Low-reflection gray LOW-E glass

Abstract

The utility model discloses low-reflection gray LOW-E glass, and relates to the technical field of coated glass. The low-reflection gray LOW-E glass disclosed by the utility model comprises a glass substrate layer and a coating layer, the coating layer is arranged on one side of the glass substrate layer and comprises a bottom dielectric medium combination layer, a first protection layer, a first transition layer, a metal functional layer, a second transition layer, a second protection layer, a top dielectric medium protection layer and an anti-reflection layer which are sequentially stacked; and one side, opposite to the first protection layer, of the bottom dielectric medium combination layer is attached to the glass substrate layer. The coated glass disclosed by the utility model is light gray in appearance color, small in color deviation and good in overall aesthetic property; after the tempering process, the film layer is stable and does not have the defects of cracking, demolding, scratching and the like; the visible light transmittance reaches 70% or above after tempering, the visible light reflectivity is about 15%, the production cost is low, and the application prospect is good.

Description

TECHNICAL FIELD

[0001] The utility model relates to a coated glass technical field, especially in low reflection gray LOW-E glass. BACKGROUND

[0002] Low emissivity coated glass is also called Low-E glass, which means that a plurality of metal or other compound films are coated on the surface of the glass. Due to the existence of the film, the surface emissivity of the coated glass is lower than that of ordinary glass and has spectral selectivity. LOW-E glass has been widely used in the field of building curtain wall due to its elegant color, good texture and excellent energy-saving properties. In order to reduce light pollution, according to the latest national standard, the reflectivity of wall and window glass must be controlled below 30%, so low reflectivity is one of the basic requirements of Low-E glass.

[0003] Ordinary single-silver Low-E glass has a simple film system, and in order to achieve high energy-saving performance, the visible light transmittance of the product is sacrificed. The low visible light transmittance reduces the lighting effect of the glass, and only has a small range of application market in the sunny southern region, which limits the application of improved single-silver Low-E to a certain extent; although double-silver Low-E can meet the above energy-saving performance and high light transmittance requirements, the production technology is difficult, and the existence of angle color deviation, film uniformity and off-site steelability technical problems leads to high production cost.

[0004] In order to solve the above technical problems, it is necessary to develop a high-quality Low-E glass with low reflectivity, high light transmittance, good appearance color and low cost. CONTENT OF THE UTILITY MODEL

[0005] The main purpose of the utility model is to provide a low reflection gray LOW-E glass, which aims to obtain a high-transmittance single-silver low-emissivity glass with elegant appearance, strong universality and low processing cost.

[0006] In order to achieve the above purpose, the low reflection gray LOW-E glass provided by the utility model comprises a glass substrate layer and a coating layer; the coating layer comprises a bottom dielectric combination layer, a first protective layer, a first transition layer, a metal functional layer, a second transition layer, a second protective layer, a top dielectric combination layer and an anti-reflection layer which are sequentially stacked; the bottom dielectric combination layer is attached to the glass substrate layer on the side away from the first protective layer.

[0007] In an embodiment, the bottom dielectric composite layer comprises a first nitride layer and a first oxide layer, the first nitride layer is adjacent to the glass substrate layer, and the first oxide layer is adjacent to the first protective layer; wherein the thickness of the first nitride layer is 35-45 nm; optionally, the thickness of the first oxide layer is 5-10 nm.

[0008] In an embodiment, the top dielectric composite layer comprises a second nitride layer and a second oxide layer, the second nitride layer is adjacent to the second protective layer, and the second oxide layer is adjacent to the anti-reflection layer; wherein the thickness of the second nitride layer is 55-60 nm; optionally, the thickness of the second oxide layer is 5-10 nm.

[0009] In an embodiment, the bottom dielectric composite layer comprises at least two dielectric layers; at least one dielectric layer is a first oxide layer, and at least another dielectric layer is a first nitride layer; wherein in an embodiment, the first oxide layer is selected from any one of a ZrOx layer, a ZnOx layer, a TiOx layer, an AZO layer, and a ZnAlOx layer; optionally, the first nitride layer is selected from any one of a ZrNx layer, a SiNx layer, a SiZrNx layer, a TiZrNx layer, and a SiTiNx layer.

[0010] In an embodiment, the top dielectric composite layer comprises at least two dielectric layers; at least one dielectric layer is a second oxide layer, and at least another dielectric layer is a second nitride layer; wherein the second oxide layer is selected from any one of a SiOx layer, a ZrOx layer, a TiOx layer, a SnOx layer, a BiOx layer, and a ZnOx layer; optionally, the second nitride layer is selected from any one of a ZrNx layer, a SiNx layer, a SiZrNx layer, a TiZrNx layer, and a SiTiNx layer.

[0011] In an embodiment, the thickness of the bottom dielectric composite layer is 40-55 nm.

[0012] In an embodiment, the thickness of the top dielectric composite layer is 60-70 nm.

