Photoetching mechanism and exposure device

Abstract

The utility model provides a photoetching mechanism and an exposure device, and the photoetching mechanism comprises an etching assembly which is used for emitting laser for etching; the visual component is used for acquiring pattern information of the workpiece to be etched; the lens box is fixedly connected with the etching assembly and the visual assembly, a first light guide channel between the etching assembly and the to-be-etched workpiece and a second light guide channel between the to-be-etched workpiece and the visual assembly are formed in the lens box, error superposition can be avoided by completing visual positioning and etching through the photoetching mechanism, and even if errors exist, the etching efficiency is improved. However, positioning and etching are completed through a photoetching mechanism, error calculation is simple, and errors are easy to compensate for the occurring errors.

Description

TECHNICAL FIELD

[0001] The utility model relates to energy science and technology, power and electrical engineering technical field, especially related to a photoetching mechanism and exposure device. BACKGROUND

[0002] In the prior art exposure machine device, as shown in the figure, the visual assembly 400 and the etching assembly 500 are usually located on the gantry 200. Figure 1 In work, the visual assembly 400 first moves with the gantry 200, and the workpiece 300 is positioned visually, and the position relationship of the workpiece 300 relative to the exposure machine device is obtained, then the etching assembly 500 moves with the gantry 200, and the workpiece 300 is etched according to the position relationship information and the etching pattern information, and the visual assembly 400 and the etching assembly 500 can be on the same gantry 200.

[0003] However, the etching assembly 500 and the visual assembly 400 in the above-mentioned scheme are driven separately, and due to the errors of the motor, the track, the code disc and the grating ruler, the visual assembly 400 and the etching assembly 500 are controlled by two sets of systems respectively, so that the motion precision error is superimposed.

[0004] Moreover, the motion assembly, the visual assembly 400 and the etching assembly 500 of different batches will appear positive error and negative error, so that the error superposition calculation method of each device is different, and the test and error compensation are more difficult. Invention Content

[0005] The utility model embodiment provides an exposure device, avoids the error superposition of two sets of systems of visual assembly and etching assembly, and solves the problems of complex error calculation and difficult error compensation.

[0006] According to the first aspect of the utility model, a photoetching mechanism is provided, which comprises:

[0007] The etching assembly is used for emitting laser for etching;

[0008] The visual assembly is used for acquiring the pattern information of the workpiece to be etched;

[0009] The lens box is fixedly connected with the etching assembly and the visual assembly, and the lens box forms a first light guide channel between the etching assembly and the workpiece to be etched, and a second light guide channel between the workpiece to be etched and the visual assembly.

[0010] Preferably, the lens box is provided with a lens arranged at a preset angle with respect to the axis of the non-orthogonal assembly, the lens being used for reflecting light of the non-orthogonal assembly to the workpiece to be etched or reflecting light of the workpiece to be etched to the non-orthogonal assembly, the non-orthogonal assembly being the etching assembly or the visual assembly which is not orthogonal to the workpiece to be etched.

[0011] Preferably, the lens is also used for transmitting light between the orthogonal assembly and the workpiece to be etched, the orthogonal assembly being the etching assembly or the visual assembly which is orthogonal to the workpiece to be etched.

[0012] Preferably, the intersection of the axis of the etching assembly and the axis of the visual assembly is located at the lens.

[0013] Preferably, one of the etching assembly and the visual assembly is connected to the top of the lens box, and the other is connected to the side of the lens box, the lens box being provided with a connecting port and being connected to the visual assembly through the connecting port.

[0014] Preferably, the etching assembly comprises a lens box for light guiding, and the laser exit end of the lens box is connected to the top of the lens box.

[0015] According to the second aspect of the present application, an exposure device is also provided, comprising a base and a support frame arranged on the base, the base being used for placing a workpiece to be etched; the support frame can move relative to the base, and the exposure device further comprises a photoetching mechanism and a power mechanism, the photoetching mechanism being arranged on the support frame, and the power mechanism being used for driving the photoetching mechanism to move relative to the support frame.

[0016] Preferably, the support frame can move relative to the base along a first direction, the support frame extends along a second direction, the photoetching mechanism can move relative to the support frame along the second direction, and the first direction is perpendicular to the second direction.

[0017] According to the first aspect of the present application, the position information of the workpiece can be acquired and the workpiece can be etched at the same time through the photoetching mechanism, and the error superposition can be avoided through the visual positioning and etching completed by the photoetching mechanism, even if there is an error, the error calculation is simple and the error can be easily compensated for the error.

