Liquid supply system

Abstract

The utility model relates to the field of semiconductor processing liquid supply, and provides a liquid supply system, which is used for supplying liquid to processing equipment and comprises a first liquid storage mechanism, a second liquid storage mechanism and a liquid supply mechanism, the second liquid storage mechanism is connected between the first liquid storage mechanism and the processing equipment; the vacuum generator is connected to the second liquid storage mechanism and is used for sucking gas in the second liquid storage mechanism by utilizing negative pressure and sucking the stock solution from the first liquid storage mechanism to the second liquid storage mechanism by utilizing negative pressure; and the gas supply mechanism is connected to the second liquid storage mechanism and is used for filling inert gas into the second liquid storage mechanism and pressing the stock solution into the processing equipment from the second liquid storage mechanism by utilizing gas pressure. According to the scheme, a traditional liquid pump is replaced by the vacuum generator and the air supply mechanism, the overall investment of system arrangement is reduced, meanwhile, an originally-adopted two-stage liquid pump and matched pipelines of the two-stage liquid pump are eliminated, and occupied installation space is reduced.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of semiconductor processing liquid supply, in particular to a liquid supply system. BACKGROUND

[0002] In the field of chemical liquid supply, the delivery of chemical liquid involves process steps such as cleaning, etching and polishing; in the cleaning step, the liquid includes organic solvents and deionized water; in the etching step, the liquid includes acidic etching liquid and alkaline etching liquid; in the polishing step, the liquid includes polishing liquid.

[0003] The existing liquid supply system adopts a two-stage pumping architecture, the stock solution for making liquid is stored in a stock solution tank, and when supplying liquid, a first liquid pump is used to pump the stock solution in the stock solution tank into a buffer tank, and then a second liquid pump is used to pump the stock solution in the buffer tank into the processing equipment to realize the supply of the processing equipment. Although the use of pump pressure can achieve rapid emptying of the stock solution tank and maintain continuous liquid supply, the purchase and maintenance cost of the liquid pump is high in actual application, which is not conducive to reducing the layout cost of the system, in addition, due to the large volume of the stock solution tank and the buffer tank, a lot of installation space has been occupied, and the installation of the liquid pump and its supporting pipeline will further occupy the installation space, resulting in less remaining space, which is not conducive to the equipment update and expansion of the system in the later stage.

[0004] Therefore, how to provide a liquid supply system with low layout cost and high space utilization is a technical problem that technicians in the field need to solve. CONTENT OF THE INVENTION

[0005] The purpose of the present application is to provide a liquid supply system, which uses a vacuum generator to generate negative pressure to suck the stock solution in the first liquid storage mechanism into the second liquid storage mechanism, and then uses the gas pressure of the gas supply mechanism to press the stock solution out of the second liquid storage mechanism to the processing equipment. The cost of the vacuum generator and the gas supply mechanism is lower than that of the liquid pump, saving the system layout cost, and the volume of the vacuum generator and the gas supply mechanism is smaller than that of the liquid pump, which is convenient to connect and is conducive to optimizing the installation space of the system.

[0006] The solution of the present application to solve the problem is:

[0007] A liquid supply system for supplying liquid to a processing equipment, the system comprising:

[0008] a first liquid storage mechanism for storing stock solution;

[0009] a second liquid storage mechanism connected between the first liquid storage mechanism and the processing equipment;

[0010] A vacuum generator is connected to the top of the second liquid storage mechanism to remove gas and bubbles from inside the second liquid storage mechanism using negative pressure, and to draw the original liquid from the first liquid storage mechanism into the second liquid storage mechanism under negative pressure.

[0011] An air supply mechanism, connected to the top of the second liquid storage mechanism, is used to fill the second liquid storage mechanism with inert gas and use air pressure to force the raw liquid from the second liquid storage mechanism into the processing equipment.

[0012] Preferably, the second liquid storage mechanism has a barrel-shaped structure, including a barrel body, a barrel cover disposed on the top of the barrel body, and an air inlet, an air outlet, a liquid inlet and a liquid outlet circumferentially disposed on the top of the barrel body surrounding the barrel cover. The air inlet is connected to the air supply mechanism, the air outlet is connected to the vacuum generator, the liquid inlet is connected to the first liquid storage mechanism, and the liquid outlet is connected to the processing equipment.

