Dimming conductive film

Abstract

The utility model discloses a dimming conductive film, which comprises a base material layer, an adhesion bonding layer, a conductive layer, a high-potential protective layer and a barrier layer which are sequentially laminated, wherein the conductive layer is a silver layer; the high-potential protective layer is a metal simple substance coating layer, and the electrode potential of the metal simple substance is E degree gt; + 1.0 V; the thickness of the conductive layer is 5 nm to 15 nm, and the thickness of the high-potential protection layer is 2 nm to 8 nm. According to the dimming conductive film, silver metal with excellent conductivity is used as the conductive layer, a gold material with excellent oxidation resistance and low resistivity is used as an oxidation protection layer of the conductive layer, and meanwhile, the optical design and the thickness of each film layer are optimized, so that the purpose of improving the light transmittance of the dimming conductive film is achieved, and the transmittance reaches more than 70%.

Description

TECHNICAL FIELD

[0001] The utility model belongs to the technical field of conductive film, specifically relates to a light-adjusting conductive film. BACKGROUND

[0002] Although the traditional heat insulation window film can block infrared and ultraviolet rays, it cannot meet the dynamic change demand of light, and too strong or too weak visible light will harm the eyes. Although the electrochromic glass with adjustable light has advantages, it is limited in large-area preparation and is expensive. The light-adjusting conductive film takes a thin film as a base material, is simple to construct and low in cost, can avoid huge manpower and resource consumption in ordinary glass modification, and can better balance the heat insulation and light demand.

[0003] The development history and technical background of the light-adjusting conductive film can be traced back to the middle of the 20th century. After many breakthroughs in material science and engineering technology, a technical system mainly composed of electrochromism (EC), polymer dispersed liquid crystal (PDLC) and suspended particles (SPD) is gradually formed.

[0004] The traditional light-adjusting conductive film has a high driving voltage due to its high impedance, and the energy consumption is relatively large. Heat is easily accumulated in the film layer during use, which may damage the film and affect its service life. At the same time, heat accumulation may also affect the phase transition temperature, causing imaging blur, adversely affecting light transmittance, and the surface resistance uniformity is poor, and the stability and compatibility need to be improved.

[0005] The low-impedance light-adjusting conductive film has low resistance, fast response speed of the electrochromic light-adjusting conductive layer, and can quickly realize the change of color and light transmittance, realize high energy efficiency and millisecond-level response. In addition, due to the specific metal layer in the film layer, the average reflectivity of near-infrared rays is high, which can effectively block sunlight and other heat rays, and the heat insulation effect is excellent.

[0006] These characteristics of the low-impedance light-adjusting conductive film make its application prospect in the field of automobile windows show a high-speed growth trend. Its technology iteration, cost reduction and market demand are deeply matched, which is promoting the technology to quickly penetrate from high-end configuration to mainstream market. However, the transmittance of the existing low-impedance light-adjusting conductive film cannot meet the demand of high transmittance in the field of automobile windows, and further improvement is needed. UTILITY MODEL CONTENTS

[0007] The utility model aims at providing a light-adjusting conductive film which has low impedance and high transmittance, and the transmittance reaches more than 70%.

[0008] In order to realize the above-mentioned purpose, the technical scheme provided by a specific embodiment of the utility model is as follows:

[0009] A light-adjusting conductive film comprises a base material layer, an adhesive bonding layer, a conductive layer, a high potential protection layer and a barrier layer which are sequentially stacked.

[0010] The conductive layer is a silver layer;

[0011] The high potential protective layer is a metal element plating film layer, and the electrode potential E° of the metal element is +1.0V;

[0012] The thickness of the conductive layer is 5nm-15nm, and the thickness of the high potential protective layer is 2nm-8nm.

[0013] In one or more embodiments of the utility model, the high potential protective layer is any one of gold layer, iridium layer.

[0014] In one or more embodiments of the utility model, the adhesion bonding layer is any one of zinc aluminum oxide layer, titanium oxide layer, zinc oxide layer, gallium-doped zinc oxide layer, indium tin oxide layer and gallium-doped indium tin oxide layer.

