Photovoltaic glass and photovoltaic module
By setting interference film stacks and nanoporous layers on photovoltaic glass substrates, the problems of high reflectivity and poor wear resistance of photovoltaic glass are solved, improving the power generation performance and stability of photovoltaic modules and realizing the efficient production of photovoltaic glass.
Patent Information
- Application Number
- CN202423322279.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-31
- Publication Date
- 2025-12-19
- Estimated Expiration
- 2034-12-31
AI Technical Summary
The reflectivity of existing photovoltaic glass still needs to be further reduced, and its wear resistance and weather resistance affect the power generation performance of photovoltaic modules.
An interference film stack and a nanoporous layer are set on one side of a photovoltaic glass substrate. The interference film stack consists of alternating high-refractive-index and low-refractive-index film layers, and the nanoporous layer has a surface closed-pore structure. It is prepared by vacuum deposition and sol-gel method. The expansion coefficients of the glass substrate and the film layer are matched to improve stability.
This reduces the reflectivity of photovoltaic glass, improves the power generation performance of photovoltaic modules, and takes into account wear resistance and weather resistance, enabling continuous production of large-area photovoltaic glass and shortening the production cycle.
Smart Images
Figure CN223694240U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to photovoltaic glass technical field, especially photovoltaic glass and photovoltaic module. BACKGROUND
[0002] In solar photovoltaic power generation, by reducing the reflection loss of photovoltaic glass to sunlight, the power generation performance of photovoltaic module can be improved. In the prior art, the method of coating film on glass is usually adopted to reduce the reflectivity of glass. However, the reflectivity of photovoltaic glass still needs to be further reduced, and the wear resistance and weather resistance of photovoltaic glass also affect the power generation performance of photovoltaic module. SUMMARY
[0003] The utility model discloses a photovoltaic glass and photovoltaic module, which aims to solve the problem that the reflectivity of photovoltaic glass still needs to be further reduced, and the wear resistance and weather resistance of photovoltaic glass also affect the power generation performance of photovoltaic module.
[0004] To achieve the above-mentioned purpose, the utility model discloses a photovoltaic glass, including glass base and the antireflection film of one side of glass base, the antireflection film includes interference film stack and nanometer porous layer that set gradually in glass base, wherein, interference film stack includes the high refractive index film layer and low refractive index film layer that set alternately in the direction of deviating from glass base, the porous structure of nanometer porous layer is surface closed pore structure.
[0005] In an embodiment, the difference between the expansion coefficients of the glass substrate and the adjacent film layer is less than or equal to 5×10 -6 / K; and / or,
[0006] In the interference film stack, the difference between the expansion coefficients of any two adjacent film layers is less than or equal to 8×10 -6 / K; and / or,
[0007] In the interference film stack, the refractive index of the high refractive index film layer at a wavelength of 550 nm is 1.8-2.5; and / or,
[0008] In the interference film stack, the refractive index of the low refractive index film layer at a wavelength of 550 nm is 1.4-2.2.
[0009] In an embodiment, the thickness of the nanometer porous layer is 50-200 nm; and / or,
[0010] The pore size of the nanometer porous layer is 10-80 nm; and / or,
[0011] The refractive index of the nanometer porous layer at a wavelength of 550 nm is 1.28-1.32; and / or,
[0012] The nanoporous layer includes any one of a nanoporous aluminum oxide layer, a nanoporous silicon dioxide layer, a nanoporous titanium dioxide layer, a nanoporous zinc oxide layer, and a nanoporous tin dioxide layer.
[0013] In an embodiment, the number of layers of the interference film stack is 3, the first layer and the third layer are high refractive index film layers, and the second layer is a low refractive index film layer in the direction away from the glass substrate; wherein the high refractive index film layer is a yttrium trioxide film layer, and the low refractive index film layer is a silicon dioxide film layer; the thicknesses of the first layer to the third layer of the interference film stack are 120 nm to 180 nm, 20 nm to 40 nm, and 20 nm to 40 nm, respectively.
[0014] In an embodiment, the number of layers of the interference film stack is 4, the first layer and the third layer are high refractive index film layers, and the second layer and the fourth layer are low refractive index film layers in the direction away from the glass substrate; wherein the high refractive index film layer is a niobium trioxide film layer, and the low refractive index film layer is a silicon dioxide film layer; the thicknesses of the first layer to the fourth layer of the interference film stack are 3 nm to 7 nm, 70 nm to 130 nm, 5 nm to 15 nm, and 90 nm to 150 nm, respectively.
[0015] In an embodiment, the number of layers of the interference film stack is 5, the first layer, the third layer, and the fifth layer are high refractive index film layers, and the second layer and the fourth layer are low refractive index film layers in the direction away from the glass substrate; wherein the high refractive index film layer is a niobium trioxide film layer, and the low refractive index film layer is a silicon dioxide film layer; the thicknesses of the first layer to the fifth layer of the interference film stack are 5 nm to 15 nm, 50 nm to 110 nm, 5 nm to 15 nm, 70 nm to 130 nm, and 3 nm to 7 nm, respectively.
[0016] In an embodiment, the number of layers of the interference film stack is 6, the first layer, the third layer, and the fifth layer are high refractive index film layers, and the second layer, the fourth layer, and the sixth layer are low refractive index film layers in the direction away from the glass substrate; wherein the high refractive index film layer is a niobium trioxide film layer, and the low refractive index film layer is a silicon dioxide film layer; the thicknesses of the first layer to the sixth layer of the interference film stack are 3 nm to 7 nm, 60 nm to 100 nm, 5 nm to 15 nm, 70 nm to 130 nm, 3 nm to 7 nm, and 3 nm to 7 nm, respectively.
[0017] In an embodiment, the number of layers of the interference film stack is 7, in the direction away from the glass substrate, the 1st layer, the 3rd layer, the 5th layer and the 7th layer are high refractive index film layers, and the 2nd layer, the 4th layer and the 6th layer are low refractive index film layers; wherein the high refractive index film layer is a niobium trioxide film layer, and the low refractive index film layer is a silicon dioxide film layer; in the interference film stack, the thicknesses of the 1st layer to the 7th layer are 5nm-10nm, 35nm-45nm, 20nm-30nm, 15nm-25nm, 120nm-160nm, 20nm-40nm and 15nm-25nm, respectively.
[0018] In an embodiment, the number of layers of the interference film stack is 8, in the direction away from the glass substrate, the 1st layer, the 3rd layer, the 5th layer and the 7th layer are high refractive index film layers, and the 2nd layer, the 4th layer, the 6th layer and the 8th layer are low refractive index film layers; wherein the high refractive index film layer is a niobium trioxide film layer, and the low refractive index film layer is a silicon dioxide film layer; in the interference film stack, the thicknesses of the 1st layer to the 8th layer are 5nm-10nm, 35nm-50nm, 20nm-25nm, 10nm-20nm, 100nm-130nm, 15nm-25nm, 15nm-20nm and 35nm-65nm, respectively.
[0019] The utility model discloses still a kind of photovoltaic module, including the photovoltaic glass of above.
