Device for producing silicon dioxide by using organic silicon waste gas and waste liquid

Abstract

The utility model relates to a device for producing silicon dioxide by using organic silicon waste gas and waste liquid. The device comprises a waste liquid evaporator, a high-temperature hydrolysis reactor, a gas-solid separator, a surface processor and a hydrochloric acid absorption tower, the waste liquid evaporator is connected with the high-temperature hydrolysis reactor through a pipeline. The pyrohydrolysis reactor is connected with the gas-solid separator, the gas-solid separator is provided with an exhaust port and a solid outlet, the exhaust port is connected with the hydrochloric acid absorption tower, and the solid outlet is connected with the surface processor. The surface treatment device comprises a treatment bin and a heating bin, the treatment bin is arranged at the upper end of the heating bin, the treatment bin is provided with a silicon dioxide particle inlet, a silicon dioxide particle outlet, a surface treatment gas inlet and an exhaust port, the heating bin is connected with the surface treatment gas inlet, and surface treatment gas is mixed with silicon dioxide particles to treat the silicon dioxide particles. The device disclosed by the utility model has the beneficial effects of improving the treatment efficiency, reducing the solid content in dilute acid, improving the treatment mode of silicon dioxide particles and remarkably improving the environmental protection benefit.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of silicon dioxide preparation technology, specifically relates to a device for producing silicon dioxide by using organic silicon waste gas and waste liquid. BACKGROUND

[0002] With the continuous development of society, people's demand for organic silicon products is more and more, a large amount of waste gas, waste liquid will be produced in the production process of organic silicon product, with the continuous improvement of organic silicon production capacity, the waste gas, waste liquid is also increasing. The waste gas, waste liquid of organic silicon mainly includes chloromethane, various methyl chlorosilane and other toxic and harmful substances. At present, the waste gas, waste liquid of organic silicon mainly adopts waste gas incineration and dilute hydrochloric acid recovery method, the method mainly comprises the following steps: 1) high temperature incineration: the waste gas, waste liquid of organic silicon is incinerated at high temperature in the incinerator, so that it becomes flue gas (the flue gas mainly comprises hydrogen chloride gas, silicon dioxide particles, carbon dioxide and the like); 2) preheating boiler recovery: the high-temperature flue gas is subjected to heat recovery through a preheating recovery boiler, so that the temperature of the flue gas is reduced to about 250 DEG C, and saturated steam is generated at the same time; 3) quenching tower cooling: the temperature of the flue gas after waste heat recovery is still relatively high, and the flue gas temperature is further reduced to about 60 DEG C by using hydrochloric acid wet spraying for cooling through a quenching tower; 4) wet spraying dust removal: after the flue gas from the quenching tower is subjected to wet spraying dust removal by circulating dilute acid, most of the silicon dioxide particles are separated from the flue gas; 5) HCL absorption: the flue gas after dust removal is further subjected to HCl absorption by circulating dilute hydrochloric acid, and the dilute hydrochloric acid obtained can be recycled and reused, and the flue gas also reaches the corresponding emission standard. Although the method can obtain part of the recyclable dilute acid, the solid content in the dilute acid is relatively high, so the recycling and reuse value is relatively low; in addition, the silicon dioxide particles obtained by incineration are defined as hazardous waste, which still needs to be treated. CONTENT OF THE UTILITY MODEL

[0003] The utility model aims at providing a device for producing silicon dioxide by using organic silicon waste gas and waste liquid, and solving the above problems existing in the current organic silicon waste gas and waste liquid treatment process.

[0004] To achieve the above-mentioned purpose, the utility model adopts the following technical scheme:

[0005] An apparatus for producing silica from organosilicon waste gas and liquid includes a waste liquid evaporator, a high-temperature hydrolysis reactor, a gas-solid separator, a surface processor, and a hydrochloric acid absorption tower. The waste liquid evaporator is connected to the high-temperature hydrolysis reactor via a pipeline. A natural gas inlet, a compressed air inlet, and an organosilicon waste gas inlet are provided on the pipeline between the waste liquid evaporator and the high-temperature hydrolysis reactor. The high-temperature hydrolysis reactor is connected to the gas-solid separator, which has a gas outlet and a solid outlet. The gas outlet is connected to the hydrochloric acid absorption tower, and the solid outlet is connected to the surface processor. A mixed gas and silica particles obtained from the reaction in the high-temperature hydrolysis reactor enter the gas-solid separator. The mixed gas enters the hydrochloric acid absorption tower through the exhaust port, and the silica particles enter the surface processor.

