermore, a conductive patterned glass with high light transmittance is provided: the light-emitting surface pattern structure is obtained by roll forming or chemical etching, the light-emitting surface pattern structure is set to an irregular concave-convex structure or a regular arc structure, and the roughness Ra of the light-emitting surface pattern structure is 0.1 to 0.3 μm.

[0013] Furthermore, a conductive patterned glass with high light transmittance: the anti-reflection layer is set to a single-layer structure with a thickness of 80 to 150 nm and a refractive index of 1.2 to 1.35.

[0014] Furthermore, a conductive patterned glass with high light transmittance: the anti-reflection layer is configured as a double-layer structure, comprising a first anti-reflection layer and a second anti-reflection layer stacked together; the first anti-reflection layer is stacked on the light incident surface patterned structure, the first anti-reflection layer has a thickness of 50 to 90 nm and a refractive index of 1.4 to 1.46; the second anti-reflection layer has a thickness of 100 to 140 nm and a refractive index of 1.22 to 1.32.

[0015] Furthermore, a conductive patterned glass with high light transmittance: the interface layer is a silicon dioxide interface layer, which is prepared by magnetron sputtering, chemical vapor deposition or electron beam evaporation deposition, and has a thickness of 15.0 to 25.0 nm.

[0016] Furthermore, a conductive patterned glass with high light transmittance: the thickness of the glass substrate is set to 1.0-3.0 mm.

[0017] Furthermore, a conductive patterned glass with high light transmittance: the glass substrate is made of thermally strengthened or chemically strengthened glass.

[0018] Furthermore, a conductive patterned glass with high light transmittance is provided: the conductive functional layer is set as a single-layer structure, which adopts an ITO conductive layer with a thickness of 160 to 200 nm.

[0019] Furthermore, a conductive patterned glass with high light transmittance: the conductive functional layer is set to a three-layer structure, which includes a first conductive functional layer, a second conductive functional layer and a third conductive functional layer that are stacked; the first conductive functional layer is made of ITO material, which is stacked on the interface layer and has a thickness of 110 to 130 nm; the second conductive functional layer is made of Ag and has a thickness of 3.0 to 5.0 nm; the third conductive functional layer is made of ITO material and has a thickness of 45 to 60 nm.

[0020] Beneficial effects of the utility model:

[0021] (1) The anti-reflection layer provided in the present invention is mainly used to increase light transmittance. The light incident surface pattern structure is conducive to the combination between the anti-reflection layer and the glass substrate, thereby improving the adhesion of the anti-reflection layer. At the same time, the light exit surface pattern structure can improve the lattice matching between the glass substrate and the conductive functional layer, thereby improving the adhesion of the conductive layer. The conductive functional layer can also improve the reflectivity of near-infrared light in the 1100-2500nm band, so that the near-infrared light in this band can be reflected out, avoiding entering the battery layer, and also preventing the heat generated in this band from continuously propagating into the room, thereby achieving a better heat dissipation effect and not increasing the indoor cooling energy consumption.

[0022] (2) The utility model provides a light-entering surface pattern structure on the light-entering surface of the glass substrate and coats an anti-reflection layer. The light-entering surface pattern structure can improve the quality of the anti-reflection film layer; at the same time, the light-entering surface pattern structure can also reduce mirror reflection, reduce glare and light pollution. A light-emitting surface pattern structure is provided on the light-emitting surface of the glass substrate, which can increase the specific surface area of ​​the light-emitting surface of the glass substrate, and the effective area per unit area is larger. After the perovskite battery layer is subsequently prepared, the power per unit area is higher. The utility model provides pattern structures on the inner and outer surfaces of the glass substrate, which can increase light trapping, and the IAM at large angles is higher, thereby improving light utilization. At the same time, the pattern structures on the inner and outer surfaces can effectively reduce the brightness of the reflected light observed by the human eye and the proportion of the incident light absorbed by the battery, resulting in high light utilization and improved optical performance. The glass substrate of the utility model is also strengthened, which effectively improves the mechanical strength of the conductive patterned glass. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.

[0024] Figure 1 A schematic structural diagram of a conductive patterned glass with high light transmittance designed for Example 1 of the present utility model;

[0025] Figure 2 A schematic structural diagram of a conductive patterned glass with high light transmittance designed for Example 2 of the present utility model;

[0026] Figure 3 A schematic structural diagram of a conductive patterned glass with high light transmittance designed for Example 3 of the present utility model;

[0027] Figure 4 A schematic structural diagram of a conductive patterned glass with high light transmittance designed for Example 4 of the present utility model;

[0028] Figure 5 Graph showing emissivity test results of the conductive patterned glass of Example 3 and the conductive glass of Comparative Example 1.

