Protective device for mask plate

Abstract

The utility model discloses a protection device for a mask plate, relates to the technical field of mask plates, and solves the problems that the transmittance of the mask plate is reduced, patterns formed during exposure pattern transfer are inaccurate and even wrong, and the quality of the mask plate is influenced due to the fact that mildew spots are easy to grow on the surface of the mask plate or the surface of an optical film is fogged in the use process of the mask plate. And batch scrapping is caused. Comprising a mask plate and a protective film structure, the protective film structure is fixed to the side, provided with a pattern area, of the mask plate, an adsorption layer is arranged on the inner side of the protective film structure, exhaust through holes are formed in the side wall of the protective film structure, filtering structures are arranged in the exhaust through holes, and one-way exhaust valves are arranged on the outer sides of the exhaust through holes; according to the utility model, organic gas in an external environment can be effectively prevented from reacting with SO2, NH3 and other substances generated by the mask or the protective film structure to crystallize, the phenomenon that mildew spots grow on the surface of the mask or the surface of an optical film fogs is avoided, and the service life of the mask is prolonged.

Description

Technical Field

[0001] The utility model relates to the technical field of mask plates, in particular to a protective device for mask plates. Background Art

[0002] Reticles are widely used in manufacturing for a variety of industries, including semiconductors, display panels, FPC circuit boards, and equipment manufacturing. They are a crucial tool for achieving micro- and nano-scale pattern transfer in these industries. Reticles contain designed circuit patterns, which are then replicated onto the workpiece through a photolithography process. To ensure the accuracy of the etched pattern formed on the workpiece surface, it is crucial to ensure that the active pattern area on the reticle is free of contaminants.

[0003] To protect the active pattern area on the reticle, a reticle protective film structure is typically installed to cover the active pattern area. Existing reticle protective film structures typically include a support frame and a protective film positioned above the support frame. The protective film is typically an optically transparent film and is positioned over the active pattern area of ​​the reticle via the support frame to protect the active pattern area from contamination.

[0004] However, during the mask production process, the mask surface is soaked or rinsed with liquids such as sulfuric acid, sodium hydroxide, ammonia, and ammonium salts. Furthermore, the mask substrate is primarily composed of hydrophilic quartz glass, so small amounts of these chemicals can remain or penetrate the glass surface. These substances are also used during the cleaning and surface coating processes of the protective film support frame, resulting in residues. Over time, during customer use, these residual chemicals gradually decompose into substances such as SO2 and NH3, which escape into the air. Upon contact with substances such as propylene glycol monomethyl ether acetate (PGMEA) and hexamethyldisilane (HMDS) present in the customer's factory environment, they can crystallize on the mask surface or the protective film, resulting in mold growth or fogging of the optical film. These mold and fogging can reduce the mask's transmittance, leading to inaccurate or even erroneous patterns during exposure pattern transfer, resulting in batch scrapping. At the same time, since the protective film and the mask are almost a closed structure, the gas cannot diffuse into the external air, which further accelerates the occurrence of this phenomenon and seriously affects the service life of the mask. Utility Model Content

[0005] The utility model is designed to solve the problem that during the use of the mask, mildew spots are easily grown on the surface of the mask or the optical film surface is fogged, which leads to a decrease in the transmittance of the mask, resulting in inaccurate or even erroneous patterns formed when the exposure pattern is transferred, and causes batch scrapping. The utility model aims to provide a protective device for the mask, which can effectively prevent organic gases in the external environment from reacting and crystallizing with substances such as SO2 and NH3 generated by the mask or protective film structure, thereby avoiding the occurrence of mildew spots on the surface of the mask or the fogging of the optical film surface, and extending the service life of the mask.

[0006] The utility model is achieved through the following technical solutions:

[0007] A protective device for a mask plate includes a mask plate and a protective film structure. The protective film structure is fixed to a side of the mask plate having a graphic area. An adsorption layer is provided on the inner side of the protective film structure. An exhaust hole is opened on the side wall of the protective film structure. A filter structure is provided in the exhaust hole. A one-way exhaust valve is provided on the outer side of the exhaust hole.

[0008] Furthermore, the protective film structure includes a supporting frame and a protective film body, the protective film body is fixed on the top of the supporting frame, and the bottom of the supporting frame is fixed on the mask through an adhesive layer.

[0009] Furthermore, the adsorption layer is arranged on the inner wall of the support frame.

[0010] Furthermore, adsorption material is encapsulated inside the adsorption layer.

[0011] Furthermore, the adsorption material is a mixture of activated carbon, alumina and adsorption silica gel.

[0012] Furthermore, the exhaust through hole is opened on the supporting frame.

[0013] Furthermore, the inner opening of the exhaust through hole is larger and the outer opening is smaller.

[0014] Furthermore, the filter structure provided inside the exhaust through hole is filter cotton.

[0015] Furthermore, the mask plate includes a substrate and a mask pattern arranged on the substrate.

[0016] Furthermore, the substrate material is quartz, and the mask pattern is a chromium film pattern.