[0020] In the technical scheme provided by the utility model, the interference film stack and the nano-porous layer are sequentially arranged on one side of the glass substrate, the interference film stack is alternately arranged by high refractive index film layers and low refractive index film layers, so that the reflection of light can be reduced, the nano-porous layer has a closed-pore structure, and the nano-porous layer cooperates with the interference film stack to further reduce the reflectivity of the photovoltaic glass, so that the wear resistance and weather resistance of the photovoltaic glass can be considered, and the power generation performance of the photovoltaic module is improved; in addition, the interference film stack can be prepared by vacuum coating, and the nano-porous layer can be prepared by sol-gel method, so that continuous production of large-area photovoltaic glass can be realized, and the production cycle can be shortened. BRIEF DESCRIPTION OF DRAWINGS
[0021] In order to more clearly illustrate the technical scheme in the embodiments of the utility model or the prior art, the drawings needed to be used in the following embodiment or prior art description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the utility model, and other drawings can be obtained from the structures shown in these drawings without creative labor for those skilled in the art.
[0022] Figure 1A structural schematic view of one embodiment of the photovoltaic glass provided by the present application;
[0023] Figure 2 A scanning electron microscope view of one embodiment of the nano-porous layer provided by the present application;
[0024] Figure 3 A reflectivity spectrum view of the photovoltaic glass of the embodiment 1 of the present application;
[0025] Figure 4 A reflectivity spectrum view of the photovoltaic glass of the embodiment 2 of the present application;
[0026] Figure 5 A reflectivity spectrum view of the photovoltaic glass of the embodiment 3 of the present application;
[0027] Figure 6 A reflectivity spectrum view of the photovoltaic glass of the embodiment 4 of the present application;
[0028] Figure 7 A reflectivity spectrum view of the photovoltaic glass of the embodiment 5 of the present application;
[0029] Figure 8 A reflectivity spectrum view of the photovoltaic glass of the embodiment 6 of the present application;
[0030] Figure 9 A reflectivity spectrum view of the photovoltaic glass of the comparative example 1 of the present application. BRIEF DESCRIPTION OF DRAWINGS
[0032] 100, photovoltaic glass;1, glass substrate;2, interference film stack;21, high refractive index film layer;22, low refractive index film layer;3, nano-porous layer.
[0033] The present application is achieved, the function characteristics and the advantages will be further explained in combination with the embodiments, and referring to the drawings. DETAILED DESCRIPTION
[0034] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all the other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.
[0035] It should be noted that if the embodiments of the utility model have the direction indication (such as up, down, left, right, front, back), the direction indication is only used to explain the relative position relationship, movement condition and the like between components in a certain posture, if the certain posture changes, then the direction indication also changes accordingly.
[0036] In addition, if the embodiments of the utility model have the description of "first", "second" and the like, the description of "first", "second" and the like is only for the purpose of description, and cannot be understood as indicating or implying the relative importance of the indicated technical features or implicitly indicating the number of the indicated technical features. Therefore, the features limited by "first", "second" can be explicitly or implicitly included at least one feature. In addition, "and / or" or "and / or" appearing in the whole text means that the three parallel schemes are included, for example, "A and / or B" includes A scheme, or B scheme, or A and B scheme. In addition, the technical solutions of each embodiment can be combined with each other, but it must be based on the realization of ordinary skilled in the art, when the combination of technical solutions appears contradictory or unachievable, it should be considered that the combination of technical solutions does not exist, also not within the protection scope required by the utility model.
[0037] In solar photovoltaic power generation, by reducing the reflection loss of photovoltaic glass to sunlight, the power generation performance of photovoltaic modules can be improved. In the prior art, a film is usually coated on the glass to reduce the reflectivity of the glass, but the reflectivity of the photovoltaic glass still needs to be further reduced, and the wear resistance and weather resistance of the photovoltaic glass also affect the power generation performance of the photovoltaic module.
[0038] Therefore, the utility model provides a kind of photovoltaic glass 100 and photovoltaic module, the reflectivity of photovoltaic glass 100 can be reduced, and the wear resistance and weather resistance of photovoltaic glass 100 can also be considered, to improve the power generation performance of photovoltaic module. Figures 1 to 9 The embodiment of the photovoltaic glass 100 provided by the utility model.
[0039] Please refer to Figure 1 And Figure 2 In the embodiment of the utility model, the photovoltaic glass 100 includes a glass substrate 1 and an anti-reflection film arranged on one side of the glass substrate 1, the anti-reflection film includes an interference film stack 2 and a nano-porous layer 3 arranged on the glass substrate 1 in sequence; wherein the interference film stack 2 includes high refractive index film layers 21 and low refractive index film layers 22 arranged alternately in the direction away from the glass substrate 1, and the nano-porous layer 3 has a surface closed pore structure.
[0040] The technical scheme provided by the utility model discloses a glass substrate 1 one side is provided with interference film stack 2 and nano porous layer 3 in proper order, interference film stack 2 is set up through high refractive index film layer 21 and low refractive index film layer 22 alternately, can reduce the reflection of light, the porous structure of nano porous layer 3 is surface closed pore structure, nano porous layer 3 cooperate with interference film stack 2, can further reduce the reflectivity of photovoltaic glass 100, also can take into account the wear resistance and weather resistance of photovoltaic glass 100, thereby improve the power generation performance of photovoltaic module, in addition, interference film stack 2 can adopt vacuum plating and prepare, nano porous layer 3 can adopt sol-gel method and prepare, thereby can realize the continuous production of large-area photovoltaic glass 100, also can shorten the production cycle.
[0041] It can be understood that high refractive index and low refractive index are relative probability, the refractive index of high refractive index film layer 21 in interference film stack 2 is higher than that of low refractive index film layer 22, the film layer of interference film stack 2 close to nano porous layer 3 can be high refractive index film layer 21, also can be low refractive index film layer 22.
[0042] It needs to be explained that photovoltaic glass 100 is used as the cover plate of photovoltaic module, the incident medium of photovoltaic glass 100 is air, and the refractive index is 1, the exit medium is adhesive film (EVA, POE, PVB etc. adhesive film), and the refractive index at wavelength 550nm is 1.45~1.6, which is not much different from the refractive index of glass substrate 1, if the anti-reflection film is set at the exit, the reflection will be increased, and the light entering the battery sheet will be reduced, therefore, the anti-reflection film is set on the side surface of glass substrate 1 in the utility model, and the single-side anti-reflection is carried out.
[0043] In the embodiment of the utility model, the difference between the expansion coefficient of glass substrate 1 and the adjacent film layer is less than or equal to 5*10 -6 / K. The difference between the expansion coefficient of glass substrate 1 and the adjacent film layer is in the above range, the structure of photovoltaic glass 100 is more stable, and the weather resistance of photovoltaic glass 100 can be improved. The difference between the expansion coefficient of glass substrate 1 and the adjacent film layer can be 5*10 -6 / K, 4*10 -6 / K, 3*10 -6 / K, 2*10 -6 / K, 1*10 -6 / K, 5*10 -7 / K or 5*10 -8 / K.
