Chemical vapor deposition gas inlet pipe cleaning equipment

Abstract

The utility model relates to chemical vapor deposition air inlet pipe cleaning equipment which comprises a cleaning tank, a fixing mechanism used for fixing a plurality of air inlet pipes is arranged at the bottom of the cleaning tank, and a high-pressure flushing mechanism is arranged on the side wall of one end, located in the length direction of the air inlet pipes, of the cleaning tank. The high-pressure flushing mechanism comprises a plurality of high-pressure nozzles which can be in butt joint with the multiple air inlet pipes correspondingly. A plurality of ultrasonic generators are mounted on the inner wall of the cleaning tank. According to the cleaning equipment for the chemical vapor deposition gas inlet pipe, the gas inlet pipe can be subjected to ultrasonic alkali washing and ultrasonic water washing by adding alkali liquor and pure water into the cleaning tank in sequence and starting the ultrasonic generator, and after ultrasonic alkali washing and ultrasonic water washing, high-pressure water is sprayed into the gas inlet pipe through butt joint of the high-pressure spray head and the gas inlet pipe, so that the gas inlet pipe is cleaned. Residual liquid medicine and silicon powder on the inner wall of the air inlet pipe are removed, the cleaning effect is improved, it is guaranteed that the air inlet pipe can be repeatedly used, the service life of the air inlet pipe is prolonged, and cost is reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to chemical gas deposition gas inlet pipe cleaning technical field especially relates to a kind of chemical gas deposition gas inlet pipe cleaning equipment. BACKGROUND

[0002] With the wide application of LPCVD in TOPCon and BC battery, the replacement cost problem caused by the short service life of gas inlet pipe is increasingly serious, and the following directions are currently used for optimizing the service life of gas inlet pipe in the prior art: 1) optimizing the size of gas inlet pipe to improve the service life of gas inlet pipe; 2) after replacing the gas inlet pipe, knocking off the internal pipe wall film of the gas inlet pipe for reuse; 3) cleaning the gas inlet pipe by using alkaline cleaning + acid cleaning + water cleaning.

[0003] Among them, the current cleaning of the gas inlet pipe mainly uses alkaline cleaning + acid cleaning + water cleaning. In this process, the gas inlet pipe is placed in a tank, and the process time and the concentration of the liquid medicine are adjusted to achieve the cleaning effect. However, this cleaning method has the following problems: 1) incomplete alkaline cleaning, resulting in a large amount of dust in the gas inlet pipe, which cannot be effectively removed in subsequent processing, affecting the yield efficiency, and the service life of the replaced gas inlet pipe is reduced; 2) excessive acid cleaning, resulting in excessive corrosion of the surface of the gas inlet pipe, high surface roughness of the gas inlet pipe, poor fit between the gas inlet pipe and the sealing ring after installation, poor sealing effect, and failure to meet the production requirements. SUMMARY

[0004] Therefore, in view of the technical problems of incomplete cleaning and excessive corrosion caused by the use of alkaline cleaning + acid cleaning + water cleaning for cleaning the gas inlet pipe in chemical vapor deposition, the utility model provides a chemical vapor deposition gas inlet pipe cleaning equipment.

[0005] To achieve the above-mentioned purpose, the utility model adopts the following technical solutions:

[0006] The utility model provides a chemical vapor deposition gas inlet pipe cleaning equipment, which comprises a cleaning tank, a fixing mechanism for fixing a plurality of gas inlet pipes is arranged at the bottom of the cleaning tank, a high-pressure flushing mechanism is arranged on the side wall of one end of the cleaning tank in the length direction of the gas inlet pipe, the high-pressure flushing mechanism comprises a plurality of high-pressure nozzles which can be respectively connected to the plurality of gas inlet pipes, and a plurality of ultrasonic generators are installed on the inner wall of the cleaning tank.

