Pattern projection device and three-dimensional scanning equipment

Abstract

The utility model discloses a pattern projection device and three-dimensional scanning equipment. The pattern projection device provided by the embodiment of the utility model is applied to the three-dimensional scanning equipment. The three-dimensional scanning equipment comprises an image acquisition device. The image acquisition device comprises a first camera and a second camera. The connecting line direction between the first camera and the second camera is a first direction. The pattern projection device is used for projecting a plurality of linear patterns with different arrangement angles. The arrangement angles of the multiple linear patterns are all located in a preset diagonal area staggered with the first direction. According to the pattern projection device and the three-dimensional scanning equipment provided by the embodiment of the invention, the pattern projection device is used for projecting the plurality of linear patterns with different arrangement angles, and the arrangement angles of the plurality of linear patterns are all located in the preset diagonal region staggered from the first direction, so that the noise of three-dimensional data is reduced, and the accuracy of the three-dimensional data is improved. Therefore, the scanning precision of the three-dimensional scanning equipment is improved, and the reliability of a scanning result is enhanced.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of three-dimensional scanning, in particular to a pattern projection device and a three-dimensional scanning device. BACKGROUND

[0002] With the continuous development of three-dimensional scanning technology, three-dimensional scanning devices are increasingly widely used in various fields. As a core component of three-dimensional scanning devices, lasers are used to emit laser light to accurately measure the three-dimensional data of the surface of the measured object, and play a crucial role in the three-dimensional reconstruction process. However, in actual application, if the arrangement angle of the laser lines projected by the laser is not reasonable, it will result in large noise of the obtained three-dimensional data, thereby affecting the scanning accuracy of the three-dimensional scanning device. CONTENT OF THE UTILITY MODEL

[0003] The present application provides a pattern projection device and a three-dimensional scanning device to solve at least one of the above technical problems.

[0004] The pattern projection device of the present application is applied to a three-dimensional scanning device, which includes an image acquisition device, the image acquisition device includes a first camera and a second camera, the direction of the line connecting the first camera and the second camera is a first direction, and the pattern projection device is used to project a plurality of linear patterns with different arrangement angles, and the arrangement angles of the plurality of linear patterns are located in a predetermined diagonal region that is staggered with the first direction.

[0005] In some embodiments, the pattern projection device includes a plurality of emitters, and the plurality of emitters are respectively used to project the plurality of linear patterns with different arrangement angles.

[0006] In some embodiments, the predetermined diagonal region is symmetrically arranged along a second direction perpendicular to the first direction.

[0007] In some embodiments, with the second direction as the reference, the included angle range of the predetermined diagonal region is [-45°, +45°].

[0008] In some embodiments, the predetermined diagonal region includes a first edge angle and a second edge angle, the plurality of linear patterns includes N linear patterns, the arrangement angle of the first linear pattern is located at the first edge angle, the arrangement angle of the Nth linear pattern is located at the second edge angle, and the arrangement angles of the second to (N-1)th linear patterns are located between the first edge angle and the second edge angle.

[0009] Wherein, N≥3, and N is an integer.

[0010] In some embodiments, the first edge angle and the second edge angle are located on two sides of a second direction perpendicular to the first direction, respectively.

[0011] In some embodiments, the arrangement angles of the second to (N-1)th linear patterns are uniformly distributed in an included angle space between the first edge angle and the second edge angle.

[0012] In some embodiments, the predetermined diagonal region includes a forbidden region covering the second direction perpendicular to the first direction, and the arrangement angles of the second to (N-1)th linear patterns are staggered with the forbidden region.

[0013] In some embodiments, the forbidden region is symmetrically arranged along the second direction.

[0014] In some embodiments, the included angle range of the forbidden region is (-5°, +5°) with the second direction as a reference.

[0015] The three-dimensional scanning device of the embodiments of the present application includes the pattern projection device and the image acquisition device of any of the above embodiments.

[0016] In the pattern projection device and the three-dimensional scanning device of the embodiments of the present application, the pattern projection device is used to project a plurality of linear patterns with different arrangement angles, and the arrangement angles of the plurality of linear patterns are all located in a predetermined diagonal region staggered with a first direction, so as to reduce the noise of three-dimensional data, thereby improving the scanning accuracy of the three-dimensional scanning device and enhancing the reliability of the scanning result.

