Protective cover for preventing magnet attraction of photoetching machine

Abstract

The utility model provides a protective cover for preventing magnet attraction of a photoetching machine. The protective cover comprises a cover body and a plurality of fixing parts, the cover body is of a telescopic structure, a cavity is formed in the cover body, an opening is formed in the bottom of the cavity, and the cavity covers the photoetching machine magnet through the opening; and the fixing part is arranged on the end surface of the cover body beside the opening. By arranging the protective cover, a safe distance can be formed between the magnet and the outside, the attraction force of magnetic force to tools or parts is reduced, and possible damage to equipment and personnel is prevented; and the length of the protective cover is adjustable, so that the slider magnets at different positions can be shielded, and the adaptability is good.

Description

Technical Field

[0001] This application relates to the field of safety protection, and in particular to a protective cover for preventing the attraction of magnets in a lithography machine. Background Technology

[0002] In photolithography, the wafer platform module is a key piece of equipment for achieving precise control over the position and movement of the wafer. To meet the requirements of high precision, high stability, and fast response speed, the slider used to control the movement is typically driven by a Lorentz motor. For example, in the wafer platform module of the ASML XT series lithography machine, the slider moving in the Y direction is driven by a Lorentz motor, which works by utilizing the Lorentz force generated by a current-carrying coil in a magnetic field. To provide a sufficiently strong magnetic field, the machine needs to equip the Y slider with a very strong magnet.

[0003] When the wafer platform module (WS) requires repair or maintenance, the strong magnets on the slider will be exposed, potentially posing several risks. For example, various tools and parts, some of which are made of metal, may be attracted to the magnets on the Y-slider, potentially causing injury to personnel or damage to tools or parts. Similarly, the magnets may be damaged by impacts from objects they attract, leading to equipment malfunctions.

[0004] It should be noted that the above introduction to the technical background is only for the purpose of providing a clear and complete explanation of the technical solutions of this application and facilitating understanding by those skilled in the art. It should not be assumed that these technical solutions are known to those skilled in the art simply because they have been described in the background section of this application. Utility Model Content

[0005] To solve all or part of the problems of the prior art, this utility model provides a protective cover to shield and isolate the slider magnet in the wafer platform module.

[0006] To achieve the above objectives, this utility model provides a protective cover to prevent the attraction of a lithography machine magnet, comprising a cover body and multiple fixing parts; the cover body is a telescopic structure, with a cavity formed therein, and an opening provided at the bottom of the cavity, through which the cavity covers the lithography machine magnet; the fixing parts are disposed on the end face of the cover body next to the opening. By setting up the protective cover, a safe distance can be isolated between the magnet and the outside environment, reducing the attraction of magnetic force on tools or parts, and preventing possible damage to equipment and personnel; moreover, the length of the protective cover is adjustable, which can shield the slider magnet in different positions, providing good adaptability.

[0007] The cover includes a side wall and a top cover, forming a cavity between the side wall and the top cover. The fixing part is disposed on the bottom end face of the side wall located at the opening. The cover has a simple structure and is easy to fix.

[0008] At least four fixing parts are provided, and the fixing parts are symmetrically arranged at the bottom of the side wall. The symmetrical arrangement of multiple fixing parts can enhance the fixing effect.

[0009] The fixing part is a suction cup, which is used to fix the protective cover. The suction cup is easy to use and is unlikely to cause additional damage to the equipment.

[0010] There are four suction cups, which are respectively located at the four corners of the bottom of the side wall. Multiple suction cups enhance the fixing effect; their placement at the corners not only provides fixation but also helps maintain the adjustable length of the cover.

[0011] The cover has a honeycomb-shaped, expandable structure, with the through holes facing sideways. The expandable nature of the honeycomb structure allows for easy adjustment of the cavity length, making it convenient to use and less prone to structural damage.

[0012] The protective cover is made of non-magnetic material, which prevents attraction to magnets.

[0013] The cover is made of polycarbonate. This material has extremely high folding resistance, ensuring long-term use, and it does not easily generate microparticles, thus avoiding contamination of the equipment.

[0014] The length of the cover is ≥50cm in its maximum extended state and ≤10cm in its minimum contracted state. Based on the dimensions of conventional wafer platform modules, it can be matched with various types of lithography equipment and has good compatibility.