[0013] In an embodiment, the first protective layer is selected from any one of a nickel-chromium alloy layer, a chromium layer, a stainless steel layer, a nickel-chromium nitride alloy layer, and a chromium nitride layer.

[0014] In an embodiment, the second protective layer is selected from any one of a nickel-chromium alloy layer, a chromium layer, a stainless steel layer, a nickel-chromium nitride alloy layer, and a chromium nitride layer.

[0015] In an embodiment, the metal functional layer is selected from any one of Ag layer, AgCu layer, AgAl layer and AgCr layer.

[0016] In an embodiment, the first transition layer is selected from Ti layer.

[0017] In an embodiment, the second transition layer is selected from Ti layer.

[0018] In an embodiment, the anti-reflective layer is selected from any one of SiOx layer, TiOx layer and SiNx layer.

[0019] In an embodiment, the first protective layer has a thickness of 2nm-3nm.

[0020] In an embodiment, the second protective layer has a thickness of 3nm-5nm.

[0021] In an embodiment, the metal functional layer has a thickness of 6nm-9nm.

[0022] In an embodiment, the first transition layer has a thickness of 2nm-5nm.

[0023] In an embodiment, the second transition layer has a thickness of 3nm-6nm.

[0024] In an embodiment, the anti-reflective layer has a thickness of 5nm-15nm.

[0025] In an embodiment, the sum of the thicknesses of the first protective layer, the first transition layer, the metal functional layer, the second transition layer and the second protective layer is 15nm-22nm.

[0026] In an embodiment, the ratio of the thicknesses of the bottom dielectric combined layer and the top dielectric combined layer is 1: (1.1-1.5).

[0027] In an embodiment, the ratio of the thicknesses of the bottom dielectric combined layer and the top dielectric combined layer is 1:1.35.

[0028] In an embodiment, the bottom dielectric combined layer has a thickness of 48nm, the top dielectric combined layer has a thickness of 65nm, the first protective layer has a thickness of 5.2nm and the second protective layer has a thickness of 7.25nm.

[0029] The technical scheme of the utility model discloses a novel single-silver structure, wherein the bottom dielectric composite layer attached to the glass substrate in the film layer structure is a "SiNx+ZnAlOx" composite structure, the metal functional layer is a silver layer, the functional silver layer is provided with a "Ti+NiCr" composite structure as a transition layer and a protective layer in front and back, the appearance color of the low-reflection gray LOW-E glass prepared through the thickness ratio design of each film layer is light gray, the side is light yellow, and the glass is transparent, fresh and coordinated with the building environment; the front side color difference Delta a is less than 2.5, the small-angle color deviation is small, the color deviation is small in different angle observation, the color uniformity is good, and the overall appearance of the coated glass is good; in addition, the "Ti+NiCr" composite structure is used in front and back of the functional silver layer, the film layer thermal processing stability is improved, the glass flat tempering and bending tempering process are applicable, and the processing engineering will not appear defects such as cracking, oxidation, film peeling and scratching; through the reasonable design of the film layer material and thickness, the visible light transmittance of the low-reflection gray LOW-E glass is more than 70% after tempering, and the visible light reflectance is about 15%. BRIEF DESCRIPTION OF DRAWINGS

[0030] In order to more clearly illustrate the technical scheme in the embodiments of the utility model or the prior art, the drawings needed to be used in the embodiment or the prior art description will be briefly introduced below, and obviously, the drawings in the following description are only some embodiments of the utility model, and for those skilled in the art, other drawings can be obtained according to the structure shown in the drawings without creative labor.

[0031] Figure 1 It is the structural schematic diagram of the low-reflection gray LOW-E glass of the embodiment of the utility model. BRIEF DESCRIPTION OF DRAWINGS

[0033] 1, glass substrate layer;2, bottom dielectric composite layer;21, first nitride layer;22 first oxide layer;3, first protective layer;4, first transition layer;5, metal functional layer;6, second transition layer;7, second protective layer;8, top dielectric composite layer;81, second nitride layer;82, second oxide layer;9, antireflection layer.

[0034] The realization, functional characteristics and advantages of the utility model will be further explained by combining with the embodiments and referring to the drawings. DETAILED DESCRIPTION

[0035] With reference to the accompanying drawings, the technical solutions in the embodiments of the present application will be clearly and completely described below, obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.

[0036] It should be noted that if the embodiments of the present application involve directional indications (such as up, down, left, right, front, back, etc.), the directional indications are only used to explain the relative positional relationship, movement condition, etc. between components in a certain posture, and if the certain posture changes, the directional indications also change accordingly.

[0037] In addition, if the embodiments of the present application involve descriptions of "first", "second", etc., the descriptions of "first", "second", etc. are only for description purposes, and cannot be understood as indicating or implying the relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features limited by "first" and "second" can explicitly or implicitly include at least one of the features.