[0013] Preferably, the second liquid storage mechanism further includes a first liquid inlet pipe and a second liquid inlet pipe disposed inside the barrel body. The first liquid inlet pipe is connected to the liquid inlet, and the second liquid inlet pipe is connected to the liquid outlet. The liquid outlet of the first liquid inlet pipe is at a first preset distance from the bottom of the barrel body, and the liquid inlet of the second liquid inlet pipe is at a second preset distance from the bottom of the barrel body. The first preset distance is equal to the second preset distance.

[0014] Preferably, the second liquid storage mechanism further includes two connectors spaced apart along the height direction of the barrel on the side wall of the barrel, a liquid level indicator tube connecting the two connectors, and a plurality of liquid level sensors spaced apart along the height direction of the barrel on the liquid level indicator tube, wherein the connectors are in communication with the inside of the barrel.

[0015] Preferably, the second liquid storage mechanism further includes a lifting member, which is located near the lid and at the top of the container.

[0016] Preferably, the second liquid storage mechanism further includes a support base, which surrounds a semi-circular protrusion structure at the bottom of the barrel to support the barrel.

[0017] Preferably, the system further includes a fixing mechanism, which includes a fixing plate, a slide rail disposed on the fixing plate, and a fixing structure slidably connected to the slide rail, the fixing structure being used to support the second liquid storage mechanism.

[0018] Preferably, the fixing structure includes a support base and a cover plate disposed on the top of the support base, the cover plate including a limiting opening, the second liquid storage mechanism passing through the limiting opening and abutting against the bottom of the support base.

[0019] Preferably, the fixing mechanism further includes a traction member disposed on the top of the cover plate for pulling the fixing structure to slide along the slide rail.

[0020] According to the specific embodiments provided in this application, the following technical effects are disclosed:

[0021] This application provides a liquid supply system for supplying liquid to processing equipment. The system includes: a first liquid storage mechanism for storing raw liquid; a second liquid storage mechanism connected between the first liquid storage mechanism and the processing equipment; a vacuum generator connected to the second liquid storage mechanism for using negative pressure to remove gas from inside the second liquid storage mechanism and to draw raw liquid from the first liquid storage mechanism into the second liquid storage mechanism under negative pressure; and a gas supply mechanism connected to the second liquid storage mechanism for filling the second liquid storage mechanism with inert gas and using gas pressure to force the raw liquid from the second liquid storage mechanism into the processing equipment. This solution replaces the liquid pump used in traditional liquid supply architectures with a vacuum generator and a gas supply mechanism, reducing the overall investment in system layout. It also eliminates the previously used two-stage liquid pump and its associated piping, reducing the space occupied and reserving more space for future production line upgrades and equipment expansion. Attached Figure Description

[0022] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0023] Figure 1 This is a schematic diagram of the liquid supply system provided in an embodiment of this application;

[0024] Figure 2 This is an overall schematic diagram of the second liquid storage mechanism provided in the embodiments of this application;

[0025] Figure 3 This is a rear view schematic diagram of the second liquid storage mechanism provided in the embodiments of this application;

[0026] Figure 4 This is a cross-sectional schematic diagram of the second liquid storage mechanism provided in the embodiments of this application;

[0027] Figure 5 This is a schematic diagram of the fixing mechanism provided in the embodiments of this application;

[0028] Figure 6 This is an overall schematic diagram of the second liquid storage mechanism installed on the fixed mechanism according to an embodiment of this application;

[0029] Figure 7 This is a rear view of the second liquid storage mechanism provided in the embodiments of this application, installed on the fixed mechanism.