[0007] The chemical vapor deposition gas inlet pipe cleaning equipment provided by the utility model can perform ultrasonic alkaline cleaning and ultrasonic water cleaning on the gas inlet pipe by sequentially adding alkali solution and pure water into the cleaning tank and turning on the ultrasonic generator. After ultrasonic alkaline cleaning and ultrasonic water cleaning, high-pressure water is sprayed into the gas inlet pipe through the high-pressure nozzle to remove the residual liquid medicine and silicon powder on the inner wall of the gas inlet pipe, improve the cleaning effect, ensure that the gas inlet pipe can be reused, prolong the service life of the gas inlet pipe, and reduce the cost.

[0008] As a further improvement of the above-mentioned scheme of the utility model, the high-pressure flushing mechanism further comprises a plurality of hoses, a plurality of clamping grooves are arranged at the top of the side wall of the one end of the length direction of the cleaning tank, and the plurality of high-pressure nozzles are detachably clamped in the plurality of clamping grooves, and the plurality of hoses are connected with the plurality of high-pressure nozzles.

[0009] As a further improvement of the above-mentioned scheme of the utility model, the fixing mechanism comprises a plurality of fixing seats; the air inlet pipes are arranged in the cleaning tank along the width direction of the cleaning tank and the length direction of the air inlet pipes is consistent with the length direction of the cleaning tank; the plurality of fixing seats are arranged at the bottom of the cleaning tank along the length direction of the cleaning tank, the fixing seat is fixed at the bottom of the cleaning tank and a plurality of fixing grooves are arranged at the top of the fixing seat along the width direction of the cleaning tank, and the plurality of air inlet pipes are correspondingly arranged in the plurality of fixing grooves and are detachably clamped in the fixing grooves.

[0010] As a further improvement of the above-mentioned scheme of the utility model, a plurality of flow guide holes for guiding flow are arranged at the bottom of the fixing seat along the width direction of the cleaning tank.

[0011] As a further improvement of the above-mentioned scheme of the utility model, the liquid injection mechanism for injecting cleaning liquid into the cleaning tank is arranged on at least one side wall of the cleaning tank.

[0012] As a further improvement of the above-mentioned scheme of the utility model, the liquid injection mechanism is arranged on the side walls on both sides of the length direction of the cleaning tank, and the liquid injection mechanism comprises a plurality of liquid injection nozzles, and the plurality of liquid injection nozzles are arranged in a matrix on the side wall of the cleaning tank. The arrayed liquid injection nozzles can ensure the uniformity of the cleaning liquid in the cleaning tank after injection.

[0013] As a further improvement of the above-mentioned scheme of the utility model, the length of the cleaning tank is 4.2-4.5 m, and the depth is 1-1.2 m.

[0014] As a further improvement of the above-mentioned scheme of the utility model, in the matrix, the distance between any two adjacent columns is 0.20-0.25 m, and the distance between any two adjacent rows is 0.20-0.25 m.

[0015] As a further improvement of the above-mentioned scheme of the utility model, a liquid discharge port is arranged at the bottom of the one end of the length direction of the cleaning tank, and the bottom surface of the cleaning tank is inclined to the direction of the liquid discharge port.

[0016] As a further improvement of the above-mentioned scheme of the utility model, the chemical vapor deposition air inlet pipe cleaning equipment further comprises a tank cover; the top end of the cleaning tank is open, and the tank cover is detachably connected with the top end of the cleaning tank to seal the cleaning tank.

[0017] Compared with the prior art, the utility model has the following beneficial effects:

[0018] The chemical vapor deposition gas inlet pipe cleaning equipment provided by the utility model can remove the residual liquid medicine and silicon powder on the inner wall of the gas inlet pipe by spraying high-pressure water into the gas inlet pipe through the high-pressure nozzle and the gas inlet pipe after ultrasonic alkali cleaning and ultrasonic water cleaning, improve the cleaning effect, ensure that the gas inlet pipe can be repeatedly used, prolong the service life of the gas inlet pipe, and reduce the cost. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 The utility model discloses a kind of chemical vapor deposition gas inlet pipe cleaning equipment structure schematic diagram proposed in embodiment of the utility model;

[0020] Figure 2 A part of structure schematic diagram of a kind of chemical vapor deposition gas inlet pipe cleaning equipment proposed in embodiment of the utility model;

[0021] Figure 3 For Figure 2 Top view;

[0022] Figure 4 For Figure 2 Half sectional view.