[0017] Compared with the prior art, the present invention has the following advantages and beneficial effects:

[0018] The utility model discloses a protection device for mask plate, including base, mask pattern, adhesive layer, protection film structure, adsorption layer and exhaust hole, its specific formation is as follows: the base is provided with the mask pattern, and the adhesive layer is provided with the protection film structure, and the protection film structure is provided with the adsorption layer, and the protection film structure is provided with the exhaust hole. BRIEF DESCRIPTION OF DRAWINGS

[0019] The accompanying drawings, which are included to provide a further understanding of the embodiments of the present application and are incorporated in and constitute a part of this application, illustrate embodiments of the present application and, together with the description, serve to explain the principles of the present application. In the drawings:

[0020] Figure 1 It is the structural schematic diagram of prior art protection device for mask plate;

[0021] Figure 2 It is the structural schematic diagram of prior art protection film structure;

[0022] Figure 3 It is the structural schematic diagram of the utility model protection device for mask plate;

[0023] Figure 4 It is the structural schematic diagram of the utility model protection film structure.

[0024] Markings in the drawings and corresponding component names:

[0025] 1-mask plate, 101-base, 102-mask pattern, 3-adhesive layer, 4-protection film structure, 401-supporting frame, 402-protection film body, 5-adsorption layer, 6-exhaust hole, 7-one-way exhaust valve. DETAILED DESCRIPTION

[0026] In order to make the purpose, technical scheme and advantage of the utility model clearer and more apparent, the utility model is further explained in detail below, the utility model's illustrative embodiment and its explanation are used to explain the utility model, and do not serve as the limitation of the utility model.

[0027] In the following description, a large number of specific details are set forth to provide a thorough understanding of the present application. However, it will be apparent to one of ordinary skill in the art that the present application can be practiced without these specific details. In other instances, well-known structures, circuits, materials or processes have not been described in detail in order to avoid obscuring the present application.

[0028] Throughout this specification, references to "one embodiment," "an embodiment," "an example," or "an example" mean that a particular feature, structure, or characteristic described in conjunction with the embodiment or example is included in at least one embodiment of the present invention. Therefore, the phrases "one embodiment," "an embodiment," "an example," or "an example" appearing in various places throughout this specification do not necessarily refer to the same embodiment or example. In addition, the particular features, structures, or characteristics may be combined in one or more embodiments or examples in any suitable combination and / or subcombination. Furthermore, it will be understood by those of ordinary skill in the art that the figures provided herein are for illustrative purposes only and are not necessarily drawn to scale. As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items.

[0029] In the description of the present invention, the indicated orientation or position relationship is based on the orientation or position relationship shown in the accompanying drawings, or is the orientation or position relationship in which the product of the application is usually placed when in use, or is the orientation or position relationship commonly understood by those skilled in the art. It is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application.

[0030] At the same time, the terms "dispose," "assemble," "connect," and "connect" should be interpreted broadly. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to direct connections, indirect connections through an intermediary, or internal connections between two components. Those skilled in the art will understand the specific meanings of these terms in this utility model based on specific circumstances.

[0031] Example

[0032] The protective structure of the mask in the prior art is as follows Figure 1-Figure 2The above-mentioned method comprises a mask 1 and a protective film structure 4, wherein the protective film structure 4 comprises a support frame 401 and a protective film body 402 located above the support frame 401. The protective film body 402 is usually made of an optically transparent film. The protective film body 402 is covered above the effective pattern area of ​​the mask through the support frame 401, thereby preventing the effective pattern area from being contaminated. Although this protective film structure 4 can prevent the mask 1 from being contaminated, during the use of the mask 1, due to the residual chemical substances in the mask 1 and the protective film structure 4 during the production process, these chemical substances will decompose and react chemically to produce crystals after long-term use, thereby causing mold spots on the surface of the mask 1 or fogging of the optical film surface. The mold spots or fogging will cause the transmittance of the mask 1 to decrease, resulting in inaccurate or even erroneous patterns formed during the exposure pattern transfer, causing batch scrapping and seriously affecting the service life of the mask 1.

[0033] Based on the defects of the protective film structure in the prior art, this embodiment provides a protective device for a mask, such as Figure 3-Figure 4 As shown, it includes a mask plate 1 and a protective film structure 4.

[0034] The mask plate 1 includes a substrate 101 and a mask pattern 102 disposed on the substrate 101 . The substrate 101 is made of quartz, and the mask pattern 102 is a chromium film pattern.

[0035] The protective film structure 4 includes a support frame 401 and a protective film body 402. The protective film body 402 is fixed on the top of the support frame 401, and the bottom of the support frame 401 is fixed on the mask 1 through the adhesive layer 3. Specifically, the protective film structure 4 is fixed on the side of the mask 1 with the graphic area.