[0030] Figure label:

[0031] 10. First liquid storage mechanism; 20. Second liquid storage mechanism; 30. Vacuum generator; 40. Gas supply mechanism; 50. Fixing mechanism; 100. Three-way liquid valve; 105. Electrostatic capacitance sensor; 110. Check valve; 115. Pneumatic valve; 120. Three-way solenoid valve; 200. Tank body; 205. Tank lid; 210. Air inlet; 215. Air outlet; 220. Liquid inlet; 225. Liquid outlet; 230 1. Liquid inlet pipe; 235. Vent pipe; 240. Connector; 245. Liquid level indicator pipe; 250. Liquid level sensor; 255. Lifting component; 260. Support base; 265. Elbow connector; 270. Hole wire; 500. Fixing plate; 505. Slide rail; 510. Fixing structure; 2000. Protruding structure; 5100. Bearing base; 5110. Cover plate; 5120. Limiting opening; 5130. Traction component. Detailed Implementation

[0032] To make the objectives, technical solutions, and advantages of this application clearer, the technical solutions in the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0033] As described in the background section, existing liquid supply systems employ a two-stage pumping architecture. The raw material for preparing the pharmaceutical solution is stored in a raw material tank. During supply, a first pump first pumps the raw material from the tank into a buffer tank, and then a second pump pumps the raw material from the buffer tank into the processing equipment to supply the equipment. Although pump pressure can quickly empty the raw material tank and maintain a continuous supply, the purchase and maintenance costs of pumps are high in practical applications, which is not conducive to reducing system layout costs. In addition, the large size of the raw material tank and buffer tank already occupies a significant amount of installation space. Adding pumps and their associated piping further reduces the available space, hindering future system upgrades and expansions.

[0034] Based on this, this application provides a liquid supply system, which aims to solve the technical problems of high cost and excessive installation space occupied by liquid pumps in the prior art.

[0035] refer to Figure 1 The liquid supply system generally includes a first liquid storage unit 10 for storing the raw liquid, which is a chemical medium used in semiconductor processes, and its function varies depending on the specific process step. A second liquid storage unit 20 is connected to the first liquid storage unit 10 and the processing equipment via pipelines. The volume of the second liquid storage unit 20 is much larger than that of the first liquid storage unit 10. One second liquid storage unit 20 is usually connected to multiple first liquid storage units 10 to extract the raw liquid from multiple first liquid storage units 10, buffer and precipitate it, and then store it for use in subsequent processes by the processing equipment. A vacuum generator 30 replaces the original first liquid pump and is connected to the second liquid storage unit 20 to use negative pressure to draw the raw liquid from the first liquid storage unit 10 into the second liquid storage unit 20. A gas supply unit 40 replaces the original second liquid pump and is connected to the second liquid storage unit 20 to use air pressure to force the raw liquid in the second liquid storage unit 20 into the processing equipment. The vacuum generator 30 and the gas supply mechanism 40 of this application have two different gas power structures: one is a suction unit that creates negative pressure, and the other is a blowing unit that creates gas thrust. The liquid delivery effect is achieved through these two different gas power structures. At the same time, the use of two gas power structures can avoid confusion among operators during use, which could lead to problems with the liquid supply.

[0036] The technical solution of this application will be analyzed in detail below with reference to the accompanying drawings. (Reference) Figure 1 The liquid supply system is used to supply liquid to the processing equipment. The system includes: a first liquid storage mechanism 10 for storing raw liquid; a second liquid storage mechanism 20 connected between the first liquid storage mechanism 10 and the processing equipment; a vacuum generator 30 connected to the second liquid storage mechanism 20 for using negative pressure to remove gas and bubbles inside the second liquid storage mechanism 20 and to draw raw liquid from the first liquid storage mechanism 10 into the second liquid storage mechanism 20 under negative pressure; and a gas supply mechanism 40 connected to the second liquid storage mechanism 20 for filling the second liquid storage mechanism 20 with inert gas and using gas pressure to force the raw liquid from the second liquid storage mechanism 20 into the processing equipment.