[0018] Further, by combining the etching assembly and the visual assembly into one in structure, the error is generated in the same system, which is easy to calculate and compensate. At the same time, since the etching assembly and the visual assembly share a set of power mechanisms, compared with the prior art in which the etching assembly and the visual assembly are respectively provided with a set of power mechanisms, the cost is saved. BRIEF DESCRIPTION OF DRAWINGS

[0019] In order to more clearly illustrate the technical solutions in the specific embodiments or prior art of the present application, the drawings required to be used in the description of the specific embodiments or prior art will be briefly introduced as follows. Obviously, the drawings in the following description are some embodiments of the present application, and for those skilled in the art, other drawings can also be obtained without creative labor on the basis of these drawings.

[0020] Figure 1 A structural diagram of an exposure device in the prior art is shown;

[0021] Figure 2 A structural diagram of a photoetching mechanism in one embodiment of the present application is shown;

[0022] Figure 3 A structural diagram of a first box in one embodiment of the present application is shown;

[0023] Figure 4 A structural diagram of an exposure device in one embodiment of the present application is shown;

[0024] In the figure: 1, base; 2, support frame; 3, workpiece; 4, visual assembly; 5, etching assembly; 6, lens box; 7, lens; 8, connecting port; 51, DMD; 52, laser; 53, lens box; 54, reflecting mirror. DETAILED DESCRIPTION

[0025] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific embodiments of the present application will be described in detail below with reference to the drawings. It can be understood that the specific embodiments described here are only used to explain the present application, but not to limit the present application. In addition, it should be noted that, for the convenience of description, only the parts related to the present application are shown in the drawings, but not all the structures. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor are within the scope of protection of the present application.

[0026] The terms "comprising" and "having" and any variations thereof in the present application are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device including a series of steps or units is not limited to the listed steps or units, but optionally also includes steps or units not listed, or optionally also includes other steps or units inherent to these processes, methods, products or devices.

[0027] Reference to an "embodiment" herein means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the application. The appearances of the phrase in various places in the specification are not necessarily all referring to the same embodiment, nor are they necessarily mutually exclusive of one another. As will be apparent to those of ordinary skill in the art, embodiments described herein can be combined with other embodiments.

[0028] Figure 2 The structure diagram of the exposure device of one embodiment of the utility model is shown. Figure 2 As shown in the figure, in one embodiment, the photoetching mechanism includes etching assembly 5, visual assembly 4 and lens box 6. Etching assembly 5 is used to emit laser for etching. Visual assembly 4 is used to acquire the pattern information of the workpiece to be etched 3. Lens box 6 is fixedly connected with etching assembly 5 and visual assembly 4, and the first light guide channel between etching assembly 5 and the workpiece to be etched 3 and the second light guide channel between the workpiece to be etched 3 and visual assembly 4 are formed in lens box 6.

[0029] Generally, as shown in the figure, etching assembly 5 includes lens box 53, DMD (digital micro mirror) 51, laser 52 and mirror 54. DMD 51 is installed on the top of lens box 53, laser 52 is installed on one side of lens box 53 and has a light guide channel with lens box 53, and mirror 54 is installed at a set angle inside lens box 53, and lens box 53 and lens box 6 have a light guide channel. Figure 2

[0030] The embodiment forms a photoetching mechanism by combining visual assembly 4 and etching assembly 5, so that the relative positions of visual assembly 4 and etching assembly 5 are fixed values, and thus the position errors of the two are also fixed values. The acquisition and compensation of the position error existing in the same system are relatively simple, and the fixed position error can be obtained through one-time calibration, and the accuracy of the etching pattern can be ensured by using the position error for compensation during photoetching. That is, the embodiment combines visual assembly 4 and etching assembly 5 fixedly, so that the errors of the two are the errors in the same system, and the errors are simple and easy to acquire and compensate, which can effectively improve the etching accuracy.

[0031] When there is a difference between the installation position of visual assembly 4 during installation and the ideal installation position, an error will occur, but since visual assembly 4 and etching assembly 5 are fixedly installed, the error between the position recognition point positioned by visual assembly 4 and the etching point of etching assembly 5 is always a fixed value, so when visual assembly 4 is moved according to the fixed value after positioning by visual assembly 4 each time, the error can be compensated.