[0038] In addition, the technical solutions of each embodiment can be combined with each other, but it must be based on the fact that a person skilled in the art can realize it, and when the combination of technical solutions appears contradictory or unachievable, it should be considered that the combination of technical solutions does not exist and is not within the scope of protection required by the present application.

[0039] The conventional ordinary single-silver Low-E glass film system has a simple structure, in order to achieve high energy-saving performance, the visible light transmittance of the product is sacrificed, so the lighting effect of the glass is reduced, and it can only be applied in the southern region with sufficient sunlight; although the double-silver Low-E can meet the above energy-saving performance and high light transmittance requirements, the production technology is difficult, and technical problems such as heavy color deviation and poor coating uniformity are prone to occur, thereby leading to high production cost, so it is necessary to develop a Low-E glass with low reflectivity, high light transmittance, good appearance color and low cost.

[0040] In order to solve the above technical problems, the present application provides a low-reflection gray LOW-E glass with a special single-silver structure.

[0041] Referring to Figure 1 , Figure 1 is a structural schematic view of an embodiment of the low-reflection gray LOW-E glass in the present application.

[0042] In the embodiment of the utility model, low reflection gray LOW-E glass includes glass substrate layer 1 and coating layer, coating layer is located glass substrate layer 1 one side, including by inside to outside sequentially layering arrangement's bottom dielectric combination layer 2, first protective layer 3, first transition layer 4, metal function layer 5, second transition layer 6, second protective layer 7, top dielectric combination layer 8 and antireflection layer 9, bottom dielectric combination layer 2 is attached to glass substrate layer 1 with first protective layer 3 side is opposite.

[0043] In an embodiment, bottom dielectric combination layer 2 includes first nitride layer 21 and first oxide layer 22, first nitride layer 21 and the glass substrate layer 1 are arranged adjacent, and first oxide layer 22 and the first protective layer 3 are arranged adjacent. It should be noted that in the present embodiment, the bottom dielectric combination layer 2 is composed of only the first oxide layer 21 and the first nitride layer 22.

[0044] The thickness of the first nitride layer is 35nm-45nm. The thickness of the first nitride layer 21 is 35nm-45nm. In order to make the first nitride layer 21 play a role, the thickness of the first nitride layer 21 can be 35nm, 37nm, 38nm, 40nm, 42nm, 43nm, 45nm, including values not listed but still within the above range. Alternatively, in the present embodiment, the thickness of the first oxide layer 22 is 5nm-10nm. In order to make the first oxide layer 22 play a corresponding role, the thickness of the first oxide layer 22 can be 5nm, 6nm, 7nm, 8nm, 8.5nm, 9nm and 10nm, including values not listed but still within the above range.

[0045] In an embodiment, top dielectric combination layer 8 includes second oxide layer 82 and second nitride layer 81. The thickness of the top dielectric combination layer 8 is 60nm-70nm. The second nitride layer 81 and the second protective layer 7 are arranged adjacent, and the second oxide layer 82 and the antireflection layer 9 are arranged adjacent. It should be noted that in the present embodiment, the top dielectric combination layer 8 is composed of only the second oxide layer 82 and the second nitride layer 81.

[0046] The thickness of the second nitride layer 81 is 55nm-60nm. The thickness of the second oxide layer 82 is 5nm-10nm. The thickness of the second nitride layer 81 can be 55nm, 57nm, 59nm, 60nm, including values not listed but still within the above range. Alternatively, in the present embodiment, the thickness of the second oxide layer 82 can be 5nm, 6nm, 7nm, 9nm, 10nm, including values not listed but still within the above range.

[0047] It should be noted that in the embodiment, the positions of the four dielectric layers, the first nitride layer 21, the first oxide layer 22, the second nitride layer 81 and the second oxide layer 82, are defined, on the one hand, to protect the metal functional layer from chemical or mechanical damage and erosion, and on the other hand, to reduce the light reflection caused by the glass substrate layer by using the interference principle to reduce the visible light reflectivity. In addition, the color and reflectivity of the film system can be adjusted by changing the thickness and material of the nitride film layer and the oxide film layer, so as to realize the pre-designed visual effect.

[0048] In an embodiment, the bottom dielectric combination layer 2 includes at least two dielectric layers; at least one dielectric layer is the first oxide layer 22, and at least another dielectric layer is the first nitride layer 21. It should be noted that in the embodiment, the bottom dielectric combination layer 2 is composed of a nitride film layer and an oxide film layer. It should be noted that the bottom dielectric combination layer 2 can be a stacked material layer composed of the first oxide layer 22 and the first nitride layer 21 in a specific order. It should also be noted that, without affecting the light transmittance, reflectivity or overall appearance color of the low-reflective gray LOW-E glass in the utility model, the bottom dielectric combination layer 2 in the utility model can be composed of 2 dielectric layers, 3 dielectric layers, 4 dielectric layers or 5 dielectric layers, and any integer layer that does not affect the realization of the technical effect can be added layer by layer.

