Semiconductor cleaning fluid treatment device

Abstract

The utility model discloses a semiconductor cleaning liquid treatment device, which relates to the technical field of cleaning waste liquid treatment, and comprises a cleaning liquid accommodating component, a cleaning liquid storage component and a liquid storage component, the stirring mechanism is used for stirring the cleaning liquid; the treating agent adding mechanism comprises an L-shaped plate, a treating agent containing barrel, a top plate, a piston barrel, a limiting ring, a piston plate, a piston rod, an output pipe and an input pipe; the L-shaped plate is fixedly arranged at the top of the right side of the sedimentation tank, the treating agent containing barrel is placed at the top of the L-shaped plate, the top plate is fixedly arranged at the top end of the L-shaped plate, the piston cylinder penetrates through the top plate and is fixedly connected with the top plate, and the limiting ring is fixedly arranged at the top of the inner side of the piston cylinder. According to the quantitative adding device, quantitative adding of the treating agent can be conveniently completed, manpower is saved, and meanwhile actual use is more convenient.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of cleaning waste liquid treatment, especially relates to a semiconductor cleaning liquid treatment device. BACKGROUND

[0002] A large amount of cleaning wastewater is produced in the semiconductor production and processing process, and the main pollutants in the cleaning wastewater are high-concentration suspended particles and heavy metal ions and other impurities. In order to avoid environmental pollution, the cleaning waste liquid needs to be purified before discharge.

[0003] After searching, the utility model patent with patent authorization announcement number CN221940232U discloses a semiconductor cleaning liquid treatment device, which comprises a sedimentation tank and a motor, the inside of the sedimentation tank is rotationally connected with symmetrically arranged mounting racks, symmetrically arranged through grooves are formed in the side walls of the mounting racks, symmetrically arranged moving blocks are slidably connected in the mounting racks, rotating rods are rotationally connected between the moving blocks on the same horizontal plane, two transmission racks are fixedly connected to the inner sides of the sedimentation tank, and guide frames are fixedly connected to the inner sides of the sedimentation tank.

[0004] However, the above-mentioned device still has some shortcomings in actual use. The most obvious one is that when adding the treatment agent to the sedimentation tank, it is mostly done manually. When manually adding the treatment agent, in order to avoid adding too much or too little, it is often necessary to manually use a weighing device to weigh a certain amount of treatment agent for addition, which is tedious and wastes manpower, and is not convenient in actual use.

[0005] Therefore, it is necessary to invent a semiconductor cleaning liquid treatment device to solve the above-mentioned problems. UTILITY MODEL CONTENTS

[0006] The utility model aims at providing a semiconductor cleaning liquid treatment device, which can conveniently complete the quantitative addition of the treatment agent, save manpower and be more convenient in actual use, so as to solve the problem that when adding the treatment agent to the sedimentation tank, it is mostly done manually, and when manually adding the treatment agent, in order to avoid adding too much or too little, it is often necessary to manually use a weighing device to weigh a certain amount of treatment agent for addition, which is tedious and wastes manpower, and is not convenient in actual use.

[0007] According to one aspect of the present disclosure, the following technical solution is provided: a semiconductor cleaning liquid treatment device, comprising:

[0008] A cleaning liquid containing assembly is used to contain cleaning liquid.

[0009] A stirring mechanism for stirring the cleaning liquid; and

[0010] A processing agent adding mechanism, which comprises an L-shaped plate, a processing agent containing barrel, a top plate, a piston cylinder, a limiting ring, a piston plate, a piston rod, an output pipe and an input pipe;

[0011] The L-shaped plate is fixedly arranged at the top of the right side of the sedimentation tank, the processing agent containing barrel is placed on the top of the L-shaped plate, the top plate is fixedly arranged at the top end of the L-shaped plate, the piston cylinder penetrates through the top plate and is fixedly connected with the top plate, the limiting ring is fixedly arranged at the top of the inner side of the piston cylinder, the piston plate is slidably arranged in the vertical direction in the inner side of the piston cylinder, the piston rod is fixedly arranged at the top of the piston plate, the output pipe is fixedly and penetratingly arranged at the bottom of the piston cylinder, the input pipe is fixedly and penetratingly arranged at the side of the piston cylinder and extends into the processing agent containing barrel, and a one-way valve is arranged on each of the output pipe and the input pipe.