[0044] In the embodiment of the utility model, the difference between the expansion coefficient of any two adjacent film layers in interference film stack 2 is less than or equal to 8*10 -6 / K. In the interference film stack 2, the difference between the expansion coefficients of any two adjacent film layers is within the above range, and the structure of the photovoltaic glass 100 is more stable, and the weather resistance of the photovoltaic glass 100 can be improved. In the interference film stack 2, the difference between the expansion coefficients of any two adjacent film layers can be 8*10 -6 / K, 7*10 -6 / K, 6*10 -6 / K, 5*10 -6 / K, 4*10 -6 / K, 3*10 -6 / K, 2*10 -6 / K, 1*10 -6 / K, 8*10 -7 / K or 8*10 -8 / K.
[0045] In the embodiment of the utility model, the thickness of the nano-porous layer 3 is 50nm-200nm. The thickness of the nano-porous layer 3 is within the above range, which is conducive to reducing the reflectivity of the photovoltaic glass 100. The thickness of the nano-porous layer 3 can be 50nm, 60nm, 80nm, 100nm, 120nm, 150nm or 200nm.
[0046] In the embodiment of the utility model, the pore size of the nano-porous layer 3 is 10nm-80nm. The pore size of the nano-porous layer 3 is within the above range, which can make the refractive index of the nano-porous layer 3 within the appropriate range, and is conducive to reducing the reflectivity of the photovoltaic glass 100, and also conducive to improving the wear resistance and weather resistance of the photovoltaic glass 100. The pore size of the nano-porous layer 3 can be 10nm, 20nm, 30nm, 40nm, 50nm, 60nm, 70nm or 80nm.
[0047] In the embodiment of the utility model, the refractive index of the nano-porous layer 3 at a wavelength of 550nm is 1.28-1.32. The refractive index of the nano-porous layer 3 at a wavelength of 550nm is within the above range, which is conducive to reducing the reflectivity of the photovoltaic glass 100, and also conducive to improving the wear resistance and weather resistance of the photovoltaic glass 100. The refractive index of the nano-porous layer 3 at a wavelength of 550nm can be 1.28, 1.29, 1.30, 1.31 or 1.32.
[0048] In the embodiment of the utility model, the nano-porous layer 3 includes any one of a nano-porous aluminum oxide layer, a nano-porous silicon dioxide layer, a nano-porous titanium dioxide layer, a nano-porous zinc oxide layer and a nano-porous tin dioxide layer. The use of the above nano-porous layer 3 is conducive to reducing the reflectivity of the photovoltaic glass 100, and also conducive to improving the wear resistance and weather resistance of the photovoltaic glass 100.
[0049] In the embodiment of the utility model, the film layer number of the interference film stack 2 is less than or equal to 8. The film layer number of the interference film stack 2 is in the above range, which is beneficial to simplify the structure of the photovoltaic glass 100. The film layer number of the interference film stack 2 can be 2, 3, 4, 5, 6, 7 or 8.
[0050] In the embodiment of the utility model, the thickness of the interference film stack 2 is less than or equal to 350nm. The thickness of the interference film stack 2 is in the above range, which is beneficial to reduce the production cost. The thickness of the interference film stack 2 can be 350nm, 300nm, 250nm or 200nm.
[0051] In the embodiment of the utility model, in the interference film stack 2, the refractive index of the high refractive index film layer 21 at wavelength 550nm is 1.8~2.5. In the interference film stack 2, the refractive index of the high refractive index film layer 21 at wavelength 550nm is in the above range, which is beneficial to reduce the reflectivity of the photovoltaic glass 100. In the interference film stack 2, the refractive index of the high refractive index film layer 21 at wavelength 550nm can be 1.8, 1.9, 2.0, 2.1, 2.2, 2.3, 2.4 or 2.5.
[0052] In the embodiment of the utility model, in the interference film stack 2, the refractive index of the low refractive index film layer 22 at wavelength 550nm is 1.4~2.2. In the interference film stack 2, the refractive index of the low refractive index film layer 22 at wavelength 550nm is in the above range, which is beneficial to reduce the reflectivity of the photovoltaic glass 100. In the interference film stack 2, the refractive index of the low refractive index film layer 22 at wavelength 550nm can be 1.4, 1.5, 1.6, 1.7, 1.8, 1.9, 2.0, 2.1 or 2.2.
[0053] In the embodiment of the utility model, in the interference film stack 2, the extinction coefficient of each film layer in the 450nm~2500nm wave band is less than or equal to 0.2. In the interference film stack 2, the extinction coefficient of each film layer in the 450nm~2500nm wave band is in the above range, the absorption rate of the interference film stack 2 is low, and the light transmittance of the photovoltaic glass 100 can be improved. In the interference film stack 2, the extinction coefficient of each film layer in the 450nm~2500nm wave band can be 0.2, 0.18, 0.15, 0.12, 0.10 or 0.08.
[0054] In the embodiment of the utility model, the component of high refractive index film layer 21 in the interference film stack 2 includes at least one of first oxide and first nitride. The high refractive index film layer 21 in the interference film stack 2 adopts the above component, which is conducive to improving the wear resistance and weather resistance of photovoltaic glass 100. The component of high refractive index film layer 21 in the interference film stack 2 can be any one or combination of any multiple of first oxide and first nitride.
[0055] In the embodiment of the utility model, the component of low refractive index film layer 22 in the interference film stack 2 includes at least one of second oxide and second nitride. The low refractive index film layer 22 in the interference film stack 2 adopts the above component, which is conducive to improving the wear resistance and weather resistance of photovoltaic glass 100. The component of low refractive index film layer 22 in the interference film stack 2 can be any one or combination of any multiple of second oxide and second nitride.
[0056] In the embodiment of the utility model, the number of film layers of the interference film stack 2 is 3, in the direction away from the glass substrate 1, the first layer and the third layer are high refractive index film layers 21, and the second layer is a low refractive index film layer 22; wherein the high refractive index film layer 21 is a yttrium trioxide film layer, and the low refractive index film layer 22 is a silicon dioxide film layer. The above interference film stack 2 can reduce the reflectivity of photovoltaic glass 100, and the structure of photovoltaic glass 100 is simple, which can reduce the production cost. Further, in the embodiment of the utility model, the thickness of the film layers of the first layer to the third layer in the interference film stack 2 is 120nm~180nm, 20nm~40nm and 20nm~40nm in turn. The thickness of each film layer of the interference film stack 2 corresponds to the above range, which is conducive to reducing the reflectivity of photovoltaic glass 100 and reducing the production cost. The thickness of the film layers of the first layer to the third layer in the interference film stack 2 can be 120nm, 20nm and 20nm in turn, can be 150nm, 30nm and 30nm in turn, can be 150nm, 20nm and 40nm in turn, or can be 180nm, 40nm and 40nm in turn. It can be understood that the refractive index of the yttrium trioxide film layer at a wavelength of 550nm can be 1.81, and the refractive index of the silicon dioxide film layer at a wavelength of 550nm can be 1.46.
