Sealing structure for diamond deposition reaction cavity

Abstract

The sealing structure for the diamond deposition reaction cavity comprises a shielding cover and a bottom plate with a penetrating through hole, and the bottom of the shielding cover is fixedly connected with the bottom plate to form the reaction cavity; the sample table is arranged in the reaction cavity, one end of the sleeve is fixedly connected with the sample table, the other end of the sleeve is arranged outside the reaction cavity through the through hole of the bottom plate, and a groove is formed in the outer wall of the part, located outside the reaction cavity, of the sleeve; the quartz ring is arranged between the sample table and the bottom plate; the clamping block is clamped in the groove and is fixedly connected with the sleeve; the locking nut is arranged on the sleeve in a sleeving mode and fixedly connected with the clamping block, and the threaded sleeve is arranged on the locking nut in a sleeving mode through internal threads; the locking sleeve is arranged on the locking nut in a sleeving mode through internal threads and located between the threaded sleeve and the clamping block; one end of the elastic piece is connected to the threaded sleeve, the other end of the elastic piece is connected to the bottom plate, the sealing structure can solve the problem that the sealing performance of the MPCVD equipment is poor, and the sealing performance of the MPCVD reaction cavity is improved.

Description

TECHNICAL FIELD

[0001] The application relates to the technical field of diamond deposition, in particular to a sealing structure for a diamond deposition reaction chamber. BACKGROUND

[0002] Artificial diamond has many advantages, such as high hardness, good thermal conductivity, small thermal expansion coefficient, excellent optical and electrical properties, fast sound propagation speed, and good dielectric properties, which makes it have a wide application prospect in fields such as infrared optical windows, high-power LEDs, heat sinks of high-power and high-frequency electronic and optoelectronic devices and systems, high-performance radiation-resistant detectors and sensors, etc. At present, the most commonly used methods for preparing diamond include hot filament chemical vapor deposition (HFCVD), high temperature ultrahigh pressure (HTUP), and microwave plasma chemical vapor deposition (MPCVD), etc. Among them, the MPCVD method has the characteristics of good controllability of the diamond deposition process and no discharge electrode pollution, and is the preferred method for preparing high-quality diamond internationally.

[0003] The equipment for preparing diamond by using the MPCVD method is an MPCVD device, which includes a reaction chamber, a microwave generating device and a transmission channel, a gas feeding device and a gas outlet device, etc. Usually, a substrate or sample is placed on a sample table, and the sample table is placed in the reaction chamber which is sealed and vacuumized. The microwave generating device emits microwaves which are fed into the reaction chamber through the transmission channel. The gas feeding device inputs gas into the reaction chamber. The gas forms a plasma above the sample table under the action of microwaves, and diamond film is deposited on the sample table.

[0004] The sealing property of the MPCVD reaction chamber has a great influence on the quality and performance of diamond film. The microwave transmission channel of the existing MPCVD device often has the defect of poor sealing property. For example, the microwave transmission channel of a butterfly-shaped cavity MPCVD device is connected to the bottom plate of the reaction chamber, and a quartz ring is arranged between the bottom plate and the sample table. The microwaves generated by the microwave generating device reach the quartz ring through the transmission channel, and are fed into the reaction chamber through the quartz ring. However, the distance between the sample table and the bottom plate of the existing reaction chamber is often not adjustable, and the size of the quartz ring is not matched or changes after being used for a period of time, which causes a gap between the quartz ring and the sample table or the bottom plate, thereby affecting the sealing effect of the whole reaction chamber. Poor sealing can easily cause the gas in the reaction chamber to leak through the upper and lower sides of the quartz ring, affecting the deposition efficiency or quality of the diamond, or causing energy waste and other problems. SUMMARY

[0005] In view of the defects of the prior art, the sealing structure for a diamond deposition reaction cavity is provided to solve the problem of poor sealing performance of the MPCVD equipment and improve the sealing performance of the MPCVD reaction cavity.