[0012] According to the semiconductor cleaning liquid processing device of at least one embodiment of the present disclosure, the cleaning liquid containing assembly comprises a sedimentation tank and a drain pipe, and the drain pipe is fixedly and penetratingly arranged at the bottom of the right side of the sedimentation tank.

[0013] According to the semiconductor cleaning liquid processing device of at least one embodiment of the present disclosure, the stirring mechanism comprises a driving motor and a rotating disc, the driving motor is fixedly arranged at the middle of the right side of the sedimentation tank, and the rotating disc is located in the interior of the sedimentation tank and is in transmission connection with the driving motor.

[0014] According to the semiconductor cleaning liquid processing device of at least one embodiment of the present disclosure, the stirring mechanism further comprises a stirring shaft and stirring plates, the stirring shaft penetrates through the rotating disc and is in rotary connection with the rotating disc through a bearing, and a plurality of stirring plates are arranged, and the plurality of stirring plates are uniformly fixedly arranged outside the stirring shaft.

[0015] According to the semiconductor cleaning liquid processing device of at least one embodiment of the present disclosure, the stirring mechanism further comprises a gear and a gear ring, the gear is fixedly sleeved and arranged at the right end of the stirring shaft, the gear ring is fixedly arranged at the right end in the interior of the sedimentation tank, and the gear ring is in engagement with the gear.

[0016] The technical effects and advantages of the present application are as follows:

[0017] The utility model discloses a handle processing agent adding mechanism, to facilitate the storage of processing agent in the processing agent containing barrel, after adding the quantitative processing sewage to the inside of the sedimentation tank, manually pull the piston rod upwards, make the piston rod drive piston board continuously move up in the piston cylinder, when due to the restriction of check valve on the output pipe, the processing agent in the processing agent containing barrel is inhaled to the inside of piston cylinder through the input pipe, along with the continuous movement of piston board, the limit ring is blocked to piston board, when using piston rod drive piston board to move down, due to the restriction of check valve on the input pipe, the processing agent in the piston cylinder falls into the inside of the sedimentation tank and mixes with the cleaning fluid therein, compared with the prior art same type device, the utility model discloses can be more convenient to complete the quantitative addition of processing agent, save the manpower, and it is more convenient to use actually. BRIEF DESCRIPTION OF DRAWINGS

[0018] The accompanying drawings illustrate exemplary embodiments of the present disclosure and together with the general description of the disclosure given above, and the detailed description of the embodiments below, serve to explain the principles of the present disclosure.

[0019] Figure 1 It is the whole structure schematic diagram of semiconductor cleaning liquid processing device according to one embodiment of the present disclosure.

[0020] Figure 2 It is the cleaning liquid containing subassembly and stirring mechanism structure schematic diagram of semiconductor cleaning liquid processing device according to one embodiment of the present disclosure.

[0021] Figure 3 It is the processing agent adding mechanism structure schematic diagram of semiconductor cleaning liquid processing device according to one embodiment of the present disclosure.

[0022] The specific reference signs in the drawings are as follows:

[0023] 1, cleaning liquid containing subassembly;11, sedimentation tank;12, drain pipe;

[0024] 2, stirring mechanism;21, drive motor;22, rotary disc;23, stirring shaft;24, stirring board;25, gear;26, gear ring;

[0025] 3, processing agent adding mechanism;31, L-shaped plate;32, processing agent containing barrel;33, top plate;34, piston cylinder;35, limit ring;36, piston board;37, piston rod;38, output pipe;39, input pipe. DETAILED DESCRIPTION

[0026] For descriptive purposes, the present disclosure can use spatial or relative terms, such as "below," "lower," "lowermost," "above," "upper" and "higher" and "side" (e.g., as in "sidewall") to describe the relative relationship between one element and another element as illustrated in the figures. The spatial or relative terms are intended to encompass different orientations of the device in use, operation and / or manufacture, for example, the device can be inverted consistent with the use of "below" or "under" as opposed to "above" or "over" as used herein. Accordingly, the exemplary term "below" can encompass both an orientation of above and below. Moreover, the device can be otherwise oriented (e.g., rotated 90 degrees or at other orientations) and the spatial or relative descriptors used herein interpreted accordingly.

