Cleaning device for crystal plain films

By introducing a receiving component and a ball screw slide rail into the cleaning device, combined with cleaning cotton and a variable frequency motor, large-scale cleaning of crystal wafers is achieved, solving the problem of low wiping efficiency in existing technologies and improving cleaning efficiency and material unloading convenience.

CN223932225UActive Publication Date: 2026-02-24SHANXI HUAXIN JINGTU TECHNOLOGY CO LTD
View PDF 1 Cites 0 Cited by

Patent Information

Application Number
CN202520924867.X
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-05-12
Publication Date
2026-02-24
Estimated Expiration
2035-05-12

Smart Images

  • Figure CN223932225U_ABST
    Figure CN223932225U_ABST
Patent Text Reader

Abstract

The utility model discloses a cleaning device for a crystal plain wafer, and relates to the technical field of crystal plain wafer cleaning, the cleaning device for the crystal plain wafer comprises a cleaning box, a cleaning cavity is arranged in the cleaning box, a material receiving assembly is arranged in the cleaning cavity, a cleaning assembly is arranged above the material receiving assembly, and the cleaning assembly is arranged above the material receiving assembly. An adjusting box is arranged at the rear end of the cleaning box, a mounting cavity is formed in the front surface of the adjusting box, a ball screw sliding rail is arranged in the mounting cavity, the moving end of the ball screw sliding rail drives the cleaning assembly to move up and down, the material receiving assembly comprises a center base, and a fixed base is welded to the lower end of the center base; fixing plates are arranged on the upper surface of the periphery of the fixing base, the fixing plates are externally connected with bolts to be fixed to the cleaning box, and according to the scheme, the problems that when an existing flat crystal wafer is wiped after being cleaned, multi-range wiping is needed, the wiping efficiency is low, time and labor are wasted, and the cleaning efficiency of the flat crystal wafer is low are solved.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] This utility model relates to the field of crystal wafer cleaning technology, specifically a cleaning device for crystal wafers. Background Technology

[0002] A crystal flat plate is a thin sheet made of crystalline materials. Crystal flat plates can be made of a variety of crystalline materials, such as quartz, zinc selenide, silicon and other optical crystal materials. These materials have excellent optical properties, which makes crystal flat plates widely used in the field of optics.

[0003] For example, the Chinese authorized patent with announcement number CN212652269U (a surface cleaning device for quartz wafers) includes a shell and a wafer body. Four base columns are fixedly installed at the bottom of the shell, and a pressurized water pump is fixedly installed on one side of the shell. One end of the pressurized water pump extends into the interior of the water tank. This surface cleaning device for quartz wafers, by setting up a nozzle and a cleaning tank, allows the pressurized water pump to enter the nozzle through the water inlet pipe. The water sprayed from the nozzle is in a scattered pattern, completing the first cleaning of the wafer body surface, which can remove floating stains on the wafer body surface. A motor is set in the cleaning tank. Driven by the structure inside the cleaning tank, the connecting rod drives the cleaning cotton to wipe and clean the wafer body surface back and forth, completing the second cleaning of the wafer body surface. Traditional cleaning devices can generally only perform one cleaning process. This device ensures the cleanliness of the wafer body surface to a certain extent.

[0004] However, existing crystal flat plates require wiping multiple areas after cleaning, which is inefficient, time-consuming, and labor-intensive, resulting in low cleaning efficiency. Therefore, it does not meet the current requirements. To address this, we propose a cleaning device for crystal flat plates. Utility Model Content

[0005] The purpose of this invention is to provide a cleaning device for crystal flat plates, in order to solve the problem mentioned in the background art that when existing crystal flat plates are wiped after cleaning, multiple areas need to be wiped, resulting in low wiping efficiency, time and labor costs, and thus low cleaning efficiency of crystal flat plates.

[0006] To achieve the above objectives, this utility model provides the following technical solution: a cleaning device for crystal wafers, comprising: a cleaning box, wherein a cleaning chamber is provided inside the cleaning box, a receiving assembly is provided inside the cleaning chamber, a cleaning assembly is provided above the receiving assembly, an adjustment box is provided at the rear end of the cleaning box, an installation cavity is provided on the front surface of the adjustment box, a ball screw slide rail is provided inside the installation cavity, and the moving end of the ball screw slide rail drives the cleaning assembly to move up and down.

[0007] Preferably, the receiving assembly includes a central seat, a fixed base welded to the lower end of the central seat, and fixed plates provided on the upper surface of the fixed base around its perimeter, with the fixed plates being fixed to the cleaning tank by external bolts.