[0037] The first liquid storage unit 10 can be a liquid tank or liquid container, and the second liquid storage unit 20 can also be a liquid tank or liquid container. The second liquid storage unit 20 is connected to multiple first liquid storage units 10 through pipes. In the initial state, the pressure between the second liquid storage unit 20 and the first liquid storage unit 10 is balanced. In a complete liquid supply process, firstly, the first airflow passing through the vacuum generator 30 body entrains impurities and air bubbles in the second liquid storage unit 20 to keep it clean. During this process, the connecting pipe between the first liquid storage unit 10 and the second liquid storage unit 20 is temporarily closed to prevent some of the original liquid in the first liquid storage unit 10 from flowing into the unclean second liquid storage unit 20. Then, the second airflow passing through the vacuum generator 30 body continues to pump pressure, increasing the negative pressure in the second liquid storage unit 20, that is, the internal pressure of the second liquid storage unit 20 is less than the internal pressure of the first liquid storage unit 10, so that the original liquid in the first liquid storage unit 10 is subjected to pressure difference. The liquid flows into the second liquid storage unit 20, where the flow rate of the second airflow is greater than that of the first airflow. After the raw liquid has been transferred, the vacuum generator 30 is disconnected, allowing the raw liquid to buffer and settle in the second liquid storage unit 20 for a preset time. Finally, the gas supply unit 40 is activated to fill the second liquid storage unit 20 with an inert gas, such as nitrogen. The pressure of the nitrogen is used to force the raw liquid from the second liquid storage unit 20 into the processing equipment until the raw liquid in the second liquid storage unit 20 is emptied, and the liquid supply process ends. During this process, the connecting pipe between the first liquid storage unit 10 and the second liquid storage unit 20 is also temporarily closed to prevent the raw liquid from flowing back into the first liquid storage unit 10 from the second liquid storage unit 20.

[0038] It should be noted that the first liquid storage mechanism 10 and the second liquid storage mechanism 20 are connected to the processing equipment in sequence. The processing equipment can be connected to the second liquid storage mechanism 20 through a valve. The valve is closed during the cleaning and liquid extraction operations of the second liquid storage mechanism 20 to prevent the raw liquid from being directly introduced into the processing equipment due to pressure imbalance. The valve is only opened when the gas supply mechanism 40 is started so that a liquid passage is formed between the processing equipment and the second liquid storage mechanism 20.

[0039] In an alternative embodiment, the compressed airflow of the vacuum generator 30 can be supplied by the air supply mechanism 40 or by an air compressor.

[0040] In an alternative embodiment, the vacuum generator 30 and the gas supply mechanism 40 are integrated on top of the second liquid storage mechanism 20 to form a compact modular unit.

[0041] In an alternative embodiment, the gas supply mechanism 40 may employ a small variable pressure nitrogen device.

[0042] In summary, the liquid supply system provided in this application utilizes the synergistic effect of vacuum negative pressure and pneumatic drive to replace the original liquid pump design, solving the problems of high cost and large space occupation in the prior art. Replacing the high-value liquid pump with a vacuum generator and gas supply mechanism significantly reduces the overall system investment. Furthermore, the vacuum generator, being a component without moving mechanical parts, has a lower failure rate compared to the liquid pump, reducing equipment maintenance costs. In addition, the vacuum generator and gas supply mechanism are small in size and can be integrated into the top of the second liquid storage mechanism, eliminating the need for the original two-stage liquid pump and its associated piping, reducing installation space occupation, and reserving more space for future production line upgrades and equipment expansion.

[0043] Preferably, refer to Figures 1 to 4 as well as Figure 6 and Figure 7 The second liquid storage mechanism 20 has a barrel-shaped structure, including a barrel body 200, a barrel cover 205 disposed on the top of the barrel body 200, and an air inlet 210, an air outlet 215, a liquid inlet 220 and a liquid outlet 225 circumferentially disposed on the top of the barrel body 200 surrounding the barrel cover 205. The air inlet 210 is connected to the air supply mechanism 40, the air outlet 215 is connected to the vacuum generator 30, the liquid inlet 225 is connected to the first liquid storage mechanism 10, and the liquid outlet 225 is connected to the processing equipment.

