Monocrystalline silicon wafer cleaning device

By introducing limiting components and brushing components into the monocrystalline silicon wafer cleaning device, double-sided brushing and drying of monocrystalline silicon wafers are achieved, solving the problem of poor cleaning effect of existing devices, improving the cleaning effect and adding drying function.

CN224114647UActive Publication Date: 2026-04-14TIANJIN ZHONGJING SEMICON MATERIALS CO LTD
View PDF 1 Cites 0 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
TIANJIN ZHONGJING SEMICON MATERIALS CO LTD
Filing Date
2025-05-06
Publication Date
2026-04-14

AI Technical Summary

Technical Problem

Existing monocrystalline silicon wafer cleaning devices only use water spray nozzles for rinsing, resulting in poor cleaning performance.

Method used

A cleaning device including a limiting component and a washing component is designed, which can wash both sides of a monocrystalline silicon wafer and is equipped with a drying component for drying.

Benefits of technology

It improves the cleaning effect of monocrystalline silicon wafers and has a drying function, which significantly improves the practicality of the cleaning device.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN224114647U_ABST
    Figure CN224114647U_ABST
Patent Text Reader

Abstract

The utility model discloses a monocrystalline silicon wafer cleaning device which comprises a cleaning box, a first moving piece is installed on the side face of the cleaning box, and the first moving piece comprises a connecting base, a first telescopic hydraulic cylinder, a first supporting plate and a sliding column. The water outlet box is installed at the end of the first telescopic hydraulic cylinder through a first connecting sleeve and a first screw, and the upper portion of the water outlet box is connected with a corrugated pipe through a sleeve; the second moving part is installed on the side face of the cleaning box, and the second moving part comprises a second telescopic hydraulic cylinder, a connecting plate, a second supporting plate and a sliding rail; the limiting piece is installed above the second supporting plate through a first bolt, and the limiting piece comprises a limiting plate, a limiting rod and a butt joint block; and the washing part is mounted above the second supporting plate. The double faces of the monocrystalline silicon wafer can be brushed, and the cleaning effect of the monocrystalline silicon wafer can be improved.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] This utility model relates to the field of cleaning devices, specifically to a single-crystal silicon wafer cleaning device. Background Technology

[0002] After grinding, monocrystalline silicon wafers require a cleaning device to remove surface contaminants. For example, patent application number 201621335852.7 discloses a single-wafer cleaning device for monocrystalline silicon wafers, comprising a water tank, a cleaning rack, baffles, and water nozzles. The cleaning rack, which is a long, box-shaped structure, has several through holes at its bottom. Several baffles are evenly distributed on the two inner side walls of the cleaning rack. A water nozzle, which is square, is slidably connected to the top of the cleaning rack and has a water pipe connected to its top. This device offers the following advantages: it avoids overlapping of monocrystalline silicon wafers and provides high cleaning quality.

[0003] However, the patent still has the following drawbacks: the cleaning device only uses water spray from the nozzle to rinse the monocrystalline silicon wafer, resulting in a mediocre cleaning effect. Utility Model Content

[0004] In view of the above-mentioned defects or deficiencies in the prior art, it is desirable to provide a single-crystal silicon wafer cleaning device that can brush and clean both sides of the single-crystal silicon wafer, thereby improving the cleaning effect of the single-crystal silicon wafer.