[0017] Additional aspects and advantages of the present application will be in part apparent and in part pointed out hereinafter. BRIEF DESCRIPTION OF DRAWINGS

[0018] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the related art, the drawings needed to be used in the embodiments or the related art description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can also be obtained by those skilled in the art without creative effort on the basis of the drawings shown.

[0019] Figure 1 is a schematic diagram of a module of the three-dimensional scanning device of some embodiments of the present application;

[0020] Figure 2 is a schematic diagram of an application scene of the three-dimensional scanning device of some embodiments of the present application;

[0021] Figure 3This is a schematic diagram of blank areas and predetermined diagonal areas in certain embodiments of this application;

[0022] Figure 4 This is a schematic diagram showing the arrangement angles of multiple linear patterns in certain embodiments of this application;

[0023] Figure 5 This is a schematic diagram of a laser scanning along a specific moving trajectory in related technologies;

[0024] Figure 6 This is a schematic diagram of blank areas, predetermined diagonal areas, and prohibited areas in certain embodiments of this application.

[0025] Explanation of reference numerals in the attached figures:

[0026] Pattern projection device 100, transmitter 10, image acquisition device 200, first camera 210, second camera 220, and three-dimensional scanning device 1000. Detailed Implementation

[0027] The embodiments of this application are described in detail below. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application.

[0028] Please see Figures 1 to 4 This application provides a pattern projection device 100. The pattern projection device 100 is applied to a three-dimensional scanning device 1000. The three-dimensional scanning device 1000 includes an image acquisition device 200. The image acquisition device 200 includes a first camera 210 and a second camera 220. The direction of the line connecting the first camera 210 and the second camera 220 is a first direction. The pattern projection device 100 is used to project multiple linear patterns with different arrangement angles. The arrangement angles of the multiple linear patterns are all located within a predetermined diagonal region offset from the first direction.

[0029] In the pattern projection device 100 of this application embodiment, the pattern projection device 100 is used to project multiple linear patterns with different arrangement angles, and the arrangement angles of the multiple linear patterns are all located in a predetermined diagonal region offset from the first direction, so as to reduce the noise of the three-dimensional data, thereby improving the scanning accuracy of the three-dimensional scanning device 1000 and enhancing the reliability of the scanning results.

[0030] Specifically, the 3D scanning device 1000 includes a pattern projection device 100 and an image acquisition device 200. The image acquisition device 200 includes a first camera 210 and a second camera 220, namely a left-eye camera and a right-eye camera. The pattern projection device 100 is used to project a linear pattern onto the object to be measured, and the first camera 210 and the second camera 220 are respectively used to capture images of the object to be measured to obtain 3D data of the surface of the object to be measured.

[0031] The pattern projection device 100 can project multiple linear patterns with different arrangement angles. The linear patterns can be those corresponding to ordinary light (such as natural light, incandescent light, fluorescent light, etc.) or those corresponding to laser light. The pattern projection device 100 may include one or more emitters 10. When the pattern projection device 100 includes one emitter 10, the emitter 10 is used to project multiple linear patterns with different arrangement angles in a time-division manner; when the pattern projection device 100 includes multiple emitters 10, the multiple emitters 10 are used to sequentially and alternately project multiple linear patterns with different arrangement angles, wherein the specific order of alternation is not limited.

[0032] The direction of the line connecting the first camera 210 and the second camera 220 is the first direction (e.g., ...). Figure 3 The direction perpendicular to the first direction (e.g., the X direction) is the second direction. Figure 3 (Y-direction). Both the first and second directions are perpendicular to the light emission direction of the pattern projection device 100. The arrangement angles of the multiple linear patterns are all located within a predetermined diagonal region offset from the first direction. For example... Figure 3 As shown, the predetermined diagonal region (e.g.) Figure 3 (R2 region) and blank region (e.g.) Figure 3 The R1 region can together form a complete disk angle. The predetermined diagonal region and the blank region do not overlap. The blank region can cover the first direction, while the predetermined diagonal region can cover the second direction. That is to say, the first direction is contained within the blank region, and the second direction is contained within the predetermined diagonal region.

