Water immersion method liquid crystal substrate edge grinding equipment

The water immersion liquid crystal substrate edge grinding equipment uses negative pressure and power components to perform edge grinding and chamfering in the liquid, solving the problem of substrate damage caused by spraying cooling water and achieving efficient cooling and low-pollution substrate processing.

CN223477198UActive Publication Date: 2025-10-28RAINBOW (HEFEI) LIQUID CRYSTAL GLASS CO LTD
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Patent Information

Application Number
CN202422607318.8
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-10-28
Publication Date
2025-10-28
Estimated Expiration
2034-10-28

AI Technical Summary

Technical Problem

The existing method of spraying cooling water during the edge grinding process of liquid crystal glass substrates is prone to causing edge chipping, cracks, plate fragments and splashing of grinding materials, which affects the quality of the substrates.

Method used

The liquid crystal substrate edge grinding equipment adopts water immersion method, uses negative pressure components to adsorb and fix the substrate on the carrying platform, and uses power components to perform edge grinding and chamfering in the liquid, which has good cooling effect and reduces chip drop and sputtering pollution.

Benefits of technology

It effectively reduces the chipping and burn marks of liquid crystal substrates during edge grinding and chamfering, reduces the contamination of the substrate surface by sputtering, provides a pre-wetting effect, and improves the quality of the substrate.

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Abstract

The utility model relates to the technical field of glass production, and discloses water immersion method liquid crystal substrate edging equipment which comprises a container, a bearing platform, a negative pressure assembly and a power assembly. When the device is used and initially, the bearing platform is higher than the liquid level of liquid in the container, the liquid crystal substrate is carried and placed on the bearing platform, then negative pressure is formed in the negative pressure cavity through the negative pressure assembly, and then the liquid crystal glass substrate is adsorbed and fixed to the bearing platform through the adsorption holes. And then the power assembly drives the bearing platform to descend to the position below the liquid level, and then the liquid crystal substrate can be subjected to edge grinding, chamfering and other treatment processes in the liquid. Due to the fact that all the processes are carried out below the liquid level, the cooling effect can be effectively guaranteed, and chip falling and burn marks generated when the liquid crystal substrate is edged and chamfered are greatly reduced; and meanwhile, the sputtering capacity of particles can be effectively reduced, and pollution to the surface of the liquid crystal substrate caused by sputtering objects generated during edge grinding of the substrate is reduced.
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Description

Technical Field

[0001] This utility model relates to the field of glass production technology, specifically to a water immersion method for grinding edges of liquid crystal substrates. Background Technology

[0002] Liquid crystal glass substrates are a crucial component of liquid crystal display devices, primarily used in TFT-LCDs (Thin Film Transistor Liquid Crystal Displays). They are widely used in devices such as LCD TVs, computer monitors, and smartphones. It is a thin glass sheet with an extremely smooth surface, typically manufactured using processes such as float glass or overflow melting.

[0003] In the production process of LCD glass substrates, precision cutting, dimensional edge grinding, and chamfering are required. Current LCD substrate edge grinding processes utilize spray cooling water for cooling during the grinding process. However, this method is prone to issues such as edge chipping, cracking, and even substrate breakage during processing. Furthermore, the abrasive particles generated during edge grinding can easily splash onto the substrate surface, thus affecting the substrate quality. Utility Model Content

[0004] The technical problem solved by this utility model is that the existing cooling method using spray cooling water is prone to edge chipping, cracking, or even board breakage during processing, and the abrasive material generated during the edge grinding process is easy to splash onto the substrate surface, thus affecting the quality of the substrate.

[0005] The objective of this utility model can be achieved through the following technical solutions:

[0006] A water immersion method liquid crystal substrate edge grinding device, comprising:

[0007] A container having a solution chamber inside;

[0008] A support platform is disposed within the solution chamber, and a negative pressure chamber is formed within the support platform. An adsorption hole communicating with the negative pressure chamber is formed on the top surface of the support platform.

[0009] A negative pressure assembly for creating negative pressure within the negative pressure chamber;

[0010] A power assembly for driving the linear motion of the support platform.

[0011] In one embodiment of this utility model: a support structure is fixedly provided at the bottom of the container.

[0012] In one embodiment of this utility model: the container is provided with an inlet and an outlet.

[0013] In one embodiment of this utility model, the position height of the liquid inlet is higher than that of the liquid outlet.

[0014] In one embodiment of this utility model: flow sensors are respectively provided at the inlet and outlet, and a liquid level sensor is provided inside the container.

[0015] In one embodiment of this utility model: the negative pressure assembly includes a negative pressure machine, and the negative pressure machine is connected to the negative pressure chamber in the support platform via a flexible hose.

[0016] In one embodiment of this utility model: the hose comprises multiple hoses, which are symmetrically arranged on both sides of the support platform.

[0017] In one embodiment of this utility model: the power assembly includes a linear motor and a connecting shaft, the linear motor drives the connecting shaft, and the end of the connecting shaft away from the linear motor is fixedly connected to the bearing platform.

