Photomask alignment device

Abstract

The utility model provides a photomask alignment device, and relates to the technical field of photoetching machines, the photomask alignment device comprises a supporting table, a photomask alignment assembly and an adjusting rod, the photomask alignment assembly comprises a fixed mirror bracket, a movable mirror bracket and an image receiver which are arranged on the supporting table, and the image receiver is used for receiving light from a photomask; and the fixed mirror bracket and the image receiver are positioned in a light path formed by the light rays. A first through hole is formed in the fixed mirror bracket, and a second through hole and a third through hole are formed in the movable mirror bracket. The adjusting rod is detachably arranged in the first through hole and the second through hole or the first through hole and the third through hole in a penetrating mode so that the second through hole and the third through hole can be located in the light path in a replaceable mode, and after the adjusting rod is detached, lens assemblies used for modulating light are installed in the first through hole, the second through hole and the third through hole. Through the design of the adjusting rod, the high precision of light modulation can be ensured, and errors possibly occurring in the displacement process of the platform are avoided, so that the performance and the stability of a photoetching machine system are greatly improved.

Description

Technical Field

[0001] This application relates to the field of lithography technology, and more specifically, to a photomask alignment device. Background Technology

[0002] Photolithography machines are crucial equipment in semiconductor manufacturing. Their main function is to precisely transfer circuit patterns from a photomask onto a wafer through an exposure process. To ensure that the exposed pattern is accurately overlaid onto the wafer, the pattern on the photomask must be precisely aligned with the existing pattern on the wafer. Therefore, the alignment accuracy between the photomask and the wafer is critical to the quality and yield of chip manufacturing.

[0003] Currently, many lithography systems employ two sets of lenses to perform coarse and fine alignment operations respectively. Typically, coarse alignment is performed by a low-magnification lens, while fine alignment is handled by a high-magnification lens. During the switching between coarse and fine alignment modes, the entire platform must be displaced simultaneously. This movement demands high precision and stability from the platform, but due to its weight, the load on the drive system also increases, placing higher demands on the power and precision of the drive equipment. Furthermore, displacement deviations during platform movement can affect the accuracy of the alignment process. These deviations not only increase alignment errors but may also lead to inaccuracies in the final pattern transfer process, thus affecting chip yield and reducing production efficiency and product quality. In addition, configuring two sets of lenses for coarse and fine alignment operations makes the lithography system more complex, significantly increasing equipment costs and hindering miniaturization and cost control. Utility Model Content

[0004] The purpose of this application is to provide a photomask alignment device to address the shortcomings of the prior art.

[0005] To achieve the above objectives, the technical solutions adopted in the embodiments of this application are as follows:

[0006] This application provides a photomask alignment device, including a support platform, a photomask alignment assembly, and an adjustment rod. The photomask alignment assembly includes a fixed frame, a movable frame, and an image receiver disposed on the support platform. The image receiver is used to receive light from the photomask. The fixed frame and the image receiver are located in the optical path formed by the light.

[0007] A first through hole is provided on the fixed frame, and a second through hole and a third through hole are provided on the movable frame;

[0008] The adjustment rod is detachably inserted into the first through hole and the second through hole or the first through hole and the third through hole so that the second through hole and the third through hole can be alternately located in the optical path. When the adjustment rod is removed, a lens assembly for modulating light is installed in the first through hole, the second through hole and the third through hole.

[0009] Optionally, the adjusting rod is detachably inserted into the first through hole and the second through hole so that the central axis of the first through hole coincides with the central axis of the second through hole; or, the adjusting rod is detachably inserted into the first through hole and the third through hole so that the central axis of the first through hole coincides with the central axis of the third through hole.

[0010] Optionally, the movable frame includes a frame body and a plurality of first mounting rings fixed to the frame body, the inner ring of the first mounting ring serving as a second through hole, the central axes of the plurality of second through holes being collinear, and / or, the movable frame includes a plurality of second mounting rings fixed to the frame body, the inner ring of the second mounting ring serving as a third through hole, the central axes of the plurality of third through holes being collinear.

[0011] Optionally, when the adjusting rod is removed, a low-magnification lens assembly is installed in the second through hole, and a high-magnification lens assembly is installed in the third through hole.