[0027] Figure 1 is a schematic diagram of the overall structure of a semiconductor cleaning solution processing device according to an embodiment of the present disclosure.

[0028] Figure 2 is a schematic diagram of the structure of a cleaning solution containing assembly 1 and a stirring mechanism 2 of a semiconductor cleaning solution processing device according to an embodiment of the present disclosure.

[0029] Figure 3 is a schematic diagram of the structure of a processing agent adding mechanism 3 of a semiconductor cleaning solution processing device according to an embodiment of the present disclosure.

[0030] As shown in Figures 1-3 , the semiconductor cleaning solution processing device of the present disclosure can include a cleaning solution containing assembly 1, a stirring mechanism 2, and a processing agent adding mechanism 3, and the like.

[0031] As shown in Figure 2 , in the present disclosure, the cleaning solution containing assembly 1 includes a sedimentation tank 11 and a drain pipe 12, wherein the drain pipe 12 is fixedly disposed through the right side bottom of the sedimentation tank 11.

[0032] As shown in Figure 2As shown, in a preferred embodiment, the stirring mechanism 2 includes a drive motor 21, a rotating disk 22, a stirring shaft 23, a stirring plate 24, a gear 25, and a gear ring 26. The drive motor 21 is fixedly disposed in the middle of the right side of the sedimentation tank 11. The rotating disk 22 is located inside the sedimentation tank 11 and is connected to the drive motor 21 for transmission. The stirring shaft 23 passes through the rotating disk 22 and is rotatably connected to the rotating disk 22 through a bearing. Multiple stirring plates 24 are provided, and the multiple stirring plates 24 are evenly fixedly disposed on the outside of the stirring shaft 23. The gear 25 is fixedly sleeved on the right end of the stirring shaft 23. The gear ring 26 is fixedly disposed inside the right end of the sedimentation tank 11, and the gear ring 26 meshes with the gear 25.

[0033] Therefore, the drive motor 21 can be used to drive the rotating disk 22 to rotate. When the rotating disk 22 rotates, it drives the stirring shaft 23 to revolve. During the revolve of the stirring shaft 23, the gear ring 26 drives the gear 25 to rotate. The gear 25 then drives the stirring shaft 23 to rotate. During the rotation of the stirring shaft 23, multiple stirring plates 24 are driven to stir the cleaning liquid, so as to achieve the mixing of the cleaning liquid and the treatment agent.

[0034] like Figure 3 As shown in this disclosure, the treatment agent adding mechanism 3 includes an L-shaped plate 31, a treatment agent holding tank 32, a top plate 33, a piston cylinder 34, a limiting ring 35, a piston plate 36, a piston rod 37, an output pipe 38, and an input pipe 39. The L-shaped plate 31 is fixedly disposed on the top right side of the sedimentation tank 11. The treatment agent holding tank 32 is placed on top of the L-shaped plate 31. The top plate 33 is fixedly disposed on the top of the L-shaped plate 31. The piston cylinder 34 penetrates the top plate 33 and is fixedly connected to it. The limiting ring 35 is fixedly disposed on the top inner side of the piston cylinder 34. The piston plate 36 is slidably disposed vertically inside the piston cylinder 34. The piston rod 37 is fixedly disposed on top of the piston plate 36. The output pipe 38 is fixedly disposed through the bottom of the piston cylinder 34. The input pipe 39 is fixedly disposed through the side of the piston cylinder 34 and extends into the treatment agent holding tank 32. Both the output pipe 38 and the input pipe 39 are equipped with one-way valves.

