Ultrasonic cleaning tank for tank type wafer cleaning machine

Abstract

The utility model relates to the technical field of wafer manufacturing, and discloses an ultrasonic cleaning tank for a tank type wafer cleaning machine, which comprises an ultrasonic cleaning tank main body, an ultrasonic vibration panel is fixedly sleeved on the inner wall of the ultrasonic cleaning tank main body, and a plurality of mounting grooves are arranged on the inner wall of the lower end of the ultrasonic cleaning tank main body. The ultrasonic cleaning tank comprises an ultrasonic cleaning tank body, a mounting groove is formed in the ultrasonic cleaning tank body, an ultrasonic transducer is arranged in the mounting groove, the ultrasonic transducer is fixedly connected with an ultrasonic vibration panel, a cleaning agent circulating mechanism is arranged on the ultrasonic cleaning tank body, a loading and unloading mechanism is arranged on the cleaning agent circulating mechanism, and the cleaning agent circulating mechanism comprises a cleaning agent storage box and a connecting frame. According to the cleaning agent recycling device, the purpose of recycling a cleaning agent can be achieved through the arranged cleaning agent recycling mechanism, so that better environmental protection performance is achieved, the filter screen can be rapidly replaced through the arranged loading and unloading mechanism, the efficiency of filtering out impurities in the cleaning agent is guaranteed, and better usability is achieved.

Description

Technical Field

[0001] This utility model relates to the field of wafer manufacturing technology, and in particular to an ultrasonic cleaning tank for a tank-type wafer cleaning machine. Background Technology

[0002] A wafer is a silicon wafer used to fabricate silicon semiconductor circuits; its raw material is silicon. High-purity polycrystalline silicon is dissolved, doped with silicon seed crystals, and then slowly pulled out to form cylindrical single-crystal silicon. After grinding, polishing, and slicing, the silicon ingot forms a silicon wafer. Surface cleaning is a necessary technical step in wafer manufacturing, and currently, this process is mainly accomplished using wafer cleaning machines. Conventional wafer cleaning machines use a pressurized water jet to rinse the wafer surface. While this provides good cleaning results, it consumes a lot of water. For wafers with relatively little surface dust, this cleaning method is not economical and is time-consuming. For such cases, ultrasonic cleaning tanks are more suitable.

[0003] In existing devices, the cleaning agent is first poured into the ultrasonic cleaning tank body, and then poured out after cleaning, resulting in resource waste and high costs. Therefore, those skilled in the art have provided an ultrasonic cleaning tank for a tank-type wafer cleaning machine to solve the problems mentioned in the background art. Utility Model Content

[0004] The purpose of this utility model is to address the shortcomings of existing technologies by proposing an ultrasonic cleaning tank for a trough-type wafer cleaning machine. The cleaning agent circulation mechanism allows for the recycling of the cleaning agent, thus achieving better environmental protection. Furthermore, the loading and unloading mechanism enables quick replacement of the filter screen, ensuring efficient filtration of impurities from the cleaning agent and improving usability.

[0005] To achieve the above objectives, the present invention provides the following technical solution:

[0006] An ultrasonic cleaning tank for a trough-type wafer cleaning machine includes an ultrasonic cleaning tank body. An ultrasonic vibration panel is fixedly sleeved on the inner wall of the ultrasonic cleaning tank body. Multiple mounting slots are opened on the lower inner wall of the ultrasonic cleaning tank body. An ultrasonic transducer is installed in the mounting slot. The ultrasonic transducer is fixedly connected to the ultrasonic vibration panel. A cleaning agent circulation mechanism is provided on the ultrasonic cleaning tank body. A loading and unloading mechanism is provided on the cleaning agent circulation mechanism.

[0007] The cleaning agent circulation mechanism includes a cleaning agent storage tank and a connecting frame. The cleaning agent storage tank is fixedly connected to one outer wall of the ultrasonic cleaning tank body. A No. 1 water pump and a No. 2 water pump are fixedly connected to the upper and lower end faces of the cleaning agent storage tank. The output ends of the No. 1 water pump and the No. 2 water pump are respectively fixedly connected to an inlet pipe and an outlet pipe. One end of the inlet pipe is fixedly sleeved on one side of the ultrasonic cleaning tank body. A lower fixing frame is fixedly sleeved on the lower part of the outer wall of the outlet pipe. A drain pipe is fixedly connected to one side of the lower end face of the ultrasonic cleaning tank body. An upper fixing frame is sleeved on the outer wall of the drain pipe. A filter screen is installed inside the lower fixing frame. A shut-off valve is fixedly installed on the outer wall of the drain pipe.