[0015] In one or more embodiments of the utility model, the thickness of the adhesion bonding layer is 30nm-60nm.

[0016] In one or more embodiments of the utility model, the barrier layer is any one of zinc aluminum oxide layer, titanium oxide layer, zinc oxide layer, gallium-doped zinc oxide layer, indium tin oxide layer and gallium-doped indium tin oxide layer.

[0017] In one or more embodiments of the utility model, the thickness of the barrier layer is 30nm-60nm.

[0018] In one or more embodiments of the utility model, a first hard coating layer is further included, which is arranged between the substrate layer and the adhesion bonding layer, and the thickness of the first hard coating layer is 1μm-5μm.

[0019] In one or more embodiments of the utility model, a second hard coating layer is further included, which is arranged on the side of the substrate layer away from the adhesion bonding layer, and the thickness of the second hard coating layer is 1μm-5μm.

[0020] In one or more embodiments of the utility model, the substrate layer is any one of PET layer and PC layer.

[0021] In one or more embodiments of the utility model, the square resistance of the light-adjustable conductive film is 1Ω-6Ω; and / or, the transmittance of the light-adjustable conductive film is greater than or equal to 70%.

[0022] Compared with the prior art, the utility model discloses silver metal of excellent conductivity is used as the conductive layer, gold material, iridium material of excellent oxidation resistance, high potential and low resistivity are used as the oxidation protection layer of the conductive layer, and the optical design and thickness of each film layer are optimized, the purpose of improving the light transmission of the light control conductive film is achieved, and the transmittance reaches more than 70%. BRIEF DESCRIPTION OF DRAWINGS

[0023] In order to more clearly illustrate the technical scheme in the embodiments of the utility model or the prior art, the drawings needed to be used in the embodiment or the prior art description will be briefly introduced below, and obviously, the drawings in the following description are only some embodiments in the utility model, and for those skilled in the art, other drawings can also be obtained according to these drawings without creating labor.

[0024] Figure 1 It is the structure schematic diagram of the light control conductive film in an embodiment of the utility model;

[0025] Figure 2 It is the transmittance curve of the light control conductive film in embodiment 1 of the utility model;

[0026] Figure 3 It is the transmittance curve of the light control conductive film in embodiment 2 of the utility model;

[0027] Figure 4 It is the transmittance curve of the light control conductive film in embodiment 3 of the utility model;

[0028] Figure 5 It is the transmittance curve of the light control conductive film in embodiment 4 of the utility model;

[0029] Figure 6 It is the transmittance curve of the light control conductive film in embodiment 5 of the utility model;

[0030] Figure 7 It is the transmittance curve of the light control conductive film in comparative example 1 of the utility model;

[0031] Figure 8 It is the transmittance curve of the light control conductive film in comparative example 2 of the utility model;

[0032] Figure 9 It is the transmittance curve of the light control conductive film in comparative example 3 of the utility model;

[0033] Figure 10 It is the transmittance curve of the light control conductive film in comparative example 4 of the utility model.

[0034] MAIN REFERENCE NUMERALS EXPLANATION:

[0035] 1. second hard coating layer; 2. substrate layer; 3. first hard coating layer; 4. adhesive bonding layer; 5. conductive layer; 6. high potential protective layer; 7. barrier layer. DETAILED DESCRIPTION

[0036] In order to make the person skilled in the art better understand the technical solutions in the present disclosure, the technical solutions in the present disclosure will be clearly and completely described below in combination with the drawings in the present disclosure. Obviously, the described embodiments are only part of the embodiments of the present disclosure, rather than all the embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by the person skilled in the art without creative labor should belong to the protection scope of the present disclosure.

[0037] The impedance of the conventional ITO (indium tin oxide) low-impedance light-adjustable conductive film is usually 6Ω, 8Ω, 13Ω, 20Ω. Such ITO low-impedance light-adjustable conductive film needs a thicker ITO plating layer, thus easily leading to cracking of the film layer, and the overall transmittance of the thin film is low, and the film impedance cannot reach 1Ω-6Ω.