[0049] It should also be noted that, without affecting the light transmittance, reflectivity or overall appearance color of the low-reflective gray LOW-E glass in the utility model, the bottom dielectric combination layer 2 in the utility model can include 1 first nitride layer 21, 2 first nitride layers 21 or 3 first nitride layers 21, and any integer layer that does not affect the realization of the technical effect can be added layer by layer. Similarly, the same applies to the first oxide layer 22. It should also be noted that the layer of the bottom dielectric combination layer 2 in the embodiment that is attached to the glass substrate layer 1 must be the first nitride layer 21, and the layer of the bottom dielectric combination layer 2 in the embodiment that is attached to the first protective layer 3 must be the first oxide layer 22.

[0050] In the embodiment, the first nitride layer 21 is selected from any one of a ZrNx layer, a SiNx layer, a SiZrNx layer, a TiZrNx layer and a SiTiNx layer; it should be noted that the first nitride layer 21 is a single material layer composed of one of ZrNx, SiNx, SiZrNx, TiZrNx and SiTiNx. Alternatively, the first nitride layer 21 is selected from a SiNx layer. In the embodiment, the first oxide layer 22 is selected from any one of a ZrOx layer, a ZnOx layer, a TiOx layer, an AZO layer and a ZnAlOx layer; it should be noted that the first oxide layer 22 is a single material layer composed of one of ZrOx, ZnOx, TiOx, AZO and ZnAlOx. Alternatively, the first oxide layer 22 is selected from a ZnAlOx layer; the ZnAlOx layer has a good smooth structure and a better refractive index, and increasing the thickness ratio of ZnAlOx in the bottom dielectric layer 2 can improve the performance of the silver layer and the antireflection effect; in addition, the work function (about 4.1) of ZnAlOx is lower than that of Ti and Ag, and the electrons in the ZnAlOx layer will migrate to the Ag layer, and the migration of the electrons in the ZnAlOx layer to the Ti can improve the conductivity of the metal functional layer as a whole, increase the reflection of infrared, and improve the energy-saving performance of the coated glass.

[0051] In an embodiment, the top dielectric combination layer 8 includes at least two dielectric layers; at least one of the dielectric layers is a second oxide layer 82, and at least one of the dielectric layers is a second nitride layer 81; in the embodiment, the top dielectric combination layer 8 is composed of a nitride film layer and an oxide film layer; it should be noted that the top dielectric combination layer 8 can be a stacked material layer composed of the second oxide layer 82 and the second nitride layer 81 in a specific order; it should also be noted that, without affecting the light transmittance, reflectivity or overall appearance color of the low-reflection gray LOW-E glass in the embodiment, the top dielectric combination layer 8 in the embodiment can be composed of 2 dielectric layers, 3 dielectric layers, 4 dielectric layers or 5 dielectric layers, and any integer layer that does not affect the realization of the technical effect can be added layer by layer.

[0052] It should be noted that, without affecting the light transmittance, reflectivity or overall appearance color of the low-reflection gray LOW-E glass in the utility model, the top layer dielectric combination layer 8 in the utility model can include one second nitride layer 81, two second nitride layers 81 or three second nitride layers 81, and the integer layer is increased layer by layer as long as the technical effect is not affected; similarly, the second oxide layer 82 is also similarly extended. It should be noted that the layer of the top layer dielectric combination layer 8 in the embodiment which is attached to the second protective layer 7 must be the second nitride layer 81, and the layer of the top layer dielectric combination layer 8 in the embodiment which is attached to the anti-reflection layer 9 must be the second oxide layer 82.

[0053] In the embodiment, the second oxide layer 81 is selected from any one of SiOx layer, ZrOx layer, TiOx layer, SnOx layer, BiOx layer and ZnOx layer; it should be noted that the second oxide layer 81 is a single material layer composed of one of SiOx, ZrOx, TiOx, SnOx, BiOx and ZnOx. Alternatively, the second oxide layer 81 is selected from TiOx layer; it should be noted that the second oxide layer 81 is selected from TiO2 layer, and the titanium dioxide film can be used in combination with the silicon dioxide film to form a double-layer anti-reflection film, which can further improve the light transmittance of the coated glass, and the composite layer of titanium dioxide and silicon dioxide can improve the selective reflection of near-infrared spectrum and reduce the emissivity, thereby improving the energy-saving effect. Alternatively, the second nitride layer 82 is selected from any one of ZrNx layer, SiNx layer, SiZrNx layer, TiZrNx layer and SiTiNx layer; it should be noted that the second nitride layer 82 is a single material layer composed of one of ZrNx, SiNx, SiZrNx, TiZrNx and SiTiNx. Alternatively, the second nitride layer 82 is selected from SiNx layer.