[0005] According to the technical solution provided by the embodiments of this utility model, a single-crystal silicon wafer cleaning device includes a cleaning tank. A first movable component is installed on the side of the cleaning tank. The first movable component includes a connecting seat, a first telescopic hydraulic cylinder, a first support plate, and a sliding column. The cleaning tank has an open-top structure. A drain pipe is fixedly connected to the lower right side of the cleaning tank. A valve is installed on the drain pipe. The connecting seat is fixedly installed on the side of the cleaning tank. The first telescopic hydraulic cylinder is installed on the side of the connecting seat by a first screw. The sliding column is fixedly connected to the side of the first support plate. The column slides in contact with the connecting seat. The side of the connecting seat has a first sliding through hole corresponding to the sliding column. The sliding column passes through the first sliding through hole. A water outlet box is installed at the end of the first telescopic hydraulic cylinder via a first connecting sleeve and a first screw. A corrugated pipe is connected to the top of the water outlet box via a sleeve. The first support plate is connected to the water outlet box via a second bolt. A connector is fixedly installed on the top of the water outlet box. Water outlet holes are spaced apart at the bottom of the water outlet box. A second moving part is installed on the side of the cleaning tank. The system includes a second telescopic hydraulic cylinder, a connecting plate, a second support plate, and a slide rail. The second telescopic hydraulic cylinder is mounted on the front side of the cleaning tank via a second screw. The connecting plate is mounted on the end of the second telescopic hydraulic cylinder via a second connecting sleeve and a second screw. The second support plate is fixedly connected to the connecting plate. The slide rail is fixedly installed inside the cleaning tank, and the second support plate is slidably connected to the slide rail. A limiting member is mounted above the second support plate via a first bolt. The limiting member includes a limiting plate, a limiting rod, and a connecting block. The water outlet is located on the limiting member. Above, the limiting plate includes a frame and a horizontal bar. The horizontal bar is installed at intervals inside the frame. The sides of the frame and the horizontal bar are provided with slots. The limiting bar abuts against the side of the limiting plate. The connecting block is fixedly installed on the side of the limiting bar. The connecting block is connected to the limiting plate by a third bolt. Below, an installation block and a washing brush are fixedly installed on the side of the frame. The washing brush is installed above the second support plate. The washing brush includes a fixing block, a waterproof cover, a motor, a screw, a screw sleeve, a guide rod, a sliding sleeve, an assembly rod, a first washing brush, and a second washing brush.The fixing block is fixedly installed above the second support plate. The waterproof cover is fixedly installed on the side of one side of the fixing block. The motor is fixedly installed inside the waterproof cover. The output shaft of the motor is connected to the waterproof cover through a rotary sealing ring. The output shaft of the motor is connected to the screw through a coupling. The screw is connected to the left-side fixing block through a waterproof bearing. The screw sleeve is screwed onto the outside of the screw. The guide rod is fixedly connected to the right-side fixing block. The sliding sleeve is slidably installed on the outside of the guide rod. The assembly rod is fixedly installed on the outside of the screw sleeve and the sliding sleeve. The first cleaning brush is connected to the assembly rod through a fourth bolt. The second cleaning brush is connected to the assembly rod through a fifth bolt. The bristles of both the first and second cleaning brushes are in contact with the monocrystalline silicon wafer. A locking block is fixedly installed at the end of both the first and second cleaning brushes, and the locking block is located on the outside of the assembly rod. A drying component is mounted above the cleaning chamber using countersunk screws. The drying component includes a ventilation box, an air outlet pipe, an elbow, a fan, an end ring, and a straight-line heating element. The ventilation box is mounted above the cleaning chamber using countersunk screws and has an internal ventilation cavity. Mounting strips are fixedly mounted on both sides of the ventilation box. The air outlet pipe is spaced apart below the ventilation box. The elbow is mounted above the ventilation box using a third screw. A first mounting ring is fixedly mounted on the outer side of the elbow, and a second and third mounting rings are fixedly mounted inside the elbow. The fan is mounted on the side of the second mounting ring using a fourth screw. The end ring is mounted on the side of the third mounting ring using a fifth screw. The straight-line heating element is fixedly connected to the side of the end ring. The ventilation box has a first connecting hole corresponding to the elbow and a second connecting hole corresponding to the air outlet pipe.

[0006] In summary, the beneficial effects of this utility model are as follows:

[0007] 1. By setting up limiting components and washing components, both sides of the monocrystalline silicon wafer can be washed, which can improve the cleaning effect of the monocrystalline silicon wafer.

[0008] 2. With the addition of a second moving part and a drying part, the monocrystalline silicon wafer can be dried, giving this product a drying function, which is very practical. Attached Figure Description

[0009] Other features, objects, and advantages of this invention will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings:

[0010] Figure 1 This is a schematic diagram of the structure of this utility model;

[0011] Figure 2 This is a top view of the connection between the end ring and the straight heating element of this utility model.

