Material receiving plate and production equipment

Abstract

The utility model discloses a material receiving plate and production equipment, the material receiving plate is provided with a through material receiving hole along the thickness direction of the material receiving plate, the material receiving hole comprises a material inlet, a channel and an opening which are communicated in sequence, the material inlet is used for a sealing nail to pass through to the channel, and the width of one end of the channel close to the material inlet is gradually increased in the direction close to the material inlet. After the suction nozzle takes out the sealing nail from the material receiving plate, dust and water are discharged to the external environment through the feeding port, the channel and the opening in sequence, dust and water are prevented from remaining on the inner side wall of the channel, dust and water can penetrate through the sealing nail conveniently while the material receiving hole limits the sealing nail, dust accumulation is avoided, and the sealing nail is prevented from being clamped in the material receiving plate.

Description

TECHNICAL FIELD

[0001] The utility model relates to a battery technical field especially relates to a kind of material receiving plate and production equipment. BACKGROUND

[0002] With the development of science and technology, sealing nail is used to seal the liquid injection hole of battery, and the sealing nail is transported to the material receiving plate during the process of taking the sealing nail, and the suction nozzle takes the sealing nail from the material receiving plate. The material receiving plate is provided with a cylindrical groove for accommodating the sealing nail. However, after the sealing nail is taken out, dust and water are in the cylindrical groove, which causes dust accumulation in the cylindrical groove, resulting in the sealing nail being stuck in the cylindrical groove of the material receiving plate. SUMMARY

[0003] One object of the present utility model is to provide a material receiving plate and production equipment, which aims to solve the technical problem of the sealing nail being stuck in the cylindrical groove of the material receiving plate after being taken out.

[0004] To achieve the above-mentioned purpose, the utility model provides a kind of scheme: a kind of material receiving plate, the material receiving plate is opened along its thickness direction and is provided with through material receiving hole, the material receiving hole includes: in sequence communication inlet, passageway and opening, the inlet is used for the sealing nail to pass to the passageway, the width of the passageway near the inlet gradually increases in the direction close to the inlet.

[0005] Optionally, the width of the passageway near the opening gradually increases in the direction close to the opening.

[0006] Optionally, the passageway includes a first peripheral wall and a second peripheral wall, the first peripheral wall is connected with the end face where the inlet is opened, and the second peripheral wall is connected with the end face where the opening is opened, and the width of the first peripheral wall gradually increases in the direction close to the inlet.

[0007] Optionally, the first peripheral wall and the second peripheral wall are smoothly connected.

[0008] Optionally, the width of the second peripheral wall gradually increases in the direction close to the opening.

[0009] Optionally, the first peripheral wall is smoothly extended, and the second peripheral wall is smoothly extended.

[0010] Optionally, the width of the opening is D1, the width of the inlet is D2, and 0.7≤D2 / D1≤1.

[0011] Optionally, the material receiving hole penetrates the edge of the material receiving plate.

[0012] Optionally, the material receiving plate comprises a fixed part and a bearing part connected with each other, the thickness of the fixed part is greater than the thickness of the bearing part, the bearing part is provided with the material receiving hole, and the end face of the material inlet of the bearing part is sunken relative to the fixed part.

[0013] To achieve the above object, a production equipment is provided in an embodiment of the present application, which comprises a moving mechanism and a material receiving plate.

[0014] The production equipment has the advantages that:

[0015] The material receiving plate is provided with a through material receiving hole in the thickness direction, the material receiving hole comprises a material inlet, a channel and an opening which are sequentially communicated, the material inlet is used for allowing the sealing nail to pass through to the channel, the width of one end of the channel close to the material inlet gradually increases in the direction close to the material inlet, and the suction nozzle is used for taking out the sealing nail from the material receiving plate, so that the dust and water are sequentially discharged to the external environment through the material inlet, the channel and the opening, the dust and water are prevented from remaining on the inner side wall of the channel, the material receiving hole is used for limiting the sealing nail and facilitating the dust and water to pass through, dust accumulation is avoided, and the sealing nail is prevented from being stuck in the material receiving plate. BRIEF DESCRIPTION OF DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings needed to be used in the embodiments or the prior art description will be briefly introduced. Obviously, the drawings in the following description only represent some embodiments of the present application, and other drawings can be obtained by those skilled in the art without any creative effort on the basis of the drawings shown.

