Scratch-resistant electrochromic device

Abstract

The utility model discloses a scratch-resistant electrochromic device which comprises electrochromic glass, a first electrode and a second electrode, the at least one scratch-resistant layer is respectively arranged on at least one side surface of the electrochromic glass; wherein the scratch-resistant layer comprises a silicon oxynitride film layer and a silicon nitride film layer, the silicon oxynitride film layer serves as the surface of the side, facing the electrochromic glass, of the scratch-resistant layer, and the silicon nitride film layer serves as the surface of the side, back to the electrochromic glass, of the scratch-resistant layer. The electrochromic device has high scratch resistance, and the scratch-resistant layer is large in binding force and is not prone to falling off after being used for a long time.

Description

TECHNICAL FIELD

[0001] The utility model relates to electrochromic technology especially relates to an anti -scratch electrochromic device. BACKGROUND

[0002] Electrochromic glass is a new type of glass, it combines electrochromic technology and the characteristics of glass, can realize the active regulation to light transmission or absorption under the action of external electric field, thereby the reversible color change occurs, thereby the valence state and component of material also occur reversible change, and then change the optical performance (such as reflectivity, transmittance, absorptivity etc.) of material, be widely used in car window glass, rearview mirror, display, curtain wall glass etc.

[0003] The surface hardness of the electrochromic glass is low, when contacting with hard material, the surface is easy to leave scratch, thereby affecting the visual effect.In order to improve the scratch resistance of the electrochromic glass, the prior art generally deposits a layer of high hardness material on the surface of the electrochromic glass, such as the Chinese patent with application number CN201720790838.4 discloses an electrochromic rearview mirror for automobile, which sets an anti -scratch layer on the surface of the cover plate to avoid the electrochromic rearview mirror for automobile being scratched by external force, the anti -scratch layer is diamond film layer.

[0004] However, in some extreme application environment, the single anti -scratch layer still cannot meet the scratch resistance requirement of the electrochromic glass, and the combination force between the material used in the anti -scratch layer and the electrochromic glass with glass material is poor, there is the risk of falling off from the electrochromic glass under long -term use. UTILITY MODEL CONTENT

[0005] In order to solve the above technical problems of the prior art, the utility model provides an electrochromic device with high scratch resistance and large combination force of the anti -scratch layer, which is not easy to fall off under long -term use.

[0006] The technical problem solved by the utility model is solved by the following technical scheme:

[0007] An anti -scratch electrochromic device, comprising:

[0008] Electrochromic glass;

[0009] At least one anti -scratch layer is arranged on at least one side surface of the electrochromic glass;

[0010] Wherein, the anti -scratch layer includes silicon oxynitride film layer and silicon nitride film layer, the silicon oxynitride film layer as the side surface of the anti -scratch layer towards the electrochromic glass, the silicon nitride film layer as the side surface of the anti -scratch layer away from the electrochromic glass.

[0011] Further, the thickness of the silicon oxynitride film layer is greater than the thickness of the silicon nitride film layer.

[0012] Further, the thickness of the silicon oxynitride film layer is 150-190nm.

[0013] Further, the thickness of the silicon nitride film layer is 80-120nm.

[0014] Further, the electrochromic glass comprises a first glass substrate, a first electrode film layer, an electrochromic film layer, a second electrode film layer and a second glass substrate, the electrochromic film layer is arranged between the first glass substrate and the second glass substrate; the first electrode film layer is arranged on the side surface of the first glass substrate facing the electrochromic film layer, and the second electrode film layer is arranged on the side surface of the second glass substrate facing the electrochromic film layer.

[0015] Further, the electrochromic film layer is a tungsten oxide film layer.

[0016] Further, the thickness of the electrochromic film layer is 50-90nm.

[0017] Further, the first electrode film layer and the second electrode film layer are indium tin oxide film layers, aluminum-doped zinc oxide film layers, fluorine-doped tin oxide film layers or antimony-doped tin oxide film layers.

[0018] Further, the thickness of the first electrode film layer and the second electrode film layer is 50-500nm.