[0008] Preferably, the receiving assembly further includes a connecting arm, one end of which is heat-fused to the upper surface of the center seat, and multiple connecting arms are provided, which are equidistantly distributed, and the other end of the connecting arm is heat-fused to a receiving seat.

[0009] Preferably, the upper surface of the receiving seat is provided with a receiving groove, and both sides of the receiving groove are provided with finger grooves.

[0010] Preferably, the cleaning assembly includes a base plate, a cleaning cotton is provided at the lower end of the base plate, a water inlet pipe is provided on the upper surface of the base plate, and a water outlet is provided on the lower surface of the cleaning cotton, with one end of the water outlet extending upward through the base plate and communicating with the water inlet pipe.

[0011] Preferably, the cleaning assembly further includes a top plate, and a variable frequency motor is provided at the center between the top plate and the bottom plate, and the top end and output end of the variable frequency motor are fixed to the top plate and the bottom plate respectively by external bolts.

[0012] Preferably, the front and rear surfaces of the cleaning tank near the bottom are provided with drain outlets, and the drain outlets are connected to the cleaning chamber.

[0013] Compared with the prior art, the beneficial effects of this utility model are:

[0014] (1) This utility model sets up a receiving component inside the cleaning box, and places multiple crystal flat plates one by one into the receiving groove of the receiving seat. The cleaning component is driven to move downward by the ball screw slide rail, so that the cleaning cotton comes into contact with the crystal flat plates. At the same time, the water outlet drains water to clean the surface of the crystal flat plates. Then, the output end of the variable frequency motor drives the base plate to rotate, and the cleaning cotton rubs against the crystal flat plates, thereby achieving a secondary wiping and cleaning effect on the crystal flat plates. Moreover, it can clean a large area and a large number of crystal flat plates at the same time, without having to wipe them little by little in a local area, which improves the cleaning efficiency and solves the problem that existing crystal flat plates need to be wiped in a large area after cleaning, which is inefficient, time-consuming and laborious, resulting in low cleaning efficiency of crystal flat plates.

[0015] (2) By setting a receiving groove on the upper surface of the receiving seat and setting finger slots on both sides of the receiving groove, when unloading, the personnel can insert their fingers into the finger slots to easily clamp and remove the crystal flat sheet, thus improving the convenience of unloading. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the overall structure of this utility model;

[0017] Figure 2 This is a top view of the connection between the cleaning box and the receiving assembly of this utility model;

[0018] Figure 3 This is a schematic diagram of the material receiving component structure of this utility model;

[0019] Figure 4 This is a schematic diagram of the overall bottom view of the present invention;

[0020] In the diagram: 1. Cleaning tank; 2. Receiving assembly; 3. Adjustment box; 4. Ball screw slide rail; 5. Mounting cavity; 6. Cleaning assembly; 7. Top plate; 8. Bottom plate; 9. Cleaning cotton; 10. Water inlet pipe; 11. Variable frequency motor; 12. Drain outlet; 13. Cleaning chamber; 14. Center seat; 15. Fixed base; 16. Fixed plate; 17. Connecting arm; 18. Receiving seat; 19. Receiving groove; 20. Finger groove; 21. Water outlet. Detailed Implementation

[0021] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0022] Please see Figure 1-4This utility model provides an embodiment of a cleaning device for crystal wafers, comprising: a cleaning tank 1, a cleaning chamber 13 inside the cleaning tank 1, a receiving assembly 2 inside the cleaning chamber 13, a cleaning assembly 6 above the receiving assembly 2, an adjusting box 3 at the rear end of the cleaning tank 1, an installation cavity 5 on the front surface of the adjusting box 3, a ball screw slide rail 4 inside the installation cavity 5, and the moving end of the ball screw slide rail 4 driving the cleaning assembly 6 to move up and down; the receiving assembly 2 includes a central seat 14, and a fixed base 15 welded to the lower end of the central seat 14. The upper surface of the fixed base 15 is provided with fixing plates 16 on all four sides, and the fixing plates 16 are fixed to the cleaning tank 1 with external bolts. The receiving assembly 2 also includes connecting arms 17, and one end of the connecting arm 17 is heat-fused to the upper surface of the center seat 14. Multiple connecting arms 17 are provided and are equidistantly distributed. The other end of the connecting arm 17 is heat-fused to a receiving seat 18. The cleaning assembly 6 includes a base plate 8. A cleaning cotton 9 is provided at the lower end of the base plate 8. A water inlet pipe 10 is provided on the upper surface of the base plate 8. A water outlet hole 21 is provided on the lower surface of the cleaning cotton 9, and one end of the water outlet hole 21 faces the... The upper extension passes through the base plate 8 and communicates with the water inlet pipe 10. The cleaning assembly 6 also includes a top plate 7. A variable frequency motor 11 is set at the center between the top plate 7 and the base plate 8. The top end and output end of the variable frequency motor 11 are fixed to the top plate 7 and the base plate 8 respectively by external bolts. The fixed base 15 is fixed to the cleaning box 1 by external bolts of the fixed plate 16, so that the receiving assembly 2 is fixed to the cleaning box 1. Multiple crystal flat plates are placed one by one into the receiving groove 19 of the receiving seat 18. The water inlet pipe 10 is connected to the water supply mechanism. The ball screw slide rail 4 is activated, which drives the cleaning assembly 6 to move downward, so that the cleaning assembly 6 can move downward. The cotton 9 contacts the crystal flat sheet, and water is supplied through the water supply mechanism. The water is discharged from the water outlet 21 and falls onto the surface of the crystal flat sheet to clean it. Then, the output end of the variable frequency motor 11 drives the base plate 8 to rotate. The cleaning cotton 9 rubs against the crystal flat sheet, thereby achieving a secondary wiping and cleaning effect on the crystal flat sheet. Moreover, it cleans a large area and a large number of crystals at the same time, without having to wipe each area one by one, which improves the cleaning efficiency. After cleaning, the ball screw slide rail 4 drives the cleaning component 6 to move upward to the initial position, and then unloads and repositions the material.