[0023] Reference numeral: 1, cleaning tank;2, high-pressure nozzle;3, hose;4, clamping groove;5, fixed seat;6, fixed groove;7, flow guide hole;8, liquid injection nozzle;9, liquid discharge port;10, tank cover. DETAILED DESCRIPTION

[0024] In order to facilitate understanding of the utility model, the utility model will be more fully described below in conjunction with specific examples. However, the utility model can be realized in many different forms, and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the utility model more thorough and comprehensive.

[0025] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which the utility model belongs. The terms used in the specification of the utility model herein are only for the purpose of describing specific embodiments and are not intended to limit the utility model.

[0026] With reference to Figure 1 , Figure 2 The embodiment proposes a kind of chemical vapor deposition gas inlet pipe cleaning equipment, it includes cleaning tank 1 and tank cover 10.

[0027] The cleaning tank 1 is in a rectangular structure as a whole, and the top end of the cleaning tank 1 is open. In this embodiment, the length of the cleaning tank 1 is 4.5 m, the depth is 1.2 m, and the width is 2.0 m. Of course, in other embodiments, in order to accommodate more air inlet pipes, the cleaning tank 1 can also be of other sizes. Since the cleaning tank 1 is used for cleaning the air inlet pipe and needs to contain alkaline solution, in this embodiment, the cleaning tank 1 is made of polyethylene material. Of course, in other embodiments, the cleaning tank 1 can also be made of other corrosion-resistant materials.

[0028] In order to facilitate the fixation of the air inlet pipe to be cleaned, in combination with Figure 3 , Figure 4 , a plurality of fixing seats 5 are fixed at the bottom of the cleaning tank 1 in the length direction thereof. In this embodiment, the number of fixing seats 5 is 3. Of course, in other embodiments, different numbers of fixing seats 5 can be configured according to the actual length of the cleaning tank 1 and the length of the air inlet pipe. The fixing seats 5 are arranged along the width direction of the cleaning tank 1, and a plurality of fixing grooves 6 are arranged on the top surface of the fixing seat 5 in the width direction of the cleaning tank 1. The number of fixing grooves 6 on each fixing seat 5 is the same, and the plurality of fixing grooves 6 on each fixing seat 5 are one-to-one corresponding. The air inlet pipe is arranged along the length direction of the cleaning tank 1 and is clamped into the fixing groove 6, and the size of the fixing groove 6 needs to be matched with the outer diameter of the air inlet pipe to ensure that the air inlet pipe can be clamped tightly. The number of fixing grooves 6 on each fixing seat 5 can be reasonably designed according to the width of the cleaning tank 1, which is not specifically limited in this embodiment.

[0029] In order to facilitate the injection of cleaning liquid into the cleaning tank 1, in this embodiment, liquid injection mechanisms for injecting cleaning liquid into the cleaning tank 1 are arranged on the side walls of the cleaning tank 1 in the length direction. The liquid injection mechanism includes a plurality of liquid injection nozzles 8, which are arranged in an array on the inner wall of the cleaning tank 1, and the distance between any two adjacent columns is 0.20 m, and the distance between any two adjacent rows is 0.25 m, which can ensure the uniformity of the cleaning liquid in the cleaning tank 1 during injection. In this embodiment, the plurality of liquid injection nozzles 8 of each liquid injection mechanism are arranged in 3 rows and 19 columns. Of course, in other embodiments, the arrangement of the liquid injection nozzles 8 can also be reasonably designed according to the length of the cleaning tank 1.