[0032] ​In one embodiment, at most one of the etching assembly 5 and the visual assembly 4 is arranged opposite the etching workpiece 3, and hereinafter, the etching assembly 5 or the visual assembly 4 arranged opposite the etching workpiece 3 is referred to as the opposite assembly, and the etching assembly 5 or the visual assembly 4 not arranged opposite the etching workpiece 3 is referred to as the non-opposite assembly, and the arrangement opposite the etching workpiece 3 can be understood as that the axis of the opposite assembly is substantially perpendicular to the plane in which the etching workpiece 3 is arranged, i.e. perpendicular to the plane or having a small included angle with the vertical plane of the plane. In this embodiment, the lens box 6 is provided with the lens 7 arranged at a preset angle with the axis of the non-opposite assembly. When the non-opposite assembly is the visual assembly 4, the lens 7 is used to reflect the pattern of the etching workpiece 3 to the visual assembly 4; when the non-opposite assembly is the etching assembly 5, the lens 7 is used to reflect the laser of the etching assembly 5 to the etching workpiece 3. It can be understood that when neither the etching assembly 5 nor the visual assembly 4 is arranged opposite the etching workpiece 3, the number of the lens 7 should be 2, corresponding to the etching assembly 5 and the visual assembly 4 respectively, and here the etching assembly 5 and the visual assembly 4 can be arranged in parallel or not arranged in parallel, which is not limited herein. When one of the etching assembly 5 and the visual assembly 4 is the opposite assembly, the light between the opposite assembly and the etching workpiece 3 can pass through the lens 7 or not pass through the lens 7, which is not limited herein.

[0033] When the visual assembly 4 and the etching assembly 5 are installed at the lens box 6, since the etching assembly 5 generally includes the lens box 53 for guiding light, the laser exit end of the lens box 53 is generally located at the bottom of the lens box 53, and the lens box 53 can be directly connected with one face of the lens box 6. For the visual assembly 4, a connecting port needs to be arranged at the lens box 6.

[0034] Figure 3 The structure diagram of the lens box in one embodiment of the present application is shown. In one embodiment, as shown in Figure 2 , the etching assembly 5 is arranged in the vertical direction, and the visual assembly 4 is arranged in the horizontal direction, the lens 7 is used to transmit the laser emitted by the etching assembly 5, and the lens 7 is also used to reflect the pattern of the etching workpiece 3 to the visual assembly 4. As shown in Figure 2 , in the embodiment, the preset angle is 45°, so that the visual assembly 4 and the etching assembly 5 are arranged vertically. Specifically, the laser exit end of the lens box 53 of the etching assembly 5 is connected with the lens box 6. The top of the lens box 6 is connected with the etching assembly 5, one side of the lens box 6 is provided with the connecting port 8 (see Figure 3 ), and the lens box 6 is connected with the visual assembly 4 through the connecting port 8, for example, the visual assembly 4 is connected at the connecting port 8 through screw threads. The vertically arranged visual assembly 4 and etching assembly 5 are convenient to assemble at the lens box 6. Of course, in other embodiments not shown, the preset angle can also be other values, which is not limited herein.

[0035] The lens box 6 of the embodiment is provided with a lens 7 arranged at a set angle, the lens 7 is used for transmitting the light of the laser 52 so that the light of the laser 52 is emitted to the workpiece to be etched, and the lens is also used for reflecting the light emitted from the workpiece 3 to be etched to the visual assembly 4. By arranging the connecting port 8, the lens box 6 is communicated with the visual assembly 4, the outlet of the etching assembly 5 emitting the laser can be consistent with the light inlet of the visual assembly 4 acquiring the position identification point, and the structure of the lens box 6 can be simplified.

[0036] In the embodiment, the light can be perpendicular to the workpiece 3 to be etched when the etching assembly 5 and the visual assembly 4 are arranged at an angle by arranging the lens 7, and the etching assembly 5 and the visual assembly 4 arranged at an angle are more conducive to heat dissipation than the arrangement of the two assemblies arranged side by side.

[0037] In a further embodiment, the intersection of the axis of the etching assembly 5 and the axis of the visual assembly 4 is located at the lens 7, and when the assembly precision meets the requirements, the visual focus of the visual assembly 4 and the laser focus of the etching assembly 5 can be the same point, so that errors during etching are avoided.

[0038] Figure 4 The structure diagram of the exposure device of one embodiment of the utility model is shown. Figure 4 As shown in the figure, the utility model discloses an exposure device, which comprises a base 1 and a support frame 2 arranged on the base 1, and the base 1 is used for placing a workpiece 3 to be etched. The support frame 2 can move relative to the base, and the exposure device further comprises a photoetching mechanism and a power mechanism. The photoetching mechanism is arranged on the support frame 2, and the power mechanism is used for driving the photoetching mechanism to move relative to the support frame 2. In one embodiment, the support frame 2 can move relative to the base 1 along a first direction (see B in the figure) Figure 3 , and the support frame 2 extends along a second direction (see A in the figure) Figure 3 . The photoetching mechanism can move relative to the support frame 2 along the second direction, and the first direction is perpendicular to the second direction.