[0057] In the embodiment of the utility model, the film layer number of the interference film stack 2 is 4, in the direction of deviating from the glass substrate 1, the 1st layer and the 3rd layer are high refractive index film layers 21, the 2nd layer and the 4th layer are low refractive index film layers 22, wherein, the high refractive index film layer 21 is niobium trioxide film layer, the low refractive index film layer 22 is silica film layer. The interference film stack 2 can reduce the reflectivity of photovoltaic glass 100, and the structure of photovoltaic glass 100 is relatively simple, and the production cost can be reduced. Further, in the embodiment of the utility model, the thickness of the film layer of the 1st layer to the 4th layer in the interference film stack 2 is 3nm~7nm, 70nm~130nm, 5nm~15nm and 90nm~150nm in turn. The thickness of each film layer of the interference film stack 2 corresponds to the range above, which is conducive to reducing the reflectivity of photovoltaic glass 100, and also conducive to reducing the production cost. The thickness of the film layer of the 1st layer to the 4th layer in the interference film stack 2 can be 3nm, 70nm, 5nm and 90nm in turn, can be 5nm, 100nm, 10nm and 120nm in turn, or can be 7nm, 130nm, 15nm and 150nm in turn. It can be understood that the refractive index of the niobium trioxide film layer at wavelength 550nm can be 2.32, and the refractive index of the silica film layer at wavelength 550nm can be 1.46.
[0058] In the embodiment of the utility model, the film layer number of the interference film stack 2 is 5, in the direction of deviating from the glass substrate 1, the 1st layer, the 3rd layer and the 5th layer are high refractive index film layers 21, the 2nd layer and the 4th layer are low refractive index film layers 22, wherein, the high refractive index film layer 21 is niobium trioxide film layer, the low refractive index film layer 22 is silica film layer. The interference film stack 2 can reduce the reflectivity of photovoltaic glass 100, and the structure of photovoltaic glass 100 is relatively simple, and the production cost can be reduced. Further, in the embodiment of the utility model, the thickness of the film layer of the 1st layer to the 5th layer in the interference film stack 2 is 5nm~15nm, 50nm~110nm, 5nm~15nm, 70nm~130nm and 3nm~7nm in turn. The thickness of each film layer of the interference film stack 2 corresponds to the range above, which is conducive to reducing the reflectivity of photovoltaic glass 100, and also conducive to reducing the production cost. The thickness of the film layer of the 1st layer to the 5th layer in the interference film stack 2 can be 5nm, 50nm, 5nm, 70nm and 3nm in turn, can be 10nm, 80nm, 10nm, 100nm and 5nm in turn, or can be 15nm, 110nm, 15nm, 130nm and 7nm in turn. It can be understood that the refractive index of the niobium trioxide film layer at wavelength 550nm can be 2.32, and the refractive index of the silica film layer at wavelength 550nm can be 1.46.
[0059] In the embodiment of the utility model, the film layer number of the interference film stack 2 is 6, in the direction of deviating from the glass substrate 1, the 1st layer, the 3rd layer and the 5th layer are high refractive index film layers 21, the 2nd layer, the 4th layer and the 6th layer are low refractive index film layers 22;Among them, the high refractive index film layer 21 is niobium trioxide film layer, the low refractive index film layer 22 is silicon dioxide film layer. The interference film stack 2 described above can reduce the reflectivity of photovoltaic glass 100, and the structure of photovoltaic glass 100 is relatively simple, which can reduce the production cost. Further, in the embodiment of the utility model, the thickness of the film layer of the 1st layer to the 6th layer in the interference film stack 2 is 3nm~7nm, 60nm~100nm, 5nm~15nm, 70nm~130nm, 3nm~7nm and 3nm~7nm in turn. The thickness of each film layer of the interference film stack 2 corresponds to the range above, which is conducive to reducing the reflectivity of photovoltaic glass 100 and also conducive to reducing the production cost. In the interference film stack 2, the thickness of the film layer of the 1st layer to the 6th layer can be 3nm, 60nm, 5nm, 70nm, 3nm and 3nm in turn, can be 5nm, 80nm, 10nm, 100nm, 5nm and 5nm in turn, or can be 7nm, 100nm, 15nm, 130nm, 7nm and 7nm in turn. It can be understood that the refractive index of the niobium trioxide film layer at a wavelength of 550nm can be 2.32, and the refractive index of the silicon dioxide film layer at a wavelength of 550nm can be 1.46.
[0060] In the embodiment of the utility model, the film layer number of the interference film stack 2 is 7, in the direction of deviating from the glass substrate 1, the 1st layer, the 3rd layer, the 5th layer and the 7th layer are high refractive index film layers 21, the 2nd layer, the 4th layer and the 6th layer are low refractive index film layers 22;Among them, the high refractive index film layer 21 is niobium trioxide film layer, the low refractive index film layer 22 is silicon dioxide film layer. The interference film stack 2 described above can reduce the reflectivity of photovoltaic glass 100, and the structure of photovoltaic glass 100 is relatively simple, and the production cost can be reduced. Further, in the embodiment of the utility model, in the interference film stack 2, the thickness of the film layer of the 1st layer to the 7th layer is 5nm~10nm, 35nm~45nm, 20nm~30nm, 15nm~25nm, 120nm~160nm, 20nm~40nm and 15nm~25nm in turn. The thickness of each film layer of the interference film stack 2 corresponds to the range described above, which is conducive to reducing the reflectivity of photovoltaic glass 100, and also conducive to reducing the production cost. In the interference film stack 2, the thickness of the film layer of the 1st layer to the 7th layer can be 5nm, 35nm, 20nm, 15nm, 120nm, 20nm and 15nm in turn, can be 7nm, 40nm, 25nm, 20nm, 140nm, 30nm and 20nm in turn, can be 10nm, 40nm, 30nm, 20nm, 150nm, 30nm and 20nm in turn, or can be 10nm, 45nm, 30nm, 25nm, 160nm, 40nm and 25nm in turn. It can be understood that the refractive index of the niobium trioxide film layer at a wavelength of 550nm can be 2.32, and the refractive index of the silicon dioxide film layer at a wavelength of 550nm can be 1.46.
[0061] In the embodiment of the utility model, the film layer number of the interference film stack 2 is 8, in the direction of deviating from the glass substrate 1, the 1st layer, the 3rd layer, the 5th layer and the 7th layer are high refractive index film layers 21, the 2nd layer, the 4th layer, the 6th layer and the 8th layer are low refractive index film layers 22, wherein, the high refractive index film layer 21 is niobium trioxide film layer, the low refractive index film layer 22 is silica film layer. The interference film stack 2 described above can reduce the reflectivity of photovoltaic glass 100, and the structure of photovoltaic glass 100 is relatively simple, and the production cost can be reduced. Further, in the embodiment of the utility model, the thickness of the film layer of the 1st layer to the 8th layer in the interference film stack 2 is 5nm~10nm, 35nm~50nm, 20nm~25nm, 10nm~20nm, 100nm~130nm, 15nm~25nm, 15nm~20nm and 35nm~65nm in turn. The thickness of each film layer of the interference film stack 2 corresponds to the range described above, which is conducive to reducing the reflectivity of photovoltaic glass 100 and reducing the production cost. The thickness of the film layer of the 1st layer to the 8th layer in the interference film stack 2 can be 5nm, 35nm, 20nm, 10nm, 100nm, 15nm, 15nm and 35nm in turn, can be 7nm, 42nm, 22nm, 15nm, 115nm, 20nm, 17nm and 50nm in turn, can be 10nm, 50nm, 20nm, 20nm, 120nm, 20nm, 20nm and 50nm in turn, or can be 10nm, 50nm, 25nm, 20nm, 130nm, 25nm, 20nm and 65nm in turn. It can be understood that the refractive index of the niobium trioxide film layer at a wavelength of 550nm can be 2.32, and the refractive index of the silica film layer at a wavelength of 550nm can be 1.46.