[0029] Markings in the figure: 1-glass substrate, 2-anti-reflection layer, 3-interface layer, 4-conductive functional layer, 11-light incident surface pattern structure, 12-light exit surface pattern structure, 21-first anti-reflection layer, 22-second anti-reflection layer, 41-first conductive functional layer, 42-second conductive functional layer, 43-third conductive functional layer. DETAILED DESCRIPTION

[0030] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. The following description of at least one exemplary embodiment is actually only illustrative and is in no way intended to limit the present invention and its application or use. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0031] In the description of the present invention, it should be understood that the terms "upper", "lower", "left", "right", "top", "bottom", etc., indicating directions or positional relationships, are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as limiting the present invention. In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. Moreover, the terms "first", "second", etc. are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that the data used in this way can be interchangeable where appropriate, so that the embodiments of the present invention described herein can be implemented in an order other than those illustrated or described herein.

[0032] Example 1

[0033] like Figure 1 As shown, in this embodiment 1, a conductive patterned glass with high light transmittance is designed. The conductive patterned glass has a bending strength greater than 90.0 MPa and a light transmittance greater than 85%, and comprises:

[0034] A glass substrate 1 having a thickness of 2.0 mm and having a light incident surface and a light exiting surface opposite to each other, wherein a light incident surface pattern structure 11 having a regular hexagonal structure is provided on the light incident surface by roll forming, and an irregular concave-convex light exiting surface pattern structure 12 is provided on the light exiting surface by roll forming, and a roughness Ra of the light exiting surface pattern structure 12 is 0.1 to 0.3 μm;

[0035] An anti-reflection layer 2 is formed on the light incident surface pattern structure 11 by roller coating, with a thickness of 120 nm and a refractive index of 1.25;

[0036] An interface layer 3, a silicon dioxide interface layer 3 with a thickness of 20.0 nm is formed on the light-emitting surface pattern structure 12 by magnetron sputtering, and the interface layer 3 is used to improve the adhesion between the conductive functional layer 4 and the glass substrate 1;

[0037] and a conductive functional layer 4, wherein a 180.0 nm thick ITO conductive functional layer 4 is prepared on the interface layer 3 by magnetron sputtering, and the conductive functional layer 4 can reflect near-infrared light in the 1100-2500 nm band;

[0038] Among them, the glass substrate 1 is heat-strengthened glass. The heat-strengthening process is: heating the glass substrate 1 to a temperature above 650°C and maintaining it for a certain period of time to make its temperature uniform, then rapidly cooling it, quickly removing the glass from the high-temperature state, and rapidly cooling it in a closed environment such as air or nitrogen.

[0039] Example 2

[0040] like Figure 2 As shown, the difference between Example 2 and Example 1 is that the number of anti-reflection layers 2 in Example 2 is set to two layers, which includes a first anti-reflection layer 21 and a second anti-reflection layer 22 stacked together. The first anti-reflection layer 21 is stacked on the light-incident surface pattern structure 11. The first anti-reflection layer 21 has a thickness of 70 nm and a refractive index of 1.42. The second anti-reflection layer 21 has a thickness of 120 nm and a refractive index of 1.25. The transmittance of the conductive glass is adjusted according to the refractive index and thickness of each film layer in the anti-reflection layer, thereby further improving the light transmittance.

[0041] Example 3

[0042] like Figure 3As shown, the difference between Example 3 and Example 1 is that: in Example 3, the number of conductive functional layers 4 is set to three layers, which includes a first conductive functional layer 41, a second conductive functional layer 42 and a third conductive functional layer 43 stacked together, the first conductive functional layer 41 is made of ITO material, which is stacked on the interface layer 3 and has a thickness of 120nm, the second conductive functional layer 42 is made of Ag and has a thickness of 4.0nm, and the third conductive functional layer 41 is made of ITO material and has a thickness of 50nm; this Example 3 further improves the reflectivity of near-infrared light in the 1100-2500nm band and improves the conductive performance of the conductive functional layer through the three-layer structure of the conductive functional layer. Due to the enhanced reflectivity of near-infrared light in the 1100-2500nm band, the near-infrared light in this band can be reflected out, thereby avoiding the problem that the light in this band enters the perovskite cell layer and causes the cell to heat up, thereby reducing the cell efficiency. At the same time, it can also avoid the problem that the light in this band is transmitted into the room, causing the indoor temperature to rise, thereby increasing the indoor cooling energy consumption.

[0043] Example 4

[0044] like Figure 4 As shown, the difference between Example 4 and Example 1 is that the light-emitting surface pattern structure 12 in Example 4 is set to a regular arc structure, and the rest is the same as Example 1.

[0045] Comparative Example 1

[0046] The difference between Comparative Example 1 and Example 1 is that the glass substrate in Comparative Example 1 is double-sided flat glass, and the rest is the same as Example 1.

[0047] Comparative Example 2

[0048] The difference between Comparative Example 2 and Example 1 is that the glass substrate in Comparative Example 2 is not heat-strengthened, and the rest is the same as Example 1.

