Concentration measuring device for etching liquid processing

Abstract

The utility model relates to the technical field of etching solution processing, in particular to a concentration measuring device for etching solution processing, which comprises an etching solution tank, solution storage tanks are fixedly mounted on two sides of the etching solution tank, a solution adding pipe is fixedly mounted at the top of each solution storage tank in a penetrating manner, and a discharge pipe is fixedly mounted below one side of the etching solution tank in a penetrating manner. And a second metering pump is arranged on the discharge pipe and is fixedly connected with one side of the etching solution tank. According to the concentration measuring device for etching liquid processing, through cooperative use of the etching liquid tank, the liquid storage tank, the master controller, the adding pipe, the first metering pump, the liquid adding pipe, the second metering pump, the discharging pipe and the photoelectric sensor, the concentration of etching liquid can be monitored on line in real time, manual intervention is reduced, stability of the concentration of the etching liquid can be kept through the automatic adjusting unit, and the working efficiency is improved. The defective rate is reduced, and the technological process is optimized, so that the production efficiency and the product quality are remarkably improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to etching liquid processing technical field, concretely is a concentration measuring device for etching liquid processing. BACKGROUND

[0002] In the process of chemical production, it is necessary to make words, patterns or prints on the surface of various materials, and various materials need to be etched. In order to ensure the etching, the concentration of etching liquid needs to be detected.

[0003] The utility model discloses a kind of etching devices with publication number CN220485554U, China patent, it includes etching device ontology, the etching device ontology includes fence, turnover mechanism, recycling mechanism and clamp, the inner side one end of the fence is provided with paraffin solution tank, the other end of the inner side of the fence is provided with etching solution tank, turnover mechanism is installed between the etching solution tank and paraffin solution tank, the etching device is provided with etching solution tank and paraffin solution tank in the inner side of fence, after one side of glass is soaked into the inside of paraffin solution, directly pull the handle of top and rotate, it can be quickly soaked into the etching solution tank of other side and contact with acid liquor to carry out etching treatment, high safety, fast in moving process, simplify the preparation step of etching area.

[0004] For the related technology in the above, the device has some deficiencies, lacks real-time detection function of etching liquid concentration in actual use process, and this defect leads to unstable etching effect and device quality. Since the concentration of etching liquid directly affects etching speed and depth, lack of concentration monitoring makes it difficult for operating personnel to maintain stable etching environment, thereby leading to inconsistent etching effect and device quality fluctuation, increases the rate of defective products and rework cost, and also reduces the rigor of operation, therefore, it is necessary to provide a concentration measuring device for etching liquid processing to solve the above technical problems. UTILITY MODEL CONTENTS

[0005] The utility model aims at providing a concentration measuring device for etching liquid processing to solve the problems raised in the above background technology.

[0006] To achieve the above object, the utility model provides the following technical scheme:

[0007] A concentration measuring device for etching liquid processing comprises:

[0008] The etching solution tank is fixedly installed with liquid storage tanks on both sides, the top of the liquid storage tank is fixedly installed with a liquid feeding pipe, the lower side of one side of the etching solution tank is fixedly installed with an external discharge pipe, the external discharge pipe is provided with a second metering pump, and the second metering pump is fixedly connected with one side of the etching solution tank.

[0009] The top of the liquid storage tank is fixedly provided with an adding pipe, one end of the adding pipe extends to the inside of the etching solution tank, a first metering pump is arranged on the adding pipe and fixedly connected with the top of the liquid storage tank, an optical sensor is arranged in the inside of the etching solution tank, a liquid level sensor is fixedly arranged in the inside of the etching solution tank, and a main controller is fixedly arranged on the front of the etching solution tank.

[0010] Preferably, the top of the liquid storage tank is fixedly provided with symmetrically distributed support rods, the outer wall of the support rod is sleeved with a movable plate, the top end of the support rod is fixedly provided with a top plate, the top of the top plate is fixedly provided with an electric telescopic rod, the driving end of the electric telescopic rod penetrates through the top plate and is fixedly connected with the top of the movable plate, the bottom of the movable plate is provided with a slide, the inside of the slide is rotatably provided with an adjusting screw rod, the outer wall of the adjusting screw rod is sleeved with an adjusting block, the adjusting block is slidably connected with the slide, the bottom of the adjusting block is rotatably provided with a stirring shaft, the bottom of the movable plate is provided with a transmission mechanism, the outer wall of the stirring shaft is fixedly provided with a plurality of transverse stirring rollers, and one side of the movable plate is provided with a driving mechanism.