[0012] Optionally, the photomask alignment assembly also includes a slide rail disposed on the support platform and a slider slidably disposed on the slide rail. The sliding direction of the slider is perpendicular to the optical path. The movable lens frame is slidably connected to the slide rail via the slider to drive the second through hole and the third through hole to be replaced in the optical path.

[0013] Optionally, the photomask alignment assembly further includes a first reflector assembly disposed on the support platform, wherein light from the photomask is reflected by the first reflector assembly to the lens assembly in the first through hole.

[0014] Optionally, the first reflector assembly includes a base and a first reflector. The base is mounted on a support platform, and an adhesive groove is provided on the side of the base away from the support platform. Adhesive is filled in the adhesive groove, and the first reflector is bonded to the surface of the base away from the support platform by the adhesive.

[0015] Optionally, the photomask alignment assembly further includes a second reflector assembly disposed on the support platform. Light from the photomask is modulated by a lens assembly in a second or third through-hole and then incident on the second reflector assembly, and after being reflected by the second reflector assembly, it is emitted to the image receiver.

[0016] Optionally, the photomask alignment assembly also includes a phase adjustment assembly disposed on the support stage. Light from the photomask is modulated by the lens assembly in the second or third through hole and then incident on the phase adjustment assembly. After phase adjustment by the phase adjustment assembly, the light is emitted to the image receiver.

[0017] Optionally, the photomask alignment device includes two photomask alignment components symmetrically arranged on the support platform.

[0018] The beneficial effects of this application include:

[0019] This application provides a photomask alignment device, including a support stage, a photomask alignment assembly, and an adjusting rod. The photomask alignment assembly includes a fixed lens mount, a movable lens mount, and an image receiver mounted on the support stage. The image receiver receives light from the photomask. The fixed lens mount and the image receiver are located in the optical path formed by the light. A first through-hole is formed on the fixed lens mount, and a second and a third through-hole are formed on the movable lens mount. The adjusting rod is detachably inserted into the first and second through-holes or the first and third through-holes, allowing the second and third through-holes to be alternatively located in the optical path. When the adjusting rod is detached, lens assemblies for modulating light are installed in the first, second, and third through-holes. Due to the detachable design of the adjusting rod, the operation process is simplified, and rapid switching between different optical paths is possible, making the entire photomask alignment process more efficient. Simultaneously, mounting two sets of lens assemblies on the same movable lens mount ensures high precision in light modulation, avoiding errors that may occur during platform displacement, thereby significantly improving the performance and stability of the lithography system. Attached Figure Description

[0020] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 This is a schematic diagram of the structure of a photomask alignment device provided in an embodiment of this application;

[0022] Figure 2 An optical path diagram of light emitted from an alignment mark in a photomask alignment device, provided as an embodiment of this application;

[0023] Figure 3 This is a schematic diagram of the structure of an adjusting rod provided in an embodiment of this application;

[0024] Figure 4 A schematic diagram of a movable eyeglass frame with a lens assembly installed, provided for an embodiment of this application;

[0025] Figure 5 This is a schematic diagram of the structure of a first reflector assembly provided in an embodiment of this application;

[0026] Figure 6This is a schematic diagram of the structure of a base provided in an embodiment of this application;

[0027] Figure 7 This is a schematic diagram of the assembled structure of a phase adjustment component and an image receiver, provided in an embodiment of this application.

[0028] Icons: 1-Support platform; 2-Photomask alignment assembly; 21-Fixed frame; 22-Moving frame; 221-Frame body; 222-First mounting ring; 223-Second mounting ring; 224-Low magnification lens assembly; 225-High magnification lens assembly; 23-Image receiver; 231-First metal plate; 232-First adjusting screw; 233-Second metal plate; 234-Second adjusting screw; 24-Driver; 25-First reflecting mirror assembly; 251-Base; 251a-Adhesive groove; 252-First reflecting mirror; 26-Second reflecting mirror assembly; 27-Phase adjustment assembly; 271-Housing; 272-First flat lens; 273-Second flat lens; 3-Adjusting rod; a-Alignment mark. Detailed Implementation

[0029] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0030] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. It should be noted that, unless otherwise specified, the various features in the embodiments of this application can be combined with each other, and the combined embodiments are still within the protection scope of this application.