[0006] Furthermore, the surface processor includes a processing chamber and a heating chamber. The processing chamber is located at the upper end of the heating chamber. The processing chamber has a silica particle inlet, a silica particle outlet, a surface treatment gas inlet, and an exhaust port. The surface treatment gas inlet is located at the bottom of the processing chamber. The heating chamber is connected to the surface treatment gas inlet. The heating chamber is used to introduce heated surface treatment gas. The surface treatment gas entering the processing chamber through the surface treatment gas inlet mixes with the silica particles to treat the silica particles.

[0007] Furthermore, a spiral airflow dispersion disk is provided on the top of the heating chamber. The surface treatment gas entering the processing chamber through the spiral airflow dispersion disk forms a spiral airflow to spirally stir the silica particles in the processing chamber.

[0008] Furthermore, the spiral airflow dispersion disk has multiple spiral blades, and each spiral blade is arranged at intervals along the circumference of the spiral airflow dispersion disk.

[0009] Furthermore, a heater is provided in the heating chamber.

[0010] Furthermore, the hydrochloric acid absorption tower is connected to a tail gas scrubbing tower.

[0011] The beneficial effects of this utility model are:

[0012] This invention relates to an apparatus for producing silica from organosilicon waste gas and liquid. The waste liquid is vaporized by an evaporator and mixed with organosilicon waste gas before entering a high-temperature hydrolysis reactor for reaction. The gaseous reaction ensures a more complete and uniform reaction, resulting in silica particles with a more uniform particle size. A gas-solid separator separates the silica particles from the mixed gas, preventing them from entering subsequent gas absorption equipment. This significantly reduces the solid content of the hydrochloric acid obtained from absorbing hydrogen chloride gas, improving the recycling value of the hydrochloric acid. Simultaneously, a surface processor collects and processes the separated silica to obtain marketable filler-grade silica. Attached Figure Description

[0013] Fig. 1 This is a schematic diagram of the device for producing silicon dioxide from organosilicon waste gas and waste liquid according to this utility model;

[0014] Fig. 2 This is a schematic diagram of the surface processor in the device for producing silicon dioxide using organosilicon waste gas and waste liquid of this utility model;

[0015] Fig. 3 This is a schematic diagram of the spiral airflow dispersion disc in the device for producing silicon dioxide using organosilicon waste gas and waste liquid.

[0016] The names corresponding to each mark in the diagram:

[0017] 1-Waste liquid evaporator, 2-High temperature hydrolysis reactor, 3-Gas-solid separator, 4-Surface processor, 5-Hydrochloric acid absorption tower, 6-Processing chamber, 7-Heating chamber, 8-Silica particle inlet, 9-Silica particle outlet, 10-Surface treatment gas inlet, 11-Exhaust port, 12-Heater, 13-Spiral airflow dispersion plate, 14-Spiral blade, 15-Tail gas scrubbing tower. Detailed Implementation

[0018] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention.

[0019] This invention provides a device for producing silicon dioxide from organosilicon waste gas and waste liquid, the structure of which is as follows: Figs. 1-3 As shown, it includes a waste liquid evaporator 1, a high-temperature hydrolysis reactor 2, a gas-solid separator 3, a surface processor 4, and a hydrochloric acid absorption tower 5.

[0020] Waste liquid evaporator 1 and high-temperature hydrolysis reactor 2 are connected by pipelines, which are equipped with natural gas inlets, compressed air inlets, and organosilicon waste gas inlets. These inlets are used to supply mixed gas to waste liquid evaporator 1 and high-temperature hydrolysis reactor 2. After the waste liquid evaporator 1 evaporates and vaporizes the organosilicon waste liquid, it mixes with the organosilicon waste gas to form a first mixed gas. The first mixed gas, together with natural gas and compressed air, enters high-temperature hydrolysis reactor 2 for reaction.

[0021] The high-temperature hydrolysis reactor 2 is connected to the gas-solid separator 3, which has a gas outlet and a solid outlet. The reaction in the high-temperature hydrolysis reactor 2 produces a mixed gas and silica particles, which are then separated in the gas-solid separator 3. The mixed gas enters the hydrochloric acid absorption tower 5 through the gas outlet, while the silica particles enter the surface processor 4 through the solid outlet.

[0022] It should be noted that the high-temperature hydrolysis reactor 2 is existing technology, and its structure will not be described in detail here.