[0035] Thus, in order to facilitate the addition of the treatment agent to the inside of the treatment agent containing barrel 32 for storage, after subsequent addition of a quantitative treatment sewage to the inside of the sedimentation tank 11, the piston rod 37 is manually pulled upward, so that the piston rod 37 drives the piston plate 36 to continuously move upward inside the piston cylinder 34, at this time, due to the restriction of the one-way valve on the output pipe 38, the treatment agent inside the treatment agent containing barrel 32 is sucked into the inside of the piston cylinder 34 through the input pipe 39, with the continuous upward movement of the piston plate 36, the limiting ring 35 blocks the piston plate 36, at this time, the piston plate 36 is driven to move downward by the piston rod 37, due to the restriction of the one-way valve on the input pipe 39, the treatment agent inside the piston cylinder 34 falls into the inside of the sedimentation tank 11 through the output pipe 38 and mixes with the cleaning liquid therein, compared with the same type of device in the prior art, the quantitative addition of the treatment agent can be more conveniently completed, the labor is saved, and the actual use is more convenient.

[0036] In addition, it also needs to be explained that the contents not described in detail in the specification belong to the prior art known to those skilled in the art.

[0037] Those skilled in the art should understand that the above embodiments are only for clearly illustrating the present disclosure, and are not intended to limit the scope of the present disclosure. Based on the above disclosure, other changes or modifications can also be made by those skilled in the art, and these changes or modifications are still within the scope of the present disclosure.

Claims

1. A semiconductor cleaning fluid treatment apparatus, characterized in that, Include: The cleaning liquid containing assembly is used to contain cleaning liquid; The stirring mechanism is used to stir the cleaning liquid; And The processing agent adding mechanism includes an L-shaped plate, a processing agent containing barrel, a top plate, a piston cylinder, a limiting ring, a piston plate, a piston rod, an output pipe and an input pipe; The L-shaped plate is fixedly arranged at the top right side of the sedimentation tank, the processing agent containing barrel is placed on the top of the L-shaped plate, the top plate is fixedly arranged at the top end of the L-shaped plate, the piston cylinder penetrates through the top plate and is fixedly connected with the top plate, the limiting ring is fixedly arranged at the top inside of the piston cylinder, the piston plate is slidably arranged inside the piston cylinder in the vertical direction, the piston rod is fixedly arranged at the top of the piston plate, the output pipe is fixedly and penetratingly arranged at the bottom of the piston cylinder, the input pipe is fixedly and penetratingly arranged at the side of the piston cylinder and extends into the processing agent containing barrel, and a one-way valve is arranged on the output pipe and the input pipe.

2. The semiconductor cleaning solution processing apparatus according to claim 1, wherein: The cleaning liquid containing assembly includes a sedimentation tank and a drain pipe, and the drain pipe is fixedly and penetratingly arranged at the bottom right side of the sedimentation tank.

3. The semiconductor cleaning solution processing apparatus according to claim 2, wherein: The stirring mechanism includes a driving motor and a rotating disc, the driving motor is fixedly arranged at the middle right side of the sedimentation tank, and the rotating disc is located inside the sedimentation tank and is drivingly connected with the driving motor.

4. The semiconductor cleaning solution processing apparatus according to claim 3, wherein: The stirring mechanism further includes a stirring shaft and a plurality of stirring plates, the stirring shaft penetrates through the rotating disc and is rotatably connected with the rotating disc through a bearing, and the plurality of stirring plates are uniformly and fixedly arranged outside the stirring shaft.

5. The semiconductor cleaning solution processing apparatus according to claim 4, wherein: The stirring mechanism further includes a gear and a gear ring, the gear is fixedly and sleevedly arranged at the right end of the stirring shaft, and the gear ring is fixedly arranged at the right end inside the sedimentation tank, and the gear ring is engaged with the gear.

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