Gas cylinder residual source recovery device for filling silicon-based precursor material

Abstract

The utility model discloses a gas cylinder residual source recovery device for filling a silicon-based precursor material, which comprises a gas source, the gas source is connected with a plurality of gas cylinders through pipelines, the outer side of each gas cylinder is provided with a heating sleeve, the plurality of gas cylinders are connected with a plurality of receiving tanks through pipelines, and the receiving tanks are connected with the gas source through pipelines. The plurality of receiving tanks are connected with a secondary cold trap through a pipeline, the secondary cold trap is connected with a primary cold trap through a pipeline, and the primary cold trap is connected with a vacuum pump through a pipeline, so that residual sources in the gas cylinder can be recovered, and a small amount of residual sources in the connecting pipeline and the receiving tanks are collected through the primary cold trap and the secondary cold trap; and the safety risk and air pollution caused by direct discharge of residues are prevented.

Description

Technical Field

[0001] This utility model relates to the technical field of residual material recycling, and more specifically, it relates to a residual material recycling device for gas cylinders used to fill silicon-based precursor materials. Background Technology

[0002] Silicon-based precursor materials play a central role in integrated circuit manufacturing and are a key element driving the development of semiconductor technology. These materials are crucial in key processes for manufacturing semiconductor integrated circuit memory and logic chips, such as epitaxy, photolithography, CVD, and ALD. As a core branch, silicon-based precursors have become a research hotspot in recent years, primarily used for the selective epitaxial growth of SiGe thin films, and for growing silicon nitride, silicon oxide, low-dielectric-constant, and high-dielectric-constant thin film materials via CVD and ALD technologies. The quality of these thin films is critical to the performance of integrated circuits, driving the continuous development of new materials in advanced integrated circuit manufacturing technologies.

[0003] With the continuous advancement of semiconductor technology, silicon-based precursor materials have become the core of integrated circuit processes. Their purity and metal impurity content directly affect chip quality and performance. In advanced IC fabrication, silicon-based precursors require a purity exceeding 99.99% and a metal impurity mass fraction below 1×10⁻⁹. These materials are typically stored in dedicated gas cylinders in gaseous or liquid form for use in integrated circuit production lines. Used gas cylinders often contain residual silicon-based precursor materials. Improper handling can lead to resource waste and pollution, and may also pose dangers to the environment and personnel safety. Therefore, how to efficiently and safely recycle and dispose of these gas cylinder residues has become an urgent problem to be solved. Utility Model Content

[0004] (a) Technical problems to be solved

[0005] To address the problems existing in the prior art, this utility model provides a device for recycling residual materials from gas cylinders filled with silicon-based precursor materials. This solves the technical problem mentioned in the background art that commonly used gas cylinders often contain residual silicon-based precursor materials, which, if not properly handled, will not only cause resource waste and pollution.

[0006] (II) Technical Solution

[0007] To achieve the above objectives, this utility model provides the following technical solution: a gas cylinder residue recovery device for filling silicon-based precursor materials, comprising a gas source, wherein the gas source is connected to multiple gas cylinders via pipes, each gas cylinder is provided with a heating jacket on its outer side, the multiple gas cylinders are connected to multiple receiving tanks via pipes, the multiple receiving tanks are connected to a secondary cold trap via pipes, the secondary cold trap is connected to a primary cold trap via pipes, and the primary cold trap is connected to a vacuum pump via pipes.

[0008] The present invention is further provided that the pipeline connecting the gas source to the multiple gas cylinders is equipped with a filter to prevent particles in the gas source from entering the gas cylinders and causing contamination.

[0009] The present invention is further provided that the pipeline connecting the gas cylinder and the receiving tank is provided with a detection port, which facilitates the detection of whether there is gas source residue in the gas source cylinder and the content of metal element impurities in the gas cylinder.

[0010] The present invention is further configured such that each of the receiving tanks is provided with a Dewar tank on the outside for easy filling with liquid nitrogen.

[0011] The present invention is further configured such that the Dewar jar, the primary cold trap and the secondary cold trap are all connected to liquid nitrogen delivery pipelines, which facilitates automatic delivery of liquid nitrogen.

[0012] The present invention is further configured such that the liquid nitrogen conveying pipeline is connected to liquid nitrogen, which facilitates the conveying of liquid nitrogen.

[0013] (III) Beneficial Effects

[0014] Compared with the prior art, this utility model provides a device for recycling residual gas cylinders used to fill silicon-based precursor materials, which has the following beneficial effects:

[0015] 1. This utility model can recover residual sources in gas cylinders and collect small amounts of residual sources in connecting pipes and receiving tanks through a primary cold trap and a secondary cold trap, preventing the direct discharge of residues from causing safety risks and air pollution.

[0016] 2. This utility model detects the gas source in the gas cylinder through the detection port to determine whether there is residual gas source and impurity elements in the gas cylinder.

[0017] 3. This utility model adds liquid nitrogen to the Dewar jar through a liquid nitrogen cold delivery pipeline, keeping the receiving tank below -100℃, ensuring that the residual source from the gas cylinder is collected by the receiving tank.

[0018] 4. This utility model filters the gas source through a filter to prevent particles in the gas source from entering the gas cylinder and causing contamination.

[0019] 5. This utility model allows for the direct addition of liquid nitrogen to the Dewar jar via a liquid nitrogen delivery pipeline, eliminating the need for manual addition and ensuring safety. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the overall structure of a gas cylinder residue recycling device for filling silicon-based precursor materials in use.