[0006] To achieve the above object, the application provides the following technical scheme: a sealing structure for a diamond deposition reaction cavity, characterized in that it comprises: a shielding cover and a bottom plate with a through hole, the bottom of the shielding cover is fixedly connected with the bottom plate to form a reaction cavity; a sample table and a sleeve, the sample table is arranged in the reaction cavity, one end of the sleeve is fixedly connected with the sample table, the other end of the sleeve is arranged outside the reaction cavity through the through hole of the bottom plate, and a groove is arranged on the outer wall of the part of the sleeve outside the reaction cavity; a quartz ring arranged between the sample table and the bottom plate; a clamping block clamped in the groove and fixedly connected with the sleeve; a locking nut and a sleeve nut on the side of the clamping block close to the bottom plate, the locking nut is sleeved on the sleeve and fixedly connected with the clamping block, and the sleeve nut is sleeved on the locking nut through internal threads; a locking sleeve sleeved on the locking nut through internal threads and located between the sleeve nut and the clamping block; and an elastic member having one end connected to the sleeve nut and the other end connected to the bottom plate.

[0007] Preferably, it further comprises a waveguide ring sleeved on the sleeve, one end connected with the bottom plate and the other end connected with the elastic member, wherein the elastic member is connected to the bottom plate through the waveguide ring.

[0008] Preferably, it further comprises a microwave generator arranged on the side of the waveguide ring and sealingly connected with the waveguide ring.

[0009] Preferably, it further comprises at least one sealing rubber ring, at least one of the sealing rubber rings being arranged between the sample table and the quartz ring, and / or at least one of the sealing rubber rings being arranged between the bottom plate and the quartz ring.

[0010] Preferably, it further comprises a first grommet arranged on the side of the sleeve close to the elastic member to clamp one end of the elastic member; and / or a second grommet arranged on the side of the bottom plate or the waveguide ring close to the elastic member to clamp the other end of the elastic member.

[0011] Preferably, the clamping block comprises at least two clamping pieces fixedly connected to form the clamping block.

[0012] Preferably, the interior of at least one of the card is provided with a first bolt, and is screwed together with the interior of the lock nut; and / or, the interior of at least one of the card is provided with at least two second bolts, and is screwed together with the interior of another card.

[0013] Preferably, the waveguide ring is provided with a microwave shielding ring on the side close to the elastic member, and a waveguide cavity is formed in the waveguide ring, one end of the waveguide cavity is in communication with the internal space surrounded by the quartz ring, and the other end is in sealing connection with the microwave shielding ring.

[0014] Preferably, the sleeve comprises a water inlet pipe and a water outlet pipe, wherein the water inlet pipe is annularly arranged on the outside of the water outlet pipe, and the groove is arranged on the outer wall of the water inlet pipe; or the water outlet pipe is annularly arranged on the outside of the water inlet pipe, and the groove is arranged on the outer wall of the water outlet pipe.

[0015] Preferably, the depth of the groove is greater than or equal to 1 / 5 of the wall thickness of the water inlet pipe, and the depth of the groove is less than or equal to 1 / 2 of the wall thickness of the water inlet pipe; or the depth of the groove is greater than or equal to 1 / 5 of the wall thickness of the water outlet pipe, and the depth of the groove is less than or equal to 1 / 2 of the wall thickness of the water outlet pipe; or the depth of the groove is greater than or equal to the wall thickness of the water inlet pipe; or the depth of the groove is greater than or equal to the wall thickness of the water outlet pipe.

[0016] Compared with the prior art, the application has the following beneficial effects:

[0017] The sealing structure for the diamond deposition reaction cavity provided by the application can move the sleeve downward by rotating the screw sleeve, compressing the spring, and transmitting the elastic force of the spring to the sleeve through the lock nut and the clamping block, so that the distance between the sample table and the bottom plate is shortened, and the quartz ring between the sample table and the bottom plate is compressed tightly. When the screw sleeve is adjusted to a certain position, i.e., when the bottom plate, the quartz ring and the sample table are completely compressed to reach a sealing state, the locking sleeve is further rotated to support the screw sleeve to prevent the screw sleeve from loosening, thereby further ensuring the sealing reliability of the sealing structure, preventing the problem of leakage of gas in the reaction cavity through the upper and lower sides of the quartz ring due to poor sealing, improving the deposition efficiency or quality of the diamond on the sample table in the reaction cavity, and avoiding energy waste. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 The overall structure schematic diagram of the sealing structure for the diamond deposition reaction cavity provided by the embodiment of the application is shown in the figure.