[0008] With the above technical solution, during cleaning operations, the No. 1 water pump is powered on to take out the cleaning agent from the cleaning agent storage tank and transmit it to the main body of the ultrasonic cleaning tank through the water inlet pipe. After use, the shut-off valve and the No. 2 water pump are opened, and the cleaning agent can filter out impurities through the filter screen in the connecting frame. Under the action of the No. 2 water pump, the cleaning agent can be injected back into the cleaning agent storage tank, thereby achieving the effect of recycling and having better environmental protection.

[0009] Furthermore, the loading and unloading mechanism includes multiple limiting posts and multiple limiting ports. The multiple limiting posts are fixedly connected to the front and rear sides of the upper and lower end faces of the connecting frame, respectively. The multiple limiting ports are respectively opened on the front and rear sides of the lower end face of the upper fixed frame and the front and rear sides of the upper end face of the lower fixed frame. The limiting posts are engaged in the limiting ports.

[0010] The above technical solution achieves the purpose of stabilizing and limiting the connecting frame and the two fixed frames by using the locking setting of the limiting post within the limiting opening.

[0011] Furthermore, an auxiliary groove is provided on one side of the limiting post, an auxiliary spring is fixedly connected to the inner wall of one side of the auxiliary groove, a movable plate is fixedly connected to one end of the auxiliary spring, a locking rod is fixedly connected to one side of the movable plate, a locking hole is provided on the inner wall of one side of the auxiliary groove, and the locking rod is locked in the locking hole.

[0012] With the above technical solution, by pressing the locking rod, the movable plate moves under force and drives the auxiliary spring to compress. The locking rod retracts into the auxiliary groove, locking the limiting post in the limiting port. Then, the auxiliary spring pops out and pushes the movable plate to move. The locking rod moves synchronously under force and locks in the locking hole, so the filter screen can be fixed and used.

[0013] Furthermore, the upper and lower end faces of the movable plate are fixedly connected with limiting sliders, and the inner walls of the upper and lower ends of the auxiliary groove are provided with limiting grooves, and the limiting sliders are slidably disposed in the limiting grooves.

[0014] By using the above technical solution, the movement of the movable plate can be restricted by limiting the sliding of the slider within the limiting groove.

[0015] Furthermore, limit blocks are fixedly connected to both sides and the front and rear end faces of the filter screen, and limit slots are opened on both sides and the front and rear end inner walls of the connecting frame, and the limit blocks are engaged in the limit slots.

[0016] The above technical solution, through the locking and engaging mechanism of the limiting block within the limiting slot, facilitates the replacement of the filter screen.

[0017] Furthermore, sealing rings are fixedly connected to both the upper and lower end faces of the connecting frame, and annular sealing grooves are provided on both the lower end face of the upper fixed frame and the upper end face of the lower fixed frame, with the sealing rings movably fitted in the annular sealing grooves.

[0018] By employing the above technical solution, a better sealing effect can be achieved through the movable fitting of the sealing ring within the annular sealing groove.

[0019] Furthermore, support columns are fixedly connected to the lower end face of the ultrasonic cleaning tank body near the four corners.

[0020] The above technical solution, through the installation of support columns, can achieve the benefit of stable support for the device.

[0021] This utility model has the following beneficial effects:

[0022] 1. The present invention proposes an ultrasonic cleaning tank for a trough-type wafer cleaning machine. During the cleaning operation, the No. 1 water pump is powered on to take out the cleaning agent from the cleaning agent storage tank and transmit the cleaning agent to the main body of the ultrasonic cleaning tank through the water inlet pipe. After use, the shut-off valve and the No. 2 water pump are opened, and the cleaning agent can filter out impurities through the filter screen in the connecting frame. The cleaning agent can be injected back into the cleaning agent storage tank under the action of the No. 2 water pump, thereby achieving the effect of recycling and having better environmental protection.

[0023] 2. The ultrasonic cleaning tank for a trough-type wafer cleaning machine proposed in this utility model allows for easy replacement of the filter screen when the locking rod is pressed during assembly. The movable plate moves under force, which in turn compresses the auxiliary spring. The locking rod retracts into the auxiliary trough, locking the limiting post in the limiting opening. Then, the auxiliary spring pops out, pushing the movable plate to move. The locking rod moves synchronously under force and locks in the locking hole, allowing the filter screen to be fixed in place. When removing the filter screen, simply press the locking rod again.