[0011] Preferably, the driving mechanism comprises a motor, and the motor is fixedly arranged on one side of the movable plate, and the driving end of the motor penetrates through the movable plate and extends to the inside of the slide and is fixedly connected with one end of the adjusting screw rod.

[0012] Preferably, the transmission mechanism comprises a toothed plate, and the toothed plate is fixedly arranged on the bottom rear side of the movable plate, the upper side of the outer wall of the stirring shaft is fixedly provided with a gear, and the gear is engaged with the toothed plate.

[0013] Preferably, the adjusting block is in T-shaped structure and is matched with the slide.

[0014] Preferably, the adjusting block is in T-shaped structure and is matched with the slide.

[0015] Preferably, one side of the top of the movable plate is provided with a slide hole corresponding in position and number to the support rods, and the movable plate is slidably connected with the support rods through the slide hole arranged on the movable plate.

[0016] Preferably, the optical sensor comprises a light source and a receiver, and the light source and the receiver are arranged at different positions in the inside of the etching solution tank.

[0017] Compared with the prior art, the present application has the following beneficial effects:

[0018] 1.The utility model discloses through the cooperation of etching solution groove, liquid storage tank, main control unit, adding pipe, first metering pump, liquid adding pipe, second metering pump, external discharge pipe and photoelectric sensor, can on -line real -time monitoring etching liquid's concentration, reduces manual intervention, and through automatic adjusting unit, can keep the stability of etching liquid concentration, reduces the rate of defective products, optimizes the technological process, thereby the production efficiency and product quality are improved significantly.

[0019] 2.The utility model discloses through the cooperation of support rod, movable plate, roof, electric telescopic link, toothed plate, transverse stirring roller, gear, motor, stirring shaft, slide, adjusting screw rod, gear and adjusting block, the vertical position of transverse stirring roller is controlled through the drive of electric telescopic link, makes transverse stirring roller enter the inside of etching solution groove, simultaneously control motor starts work, makes transverse stirring roller in the course of horizontal movement and carries out autorotation, reaches the mixing effect of etching liquid in etching solution groove, ensures that the new and old etching liquid is fully mixed, avoids partial concentration uneven, after completing the stirring of etching liquid, stirring shaft and slide are separated from the inside of etching solution groove rapidly, the whole stirring process is very transient, can not have too much influence on the operation of etching solution groove. ACCURACY

[0020] Figure 1 It is the structural schematic diagram of the utility model;

[0021] Figure 2 It is the front view sectional structure schematic diagram of the utility model;

[0022] Figure 3 It is the connecting structure schematic diagram of gear and toothed plate in the utility model;

[0023] Figure 4 It is the structure schematic diagram of adjusting block in the utility model;

[0024] Figure 5 It is the Figure 2 enlarged structure schematic diagram of A place in the utility model.

[0025] In the drawing: 1, etching solution groove;2, liquid storage tank;3, main control unit;4, support rod;5, movable plate;6, roof;7, electric telescopic link;8, toothed plate;9, transverse stirring roller;10, liquid level sensor;11, motor;12, stirring shaft;13, adding pipe;14, first metering pump;15, liquid adding pipe;16, second metering pump;17, external discharge pipe;18, photoelectric sensor;19, slide;20, adjusting screw rod;21, gear;22, adjusting block. SPECIFIC IMPLEMENTATION

[0026] In order to make the technical means, creative features, purposes and effects of the utility model easy to understand, the utility model is further described below in combination with specific implementation.