[0019] Figure 2Another overall structure schematic view of the sealing structure for the diamond deposition reaction cavity provided by the embodiment of the present application;

[0020] Figure 3 A split structure perspective schematic view of the sealing structure for the diamond deposition reaction cavity provided by the embodiment of the present application;

[0021] Figure 4 A sectional view schematic view of the sealing structure for the diamond deposition reaction cavity provided by the embodiment of the present application;

[0022] Figure 5 A partial structure schematic view of the sealing structure for the diamond deposition reaction cavity provided by the embodiment of the present application;

[0023] Figure 6 Another partial structure schematic view of the sealing structure for the diamond deposition reaction cavity provided by the embodiment of the present application.

[0024] In the figure: 1, shielding cover; 2, bottom plate; 3, waveguide ring; 4, microwave generator; 5, second gasket ring; 6, spring; 7, threaded sleeve; 8, locking sleeve; 9, locking nut; 10, clamping block; 11, second bolt; 12, first bolt; 13, waveguide cavity; 14, sleeve; 15, water inlet pipe; 16, water outlet pipe; 17, microwave shielding ring; 18, sample stage; 19, groove; 20, rubber ring; 21, quartz ring; 22, through hole; 23, first gasket ring. DETAILED DESCRIPTION

[0025] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0026] Artificial diamond has many advantages, such as high hardness, good thermal conductivity, small thermal expansion coefficient, excellent optical and electrical properties, fast sound propagation speed, and good dielectric properties, which makes it have a wide application prospect in fields such as infrared optical windows, high-power LEDs, heat sinks of high-power and high-frequency electronic and optoelectronic devices and systems, high-performance radiation-resistant detectors and sensors, etc. At present, the most commonly used methods for preparing diamond include hot-wire chemical vapor deposition, high-temperature superhigh-pressure method, and microwave plasma chemical vapor deposition, etc. Among them, the MPCVD method has the characteristics of good controllability of diamond deposition process and no discharge electrode pollution, and is the preferred method for preparing high-quality diamond internationally.

[0027] The equipment for preparing diamond by MPCVD method is MPCVD equipment, which comprises a reaction cavity, a microwave generating device and a transmission channel, a gas feeding device and a gas outlet device, etc. Usually, the substrate or sample is placed on a sample table, and the sample table is placed in the reaction cavity which is sealed and vacuumized. The microwave generating device emits microwaves which are fed into the reaction cavity through the transmission channel. The gas feeding device inputs gas into the reaction cavity. The gas forms plasma above the sample table under the action of microwaves, and diamond film is deposited on the sample table.

[0028] Common MPCVD equipment includes cylindrical cavity MPCVD equipment and disc cavity MPCVD equipment. Due to the structural limitations, the microwave power in the reaction cavity of the cylindrical cavity MPCVD equipment is limited. For example, when the microwave power is large, additional plasma is formed near the quartz ring at the top of the reaction cavity, which easily causes damage to the cavity structure, and also causes diamond film to be deposited on the quartz ring at the top of the cavity during the growth of diamond film, which will affect the transmission of microwaves. At the same time, the size range of the plasma covered by the cylindrical cavity MPCVD equipment is small, and it is difficult to achieve high efficiency growth of diamond. Therefore, in order to improve the growth efficiency of diamond film, disc cavity MPCVD equipment is more and more used. It can increase the microwave power, so that the size range of the formed plasma is larger, and therefore the sample table for carrying diamond film can be designed larger than the cylindrical cavity MPCVD, thereby increasing the size of the diamond film grown thereon. Moreover, since the disc cavity cavity structure is different from the cylindrical cavity (the microwave of the cylindrical cavity MPCVD equipment is fed from the top of the cavity), the microwave of the disc cavity MPCVD equipment is fed into the reaction cavity from the bottom of the cavity, which can avoid the damage of other parts caused by the formation of other plasma at the top of the cavity as in the cylindrical cavity MPCVD equipment. Therefore, the disc cavity MPCVD equipment can improve the production capacity under the premise of reducing the damage of parts, and is more and more applied to the growth of diamond film.