[0039] The power mechanism provides power for the photoetching mechanism to drive the photoetching mechanism to move along the extension direction of the support frame 2. At the same time, the support frame 2 moves relative to the base 1 along the first direction, so that the photoetching mechanism can cover the entire area of the workpiece 3. During the working process of the photoetching mechanism, the visual assembly 4 can acquire the position identification point information of the workpiece 3, and the etching assembly 5 can etch the workpiece 3 according to the position identification point. The specific working mode is as follows: first, acquire the position information, drive the visual assembly 4 to move by the support frame 2, and drive the visual assembly 4 to step by the power mechanism, so that the visual assembly 4 scans the pattern on the workpiece, i.e. the position identification point (Mark point); then etch the workpiece, drive the etching assembly 5 to move by the support frame 2, and drive the etching assembly 5 to step by the power mechanism, so that the etching assembly 5 scans the etching area on the workpiece 3.

[0040] Since the visual assembly 4 and the etching assembly 5 share the same set of power mechanisms, the motion accuracy errors of the two assemblies are generally positive or negative, and the values are close or equal. The measurement and calculation of the errors are simpler than the prior art.

[0041] The support frame is movable relative to the base in a first direction, the support frame extends in a second direction, the lithography mechanism is movable relative to the support frame 2 in the second direction, and the first direction is perpendicular to the second direction.

[0042] The lithography mechanism moves along the support frame 2 in the second direction, and the support frame 2 moves along the base 1 in the first direction. Through the two movements, the scanning range of the lithography mechanism on the support frame 2 can fully cover the workpiece 3.

[0043] By structurally integrating the etching assembly 5 and the visual assembly 4, sharing the same set of power mechanisms, tracks, encoders, and grating rulers, even if there is an error, the error is generated in the same set of systems, which is easy to calculate and compensate.

[0044] Further, since the etching assembly 5 and the visual assembly 4 share a set of power mechanisms, compared with the prior art scheme in which the etching assembly and the visual assembly are respectively equipped with a set of power mechanisms, the cost is saved.

[0045] The specific structure is as follows: a lens box is additionally arranged below the lens, a lens at an angle of 45 degrees is installed in the lens box, the angle can be changed, that is, 45 degrees is the best during the experiment, the light can directly pass through the lens or be reflected by the lens, that is, the mirror 54 in the etching assembly 5 emits the light projected by the laser 52, and then the light is reflected by the DMD 51 and passes through the lens 7 in the lens box 6 to the workpiece 3, while the visual assembly 4 emits light through the lens 7, receives the light, and positions the workpiece 3 through the light.

[0046] The bottom of the lens box is open, that is, the bottom of the etching assembly 5 and the bottom of the lens box 6 are open, the etching assembly 5 communicates with the lens box 6 through the bottom opening for the light to enter or exit, and the side of the lens box 6 is provided with a mounting port, that is, the etching assembly 5 and the lens box 6 are provided with mounting ports on one side, the etching assembly 5 is used for mounting the laser 52, the lens box 6 is used for mounting and communicating with the visual assembly 4, and the light can enter the visual assembly 4 through the mounting port.

[0047] The working mode of the visual assembly 4 is that the light enters the lens box from the opening, that is, the light enters from the opening at the bottom of the lens box 6, is reflected by the lens 7, and is projected into the visual assembly 4 through the connecting port 8 on one side of the lens box 6, based on which the visual assembly 4 obtains the position information of the mark (position recognition point) on the workpiece 3.

[0048] The working mode of the etching assembly 5: the light emitted by the laser light source passes through the lens after the lens, is projected onto the lens 7, and passes through the lens 7 to project onto the workpiece 3, that is, the light emitted by the laser 52 is reflected by the mirror 54 in the etching assembly 5 to the DMD 51 at the top of the etching assembly 5, and is reflected by the DMD 51 to project onto the lens 7 in the lens box 6, and passes through the lens 7 to project onto the workpiece 3, and the workpiece 3 is etched.

[0049] In work, the visual assembly 4 and the etching assembly 5 move simultaneously through the transmission mechanism, for example, the visual assembly 4 and the etching assembly 5 move left and right on the support frame 2 along the A direction, and the visual assembly 4 and the etching assembly 5 move forward and backward on the base 1 along the B direction with the support frame 2. The visual assembly 4 works first to obtain the relative position of the workpiece 3, and then the etching assembly 5 works to etch the workpiece 3 according to the position information and image data obtained by the visual assembly 4.