[0027] In the description of the utility model, it needs to explain, the term "upper", "lower", "internal", "external" "front end", "rear end", "both ends", "one end", "the other end" and so on indicate the position relation or location relation is based on the position relation or location relation shown in the drawing, only for the convenience of describing the utility model and simplifying the description, and not indicate or imply that the device or element must have a particular orientation, with a particular orientation structure and operation, therefore cannot be understood as the limitation of the utility model. In addition, the term "first", "second" is only for the purpose of description, and cannot be understood as indicating or implying relative importance.

[0028] In the description of the utility model, it needs to explain, unless otherwise specified and limited, the term "installation", "provided with", "connection" and so on, should be broad understanding, for example, "connection", can be fixed connection, can also be detachable connection, or integrally connected, can be mechanical connection, can also be electrical connection, can be directly connected, can also be indirectly connected through the intermediate medium, can be the communication inside two elements. For ordinary skilled in the art, the specific meaning of the above terms in the utility model can be understood according to the specific circumstances.

[0029] The technical scheme in the embodiments of the utility model will be described clearly and completely in the drawings in the embodiments of the utility model, apparently, the described embodiments are only a part of the embodiments of the utility model, not all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary skilled in the art without creative labor belong to the scope of protection of the utility model.

[0030] Please refer to Figures 1-5 , the utility model provides a kind of embodiment:

[0031] A concentration measuring device for etching solution processing, comprising:

[0032] The etching solution tank 1 is fixedly installed with a liquid storage tank 2 on both sides, a liquid feeding pipe 15 is fixedly inserted and installed on the top of the liquid storage tank 2, an external discharge pipe 17 is fixedly inserted and installed below one side of the etching solution tank 1, a second metering pump 16 is arranged on the external discharge pipe 17, and the second metering pump 16 is fixedly connected with one side of the etching solution tank 1.

[0033] The top of the liquid storage tank 2 is fixedly provided with an adding pipe 13, one end of the adding pipe 13 extends to the inside of the etching solution tank 1, a first metering pump 14 is arranged on the adding pipe 13, the first metering pump 14 is fixedly connected with the top of the liquid storage tank 2, an optical sensor 18 is arranged in the etching solution tank 1, a liquid level sensor 10 is fixedly arranged in the etching solution tank 1, and a main control unit 3 is fixedly arranged on the front of the etching solution tank 1. The liquid level sensor 10 is arranged to facilitate detection of the amount of solution in the etching solution tank 1, so as to add in time.

[0034] The top of the liquid storage tank 2 is fixedly provided with a support rod 4, the outer wall of the support rod 4 is sleeved with a movable plate 5, the top end of the support rod 4 is fixedly provided with a top plate 6, the top of the top plate 6 is fixedly provided with an electric telescopic rod 7, the driving end of the electric telescopic rod 7 penetrates through the top plate 6 and is fixedly connected with the top of the movable plate 5, the bottom of the movable plate 5 is provided with a slide 19, the inside of the slide 19 is rotatably provided with an adjusting screw 20, the outer wall of the adjusting screw 20 is sleeved with an adjusting block 22, the adjusting block 22 is slidably connected with the slide 19, the bottom of the adjusting block 22 is rotatably provided with a stirring shaft 12, the bottom of the movable plate 5 is provided with a transmission mechanism, a plurality of transverse stirring rollers 9 are fixedly arranged on the outer wall of the stirring shaft 12, and one side of the movable plate 5 is provided with a driving mechanism.

[0035] In one embodiment, the driving mechanism includes a motor 11, and the motor 11 is fixedly arranged on one side of the movable plate 5. The driving end of the motor 11 penetrates through the movable plate 5 and extends to the inside of the slide 19 and is fixedly connected with one end of the adjusting screw 20.

[0036] In one preferred embodiment, the transmission mechanism includes a toothed plate 8, and the toothed plate 8 is fixedly arranged on the bottom rear side of the movable plate 5. The upper side of the outer wall of the stirring shaft 12 is fixedly provided with a gear 21, and the gear 21 is engaged with the toothed plate 8. Through the driving of the motor 11 and the cooperation of the transmission mechanism, the rotation of the transverse stirring roller 9 is indirectly realized, the operation cost of the device is reduced, and the practicability of the device is improved.