[0029] The sealing property of the MPCVD reaction cavity has a great influence on the quality and performance of diamond film formation. The microwave transmission channel of the existing MPCVD equipment often has the defect of poor sealing property. For example, the disc cavity MPCVD equipment, the microwave transmission channel of which is connected to the bottom plate of the reaction cavity, and a quartz ring is arranged between the bottom plate and the sample table. The microwave generated by the microwave generating device reaches the quartz ring through the transmission channel, and is fed into the reaction cavity through the quartz ring. However, the distance between the sample table and the bottom plate of the existing reaction cavity is often not adjustable, and the size of the quartz ring is easily mismatched or changes after being used for a period of time, which causes a gap between the quartz ring and the sample table or the bottom plate, thereby affecting the sealing effect of the whole reaction cavity. Poor sealing easily causes the gas in the reaction cavity to leak through the upper and lower sides of the quartz ring, which affects the deposition efficiency or quality of diamond, or causes energy waste and other problems.

[0030] In view of the above, the application provides a sealing structure for a diamond deposition reaction chamber to solve the problem of poor sealing performance of the MPCVD device and improve the sealing performance of the MPCVD reaction chamber. The technical scheme of the application will be described in detail below with reference to the accompanying drawings and specific embodiments. Figures 1-6 and specific embodiments.

[0031] Please refer to Figs. 1-6, the sealing structure for a diamond deposition reaction chamber provided by the embodiments of the application includes a shielding cover 1 and a bottom plate 2 with a through hole 22, the bottom of the shielding cover 1 is fixedly connected with the bottom plate 2 to form a reaction chamber; a sample table 18 and a sleeve 14, the sample table 18 is arranged in the reaction chamber, one end of the sleeve 14 is fixedly connected with the sample table 18, the other end of the sleeve 14 is arranged outside the reaction chamber through the through hole 22 of the bottom plate 2, and a groove 19 is arranged on the outer wall of the part of the sleeve 14 located outside the reaction chamber; a quartz ring 21 arranged between the sample table 18 and the bottom plate 2; a clamping block 10 clamped in the groove 19 and fixedly connected with the sleeve 14; a locking nut 9 and a screw sleeve 7 located on the side of the clamping block 10 close to the bottom plate 2, the locking nut 9 is sleeved on the sleeve 14 and fixedly connected with the clamping block 10, the screw sleeve 7 is sleeved on the locking nut 9 through internal threads; a locking sleeve 8 sleeved on the locking nut 9 through internal threads and located between the screw sleeve 7 and the clamping block 10; and a resilient member having one end connected with the screw sleeve 7 and the other end connected with the bottom plate 2.

[0032] The sealing structure for a diamond deposition reaction chamber provided by the embodiments of the application can make the screw sleeve move upward relative to the locking nut and compress the spring by rotating the screw sleeve, so that the spring generates a downward elastic force, the elastic force is transmitted to the sleeve through the locking nut and the clamping block, the sleeve moves downward, the sample table moves downward due to the fixed connection between the sample table and the sleeve, the distance between the sample table and the bottom plate is shortened to compress the quartz ring arranged between the bottom plate and the sample table; when the screw sleeve is adjusted to a certain position, i.e., the bottom plate, the quartz ring and the sample table are completely compressed to reach a sealed state, the locking sleeve is further rotated to support the screw sleeve to prevent the screw sleeve from loosening, the sealing reliability of the sealing structure is further ensured, the problem of gas leakage in the reaction chamber through the upper and lower sides of the quartz ring due to poor sealing is prevented, the deposition efficiency or quality of the diamond on the sample table in the reaction chamber is improved, and energy waste is avoided.