[0038] If the conductive layer ITO layer is replaced by an Ag (silver) layer with lower resistivity, the Ag layer is easy to be oxidized, thus a layer of oxidation protective layer needs to be plated on it, and NiCr (nickel-chromium) is usually used as the oxidation protective layer. However, because the resistivity of nickel-chromium is high, in order to achieve the target resistance value of 1Ω-6Ω, the thickness of the Ag layer needs to be increased to 20nm-30nm, and the increase of the thickness of the Ag layer leads to the decrease of the overall transmittance of the thin film, and the transmittance is only 30%-40%.

[0039] Moreover, because the light-adjustable conductive film needs to be in contact with the electrolyte in the structure when applied to the EC structure or the PDLC structure, the electrolyte contains lithium ions, chloride ions and fluoride ions, and the low potential of the NiCr (nickel-chromium) is easy to be oxidized and reduced by the ions in the electrolyte, forming chromium chloride, chromium fluoride or lithium-chromium alloy, thus destroying the oxidation protective layer, and finally leading to the oxidation and reduction of the Ag (silver) layer in the conductive layer.

[0040] In order to further improve the transmittance of the light-adjustable conductive film, while also ensuring that the light-adjustable conductive film has low impedance, the present utility model attempts to improve the plating material of the oxidation protective layer, using a material with excellent oxidation resistance (high potential) and low resistivity as the oxidation protective layer, and optimizing the optical design of each film layer to improve the light transmittance of the low-impedance light-adjustable conductive film. The present utility model replaces the original high-resistance NiCr (nickel-chromium) material with a material with excellent oxidation resistance and low resistivity, thereby reducing the required thickness of the Ag layer, reducing the thickness of the conductive layer Ag silver layer from 20nm-30nm to 5nm-15nm, thus improving the transmittance from 30%-40% to more than 70%, and the impedance of the light-adjustable conductive film can be 1Ω-6Ω.

[0041] The uniform conductor DC resistance formula is: where R is the resistance (Ω), p is the material resistivity (Ω·m), L is the conductor length (m), and S is the cross-sectional area (m 2 ). In a thin film, the thin film resistance formula can be simplified to: where R is the resistance (Ω), p is the material resistivity (Ω·m), and d is the film thickness (m).

[0042] The resistivity of Ag (silver) is typically 1.65×10 -8 Ω·m, and the resistivity of NiCr (nickel-chromium) is typically 1.0×10 -7 Ω·m, so if a low-resistivity NiCr layer is required to have a resistance on the order of a single digit, the required thickness is 10 nm or more, and at this thickness, the transmittance of the finished low-impedance dimmable conductive film can only be 40%-60%, which cannot achieve the required transmittance of 70% or more.

[0043] Typically, the electrolyte in a dimmable conductive film contains lithium ions, chloride ions, and fluoride ions, and the half-reactions and standard electrode potentials of nickel, chromium, silver, gold, and iridium are as follows:

[0044] 1. Half-reaction: , electrode potential E° = -0.25 V;

[0045] 2. Half-reaction: , electrode potential E° = -0.74 V;

[0046] 3. Half-reaction: Ag + + e - = Ag, electrode potential E° = +0.799 V;

[0047] 4. Half-reaction: , electrode potential E° = +1.52 V;

[0048] 5. Half-reaction: , electrode potential E° = +1.16 V.

[0049] Since a dimmable conductive film needs to be powered during application, the electrode potential applied to the conductive film by the electrode is typically +1.0 V or so, and the electrode potential of silver is +0.799 V, which is easily corroded and oxidized by the electrolyte, but due to the high potential characteristics of gold and iridium, they are more difficult to be oxidized and reduced, and due to the negative potential characteristics of nickel and chromium, they are easily oxidized and reduced by various ions in the electrolyte, so the Ag layer of the conductive layer cannot be protected from oxidation.