[0037] In one embodiment, the adjusting block 22 is in a T-shaped structure, and the adjusting block 22 is matched with the slide 19, thereby improving the stability between the adjusting block 22 and the slide 19.

[0038] In one preferred embodiment, a threaded hole matched with the adjusting screw 20 is formed in the adjusting block 22, and the adjusting block 22 is threadedly connected with the adjusting screw 20 through the threaded hole.

[0039] In one embodiment, a slide hole corresponding in position and number to the support rod 4 is formed in one side of the top of the movable plate 5, and the movable plate 5 is slidably connected with the support rod 4 through the slide hole.

[0040] In one preferred embodiment, the photoelectric sensor 18 includes a light source and a receiver, and the light source and the receiver are respectively arranged at different positions inside the etching solution tank 1, so that the light signal emitted by the light source can penetrate the etching liquid and be captured by the receiver. This design can more accurately measure the optical properties of the etching liquid, thereby improving the accuracy of concentration measurement. Since the propagation path of the light signal in the etching liquid is longer, it can more comprehensively reflect the overall characteristics of the etching liquid, reducing the measurement error caused by local concentration fluctuations.

[0041] The working principle of the utility model is: the whole device is controlled by the main control ware 3, because the equipment matched by the main control ware 3 is common equipment, belongs to the prior art, the electrical connection relationship and the specific circuit structure are not repeated, the part not involved in the device is same as the prior art or can be realized by the prior art, when using the device, the inside of two liquid storage tanks 2 is respectively injected with a certain amount of concentrated etching liquid and diluent through the liquid feeding pipe 15 at the top thereof, the photoelectric sensor 18 monitors the concentration of the etching liquid in the inside in real time during the operation of the etching solution tank 1, if the real-time concentration is higher than the target concentration, the main control ware 3 sends an instruction to control the corresponding first metering pump 14 to start, allowing the diluent to flow into the etching solution tank 1, and the second metering pump 16 starts to discharge the excess etching liquid through the discharge pipe 17, if the real-time concentration is lower than the target concentration, the main control ware 3 sends an instruction to control the other first metering pump 14 to start, allowing the concentrated etching liquid to flow into the etching solution tank 1, and the second metering pump 16 starts to discharge the excess etching liquid through the discharge pipe 17, until the concentration of the etching liquid reaches the target value and remains stable, during the use of the device, the concentration of the etching liquid can be monitored in real time on line, manual intervention is reduced, and through the automatic adjusting unit, the stability of the etching liquid concentration can be maintained, the production efficiency is improved, and the product quality is ensured.

[0042] In the process of adjusting the concentration inside the etching solution tank 1, the electric telescopic rod 7 can be controlled to start working, the driving end of the electric telescopic rod 7 drives the movable plate 5 to slide vertically on the outer wall of the supporting rod 4, the movement of the movable plate 5 drives the stirring shaft 12 to move through the cooperation of the adjusting screw rod 20 and the adjusting block 22, the movement of the stirring shaft 12 drives the transverse stirring roller 9 to move, so that the vertical position of the transverse stirring roller 9 is controlled by the driving of the electric telescopic rod 7, the transverse stirring roller 9 enters the inside of the etching solution tank 1, and the motor 11 is controlled to start working, the driving end of the motor 11 drives the adjusting screw rod 20 to rotate, the adjusting block 22 is stably moved transversely through the threaded transmission of the adjusting screw rod 20 and the adjusting block 22 and the sliding relationship between the adjusting block 22 and the slide 19, the movement of the adjusting block 22 drives the stirring shaft 12 to move, the transverse stirring roller 9 moves transversely along with the stirring shaft 12, and the movement of the stirring shaft 12 drives the gear 21 to rotate, the gear 21 rotates in the process of transverse movement through the meshing of the gear 21 and the toothed plate 8, the rotation of the gear 21 drives the stirring shaft 12 to rotate, the rotation of the stirring shaft 12 drives the transverse stirring roller 9 to rotate, so that the transverse stirring roller 9 rotates in the process of transverse movement, the mixing effect of the etching liquid inside the etching solution tank 1 is achieved, the new and old etching liquid is fully mixed, local concentration is avoided, and the stirring of the etching liquid is completed.