[0033] The above-mentioned certain position refers to a preset position when the bottom plate, the quartz ring and the sample table are completely pressed to achieve a sealed state. For example, a scale can be provided on the locking nut 9, and the preset position is a specific preset scale value. The preset scale value can be different for different types of equipment. The preset scale value can be determined by the following method: rotate the sleeve 7 to the first preset scale value, perform airtightness test on the reaction chamber, for example, helium test. If it is found that there is a leakage point between the sample table and the quartz ring or between the quartz ring and the bottom plate during the helium test, the sleeve 7 can be further tightened, for example, by half a turn, one turn, etc., i.e. to the second preset scale value, and then the airtightness test is performed again. In this way, the cycle is repeated until the airtightness test determines that there is no leakage point between the sample table, the quartz ring and the bottom plate, which proves that the reaction chamber is well sealed. At this time, the position of the sleeve corresponding to the locking nut is determined as the above-mentioned certain position or the preset position or the preset scale value which can achieve good sealing.

[0034] In some embodiments, the diamond deposition reaction chamber sealing structure further comprises a waveguide ring 3, as shown in Figure 2 The waveguide ring 3 is sleeved on the sleeve 14, one end is connected with the bottom plate 2, and the other end is connected with the elastic member 6. The elastic member 6 is connected to the bottom plate 2 through the waveguide ring 3. In other embodiments, the waveguide ring 3 can be fixedly connected to the bottom plate by a screw. In this way, the propagation direction of the microwave generated by the microwave generator can be changed by the waveguide ring, so that it can be conducted into the reaction chamber to form a plasma in the reaction chamber to deposit a diamond film.

[0035] In some embodiments, the diamond deposition reaction chamber sealing structure further comprises a microwave generator 4, which is arranged on the side of the waveguide ring 3 and is sealingly connected with the waveguide ring 3. In this way, the microwave generator can generate microwaves, which are transmitted to the waveguide ring through the microwave transmission channel. The waveguide ring changes the transmission direction of the microwaves so that they can be conducted into the reaction chamber to form a plasma in the reaction chamber to deposit a diamond film.

[0036] In some embodiments, the side of the waveguide ring 3 close to the elastic member 6 is provided with a microwave shielding ring 17, and the inside of the waveguide ring 3 is provided with a waveguide cavity 13. One end of the waveguide cavity 13 communicates with the internal space surrounded by the quartz ring 21, and the other end is sealingly connected with the microwave shielding ring 17. In this way, by providing the microwave shielding ring, the microwaves can be prevented from being transmitted to places outside the reaction chamber through the other end of the waveguide ring, and only the microwaves can be transmitted to the reaction chamber through the waveguide cavity and the quartz ring, thereby improving the utilization efficiency of the microwaves and preventing energy waste and the like.

[0037] In some embodiments, the waveguide ring 3 is sleeved on the sleeve 14, one end is connected with the bottom plate 2, and the other end is connected with the microwave shielding ring 17. The elastic member 6 is connected with the waveguide ring 3 through the microwave shielding ring 17 and is further connected to the bottom plate 2.