[0012] Figure 3 This is a top view of the connection between the cleaning box, the second moving part, the limiting part, the washing part, and the monocrystalline silicon wafer of this utility model.

[0013] Figure 4 This is a top view of the connection between the brush and the locking block of this utility model.

[0014] Figure 5 This is a schematic diagram of the structure at the connection between the limiting component and the monocrystalline silicon wafer of this utility model;

[0015] Figure 6 This is a schematic diagram of the structure of the drying component of this utility model;

[0016] Figure 7 This is a side view of the card block structure of this utility model.

[0017] The following components are labeled in the diagram: 1. Cleaning box; 2. First moving part; 3. Connecting seat; 4. First telescopic hydraulic cylinder; 5. First support plate; 6. Sliding column; 7. Water outlet box; 8. Bellows; 9. Second moving part; 10. Second telescopic hydraulic cylinder; 11. Connecting plate; 12. Second support plate; 13. Slide rail; 14. Limiting component; 15. Limiting plate; 16. Limiting rod; 17. Connecting block; 18. Washing brush; 19. Fixing block; 20. Waterproof cover; 21. Motor; 22. Screw; 23. Screw sleeve; 24. Guide rod; 25. Sliding sleeve; 26. Assembly rod; 27. First cleaning brush; 28. Second cleaning brush; 29. ​​Drying component; 30. Ventilation box; 31. Air outlet pipe; 32. Elbow; 33. Fan; 34. End ring; 35. I-shaped electric heating tube; 36. Monocrystalline silicon wafer; 37. Locking block. Detailed Implementation

[0018] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, only the parts relevant to the invention are shown in the accompanying drawings.

[0019] It should be noted that, where there is no conflict, the embodiments and features in the embodiments of this utility model can be combined with each other. The present utility model will now be described in detail with reference to the accompanying drawings and embodiments.

[0020] Please refer to Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 5 , Figure 6 and Figure 7 A single-crystal silicon wafer cleaning device includes a cleaning tank 1, a first movable component 2 mounted on the side of the cleaning tank 1, the first movable component 2 including a connecting seat 3, a first telescopic hydraulic cylinder 4, a first support plate 5, and a sliding column 6; a water outlet box 7, the water outlet box 7 being mounted on the end of the first telescopic hydraulic cylinder 4 via a first connecting sleeve and a first screw, and a corrugated pipe 8 being connected to the top of the water outlet box 7 via a sleeve; a second movable component 9, the second movable component 9 being mounted on the side of the cleaning tank 1, the second movable component 9 including a second telescopic hydraulic cylinder 10, a connecting plate 11, a second support plate 12, and a sliding rail 13; and a limiting component 14, the limiting component 14 being connected by a first connecting sleeve and a first screw. Bolts are installed above the second support plate 12. The limiting component 14 includes a limiting plate 15, a limiting rod 16, and a connecting block 17. A washing component 18 is installed above the second support plate 12. The washing component 18 includes a fixing block 19, a waterproof cover 20, a motor 21, a screw 22, a screw sleeve 23, a guide rod 24, a sliding sleeve 25, an assembly rod 26, a first cleaning brush 27, and a second cleaning brush 28. A drying component 29 is installed above the cleaning box 1 by countersunk screws. The drying component 29 includes a ventilation box 30, an air outlet pipe 31, an elbow 32, a fan 33, an end ring 34, and a straight electric heating tube 35.

[0021] like Figure 1 and Figure 3 As shown, the cleaning tank 1 has an open top structure. A drain pipe is fixedly connected to the lower right side of the cleaning tank 1 for convenient sewage discharge. A valve is installed on the drain pipe. The connecting seat 3 is fixedly installed on the side of the cleaning tank 1. The first telescopic hydraulic cylinder 4 is installed on the side of the connecting seat 3 by a first screw. The sliding column 6 is fixedly connected to the side of the first support plate 5. The sliding column 6 is in sliding contact with the connecting seat 3. The side of the connecting seat 3 is provided with a first sliding through hole corresponding to the sliding column 6. The sliding column 6 passes through the first sliding through hole. The first support plate 5 is connected to the water outlet box 7 by a second bolt.