[0019] Further, the first electrode film layer comprises a plurality of first electrode strips, each first electrode strip is parallel to the first direction and is sequentially distributed along the second direction; the second electrode film layer comprises a plurality of second electrode strips, each second electrode strip is parallel to the second direction and is sequentially distributed along the first direction.

[0020] The electrochromic device has at least one scratch-resistant layer, which protects at least one side surface of the electrochromic glass, the scratch-resistant layer is composed of the silicon oxynitride film layer and the silicon nitride film layer, both have crystal structure and high hardness, and the hardness of the two is close, which can improve the surface scratch resistance of the electrochromic glass; and the silicon oxynitride film layer has the characteristics of silicon oxide and silicon nitride, the silicon oxide property can ensure the bonding strength between the electrochromic glass, and the silicon nitride property can ensure the bonding strength between the electrochromic glass, so the silicon oxynitride film layer as the intermediate layer of the electrochromic glass and the silicon nitride film layer can improve the bonding force of the scratch-resistant layer on the electrochromic glass, and it is not easy to fall off for long-term use. BRIEF DESCRIPTION OF DRAWINGS

[0021] Figure 1 A schematic diagram of a layer structure of an electrochromic device provided by the present application.

[0022] Figure 2 A schematic diagram of a layer structure of another electrochromic device provided by the present application.

[0023] Figure 3 A schematic diagram of a layer structure of another electrochromic device provided by the present application.

[0024] Figure 4 A schematic diagram of a layer structure of an electrochromic glass in an electrochromic device provided by the present application.

[0025] Figure 5 A schematic diagram of a planar structure of a first electrode film layer and a second electrode film layer in an electrochromic device provided by the present application. DETAILED DESCRIPTION

[0026] The present application will be described in detail below with reference to the drawings and embodiments, examples of which are shown in the drawings, wherein the same or similar notations represent the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by reference to the drawings are exemplary and are intended to explain the present application, and cannot be understood as limiting the present application.

[0027] In the description of the present application, it should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application.

[0028] In addition, the terms "first", "second", "third" are only for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined with "first", "second", "third" can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "multiple" is two or more, unless otherwise specifically limited.

[0029] In the utility model, unless another definite provision and limitation, the terms "mount", "link", "connect", "fix", "arrange" and so on terms should do broad sense understanding, for example, can be fixed connection, also can be detachable connection, or be integrated;Can be mechanical connection, also can be electrical connection;Can be direct connection, also can indirectly connect through intermediate medium, also can be two element internal communication or two element mutual action relationship.For ordinary skilled person in the art, can understand the concrete meaning of above-mentioned term in the utility model according to specific circumstances.

[0030] Example one

[0031] As Figures 1-3 Indicated, an anti-scratch electrochromic device includes:

[0032] Electrochromic glass 1;

[0033] At least one anti-scratch layer 2 is arranged on at least one side surface of the electrochromic glass 1 respectively;

[0034] Wherein, the anti-scratch layer 2 includes silicon oxynitride film layer 21 and silicon nitride film layer 22, the silicon oxynitride film layer 21 as the side surface of the anti-scratch layer 2 towards the electrochromic glass 1, the silicon nitride film layer 22 as the side surface of the anti-scratch layer 2 away from the electrochromic glass 1.

[0035] The electrochromic device of the utility model is provided with at least one anti-scratch layer 2 to protect at least one side surface of the electrochromic glass 1, the anti-scratch layer 2 is composed of the silicon oxynitride film layer 21 and silicon nitride film layer 22, the silicon oxynitride film layer 21 and silicon nitride film layer 22 all have crystal structure, can show high hardness, and the hardness of both is close, can improve the surface scratch resistance of the electrochromic glass 1;And, the silicon oxynitride film layer 21 has the characteristics of silicon oxide and silicon nitride simultaneously, the silicon oxide property of it can guarantee the bonding strength between the electrochromic glass 1, the silicon nitride property of it can guarantee the bonding strength between the electrochromic glass 1, therefore the silicon oxynitride film layer 21 as the intermediate layer of the electrochromic glass 1 and silicon nitride film layer 22, can improve the bonding force of the anti-scratch layer 2 on the electrochromic glass 1, so that it is not easy to fall off under long-term use.