[0050] Therefore, Au (gold), Ir (iridium), and Ru (ruthenium) with high potential and low resistivity are selected, in which the resistivity of Au is 2.44*10 -8 Ω·m, the resistivity of Ir is 4.71*10 -8 Ω·m, if the resistance of the Au layer and the Ir layer needs to reach the order of magnitude of a single digit, the required thickness is 2nm-8nm, and the refractive index N Au of Au in the visible light band (380-780nm) is 0.42, the refractive index N Ir of Ir in the visible light band (380-780nm) is 0.82, both of which are significantly smaller than the refractive index (N NiCr =2.58) of NiCr (nickel-chromium), NiCr (nickel-chromium) has high light reflection, resulting in low transmittance of the film, Au (gold) has low light reflection, which can improve the transmittance of the film. In addition, NiCr has high light absorption, which can easily reduce the light transmittance of the film. Therefore, the selection of Au (gold) and Ir (iridium) can optimize the optical design of the film, thereby improving the transmittance of the film, and the use of Au (gold) and Ir (iridium) can improve the reflection of the film in the infrared band, reduce the transmittance in the near-infrared band (780-2500nm), and reduce the temperature in the car in summer.

[0051] The utility model discloses a kind of light-adjusting conductive films, as shown in figure Figure 1 , light-adjusting conductive film includes substrate layer 2, attached adhesive layer 4, conductive layer 5, high potential protective layer 6 and barrier layer 7 which are sequentially stacked;Wherein, conductive layer 5 is silver layer, high potential protective layer 6 is metal single element plating film layer, the electrode potential E of metal single element °>+1.0V;The thickness of conductive layer 5 is 5nm-15nm, the thickness of high potential protective layer 6 is 2nm-8nm.

[0052] Specifically, the thickness of the conductive layer can be selected to be 5nm-10nm, 9nm-12nm, and specifically can be selected to be 5nm, 8nm, 9nm, 10nm, 11nm, 12nm or 15nm, and the thickness of the high potential protective layer can be selected to be 2nm, 4nm, 5nm, 6nm or 8nm. The high potential protective layer is any one of gold layer and iridium layer.

[0053] Silver metal has excellent electrical conductivity, which can give the light-adjustable conductive film a lower impedance. Silver is easy to be oxidized, and the resistance will increase significantly after oxidation, which seriously affects the performance of the light-adjustable conductive film. Au (gold) has strong oxidation resistance and high potential characteristics, and can be used as a protective layer for the silver layer to prevent oxidation of the silver layer. At the same time, the high-potential protective layer is formed by magnetron sputtering process. In the sputtering process, the sputtering gas does not contain oxygen, so it can also ensure that the silver layer is not oxidized during preparation. In addition, Au has a lower resistivity, a low refractive index in the visible light band, and a low absorption of light, which can improve the transmittance of the overall film to a certain extent while meeting the optical matching of the film layer.

[0054] In addition to selecting Au (gold) as the high-potential protective layer, Ir (iridium) can also be selected. The resistivity of Ir is 4.71*10 -8 Ω·m, and the resistivity is less than that of nickel-chromium (1.0*10 -7 Ω·m), which can reduce the sheet resistance of the film. At the same time, within the thickness range of 2nm-8nm, the high-potential protective layer can also ensure that the film material has a high transmittance.

[0055] In addition, the density of Au (gold) is about 19.32g / cm 3 , and the density of Ir (iridium) is about 22.56g / cm 3 . The higher density makes the formed high-potential protective layer have a higher density, which can block water vapor and oxygen and reduce the influence of water vapor and oxygen on the conductive layer.

[0056] Further, the substrate layer is any one of a PET (polyethylene terephthalate) layer and a PC (polycarbonate) layer, and the specific thickness can be selected from 50μm, 100μm, 125μm, 188μm, and 250μm.

[0057] Further, the adhesion layer is any one of a zinc aluminum oxide layer, a titanium oxide layer, a zinc oxide layer, a gallium-doped zinc oxide layer, an indium tin oxide layer, and a gallium-doped indium tin oxide layer, and the thickness is 30nm-60nm. The thickness range can be 30nm-40nm or 40nm-60nm, and the thickness can be selected from 30nm, 35nm, 40nm, 45nm, 50nm, and 60nm.