[0024] 3. The ultrasonic cleaning tank for a trough-type wafer cleaning machine proposed in this utility model can achieve the purpose of recycling the cleaning agent through the set cleaning agent circulation mechanism, thereby achieving better environmental protection. Furthermore, the set loading and unloading mechanism can quickly replace the filter screen, thereby ensuring the efficiency of filtering out impurities in the cleaning agent and having better usability. Attached Figure Description

[0025] Figure 1 This is an isometric schematic diagram of an ultrasonic cleaning tank for a trough-type wafer cleaning machine proposed in this utility model.

[0026] Figure 2 This is a front sectional view of an ultrasonic cleaning tank for a trough-type wafer cleaning machine proposed in this utility model.

[0027] Figure 3 This is a front sectional view of the connection frame of the ultrasonic cleaning tank for a trough-type wafer cleaning machine proposed in this utility model, showing the connection between the upper fixed frame and the lower fixed frame.

[0028] Figure 4 for Figure 3 An enlarged schematic diagram of the structure at point A;

[0029] Figure 5 This is an isometric view of the connecting frame of the ultrasonic cleaning tank for a trough-type wafer cleaning machine proposed in this utility model.

[0030] Legend:

[0031] 1. Ultrasonic cleaning tank body; 2. Ultrasonic vibration panel; 3. Mounting slot; 4. Ultrasonic transducer; 5. Cleaning agent circulation mechanism; 501. Cleaning agent storage tank; 502. No. 1 water pump; 503. Inlet pipe; 504. No. 2 water pump; 505. Outlet pipe; 506. Shut-off valve; 507. Upper fixing frame; 508. Connecting frame; 509. Lower fixing frame; 510. Filter screen; 511. Drain pipe; 6. Loading and unloading mechanism; 601. Limiting block; 602. Limiting slot; 603. Sealing ring; 604. Annular sealing groove; 605. Limiting column; 606. Limiting port; 607. Auxiliary groove; 608. Auxiliary spring; 609. Movable plate; 610. Engaging rod; 611. Engaging hole; 612. Limiting slider; 613. Limiting groove; 7. Support column. Detailed Implementation

[0032] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of specific embodiments. Obviously, the described specific embodiments are only a part of the specific embodiments of the present invention, and not all of them. Based on the specific embodiments of the present invention, all other specific embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0033] Reference Figure 1 , Figure 2 , Figure 3 and Figure 5 The present invention provides a specific embodiment of an ultrasonic cleaning tank for a trough-type wafer cleaning machine, comprising an ultrasonic cleaning tank body 1, an ultrasonic vibration panel 2 fixedly sleeved on the inner wall of the ultrasonic cleaning tank body 1, a plurality of mounting grooves 3 opened on the lower inner wall of the ultrasonic cleaning tank body 1, an ultrasonic transducer 4 disposed in the mounting groove 3, the ultrasonic transducer 4 being fixedly connected to the ultrasonic vibration panel 2, a cleaning agent circulation mechanism 5 disposed on the ultrasonic cleaning tank body 1, a loading and unloading mechanism 6 disposed on the cleaning agent circulation mechanism 5, and support columns 7 fixedly connected near the four corners of the lower end face of the ultrasonic cleaning tank body 1, thereby achieving the benefit of stable support for the device.

[0034] The cleaning agent circulation mechanism 5 includes a cleaning agent storage tank 501 and a connecting frame 508. The cleaning agent storage tank 501 is fixedly connected to the outer wall of one side of the ultrasonic cleaning tank body 1. A first water pump 502 and a second water pump 504 are fixedly connected to the upper and lower ends of the cleaning agent storage tank 501. The output ends of the first water pump 502 and the second water pump 504 are respectively fixedly connected to an inlet pipe 503 and an outlet pipe 505. One end of the inlet pipe 503 is fixedly sleeved on one side of the ultrasonic cleaning tank body 1. A lower fixing frame 509 is fixedly sleeved on the lower part of the outer wall of the outlet pipe 505. A drain pipe 511 is fixedly connected to one side of the lower end face of the ultrasonic cleaning tank body 1. An upper fixing frame 507 is sleeved on the outer wall of the drain pipe 511. A filter screen 510 is installed inside the lower fixing frame 509. A shut-off valve 506 is fixedly installed on the outer wall of the drain pipe 511.