[0044] In a specific embodiment, such as Figure 1 and Figure 2As shown, both the first liquid storage mechanism 10 and the second liquid storage mechanism 20 are medicine tanks, and there are two first liquid storage mechanisms 10. Each first liquid storage mechanism 10 is connected to the inlet 220 of the second liquid storage mechanism 20 through a three-way medicine valve 100. A capacitive sensor 105 is also provided between the first liquid storage mechanism 10 and the three-way medicine valve 100 to detect the flow rate of the raw liquid flowing out of each first liquid storage mechanism 10. A one-way valve 110 is also provided between the three-way medicine valve 100 and the second liquid storage mechanism 20 to prevent the raw liquid in the second liquid storage mechanism 20 from flowing back into the first liquid storage mechanism 10 in the event of a system failure. Each first liquid storage mechanism 10 is provided with a top air passage to maintain airflow inside the first liquid storage mechanism 10 and prevent excessive pressure inside the mechanism. The vacuum generator 30 includes a vacuum suction port, a compressed gas inlet, and a gas-liquid outlet. The vacuum suction port is connected to the outlet 215 of the second liquid storage mechanism 20. The compressed gas inlet is used to introduce compressed gas with a certain flow rate. The gas-liquid outlet is used to allow the compressed gas to pass through and to discharge impurities and bubbles drawn from the second liquid storage mechanism 20. When the pressure difference between the second liquid storage mechanism 20 and the first liquid storage mechanism 10 reaches a preset value, the raw liquid flows from the first liquid storage mechanism 10 to the second liquid storage mechanism 20. The outlet 225 of the second liquid storage mechanism 20 is connected to the processing equipment via a pneumatic valve 115. The pneumatic valve 115 is used to control the connection between the second liquid storage mechanism 20 and the processing equipment, and to control the flow rate of the raw liquid from the second liquid storage mechanism 20 to the processing equipment, to ensure a stable and continuous delivery of the raw liquid. The gas supply mechanism 40 is connected to the inlet 210 of the second liquid storage mechanism 20 via a three-way solenoid valve 120 to regulate the flow rate of the gas supplied by the gas supply mechanism 40.

[0045] In a specific embodiment, such as Figure 2 , Figure 6 and Figure 7 As shown, the second liquid storage mechanism 20 also includes several elbow joints 265. The air inlet 210, air outlet 215, liquid inlet 220 and liquid outlet 225 are all connected to their respective mechanisms or equipment through elbow joints 265 pipes.

[0046] Preferably, refer to Figure 1The second liquid storage mechanism 20 further includes a liquid inlet pipe 230 and a vent pipe 235 disposed inside the barrel body; the liquid inlet pipe 230 includes a first liquid inlet pipe and a second liquid inlet pipe, the first liquid inlet pipe being connected to the liquid inlet 220 and the second liquid inlet pipe being connected to the liquid outlet 225, wherein the liquid outlet end of the first liquid inlet pipe is at a first preset distance from the bottom of the barrel body 200, and the liquid inlet end of the second liquid inlet pipe is at a second preset distance from the bottom of the barrel body 200; the vent pipe 235 includes a first vent pipe and a second vent pipe, the first vent pipe being connected to the air outlet 215 and the second vent pipe being connected to the air inlet 210, wherein the air inlet end of the first vent pipe is at a third preset distance from the bottom of the barrel body 200, and the air outlet end of the second vent pipe is at a fourth preset distance from the bottom of the barrel body 200.

[0047] like Figure 1 As shown, the length of the liquid inlet pipe 230 is much greater than the length of the vent pipe 235. There is a first preset distance between the liquid outlet of the first liquid inlet pipe and the bottom of the tank 200 to ensure that no excessive bubbles are generated when the raw liquid flows into the tank 200. The second preset distance is equal to the first preset distance to ensure that all the raw liquid in the tank can be extracted without leaving any residue. The air inlet of the first vent pipe and the air outlet of the second vent pipe are always located above the liquid surface at the top of the raw liquid to avoid the vent pipe 235 from immersing in the raw liquid and affecting the transmission of the raw liquid. The third preset distance is equal to the fourth preset distance to ensure that impurity gases and bubbles can be absorbed and inert gases can be introduced.

[0048] Preferably, refer to Figure 7 The second liquid storage mechanism 20 also includes two connectors 240 spaced apart along the height direction of the barrel 200 on the side wall of the barrel 200, a liquid level indicator tube 245 connecting the two connectors 240, and a plurality of liquid level sensors 250 spaced apart along the height direction of the barrel 200 on the liquid level indicator tube 245, wherein the connectors 240 are in communication with the inside of the barrel 200.