[0031] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0032] In the description of this application, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product of this application is in use. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on this application. In addition, the terms "first," "second," and "third," etc., are only used to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0033] Furthermore, terms such as "horizontal" and "vertical" do not imply that components must be absolutely horizontal or suspended, but rather that they can be slightly tilted. For example, "horizontal" simply means that its direction is more horizontal than "vertical," and does not mean that the structure must be completely horizontal, but can be slightly tilted.

[0034] In the description of this application, it should also be noted that, unless otherwise expressly specified and limited, the terms "set up," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0035] This application provides a photomask alignment device, such as... Figures 1 to 3 As shown, the device comprises key components such as a support platform 1, a photomask alignment assembly 2, and an adjustment rod 3. The support platform 1 is fixed to the mask stage, providing a stable support base for the entire photomask alignment device and ensuring that the stability of each component's function is not affected by external factors during operation. The photomask alignment assembly 2, through a fixed lens mount 21, a movable lens mount 22, and an image receiver 23 mounted on the support platform 1, achieves precise alignment of the photomask pattern. The main function of the image receiver 23 is to receive light from the photomask. The fixed lens mount 21 and the image receiver 23 are located together in the optical path, ensuring that the light from the alignment mark a on the photomask is accurately transmitted and reaches the image receiver 23. In practical applications, the alignment accuracy between the photomask and the wafer is crucial for ensuring the quality of semiconductor manufacturing; therefore, the design of this device effectively ensures high precision and stability during the alignment process.

[0036] In the specific structure of the photomask alignment assembly 2, the fixed frame 21 is provided with a first through hole, and the movable frame 22 is provided with a second through hole and a third through hole, respectively. The axes of the first, second, and third through holes are parallel. The function of the adjusting rod 3 is to be detachably inserted between the first and second through holes, or between the first and third through holes, to realize the replacement of the second and third through holes, so that they can alternately be located in the optical path. This design fully considers the adjustability and flexibility of the optical path, and can quickly adjust the optical path as needed in different operating modes, thereby meeting the requirements of coarse and fine alignment.

[0037] In the specific operation, firstly, the adjusting rod 3 is inserted along the axial direction of the first through hole into the first and second through holes, so that the second through hole is in the optical path. At this time, the position of the moving lens mount 22 is recorded. This step ensures the initial alignment between the photomask and the wafer. Next, the adjusting rod 3 is inserted along the axial direction of the first through hole into the third through hole, so that the third through hole enters the optical path, and the position of the moving lens mount 22 at this time is recorded. By recording two positions, it is ensured that the position of the moving lens mount 22 can be accurately restored in subsequent operations, thereby improving alignment accuracy. After achieving initial alignment, the adjusting rod 3 is removed, and lens assemblies are installed in the first, second, and third through holes. The function of these lens assemblies is to modulate the light, ensuring the accurate transmission and adjustment of the light. Whenever it is necessary to switch alignment modes, the control system makes precise adjustments based on the previously recorded positions, ensuring that the alignment accuracy between the photomask and the wafer is not affected, thereby achieving accurate pattern transfer.

[0038] In summary, this technical solution, through its ingenious design and precise adjustment mechanism, effectively improves the accuracy and reliability of the photomask alignment process. The detachable design of the adjustment rod 3 not only simplifies the operation process but also allows for rapid switching between different optical paths, making the entire photomask alignment process more efficient. Simultaneously, mounting the two lens assemblies on the same movable lens mount 22 ensures high-precision light modulation, avoiding errors that may occur during platform displacement, thereby significantly improving the performance and stability of the lithography system. Ultimately, this technical solution can significantly improve alignment accuracy in semiconductor manufacturing, reduce errors in the production process, and thus improve chip yield and production efficiency, demonstrating significant application value and broad market prospects.

[0039] Optionally, the adjusting rod 3 is a telescopic rod, capable of being adjusted between different positions to achieve precise optical path switching during the photomask alignment process. Specifically, the adjusting rod 3 is placed along the axial direction of the first through hole between the first through hole and the second or third through hole. Through its telescopic design, the adjusting rod 3 can flexibly adjust its length, allowing its two ends to pass through the first and second through holes respectively, or through the first and third through holes, thereby ensuring alignment between the through holes and precise adjustment of the optical path. After initial alignment is achieved, the adjusting rod 3 is retracted from the through hole, thus providing space for the installation of the lens assembly.