[0054] In an embodiment, the thickness of the bottom layer dielectric combination layer 2 is 40nm-55nm; in order to make the bottom layer dielectric combination layer 2 play a corresponding antireflection role, the thickness of the bottom layer dielectric combination layer 2 can be 40nm, 42nm, 44nm, 45nm, 48nm, 49nm, 50nm, 53nm, 55nm, including values not listed but still belonging to the above range. Alternatively, the thickness of the top layer dielectric combination layer 8 is 60nm-70nm; in order to make the top layer dielectric combination layer 8 play a role, the thickness of the top layer dielectric combination layer 8 can be 60nm, 62nm, 65nm, 66nm, 67nm, 69nm, 70nm, including values not listed but still belonging to the above range.

[0055] In an embodiment, the first protective layer 3 is selected from any one of a nickel-chromium alloy layer, a chromium layer, a stainless steel layer, a nickel-chromium nitride alloy layer, and a chromium nitride layer; it should be understood that the first protective layer 3 can be made of any one of a nickel-chromium alloy, chromium, stainless steel, a nickel-chromium nitride alloy, and chromium nitride; alternatively, the first protective layer 3 is selected from a nickel-chromium alloy layer. By arranging a protective layer on each of the front and back sides of the silver functional layer, the heat processing performance of the coated glass is improved, so that after the tempering process, the film layer is stable and does not have defects such as cracking, oxidation, delamination, scratching, and the like.

[0056] In an embodiment, the second protective layer 7 is selected from any one of a nickel-chromium alloy layer, a chromium layer, a stainless steel layer, a nickel-chromium nitride alloy layer, and a chromium nitride layer; it should be understood that the second protective layer 7 can be made of any one of a nickel-chromium alloy, chromium, stainless steel, a nickel-chromium nitride alloy, and chromium nitride; alternatively, the second protective layer 7 is selected from a nickel-chromium alloy layer.

[0057] In an embodiment, the metal functional layer 5 is selected from any one of an Ag layer, an AgCu layer, an AgAl layer, and an AgCr layer; it should be understood that the metal functional layer 5 can be made of any one of Ag, AgCu, AgAl, and AgCr; alternatively, the metal functional layer 5 is selected from an Ag layer.

[0058] In an embodiment, the first transition layer 4 is selected from a Ti layer.

[0059] In an embodiment, the second transition layer 6 is selected from a Ti layer. The Ti layer on both sides of the functional Ag layer is an oxidation-resistant protective layer for the Ag layer and has good oxidation resistance. During the tempering process of the coated glass, the Ti layer can be partially oxidized as a protective layer (sacrificial layer) for the Ag layer. During the partial oxidation process, the visible light transmittance of the Ti layer is improved, and the color is more transparent. The ZnAlOx can completely oxidize the metal Ti layer, reduce the light attenuation of the film layer, and make the film system product have a higher light transmittance, which is very suitable for producing high-transmittance, super-energy-saving, and low-emissivity coated glass.

[0060] In an embodiment, the thickness of the first protective layer 3 is 2 nm to 3 nm; specifically, the thickness of the first protective layer 3 can be 2 nm, 2.2 nm, 2.4 nm, 2.5 nm, 2.7 nm, 2.9 nm, or 3 nm, including values not listed but still belonging to the above range.

[0061] In an embodiment, the thickness of the second protective layer 7 is 3 nm to 5 nm; specifically, the thickness of the second protective layer 7 can be 3 nm, 3.4 nm, 3.8 nm, 4.1 nm, 4.5 nm, 4.8 nm, or 5 nm, including values not listed but still belonging to the above range.

[0062] In an embodiment, the thickness of the metal functional layer 5 is 6nm-9nm; specifically, the thickness of the metal functional layer 5 can be 6nm, 6.2nm, 6.5nm, 6.6nm, 6.9nm, 7nm, 7.5nm, 8nm, 9nm, including values not listed but still belonging to the above range.

[0063] In an embodiment, the thickness of the first transition layer 4 is 2nm-5nm; specifically, the thickness of the first transition layer 4 can be 2nm, 2.5nm, 3nm, 3.5nm, 4nm, 5nm, including values not listed but still belonging to the above range.

[0064] In an embodiment, the thickness of the second transition layer 6 is 3nm-6nm; specifically, the thickness of the second transition layer 6 can be 3nm, 3.5nm, 4nm, 4.5nm, 5nm, 6nm, including values not listed but still belonging to the above range.

[0065] In an embodiment, the thickness of the anti-reflection layer 9 is 5nm-15nm; specifically, the thickness of the anti-reflection layer 9 can be 5nm, 8nm, 10nm, 12nm, 14nm, 15nm, including values not listed but still belonging to the above range.