[0062] In the embodiment of the utility model, the glass substrate 1 includes at least one of super white calender glass and super white float glass. The glass substrate 1 uses the above glass, which is conducive to reducing the reflectivity of photovoltaic glass 100. The glass substrate 1 can be one or a combination of super white calender glass and super white float glass.
[0063] In the embodiment of the utility model, the light transmittance of the glass substrate 1 is greater than or equal to 90%. The light transmittance of the glass substrate 1 is in the range described above, which is conducive to reducing the reflectivity of photovoltaic glass 100. The light transmittance of the glass substrate 1 can be 90%, 91%, 92%, 93%, 94% or 95%.
[0064] In the embodiment of the utility model, the thickness of the glass substrate 1 is 1.6mm~4.0mm. The thickness of the glass substrate 1 is in the above range, which is conducive to reducing the reflectivity of the photovoltaic glass 100 and improving the wear resistance and weather resistance of the photovoltaic glass 100. The thickness of the glass substrate 1 can be 1.6mm, 1.8mm, 2.0mm, 2.2mm, 2.4mm, 2.5mm, 2.8mm, 3.0mm, 3.2mm, 3.4mm, 3.6mm, 3.8mm or 4.0mm.
[0065] In the embodiment of the utility model, the average reflectivity of the photovoltaic glass 100 under near-normal incidence in the 380nm~1100nm wave band is less than or equal to 1%. The average reflectivity of the photovoltaic glass 100 under near-normal incidence in the 380nm~1100nm wave band is in the above range, which can improve the power generation performance of the photovoltaic glass 100.
[0066] The utility model provides a kind of preparation method of above-mentioned photovoltaic glass 100, comprising the following steps:
[0067] S10, by film system design, the film layer structure of optimized design interference film stack 2 is obtained;
[0068] S20, on glass substrate 1, high refractive index film layer 21 and low refractive index film layer 22 are alternately prepared by vacuum plating method, and the film layer structure of optimized design interference film stack 2 is formed;
[0069] S30, on interference film stack 2, coating is prepared using sol-gel method, solidification treatment is carried out, and nanometer porous layer 3 is obtained, and then tempering treatment is carried out, and photovoltaic glass 100 is obtained.
[0070] By vacuum plating method, interference film stack 2 is prepared, sol-gel method is used to prepare nanometer porous layer 3, and then tempering treatment is carried out, and photovoltaic glass 100 is obtained, which is simple and convenient to operate, can realize continuous production of large-area photovoltaic glass 100, and can shorten production cycle.
[0071] It can be understood that the coating process of coating layer prepared by sol-gel method can be spraying, roller coating or shower coating;The process of alternately preparing high refractive index film layer 21 and low refractive index film layer 22 by vacuum plating method can be electron beam evaporation, magnetron sputtering or atomic force deposition;Before vacuum plating of glass substrate 1, it can be cut, edge polished, cleaned and dried for standby.
[0072] In the embodiment of the utility model, step S10 comprises:
[0073] S101, coating is prepared using sol-gel method, solidification treatment is carried out, and nanometer porous layer 3 is obtained, and then tempering treatment is carried out, and nanometer porous layer 3 sample is obtained;
[0074] S102, an ellipsometer is used to test and obtain a refractive index distribution curve of the nanoporous layer 3 sample;
[0075] S103, a vacuum coating method is used to respectively prepare single film layer samples of different materials used in the interference film stack 2, and a plurality of single film layer samples corresponding to different materials are obtained;
[0076] S104, an ellipsometer is used to test and obtain a refractive index distribution curve of each of the plurality of single film layer samples;
[0077] S105, a thin film design software is used to set an optimization target according to a wavelength range and reflection requirements of the antireflection film; the nanoporous layer 3 sample is taken as the outermost layer, and appropriate high-refractive-index film layers 21 and low-refractive-index film layers 22 are selected from the plurality of single film layer samples to perform film system design, and a film layer structure of the optimized design interference film stack 2 is obtained.
[0078] The film layer structure of the optimized design interference film stack 2 obtained by using the above steps can be used to guide the preparation of the interference film stack 2 and control the reflectivity of the photovoltaic glass 100. Further, in the embodiments of the present application, the thickness of the nanoporous layer 3 sample can be 80-120 nm, and the thickness of the single film layer sample can be 80-120 nm.
[0079] In the embodiments of the present application, in step S30, the temperature of the curing treatment is 100-300 DEG C. The temperature of the curing treatment is in the above range, which is beneficial to guarantee the performance of the nanoporous layer 3. The temperature of the curing treatment can be 100 DEG C, 150 DEG C, 200 DEG C, 250 DEG C or 300 DEG C. Preferably, the temperature of the curing treatment is 150-200 DEG C.
[0080] In the embodiments of the present application, in step S30, the temperature of the tempering treatment is 600-700 DEG C. The temperature of the tempering treatment is in the above range, which improves the wear resistance and weather resistance of the photovoltaic glass 100. The temperature of the tempering treatment can be 600 DEG C, 620 DEG C, 650 DEG C, 680 DEG C or 700 DEG C.
[0081] It can be understood that, in step S101, the temperature of the curing treatment can be 100-300 DEG C, and the temperature of the tempering treatment can be 600-700 DEG C.
[0082] The present application also provides a photovoltaic module comprising the photovoltaic glass 100. The structure and preparation method of the photovoltaic glass 100 are as described above. Since the photovoltaic module adopts all the technical solutions of the above embodiments, it at least has all the beneficial effects brought by the technical solutions of the above embodiments, which will not be repeated here.
[0083] The technical scheme of the utility model will be explained in further detail in connection with specific embodiments. It should be understood that the following embodiments are only used to explain the utility model and not to limit the utility model.
[0084] Embodiment 1
[0085] A photovoltaic glass 100 comprises a glass substrate 1 and an interference film stack 2 and a nano-porous silica layer arranged on one side of the glass substrate 1; the interference film stack 2 comprises high refractive index film layers 21 and low refractive index film layers 22 arranged alternately in the direction away from the glass substrate 1, and the porous structure of the nano-porous silica layer is a surface closed pore structure.