[0033] For example, using the second direction as a reference (clockwise is positive, counterclockwise is negative, or in other words, the direction of rotation towards the second camera 220 is positive, and the direction of rotation towards the first camera 210 is negative), the angle range of the predetermined diagonal region is [-75°, +75°], while the angle range of the blank region is [-90°, -75°) and (+75°, +90°). As another example, using the second direction as a reference, the angle range of the predetermined diagonal region is [-45°, +45°], while the angle range of the blank region is [-90°]. The angles are [-45°, +45°] and (+45°, +90°). For example, using the second direction as a reference, the included angle range of the predetermined diagonal region is [-30°, +30°], while the included angle range of the blank region is [-90°, -30°) and (+30°, +90°). It should be noted that using the second direction as a reference is only for illustrating the included angle range of the blank region and the predetermined diagonal region. In other examples, the first direction can also be used as a reference, and the included angle range of the blank region and the predetermined diagonal region can be converted by angle calculation.

[0034] like Figure 4 As shown, the arrangement angles of multiple linear patterns are located within a predetermined diagonal region. That is, the arrangement angle of each linear pattern is within the included angle range of the predetermined diagonal region. Taking a predetermined diagonal region with an included angle range of [-75°, +75°] and multiple linear patterns including four linear patterns as an example, the arrangement angles of the four linear patterns can be -50°, -25°, +25°, and +50° respectively; or, -30°, -15°, +15°, and +30° respectively; or, -30°, -10°, +10°, and +30° respectively, etc. These will not be listed individually here. Since the direction of the line connecting the first camera 210 and the second camera 220 is the first direction, according to the principle of binocular imaging, if the arrangement angle of the linear patterns is located in the first direction, it will result in higher noise in the acquired 3D data. Therefore, in this embodiment, the arrangement angle of the linear pattern is set in a predetermined diagonal region offset from the first direction to reduce the noise of the three-dimensional data, thereby avoiding scanning errors, improving the scanning accuracy of the three-dimensional scanning device 1000, and enhancing the reliability of the scanning results.

[0035] It should be noted that the embodiments of this application are designed for the arrangement angle of the multiple linear patterns projected by the pattern projection device 100, rather than for the placement of the multiple emitters 10 in the pattern projection device 100. The placement of the multiple emitters 10 can be flexibly selected according to actual needs and is not limited here. The arrangement angle of the multiple linear patterns is also the angle at which the linear patterns projected by the pattern projection device 100 illuminate the object to be measured.

[0036] Please seeFigures 2 to 4 In some embodiments, the pattern projection device 100 comprises a plurality of emitters 10. The plurality of emitters 10 are respectively configured to project a plurality of line patterns with different arrangement angles. When the line pattern is a line pattern corresponding to a laser, the emitter 10 is a laser.

[0037] In the related art, the scanning frame rate of a three-dimensional scanning device is limited.

[0038] It can be understood that for the energy output and control of a laser, the duty cycle is a very important parameter. The duty cycle is defined as the ratio of the time when the laser is on to the entire cycle time in a complete laser lighting cycle. For example, when the duty cycle is 30%, it means that in each cycle, the time when the laser is on is 30% of the entire cycle time. When the duty cycle of the laser exceeds a threshold value, the laser will overheat and burn out.

[0039] When the pattern projection device comprises a laser, if the duty cycle of the laser is fixed at 30% and the original cycle of the laser is 10ms, then the laser frame rate (i.e. scanning frame rate) of the three-dimensional scanning device can only be limited to a maximum of 100fps, and the exposure time is limited to a maximum of 3ms. If the exposure time is to be increased to 6ms, limited by the duty cycle of the laser being 30%, the cycle of the laser must be adjusted to 20ms, and then the maximum laser frame rate of the three-dimensional scanning device is 50fps.

[0040] As such, the laser brightness (i.e. exposure time) will be increased, and the laser frame rate will be reduced, which is very disadvantageous for scanning black and bright workpieces (scanning black and bright workpieces requires increasing the exposure time to be able to scan out, resulting in a reduction in the laser frame rate, which will cause the scanning to be stalled and slow for the user). Therefore, the application mode of simply increasing the exposure time to reduce the laser frame rate is not feasible.