[0030] One end of the cleaning tank 1 in the length direction is also provided with a high-pressure flushing mechanism. The high-pressure flushing mechanism includes a plurality of high-pressure nozzles 2 and a plurality of hoses 3. The top of one end of the cleaning tank 1 in the length direction is spaced apart to form a plurality of clamping grooves 4, the plurality of high-pressure nozzles 2 are respectively detachably clamped in the plurality of clamping grooves 4, the plurality of hoses 3 are respectively connected with the plurality of high-pressure nozzles 2, and the other end of the hose 3 is connected with a water source. The number of high-pressure nozzles 2 can be reasonably designed according to the actual width of the cleaning tank 1, which is not specifically limited in this embodiment.

[0031] In this embodiment, the bottom and four walls of the cleaning tank 1 are provided with ultrasonic generators (not shown in the figure). The bottom of the length direction of the cleaning tank 1 is also provided with a liquid outlet 9, which can be connected to a device for collecting waste liquid through a pipe. Generally, the liquid outlet 9 is in a sealed state, and when it is necessary to drain the liquid, the valve at the liquid outlet 9 can be opened. In order to ensure that the waste liquid can be drained, the bottom surface of the cleaning tank 1 is inclined to the direction of the liquid outlet 9, and the bottom of each fixing seat 5 is provided with a plurality of flow guide holes 7, so as to facilitate the flow of cleaning liquid to the liquid outlet 9. At the same time, in order to ensure safety, the top of the cleaning tank 1 of the present embodiment is also provided with a tank cover 10. When the air inlet pipe is cleaned, the cleaning tank 1 is sealed by the tank cover 10 to avoid accidents.

[0032] In use, a plurality of air inlet pipes to be cleaned are respectively corresponded to a plurality of fixing grooves 6 of the fixing seat 5, and the air inlet pipes are clamped into the corresponding fixing grooves 6 to prevent the air inlet pipes from shaking. The liquid outlet 9 is sealed, water is first added into the cleaning tank 1 through the liquid injection nozzle 8, and then alkali (KOH, NaOH, etc.) is added, and then water is added. The proportion of the alkali is 8%-12%, and the arrayed liquid injection nozzles 8 can ensure uniform distribution of the alkali. After the liquid is prepared, the tank cover 10 is covered, the ultrasonic generator is started to perform ultrasonic cleaning, and the cleaning time is 4-8h.

[0033] After the alkali cleaning is completed, the valve at the liquid outlet 9 is opened, and the cleaning tank 1 is emptied. Then, pure water is filled into the cleaning tank 1 through the liquid injection nozzle 8, the ultrasonic generator is started to perform ultrasonic cleaning, and the cleaning time is 1-2h. Then, the valve at the liquid outlet 9 is opened, the cleaning tank 1 is emptied, and the pure water cleaning is repeated for 3-8 times.

[0034] After the pure water cleaning is completed, the valve at the liquid outlet 9 is opened, the cleaning tank 1 is emptied, the tank cover 10 is opened, the air inlet pipe is respectively connected to a high-pressure nozzle 2, and the high-pressure nozzle 2 is started to spray high-pressure water into the air inlet pipe to remove the residual cleaning liquid and silicon powder on the inner wall of the air inlet pipe.

[0035] After the flushing is completed, the air inlet pipe can be dried.

[0036] It should be noted that when a component is referred to as "mounted on" another component, it can be directly on the other component or there can be a middle component. When a component is referred to as "provided on" another component, it can be directly provided on the other component or there can be a middle component. When a component is referred to as "fixed on" another component, it can be directly fixed on the other component or there can be a middle component.

[0037] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used in the description herein is for describing particular embodiments only and is not intended to be limiting of the application. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.

[0038] Various technical features of the above-described embodiments can be combined in any combination, and the description herein makes no representation that all possible combinations have been described. The disclosure of the application is intended to embrace all such possible combinations.