[0040] like Figure 3 As shown, the adjusting rod 3 is cylindrical, with both ends coaxial. One end is designed to match the size of the first through-hole, and the other end is designed to match the size of the second or third through-hole, ensuring a perfect fit between the adjusting rod 3 and the through-hole. To ensure the accuracy of the optical path, the size of the first through-hole is fixed, while the size and position of the second and third through-holes are adjustable. The size of one end of the adjusting rod 3 corresponds exactly to the size of the first through-hole. By flexibly adjusting the size and position of the second or third through-hole, it is ensured that the second or third through-hole can match the other end of the adjusting rod 3. In this way, when both ends of the adjusting rod 3 are inserted into the first and second or third through-holes respectively, the alignment between the through-hole and the adjusting rod 3 is ensured, thus maintaining the accuracy of the optical path. After adjustment, the size and position of the second and third through-holes remain unchanged, and a lens assembly is installed within them, allowing the lens assembly to be accurately positioned in the optical path, thereby completing the modulation and precise transmission of light.

[0041] Optionally, the adjusting rod 3 can be detachably inserted into the first through hole and the second through hole so that the central axis of the first through hole coincides with the central axis of the second through hole; or, the adjusting rod 3 can be detachably inserted into the first through hole and the third through hole so that the central axis of the first through hole coincides with the central axis of the third through hole. This design can ensure that the optical axis of the lens assembly in different through holes can be accurately aligned, further improving the stability and consistency of the light transmission path.

[0042] Specifically, when the adjusting rod 3 passes between the first and second through holes, the optical axis of the lens assembly in the first through hole and the optical axis of the lens assembly in the second through hole are strictly aligned, ensuring that the light transmission path is without any deviation during the photomask alignment process. Simultaneously, when the adjusting rod 3 passes between the first and third through holes, the optical axis of the lens assembly in the first and third through holes also precisely aligns, further ensuring the consistency of the optical path. This precise optical axis alignment technology effectively avoids errors during light transmission, thereby improving the accuracy of photomask alignment and ensuring the accuracy of the final pattern transfer.

[0043] Optionally, the adjusting rod 3 can be removed after the initial alignment of the optical path is achieved, in order to provide space for the installation of different lens components. For example... Figure 4 As shown, when the adjusting rod 3 is removed, a low-magnification lens assembly 224 (typically 5X-10X) will be installed in the second through hole, and a high-magnification lens assembly 225 (typically 50X-100X) will be installed in the third through hole. This design allows for flexible switching between low-magnification and high-magnification lenses according to different alignment requirements, thereby adapting to different photomask alignment accuracy requirements.

[0044] The low-magnification lens assembly 224 is primarily used in the coarse alignment stage. Its function is to quickly scan the alignment of the photomask and wafer with a wide field of view, helping to locate the approximate position of the pattern. The low-magnification lens is mounted within the second through-hole, allowing light to pass through and form a relatively wide image, ensuring that the pattern can be quickly and roughly aligned during coarse alignment. Meanwhile, the high-magnification lens assembly 225 is mounted within the third through-hole and is mainly used in the fine alignment stage. The high-magnification lens has higher magnification and higher resolution, providing a more precise image during fine alignment, ensuring that the photomask pattern can be accurately transferred onto the wafer. Throughout the process, switching between lens assemblies ensures precise adjustment of the optical path, effectively improving the alignment accuracy between the photomask and wafer. This design allows the device to use lenses of different magnifications at different operational stages, thereby improving the efficiency and flexibility of the alignment process while maintaining alignment accuracy.

[0045] Optionally, such as Figure 4 As shown, the movable lens frame 22 includes a frame body 221 and a plurality of first mounting rings 222 fixed to the frame body 221. The inner ring of the first mounting ring 222 serves as a second through hole, and the central axes of the plurality of second through holes are collinear. Alternatively, the movable lens frame 22 includes a plurality of second mounting rings 223 fixed to the frame body 221, and the inner ring of the second mounting ring 223 serves as a third through hole, and the central axes of the plurality of third through holes are collinear. This precise structural design further ensures that the lens assembly can always maintain accurate alignment under different optical path switching modes.