[0086] The number of film layers of the interference film stack 2 is 3, in the direction away from the glass substrate 1, the first layer and the third layer are high refractive index film layers 21 (H 1.81 ) with a refractive index of 1.81 at a wavelength of 550 nm, and the second layer is a low refractive index film layer 22 (L 1.46 ) with a refractive index of 1.46 at a wavelength of 550 nm; the high refractive index film layer 21 is a yttrium trioxide film layer (Y2O3 film layer), and the low refractive index film layer 22 is a silicon dioxide film layer (SiO2 film layer);
[0087] The difference between the expansion coefficients of the glass substrate 1 and the adjacent film layers is 0.6*10 -6 / K;
[0088] In the interference film stack 2, the difference between the expansion coefficients of any two adjacent film layers is 8*10 -6 / K;
[0089] The specific structure of the photovoltaic glass 100 is 2.0mm glass substrate 1 / / 150nm H 1.81 / / 20nm L 1.46 / / 40H 1.81 / / 100nm nano-porous silica layer;
[0090] The preparation method of the photovoltaic glass 100 comprises the following steps:
[0091] On the glass substrate 1, high refractive index film layers 21 (H 1.81 ) and low refractive index film layers 22 (H 1.46 ) are alternately prepared by vacuum coating to obtain the interference film stack 2;
[0092] On the interference film stack 2, a coating is prepared by sol-gel method, solidification treatment is performed to obtain the nano-porous silica layer, and then tempering treatment is performed to obtain the photovoltaic glass 100; wherein the temperature of the solidification treatment is 150℃, and the temperature of the tempering treatment is 600℃.
[0093] Example 2
[0094] A photovoltaic glass 100 comprises a glass substrate 1 and an interference film stack 2 and a nano-porous silica layer provided on one side of the glass substrate 1; the interference film stack 2 comprises high refractive index film layers 21 and low refractive index film layers 22 arranged alternately in a direction away from the glass substrate 1, and the nano-porous silica layer has a porous structure of surface closed pore structure;
[0095] The number of film layers of the interference film stack 2 is 4, in a direction away from the glass substrate 1, the 1st layer and the 3rd layer are high refractive index film layers 21 (H 2.32 ) with a refractive index of 2.32 at a wavelength of 550 nm, and the 2nd layer and the 4th layer are low refractive index film layers 22 (L 1.46 ) with a refractive index of 1.46 at a wavelength of 550 nm, the high refractive index film layers 21 are niobium trioxide film layers (Nb2O3 film layers), and the low refractive index film layers 22 are silicon dioxide film layers (SiO2 film layers);
[0096] The difference between the expansion coefficients of the glass substrate 1 and the adjacent film layers is 2.5*10 -6 / K;
[0097] In the interference film stack 2, the difference between the expansion coefficients of any two adjacent film layers is 5*10 -6 / K;
[0098] The specific structure of the photovoltaic glass 100 is 2.0mm glass substrate 1 / / 5nm H 2.32 / / 100nm L 1.46 / / 10nm H 2.32 / / 120nm L 1.46 / / 100nm nano-porous silica layer;
[0099] The preparation method of the photovoltaic glass 100 comprises the following steps:
[0100] On the glass substrate 1, high refractive index film layers 21 (H 2.32 ) and low refractive index film layers 22 (L 1.46 ) are alternately prepared by vacuum coating to obtain the interference film stack 2;
[0101] On the interference film stack 2, a coating is prepared by sol-gel method, solidification treatment is performed to obtain the nano-porous silica layer, and then tempering treatment is performed to obtain the photovoltaic glass 100; wherein the temperature of the solidification treatment is 150℃, and the temperature of the tempering treatment is 600℃.
[0102] Example 3
[0103] A photovoltaic glass 100, comprising a glass substrate 1, and an interference film stack 2 and a nano-porous silica layer arranged on one side of the glass substrate 1; the interference film stack 2 comprises high refractive index film layers 21 and low refractive index film layers 22 arranged alternately in a direction away from the glass substrate 1, and the nano-porous silica layer has a surface closed-pore structure;
[0104] The number of film layers of the interference film stack 2 is 5, in a direction away from the glass substrate 1, the 1st layer, the 3rd layer and the 5th layer are high refractive index film layers 21 (H 2.32 ) with a refractive index of 2.32 at a wavelength of 550 nm, and the 2nd layer and the 4th layer are low refractive index film layers 22 (L 1.46 ) with a refractive index of 1.46 at a wavelength of 550 nm, the high refractive index film layers 21 are niobium trioxide film layers (Nb2O3 film layers), and the low refractive index film layers 22 are silicon dioxide film layers (SiO2 film layers);
[0105] The difference between the expansion coefficients of the glass substrate 1 and the adjacent film layers is 2.5*10 -6 / K;
[0106] In the interference film stack 2, the difference between the expansion coefficients of any two adjacent film layers is 5*10 -6 / K;
[0107] The specific structure of the photovoltaic glass 100 is 2.0mm glass substrate 1 / / 10nm H 2.32 / / 80nm L 1.46 / / 10nm H 2.32 / / 100nm L 1.46 / / 5nm H 2.32 / / 80nm nano-porous silica layer;
[0108] The preparation method of the photovoltaic glass 100 comprises the following steps:
[0109] On the glass substrate 1, high refractive index film layers 21 (H 2.32 ) and low refractive index film layers 22 (H 1.46 ) are alternately prepared by vacuum coating to obtain the interference film stack 2;
[0110] On the interference film stack 2, a coating layer is prepared by sol-gel method, solidification treatment is performed to obtain the nano-porous silica layer, and then tempering treatment is performed to obtain the photovoltaic glass 100; wherein the solidification treatment temperature is 150℃, and the tempering treatment temperature is 650℃.
[0111] Example 4
[0112] A photovoltaic glass 100 comprises a glass substrate 1 and an interference film stack 2 and a nano-porous silica layer provided on one side of the glass substrate 1; the interference film stack 2 comprises high refractive index film layers 21 and low refractive index film layers 22 arranged alternately in a direction away from the glass substrate 1, and the nano-porous silica layer has a surface closed-pore structure;
[0113] The interference film stack 2 has 6 layers, and in a direction away from the glass substrate 1, the 1st layer, the 3rd layer and the 5th layer are high refractive index film layers 21 (H 2.32 ) having a refractive index of 2.32 at a wavelength of 550 nm, and the 2nd layer, the 4th layer and the 6th layer are low refractive index film layers 22 (L 1.46 ) having a refractive index of 1.46 at a wavelength of 550 nm; the high refractive index film layers 21 are niobium trioxide film layers (Nb2O3 film layers), and the low refractive index film layers 22 are silica film layers (SiO2 film layers);
[0114] The difference between the expansion coefficients of the glass substrate 1 and the adjacent film layers is 2.5*10 -6 / K;
[0115] In the interference film stack 2, the difference between the expansion coefficients of any two adjacent film layers is 5*10 -6 / K;
[0116] The photovoltaic glass 100 has a specific structure of 2.0mm glass substrate 1 / / 5nm H 2.32 / / 80nm L 1.46 / / 10nm H 2.32 / / 100nm L 1.46 / / 5nm H 2.32 / / 5nm L 1.46 / / 120nm nano-porous silica layer;
[0117] The preparation method of the photovoltaic glass 100 comprises the following steps:
[0118] On the glass substrate 1, high refractive index film layers 21 (H 2.32 ) and low refractive index film layers 22 (L 1.46 ) are alternately prepared by vacuum coating to obtain the interference film stack 2;
[0119] On the interference film stack 2, a coating layer is prepared by sol-gel method, and solidification treatment is performed to obtain the nano-porous silica layer, and then tempering treatment is performed to obtain the photovoltaic glass 100; wherein the solidification treatment temperature is 150℃, and the tempering treatment temperature is 650℃.
