Glass etching equipment

Abstract

The utility model discloses glass etching equipment, which comprises an equipment main body, a circuit device, a heater and at least two heating pipes, the equipment main body is provided with an etching groove and a mounting cavity positioned below the etching groove, the etching groove and the mounting cavity are separated by a heat conducting plate, and the heat conducting plate forms at least part of the bottom wall of the etching groove; the circuit device is arranged on the equipment main body; the at least two heating pipes are respectively arranged on two opposite sides of the etching tank and are electrically connected with the circuit device; the heater is arranged in the mounting cavity and is in heat conduction connection with the heating plate, and the heater is electrically connected with the circuit device. According to the technical scheme, the temperature uniformity of the etching liquid can be improved, so that the etching effect is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to glass processing technical field, especially a kind of glass etching equipment. BACKGROUND

[0002] With the development of science and technology, the application of glass is more and more extensive, such as the screen of electronic product, LED substrate, semiconductor chip substrate and so on, and in the glass production process, thinning process is a relatively important link, and currently common is to use etching equipment for etching thinning, in order to avoid the waste chip produced by etching covering the heating pipe and affecting the heating efficiency, generally the heating pipe is arranged on the opposite sides of the etching tank, but when arranged in this way, the etching liquid temperature at the bottom of the etching tank is usually low, and there is a large temperature difference between the upper etching liquid and the bottom etching liquid, which greatly affects the etching quality. SUMMARY

[0003] The main purpose of the utility model is to provide a kind of glass etching equipment, to improve the etching liquid temperature uniformity.

[0004] To achieve the above purpose, the glass etching equipment provided by the utility model comprises:

[0005] The equipment main body is provided with an etching tank and a mounting cavity located below the etching tank, the etching tank and the mounting cavity are separated by a heat conduction plate, and the heat conduction plate constitutes at least part of the bottom wall of the etching tank.

[0006] The circuit device is arranged in the equipment main body.

[0007] At least two heating pipes, at least two heating pipes are arranged on the opposite sides of the etching tank, and are electrically connected with the circuit device.

[0008] The heater is arranged in the mounting cavity and is in thermal conduction connection with the heat conduction plate, and the heater is electrically connected with the circuit device.

[0009] Optionally, the side wall of the etching tank is provided with a groove, and the heating pipe is arranged in the groove.

[0010] Optionally, the bottom wall of the groove gradually inclines downward in the direction close to the side wall of the etching tank.

[0011] Optionally, the number of the heater is multiple, and multiple heaters are located in the mounting cavity and are arranged at intervals on the side of the heat conduction plate away from the etching tank.

[0012] Optionally, a heat preservation layer is arranged around the etching tank.

[0013] Optionally, the glass etching equipment further comprises a lifting device, and the lifting device has a lifting piece located above the etching tank.

[0014] Optionally, the lifting member comprises a cover plate and a hook arranged below the cover plate.

[0015] Optionally, a bottom wall of the etching tank is provided with a liquid discharge port, and the equipment body is provided with a liquid discharge pipe at the liquid discharge port.

[0016] Optionally, the bottom wall of the etching tank gradually inclines downward in the direction close to the liquid discharge port.

[0017] Optionally, a bottom of the equipment body is provided with a plurality of moving wheels and a movable supporting leg, the supporting leg has a supporting state and an idle state, in the supporting state, the supporting leg is supported on the ground to separate the moving wheels from the ground, in the idle state, the supporting leg is separated from the ground to support the moving wheels on the ground.

[0018] The technical scheme of the utility model discloses a heat-conducting plate is arranged on the bottom wall of the etching tank, and a heater is arranged below the heat-conducting plate, when working, the etching liquid can be heated in multiple directions by the heater and the heating pipe simultaneously, and the heater can ensure that the etching liquid at the bottom can also be heated, the etching liquid at the bottom can flow upward during the heating process, the low-temperature etching liquid flows to the bottom to circulate, and finally the etching liquid in the etching tank can be heated, the etching liquid temperature uniformity is improved, and the etching quality of the glass plate can be improved. BRIEF DESCRIPTION OF DRAWINGS

[0019] In order to more clearly illustrate the technical scheme in the embodiments of the utility model or the prior art, the drawings needed to be used in the embodiment or the prior art description will be briefly introduced below, and obviously, the drawings in the following description are only some embodiments of the utility model, and other drawings can also be obtained according to the structure shown in the drawings without creative labor for those skilled in the art.

[0020] Figure 1 It is a sectional view of an embodiment of the glass etching equipment of the utility model;

[0021] Figure 2 It is Figure 1 It is a sectional view of another angle of the glass etching equipment.