[0066] In an embodiment, the sum of the thicknesses of the first protective layer 3, the first transition layer 4, the metal functional layer 5, the second transition layer 6, and the second protective layer 7 is 15nm-22nm; specifically, the sum of the thicknesses of the first protective layer 3, the first transition layer 4, the metal functional layer 5, the second transition layer 6, and the second protective layer 7 can be 15nm, 16nm, 18nm, 20nm, 22nm, including values not listed but still belonging to the above range. In this embodiment, the metal functional layer Ag layer and the metal layer composed of the protective layer NiCr and the transition layer Ti together have strong absorption and reflection effects on visible light. The inventors have found in the development process that if the sum of the thicknesses of the above-mentioned 5 layers of metal layer is controlled within the range of 15nm-22nm, the light transmittance of the coated glass prepared in this way is at the highest level.

[0067] In an embodiment, the ratio of the thicknesses of the bottom dielectric combination layer 2 and the top dielectric combination layer 8 is 1:(1.1-1.5). By controlling the ratio of the thicknesses of the bottom dielectric combination layer 2 and the top dielectric combination layer 8 within a certain range, the mechanical properties and transmittance of the product prepared are at a higher level.

[0068] In an embodiment, the ratio of the thicknesses of the bottom dielectric combination layer 2 and the top dielectric combination layer 8 is 1:1.35.

[0069] In an embodiment, the thickness of the bottom dielectric combination layer 2 is 48 nm, the thickness of the top dielectric combination layer 8 is 65 nm, the thickness of the first protective layer 3 is 5.2 nm, and the thickness of the second protective layer 7 is 7.25 nm.

[0070] In some embodiments, the prepared 6mm coated glass sheet has a visible light transmittance T of 65-69% before tempering, a transmittance a* of (-1.5)-(-3.5), and a transmittance b* of 0.5-(-2); the glass surface color L is 28-32, a* is (-0.8)-(-2), and b* is (-0.5)-(-2.5); the glass surface side color L is 35-40, a* is 0.5-(-2), and b* is (-1.5)-(-3.5). The glass surface color of the 6mm coated glass sheet is light gray, the single sheet emissivity is 0.14-0.16, and the visible light reflectivity is 15.6%.

[0071] In some embodiments, the prepared 6mm coated glass sheet has a visible light transmittance T of 65-69% before tempering, a transmittance a* of (-1.5)-(-3.5), and a transmittance b* of 0.5-(-2); the glass surface color L is 28-32, a* is (-0.8)-(-2), and b* is (-0.5)-(-2.5); the glass surface side color L is 35-40, a* is 0.5-(-2), and b* is (-1.5)-(-3.5). The glass surface color of the 6mm coated glass sheet is light gray, the single sheet emissivity is 0.14-0.16, and the visible light reflectivity is 15.6%.

[0072] Embodiment 1 is a representative embodiment of the present application, and the specific technical content is as follows:

[0073] Referring to Figure 1 The low-reflection gray LOW-E glass in the embodiment includes a glass substrate layer 1 and a coating layer. The coating layer is arranged on one side of the glass substrate layer 1 and includes, from inside to outside, a bottom dielectric combination layer 2, a first protective layer 3, a first transition layer 4, a metal functional layer 5, a second transition layer 6, a second protective layer 7, a top dielectric combination layer 8, and an anti-reflection layer 9.

[0074] The bottom dielectric combination layer 2 includes a first nitride layer 21 and a first oxide layer 22. The first nitride layer 21 is arranged adjacent to the glass substrate layer 1, and the first oxide layer 22 is arranged adjacent to the first protective layer 3. The top dielectric combination layer 8 includes a second nitride layer 81 and a second oxide layer 82. The second nitride layer 81 is arranged adjacent to the second protective layer 7, and the second oxide layer 82 is arranged adjacent to the anti-reflection layer 9.

[0075] In this embodiment, the thickness of the glass substrate layer 1 is 6 mm, the first nitride layer 21 is a SiNx layer with a thickness of 37 nm; the first oxide layer 22 is a ZnAlOx layer with a thickness of 6 nm; the first protective layer 3 is a NiCr layer with a thickness of 2.5 nm; the first transition layer 4 is a Ti layer with a thickness of 3 nm; the metal functional layer 5 is an Ag layer with a thickness of 8 nm; the second transition layer 6 is a Ti layer with a thickness of 3.5 nm; the second protective layer 7 is a NiCr layer with a thickness of 4.5 nm; the second nitride layer 81 is a SiNx layer with a thickness of 55 nm; the second oxide layer 82 is a TiO2 layer with a thickness of 8 nm; and the anti-reflection layer 9 is a SiO2 layer with a thickness of 5 nm.