[0058] Specifically, selecting the adhesion layer of the above specific material helps to improve the adhesion of the conductive layer. At the same time, the conductive layer is prepared by a magnetron sputtering process during preparation. In the sputtering process, the adhesion layer of the above specific material can also promote the uniform spreading of silver on the adhesion layer, obtain a uniform and continuous conductive layer, and ensure that the conductive layer has excellent electrical conductivity. In addition, the adhesion layer can also provide optical antireflection effect.

[0059] Further, the barrier layer is any one of an aluminum zinc oxide layer, a titanium oxide layer, a zinc oxide layer, a gallium-doped zinc oxide layer, an indium tin oxide layer, and a gallium-doped indium tin oxide layer, and has a thickness of 30-60 nm, and the thickness range can be 30-40 nm or 40-60 nm, and the thickness can be 30 nm, 35 nm, 40 nm, 45 nm, 50 nm, or 60 nm.

[0060] Specifically, the barrier layer made of the above material can be used as a protective layer of the film material, and can prevent water vapor from penetrating into the conductive layer and affecting the conductivity of the conductive layer.

[0061] Further, the substrate layer and the adhesive bonding layer are further provided with a first hard coating layer 3, the thickness of the first hard coating layer 3 is 1-5 μm, and the thickness can be 1 μm, 3 μm, 4 μm, or 5 μm; and the side of the substrate layer away from the adhesive bonding layer is provided with a second hard coating layer 1, the thickness of the second hard coating layer 1 is 3-5 μm, and the thickness can be 3 μm, 4 μm, or 5 μm.

[0062] Specifically, the first hard coating layer and the second hard coating layer can help reduce the haze of the film material, and can improve the hardness and wear resistance of the film material, and improve the use performance of the film material. The materials of the first hard coating layer and the second hard coating layer can be CHT-X1-NS of Gohsui Chemical and GRANDIC PC15-5311 of DIC, and the precise wet coating process is used for coating.

[0063] The utility model will be further described in detail in combination with specific embodiments.

[0064] Embodiment 1

[0065] The light-adjustable conductive film in the embodiment is prepared as follows:

[0066] The substrate is PET (polyethylene terephthalate), and the thickness is 125 μm. First, the precise wet coating process is used to coat a first hard coating layer and a second hard coating layer with a thickness of 2 μm on both sides of the PET substrate layer. Then, the adhesive bonding layer, the conductive layer, the high-potential protective layer, and the barrier layer are sequentially plated on the first hard coating layer by using the magnetron sputtering process. The material of the adhesive bonding layer is aluminum zinc oxide (AZO), and the thickness is 40 nm; the material of the conductive layer is silver (Ag), and the thickness is 10 nm; the material of the high-potential protective layer is gold (Au), and the thickness is 5 nm; and the material of the barrier layer is aluminum zinc oxide (AZO), and the thickness is 30 nm.

[0067] In the embodiment, the sheet resistance of the sample is about 3.25 Ω, the average transmittance in the visible light range of 380-780 nm can reach 81.4%, and the transmittance in the near-infrared wave band (780-2500 nm) is 22.02%.

[0068] Example 2

[0069] The light-adjustable conductive film in this example was prepared as follows:

[0070] The substrate was PC (polycarbonate) with a thickness of 188 μm. First, a precision wet coating process was used to coat a first hard coating layer and a second hard coating layer on both sides of the PC substrate layer, each with a thickness of 3 μm. Then, a magnetron sputtering process was used to successively deposit an adhesion layer, a conductive layer, a high-potential protective layer, and a barrier layer on the first hard coating layer. The adhesion layer was made of zinc aluminum oxide (AZO) with a thickness of 50 nm; the conductive layer was made of silver (Ag) with a thickness of 9 nm; the high-potential protective layer was made of gold (Au) with a thickness of 6 nm; and the barrier layer was made of zinc aluminum oxide (AZO) with a thickness of 50 nm.