[0017] Figure 1 is an assembly structure schematic view of the production equipment provided by the embodiment of the present application;

[0018] Figure 2 is a cross-sectional structure schematic view of the production equipment provided by the embodiment of the present application;

[0019] Figure 3 is a partial enlarged view of A in Figure 2

[0020] Explanation of reference numerals:

[0021] 100, material receiving plate;

[0022] 10, material receiving hole; 11, material inlet; 12, channel; 121, first peripheral wall; 122, second peripheral wall; 13, opening;

[0023] ​20, fixed part;

[0024] 30, bearing part. DETAILED DESCRIPTION

[0025] The technical solutions in the embodiments of the present application will be clearly and completely described with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.

[0026] Please refer to Figures 1 to 3 , as shown in the figure, Figure 1 is a schematic diagram of the assembly structure of the production equipment provided by the embodiments of the present application; Figure 2 is a schematic diagram of the cross-sectional structure of the production equipment provided by the embodiments of the present application; Figure 3 is shown Figure 2 , the local enlarged view of A in the figure.

[0027] Please refer to the accompanying Figures 1 to 3 , the application provides an application for a kind of material receiving plate 100, material receiving plate 100 is used to support sealing nail, prevent dust accumulation simultaneously.

[0028] Please refer to the accompanying Figures 1 to 3 , in the embodiments of the present application, material receiving hole 10 is opened along the thickness direction of material receiving plate 100, material receiving hole 10 includes inlet 11, channel 12 and opening 13 communicated in sequence, inlet 11 is used for sealing nail to pass to channel 12. After suction nozzle takes out sealing nail from material receiving plate, in order to dust and water are sequentially discharged to external environment through inlet 11, channel 12 and opening 13, prevent dust and water from remaining on the inner side wall of channel 12, so that material receiving hole 10 limits sealing nail at the same time facilitates dust and water to be provided, avoids dust accumulation, prevents sealing nail from being stuck in material receiving plate 100.

[0029] Please refer to the accompanying Figures 1 to 3 , at this time, inlet 11 is on the upper side of channel 12, opening 13 is on the lower side of channel 12, sealing nail enters channel 12 from inlet 11 from top to bottom, the position of the inner side wall of channel 12 limits sealing nail, to realize the supporting effect of sealing nail, suction nozzle takes out sealing nail from inlet 11 from bottom to top. When sealing nail is not on material receiving hole 10, dust is sequentially discharged to external environment through inlet 11, channel 12 and opening 13, prevent dust from remaining on material receiving hole 10, so that material receiving hole 10 limits sealing nail at the same time facilitates dust and water to be provided, avoids dust accumulation, prevents sealing nail from being stuck in material receiving plate 100.

[0030] Please refer to the accompanyingFigures 1 to 3 The width of the channel 12 near the end of the inlet 11 gradually increases in the direction close to the inlet 11, and the end of the channel 12 close to the inlet 11 is the upper half of the channel 12, which gradually narrows to limit the position of the sealing nail and prevent the sealing nail from falling to the outside environment through the opening 13. At the same time, the inner side wall of the upper half of the channel 12 has a guiding effect to facilitate the sealing nail to enter the channel 12 under the guidance of the inner side wall of the channel 12.

[0031] Please refer to the attached drawings Figures 1 to 3 The width of the channel 12 near the end of the opening 13 gradually increases in the direction close to the opening 13, and the end of the channel 12 close to the opening 13 is the lower half of the channel 12, which gradually widens to facilitate the passage of dust and water and make it easier to discharge dust and water. The width of the upper half of the channel 12 gradually narrows from top to bottom, and the width of the lower half of the channel 12 gradually widens from top to bottom, so as to facilitate the channel 12 to form a double-horn shape, which limits the sealing nail while facilitating the passage of dust and water, avoids dust accumulation, and prevents the sealing nail from being stuck in the receiving plate 100.