[0018] In one embodiment of this utility model: the connecting shaft passes through the container, and a sealing sleeve is provided at the penetration position.

[0019] The beneficial effects of this utility model are:

[0020] This device is used for the precision cutting, dimensional grinding, and chamfering processes of liquid crystal substrates. Initially, the support platform is higher than the liquid level in the container. The liquid crystal substrate is transported and placed on the support platform. Then, a negative pressure component creates negative pressure within the negative pressure chamber, which adsorbs and fixes the liquid crystal glass substrate onto the support platform through the suction holes. The power component then drives the support platform to descend below the liquid level, allowing for grinding and chamfering processes on the liquid crystal substrate while it is submerged. Because all these processes are performed below the liquid level, effective cooling is ensured, significantly reducing substrate chipping and burn marks during grinding and chamfering. Simultaneously, it effectively reduces the sputtering ability of particles, minimizing contamination of the liquid crystal substrate surface by sputtered material generated during edge grinding. Furthermore, it provides pre-wetting for the subsequent cleaning process of the liquid crystal substrate.

[0021] Additional aspects and advantages of this invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0022] The above and / or additional aspects and advantages of this utility model will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which:

[0023] Figure 1 This is a schematic diagram of the structure of the bearing platform of this utility model above the liquid surface;

[0024] Figure 2 This is a schematic diagram of the structure of the bearing platform of this utility model below the liquid surface;

[0025] Figure 3 This is a top view of the structure of this utility model.

[0026] The reference numerals in the figure are: 1. Liquid crystal substrate; 2. Supporting platform; 3. Container; 4. Negative pressure component; 5. Liquid inlet; 6. Liquid outlet; 7. Supporting structure; 8. Power component. Detailed Implementation

[0027] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0028] In the description of this utility model, it should be understood that the directional descriptions, such as up, down, front, back, left, right, etc., indicate the directional or positional relationship based on the directional or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0029] In the description of this utility model, "several" means one or more, "multiple" means two or more, "greater than," "less than," and "exceeding" are understood to exclude the stated number, while "above," "below," and "within" are understood to include the stated number. If "first" or "second" is used in the description, it is only for the purpose of distinguishing technical features and should not be construed as indicating or implying relative importance, or implicitly indicating the number of indicated technical features, or implicitly indicating the order of the indicated technical features.

[0030] Please see Figure 1-3This utility model relates to a water immersion method for grinding liquid crystal substrates 1, comprising: a container 3, a support platform 2, a negative pressure component 4, and a power component 8. The bottom of the container 3 may be fixedly provided with a support structure 7, which serves a supporting function. The support structure 7 can be a columnar support leg structure or other support structure. A solution chamber is formed inside the container 3 to contain a solution (which can be water). The container 3 may include a bottom structure and a side structure to form a solution chamber with an open top. Furthermore, the container 3 is provided with a liquid inlet 5 and a liquid outlet 6. Multiple liquid inlets 5 and outlets 6 can be provided, and they can be located on opposite sides of the container 3. These are used for liquid inlet and outlet to control the liquid volume within the solution chamber. The position of the liquid inlet 5 can be higher than the position of the liquid outlet 6 for better liquid inlet and outlet.

[0031] Please see Figure 1-3 In one embodiment of this utility model, flow sensors are respectively installed at the inlet 5 and outlet 6, and a level sensor is installed inside the container 3. The flow sensors and level sensors can be used to detect the amount of liquid in the container 3 and then control and adjust it. The level sensor and flow sensor can be connected to a controller, and solenoid valves connected to the controller are installed at the inlet 5 and outlet 6 respectively. The inlet and outlet processes can be automatically controlled by the controller through preset instructions or programs. The liquid in the container 3 can be replaced or replenished periodically, or the inlet 5 and outlet 6 can be opened simultaneously to keep the liquid flowing, ensuring the effectiveness of use and removing impurities generated during use. Furthermore, with the inlet 5 at the top and the outlet 6 at the bottom, the direction of liquid flow can carry away impurities generated during polishing as much as possible, avoiding contamination of the liquid crystal substrate 1 surface by sputtered materials. The sensors at the inlet 5 and outlet 6 can detect and adjust the flow rate of the inlet 5 and outlet 6. The sensor inside the container 3 can detect the liquid level inside the concave container 3. Through the flow monitoring and adjustment equipment, the liquid level inside the concave container 3 is kept basically constant.

[0032] Please see Figure 1-3In one embodiment of this utility model, the support platform 2 is disposed within the solution chamber; specifically, the support platform 2 may be disposed at the center of the solution chamber. A negative pressure chamber is formed within the support platform 2. The top surface of the support platform 2 should be a flat surface for supporting the substrate glass to be processed, and an adsorption hole communicating with the negative pressure chamber is formed on its top surface. The negative pressure component 4 is used to generate negative pressure within the negative pressure chamber. In use, the liquid crystal glass substrate is placed on the support platform 2, and then negative pressure is generated within the negative pressure chamber by the negative pressure component 4, thereby adsorbing and fixing the liquid crystal glass substrate onto the support platform 2 through the adsorption hole. Furthermore, the force is evenly distributed during the fixing process, ensuring the stability of the glass substrate while avoiding damage to the glass plate.