[0071] The sheet resistance of the sample in this example was about 2.5 Ω, and the average transmittance in the visible light range of 380-780 nm could reach 80.6%. The transmittance in the near-infrared waveband (780-2500 nm) was 24.07%.

[0072] Example 3

[0073] The light-adjustable conductive film in this example was prepared as follows:

[0074] The substrate was PC (polycarbonate) with a thickness of 100 μm. First, a precision wet coating process was used to coat a first hard coating layer and a second hard coating layer on both sides of the PET substrate layer, each with a thickness of 3 μm. Then, a magnetron sputtering process was used to successively deposit an adhesion layer, a conductive layer, a high-potential protective layer, and a barrier layer on the first hard coating layer. The adhesion layer was made of titanium oxide (TiO2) with a thickness of 30 nm; the conductive layer was made of silver (Ag) with a thickness of 5 nm; the high-potential protective layer was made of gold (Au) with a thickness of 8 nm; and the barrier layer was made of titanium oxide (TiO2) with a thickness of 40 nm.

[0075] The sheet resistance of the sample in this example was about 4.3 Ω, and the average transmittance in the visible light range of 380-780 nm could reach 82.65%. The transmittance in the near-infrared waveband (780-2500 nm) was 26.46%.

[0076] Example 4

[0077] The light-adjustable conductive film in this example was prepared as follows:

[0078] The substrate is selected as PC (polycarbonate) with a thickness of 250 μm. First, a precision wet coating process is used to coat a first hard coating layer and a second hard coating layer on both sides of the PET substrate layer, each with a thickness of 4 μm. Then, a magnetron sputtering process is used to successively deposit an adhesion layer, a conductive layer, a high-potential protective layer, and a barrier layer on the first hard coating layer. The adhesion layer is made of indium tin oxide (ITO) with a thickness of 45 nm. The conductive layer is made of silver (Ag) with a thickness of 15 nm. The high-potential protective layer is made of gold (Au) with a thickness of 2 nm. The barrier layer is made of indium tin oxide (ITO) with a thickness of 35 nm.

[0079] In this embodiment, the sheet resistance of the sample is about 2.85 Ω, the average transmittance in the visible light range of 380-780 nm can reach 75.87%, and the transmittance in the near-infrared waveband (780-2500 nm) is 21.35%.

[0080] Example 5

[0081] The dimming conductive film in this embodiment is prepared as follows:

[0082] The substrate is selected as PET (polyethylene terephthalate) with a thickness of 188 μm. First, a precision wet coating process is used to coat a first hard coating layer and a second hard coating layer on both sides of the PET substrate layer, each with a thickness of 4 μm. Then, a magnetron sputtering process is used to successively deposit an adhesion layer, a conductive layer, a high-potential protective layer, and a barrier layer on the first hard coating layer. The adhesion layer is made of zinc aluminum oxide (AZO) with a thickness of 30 nm. The conductive layer is made of silver (Ag) with a thickness of 11 nm. The high-potential protective layer is made of iridium (Ir) with a thickness of 3 nm. The barrier layer is made of zinc aluminum oxide (AZO) with a thickness of 30 nm.

[0083] In this embodiment, the sheet resistance of the sample is about 3.1 Ω, the average transmittance in the visible light range of 380-780 nm can reach 80.3%, and the transmittance in the near-infrared waveband (780-2500 nm) is 25.6%.

[0084] Comparative Example 1

[0085] The dimming conductive film in this embodiment is prepared as follows:

[0086] The substrate is PET (polyethylene terephthalate) with a thickness of 188 μm. First, a precision wet coating process is used to coat the PC substrate layer on both sides with a first hard coating layer and a second hard coating layer, each with a thickness of 4 μm. Then, a magnetron sputtering process is used to successively deposit an adhesion layer, a conductive layer, and a barrier layer on the first hard coating layer. The adhesion layer is made of zinc aluminum oxide (AZO) with a thickness of 30 nm. The conductive layer is made of silver (Ag) with a thickness of 11 nm. The barrier layer is made of zinc aluminum oxide (AZO) with a thickness of 30 nm.