[0046] Specifically, the position and size of the first mounting ring 222 and the second mounting ring 223 are adjustable. This adjustable design makes the optical path adjustment more flexible, allowing for precise adjustment of the position and size of the through-holes as needed to adapt to the installation requirements of different lens assemblies. Specifically, when the adjusting rod 3 passes through the first through-hole, the second through-hole, or the third through-hole along the axial direction of the first through-hole, the adjusting rod 3 ensures that the first through-hole is collinear with the central axis of the multiple second through-holes or the central axis of the first through-hole and the multiple third through-holes, thereby achieving precise alignment of the optical path. In this way, optical deviations caused by alignment errors can be effectively reduced.

[0047] Once the adjusting rod 3 is in place, locking the first mounting ring 222 or the second mounting ring 223 ensures that the size of the second or third through hole will not change after adjustment. Thus, once alignment is complete, the size of the second or third through hole is fixed, ensuring precise installation of the lens assembly within these through holes. At this point, the adjusting rod 3 is removed, and the lens assembly is installed in the predetermined position. After installation, the optical axis of the lens assembly in the first through hole can precisely coincide with the optical axis of the lens assembly in the second or third through hole, thereby ensuring the consistency and stability of the light transmission path, effectively improving the installation accuracy during photomask alignment, and thus enhancing the performance and stability of the lithography machine.

[0048] Optionally, such as Figure 1 As shown, the photomask alignment assembly 2 also includes a slide rail disposed on the support platform 1 and a slider (such as a slider) slidably disposed on the slide rail. The sliding direction of the slider is perpendicular to the optical path (the optical axis of the lens assembly in the fixed frame 21). The movable frame 22 is slidably connected to the slide rail via the slider to drive the second through hole and the third through hole to be replaced in the optical path, thereby realizing the rapid switching of different lens assemblies and further improving the flexibility and efficiency of the photomask alignment system.

[0049] During the operation of this system, the control system and the driver 24 are interconnected, and the output of the driver 24 is connected to the slider drive. When the system starts working, a coarse alignment operation is performed first. According to a preset program, the control system drives the slider to slide along the slide rail via the driver 24 (usually an electric cylinder). The movement of the slider causes the moving lens holder 22 to slide synchronously, thereby aligning the low-magnification lens assembly 224 in the second through-hole with the lens assembly in the first through-hole, completing the coarse alignment step. At this stage, the approximate positional information of the photomask and the wafer is quickly acquired through the low-magnification lens, laying the foundation for subsequent precise alignment.

[0050] After coarse alignment, the system, according to a preset program, drives the slider along the slide rail via the driver 24 to bring the moving lens holder 22 to align the high-magnification lens assembly 225 in the third through-hole with the lens assembly in the first through-hole, thus initiating the fine alignment operation. During the fine alignment stage, the high-magnification lens assembly 225 provides a higher resolution image, ensuring that the pattern between the photomask and the wafer can be aligned with micron-level precision, thereby ensuring the accurate transfer of the final pattern.

[0051] Optionally, such as Figure 1As shown, the photomask alignment assembly 2 also includes a first reflector assembly 25 disposed on the support platform 1. This assembly is used to receive light from the photomask and reflect it to the lens assembly within the first through-hole. The photomask is typically located below the support platform 1, and the emitted light propagates vertically. In this configuration, the propagation direction of the light is changed after being reflected by the first reflector assembly 25, altering its original propagation path from vertical to horizontal.

[0052] This optical path adjustment method enables a more rational arrangement of subsequent optical components. Specifically, after light is reflected by the first reflecting mirror assembly 25, its propagation direction is horizontal. This allows the fixed frame 21, the movable frame 22, and the image receiver 23 to be arranged horizontally on the support platform 1, thus achieving a rational layout and enabling the various optical components to work together efficiently.

[0053] Overall, this design flexibly adjusts the light propagation path through the first reflector assembly 25, thereby avoiding complex optical adjustments and unnecessary optical components, and improving the efficiency and accuracy of the photomask alignment process. Furthermore, the introduction of the first reflector assembly 25 simplifies the design of the optical path system, while also reducing potential losses and errors during light propagation, ensuring that light is transmitted to the lens assembly in the optimal manner, thus guaranteeing high-precision alignment between the photomask and the wafer.