[0022] like Figure 1 , Figure 3 and Figure 5As shown, a connector is fixedly installed on the top of the water outlet box 7 for easy connection with the corrugated pipe 8. Water outlet holes are spaced apart at the bottom of the water outlet box 7, and these holes are located above the limiting member 14. The second telescopic hydraulic cylinder 10 is installed on the front side of the cleaning tank 1 via a second screw. The connecting plate 11 is installed on the end of the second telescopic hydraulic cylinder 10 via a second connecting sleeve and a second screw. The second support plate 12 is fixedly connected to the connecting plate 11. The slide rail 13 is fixedly installed inside the cleaning tank 1, and the second support plate 12 is slidably connected to the slide rail 13. A control panel is installed on the front side of the cleaning tank 1. The first telescopic hydraulic cylinder 4, the second telescopic hydraulic cylinder 10, the motor 21, the fan 33, and the straight-line electric heating tube 35 are electrically connected to the control panel for convenient control.

[0023] like Figure 1 , Figure 3 , Figure 4 and Figure 7 As shown, the limiting plate 15 includes a frame and a horizontal bar. The horizontal bar is installed at intervals inside the frame. Both the frame and the horizontal bar have slots on their sides. The limiting rod 16 abuts against the side of the limiting plate 15. The connecting block 17 is fixedly installed on the side of the limiting rod 16. The connecting block 17 is connected to the limiting plate 15 by a third bolt. An installation block is fixedly installed on the side of the lower frame to facilitate the installation of the limiting component 14. The fixing block 19 is fixedly installed above the second support plate 12. The waterproof cover 20 is fixedly installed on the side of one side of the fixing block 19. The motor 21 is fixedly installed inside the waterproof cover 20. The output shaft of the motor 21 is connected to the waterproof cover 20 through a rotating sealing ring. The output shaft of the motor 21 is connected to the screw 22 through a coupling. The screw 22 is connected to the left fixing block 19 through a waterproof bearing. The screw sleeve 23 is screwed onto the outside of the screw 22. The guide rod 24 is fixedly connected to the right fixing block 19. The sliding sleeve 25 is slidably installed on the guide rod 24. On the outside of 4, the assembly rod 26 is fixedly installed on the outside of the screw sleeve 23 and the sliding sleeve 25. The first cleaning brush 27 is connected to the assembly rod 26 by the fourth bolt, and the second cleaning brush 28 is connected to the assembly rod 26 by the fifth bolt. The bristles of the first cleaning brush 27 and the second cleaning brush 28 are in contact with the monocrystalline silicon wafer 36, which can clean the monocrystalline silicon wafer 36. The ends of the first cleaning brush 27 and the second cleaning brush 28 are fixedly installed with a locking block 37, which facilitates the installation of the first cleaning brush 27 and the second cleaning brush 28. The locking block 37 is located on the outside of the assembly rod 26.

[0024] like Figure 1 , Figure 2 and Figure 6As shown, the ventilation box 30 is installed above the cleaning box 1 by countersunk screws. The ventilation box 30 has a ventilation cavity inside. Mounting strips are fixedly installed on both the left and right sides of the ventilation box 30 to facilitate the installation of the ventilation box 30. The air outlet pipe 31 is installed at intervals below the ventilation box 30. The elbow 32 is installed above the ventilation box 30 by a third screw. A first mounting ring is fixedly installed on the outside of the elbow 32 to facilitate the installation of the elbow 32. A second mounting ring and a third mounting ring are fixedly installed inside the elbow 32. The fan 33 is installed on the side of the second mounting ring by a fourth screw. The end ring 34 is installed on the side of the third mounting ring by a fifth screw. The straight electric heating tube 35 is fixedly connected to the side of the end ring 34. The ventilation box 30 has a first connecting hole corresponding to the elbow 32 and a second connecting hole corresponding to the air outlet pipe 31.