[0036] The oxygen-nitride silicon film layer 21 is not the same substance as the traditional silicon nitride film layer, although both are composed of oxygen, silicon and nitrogen, and the chemical formula can be expressed as SiOxNy, but the component ratio and preparation process are not the same. The traditional silicon nitride film layer is a compound film layer composed of nitrogen, oxygen and silicon, and the oxygen-nitride silicon film layer 21 of the utility model belongs to the intermediate phase of silicon nitride and silicon oxide. Researches on electronic structure and bonding show that the oxygen and nitrogen of the oxygen-nitride silicon film layer 21 are locally mixed at the atomic scale, and do not contain a single silicon oxide region and a single silicon nitride region, that is, the oxygen-nitride silicon film layer 21 can be regarded as a critical state between the silicon nitride film layer and the silicon oxide-silicon nitride mixture film layer, and thus can have the characteristics of silicon oxide and silicon nitride at the same time.

[0037] The oxygen-nitride silicon film layer 21 is formed by nitriding treatment of silicon dioxide, that is, ion beam is used to bombard a silicon dioxide target, so that the silicon dioxide molecules are gasified and overflow into a high-temperature plating chamber, then a certain concentration of nitrogen gas is introduced into the plating chamber to replace the oxygen atoms in the silicon dioxide, and finally the oxygen-nitride silicon is formed and deposited on the surface of the electrochromic glass 1 to form a film.

[0038] Specifically, the electrochromic glass 1 has a first side surface and a second side surface arranged oppositely along the thickness direction of the electrochromic glass 1, and in some examples, as shown in Figure 1 , the electrochromic glass 1 is provided with the anti-scratch layer 2 only on the first side surface thereof, and in some examples, as shown in Figure 2 , the electrochromic glass 1 is provided with the anti-scratch layer 2 only on the second side surface thereof, and in some examples, as shown in Figure 3 , the electrochromic glass 1 is provided with the anti-scratch layer 2 on both the first side surface and the second side surface thereof.

[0039] Preferably, the thickness of the oxygen-nitride silicon film layer 21 is greater than the thickness of the silicon nitride film layer 22, so that the oxygen-nitride silicon film layer 21 has sufficient thickness to combine with the electrochromic glass 1 and the silicon nitride film layer 22 respectively. Since the oxygen-nitride silicon film layer 21 belongs to the intermediate phase of silicon nitride and silicon oxide, the silicon oxide atoms can penetrate into the electrochromic glass 1 to increase the bonding area with the electrochromic glass 1, and the silicon nitride atoms can penetrate into the silicon nitride film layer 22 to increase the bonding area with the silicon nitride film layer 22.

[0040] In this embodiment, the thickness of the oxygen-nitride silicon film layer 21 is 150-190 nm, and the thickness of the silicon nitride film layer 22 is 80-120 nm.

[0041] As shown in Figure 4As shown, the electrochromic glass 1 comprises a first glass substrate 11, a first electrode film layer 12, an electrochromic film layer 13, a second electrode film layer 14 and a second glass substrate 15, the electrochromic film layer 13 is disposed between the first glass substrate 11 and the second glass substrate 15; the first electrode film layer 12 is disposed on the side surface of the first glass substrate 11 facing the electrochromic film layer 13, and the second electrode film layer 14 is disposed on the side surface of the second glass substrate 15 facing the electrochromic film layer 13.

[0042] The first glass substrate 11 and the second glass substrate 15 are used to provide rigid support for the electrochromic glass 1 and encapsulate the electrochromic film layer 13; the first electrode film layer 12 and the second electrode film layer 14 respectively serve as the positive and negative electrodes of the electrochromic glass 1, and cooperate with each other to generate an electric field when energized, so that the electrochromic film layer 13 undergoes reversible color change under the action of the electric field.