[0033] Please see Figure 1-3 In one embodiment of this utility model, the negative pressure component 4 may include a negative pressure generator or an exhaust fan, and the negative pressure generator is connected to the negative pressure chamber within the support platform 2 via a flexible hose. This allows the hose to move up and down with the support platform 2. Multiple flexible hoses may be included and symmetrically arranged on both sides of the support platform 2. This allows for the efficient and balanced formation of negative pressure within the negative pressure chamber.

[0034] Please see Figure 1-3 In one embodiment of this utility model, the power component 8 is used to drive the support platform 2 to move linearly, thereby enabling the support platform 2 to enter / exit the solution in the container 3. The power component 8 is a linear drive structure, such as a hydraulic / pneumatic lifting mechanism, a lead screw drive structure, or a linear motor. As an example, the power component 8 includes a linear motor and a connecting shaft. The linear motor drives the connecting shaft, and the end of the connecting shaft away from the linear motor is fixedly connected to the support platform 2. The linear motor can be located below the container 3, and the connecting shaft passes through the container 3, with a sealing sleeve provided at the penetration position. This ensures sealing performance, preventing liquid leakage inside the container 3.

[0035] The working principle of this utility model:

[0036] This device is used for the precision cutting, dimensional grinding, and chamfering processes of liquid crystal substrate 1. Initially, the support platform 2 is higher than the liquid level in the container 3. The liquid crystal substrate 1 is placed on the support platform 2 after being transported. Then, a negative pressure is created in the negative pressure chamber by the negative pressure component 4, which adsorbs and fixes the liquid crystal glass substrate onto the support platform 2 through the adsorption holes. Then, the support platform 2 is driven by the power component 8 to descend below the liquid level, after which the liquid crystal substrate 1 can be processed in the liquid, including grinding and chamfering. Since all the above processes are carried out below the liquid level, the cooling effect is effectively guaranteed, greatly reducing the occurrence of chip loss and burn marks on the liquid crystal substrate 1 during grinding and chamfering. At the same time, it effectively reduces the sputtering ability of particulate matter, reducing the contamination of the liquid crystal substrate 1 surface by sputtered materials generated during substrate grinding. Furthermore, it provides pre-wetting for the subsequent cleaning process of the liquid crystal substrate 1.

[0037] The foregoing has provided a detailed description of one embodiment of the present invention, but the description is merely a preferred embodiment and should not be construed as limiting the scope of the present invention. All equivalent variations and improvements made within the scope of the claims of the present invention should still fall within the scope of the claims of the present invention.

Claims

1. A water immersion liquid crystal substrate (1) edge grinding device, characterized in that, include: Container (3), wherein a solution chamber is provided inside the container (3); The support platform (2) is disposed in the solution chamber, and a negative pressure chamber is provided in the support platform (2). An adsorption hole communicating with the negative pressure chamber is provided on the top surface of the support platform (2). Negative pressure assembly (4), the negative pressure assembly (4) is used to create negative pressure in the negative pressure chamber; Power assembly (8) is used to drive the carrier platform (2) to linear motion.

2. The water immersion method liquid crystal substrate (1) edge grinding equipment according to claim 1, characterized in that, The bottom of the container (3) is fixedly provided with a support structure (7).

3. The water immersion method liquid crystal substrate (1) edge grinding equipment according to claim 1, characterized in that, The container (3) is provided with an inlet (5) and an outlet (6).

4. The water immersion method liquid crystal substrate (1) edge grinding equipment according to claim 3, characterized in that, The position height of the liquid inlet (5) is higher than that of the liquid outlet (6).

5. The water immersion method liquid crystal substrate (1) edge grinding equipment according to claim 4, characterized in that, The inlet (5) and outlet (6) are respectively equipped with flow sensors, and the container (3) is equipped with a liquid level sensor.

6. The water immersion method liquid crystal substrate (1) edge grinding equipment according to claim 1, characterized in that, The negative pressure assembly (4) includes a negative pressure machine, which is connected to the negative pressure chamber in the support platform (2) via a hose.

7. The water immersion method liquid crystal substrate (1) edge grinding equipment according to claim 6, characterized in that, The hoses comprise multiple hoses, which are symmetrically arranged on both sides of the support platform (2).

8. The water immersion liquid crystal substrate (1) edge grinding equipment according to claim 1, characterized in that, The power assembly (8) includes a linear motor and a connecting shaft. The linear motor drives the connecting shaft, and the end of the connecting shaft away from the linear motor is fixedly connected to the bearing platform (2).

9. The water immersion method liquid crystal substrate (1) edge grinding equipment according to claim 8, characterized in that, The connecting shaft passes through the container (3), and a sealing sleeve is provided at the penetration position.