[0038] In the embodiments of the present application, the sealing structure of the diamond deposition reaction chamber further comprises at least one sealing rubber ring 20, which is arranged between the sample table 18 and the quartz ring 21, and / or at least one sealing rubber ring 20 is arranged between the bottom plate 2 and the quartz ring 21. In some embodiments, the sealing rubber ring 20 can be one, for example, arranged between the sample table 18 and the quartz ring 21, or arranged between the bottom plate 2 and the quartz ring 21. In other embodiments, the sealing rubber ring 20 can be two, for example, one of which is arranged between the sample table 18 and the quartz ring 21, and the other is arranged between the bottom plate 2 and the quartz ring 21. Among them, the sealing rubber ring 20 can be a rubber sealing rubber ring or a plastic sealing rubber ring, etc. Therefore, through the arrangement of the sealing rubber ring, on the one hand, it can form a buffer between the sample table and the quartz ring, and / or between the bottom plate and the quartz ring, to prevent the quartz ring from being broken due to excessive stress during the extrusion process of the bottom plate and the sample table; on the other hand, the sealing rubber ring has excellent sealing performance, which is arranged between the quartz ring and the sample table and / or between the quartz ring and the bottom plate, which can improve the sealing effect between the quartz ring, the sample table and the bottom plate, and improve the overall sealing performance of the reaction chamber.

[0039] In some embodiments, the side of the sample table 18 close to the quartz ring 21 can be provided with a first groove, and the sealing rubber ring 20 can be at least partially arranged in the first groove. In other embodiments, the side of the bottom plate 2 close to the quartz ring 21 can be provided with a second groove, and the sealing rubber ring 20 can be at least partially arranged in the second groove. Therefore, the sealing rubber ring can be limited by the groove, which facilitates the installation of the sealing rubber ring and prevents the displacement of the sealing rubber ring due to excessive stress during the extrusion sealing process.

[0040] In some embodiments, the sealing structure of the diamond deposition reaction chamber further comprises a first grommet 23 arranged on one side of the screw sleeve 7 close to the elastic member 6 to clamp one end of the elastic member 6; and / or a second grommet 5 arranged on one side of the bottom plate 2 or the waveguide ring 3 close to the elastic member 6 to clamp the other end of the elastic member 6. Therefore, through the arrangement of the grommet, the installation of the elastic member can be more convenient, which can be more conveniently installed on the screw sleeve, and / or more conveniently installed on the bottom plate or the waveguide ring.

[0041] In some embodiments, the card block 10 comprises at least two cards, and the cards are fixedly connected to form the card block 10. In some embodiments, the card block 10 can be two, three or other number of cards, etc. Thus, by fixedly connecting the plurality of cards to form the card block, the card block can be more conveniently arranged in the groove on the sleeve, and the convenience and efficiency of the overall structure preparation and installation are improved.

[0042] In some embodiments, the interior of at least one card is provided with a first bolt 12, and is threadedly connected with the interior of the locking nut 9; or, the interior of at least one card is provided with at least two second bolts 11, and is threadedly connected with the interior of another card. In other embodiments, the interior of at least one card is provided with a first bolt 12, and is threadedly connected with the interior of the locking nut 9; and, the interior of at least one card is provided with at least two second bolts 11, and is threadedly connected with the interior of another card. Here, the interior thread refers to the thread in the threaded hole provided on the locking nut 9 or on the card, the first bolt 12 can be fixedly connected to the card block 10 through the thread on the locking nut 9, thereby forming the fixed connection of the locking nut 9 and the card block 10, and the second bolt 11 can be fixedly connected to another card through the thread, i.e., forming the fixed connection between the plurality of cards of the card block 10. Thus, by providing the bolts, the fixed connection between the card block and the locking nut, or between the cards in the card block can be more conveniently achieved. Especially by making the second bolt at least two, not only the fixed connection between the two cards can be formed, but also the stability of the connection between the cards can be ensured through the plurality of bolts, i.e., the connection stability of the card block is improved, thereby effectively improving the sealing effect of the sealing structure.