[0043] The electrochromic film layer 13 can be, but is not limited to, a tungsten oxide film layer, and the thickness of the electrochromic film layer 13 is 50-90 nm; the first electrode film layer 12 and the second electrode film layer 14 can be, but are not limited to, indium tin oxide film layers, aluminum-doped zinc oxide film layers, fluorine-doped tin oxide film layers or antimony-doped tin oxide film layers, and the thickness of the first electrode film layer 12 and the second electrode film layer 14 is 50-500 nm.

[0044] In some examples, as shown in FIG. 2, the first electrode film layer 12 comprises a plurality of first electrode strips 121, each first electrode strip 121 is parallel to the first direction x and is sequentially distributed along the second direction y; the second electrode film layer 14 comprises a plurality of second electrode strips 141, each second electrode strip 141 is parallel to the second direction y and is sequentially distributed along the first direction x. Figure 5

[0045] The first electrode strips 121 and the second electrode strips 141 respectively serve as positive electrodes and negative electrodes, and in the energized state, the first electrode strips 121 and the second electrode strips 141 generate an electric field at the overlapping area to control the electrochromic film layer 13 located at the overlapping area to change color; and when adjusting the color of the electrochromic glass 1, each overlapping area between each first electrode strip 121 and each second electrode strip 141 can serve as a separate color adjusting area to achieve individual color adjustment.

[0046] Preferably, the first direction x is perpendicular to the second direction y.

[0047] ​Finally, it needs to be explained that the above examples are only used to illustrate the technical solutions of the embodiments of the present application, but not to limit them. Although the embodiments of the present application have been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that the technical solutions of the embodiments of the present application can still be modified or replaced equivalently, and these modifications or equivalent replacements cannot make the modified technical solutions deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. An anti-scratch electrochromic device, characterized in that, The application relates to an electrochromic glass, which comprises: an electrochromic glass; at least one scratch-resistant layer arranged on at least one side surface of the electrochromic glass respectively; wherein the scratch-resistant layer comprises a silicon oxynitride film layer and a silicon nitride film layer, the silicon oxynitride film layer is arranged on the side surface of the electrochromic glass as the scratch-resistant layer, and the silicon nitride film layer is arranged on the side surface of the electrochromic glass away from the scratch-resistant layer.

2. The electrochromic device of claim 1, wherein, The thickness of the silicon oxynitride film layer is greater than that of the silicon nitride film layer.

3. Electrochromic device according to claim 1 or 2, characterized in that The thickness of the silicon oxynitride film layer is 150-190 nm.

4. The electrochromic device according to claim 1 or 2, characterized in that, The thickness of the silicon nitride film layer is 80-120 nm.

5. The electrochromic device of claim 1, wherein, The electrochromic glass comprises a first glass substrate, a first electrode film layer, an electrochromic film layer, a second electrode film layer and a second glass substrate, the electrochromic film layer is arranged between the first glass substrate and the second glass substrate, the first electrode film layer is arranged on the side surface of the first glass substrate towards the electrochromic film layer, and the second electrode film layer is arranged on the side surface of the second glass substrate towards the electrochromic film layer.

6. The electrochromic device of claim 5, wherein, The electrochromic film layer is a tungsten oxide film layer.

7. Electrochromic device according to claim 5 or 6, characterized in that The thickness of the electrochromic film layer is 50-90 nm.

8. The electrochromic device of claim 5, wherein, The first electrode film layer and the second electrode film layer are an indium tin oxide film layer, an aluminum-doped zinc oxide film layer, a fluorine-doped tin oxide film layer or an antimony-doped tin oxide film layer.

9. Electrochromic device according to claim 5 or 8, characterized in that The thickness of the first electrode film layer and the second electrode film layer is 50-500 nm.

10. The electrochromic device of claim 5, wherein, The first electrode film layer comprises a plurality of first electrode strips, each first electrode strip is parallel to the first direction and is sequentially arranged along the second direction; and the second electrode film layer comprises a plurality of second electrode strips, each second electrode strip is parallel to the second direction and is sequentially arranged along the first direction.

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