[0032] Please refer to the attached drawings Figures 2 to 3 The channel 12 includes a first peripheral wall 121 and a second peripheral wall 122. The first peripheral wall 121 is connected with the end face where the inlet 11 is arranged, and is used to receive the sealing nail. The second peripheral wall 122 is arranged below the first peripheral wall 121, and is connected with the end face where the opening 13 is arranged. The width of the first peripheral wall 121 gradually increases in the direction close to the inlet 11. So as to facilitate the first peripheral wall 121 to gradually narrow from top to bottom, and the sealing nail to enter the channel 12 under the guidance of the first peripheral wall 121. The narrowest part of the first peripheral wall 121 limits the position of the sealing nail, prevents the sealing nail from escaping in the direction away from the inlet 11 along the first peripheral wall 121, and ensures the position of the sealing nail relative to the first peripheral wall 121. So as to achieve the sealing nail to be contained in the channel 12, and prevent the sealing nail from protruding from the end face of the inlet 11.

[0033] Please refer to the attached drawings Figures 2 to 3 The first peripheral wall 121 and the second peripheral wall 122 are smoothly connected, which is more conducive to the dust and water to flow along the first peripheral wall 121 and the second peripheral wall 122 to the outside environment, so as to facilitate the discharge of dust and water, prevent dust and water from remaining in the first peripheral wall 121 and the second peripheral wall 122, and make the first peripheral wall 121 to limit the sealing nail while facilitating the passage of dust and water, avoid dust accumulation, and prevent the sealing nail from being stuck in the first peripheral wall 121.

[0034] Please refer to the attached drawings Figures 2 to 3, the width of the second peripheral wall 122 gradually increases in the direction close to the opening 13, so that the second peripheral wall 122 gradually widens from top to bottom, thereby facilitating the expansion of the dust and water discharge port. More conducive to the discharge of dust and water, prevent dust and water remaining in the second peripheral wall 122, to ensure the dust and water discharge effect. At the same time, the dust and water flow to the external environment under the guidance of the second peripheral wall 122 through the opening 13, to ensure the smoothness of the flow of dust and water, to achieve timely discharge of dust and water.

[0035] Please refer to the attached Figures 2 to 3 , the first peripheral wall 121 is smoothly extended, and the second peripheral wall 122 is smoothly extended, so that the first peripheral wall 121 and the second peripheral wall 122 are arranged in sequence in a circular arc shape, rather than extending in an inclined direction, to realize the smooth connection of the first peripheral wall 121 and the second peripheral wall 122. Thus, the dust and water flow into the inlet 11 along the first peripheral wall 121 and the second peripheral wall 122 through the opening 13, so that the dust and water are discharged to the external environment. The first peripheral wall 121 and the second peripheral wall 122 have a guiding effect, and the dust and water flow to the opening 13 under the guidance of the first peripheral wall 121 and the second peripheral wall 122, to ensure the smoothness of the flow of dust and water, and improve the discharge effect of dust and water. Avoiding the dust and water remaining in the first peripheral wall 121 and the second peripheral wall 122, avoiding the accumulation of dust, preventing the sealing nail from being stuck in the first peripheral wall 121.

[0036] Please refer to the attached Figures 2 to 3 , the width of the opening 13 is D1, the width of the inlet 11 is D2, and 0.7≤D2 / D1≤1. When the width of the inlet 11 is larger, the width of the opening 13 is larger, and when the width of the inlet 11 is smaller, the width of the opening 13 is smaller. To ensure that the position of the sealing nail is limited while the width of the opening 13 is expanded, so as to ensure the dust and water discharge effect of the dust and water to the external environment through the opening 13 after the suction nozzle takes out the sealing nail from the receiving plate 100, avoiding the accumulation of dust, preventing the sealing nail from being stuck in the receiving plate 100.