[0025] In use: First, connect the corrugated pipe 8 to the water pipe and the drain pipe to the sewage pipe. Then, unscrew the third bolt on the front side, remove the limiting rod 16 on the front side of the limiting member 14, insert the monocrystalline silicon wafer 36 into the slot of the limiting plate 15, and then install the limiting rod 16 and the third bolt on the front side to complete the fixation of the monocrystalline silicon wafer 36. Then, open the valve on the water pipe, and water will flow out through the outlet hole of the water outlet box 7. At the same time, start the first telescopic hydraulic cylinder 4 of the first moving member 2, which can drive the first support plate 5 and the water outlet box 7 to move back and forth. The water will flow to the monocrystalline silicon wafer 36, and start the motor 21 of the washing member 18. The motor 21 can drive the screw 22 to rotate, and the screw 22 can drive the screw sleeve 23. The assembly rod 26, sliding sleeve 25, locking block 37, first cleaning brush 27 and second cleaning brush 28 move back and forth, which can brush both sides of the monocrystalline silicon wafer 36, improving the cleaning effect of the monocrystalline silicon wafer 36. After cleaning, the second telescopic hydraulic cylinder 10 of the second moving part 9 is activated, which can drive the second support plate 12 to move the limiting part 14 to the bottom of the drying part 29. Then the fan 33 is activated, and the straight electric heating tube 35 can heat the air blown by the fan 33. Then this hot air will be blown to the monocrystalline silicon wafer 36 through the ventilation box 30 and the air outlet 31, which can dry the monocrystalline silicon wafer 36. This gives the product a drying function, which is very practical.

[0026] The above description is merely a preferred embodiment of this utility model and an explanation of the technical principles and solutions employed. Furthermore, the scope of this invention is not limited to the specific combinations of the above-described technical features, but also includes other technical solutions formed by arbitrary combinations of the above-described technical features or their equivalents without departing from the inventive concept. For example, technical solutions formed by substituting the above-described features with (but not limited to) technical features with similar functions disclosed in this utility model.

Claims

1. A single-crystal silicon wafer cleaning device, characterized in that: The cleaning box (1) is included, and a first moving part (2) is installed on the side of the cleaning box (1). The first moving part (2) includes a connecting seat (3), a first telescopic hydraulic cylinder (4), a first support plate (5) and a sliding column (6). Water outlet box (7), the water outlet box (7) is installed at the end of the first telescopic hydraulic cylinder (4) through the first connecting sleeve and the first screw, and a corrugated pipe (8) is connected above the water outlet box (7) through a sleeve; The second moving part (9) is installed on the side of the cleaning tank (1). The second moving part (9) includes a second telescopic hydraulic cylinder (10), a connecting plate (11), a second support plate (12), and a slide rail (13). The limiting member (14) is installed above the second support plate (12) by a first bolt. The limiting member (14) includes a limiting plate (15), a limiting rod (16), and a docking block (17). A washing brush (18) is installed above the second support plate (12). The washing brush (18) includes a fixing block (19), a waterproof cover (20), a motor (21), a screw (22), a screw sleeve (23), a guide rod (24), a sliding sleeve (25), an assembly rod (26), a first cleaning brush (27), and a second cleaning brush (28). The drying component (29) is installed above the cleaning box (1) by countersunk screws. The drying component (29) includes a ventilation box (30), an air outlet pipe (31), an elbow (32), a fan (33), an end ring (34), and a straight electric heating tube (35).

2. The single-crystal silicon wafer cleaning device according to claim 1, characterized in that: The cleaning tank (1) has an open top structure. A drain pipe is fixedly connected to the lower right side of the cleaning tank (1), and a valve is installed on the drain pipe.