[0087] The sample in this comparative example has a sheet resistance of about 3.0 Ω, an average transmittance in the visible light range of 380-780 nm of 86.5%, and a transmittance in the near-infrared waveband (780-2500 nm) of 40.59%.

[0088] Compared to Example 5, the main difference in this comparative example is the deletion of the high-potential protective layer. Although the resulting light-adjustable conductive film has a relatively high average transmittance in the visible light range of 380-780 nm, the transmittance in the near-infrared waveband (780-2500 nm) is significantly higher than that of Example 5, resulting in a decrease in heat insulation effect.

[0089] Comparative Example 2

[0090] The light-adjustable conductive film in this comparative example is prepared as follows:

[0091] The substrate is PET (polyethylene terephthalate) with a thickness of 125 μm. First, a precision wet coating process is used to coat the PET substrate layer on both sides with a first hard coating layer and a second hard coating layer, each with a thickness of 3 μm. Then, a magnetron sputtering process is used to successively deposit an adhesion layer, a conductive layer, a high-potential protective layer, and a barrier layer on the first hard coating layer. The adhesion layer is made of zinc aluminum oxide (AZO) with a thickness of 20 nm. The conductive layer is made of silver (Ag) with a thickness of 20 nm. The high-potential protective layer is made of nickel-chromium (NiCr) with a thickness of 5 nm. The barrier layer is made of zinc aluminum oxide (AZO) with a thickness of 20 nm.

[0092] The sample in this comparative example has a sheet resistance of about 3.3 Ω, an average transmittance in the visible light range of 380-780 nm of 45.99%, and a transmittance in the near-infrared waveband (780-2500 nm) of 13.62%.

[0093] Compared to the example, the main difference in this comparative example is the replacement of the high-potential protective layer material with nickel-chromium and the appropriate increase in the thickness of the conductive layer to reduce the impedance of the light-adjustable conductive film. Although the impedance of the light-adjustable conductive film is lower, the average transmittance in the visible light range of 380-780 nm is significantly decreased.

[0094] Comparative Example 3

[0095] The light-adjustable conductive film in the present comparative example was prepared as follows:

[0096] The substrate was PET (polyethylene terephthalate) with a thickness of 125 μm. First, a precision wet coating process was used to coat a first hard coating layer and a second hard coating layer with a thickness of 2 μm on both sides of the PET substrate layer. Then, a magnetron sputtering process was used to successively plate an adhesion layer, a conductive layer, a high-potential protection layer, and a barrier layer on the first hard coating layer. The adhesion layer was made of aluminum zinc oxide (AZO) with a thickness of 40 nm; the conductive layer was made of silver (Ag) with a thickness of 10 nm; the high-potential protection layer was made of gold (Au) with a thickness of 20 nm; and the barrier layer was made of aluminum zinc oxide (AZO) with a thickness of 30 nm.

[0097] The sheet resistance of the sample in the present comparative example was about 2.1 Ω, and the average transmittance in the visible light range of 380-780 nm could reach 44.64%, and the transmittance in the near-infrared waveband (780-2500 nm) was 14.28%.

[0098] Compared with Example 1, the thickness of the high-potential protection layer in the present comparative example exceeded the range defined in the present application, and the increase in thickness caused a significant decrease in the average transmittance of the light-adjustable conductive film in the visible light range of 380-780 nm.

[0099] Comparative Example 4

[0100] The light-adjustable conductive film in the present comparative example was prepared as follows:

[0101] The substrate was PET (polyethylene terephthalate) with a thickness of 188 μm. First, a precision wet coating process was used to coat a first hard coating layer and a second hard coating layer with a thickness of 4 μm on both sides of the PET substrate layer. Then, a magnetron sputtering process was used to successively plate an adhesion layer, a conductive layer, a high-potential protection layer, and a barrier layer on the first hard coating layer. The adhesion layer was made of aluminum zinc oxide (AZO) with a thickness of 30 nm; the conductive layer was made of silver (Ag) with a thickness of 11 nm; the high-potential protection layer was made of iridium (Ir) with a thickness of 15 nm; and the barrier layer was made of aluminum zinc oxide (AZO) with a thickness of 30 nm.