[0039] The above-described embodiments are merely illustrative of the present application and do not limit the scope of the application. It should be noted that, for those skilled in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which are all within the scope of the present application. Therefore, the scope of the patent protection of the present application should be subject to the appended claims.

Claims

1. A chemical vapor deposition inlet tube cleaning apparatus, characterized by, It includes the cleaning tank (1), the cleaning tank (1) bottom is provided with the fixing mechanism for fixing multiple air inlet pipes, the cleaning tank (1) is located on the side wall of the length direction one end of air inlet pipe and is provided with high pressure flushing mechanism, the high pressure flushing mechanism includes multiple high pressure nozzles (2) that can be respectively with multiple air inlet pipes butt joint;Cleaning tank (1) inner wall is installed with several ultrasonic generators.

2. The chemical vapor deposition inlet tube cleaning apparatus of claim 1, wherein, The high pressure flushing mechanism further comprises a plurality of hoses (3), the cleaning tank (1) is located on the side wall of the length direction one end of the air inlet pipe and is provided with a plurality of clamping grooves (4) at the top end, a plurality of high pressure nozzles (2) are respectively detachably connected in a plurality of clamping grooves (4), and a plurality of hoses (3) are respectively connected with a plurality of high pressure nozzles (2).

3. The chemical vapor deposition inlet tube cleaning apparatus of claim 1, wherein, The fixing mechanism comprises a plurality of fixing seats (5); the air inlet pipe is arranged along the width direction of the cleaning tank (1) in the cleaning tank (1) and the length direction of the air inlet pipe is consistent with the length direction of the cleaning tank (1); a plurality of fixing seats (5) are arranged along the length direction of the cleaning tank (1) at the bottom of the cleaning tank (1), the fixing seat (5) is fixed at the bottom of the cleaning tank (1) and the top surface thereof is provided with a plurality of fixing grooves (6) along the width direction of the cleaning tank (1), a plurality of air inlet pipes are provided one by one corresponding to a plurality of fixing grooves (6) of the fixing seat (5) and the air inlet pipe is detachably clamped and fixed in the corresponding fixing groove (6).

4. The chemical vapor deposition inlet tube cleaning apparatus of claim 3, wherein, The bottom of the fixing seat (5) is provided with a plurality of flow guide holes (7) for flow guide along the width direction of the cleaning tank (1).

5. The chemical vapor deposition inlet tube cleaning apparatus of claim 1, wherein, At least one side wall of the cleaning tank (1) is provided with a liquid injection mechanism for injecting cleaning liquid into the cleaning tank (1).

6. The chemical vapor deposition inlet tube cleaning apparatus of claim 1, wherein, The liquid injection mechanism is provided on both sides of the length direction of the cleaning tank (1), and the liquid injection mechanism comprises a plurality of liquid injection nozzles (8), which are arranged in a matrix on the side wall of the cleaning tank (1).

7. The chemical vapor deposition inlet tube cleaning apparatus of claim 6, wherein, The length of the cleaning tank (1) is 4.2-4.5m, and the depth is 1-1.2m.

8. The chemical vapor deposition inlet tube cleaning apparatus of claim 7, wherein, In the matrix, the distance between any two adjacent columns is 0.20-0.25m, and the distance between any two adjacent rows is 0.20-0.25m.

9. The chemical vapor deposition inlet tube cleaning apparatus of claim 1, wherein, The bottom of one end of the length direction of the cleaning tank (1) is provided with a drain port (9), and the bottom surface of the cleaning tank (1) is inclined to the direction of the drain port (9).

10. The chemical vapor deposition inlet tube cleaning apparatus of claim 1, wherein, The chemical vapor deposition air inlet pipe cleaning equipment further comprises a tank cover (10); the top end of the cleaning tank (1) is open, and the tank cover (10) is detachably connected with the top end of the cleaning tank (1) to seal the cleaning tank (1).

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