3. The single-crystal silicon wafer cleaning device according to claim 1, characterized in that: The connecting seat (3) is fixedly installed on the side of the cleaning tank (1). The first telescopic hydraulic cylinder (4) is installed on the side of the connecting seat (3) by the first screw. The sliding column (6) is fixedly connected to the side of the first support plate (5). The sliding column (6) is in sliding contact with the connecting seat (3). The side of the connecting seat (3) is provided with a first sliding through hole corresponding to the sliding column (6). The sliding column (6) passes through the first sliding through hole. The first support plate (5) is connected to the water outlet box (7) by the second bolt.

4. The single-crystal silicon wafer cleaning device according to claim 1, characterized in that: A connector is fixedly installed on the top of the water outlet box (7), and water outlet holes are provided at intervals on the bottom of the water outlet box (7), with the water outlet holes located above the limiting member (14).

5. The single-crystal silicon wafer cleaning device according to claim 1, characterized in that: The second telescopic hydraulic cylinder (10) is installed on the front side of the cleaning tank (1) by the second screw. The connecting plate (11) is installed on the end of the second telescopic hydraulic cylinder (10) by the second connecting sleeve and the second screw. The second support plate (12) is fixedly connected to the connecting plate (11). The slide rail (13) is fixedly installed inside the cleaning tank (1). The second support plate (12) is slidably connected to the slide rail (13).

6. The single-crystal silicon wafer cleaning device according to claim 1, characterized in that: The limiting plate (15) includes a frame and a horizontal bar. The horizontal bar is installed at intervals inside the frame. The sides of the frame and the horizontal bar are provided with slots. The limiting bar (16) abuts against the side of the limiting plate (15). The connecting block (17) is fixedly installed on the side of the limiting bar (16). The connecting block (17) is connected to the limiting plate (15) by a third bolt. An installation block is fixedly installed on the side of the frame below.

7. The single-crystal silicon wafer cleaning device according to claim 1, characterized in that: The fixing block (19) is fixedly installed above the second support plate (12), the waterproof cover (20) is fixedly installed on the side of one side of the fixing block (19), the motor (21) is fixedly installed inside the waterproof cover (20), the output shaft of the motor (21) is connected to the waterproof cover (20) through a rotating sealing ring, the output shaft of the motor (21) is connected to the screw (22) through a coupling, the screw (22) is connected to the left fixing block (19) through a waterproof bearing, the screw sleeve (23) is screwed onto the outside of the screw (22), and the guide rod (24) is fixedly connected to the right fixing block (19). The sliding sleeve (25) is slidably mounted on the outside of the guide rod (24), and the assembly rod (26) is fixedly mounted on the outside of the screw sleeve (23) and the sliding sleeve (25). The first cleaning brush (27) is connected to the assembly rod (26) by the fourth bolt, and the second cleaning brush (28) is connected to the assembly rod (26) by the fifth bolt. The bristles of the first cleaning brush (27) and the second cleaning brush (28) are in contact with the monocrystalline silicon wafer (36). The ends of the first cleaning brush (27) and the second cleaning brush (28) are fixedly mounted with a locking block (37), and the locking block (37) is located on the outside of the assembly rod (26).

8. The single-crystal silicon wafer cleaning device according to claim 1, characterized in that: The ventilation box (30) is installed above the cleaning box (1) by the countersunk screw. The ventilation box (30) has a ventilation cavity inside. Mounting strips are fixedly installed on both the left and right sides of the ventilation box (30). The air outlet pipe (31) is installed at intervals below the ventilation box (30). The elbow (32) is installed above the ventilation box (30) by the third screw. A first mounting ring is fixedly installed on the outside of the elbow (32). A second mounting ring and a third mounting ring are fixedly installed inside the elbow (32). The fan (33) is installed on the side of the second mounting ring by the fourth screw. The end ring (34) is installed on the side of the third mounting ring by the fifth screw. The straight electric heating tube (35) is fixedly connected to the side of the end ring (34). The ventilation box (30) has a first connecting hole corresponding to the elbow (32). The ventilation box (30) has a second connecting hole corresponding to the air outlet pipe (31).

Citation Information

Patent Citations

  • Abluent monocrystalline silicon piece belt cleaning device of monolithic

    CN206296236U