[0022] EXPLANATION OF DRAWINGS:

[0023] 10, equipment body; 11, etching tank; 111, groove; 112, liquid discharge port; 12, mounting cavity; 13, liquid discharge pipe; 14, heat preservation layer; 20, heating pipe; 30, heat-conducting plate; 40, heater; 50, lifting device; 51, lifting mechanism; 52, lifting member; 521, cover plate; 522, hook; 60, moving wheel; 70, supporting leg; 80, circuit device.

[0024] The purposes, functional features and advantages of the utility model will be further explained in combination with embodiments with reference to the drawings. DETAILED DESCRIPTION

[0025] The technical solutions in the embodiments of the utility model will be clearly and completely described in combination with the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the protection scope of the utility model.

[0026] It should be noted that if the embodiments of the utility model involve directional indications (such as up, down, left, right, front, back, etc.), the directional indications are only used to explain the relative position relationship, movement condition, etc. between components in a certain specific posture (as shown in the drawings), if the specific posture changes, the directional indications also change accordingly.

[0027] In addition, if the embodiments of the utility model involve the description of "first", "second", etc., the description of "first", "second", etc. is only for the purpose of description, and cannot be understood as indicating or implying the relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features with "first", "second" can explicitly or implicitly include at least one feature. In addition, the meaning of "and / or" appearing throughout the text is that it includes three parallel schemes, for example, "A and / or B" includes A scheme, or B scheme, or A and B schemes. In addition, the technical solutions of each embodiment can be combined with each other, but it must be based on the realization of ordinary skilled in the art, when the combination of technical solutions appears contradictory or unachievable, it should be considered that the combination of technical solutions does not exist, and is not within the protection scope required by the utility model.

[0028] The utility model provides a kind of glass etching equipment.

[0029] In the embodiments of the utility model, as Figure 1 And Figure 2As shown, the glass etching device comprises a device body 10, a circuit device 80, a heater 40 and at least two heating pipes 20, the device body 10 is provided with an etching tank 11 and a mounting cavity 12 located below the etching tank 11, the etching tank 11 and the mounting cavity 12 are separated by a heat conduction plate 30, the heat conduction plate 30 constitutes at least part of the bottom wall of the etching tank 11; the circuit device 80 is arranged on the device body 10; the at least two heating pipes 20 are arranged on opposite sides of the etching tank 11 and are electrically connected with the circuit device 80; the heater 40 is arranged in the mounting cavity 12 and is in thermal conduction connection with the heat conduction plate 30, and the heater 40 is electrically connected with the circuit device 80.

[0030] Optionally, the heat conduction plate 30 is a metal plate or a heat conduction ceramic plate. The circuit device 80 comprises a controller, a display device and the like, and specific reference can be made to the prior art, and the present application will not be described one by one. The heater 40 arranged at the bottom of the etching tank 11 can effectively heat the etching liquid at the bottom, and the at least two heating pipes 20 arranged on opposite sides of the etching tank 11 can quickly heat the etching liquid and improve the heating speed of the etching liquid.

[0031] The technical scheme of the present application can heat the etching liquid in multiple directions through the heater 40 and the heating pipe 20 at the same time during work, and the heater 40 can ensure that the etching liquid at the bottom can also be heated. The etching liquid heated at the bottom can flow upwards during the heating process, and the low-temperature etching liquid flows to the bottom for circulation, so that the etching liquid in the etching tank 11 can be heated ultimately, the uniformity of the etching liquid temperature is improved, and the etching quality of the glass plate can be improved.

[0032] In some embodiments, the side wall of the etching tank 11 is provided with a groove 111, and the heating pipe 20 is arranged in the groove 111. Specifically, the heating pipe 20 is located in the groove 111 as a whole, that is, the heating pipe 20 does not protrude from the side wall of the etching tank 11, so that the waste generated during processing can be prevented from directly falling on the heating pipe 20, the heating efficiency of the heating pipe 20 can be ensured to be high, and the cleaning frequency of the heating pipe 20 can be reduced.

[0033] In some embodiments, the bottom wall of the groove 111 gradually extends downward in the direction close to the side wall of the etching tank 11, so that the waste deposited on the bottom wall of the groove 111 can be easily cleaned.

[0034] In some embodiments, the number of the heater 40 is multiple, and the multiple heaters 40 are located in the mounting cavity 12 and are arranged at intervals on the side of the heat conduction plate 30 away from the etching tank 11, so that the bottom heating effect can be improved.

[0035] In some embodiments, a heat preservation layer 14 is arranged around the etching tank 11, so as to reduce heat loss, improve the uniformity of etching liquid temperature, and save energy. The heat preservation layer 14 can be made of heat insulation bubble cotton or heat insulation bubble foam, etc.