[0043] In some embodiments, the sleeve 14 comprises a water inlet pipe 15 and a water outlet pipe 16, wherein the water inlet pipe 15 is arranged outside the water outlet pipe 16, and the groove 19 is arranged on the outer wall of the water inlet pipe 15. The depth of the groove 19 is not particularly limited. In some embodiments, the depth of the groove 19 can be less than the wall thickness of the water inlet pipe 15. In other embodiments, the depth of the groove 19 can be greater than or equal to 1 / 5 of the wall thickness of the water inlet pipe 15, and the depth of the groove 19 can be less than or equal to 1 / 2 of the wall thickness of the water inlet pipe 15. Here, the depth of the groove refers to the depth of the groove formed by recessing inward from the outermost surface of the sleeve (for example, the water inlet pipe or the water outlet pipe located outside). Generally, while ensuring that the cross-sectional size of the water inlet passage of the water inlet pipe remains unchanged, if the depth of the groove is too large, the wall thickness of the water inlet pipe at the corresponding position will be too thin, and the cooling water in the water inlet pipe may leak or the water pipe may break. If the depth of the groove is too small, it is not conducive to the limiting and fixing of the clamping block, the clamping block is not stably connected, and the sealing effect of the entire sealing structure may be poor. Therefore, limiting the depth of the groove to between 1 / 5 and 1 / 2 of the wall thickness of the water inlet pipe can not only ensure that the clamping block can be stably connected, but also effectively prevent the cooling water in the water inlet pipe from leaking or breaking at the groove, thereby improving the use reliability and stability of the entire sealing structure.

[0044] In some embodiments, the water outlet pipe 16 is arranged outside the water inlet pipe 15, and the groove 19 can be arranged on the outer wall of the water outlet pipe 16. The depth of the groove 19 is not particularly limited. In some embodiments, the depth of the groove 19 can be less than the wall thickness of the water outlet pipe 16. In other embodiments, the depth of the groove 19 can be greater than or equal to 1 / 5 of the wall thickness of the water outlet pipe 16, and the depth of the groove 19 can be less than or equal to 1 / 2 of the wall thickness of the water outlet pipe 16. Generally, while ensuring that the cross-sectional size of the water outlet passage of the water outlet pipe remains unchanged, if the depth of the groove is too large, the wall thickness of the water outlet pipe at the corresponding position will be too thin, and the cooling water in the water outlet pipe may leak or the water pipe may break. If the depth of the groove is too small, it is not conducive to the limiting and fixing of the clamping block, the clamping block is not stably connected, and the sealing effect of the entire sealing structure may be poor. Therefore, limiting the depth of the groove to between 1 / 5 and 1 / 2 of the wall thickness of the water outlet pipe can not only ensure that the clamping block can be stably connected, but also effectively prevent the cooling water in the water outlet pipe from leaking or breaking at the groove, thereby improving the use reliability and stability of the entire sealing structure.

[0045] In some embodiments, the depth of the groove 19 can be greater than or equal to the wall thickness of the water inlet pipe 15 when the water inlet pipe 15 is located at the outermost position. In other embodiments, the depth of the groove 19 can be greater than or equal to the wall thickness of the water outlet pipe 16 when the water outlet pipe 16 is located at the outermost position. In some cases, in order to improve the service life of the water pipe, etc., it is necessary to ensure that the wall thickness of the water inlet pipe or the water outlet pipe is thick enough, and thus the cross-sectional area of the water inlet or outlet passage can be reduced to keep the wall thickness of the water pipe at the groove consistent with the wall thickness of the water pipe elsewhere, or even, due to the need for the groove to withstand the extrusion force of the clamping block, the wall thickness of the water pipe at the groove can be greater than the wall thickness of the water pipe elsewhere, thereby improving the service life of the water pipe and improving the service life and reliability of the entire sealing structure, etc.

[0046] Although the above embodiments of the present application have been shown and described, it is to be understood that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present application, and the scope of the present application is defined by the appended claims and their equivalents.