[0023] Please see Figure 3 The upper surface of the receiving base 18 is provided with a receiving groove 19, and both sides of the receiving groove 19 are provided with finger slots 20. When unloading, the operator inserts his / her fingers into the finger slots 20 to facilitate the clamping and removal of the crystal wafer, thus improving the convenience of unloading.

[0024] Please see Figure 1 The front and rear surfaces of the cleaning tank 1 near the bottom are provided with drain outlets 12, and the drain outlets 12 are interconnected with the cleaning chamber 13. The falling water falls into the cleaning chamber 13 and is discharged from the drain outlets 12 to avoid accumulation.

[0025] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

Claims

1. A cleaning apparatus for crystal flat plates, comprising a cleaning chamber (1), characterized in that: The cleaning box (1) is provided with a cleaning chamber (13) inside. The cleaning chamber (13) is provided with a receiving component (2) inside. The receiving component (2) is provided with a cleaning component (6) above it. The cleaning box (1) is provided with an adjustment box (3) at the rear end. The front surface of the adjustment box (3) is provided with an installation cavity (5). The installation cavity (5) is provided with a ball screw slide rail (4) inside. The moving end of the ball screw slide rail (4) drives the cleaning component (6) to move up and down.

2. The cleaning apparatus for crystal flat plates according to claim 1, characterized in that: The receiving assembly (2) includes a center seat (14), and a fixed base (15) is welded to the lower end of the center seat (14). A fixed plate (16) is provided on the upper surface of the fixed base (15) around its perimeter, and the fixed plate (16) is fixed to the cleaning box (1) by external bolts.

3. The cleaning apparatus for crystal flat plates according to claim 2, characterized in that: The receiving assembly (2) also includes a connecting arm (17), one end of which is heat-fused to the upper surface of the center seat (14), and multiple connecting arms (17) are provided, with multiple connecting arms (17) distributed at equal intervals, and the other end of the connecting arm (17) is heat-fused to a receiving seat (18).

4. The cleaning apparatus for crystal flat plates according to claim 3, characterized in that: The upper surface of the receiving seat (18) is provided with a receiving groove (19), and both sides of the receiving groove (19) are provided with finger slots (20).

5. The cleaning apparatus for crystal flat plates according to claim 1, characterized in that: The cleaning assembly (6) includes a base plate (8), a cleaning cotton (9) is provided at the lower end of the base plate (8), a water inlet pipe (10) is provided on the upper surface of the base plate (8), and a water outlet hole (21) is provided on the lower surface of the cleaning cotton (9), with one end of the water outlet hole (21) extending upward through the base plate (8) and communicating with the water inlet pipe (10).

6. The cleaning apparatus for crystal flat plates according to claim 5, characterized in that: The cleaning assembly (6) also includes a top plate (7), and a variable frequency motor (11) is provided at the center between the top plate (7) and the bottom plate (8). The top end and the output end of the variable frequency motor (11) are fixed to the top plate (7) and the bottom plate (8) respectively by external bolts.

7. The cleaning apparatus for crystal flat plates according to claim 1, characterized in that: The cleaning tank (1) has drain outlets (12) on both the front and rear surfaces near the bottom, and the drain outlets (12) are connected to the cleaning chamber (13).

Citation Information

Patent Citations

  • Surface cleaning device for quartz wafer

    CN212652269U