[0054] Optionally, such as Figure 5 and Figure 6 As shown, the first reflector assembly 25 consists of a base 251 and a first reflector 252. The base 251 is mounted on a support platform 1, and the first reflector 252 is mounted on the side of the base 251 facing away from the support platform 1. The first reflector 252 can typically be a prism or other optical element capable of achieving the same technical effect. To ensure precise installation of the first reflector 252, an adhesive groove 251a is provided on the side of the base 251 facing away from the support platform 1, and the adhesive groove 251a is filled with adhesive (such as glue). The first reflector 252 is adhered to the surface of the base 251 facing away from the support platform 1 by the adhesive, thereby achieving fixation.

[0055] The design of the adhesive groove 251a ensures that the adhesive is evenly distributed during the curing process. This not only avoids installation accuracy issues caused by uneven adhesive thickness but also guarantees a more stable connection between the first reflector 252 and the base 251. The precise design of the adhesive groove 251a allows for uniform adhesive application, providing balanced bonding force and ensuring that the first reflector 252 is firmly fixed to the base 251. More importantly, during the adhesive curing process, the surface on which the first reflector 252 is actually fixed is the more precise mounting surface of the base 251. This significantly reduces the impact of adhesive thickness on the installation accuracy of the first reflector 252, thereby effectively improving installation accuracy.

[0056] This design ensures that the first reflector 252 maintains a precise angle and position after installation, avoiding instability in the light propagation path or optical errors caused by reflector position deviations. This high-precision installation method ensures a more stable and accurate light refraction path in the optical system, helping to improve the alignment accuracy between the photomask and the wafer. This innovative installation method not only improves the stability of the optical system but also significantly enhances the accuracy and production efficiency in the photolithography process, thereby optimizing the yield and quality of the entire semiconductor manufacturing process.

[0057] Optionally, such as Figure 1 As shown, the photomask alignment assembly 2 also includes a second reflector assembly 26 disposed on the support platform 1. The function of the second reflector assembly 26 is to further adjust the propagation direction of the light. The second reflector assembly 26 can typically be a prism or other optical element capable of achieving the same technical effect. The light from the photomask is first reflected by the first reflector assembly 25, then modulated by the lens assembly in the first through-hole, and further modulated by the lens assembly in the second or third through-hole before propagating horizontally along the optical axis of the lens assembly within the fixed frame 21. At this time, the second reflector assembly 26 receives the modulated light and reflects it, changing its propagation direction so that it propagates horizontally along a direction perpendicular to the optical axis of the lens assembly within the fixed frame 21.

[0058] This design allows for precise control of the light path in the optical system, ensuring stable transmission of light to the image receiver 23. In this way, after reflection by the second reflector assembly 26, the light propagates in a new direction and ultimately exits to the image receiver 23, ensuring accurate reception and processing of optical data during alignment. To achieve this precise light path, the first reflector assembly 25, the fixed frame 21, the movable frame 22, and the second reflector assembly 26 are precisely arranged sequentially along the axial direction of the first through-hole. The second reflector assembly 26 and the image receiver 23 are arranged sequentially along an axial direction perpendicular to the first through-hole. This rational arrangement allows the components on the support platform 1 to be arranged orderly in two directions, thereby optimizing space utilization, reducing the size of the support platform 1 in one direction, and improving the overall layout efficiency of the system.

[0059] Optionally, such as Figure 1 As shown, the photomask alignment assembly 2 also includes a phase adjustment assembly 27 disposed on the support stage 1. The phase adjustment assembly 27 is located between the second reflector assembly 26 and the image receiver 23, and is responsible for adjusting the phase of the light modulated by the lens assembly passing through the second or third through-hole. Specifically, the light from the photomask, after being modulated by the lens assembly in the second or third through-hole, first enters the phase adjustment assembly 27, then is adjusted by the phase adjustment assembly 27, and finally exits to the image receiver 23.