[0037] Please refer to the attached Figure 1, the receiving hole 10 penetrates the edge of the receiving plate 100 to expand the space of the receiving hole 10, thereby further expanding the flow space of the dust and water, which is beneficial to the discharge of the dust and water and avoids dust accumulation and prevents the sealing nails from being stuck in the receiving plate 100. Meanwhile, the sealing nails enter the receiving hole 10 along the edge of the receiving plate 100, which increases the assembly of the sealing nails. The receiving hole 10 extends along the thickness direction of the receiving plate 100 to realize the penetration of the receiving hole 10 along the thickness direction of the receiving plate 100. This is convenient for the sealing nails to enter the receiving hole 10 along the thickness direction of the receiving plate 100, so that the inner side wall of the receiving hole 10 can limit the sealing nails, thereby ensuring the position of the sealing nails relative to the receiving plate 100. After the suction nozzle takes out the sealing nails from the receiving hole 10, the dust and water pass through the receiving hole 10 along the thickness direction of the receiving plate 100 to realize the discharge of the dust and water, prevent the dust and water from remaining in the receiving hole 10, avoid dust accumulation, and prevent the sealing nails from being stuck in the receiving plate 100.

[0038] Please refer to the attached drawings Figure 1 The receiving plate 100 includes the fixed part 20 and the bearing part 30 connected with each other, the thickness of the fixed part 20 is greater than the thickness of the bearing part 30, so that the upper surface of the fixed part 20 is higher than the upper surface of the bearing part 30, thereby the upper surface of the fixed part 20 is staggered with the upper surface of the bearing part 30, so that the fixed part 20 and the bearing part 30 are in a stepped shape. The bearing part 30 is provided with the receiving hole 10, and the end surface of the inlet 11 of the bearing part 30 is sunken relative to the fixed part 20, so that the end surface of the inlet 11 is lower than the upper surface of the fixed part 20, thereby the end surface of the inlet 11 is staggered with the upper surface of the fixed part 20. The fixed part 20 is used for fixing the movement mechanism, and the upper surface of the fixed part 20 blocks the movement mechanism from contacting the upper surface of the bearing part 30, thereby avoiding the movement mechanism from colliding with the sealing nails in the bearing part 30, preventing the sealing nails from being damaged, and ensuring the performance of the sealing nails.

[0039] Please refer to the attached drawings Figure 1 The fixed part 20 and the bearing part 30 are in an integrated connection structure, which ensures the connection strength between the fixed part 20 and the bearing part 30, improves the connection stability between the fixed part 20 and the bearing part 30, avoids the connection between the fixed part 20 and the bearing part 30 from being broken, and ensures the strength of the receiving plate 100.

[0040] Please refer to the attached drawings Figure 1 The receiving hole 10 has a plurality of receiving holes 10, the plurality of receiving holes 10 are arranged at intervals along the length direction of the receiving plate 100, and the plurality of receiving holes 10 correspond to the respective sealing nails. By arranging the plurality of receiving holes 10, the number of the receiving plate 100 relative to the sealing nails is increased, so that one receiving plate 100 can accommodate multiple sealing nails, thereby improving the work efficiency.

[0041] In another embodiment, a production device, the production device comprises a moving mechanism and a receiving plate 100, the receiving plate 100 is connected with the moving mechanism so as to be fixed to the moving mechanism, thereby the receiving plate 100 moves with the movement of the moving mechanism, the position of the receiving plate 100 is adjusted to realize the transfer of the receiving plate 100.

[0042] At this time, the receiving plate 100 is provided with a through receiving hole 10 along the thickness direction thereof, the receiving hole 10 comprises a feeding port 11, a channel 12 and an opening 13 which are sequentially communicated, the feeding port 11 is used for allowing the sealing nail to pass through to the channel 12, the width of the channel 12 near the feeding port 11 gradually increases in the direction close to the feeding port 11, after the suction nozzle takes out the sealing nail from the receiving plate, the dust and water are sequentially discharged to the external environment through the feeding port 11, the channel 12 and the opening 13, the dust and water are prevented from remaining on the inner side wall of the channel 12, the receiving hole 10 is convenient for the dust and water to pass through while limiting the sealing nail, the dust accumulation is avoided, and the sealing nail is prevented from being stuck in the receiving plate 100.