[0041] It has been found through research that, assuming that the laser frame rate of the three-dimensional scanning device is 100fps, when the pattern projection device comprises a laser, if the requirement of 100fps needs to be met, then the frame rate of the laser must be 100fps. When the pattern projection device comprises two lasers, if the requirement of 100fps needs to be met, then the frame rate of each laser only needs to be 50fps. In other words, if the frame rate of a single laser is a maximum of 100fps (too high will burn out), and only one laser is used, then the laser frame rate of the three-dimensional scanning device cannot break through 100fps. If two lasers are used, then the laser frame rate of the three-dimensional scanning device can theoretically reach 200fps.

[0042] In the embodiments of the present application, by arranging more emitters 10 (such as lasers) in the pattern projection device 100, the laser frame rate of the three-dimensional scanning device 1000 can be improved. For the above example, if four emitters 10 are used, the exposure time is increased to 6 ms, and the laser frame rate of the three-dimensional scanning device 1000 can still reach 200 fps, so that the scanning of the black-bright workpiece can be better implemented, the exposure time is increased, and the laser frame rate is also increased.

[0043] In the related art, the laser also has the problem of slow scanning along a specific movement trajectory. Please refer to Figure 5 , two different lasers respectively project laser light, where A and B are respectively schematic diagrams of the laser light projected by the two lasers irradiating to the object to be measured (the positions of the two lasers can be understood as the centers of the lines A and B, and the projection direction is perpendicular to the paper surface), and then the three-dimensional scanning device moves along the direction indicated by the arrow. The area scanned by the laser is the area enclosed by the solid line and the dashed line. As can be seen, the area scanned by A is obviously larger than the area scanned by B. Based on the same scanning time, A scans a larger area per unit time, and the scanning efficiency is higher, that is, A is better in this scanning path. However, due to the arrangement angle of the laser light projected by the laser, the laser has the problem of slow scanning along a specific movement trajectory.

[0044] In the embodiments of the present application, by arranging more emitters 10 (such as lasers) in the pattern projection device 100, the laser frame rate of the three-dimensional scanning device 1000 can be improved. For the above example, if four emitters 10 are used, the exposure time is increased to 6 ms, and the laser frame rate of the three-dimensional scanning device 1000 can still reach 200 fps, so that the scanning of the black-bright workpiece can be better implemented, the exposure time is increased, and the laser frame rate is also increased.

[0045] Please refer to Figure 3 In some embodiments, the predetermined diagonal area is symmetrically arranged along a second direction perpendicular to the first direction.

[0046] For example, the included angle range of the predetermined diagonal area is [-75°, +75°]; or the included angle range of the predetermined diagonal area is [-60°, +60°]; or the included angle range of the predetermined diagonal area is [-45°, +45°]; or the included angle range of the predetermined diagonal area is [-30°, +30°], and the like, which are not exemplified one by one. In the embodiments of the present application, the predetermined diagonal area is symmetrically arranged along the second direction, which facilitates the arrangement angle design of the plurality of linear patterns.

[0047] Please refer to Figure 3 In some embodiments, the included angle range of the predetermined diagonal area is [-45°, +45°] with reference to the second direction.

[0048] Specifically, the region corresponding to the angle range of [-90°, -45°) and (+45°, +90°] is too parallel to the connecting line of the first camera 210 and the second camera 220, and according to the principle of binocular imaging, if the arrangement angle of the linear pattern is located in this region, it will cause the three-dimensional data obtained to have large noise. Therefore, the arrangement angle of the linear pattern in the present application is not set in the angle range of [-90°, -45°) and (+45°, +90°], but is set in the angle range of [-45°, +45°] to reduce the noise of the three-dimensional data, thereby avoiding scanning errors, improving the scanning accuracy of the three-dimensional scanning device 1000, and enhancing the reliability of the scanning results.