[0015] The cover is a rectangular shell. It has a simple structure and low manufacturing cost.

[0016] Compared with the prior art, the main beneficial effects of this utility model are: it provides a protective cover to prevent the attraction of magnets in a lithography machine. By setting the protective cover, a safe distance can be isolated between the magnet and the outside world, reducing the attraction of magnetic force on tools or parts and preventing possible damage to equipment and personnel; moreover, the length of the protective cover is adjustable, which can shield the slider magnet when it is in different positions, and has good adaptability. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the specific embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram showing the installation status of the protective cover.

[0019] Figure 2 This is a schematic diagram of the protective cover structure provided in Embodiment 1. Figure 2 In the diagram, A represents the front view. Figure 2 B in the diagram represents the bottom view.

[0020] Figure 3 This is a schematic diagram of a honeycomb-shaped stretchable structure. Detailed Implementation

[0021] The foregoing and other technical contents, features, and effects of this utility model will be clearly presented in the following detailed description of the preferred embodiments with reference to the accompanying drawings. The directional terms mentioned in the following embodiments, such as up, down, left, right, front, or back, are only for reference to the accompanying drawings. Therefore, the directional terms used are for illustrative purposes and not for limiting the scope of this utility model.

[0022] Figure 1 This is a schematic diagram showing the installation status of the protective cover provided in this application. Figure 1 As shown, for a slider driven by a Lorentz motor, a magnet 2 is mounted on its sliding arm 1. To prevent potential hazards caused by the strong magnetism of the magnet 2 during maintenance or repair work, this application provides a protective cover to prevent magnet attraction in a lithography machine. This is achieved by mounting the protective cover on the sliding arm 1 to cover the magnet 2. It is understood that the magnetic force of the magnet 2 is inversely proportional to the square of the distance. The magnetic attraction weakens rapidly with increasing distance. Empirically, the magnetic force is very strong when the magnet 2 is within 2 cm of an object that can be attracted, making it difficult to prevent the object from being attracted. When the distance is between 5 cm and 2 cm, the magnetic force becomes weaker and more controllable. Therefore, by using a protective cover to isolate the magnet 2, a safe distance can be maintained between the attracted object and the magnet 2, ensuring that materials outside the protective cover are not subjected to excessive attraction and avoiding potential hazards. Typically, a safe distance of 5 cm or more is sufficient, which can be easily achieved by controlling the size of the protective cover. On the other hand, considering that the slider may be in different positions, it is desirable that the protective cover be adjustable in length so that it can be placed in various situations to shield the magnet 2.

[0023] Example 1:

[0024] refer to Figure 2 and Figure 3 This embodiment provides a protective cover to prevent magnets from being attracted to a lithography machine. The protective cover includes a cover body 3 and a fixing part 4. The cover body 3 is a rectangular shell structure, which is composed of two parts: a side wall 31 and a top cover 32. The side wall 31 and the top cover 32 form a cavity. An opening is provided at the bottom of the cavity. Through the cavity and the opening of the cover body 3, the magnet 2 on the slider can be covered and wrapped inside the cavity, thereby shielding the magnet 2.

[0025] The fixing part 4 is disposed on the end face next to the opening. Specifically, the fixing part 4 is disposed on the end face of the bottom of the side wall 31 located next to the opening. In this embodiment, refer to... Figure 2 The fixing part 4 consists of four suction cups, which are respectively located at the four corners of the bottom of the side wall 31. In other embodiments, the number of fixing parts 4 can be set according to needs, generally at least four, symmetrically arranged at the bottom of the side wall 31.