[0021] In the diagram: 1. Gas source; 2. Filter; 3. Heating jacket; 4. Gas cylinder; 5. Detection port; 6. Receiving tank; 7. Dewar flask; 8. Liquid nitrogen; 9. Liquid nitrogen delivery pipeline; 10. Primary cold trap; 11. Vacuum pump; 12. Secondary cold trap. Detailed Implementation

[0022] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0023] It should be noted that, unless otherwise specified, all technical and scientific terms used in this application have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains.

[0024] In this utility model, unless otherwise stated, the orientations used, such as "up" and "down", usually refer to the direction shown in the accompanying drawings, or to the vertical, perpendicular, or gravitational direction; similarly, for ease of understanding and description, "left" and "right" usually refer to the left and right shown in the accompanying drawings; "inner" and "outer" refer to the inner and outer contours of each component itself, but the above directional terms are not used to limit this utility model.

[0025] Please see Figure 1 A gas cylinder residue recovery device for filling silicon-based precursor materials includes a gas source 1, which is connected to multiple gas cylinders 4 via pipes. Each gas cylinder 4 is provided with a heating jacket 3 on its outer side. The multiple gas cylinders 4 are connected to multiple receiving tanks 6 via pipes. The multiple receiving tanks 6 are connected to a secondary cold trap 12 via pipes. The secondary cold trap 12 is connected to a primary cold trap 10 via pipes. The primary cold trap 10 is connected to a vacuum pump 11 via pipes. A filter 2 is provided on the pipes connecting the gas source 1 and the multiple gas cylinders 4. A detection port 5 is provided on the pipes connecting the gas cylinders 4 and the receiving tanks 6. A Dewar canister 7 is provided on the outer side of each receiving tank 6. The Dewar canister 7, the primary cold trap 10, and the secondary cold trap 12 are all connected to a liquid nitrogen delivery pipe 9. The liquid nitrogen delivery pipe 9 is connected to liquid nitrogen 8.

[0026] In this embodiment, all connected pipes and liquid nitrogen delivery pipes 9 are equipped with corresponding valves, which can be used to open or close the relevant connected pipes or liquid nitrogen delivery pipes 9. When it is necessary to recover the residual source in the gas cylinder 4, the vacuum pump 11 is started. The vacuum pump 11 draws the gas cylinder 4 into negative pressure through the connected primary cold trap 10 and secondary cold trap 12. The pressure of the residual liquid in the gas cylinder 4 decreases, and it is drawn into the receiving tank 6. Then, the gas source 1 is filtered through the filter 2 and replenished to the gas cylinder 4. The vacuum pump 11, primary cold trap 10 and secondary cold trap 12 draw the gas cylinder 4 into negative pressure again. This process is repeated until the source residue in the gas cylinder 4 is qualified as detected by the detection port 5. Throughout the process, the heating jacket 3 heats the gas cylinder 4 to vaporize the liquid in the gas cylinder 4. Then, the liquid reaches the receiving tank 6 for storage through the pressure difference. During this process, the gas carries the residual liquid in the gas cylinder 4 out to the receiving tank 6. The gas source 1 is high-purity helium. Filter 2 filters the gas source 1, preventing particles from entering the gas cylinder 4 and contaminating it. Liquid nitrogen 8 can be transported to the Dewar tank 7, the primary cold trap 10, and the secondary cold trap 12 via the liquid nitrogen delivery pipeline 9. The primary cold trap 10 and the secondary cold trap 12 are used to collect any small amounts of residual gas that may flow out from the receiving tank 6.

[0027] Of all the solutions mentioned above, those involving the connection between two components can be selected according to the actual situation, such as welding, bolt and nut connection, bolt or screw connection, or other known connection methods, which will not be elaborated here. For all the fixed connections mentioned above, welding is preferred. Although embodiments of this utility model have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of this utility model. The scope of this utility model is defined by the appended claims and their equivalents.

Claims

1. A gas cylinder residue recovery device for filling silicon-based precursor materials, comprising a gas source (1), characterized in that: The gas source (1) is connected to multiple gas cylinders (4) via pipes. Each gas cylinder (4) is provided with a heating jacket (3) on its outside. The multiple gas cylinders (4) are connected to multiple receiving tanks (6) via pipes. The multiple receiving tanks (6) are connected to a secondary cold trap (12) via pipes. The secondary cold trap (12) is connected to a primary cold trap (10) via pipes. The primary cold trap (10) is connected to a vacuum pump (11) via pipes.

2. The gas cylinder residue recycling device for filling silicon-based precursor materials according to claim 1, characterized in that: The gas source (1) is connected to the pipeline of multiple gas cylinders (4) by a filter (2).

3. The gas cylinder residue recycling device for filling silicon-based precursor materials according to claim 1, characterized in that: The pipeline connecting the gas cylinder (4) and the receiving tank (6) is equipped with a detection port (5).

4. The gas cylinder residue recycling device for filling silicon-based precursor materials according to claim 1, characterized in that: Each of the receiving containers (6) is provided with a Dewar container (7) on its outer side.

5. A gas cylinder residue recycling device for filling silicon-based precursor materials according to claim 4, characterized in that: The Dewar tank (7), the primary cold trap (10) and the secondary cold trap (12) are all connected to liquid nitrogen delivery pipes (9).

6. A gas cylinder residue recycling device for filling silicon-based precursor materials according to claim 5, characterized in that: The liquid nitrogen delivery pipeline (9) is connected to a liquid nitrogen (8).

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