[0049] In a specific embodiment, such as Figure 4 As shown, the side wall of the second liquid storage mechanism 20 is provided with through-hole wires 270, one of which is located near the top of the barrel 200 and the other is located near the bottom of the barrel 200. Two connectors 240 are respectively installed in the upper and lower through-hole wires 270 and connected by a liquid level indicator tube 245. The remaining amount of original liquid in the second liquid storage mechanism 20 is detected by a liquid level sensor 250 clamped on the liquid level indicator tube 245.

[0050] In a specific embodiment, such as Figure 7As shown, the liquid level sensor 250 includes a first liquid level sensor, a second liquid level sensor, a third liquid level sensor, and a fourth liquid level sensor arranged sequentially from bottom to top along the height direction of the tank body 200. The first liquid level sensor is used to detect whether the remaining amount of the original liquid reaches 20% of the total amount, the second liquid level sensor is used to detect whether the remaining amount of the original liquid reaches 30% of the total amount, the third liquid level sensor is used to detect whether the remaining amount of the original liquid reaches 70% of the total amount, and the fourth liquid level sensor is used to detect whether the remaining amount of the original liquid reaches 90% of the total amount.

[0051] Preferably, refer to Figures 2 to 4 as well as Figure 6 and Figure 7 The second liquid storage mechanism 20 also includes a lifting member 255, which is located near the lid 205 and on the top of the container body 200.

[0052] The lifting components 255 are located on opposite sides of the lid 205, thus providing a leverage point for workers or handling equipment to lift the second liquid storage mechanism 20 and transfer it to a designated location.

[0053] In an optional embodiment, the lifting member 255 is disposed on the side wall of the barrel 200 along the circumference of the barrel 200.

[0054] Preferably, refer to Figures 2 to 4 The second liquid storage mechanism 20 also includes a support base 260, which surrounds the protruding structure 2000 at the bottom of the barrel 200 to support the barrel 200.

[0055] Among them, such as Figure 4 As shown, the side cross-section of the protruding structure 2000 is semi-circular. If the barrel 200 is placed directly on the plane, it cannot maintain stability. A support base 260 is added to make the barrel 200 stably placed on the plane.

[0056] Preferably, refer to Figures 5 to 7 The system also includes a fixing mechanism 50, which includes a fixing plate 500, a slide rail 505 disposed on the fixing plate 500, and a fixing structure 510 slidably connected to the slide rail 505. The fixing structure 510 is used to support the second liquid storage mechanism 20.

[0057] In one specific embodiment, reference Figure 5 There are two fixed plates 500 and two slide rails 505. The two fixed plates 500 are arranged opposite each other, and the slide rails 505 are located on the opposite surfaces of the two fixed plates 500. The fixing structure 510 is located between the fixed plates 500 and is slidably mounted on the slide rails 505. When the second liquid storage mechanism 20 is mounted on the fixing structure 510, it can slide to a specified position in a specified direction.

[0058] It should be noted that the travel of the slide rail 505 is adjustable, and the length of the slide rail 505 is related to the extension length of the fixed plate 500. The staff can design the length according to actual needs.

[0059] Preferably, refer to Figures 5 to 7 The fixed structure 510 includes a support 5100 and a cover plate 5110 disposed on the top of the support 5100. The cover plate 5110 includes a limiting opening 5120. The second liquid storage mechanism 20 passes through the limiting opening 5120 and abuts against the bottom of the support 5100.

[0060] The size of the limiting opening 5120 is matched with the size of the barrel body 200 so that the barrel body 200 can be stably locked in the limiting opening 5120 without tilting, thus preventing the barrel body 200 from shifting.

[0061] In an optional embodiment, the second liquid storage mechanism 20 may have a bottom protrusion 2000 abutting against the bottom of the support 5100, or the support 260 may be installed at the protrusion 2000 and then abutted against the bottom of the support 5100.

[0062] Preferably, the fixing mechanism 50 further includes a traction member 5130 disposed on the top of the cover plate 5110 for traction of the fixing structure 510 to slide along the slide rail 505.