[0036] In some embodiments, the glass etching device further comprises a lifting device 50 having a lifting piece 52 arranged above the etching tank 11. Specifically, the lifting device 50 comprises a lifting mechanism 51, and the lifting piece 52 is arranged above the etching tank 11 and is driven by the lifting mechanism 51 to move up and down, so that the glass plate can be put into or taken out of the etching tank 11 through the lifting piece 52. The lifting mechanism 51 can be a motor-screw mechanism or a hydraulic / pneumatic mechanism.

[0037] In some embodiments, the lifting piece 52 comprises a cover plate 521 and a hook 522 arranged below the cover plate 521. In use, the bracket containing the glass plate to be processed can be hung on the hook 522, and the glass plate can be lowered into the etching tank 11 through the lifting device 50. During the processing, the etching tank 11 can be covered by the cover plate 521, so as to reduce the heat loss of the etching liquid.

[0038] In some embodiments, the bottom wall of the etching tank 11 is provided with a liquid discharge port 112, and the device body 10 is provided with a liquid discharge pipe 13 at the liquid discharge port 112. The liquid discharge pipe 13 is provided with a stop valve, so that the etching liquid in the etching tank 11 can be discharged conveniently. Alternatively, the bottom wall of the etching tank 11 gradually inclines downward in the direction close to the liquid discharge port 112, so that the etching liquid in the etching tank 11 can be discharged fully, and liquid accumulation in the etching tank 11 can be avoided.

[0039] In some embodiments, the bottom of the device body 10 is provided with a plurality of moving wheels 60 and a movable supporting leg 70. The supporting leg 70 has a supporting state and an idle state. In the supporting state, the supporting leg 70 is supported on the ground, so that the moving wheels 60 are spaced from the ground. In the idle state, the supporting leg 70 is spaced from the ground, so that the moving wheels 60 are supported on the ground. That is, when the glass etching device needs to be moved, the supporting leg 70 can be switched to the idle state, so that the glass etching device can be moved through the moving wheels 60. When the glass etching device is moved to a placement position, the supporting leg 70 can be switched to the supporting state, so that the glass etching device cannot be moved easily, and the moving wheels 60 cannot be damaged due to long-term stress. The supporting leg 70 can be a sleeve telescopic structure, and is locked in the idle state or the supporting state by a latch. Alternatively, the supporting leg 70 can be a rotating folding structure.

[0040] The above merely describes preferred embodiments of the present application, and does not limit the patent scope of the present application, and any equivalent structural transformation or direct / indirect application in other related technical fields under the inventive concept of the present application, and by using the content of the present application specification and drawings, are included in the patent protection scope of the present application.

Claims

1. A glass etching apparatus, characterized by, The application relates to a glass etching device. The device body is provided with an etching tank and a mounting cavity below the etching tank, the etching tank and the mounting cavity are separated by a heat conduction plate which constitutes at least a part of the bottom wall of the etching tank. The circuit device is arranged in the device body. At least two heating pipes are arranged on opposite sides of the etching tank and are electrically connected to the circuit device. The heater is arranged in the mounting cavity and is in thermal conduction connection with the heat conduction plate, and the heater is electrically connected to the circuit device. The side wall of the etching tank is provided with a groove, and the heating pipe is arranged in the groove.

2. The glass etching apparatus of claim 1, wherein, The bottom wall of the groove gradually extends downward in the direction close to the side wall of the etching tank.

3. The glass etching apparatus of claim 2, wherein, The number of the heaters is multiple, and the multiple heaters are arranged in the mounting cavity and are spaced apart on the side of the heat conduction plate away from the etching tank.

4. The glass etching apparatus of claim 1, wherein, The etching tank is provided with a heat preservation layer.

5. The glass etching apparatus of claim 1, wherein, The glass etching device further comprises a lifting device, and the lifting device is provided with a lifting piece above the etching tank.

6. The glass etching apparatus of claim 1, wherein, The lifting piece comprises a cover plate and a hook arranged below the cover plate.

7. The glass etching apparatus of claim 6, wherein, The bottom wall of the etching tank is provided with a liquid discharge port, and the device body is provided with a liquid discharge pipe at the liquid discharge port.

8. The glass etching apparatus of claim 1, wherein, The bottom wall of the etching tank gradually extends downward in the direction close to the liquid discharge port.

9. The glass etching apparatus of claim 8, wherein, The bottom of the device body is provided with multiple moving wheels and a movable supporting leg, and the supporting leg has a supporting state and an idle state.

10. The glass etching apparatus of any one of claims 1 to 9, wherein, In the supporting state, the supporting leg is supported on the ground to separate the moving wheels from the ground. In the idle state, the supporting leg is spaced apart from the ground to support the moving wheels on the ground.

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