[0120] Example 5
[0121] A photovoltaic glass 100 comprises a glass substrate 1 and an interference film stack 2 and a nano-porous silica layer provided on one side of the glass substrate 1; the interference film stack 2 comprises high refractive index film layers 21 and low refractive index film layers 22 arranged alternately in a direction away from the glass substrate 1, and the nano-porous silica layer has a surface closed-pore structure;
[0122] The interference film stack 2 has 7 layers, in a direction away from the glass substrate 1, the 1st layer, the 3rd layer, the 5th layer and the 7th layer are high refractive index film layers 21 (H 2.32 ) with a refractive index of 2.32 at a wavelength of 550 nm, and the 2nd layer, the 4th layer and the 6th layer are low refractive index film layers 22 (L 1.46 ) with a refractive index of 1.46 at a wavelength of 550 nm; the high refractive index film layers 21 are niobium trioxide film layers (Nb2O3 film layers), and the low refractive index film layers 22 are silica film layers (SiO2 film layers);
[0123] The difference between the expansion coefficients of the glass substrate 1 and the adjacent film layers is 2.5*10 -6 / K;
[0124] In the interference film stack 2, the difference between the expansion coefficients of any two adjacent film layers is 5*10 -6 / K;
[0125] The specific structure of the photovoltaic glass 100 is 2.0mm glass substrate 1 / / 10nm H 2.32 / / 40nm L 1.46 / / 30nmH 2.32 / / 20nm L 1.46 / / 150nm H 2.32 / / 30nm L 1.46 / / 20nm H 2.32 / / 150nm nano-porous silica layer;
[0126] The preparation method of the photovoltaic glass 100 comprises the following steps:
[0127] On the glass substrate 1, high refractive index film layers 21 (H 2.32 ) and low refractive index film layers 22 (H 1.46 ) are alternately prepared by vacuum coating to obtain the interference film stack 2;
[0128] On the interference film stack 2, a coating layer is prepared by sol-gel method, solidification treatment is performed to obtain the nano-porous silica layer, and then tempering treatment is performed to obtain the photovoltaic glass 100; wherein the solidification treatment temperature is 150℃, and the tempering treatment temperature is 700℃.
[0129] Example 6
[0130] A photovoltaic glass 100 comprises a glass substrate 1 and an interference film stack 2 and a nano-porous silica layer provided on one side of the glass substrate 1; the interference film stack 2 comprises high refractive index film layers 21 and low refractive index film layers 22 arranged alternately in a direction away from the glass substrate 1, and the nano-porous silica layer has a surface closed-pore structure;
[0131] The number of film layers of the interference film stack 2 is 8, and in a direction away from the glass substrate 1, the 1st layer, the 3rd layer, the 5th layer and the 7th layer are high refractive index film layers 21 (H 2.32 ) having a refractive index of 2.32 at a wavelength of 550 nm, and the 2nd layer, the 4th layer, the 6th layer and the 8th layer are low refractive index film layers 22 (L 1.46 ) having a refractive index of 1.46 at a wavelength of 550 nm; the high refractive index film layers 21 are niobium trioxide film layers (Nb2O3 film layers), and the low refractive index film layers 22 are silicon dioxide film layers (SiO2 film layers);
[0132] The difference between the expansion coefficients of the glass substrate 1 and the adjacent film layers is 2.5*10 -6 / K;
[0133] In the interference film stack 2, the difference between the expansion coefficients of any two adjacent film layers is 5*10 -6 / K;
[0134] The specific structure of the photovoltaic glass 100 is 2.0 mm glass substrate 1 / / 10 nm H 2.32 / / 50 nm L 1.46 / / 20 nm H 2.32 / / 20 nm L 1.46 / / 120 nm H 2.32 / / 20 nm L 1.46 / / 20 nm H 2.32 / / 50 nm L 1.46 / / 60 nm nano-porous silica layer;
[0135] The preparation method of the photovoltaic glass 100 comprises the following steps:
[0136] On the glass substrate 1, high refractive index film layers 21 (H 2.32 ) and low refractive index film layers 22 (H 1.46 ) are alternately prepared by vacuum coating to obtain the interference film stack 2;
[0137] On the interference film stack 2, a coating is prepared by sol-gel method, a curing treatment is performed to obtain the nano-porous silica layer, and then a tempering treatment is performed to obtain the photovoltaic glass 100; wherein the temperature of the curing treatment is 150°C, and the temperature of the tempering treatment is 700°C.
[0138] Comparative Example 1
[0139] A photovoltaic glass 100 is a commercially available double-layer coated glass, and the specific structure is: 2.0 mm glass substrate 1 / / 80 nm film layer with a refractive index of 1.44 / / 120 nm film layer with a refractive index of 1.30.
[0140] Performance Test
[0141] (1) Reflectivity Test
[0142] The reflectivity of the photovoltaic glass 100 of Examples 1 to 6 and Comparative Example 1 under near-normal incidence at a wavelength of 380 nm to 1100 nm was tested, respectively, and the reflectivity spectrum of the photovoltaic glass 100 of Examples 1 to 6 and Comparative Example 1 under near-normal incidence at a wavelength of 380 nm to 1100 nm is shown in FIG. 1, FIG. 2, FIG. 3, FIG. 4, FIG. 5, FIG. 6 and FIG. 7, respectively. Figures 3 to 9 The average reflectivity of the photovoltaic glass 100 of Examples 1 to 6 and Comparative Example 1 under near-normal incidence at a wavelength of 380 nm to 1100 nm is shown in Table 1.
[0143] (2) Abrasion Resistance Test
[0144] The film hardness of the photovoltaic glass 100 of Examples 1 to 6 and Comparative Example 1 was determined by pencil method, according to GB / T 6739-2006 “Determination of Film Hardness by Pencil Method for Paint and Varnish”, and the industry requirement is that the pencil hardness of the film layer is greater than or equal to 4H; the results are shown in Table 1.
[0145] (3) Weather Resistance Test
[0146] The weather resistance of the photovoltaic glass 100 of Examples 1 to 6 and Comparative Example 1 was tested by accelerated aging test, and the decrease in light transmittance was determined after pressure cooking aging (PCT) for 48 h, and the decrease in light transmittance was determined again after pressure cooking aging (PCT) for another 48 h (PCT 96 h), according to JC / T 2170-2013 “Anti-reflective Film Glass for Solar Photovoltaic Modules”, and the industry requirement is that the decrease in light transmittance is not more than 1% after pressure cooking aging (PCT) for 48 h under the condition of a temperature of 121°C and a relative humidity of 100%; the results are shown in Table 1.