[0049] Please refer to Figure 4 In some embodiments, the predetermined diagonal region includes a first edge angle and a second edge angle. The plurality of linear patterns includes N linear patterns. The arrangement angle of the 1st linear pattern is located at the first edge angle, and the arrangement angle of the Nth linear pattern is located at the second edge angle. The arrangement angles of the 2nd to (N-1)th linear patterns are located between the first edge angle and the second edge angle. Wherein, N≥3, and N is an integer.

[0050] Specifically, taking the angle range of the predetermined diagonal region as [-45°, +45°] and the plurality of linear patterns including four linear patterns as an example, the predetermined diagonal region includes a first edge angle -45° and a second edge angle +45°, the arrangement angle of the 1st linear pattern is located at the first edge angle -45°, and the arrangement angle of the 4th linear pattern is located at the second edge angle +45°. The arrangement angles of the 2nd to 3rd linear patterns are located between -45° and +45°, for example, they can be -25° and +25° respectively.

[0051] Taking the angle range of the predetermined diagonal region as [-45°, -15°] and the plurality of linear patterns including four linear patterns as an example, the predetermined diagonal region includes a first edge angle -45° and a second edge angle -15°, the arrangement angle of the 1st linear pattern is located at the first edge angle -45°, and the arrangement angle of the 4th linear pattern is located at the second edge angle -15°. The arrangement angles of the 2nd to 3rd linear patterns are located between -45° and -15°, for example, they can be -35° and -25° respectively.

[0052] Please refer to Figure 4 In some embodiments, the first edge angle and the second edge angle are respectively located on both sides of the second direction perpendicular to the first direction.

[0053] For example, the first edge angle is -45° and the second edge angle is +45°; for another example, the first edge angle is -45° and the second edge angle is +30°; for yet another example, the first edge angle is -30° and the second edge angle is +45°.

[0054] In the embodiments of the present application, the first edge angle and the second edge angle are respectively located on two sides of the second direction, the arrangement angles of the plurality of linear patterns can be set in a wide range, and thus the angle range covered by the plurality of linear patterns is also wide, which is beneficial to increasing the scanning range of the three-dimensional scanning device 1000.

[0055] Referring to Figure 4 In some embodiments, the arrangement angles of the 2nd to (N-1)th linear patterns are uniformly distributed in the included angle space between the first edge angle and the second edge angle.

[0056] Specifically, taking the included angle range of the predetermined diagonal region as [-20°, +20°] and the plurality of linear patterns as four linear patterns as an example, the predetermined diagonal region includes the first edge angle -20° and the second edge angle +20°, the arrangement angle of the 1st linear pattern is located at the first edge angle -20°, and the arrangement angle of the 4th linear pattern is located at the second edge angle +20°. The arrangement angles of the 2nd to 3rd linear patterns are uniformly distributed in the included angle space between -20° and +20°. According to the calculation 40 / 3≈13 degrees, the arrangement angles of the 2nd to 3rd linear patterns are -7° and +7° respectively.

[0057] In the embodiments of the present application, the arrangement angles of the 2nd to (N-1)th linear patterns are uniformly distributed in the included angle space between the first edge angle and the second edge angle, which can make the linear patterns cover each corner of the predetermined diagonal region, and improve the uniformity and completeness of the coverage of the linear patterns.

[0058] Referring to Figure 6 In some embodiments, the predetermined diagonal region includes a prohibited region covering the second direction perpendicular to the first direction. The arrangement angles of the 2nd to (N-1)th linear patterns are staggered with the prohibited region.

[0059] Specifically, the second direction is included in the prohibited region (as shown in the R3 region in Figure 6 ), and the arrangement angles of the 2nd to (N-1)th linear patterns are staggered with the prohibited region, that is, the arrangement angles of the 2nd to (N-1)th linear patterns are staggered with at least the second direction. Taking the included angle range of the predetermined diagonal region as [-20°, +20°] as an example, the included angle range of the prohibited region is (-8°, +8°); or, the included angle range of the prohibited region is (-5°, +5°); or, the included angle range of the prohibited region is (-2°, +2°), which will not be exemplified one by one.

[0060] Further, the scheme of "arrangement angles of the 2nd to (N-1)th linear patterns being staggered with the forbidden region" can be combined with the aforementioned scheme of "arrangement angles of the 2nd to (N-1)th linear patterns being uniformly distributed in the included angle space between the first edge angle and the second edge angle".