[0035] Reference Figure 3 , Figure 4 and Figure 5The loading and unloading mechanism 6 includes multiple limiting posts 605 and multiple limiting openings 606. The multiple limiting posts 605 are fixedly connected to the front and rear sides of the upper and lower end faces of the connecting frame 508, respectively. The multiple limiting openings 606 are respectively opened on the front and rear sides of the lower end face of the upper fixed frame 507 and the front and rear sides of the upper end face of the lower fixed frame 509. The limiting posts 605 are engaged in the limiting openings 606. The engagement of the limiting posts 605 in the limiting openings 606 can achieve the purpose of stably limiting the connecting frame 508 and the two fixed frames. An auxiliary groove 607 is provided on one side of the limiting post 605. An auxiliary spring 608 is fixedly connected to one inner wall of the auxiliary groove 607. A movable plate 609 is fixedly connected to one end of the auxiliary spring 608. A locking rod 610 is fixedly connected to one side of the movable plate 609. A locking hole 611 is provided on one inner wall of the auxiliary groove 607. The locking rod 610 is locked in the locking hole 611. By pressing the locking rod 610, the movable plate 609 is moved under force and drives the auxiliary spring 608 to compress. The locking rod 610 retracts into the auxiliary groove 607, locking the limiting post 605 in the limiting opening 606. Then, the auxiliary spring 608 pops out and pushes the movable plate 609. 9. The locking rod 610 moves synchronously under force and engages in the locking hole 611, allowing the filter screen 510 to be fixed in place. Limiting sliders 612 are fixedly connected to the upper and lower end faces of the movable plate 609. Limiting grooves 613 are provided on the inner walls of the upper and lower ends of the auxiliary groove 607. The limiting sliders 612 slide within the limiting grooves 613. By sliding the limiting sliders 612 within the limiting grooves 613, the movement of the movable plate 609 can be restricted. Limiting blocks 601 are fixedly connected to both sides and the front and rear end faces of the filter screen 510. The inner walls of both sides of the connecting frame 508 and... Both the front and rear inner walls are provided with limiting slots 602, and limiting blocks 601 are engaged in the limiting slots 602. The engagement of the limiting blocks 601 in the limiting slots 602 can facilitate the replacement of the filter screen 510. The upper and lower end faces of the connecting frame 508 are fixedly connected with sealing rings 603. The lower end face of the upper fixed frame 507 and the upper end face of the lower fixed frame 509 are provided with annular sealing grooves 604. The sealing rings 603 are movably fitted in the annular sealing grooves 604. The movable fitting of the sealing rings 603 in the annular sealing grooves 604 can achieve a better sealing effect.

[0036] Working Principle: Before cleaning, the No. 1 water pump 502 is powered on to extract the cleaning agent from the cleaning agent storage tank 501 and transmit it to the ultrasonic cleaning tank body 1 through the water inlet pipe 503. The wafer is then placed inside. The high-frequency oscillation signal emitted by the ultrasonic generator is converted into high-frequency mechanical oscillation by the ultrasonic transducer 4 and propagates into the cleaning solvent. The ultrasonic waves radiate forward in the cleaning liquid in alternating dense and sparse patterns, causing the liquid to flow and generating tens of thousands of tiny bubbles. These bubbles form and grow under the negative pressure of the longitudinal propagation of the ultrasonic waves, and then rapidly close in the positive pressure zone. In this process, known as the "cavity" effect, the bubble closure can create instantaneous high pressure exceeding one thousand atmospheres. The continuous generation of instantaneous high pressure is like a series of small "explosions" constantly impacting the surface of the object, causing the... The dirt on the surface and in the crevices of the object is quickly peeled off, thus achieving the purpose of cleaning the object's surface. After use, the shut-off valve 506 and the second water pump 504 are opened. The cleaning agent can filter out impurities through the filter screen 510 in the connecting frame 508. Under the action of the second water pump 504, the cleaning agent can be injected back into the cleaning agent storage tank 501 for recycling. When assembling the filter screen 510, first press the locking rod 610. At this time, the movable plate 609 is moved by force and pushes the auxiliary spring 608 to compress, locking the limiting post 605 in the limiting port 606. The locking rod 610 is aligned with the locking hole 611. The auxiliary spring 608 pops out without resistance. The movable plate 609 is moved by force, and the locking rod 610 moves and is locked in the locking hole 611. The filter screen 510 can then be fixed in place.