[0102] The sheet resistance of the sample in the present comparative example was about 3.15 Ω, and the average transmittance in the visible light range of 380-780 nm could reach 33.40%, and the transmittance in the near-infrared waveband (780-2500 nm) was 18.67%.

[0103] Compared with Example 5, the thickness of the high-potential protection layer in the present comparative example exceeded the range defined in the present application, and the increase in thickness caused a significant decrease in the average transmittance of the light-adjustable conductive film in the visible light range of 380-780 nm.

[0104] In combination Figures 2-10 It can be known that the utility model discloses silver layer as conductive layer, set up high potential protective layer on silver layer, cooperate conductive layer, high potential protective layer and the thickness of each layer simultaneously, guarantee the low impedance of film material, make the transmittance of film material reach above 80% simultaneously, also have the heat insulation effect of relatively superior.

[0105] It will be apparent to those skilled in the art that the present disclosure is not limited to the details of the above-exemplified embodiments as such, but that it can be implemented in other particular forms without departing from the spirit or essential characteristics of the present disclosure. The presently disclosed embodiments are, therefore, to be considered in all respects as illustrative and not restrictive, the scope of the disclosure being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. No reference signs in the claims shall be construed as limiting the claim being referenced.

[0106] In addition, it should be understood that, although the present specification is described in terms of embodiments, not every embodiment contains only one independent technical solution, and the description of the specification is only for the sake of clarity, and those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can be combined appropriately to form other embodiments that those skilled in the art can understand.

Claims

1. A light-adjustable conductive film, characterized in that: It includes a base material layer, an adhesive layer, a conductive layer, a high potential protection layer and a barrier layer stacked in sequence; Wherein, the conductive layer is a silver layer; The high potential protection layer is a metal element coating layer, and the electrode potential E° of the metal element is greater than +1.0V; The thickness of the conductive layer is 5nm-15nm, and the thickness of the high-potential protection layer is 2nm-8nm.

2. The light-adjustable conductive film according to claim 1, wherein: The high potential protection layer is any one of a gold layer and an iridium layer.

3. The light-adjustable conductive film according to claim 1, wherein: The adhesive bonding layer is any one of a zinc oxide aluminum layer, a titanium oxide layer, a zinc oxide layer, a gallium-doped zinc oxide layer, an indium tin oxide layer, and a gallium-doped indium tin oxide layer.

4. The light-adjustable conductive film according to claim 1, wherein: The thickness of the adhesive layer is 30 nm to 60 nm.

5. The light-adjustable conductive film according to claim 1, wherein: The barrier layer is any one of a zinc oxide aluminum layer, a titanium oxide layer, a zinc oxide layer, a gallium-doped zinc oxide layer, an indium tin oxide layer, and a gallium-doped indium tin oxide layer.

6. The light-adjustable conductive film according to claim 1, wherein: The thickness of the barrier layer is 30nm-60nm.

7. The light-adjustable conductive film according to claim 1, wherein: The invention further comprises a first hard coating layer, wherein the first hard coating layer is provided between the substrate layer and the adhesive layer, and the thickness of the first hard coating layer is 1 μm-5 μm.

8. The light-adjustable conductive film according to claim 1, wherein: The invention also includes a second hard coating layer, which is arranged on a side of the substrate layer away from the adhesive layer, and has a thickness of 1 μm to 5 μm.

9. The light-adjustable conductive film according to claim 1, wherein: The substrate layer is any one of a PET layer and a PC layer.

10. The light-adjustable conductive film according to any one of claims 1 to 9, characterized in that: The sheet resistance of the light-adjusting conductive film is 1Ω-6Ω; and / or the transmittance of the light-adjusting conductive film is greater than or equal to 70%.

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