[0050] The above exposure device can be controlled according to the following control method, a control method of an exposure device, comprising:

[0051] Step S100, control the support frame 2 to drive the visual assembly 4 to move, and the power mechanism drives the visual assembly 4 to step, so that the visual assembly 4 obtains the position identification point on the workpiece 3 to be etched;

[0052] Step S200, adjust the position of the etching assembly 5 according to the error compensation value, and the error compensation value is the position error of the visual assembly 4 and the etching assembly 5 calibrated in advance;

[0053] Step S300, control the support frame 2 to drive the etching assembly 5 to move, and the power mechanism drives the etching assembly 5 to step, so that the etching assembly 5 etches the etching area of the workpiece 3 to be etched.

[0054] In step S300, the etching assembly 5 etches the etching area of the workpiece 3 to be etched, comprising:

[0055] Control the laser 52 of the etching assembly 5 to emit light to etch the workpiece 3 to be etched after passing through the lens box 6.

[0056] In step S200, the acquisition of the position error comprises:

[0057] Step S210, etching a calibration identification point on the workpiece 3 to be etched and recording the first position information of the etching assembly 5 at present;

[0058] Step S220, control the visual assembly 4 to move to align the calibration identification point, and record the second position information of the etching assembly 5 at this time;

[0059] Step S230, calculating the position error according to the first position information and the second position information.

[0060] The technical features of the above-described embodiments can be combined in any manner. For the sake of brevity, not all possible combinations of the technical features in the above-described embodiments are described, however, as long as the combination of the technical features does not result in a contradiction, it should be considered within the scope of the present disclosure.

[0061] The above-described embodiments only express several implementation manners of the present application, and the description is relatively specific and detailed, but it should not be understood as a limitation on the scope of the present application. It should be pointed out that, for ordinary skilled persons in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which are all within the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the appended claims.

Claims

1. A lithographic apparatus comprising, The exposure device comprises: an etching assembly (5) for emitting laser for etching; a visual assembly (4) for acquiring pattern information of a workpiece (3) to be etched; a lens box (6) fixedly connected with the etching assembly (5) and the visual assembly (4), the lens box (6) forming a first light guide channel between the etching assembly (5) and the workpiece (3) to be etched, and a second light guide channel between the workpiece (3) to be etched and the visual assembly (4).

2. The photolithography mechanism according to claim 1, wherein The lens box (6) is provided with a lens (7) arranged at a preset angle with respect to the axis of a non-orthogonal assembly, the lens (7) being used for reflecting light of the non-orthogonal assembly to the workpiece (3) to be etched or reflecting the pattern of the workpiece (3) to be etched to the non-orthogonal assembly, the non-orthogonal assembly being the etching assembly (5) and / or the visual assembly (4) not orthogonal to the workpiece (3) to be etched.

3. The photolithography mechanism according to claim 2, wherein The lens (7) is also used for transmitting light between an orthogonal assembly and the workpiece (3) to be etched, the orthogonal assembly being the etching assembly (5) or the visual assembly (4) orthogonal to the workpiece (3) to be etched.

4. The photolithography mechanism according to claim 3, wherein The intersection of the axis of the etching assembly (5) and the axis of the visual assembly (4) is located at the lens (7).

5. The lithographic apparatus of any one of claims 1-4, wherein, One of the etching assembly (5) and the visual assembly (4) is connected to the top of the lens box (6), and the other is connected to the side of the lens box (6), the lens box (6) being provided with a connecting port (8) and being connected with the visual assembly (4) through the connecting port (8).

6. The photolithography mechanism according to claim 5, wherein The etching assembly (5) comprises a lens box (53) for guiding light, the laser exit end of the lens box (53) being connected with the top of the lens box (6).

7. An exposure apparatus comprising a base (1) for placing a workpiece (3) to be etched and a support frame (2) provided on the base (1), the support frame being movable relative to the base (1), characterized in that The exposure device further comprises the photolithography mechanism of any one of claims 1 to 3 and a power mechanism, the photolithography mechanism being arranged on the support frame (2), and the power mechanism being used for driving the photolithography mechanism to move relative to the support frame (2).

8. The exposure apparatus according to claim 7, wherein The support frame (2) is movable relative to the base (1) along a first direction, the support frame (2) extending along a second direction, and the photolithography mechanism is movable relative to the support frame (2) along the second direction, the first direction being perpendicular to the second direction.

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