[0049] The transmittance, sheet resistance, and bending strength of the conductive glasses of Examples 1 to 4 and Comparative Examples 1 to 2 were tested at 380 to 780 nm. The test results are shown in the following table:

[0050] Light transmittance (%) Square resistance (Ω / □) Flexural strength (MPa) Example 1 85.49 7.5 100 Example 2 86.99 7.7 98 Example 3 85.03 6.8 99 Example 4 85.03 7.3 101 Comparative Example 1 84.45 7.3 103 Comparative Example 2 85.65 7.4 55

[0051] It can be seen from the above test results that the conductive patterned glass of the present invention has high light transmittance and mechanical strength.

[0052] The reflectivity of the conductive patterned glass of Example 3 and the conductive glass of Comparative Example 1 were tested, and the test results are as follows: Figure 5 As shown by Figure 5It can be seen that the reflectivity of the conductive patterned glass of the present invention in the infrared light band of 1100 to 5000 nm is significantly enhanced, the radiation heat dissipation performance is better, the operating temperature of the component is reduced, and the output power of the component is improved.

[0053] The above preferred embodiments of the present invention are only used to explain the present invention and are not intended to limit the present invention. Any obvious changes or modifications derived from the technical solution of the present invention are still within the scope of protection of the present invention.

Claims

1. A conductive patterned glass with high light transmittance, characterized in that: The conductive patterned glass has a bending strength greater than 90.0 MPa and a light transmittance greater than 85%, and comprises: A glass substrate (1) having a light incident surface and a light emitting surface opposite to each other, wherein the light incident surface is provided with a light incident surface pattern structure (11), and the light emitting surface is provided with a light emitting surface pattern structure (12); At least one anti-reflection layer (2) is sequentially stacked on the light incident surface pattern structure (11); an interface layer (3) stacked on the light-emitting surface pattern structure (12); and at least one conductive functional layer (4) which is sequentially stacked on the interface layer (3); the interface layer (3) is used to improve the adhesion between the conductive functional layer (4) and the glass substrate (1); the conductive functional layer (4) can reflect near-infrared light in the 1100-2500nm band.

2. The conductive patterned glass with high light transmittance according to claim 1, characterized in that: The light incident surface pattern structure (11) is obtained by roll forming or chemical etching, and the light incident surface pattern structure (11) is arranged as a regular hexagonal structure.

3. The conductive patterned glass with high light transmittance according to claim 1, characterized in that: The light-emitting surface pattern structure (12) is obtained by roll forming or chemical etching, and the light-emitting surface pattern structure (12) is configured as an irregular concave-convex structure or a regular arc-shaped structure, and the roughness Ra of the light-emitting surface pattern structure (12) is 0.1 to 0.3 μm.

4. The conductive patterned glass with high light transmittance according to claim 1, characterized in that: The anti-reflection layer (2) is configured as a single-layer structure, with a thickness of 80 to 150 nm and a refractive index of 1.2 to 1.

35.

5. The conductive patterned glass with high light transmittance according to claim 1, characterized in that: The anti-reflection layer (2) is provided as a double-layer structure, comprising a first anti-reflection layer (21) and a second anti-reflection layer (22) which are stacked; The first anti-reflection layer (21) is stacked on the light incident surface pattern structure (11), the first anti-reflection layer (21) has a thickness of 50 to 90 nm and a refractive index of 1.4 to 1.46; the second anti-reflection layer (21) has a thickness of 100 to 140 nm and a refractive index of 1.22 to 1.

32.

6. The conductive patterned glass with high light transmittance according to claim 1, characterized in that: The interface layer (3) is a silicon dioxide interface layer, which is prepared by magnetron sputtering, chemical vapor deposition or electron beam evaporation deposition, and has a thickness of 15.0 to 25.0 nm.

7. The conductive patterned glass with high light transmittance according to claim 1, characterized in that: The thickness of the glass substrate (1) is set to 1.0-3.0 mm.

8. The conductive patterned glass with high light transmittance according to claim 1, characterized in that: The glass substrate (1) is made of thermally strengthened or chemically strengthened glass.

9. The conductive patterned glass with high light transmittance according to claim 1, characterized in that: The conductive functional layer (4) is configured as a single-layer structure, and adopts an ITO conductive layer with a thickness of 160 to 200 nm.

10. The conductive patterned glass with high light transmittance according to claim 1, characterized in that: The conductive functional layer (4) is configured as a three-layer structure, comprising a first conductive functional layer (41), a second conductive functional layer (42), and a third conductive functional layer (43) that are stacked. The first conductive functional layer (41) is made of ITO and is stacked on the interface layer (3) with a thickness of 110 to 130 nm; the second conductive functional layer (42) is made of Ag and has a thickness of 3.0 to 5.0 nm; and the third conductive functional layer (41) is made of ITO and has a thickness of 45 to 60 nm.

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