[0063] In one specific embodiment, the fixing mechanism 50 and the second liquid storage mechanism 20 are arranged in the cell space of the system. The fixing plate 500 is fixed to the plane between the cell spaces. The second liquid storage mechanism 20 is placed on the fixing structure 510. When the second liquid storage mechanism 20 does not need to be adjusted, it is placed statically between the cell spaces. When adjustment is needed, the traction member 5130 is pulled, so that the fixing structure 510 moves the second liquid storage mechanism 20 out of the cell space. In this way, the second liquid storage mechanism 20 can be slid or pulled out by using the drawer-like pull-out form. The structure is simple and saves time and effort.

[0064] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0065] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0066] Although embodiments of this application have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting this application. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of this application.

Claims

1. A liquid supply system for supplying liquid to processing equipment, characterized in that, The system includes: The first liquid storage unit (10) is used to store the original liquid; A second liquid storage mechanism (20) is connected between the first liquid storage mechanism (10) and the processing equipment; A vacuum generator (30) is connected to the second liquid storage mechanism (20) for using negative pressure to remove gas from inside the second liquid storage mechanism (20) and to draw the original liquid from the first liquid storage mechanism (10) into the second liquid storage mechanism (20) under negative pressure. A gas supply mechanism (40) is connected to the second liquid storage mechanism (20) and is used to fill the second liquid storage mechanism (20) with inert gas and use gas pressure to press the raw liquid from the second liquid storage mechanism (20) into the processing equipment.

2. The liquid supply system according to claim 1, characterized in that, The second liquid storage mechanism (20) includes a barrel body (200), a barrel cover (205) disposed on the top of the barrel body (200), and an air inlet (210), an air outlet (215), a liquid inlet (220) and a liquid outlet (225) circumferentially disposed on the top of the barrel body (200) surrounding the barrel cover (205). The air inlet (210) is connected to the air supply mechanism (40), the air outlet (215) is connected to the vacuum generator (30), the liquid inlet (220) is connected to the first liquid storage mechanism (10), and the liquid outlet (225) is connected to the processing equipment.

3. The liquid supply system according to claim 2, characterized in that, The second liquid storage mechanism (20) further includes a first liquid passage pipe disposed inside the barrel (200), the first liquid passage pipe being connected to the liquid inlet (220), wherein the liquid outlet of the first liquid passage pipe is at a first preset distance from the bottom of the barrel (200).

4. The liquid supply system according to claim 3, characterized in that, The second liquid storage mechanism (20) further includes a second liquid passage pipe disposed inside the barrel (200), the second liquid passage pipe being connected to the liquid outlet (225), wherein there is a second preset distance between the liquid inlet end of the second liquid passage pipe and the bottom of the barrel (200), and the first preset distance is equal to the second preset distance.

5. The liquid supply system according to claim 2, characterized in that, The second liquid storage mechanism (20) further includes two connectors (240) spaced apart along the height direction of the barrel (200) on the side wall of the barrel (200) and communicating with the interior of the barrel (200), a liquid level indicator tube (245) connecting the two connectors (240), and a plurality of liquid level sensors (250) spaced apart along the height direction of the barrel (200) on the liquid level indicator tube (245).

6. The liquid supply system according to claim 2, characterized in that, The second liquid storage mechanism (20) further includes a lifting member (255) which is close to the lid (205) and located on the top of the barrel body (200).

7. The liquid supply system according to claim 2, characterized in that, The second liquid storage mechanism (20) further includes a support base (260) which surrounds a protruding structure (2000) at the bottom of the barrel (200) to support the barrel (200).

8. The liquid supply system according to claim 2, characterized in that, The system further includes a fixing mechanism (50), which includes a fixing plate (500), a slide rail (505) disposed on the fixing plate (500), and a fixing structure (510) slidably connected to the slide rail (505). The fixing structure (510) is used to support the second liquid storage mechanism (20).

9. The liquid supply system according to claim 8, characterized in that, The fixing structure (510) includes a support (5100) and a cover plate (5110) disposed on the top of the support (5100). The cover plate (5110) includes a limiting opening (5120). The second liquid storage mechanism (20) passes through the limiting opening (5120) and abuts against the bottom of the support (5100).

10. The liquid supply system according to claim 9, characterized in that, The fixing mechanism (50) also includes a traction member (5130) disposed on the top of the cover plate (5110) for pulling the fixing structure (510) to slide along the slide rail (505).

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