[0076] The preparation process of the low-reflection gray LOW-E glass in Example 1 includes the following steps:

[0077] (1) sputtering and depositing the first nitride layer 21 on the glass substrate layer 1:

[0078] The target material is configured as silicon aluminum (a silicon aluminum alloy target with a weight ratio of 90:10), and is a rotating target; the process gas ratio is 1:1 for argon and nitrogen; during magnetron sputtering, power control is used, the silicon aluminum target power is 0~60Kw to ensure stable sputtering and not damage the target material; the sputtering gas pressure is 2.5~8.5×10 -3 mbar; the film thickness is 37 nm;

[0079] (2) sputtering and depositing the first oxide layer 22 on the first nitride layer 21:

[0080] The target material is configured as zinc aluminum (a zinc aluminum alloy target), and is a rotating target; the process gas ratio is 1:2 for high-purity argon and high-purity oxygen; during magnetron sputtering, power control is used, the zinc aluminum target power is 0~50Kw to ensure stable sputtering and not damage the target material; the sputtering gas pressure is 2~5×10 -3 mbar; the film thickness is 6 nm;

[0081] (3) sputtering and depositing the first protective layer 3 on the first oxide layer 22:

[0082] The target material is configured as nickel chromium (a nickel chromium alloy target with a weight ratio of 80:20), and is a planar target; the process gas ratio is pure argon; during magnetron sputtering, power control is used, the nickel chromium target power is 0~20Kw to ensure stable sputtering and not damage the target material; the sputtering gas pressure is 2~5×10 -3 mbar; the film thickness is 2.5 nm;

[0083] (4) sputtering and depositing the first transition layer 4 on the first protective layer 3:

[0084] The target material is configured as a titanium target (purity 99.99%) and is a rotating target; the process gas ratio is pure argon; during magnetron sputtering, power control is used to ensure stable sputtering and not to damage the target material, and the titanium target power is 0-30Kw; the sputtering gas pressure is 2-5x10 - 3 mbar; the film thickness is 3nm;

[0085] (5) Sputtering and depositing a metal functional layer 5 on the first transition layer 4:

[0086] The target material is configured as a silver target (purity 99.99%) and is a flat target; the process gas ratio is pure argon; during magnetron sputtering, power control is used to ensure stable sputtering and not to damage the target material, and the silver target power is 0-20Kw; the sputtering gas pressure is 2-5x10 - 3 mbar; the film thickness is 8nm;

[0087] (6) Sputtering and depositing a second transition layer 6 on the metal functional layer 5:

[0088] The target material is configured as a titanium target (purity 99.99%) and is a rotating target; the process gas ratio is pure argon; during magnetron sputtering, power control is used to ensure stable sputtering and not to damage the target material, and the titanium target power is 0-30Kw; the sputtering gas pressure is 2-5x10 - 3 mbar; the film thickness is 3.5nm;

[0089] (7) Sputtering and depositing a second protective layer 7 on the second transition layer 6:

[0090] The target material is configured as a nickel-chromium (nickel-chromium alloy target with a weight ratio of 80:20) and is a flat target; the process gas ratio is pure argon; during magnetron sputtering, power control is used to ensure stable sputtering and not to damage the target material, and the nickel-chromium target power is 0-20Kw; the sputtering gas pressure is 2-5x10 -3 mbar; the film thickness is 4.5nm;

[0091] (8) Sputtering and depositing a second nitride layer 81 on the second protective layer 7:

[0092] The target material is configured as a silicon-aluminum (silicon-aluminum alloy target with a weight ratio of 90:10) and is a rotating target; the process gas ratio is 1:1 for argon and nitrogen; during magnetron sputtering, power control is used to ensure stable sputtering and not to damage the target material, and the silicon-aluminum target power is 0-60Kw; the sputtering gas pressure is 2.5-8.5x10 -3 mbar; the film thickness is 55nm;

[0093] (9) Sputtering and depositing a second oxide layer 82 on the second nitride layer 81:

[0094] The target material is configured as a rotating titanium dioxide target; the process gas ratio is that the ratio of high-purity argon and high-purity oxygen is 1:0.05; when the magnetron sputtering is performed, power control is used, the titanium dioxide target power is 0-50Kw to ensure stable sputtering and not to damage the target material; the sputtering gas pressure is 2-5*10 -3 mbar; the film thickness is 8nm;

[0095] (10) sputtering deposition of the anti-reflection layer 9 on the second oxide layer 82:

[0096] The target material is configured as a rotating silicon aluminum (silicon aluminum alloy target with a weight ratio of 90:10 of silicon and aluminum) target; the process gas ratio is that the ratio of argon and oxygen is 1:1; when the magnetron sputtering is performed, power control is used, the silicon aluminum target power is 0-60Kw to ensure stable sputtering and not to damage the target material; the sputtering gas pressure is 2.5-8.5*10 -3 mbar; the film thickness is 5nm.

[0097] The sputtering chamber transmission speed is controlled at 3-4.5m / min.

[0098] The low-reflection gray LOW-E glass prepared in the embodiment has stable single-piece thermal processing performance and does not have defects such as cracking, oxidation, film peeling and scratching.