[0037] Finally, it should be noted that the above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Although the present utility model has been described in detail with reference to the foregoing specific embodiments, those skilled in the art can still modify the technical solutions described in the foregoing specific embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. An ultrasonic cleaning tank for a slot-type wafer cleaning machine, comprising an ultrasonic cleaning tank main body (1), characterized by: The inner wall of the ultrasonic cleaning tank body (1) is fixedly sleeved with an ultrasonic vibration panel (2), a plurality of mounting grooves (3) are formed in the lower end inner wall of the ultrasonic cleaning tank body (1), an ultrasonic transducer (4) is arranged in the mounting groove (3), the ultrasonic transducer (4) is fixedly connected with the ultrasonic vibration panel (2), a cleaning agent circulating mechanism (5) is arranged on the ultrasonic cleaning tank body (1), and a loading and unloading mechanism (6) is arranged on the cleaning agent circulating mechanism (5). The cleaning agent circulating mechanism (5) comprises a cleaning agent storage box (501) and a connecting frame (508), the cleaning agent storage box (501) is fixedly connected to the outer wall of one side of the ultrasonic cleaning tank body (1), the upper and lower end faces of the cleaning agent storage box (501) are fixedly connected with a first water pump (502) and a second water pump (504), the output ends of the first water pump (502) and the second water pump (504) are fixedly connected with an inlet pipe (503) and an outlet pipe (505), respectively, one end of the inlet pipe (503) is fixedly sleeved on one side of the ultrasonic cleaning tank body (1), the outer wall of the lower part of the outlet pipe (505) is fixedly sleeved with a lower fixed frame (509), the lower end face of the ultrasonic cleaning tank body (1) is fixedly connected with a drain pipe (511), the outer wall of the drain pipe (511) is sleeved with an upper fixed frame (507), the lower fixed frame (509) is provided with a filter screen (510), and the outer wall of the drain pipe (511) is fixedly provided with a stop valve (506).

2. The ultrasonic cleaning tank for a slot-type wafer cleaning machine according to claim 1, wherein: The loading and unloading mechanism (6) comprises a plurality of limiting columns (605) and a plurality of limiting openings (606), the plurality of limiting columns (605) are fixedly connected to the upper end face and the lower end face of the connecting frame (508) on the two sides of the front and rear, the plurality of limiting openings (606) are formed on the lower end face of the upper fixed frame (507) on the two sides of the front and rear and on the upper end face of the lower fixed frame (509) on the two sides of the front and rear, and the limiting column (605) is clamped in the limiting opening (606).

3. The ultrasonic cleaning tank for a slot-type wafer cleaning machine according to claim 2, wherein: One side of the limiting column (605) is provided with an auxiliary groove (607), one side of the auxiliary groove (607) is fixedly connected with an auxiliary spring (608), one end of the auxiliary spring (608) is fixedly connected with a movable plate (609), one side of the movable plate (609) is fixedly connected with a clamping rod (610), one side of the auxiliary groove (607) is provided with a clamping hole (611), and the clamping rod (610) is clamped in the clamping hole (611).

4. The ultrasonic cleaning tank for a slot-type wafer cleaning machine according to claim 3, wherein: The upper and lower end faces of the movable plate (609) are fixedly connected with limiting sliding blocks (612), and the upper and lower end inner walls of the auxiliary groove (607) are provided with limiting sliding grooves (613), and the limiting sliding blocks (612) are slidingly arranged in the limiting sliding grooves (613).

5. The ultrasonic cleaning tank for use in a slot-type wafer cleaning machine according to claim 1, wherein: Both sides and front and back end surfaces of the filter screen (510) are fixedly connected with limiting clamping blocks (601), inner walls of both sides and front and back end inner walls of the connecting frame (508) are provided with limiting clamping grooves (602), and the limiting clamping blocks (601) are clamped in the limiting clamping grooves (602).

6. The ultrasonic cleaning tank for a slot-type wafer cleaning machine according to claim 1, wherein: Upper and lower end surfaces of the connecting frame (508) are fixedly connected with sealing rings (603), and the upper fixed frame (507) and the lower fixed frame (509) are provided with annular sealing grooves (604) at lower end surfaces and upper end surfaces respectively, and the sealing rings (603) are movably sleeved in the annular sealing grooves (604).

7. The ultrasonic cleaning tank for use in a slot-type wafer cleaning machine according to claim 1, wherein: Lower end surfaces of the ultrasonic cleaning tank main body (1) are fixedly connected with supporting columns (7) near four corners.

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