[0023] The surface processor 4 includes a processing chamber 6 and a heating chamber 7, with the processing chamber 6 located at the upper end of the heating chamber 7. The processing chamber 6 has a silica particle inlet 8 (connected to a solid outlet), a silica particle outlet 9, a surface treatment gas inlet 10, and an exhaust port 11. The gas inlet is located at the bottom of the processing chamber 6, and the heating chamber 7 is connected to the surface treatment gas inlet 10. A heater 12 is installed in the heating chamber 7 to heat the surface treatment gas. The heated surface treatment gas enters the processing chamber 6 through the surface treatment gas inlet 10, mixes with the silica particles, and treats the silica particles. The heated surface treatment gas can remove acidic substances and impurities adhering to the silica surface, resulting in treated silica that is filler-grade and can be sold directly.

[0024] To further improve the treatment effect, a spiral airflow dispersion disk 13 is provided on the top of the heating chamber 7. The spiral airflow dispersion disk 13 has multiple spiral blades 14, which are spaced apart circumferentially along the spiral airflow dispersion disk 13. The surface treatment gas entering the treatment chamber 6 through the spiral airflow dispersion disk 13 forms a spiral airflow, which spirally stirs the silica particles in the treatment chamber 6, thereby enhancing the treatment effect.

[0025] The mixed gas absorbs hydrogen chloride in the hydrochloric acid absorption tower 5 to obtain clean hydrochloric acid that can be recycled. In addition, the hydrochloric acid absorption tower 5 is also connected to the tail gas scrubbing tower 15 for further treatment of the tail gas discharged from the hydrochloric acid absorption tower 5. The exhaust gas is also transformed into tail gas that meets the emission standards, ensuring that the emitted tail gas meets environmental protection requirements.

[0026] Through the above specific embodiments, the device for producing silicon dioxide using organosilicon waste gas and waste liquid provided by this utility model can effectively treat organosilicon waste gas and waste liquid and produce high-quality silicon dioxide products. At the same time, it achieves effective treatment of waste gas and achieves the dual goals of environmental protection and economic benefits.

[0027] Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of this utility model are within the protection scope of this utility model.

Claims

1. An apparatus for producing silicon dioxide from organosilicon waste gas and waste liquid, characterized in that: The system includes a waste liquid evaporator, a high-temperature hydrolysis reactor, a gas-solid separator, a surface processor, and a hydrochloric acid absorption tower. The waste liquid evaporator and the high-temperature hydrolysis reactor are connected by a pipeline. The pipeline between the waste liquid evaporator and the high-temperature hydrolysis reactor is equipped with a natural gas inlet, a compressed air inlet, and an organosilicon waste gas inlet. The high-temperature hydrolysis reactor is connected to the gas-solid separator, which has a gas outlet and a solid outlet. The gas outlet is connected to the hydrochloric acid absorption tower, and the solid outlet is connected to the surface processor. The mixed gas and silica particles obtained by the reaction in the high-temperature hydrolysis reactor enter the gas-solid separator. The mixed gas enters the hydrochloric acid absorption tower through the gas outlet, and the silica particles enter the surface processor.

2. The apparatus for producing silicon dioxide from organosilicon waste gas and waste liquid according to claim 1, characterized in that: The surface processor includes a processing chamber and a heating chamber. The processing chamber is located at the upper end of the heating chamber. The processing chamber has a silica particle inlet, a silica particle outlet, a surface treatment gas inlet, and an exhaust port. The surface treatment gas inlet is located at the bottom of the processing chamber. The heating chamber is connected to the surface treatment gas inlet. The heating chamber is used to introduce heated surface treatment gas. The surface treatment gas entering the processing chamber through the surface treatment gas inlet mixes with the silica particles to treat the silica particles.

3. The apparatus for producing silicon dioxide from organosilicon waste gas and waste liquid according to claim 2, characterized in that: The top of the heating chamber is equipped with a spiral airflow dispersion disk. The surface treatment gas entering the processing chamber through the spiral airflow dispersion disk forms a spiral airflow to spirally stir the silica particles in the processing chamber.

4. The apparatus for producing silicon dioxide from organosilicon waste gas and waste liquid according to claim 3, characterized in that: The spiral airflow dispersion disk has multiple spiral blades, and each spiral blade is arranged at intervals along the circumference of the spiral airflow dispersion disk.

5. The apparatus for producing silicon dioxide from organosilicon waste gas and waste liquid according to claim 4, characterized in that: The heating chamber is equipped with a heater.

6. The apparatus for producing silicon dioxide from organosilicon waste gas and waste liquid according to claim 1, characterized in that: The hydrochloric acid absorption tower is connected to a tail gas scrubbing tower.

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