[0026] As described above, to protect the slider in any position, the length of the protective cover is set to be adjustable. In this embodiment, this is achieved through a telescopic structure. Figure 3 As shown, a honeycomb structure is used to achieve the expansion and contraction of the protective cover. It can be understood that this honeycomb structure can extend and compress in the X direction, achieving length adjustment of the cover 3, and thus adjusting the length of the cavity formed by the cover 3, automatically adapting the placement of the protective cover under various conditions. Furthermore, considering the through-hole structure 5 (i.e., openings) on the honeycomb structure, when the direction of the through-hole 5 is vertical, dust / particles and other contaminants may fall onto the slider during maintenance / upkeep. Therefore, the direction of the through-hole 5 should be oriented to the side. It can be understood that this embodiment uses a honeycomb structure to achieve length adjustment of the protective cover; in other embodiments, other methods can also be used. For example, the protective cover can be set as a segmented structure, with multiple sub-structures spliced ​​together to form a protective cover. The total length can be adjusted according to the size of each sub-structure and the number of splices; different sub-structures can be directly connected by detachable means, such as snap-fit ​​connections. Alternatively, the cover can be set as a multi-segment sliding connection structure, with different segments sliding through the cooperation of grooves and sliders to adjust the length of the cover.

[0027] like Figure 2As shown, the width of the cover 3 is a, the height is b, and the length is c. In this embodiment, the width and height of the cover 3 remain basically unchanged during the expansion and contraction process. Its width a is 17±2cm and its height b is 6±1cm. The thickness of the side wall 31 and the length c of the cover 3 will change with the expansion and contraction states. The thickness of the side wall 31 changes within the range of 2±1cm with the expansion and contraction, while the length c changes with the expansion and contraction. Its length is ≥50cm in the maximum expansion state and ≤10cm in the minimum contraction state.

[0028] In this embodiment, a suction cup is used to fix the cover 3 and maintain its arbitrary extension and retraction. It is understood that the main purpose of using the protective cover in this application is to achieve isolation between the magnet 2 and the outside environment, without requiring a very high level of sealing. Therefore, there are fewer restrictions during use, and it has high applicability.

[0029] Under normal circumstances, there are multiple sliders and corresponding magnets 2 in each wafer platform module. Taking the wafer platform module of ASML XT series lithography machine as an example, its sliders moving in the Y direction are driven by Lorentz motors. There are two Y sliders, and each Y slider is equipped with three magnets 2. Therefore, multiple protective covers are needed to cover and shield the magnets 2 one by one to achieve complete protection.

[0030] The common English terms or letters used in this invention for the purpose of clarity are for illustrative purposes only and are not intended to be limiting or specific. They should not be used to limit the scope of protection of this invention based on their possible Chinese translations or specific letters.

[0031] It should also be noted that in this article, relational terms such as “first” and “second” are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations.

Claims

1. A protective cover for preventing attraction of a lithography machine magnet, characterized in that, The cover comprises a cover body and a plurality of fixing parts; The cover body is a telescopic structure, a cavity is formed in the cover body, and an opening is arranged at the bottom of the cavity, the cavity covers the magnet of the photoetching machine through the opening; The fixing parts are arranged on the end face of the cover body beside the opening.

2. A protective cover for preventing attraction of a lithography machine magnet according to claim 1, characterized in that, The cover body comprises a side wall and a top cover, the cavity is formed between the side wall and the top cover, and the fixing parts are arranged on the end face of the side wall at the bottom of the opening.

3. A protective cover to prevent attraction of a lithography machine magnet according to claim 2, characterized in that, The fixing parts are at least four, and the fixing parts are symmetrically arranged at the bottom of the side wall.

4. A protective cover to prevent attraction of a lithography machine magnet according to claim 3, characterized in that, The fixing parts are suction cups, and the protective cover is fixed through the suction cups.

5. A protective cover for preventing attraction of a lithography machine magnet according to claim 4, characterized in that, The suction cups are four, and the four suction cups are arranged at the four corners of the bottom of the side wall.

6. A protective cover for preventing attraction of a lithography machine magnet according to claim 1, wherein The cover body is a honeycomb telescopic structure, and the through hole direction of the honeycomb telescopic structure is towards the side face.

7. A protective cover for preventing attraction of a lithography machine magnet according to claim 1, wherein The protective cover is made of a non-magnetic material.

8. A protective cover for preventing attraction of a lithography machine magnet according to claim 6, characterized in that, The cover body is made of a polycarbonate material.

9. A protective cover for preventing attraction of a lithography machine magnet according to claim 6, wherein The length of the cover body is greater than or equal to 50 cm in the maximum expansion state and less than or equal to 10 cm in the minimum contraction state.

10. The protective cover for preventing attraction of a magnet of a photolithography machine according to claim 1, wherein The cover body is a rectangular shell.

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