[0147] Table 1 Performance Test Results of Photovoltaic Glass of Examples 1 to 6 and Comparative Example 1
[0148]
[0149] As can be seen from Table 1, the photovoltaic glass 100 of Examples 1 to 6 has an average reflectivity of less than 1% for near-normal incidence in the wavelength range of 380nm to 1100nm, and the average reflectivity of the photovoltaic glass 100 of Examples 1 to 6 is reduced by 0.21% to 0.71% compared with Comparative Example 1 in the wavelength range of 380nm to 1100nm, indicating that the photovoltaic glass 100 of the utility model can reduce the reflectivity; the film layer of the photovoltaic glass 100 of Examples 1 to 6 has a pencil hardness of 4H, indicating that the photovoltaic glass 100 of the utility model has good wear resistance and can meet the industry requirements; the photovoltaic glass 100 of Examples 1 to 6 has a light transmittance decrease value of 0.11% to 0.25% after pressure cooking aging for 48h, and a light transmittance decrease value of 0.22% to 0.31% after pressure cooking aging for 96h, indicating that the photovoltaic glass 100 of the utility model has good weather resistance and can meet the industry requirements; and compared with Comparative Example 1, the photovoltaic glass 100 of Examples 1 to 6 has a reduced light transmittance decrease value after pressure cooking aging for 48h and after pressure cooking aging for 96h, indicating that the photovoltaic glass 100 of the utility model can even improve the weather resistance; in summary, the photovoltaic glass 100 of the utility model can reduce the reflectivity, and can also take into account the wear resistance and weather resistance, thereby improving the power generation performance of the photovoltaic module.
[0150] The above description is merely exemplary embodiments of the utility model, and does not limit the patent scope of the utility model, and any equivalent structural transformation made by using the utility model specification and drawings, or direct / indirect application in other related technical fields is included in the patent protection scope of the utility model.
Claims
1. A photovoltaic glass, characterized in that, The anti-reflective film is provided on one side of a glass substrate, and comprises a nano-porous layer and an interference film stack provided in sequence on the glass substrate; wherein the interference film stack comprises high refractive index film layers and low refractive index film layers arranged alternately in a direction away from the glass substrate, and the nano-porous layer has a surface closed-pore structure.
2. The photovoltaic glass of claim 1, wherein, the difference in the coefficient of expansion between the glass substrate and the adjacent film layer is less than or equal to 5 x 10 -6 / K; and / or, The difference between the expansion coefficients of any two adjacent layers in the stack of interference films is less than or equal to 8 x 10 -6 / K; and / or, In the interference film stack, the high refractive index film layers have a refractive index of 1.8-2.5 at a wavelength of 550 nm; and / or, In the interference film stack, the low refractive index film layers have a refractive index of 1.4-2.2 at a wavelength of 550 nm.
3. The photovoltaic glass of claim 1, wherein, The nano-porous layer has a thickness of 50-200 nm; and / or, The nano-porous layer has a pore size of 10-80 nm; and / or, The nano-porous layer has a refractive index of 1.28-1.32 at a wavelength of 550 nm; and / or, The nano-porous layer comprises any one of a nano-porous aluminum trioxide layer, a nano-porous silicon dioxide layer, a nano-porous titanium dioxide layer, a nano-porous zinc oxide layer, and a nano-porous tin dioxide layer.
4. The photovoltaic glass of claim 1, wherein, The interference film stack has 3 layers, and in a direction away from the glass substrate, the first and third layers are high refractive index film layers, and the second layer is a low refractive index film layer; wherein the high refractive index film layers are yttrium trioxide film layers, and the low refractive index film layer is a silicon dioxide film layer; in the interference film stack, the thicknesses of the first to third layers are 120-180 nm, 20-40 nm, and 20-40 nm, respectively.
5. The photovoltaic glass of claim 1, wherein, The interference film stack has 4 layers, and in a direction away from the glass substrate, the first and third layers are high refractive index film layers, and the second and fourth layers are low refractive index film layers; wherein the high refractive index film layers are niobium trioxide film layers, and the low refractive index film layers are silicon dioxide film layers; in the interference film stack, the thicknesses of the first to fourth layers are 3-7 nm, 70-130 nm, 5-15 nm, and 90-150 nm, respectively.
6. The photovoltaic glass of claim 1, wherein, The interference film stack has 5 layers, and in a direction away from the glass substrate, the first, third, and fifth layers are high refractive index film layers, and the second and fourth layers are low refractive index film layers; wherein the high refractive index film layers are niobium trioxide film layers, and the low refractive index film layers are silicon dioxide film layers; in the interference film stack, the thicknesses of the first to fifth layers are 5-15 nm, 50-110 nm, 5-15 nm, 70-130 nm, and 3-7 nm, respectively.
7. The photovoltaic glass of claim 1, wherein, The number of the film layers of the interference film stack is 6, in the direction away from the glass substrate, the 1st layer, the 3rd layer and the 5th layer are high refractive index film layers, and the 2nd layer, the 4th layer and the 6th layer are low refractive index film layers; wherein the high refractive index film layer is a niobium trioxide film layer, and the low refractive index film layer is a silicon dioxide film layer; in the interference film stack, the thicknesses of the 1st layer to the 6th layer are 3nm-7nm, 60nm-100nm, 5nm-15nm, 70nm-130nm, 3nm-7nm and 3nm-7nm respectively.
8. The photovoltaic glass of claim 1, wherein, The number of the film layers of the interference film stack is 7, in the direction away from the glass substrate, the 1st layer, the 3rd layer, the 5th layer and the 7th layer are high refractive index film layers, and the 2nd layer, the 4th layer and the 6th layer are low refractive index film layers; wherein the high refractive index film layer is a niobium trioxide film layer, and the low refractive index film layer is a silicon dioxide film layer; in the interference film stack, the thicknesses of the 1st layer to the 7th layer are 5nm-10nm, 35nm-45nm, 20nm-30nm, 15nm-25nm, 120nm-160nm, 20nm-40nm and 15nm-25nm respectively.
9. The photovoltaic glass of claim 1, wherein, The number of the film layers of the interference film stack is 8, in the direction away from the glass substrate, the 1st layer, the 3rd layer, the 5th layer and the 7th layer are high refractive index film layers, and the 2nd layer, the 4th layer, the 6th layer and the 8th layer are low refractive index film layers; wherein the high refractive index film layer is a niobium trioxide film layer, and the low refractive index film layer is a silicon dioxide film layer; in the interference film stack, the thicknesses of the 1st layer to the 8th layer are 5nm-10nm, 35nm-50nm, 20nm-25nm, 10nm-20nm, 100nm-130nm, 15nm-25nm, 15nm-20nm and 35nm-65nm respectively.
10. A photovoltaic module, characterized by, The photovoltaic glass comprises the photovoltaic glass according to any one of claims 1-9.