[0061] One combination is to first uniformly distribute the arrangement angles of the 2nd to (N-1)th linear patterns in the included angle space between the first edge angle and the second edge angle, and then adjust the arrangement angles of the linear patterns falling within the forbidden region to outside the forbidden region.

[0062] When the included angle range of the diagonal region is [-20°, +20°] and the included angle range of the forbidden region is (-5°, +5°), taking five linear patterns as an example, the arrangement angle of the 1st linear pattern is located at the first edge angle -20°, and the arrangement angle of the 5th linear pattern is located at the second edge angle +20°. According to the scheme of uniformly distributing the arrangement angles of the 2nd to 4th linear patterns in the included angle space between -20° and +20°, the arrangement angles of the 2nd to 4th linear patterns should theoretically be -10°, 0°, +10° respectively. Since 0° is located in the forbidden region, it can be adjusted to 5°. That is, the arrangement angles of the 2nd to 4th linear patterns can be -10°, 5°, +10° respectively.

[0063] Another combination is to first remove the forbidden region from the included angle space between the first edge angle and the second edge angle, and then uniformly distribute the arrangement angles of the 2nd to (N-1)th linear patterns in the included angle space between the first edge angle and the second edge angle after removing the forbidden region.

[0064] When the included angle range of the diagonal region is [-20°, +20°] and the included angle range of the forbidden region is (-5°, +5°), taking six linear patterns as an example, the arrangement angle of the 1st linear pattern is located at the first edge angle -20°, and the arrangement angle of the 6th linear pattern is located at the second edge angle +20°. Remove (-5°, +5°) from the included angle space between -20° and +20°, and uniformly distribute the arrangement angles of the 2nd to 5th linear patterns in the remaining included angle space, then the arrangement angles of the 2nd to 5th linear patterns can be -15°, -5°, 5°, +15° respectively.

[0065] The application embodiments make the arrangement angles of the second to (N-1)th linear patterns as uniform as possible in the angle space between the first edge angle and the second edge angle, on the premise that the arrangement angles of the second to (N-1)th linear patterns are staggered with the forbidden area. Due to the light symmetry problem of the linear patterns (especially the laser symmetry problem of the multi-line laser), in the same frame image, the too symmetrical light data is very easy to match errors, and the reconstructed three-dimensional information is not real information but false information. Therefore, the application embodiments do not set the arrangement angle of the linear pattern in the forbidden area covering 0°, so as to avoid the light data matching error, thereby ensuring the reliability of the scanning result.

[0066] Referring to Figure 6 In some embodiments, the forbidden area is symmetrically arranged along the second direction.

[0067] Specifically, taking the second direction as the reference, for example, the angle range of the forbidden area is (-10°, +10°); or the angle range of the forbidden area is (-8°, +8°); or the angle range of the forbidden area is (-5°, +5°); or the angle range of the forbidden area is (-2°, +2°), and the like, which are not exemplified one by one. In the application embodiments, the forbidden area is symmetrically arranged along the second direction, which facilitates the arrangement angle design of the plurality of linear patterns.

[0068] Of course, in other embodiments, the forbidden area can also not be symmetrically arranged along the second direction, and at this time, taking the second direction as the reference, the angle range of the forbidden area is, for example, (-5°, +4°), and the like, which is not limited.

[0069] Referring to Figure 6 In some embodiments, taking the second direction as the reference, the angle range of the forbidden area is (-5°, +5°).

[0070] Specifically, the area corresponding to the (-5°, +5°) angle range is not arranged with the arrangement angle of the linear pattern in the application embodiments, because there is a light symmetry problem to a certain extent, so as to avoid the problem of matching error of too symmetrical light data, thereby ensuring the reliability of the scanning result.

[0071] Referring to Figure 1 The application embodiments also provide a three-dimensional scanning device 1000. The three-dimensional scanning device 1000 comprises the pattern projection device 100 and the image acquisition device 200 of any one of the above embodiments.