[0060] like Figure 7 As shown, the phase adjustment assembly 27 consists of two flat lenses placed vertically on the housing 271, namely a first flat lens 272 and a second flat lens 273. The optical axes of the first flat lens 272, the second flat lens 273, and the lens assembly within the fixed frame 21 are all perpendicular to each other. This vertical arrangement of optical axes ensures that light can be flexibly adjusted in both directions. When the first flat lens 272 and the second flat lens 273 rotate along the direction perpendicular to the optical axis of the lens assembly within the fixed frame 21, the incident angle of the light can be adjusted, thereby achieving precise adjustment of the light phase. Specifically, the rotation axes of the first flat lens 272 and the second flat lens 273 are perpendicular to each other. This design allows the incident angle of the light to be effectively changed by rotating and adjusting the angle of the two flat lenses, thereby adjusting the phase of the light. After phase adjustment, the imaging position of the image receiver 23 is ultimately changed, allowing for fine-tuning of the image position in the horizontal or vertical direction to ensure imaging accuracy.

[0061] This phase adjustment technique allows for precise adjustment of the light phase without altering other components of the optical system, thereby optimizing the image's imaging position. Adjusting the light phase ensures high-precision imaging on the image receiver 23, further improving the alignment accuracy between the photomask and the wafer. This design provides extremely flexible and precise optical adjustment capabilities, significantly improving the imaging quality and lithography effect of the optical system during photolithography, especially in high-precision semiconductor manufacturing processes.

[0062] Optionally, such as Figure 7 As shown, the image receiver 23 employs a high-resolution industrial camera to ensure imaging quality and precision during the photolithography process. To further improve the system's accuracy and adaptability, the industrial camera is mounted on a first metal plate 231 that is adjustable at a small angle, and the angle is adjusted by turning the first adjusting screw 232, thereby enabling precise control of the camera's viewing angle and optical axis direction. This adjustable design allows the camera to be fine-tuned according to actual needs to adapt to different conditions and operating requirements within the optical system.

[0063] Furthermore, the first metal plate 231 is mounted on the second metal plate 233, which can be adjusted back and forth along its optical axis. By adjusting the position of the second metal plate 233, the relative position between the camera and the optical system can be precisely adjusted, compensating for errors that may occur during machining and assembly. The back-and-forth position of the second metal plate 233 can be adjusted by turning the second adjusting screw 234. The user can use their fingers or an Allen wrench to adjust these screws, allowing the second metal plate 233 to move back and forth to ensure precise alignment between the camera's position and the light transmission path.

[0064] By adjusting these two metal plates, the system can precisely compensate for errors caused during the machining and assembly of the optical system, ensuring accurate installation of the image receiver 23 and stability of the optical path. The introduction of this adjustment mechanism makes the entire optical system more adaptable, enabling fine-tuning of the relative positions of various components during manufacturing and assembly, thereby ensuring the accuracy of light transmission and high-quality imaging of the final image.

[0065] Optionally, the support stage 1 has a cutout window area in the middle for photomask alignment and exposure. This window area allows light to pass through and provides a suitable space for photomask alignment and exposure. On the left and right sides of this cutout window area, a photomask alignment component 2 is symmetrically arranged. The function of each photomask alignment component 2 is to align the light emitted from the alignment mark a on the photomask, thereby ensuring precise alignment between the photomask pattern and the wafer pattern.

[0066] The two photomask alignment components 2 operate synchronously, aligning themselves with the light emitted from two alignment marks 'a' on the photomask to ensure synchronization during the alignment process. Each photomask alignment component 2 undergoes two stages during alignment: coarse alignment and fine alignment. First, through coarse alignment, the photomask alignment component 2 roughly positions the photomask relative to the wafer, completing the initial alignment. Then, the fine alignment stage meticulously corrects any deviations after coarse alignment, ensuring that the pattern on the photomask and the pattern on the wafer are highly consistent at the micrometer level. These two stages significantly improve alignment accuracy, ensuring accurate pattern transfer during photolithography. Most importantly, the synchronous operation design of the two photomask alignment components 2 allows them to operate simultaneously, ensuring simultaneous alignment of multiple marks on the photomask, improving alignment efficiency and reducing operational errors. This synchronous operation not only increases the speed of the photomask alignment process but also further improves alignment accuracy and the stability of the final pattern by reducing asynchrony errors during operation.