[0036] An adsorption layer 5 is provided inside the protective film structure 4. Specifically, the adsorption layer 5 is disposed on the inner wall of the support frame 401 and contains an adsorption material, which is a mixture of activated carbon, aluminum oxide, and adsorbent silica gel. The adsorption layer 5 effectively absorbs residual volatile chemicals, such as SO2, NH3, and H2O, from the surface of the mask 1 and the support frame 401, removing harmful gases.

[0037] The protective film structure 4 has a sidewall with an exhaust hole 6. Specifically, the exhaust hole 6 is formed on the support frame 401. The inner opening of the exhaust hole 6 is larger, and the outer opening is smaller. Preferably, the exhaust hole 6 has a trapezoidal cross-section, with a wide inner portion and a narrow outer portion. The exhaust hole 6 facilitates the exhaust of gas between the protective film body 402 and the mask 1. The exhaust hole 6, with a wide inner portion and a narrow outer portion, further facilitates the exhaust of internal gas.

[0038] A one-way exhaust valve 7 is provided on the outside of the exhaust hole 6. Because the mask 1 is exposed to ultraviolet light for a long time during use, the temperature inside the mask 1 will be higher than the external ambient temperature, and the gas between the protective film body 402 and the mask 1 will expand due to the heat. The one-way exhaust valve 7 on the outside allows the internal gas to be partially discharged, and external gas is not easily able to enter the optical film and the interior of the mask 1. This can prevent contact with organic gases in the external environment, thereby preventing reaction and crystallization of substances such as SO2 and NH3 generated by the mask 1 or the protective film structure 4, thereby extending the service life of the mask 1.

[0039] The exhaust hole 6 is provided with a filter structure, specifically, the filter structure provided in the exhaust hole 6 is filter cotton. The filter cotton can further prevent dust from entering the optical film and the mask 1.

[0040] In summary, the present invention can effectively absorb residual volatile chemicals on the surface of the mask 1 and the supporting frame 401, such as SO2, NH3, H2O, etc., by arranging an adsorption layer 5 on the inner side of the protective film structure 4, and adsorb harmful gases. By arranging an exhaust hole 6 on the protective film structure 4, the gas between the protective film body 402 and the mask 1 can be discharged. At the same time, a one-way exhaust valve 7 is arranged on the outside of the exhaust hole 6 to prevent external gas from entering the optical film and the mask 1. The structural design of the present invention can effectively prevent organic gases in the external environment from reacting and crystallizing with SO2, NH3 and other substances generated by the mask 1 or the protective film structure 4, thereby avoiding the occurrence of mildew spots on the surface of the mask 1 or fogging on the surface of the optical film, and extending the service life of the mask 1.

[0041] Finally, it should be noted that the above specific embodiments are only used to explain in detail the purpose, technical solutions and beneficial effects of the present invention. It should be understood that the above is only a specific implementation method of the present invention and is not used to limit the scope of protection of the present invention. Although the present invention has been described in detail with reference to the above specific embodiments, ordinary technicians in this field should understand that it is still possible to modify the technical solutions recorded in the above embodiments, or to replace or improve some or all of the technical features therein. These modifications, equivalent replacements, and improvements do not deviate the essence of the corresponding technical solutions from the scope of the technical solutions of the embodiments of the present invention, and they should all be included in the scope of the claims and description of the present invention.

Claims

1. A protective device for a mask, characterized in that: The invention comprises a mask plate (1) and a protective film structure (4), wherein the protective film structure (4) is fixed on a side of the mask plate (1) having a pattern area, an adsorption layer (5) is provided on the inner side of the protective film structure (4), an exhaust through hole (6) is provided on the side wall of the protective film structure (4), a filter structure is provided in the exhaust through hole (6), and a one-way exhaust valve (7) is provided on the outer side of the exhaust through hole (6).

2. The mask protection device according to claim 1, wherein: The protective film structure (4) comprises a supporting frame (401) and a protective film body (402), wherein the protective film body (402) is fixed on the top of the supporting frame (401), and the bottom of the supporting frame (401) is fixed on the mask (1) via an adhesive layer (3).

3. The mask protection device according to claim 2, wherein: The adsorption layer (5) is arranged on the inner wall of the support frame (401).

4. The mask protection device according to claim 3, wherein: Adsorption material is encapsulated inside the adsorption layer (5).

5. The mask protection device according to claim 4, characterized in that: The adsorption material is a mixture of activated carbon, aluminum oxide and adsorption silica gel.

6. The mask protection device according to claim 2, characterized in that: The exhaust through hole (6) is provided on the supporting frame (401).

7. The mask protection device according to claim 6, characterized in that: The exhaust through hole (6) has a large inner opening and a small outer opening.

8. The mask protection device according to claim 6, characterized in that: The filtering structure arranged inside the exhaust through hole (6) is filter cotton.

9. A mask protection device according to any one of claims 1 to 8, characterized in that: The mask plate (1) comprises a substrate (101) and a mask pattern (102) arranged on the substrate (101).

10. The mask protection device according to claim 9, characterized in that: The substrate (101) is made of quartz, and the mask pattern (102) is a chromium film pattern.

Images