[0043] The utility model discloses the beneficial effect lies in:

[0044] The utility model provides an application to a receiving plate 100 and production device, the receiving plate 100 is provided with a through receiving hole 10 along the thickness direction thereof, the receiving hole 10 comprises a feeding port 11, a channel 12 and an opening 13 which are sequentially communicated, the feeding port 11 is used for allowing the sealing nail to pass through to the channel 12, the width of the channel 12 near the feeding port 11 gradually increases in the direction close to the feeding port 11, after the suction nozzle takes out the sealing nail from the receiving plate, the dust and water are sequentially discharged to the external environment through the feeding port 11, the channel 12 and the opening 13, the dust and water are prevented from remaining on the inner side wall of the channel 12, the receiving hole 10 is convenient for the dust and water to pass through while limiting the sealing nail, the dust accumulation is avoided, and the sealing nail is prevented from being stuck in the receiving plate 100.

[0045] It should be noted that all the directionality indications (such as up, down, left, right, front, back, etc.) in the embodiments of the utility model are only used to explain the relative position relationship, movement condition, etc. between the components in a certain specific posture, and if the specific posture changes, the directionality indications will also change accordingly.

[0046] It is also need to point out that when an element is referred to as "fixed to" or "set to" another element, it can be directly on another element or there can be a middle element. When an element is referred to as "connected to" another element, it can be directly connected to another element or indirectly connected to another element through a middle element.

[0047] In addition, the description of "first", "second" and the like in the present application is only for the purpose of description and can not be understood as indicating or implying the relative importance of the technical features or implying the number of the technical features indicated. Therefore, the features limited by "first", "second" can explicitly or implicitly include at least one of the features. In addition, the technical solutions of each embodiment can be combined with each other, but it must be based on the realization of the ordinary skilled in the art, when the combination of technical solutions appears contradictory or cannot be realized, it should be considered that the combination of technical solutions does not exist, nor within the scope of the patent protection required by the present application.

[0048] The above is only the preferred embodiment of the present application, and does not limit the patent range of the present application, any equivalent structural transformation made by using the content of the present application specification and drawings, or directly / indirectly applied in other related technical fields under the concept of the present application are included in the patent protection range of the present application.

Claims

1. A receiving plate, characterized in that, The receiving plate is provided with a through receiving hole along its thickness direction, the receiving hole comprises a feeding port, a channel and an opening which are communicated in sequence, the feeding port is used for allowing the sealing nail to pass through to the channel, the width of the channel near one end of the feeding port gradually increases in the direction close to the feeding port.

2. The material receiving plate of claim 1, wherein The width of the channel near one end of the opening gradually increases in the direction close to the opening.

3. The material receiving plate of claim 1, wherein, The channel comprises a first peripheral wall and a second peripheral wall, the first peripheral wall is connected with the end face provided with the feeding port, the second peripheral wall is connected with the end face provided with the opening, the width of the first peripheral wall gradually increases in the direction close to the feeding port.

4. The material receiving plate of claim 3, wherein, The first peripheral wall and the second peripheral wall are smoothly connected.

5. The material receiving plate of claim 3, wherein, The width of the second peripheral wall gradually increases in the direction close to the opening.

6. The material receiving plate of claim 5, wherein, The first peripheral wall is smoothly extended, and the second peripheral wall is smoothly extended.

7. The material receiving plate of claim 2, wherein, The width of the opening is D1, and the width of the feeding port is D2, 0.7≤D2 / D1≤1.

8. A material receiving plate according to any one of claims 1 to 7, characterised in that, The receiving hole penetrates the edge of the receiving plate.

9. A material receiving plate according to any one of claims 1 to 7, characterised in that, The receiving plate comprises a fixed part and a bearing part which are connected with each other, the thickness of the fixed part is greater than the thickness of the bearing part, the bearing part is provided with the receiving hole, and the end face provided with the feeding port of the bearing part is sunken relative to the fixed part.

10. A production apparatus characterized by comprising: The production equipment comprises a motion mechanism and the receiving plate according to any one of claims 1 to 9, the receiving plate is connected with the motion mechanism, and the receiving plate is used for bearing the sealing nail through the receiving hole.

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