[0043] The basic principle, main characteristics and advantages of the present application are shown and described above. It should be understood by those skilled in the art that the present application is not limited by the above embodiments, and the above embodiments and descriptions in the specification are only preferred examples of the present application and are not intended to limit the present application. Without departing from the spirit and scope of the present application, various changes and improvements can be made to the present application, and these changes and improvements all fall within the scope of the claimed present application. The scope of protection of the present application is defined by the appended claims and their equivalents.

Claims

1. An etching liquid processing concentration measuring device characterized by comprising: It includes: The etching solution tank (1) is fixedly installed with liquid storage tank (2) on both sides, the top of the liquid storage tank (2) is fixedly installed with liquid adding pipe (15), the lower side of the etching solution tank (1) is fixedly installed with external discharge pipe (17), the second metering pump (16) is arranged on the external discharge pipe (17), and the second metering pump (16) is fixedly connected with the side of the etching solution tank (1); The top of the liquid storage tank (2) is fixedly installed with the adding pipe (13), and one end of the adding pipe (13) extends to the inside of the etching solution tank (1) upper side, the first metering pump (14) is arranged on the adding pipe (13), and the first metering pump (14) is fixedly connected with the top of the liquid storage tank (2), the inside of the etching solution tank (1) is provided with photoelectric sensor (18), the inside of the etching solution tank (1) is fixedly installed with liquid level sensor (10), the front of the etching solution tank (1) is fixedly installed with main control unit (3).

2. The concentration measuring device for etching liquid processing according to claim 1, characterized in that: The top of one of the liquid storage tanks (2) is fixedly installed with symmetrically distributed support rods (4), the outer wall of the support rod (4) is sleeved with a movable plate (5), the top end of the support rod (4) is fixedly installed with a top plate (6), the top of the top plate (6) is fixedly installed with an electric telescopic rod (7), and the driving end of the electric telescopic rod (7) penetrates through the top plate (6) and is fixedly connected with the top of the movable plate (5), the bottom of the movable plate (5) is provided with a slide (19), the inside of the slide (19) is rotatably installed with an adjusting screw (20), the outer wall of the adjusting screw (20) is sleeved with an adjusting block (22), and the adjusting block (22) is slidably connected with the slide (19), the bottom of the adjusting block (22) is rotatably installed with a stirring shaft (12), the bottom of the movable plate (5) is provided with a transmission mechanism, the outer wall of the stirring shaft (12) is fixedly installed with a plurality of transverse stirring rollers (9), one side of the movable plate (5) is provided with a driving mechanism.

3. The etching solution processing concentration measuring device according to claim 2, characterized by: The driving mechanism includes a motor (11), and the motor (11) is fixedly installed on one side of the movable plate (5), the driving end of the motor (11) penetrates through the movable plate (5) and extends to the inside of the slide (19) and is fixedly connected with one end of the adjusting screw (20).

4. The etching solution processing concentration measuring device according to claim 2, characterized by: The transmission mechanism includes a toothed plate (8), and the toothed plate (8) is fixedly installed on the bottom rear side of the movable plate (5), the upper side of the outer wall of the stirring shaft (12) is fixedly installed with a gear (21), and the gear (21) is engaged with the toothed plate (8).

5. The etching solution processing concentration measuring device according to claim 2, characterized by: The adjusting block (22) is T-shaped structure, and the adjusting block (22) is matched with the slide (19).

6. The etching solution concentration measuring device according to claim 2, wherein: The adjusting block (22) is provided with a threaded hole matched with the adjusting screw (20), and the adjusting block (22) is threadedly connected with the adjusting screw (20) through the threaded hole.

7. The etching solution concentration measuring device according to claim 2, wherein: One side of the top of the movable plate (5) is provided with a slide hole corresponding in position and number to the support rod (4), and the movable plate (5) is slidably connected with the support rod (4) through the slide hole.

8. The etching solution processing concentration measuring device according to claim 1, characterized by: The photoelectric sensor (18) comprises a light source and a receiver, and the light source and the receiver are arranged at different positions inside the etching solution tank (1) respectively.

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