[0099] After the heat processing and tempering treatment, the visible light transmittance T is 72.4%, a* is -1 and b* is -1.2; the glass surface color L is 24.8, a* is -0.65 and b* is -1.8.

[0100] After the low-reflection gray LOW-E glass after the tempering treatment is made into hollow glass, the outdoor color L is 27.2, a* is -1 and b* is -0.8, and the emissivity is 0.14. Therefore, the low-reflection gray LOW-E glass prepared in the utility model has a light gray appearance color, is coordinated with the building environment, has uniform overall color and good overall aesthetic property of the glass.

[0101] The above merely describes exemplary embodiments of the utility model, and does not limit the patent range of the utility model, and any equivalent structural transformation, direct / indirect application in other related technical fields under the technical concept of the utility model and according to the contents of the utility model specification and drawings are included in the patent protection range of the utility model.

Claims

1. A low reflective gray LOW-E glass, characterized in that, The low-reflection gray LOW-E glass comprises: a glass substrate layer; and a coating layer arranged on one side of the glass substrate layer, the coating layer comprising a bottom dielectric combination layer, a first protective layer, a first transition layer, a metal functional layer, a second transition layer, a second protective layer, a top dielectric combination layer and an anti-reflection layer arranged in sequence; the bottom dielectric combination layer is attached to the glass substrate layer on the side opposite to the first protective layer.

2. The low reflective gray LOW-E glass of claim 1, wherein, The bottom dielectric combination layer comprises a first nitride layer and a first oxide layer, the first nitride layer is arranged adjacent to the glass substrate layer, and the first oxide layer is arranged adjacent to the first protective layer; wherein the thickness of the first nitride layer is 35-45 nm; and / or the thickness of the first oxide layer is 5-10 nm.

3. The low reflective gray LOW-E glass of claim 1, wherein, The top dielectric combination layer comprises a second nitride layer and a second oxide layer, the second nitride layer is arranged adjacent to the second protective layer, and the second oxide layer is arranged adjacent to the anti-reflection layer; wherein the thickness of the second nitride layer is 55-60 nm; and / or the thickness of the second oxide layer is 5-10 nm.

4. The low reflective gray LOW-E glass of claim 1, wherein, The bottom dielectric combination layer comprises at least two dielectric layers; at least one dielectric layer is a first oxide layer, and at least one other dielectric layer is a first nitride layer; wherein the first oxide layer is selected from any one of ZrOx layer, ZnOx layer, TiOx layer, AZO layer and ZnAlOx layer; and / or the first nitride layer is selected from any one of ZrNx layer, SiNx layer, SiZrNx layer, TiZrNx layer and SiTiNx layer.

5. The low reflective gray LOW-E glass of claim 1, wherein, The top dielectric combination layer comprises at least two dielectric layers; at least one dielectric layer is a second oxide layer, and at least one other dielectric layer is a second nitride layer; wherein the second oxide layer is selected from any one of SiOx layer, ZrOx layer, TiOx layer, SnOx layer, BiOx layer and ZnOx layer; and / or the second nitride layer is selected from any one of ZrNx layer, SiNx layer, SiZrNx layer, TiZrNx layer and SiTiNx layer.

6. The low reflective gray LOW-E glass of claim 1, wherein, The thickness of the bottom dielectric combination layer is 40-55 nm; and / or the thickness of the top dielectric combination layer is 60-70 nm.

7. The low reflective gray LOW-E glass of claim 1, wherein, The first protective layer is selected from any one of nickel-chromium alloy layer, chromium layer, stainless steel layer, nickel-chromium nitride alloy layer and chromium nitride layer; and / or the second protective layer is selected from any one of nickel-chromium alloy layer, chromium layer, stainless steel layer, nickel-chromium nitride alloy layer and chromium nitride layer; and / or the metal functional layer is selected from any one of Ag layer, AgCu layer, AgAl layer and AgCr layer; and / or the first transition layer is selected from Ti layer; and / or the second transition layer is selected from Ti layer; and / or the anti-reflection layer is selected from any one of SiOx layer, TiOx layer and SiNx layer.

8. The low reflective gray LOW-E glass of claim 1, wherein, The thickness of the first protective layer is 2-3 nm; and / or the thickness of the second protective layer is 3-5 nm; And / or, the thickness of the metal functional layer is 6nm-9nm; And / or, the thickness of the first transition layer is 2nm-5nm; And / or, the thickness of the second transition layer is 3nm-6nm; And / or, the thickness of the anti-reflection layer is 5nm-15nm.

9. The low reflective gray LOW-E glass of claim 1, wherein, The sum of the thicknesses of the first protective layer, the first transition layer, the metal functional layer, the second transition layer and the second protective layer is 15nm-22nm.

10. The low reflective gray LOW-E glass of claim 1, wherein, The ratio of the thicknesses of the bottom dielectric combined layer and the top dielectric combined layer is 1:(1.1-1.5).

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