[0072] In the three-dimensional scanning device 1000 of the embodiments of the present application, the pattern projection device 100 is configured to project a plurality of linear patterns with different arrangement angles, and the arrangement angles of the plurality of linear patterns are located in a predetermined diagonal region that is offset from the first direction, so as to reduce the noise of the three-dimensional data, thereby improving the scanning accuracy of the three-dimensional scanning device 1000 and enhancing the reliability of the scanning result.

[0073] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first", "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined as "first", "second" can explicitly or implicitly include one or more features. In the description of the present application, the meaning of "a plurality of" is two or more, unless otherwise explicitly specified and limited.

[0074] In the description of the present application, it should be noted that, unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connection" should be understood broadly, for example, it can be fixed connection, or detachable connection, or integrally connected; it can be mechanical connection, or electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, or it can be the internal communication of two elements or the interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0075] In the present application, unless otherwise explicitly specified and limited, the "upper" or "lower" of the first feature to the second feature can include that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, the "above", "over" and "on" of the first feature to the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. The "below", "under" and "under" of the first feature to the second feature includes that the first feature is directly below and obliquely below the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.

[0076] The above disclosure provides many different embodiments or examples for implementing different structures of the present application. For simplicity of the present disclosure, the terms used in the above description are for the purpose of explanation only and are not intended to limit the present application. It will be apparent to those skilled in the art that the present application can be practiced with different structures and / or materials without departing from the spirit and scope of the present application. In addition, the present application can repeat reference numerals and / or reference letters in various examples and this repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and / or configurations discussed.

[0077] In the description of the present specification, the description of the terms "one embodiment", "some embodiments", "exemplary embodiment", "example", "specific example", "some examples" and the like means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present application. The exemplary expressions of the above terms in the present specification do not necessarily refer to the same embodiment or example. Also, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in an appropriate manner.

[0078] Although the embodiments of the present application have been shown and described above, those skilled in the art will understand that various changes, modifications, substitutions and variations can be made thereto without departing from the principles and spirit of the present application, the scope of which is defined by the claims and their equivalents.

Claims

1. A pattern projection device, characterized in that, The invention is applied to a 3D scanning device, which includes an image acquisition device, a first camera and a second camera, wherein the line connecting the first camera and the second camera is a first direction, and the pattern projection device is used to project multiple linear patterns with different arrangement angles, wherein the arrangement angles of the multiple linear patterns are all located in a predetermined diagonal region offset from the first direction.

2. The pattern projection device according to claim 1, characterized in that, The pattern projection device includes multiple emitters, each of which is used to project multiple linear patterns with different arrangement angles.

3. The pattern projection device according to claim 1, characterized in that, The predetermined diagonal region is symmetrically arranged along a second direction perpendicular to the first direction.

4. The pattern projection device according to claim 3, characterized in that, With the second direction as a reference, the included angle range of the predetermined diagonal region is [-45°, +45°].

5. The pattern projection device according to claim 1, characterized in that, The predetermined diagonal region includes a first edge angle and a second edge angle. The plurality of linear patterns include N linear patterns. The arrangement angle of the first linear pattern is located at the first edge angle, the arrangement angle of the Nth linear pattern is located at the second edge angle, and the arrangement angles of the second to (N-1)th linear patterns are located between the first edge angle and the second edge angle. Where N≥3, and N is an integer.

6. The pattern projection device according to claim 5, characterized in that, The first edge angle and the second edge angle are located on both sides of a second direction that is perpendicular to the first direction.

7. The pattern projection device according to claim 5, characterized in that, The arrangement angles of the second to (N-1) linear patterns are evenly distributed in the angular space between the first edge angle and the second edge angle.

8. The pattern projection device according to claim 5, characterized in that, The predetermined diagonal region includes a prohibited region covering a second direction perpendicular to the first direction, and the arrangement angles of the 2nd to (N-1)th linear patterns are offset from the prohibited region.

9. The pattern projection device according to claim 8, characterized in that, The prohibited area is symmetrically arranged along the second direction.

10. The pattern projection device according to claim 8, characterized in that, Based on the second direction, the included angle range of the prohibited area is (-5°, +5°).

11. A three-dimensional scanning device, characterized in that, Includes the pattern projection device and image acquisition device as described in any one of claims 1-10.

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