[0067] In summary, by using the symmetrically arranged photomask alignment components 2, the support stage 1 can not only achieve a highly efficient photomask alignment process, but also complete the alignment of multiple marks in a short time, ensuring high precision and efficiency in the photolithography process. The synchronous action design greatly improves the operational performance and accuracy of the photomask alignment device, providing crucial technical support for photolithography operations in semiconductor manufacturing, and driving technological advancements and increased production capacity in this field.

[0068] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A photomask alignment device, characterized in that, The system includes a support platform (1), a photomask alignment assembly (2), and an adjustment rod (3). The photomask alignment assembly (2) includes a fixed frame (21), a movable frame (22), and an image receiver (23) disposed on the support platform (1). The image receiver (23) is used to receive light from the photomask. The fixed frame (21) and the image receiver (23) are located in the optical path formed by the light. A first through hole is provided on the fixed frame (21), and a second through hole and a third through hole are provided on the movable frame (22); The adjusting rod (3) is detachably inserted into the first through hole and the second through hole or the first through hole and the third through hole so that the second through hole and the third through hole are interchangeably located in the optical path. When the adjusting rod (3) is detached, a lens assembly for modulating the light is installed in the first through hole, the second through hole and the third through hole.

2. The photomask alignment device according to claim 1, characterized in that, The adjusting rod (3) is detachably inserted into the first through hole and the second through hole so that the central axis of the first through hole coincides with the central axis of the second through hole; or, the adjusting rod (3) is detachably inserted into the first through hole and the third through hole so that the central axis of the first through hole coincides with the central axis of the third through hole.

3. The photomask alignment device according to claim 1 or 2, characterized in that, The movable eyeglass frame (22) includes a frame body (221) and a plurality of first mounting rings (222) fixed to the frame body (221), wherein the inner ring of the first mounting ring (222) serves as a second through hole, the central axes of the plurality of second through holes are collinear, and / or, the movable eyeglass frame (22) includes a plurality of second mounting rings (223) fixed to the frame body (221), wherein the inner ring of the second mounting ring (223) serves as a third through hole, and the central axes of the plurality of third through holes are collinear.

4. The photomask alignment device according to claim 1 or 2, characterized in that, When the adjusting rod (3) is removed, a low magnification lens assembly (224) is installed in the second through hole, and a high magnification lens assembly (225) is installed in the third through hole.

5. The photomask alignment device according to claim 1 or 2, characterized in that, The photomask alignment assembly (2) also includes a slide rail disposed on the support platform (1) and a sliding member slidably disposed on the slide rail. The sliding direction of the sliding member is perpendicular to the optical path. The movable lens frame (22) is slidably connected to the slide rail via the sliding member to drive the second through hole and the third through hole to be replaced in the optical path.

6. The photomask alignment device according to claim 1 or 2, characterized in that, The photomask alignment assembly (2) further includes a first reflector assembly (25) disposed on the support platform (1), and light from the photomask is reflected by the first reflector assembly (25) to the lens assembly in the first through hole.

7. The photomask alignment device according to claim 6, characterized in that, The first reflector assembly (25) includes a base (251) and a first reflector (252). The base (251) is mounted on the support platform (1). An adhesive groove (251a) is provided on the side of the base (251) away from the support platform (1). Adhesive is filled in the adhesive groove (251a). The first reflector (252) is bonded to the surface of the base (251) away from the support platform (1) by the adhesive.

8. The photomask alignment device according to claim 1 or 2, characterized in that, The photomask alignment assembly (2) further includes a second reflector assembly (26) disposed on the support platform (1). Light from the photomask is modulated by a lens assembly in the second or third through hole and then incident on the second reflector assembly (26), and after being reflected by the second reflector assembly (26), it is emitted to the image receiver (23).

9. The photomask alignment device according to claim 1 or 2, characterized in that, The photomask alignment assembly (2) further includes a phase adjustment assembly (27) disposed on the support platform (1). Light from the photomask is modulated by the lens assembly in the second or third through hole and then incident on the phase adjustment assembly (27). After phase adjustment by the phase adjustment assembly (27), the light is emitted to the image receiver (23).

10. The photomask alignment device according to claim 1 or 2, characterized in that, The photomask alignment device includes two photomask alignment components (2) symmetrically arranged on the support platform (1).

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