Claims

1. A sealing structure for a diamond deposition reaction chamber, characterized in that, include: A shield (1) and a base plate (2) having a through hole (22), wherein the bottom of the shield (1) is fixedly connected to the base plate (2) to form a reaction chamber; The sample stage (18) and the sleeve (14) are provided. The sample stage (18) is disposed inside the reaction chamber. One end of the sleeve (14) is fixedly connected to the sample stage (18). The other end of the sleeve (14) is disposed outside the reaction chamber through the through hole (22) of the base plate (2). Furthermore, a groove (19) is provided on the outer wall of the part of the sleeve (14) located outside the reaction chamber. A quartz ring (21) is disposed between the sample stage (18) and the base plate (2); The locking block (10) is engaged in the groove (19) and fixedly connected to the sleeve (14); A locking nut (9) and a threaded sleeve (7) are located on the side of the locking block (10) near the bottom plate (2). The locking nut (9) is sleeved on the sleeve (14) and fixedly connected to the locking block (10). The threaded sleeve (7) is sleeved on the locking nut (9) through its internal thread. The locking sleeve (8) is fitted onto the locking nut (9) by its internal threads and is located between the threaded sleeve (7) and the retaining block (10); And an elastic element (6), one end of which is connected to the threaded sleeve (7) and the other end of which is connected to the base plate (2).

2. The sealing structure for the diamond deposition reaction chamber according to claim 1, characterized in that, Also includes: A waveguide ring (3) is sleeved on the sleeve (14), with one end connected to the base plate (2) and the other end connected to the elastic element (6), wherein the elastic element (6) is connected to the base plate (2) through the waveguide ring (3).

3. The sealing structure for the diamond deposition reaction chamber according to claim 2, characterized in that, Also includes: A microwave generator (4) is disposed on the side of the waveguide ring (3) and is sealed to the waveguide ring (3).

4. The sealing structure for the diamond deposition reaction chamber according to claim 1, characterized in that, Also includes: At least one sealing ring (20) is disposed between the sample stage (18) and the quartz ring (21), and / or at least one sealing ring (20) is disposed between the base plate (2) and the quartz ring (21).

5. The sealing structure for the diamond deposition reaction chamber according to claim 2, characterized in that, Also includes: A first washer (23) is disposed on the side of the threaded sleeve (7) near the elastic member (6) to engage one end of the elastic member (6); and / or, The second washer (5) is disposed on the side of the base plate (2) or the waveguide ring (3) near the elastic member (6) to engage the other end of the elastic member (6).

6. The sealing structure for the diamond deposition reaction chamber according to claim 1, characterized in that, The card block (10) includes at least two cards, which are fixedly connected to form the card block (10).

7. The sealing structure for the diamond deposition reaction chamber according to claim 6, characterized in that, At least one of the cards has a first bolt (12) that passes through its interior and is threadedly connected to the locking nut (9); and / or, At least one of the cards has at least two second bolts (11) through its interior and is threadedly connected to the interior of another card.

8. The sealing structure for the diamond deposition reaction chamber according to claim 2, characterized in that, A microwave shielding ring (17) is provided on the side of the waveguide ring (3) near the elastic member (6), and a waveguide cavity (13) is provided on the inner side of the waveguide ring (3). One end of the waveguide cavity (13) is connected to the internal space enclosed by the quartz ring (21), and the other end is sealed to the microwave shielding ring (17).

9. The sealing structure for a diamond deposition reaction chamber according to any one of claims 1-8, characterized in that, The sleeve (14) includes an inlet pipe (15) and an outlet pipe (16), wherein, The inlet pipe (15) is arranged around the outside of the outlet pipe (16), and the groove (19) is provided on the outer wall of the inlet pipe (15); or, The outlet pipe (16) is arranged around the outside of the inlet pipe (15), and the groove (19) is provided on the outer wall of the outlet pipe (16).

10. The sealing structure for a diamond deposition reaction chamber according to claim 9, characterized in that, The depth of the groove (19) is greater than or equal to 1 / 5 of the wall thickness of the water inlet pipe (15), and the depth of the groove (19) is less than or equal to 1 / 2 of the wall thickness of the water inlet pipe (15); or, The depth of the groove (19) is greater than or equal to 1 / 5 of the wall thickness of the outlet pipe (16), and the depth of the groove (19) is less than or equal to 1 / 2 of the wall thickness of the outlet pipe (16); or, The depth of the groove (19) is greater than or equal to the wall thickness of the inlet pipe (15); or, The depth of the groove (19) is greater than or equal to the wall thickness of the water outlet pipe (16).

Images