Carbon nanotube processing chemical vapor deposition device

Abstract

The utility model discloses a carbon nanotube processing chemical vapor deposition device which comprises a device case and a chemical reaction box arranged at the top end of the device case, the front end of the chemical reaction box is provided with an opening, a heat insulation lining is fixed on the inner wall of the chemical reaction box, a heat insulation box door is arranged at the front end of the chemical reaction box, and the heat insulation box door is connected with the heat insulation lining. Connection type adjustable protection devices are additionally arranged at the left end, the right end and the front end of the device case of the carbon nanotube processing chemical vapor deposition device, when the device is not used, the protection devices are arranged outside the case, and when the device is used, the protection devices can slide upwards to the proper height; the device can prevent reactants from splashing or leaking to hurt operators, prevent external objects from colliding with a case and internal equipment, prolong the service life of the equipment, can flexibly change the protection position and height according to different scenes due to the adjustable characteristic, enhances the applicability and universality, and improves the overall performance and practicability of the device.

Description

Technical Field

[0001] This utility model belongs to the field of materials science and engineering, and specifically relates to a chemical vapor deposition apparatus for carbon nanotube processing. Background Technology

[0002] In the field of carbon nanotube processing, chemical vapor deposition (CVD) equipment is a crucial tool, enabling the production of high-quality carbon nanotubes through chemical reactions under specific conditions. However, existing CVD equipment still faces several challenges in practical applications. For instance, during operation, CVD reactions often involve high temperatures, high pressures, and the use of potentially hazardous chemicals. This can lead to reactant splashes and leaks, posing a threat to operator safety. Traditional protective measures are mostly fixed structures, unable to flexibly adjust the protective position and height according to different operating scenarios and actual needs, thus failing to provide comprehensive and effective protection. Furthermore, the equipment may be subject to accidental collisions with external objects during daily placement and operation. Due to the lack of effective protective structures, the equipment's casing and internal precision components are easily damaged by impacts, affecting normal equipment operation, potentially leading to high maintenance costs and downtime, and reduced production efficiency. Utility Model Content

[0003] The purpose of this invention is to provide a chemical vapor deposition (CVD) device for carbon nanotube processing, in order to solve the problems mentioned in the background art, such as the high temperature, high pressure and hazardous chemicals involved in the CVD process, the easy occurrence of reactant splashing and leakage, which threatens personnel safety, the difficulty of meeting the requirements of traditional fixed protection, and the vulnerability of the device to external impacts, which can affect operation, increase costs and reduce production efficiency.

[0004] To achieve the above objectives, this utility model provides the following technical solution: a carbon nanotube processing chemical vapor deposition apparatus, comprising an apparatus chassis and a chemical reaction chamber disposed at the top of the apparatus chassis. The front end of the chemical reaction chamber is open, and a heat-insulating liner is fixed to the inner wall of the chemical reaction chamber. A heat-insulating door is disposed at the front end of the chemical reaction chamber, and the left end of the heat-insulating door is rotatably connected to the chemical reaction chamber via a hinge, and the heat-insulating door can rotate at an angle greater than 120 degrees via the hinge. A gas supply box is disposed at the left end of the chemical reaction chamber, and a catalyst supply box is disposed at the top of the chemical reaction chamber. Adjustable protective devices are connected to the left and right ends and the front end of the apparatus chassis.

[0005] Preferably, the adjustable protective device includes a T-slot lifting sleeve A, a T-shaped slide rail, a right protective plate, a mounting base, a front protective plate, a T-slot lifting sleeve B, and a left protective plate. T-shaped slide rails are fixed to the outer walls of the left and right ends of the four corners of the device housing. Multiple T-shaped slide rails are vertically arranged. T-slot lifting sleeves A are fitted onto the outside of the two T-shaped slide rails on the right end of the device housing. T-slot lifting sleeves B are fitted onto the outside of the two T-shaped slide rails on the left end of the device housing. A right protective plate is connected to the right end of the two T-slot lifting sleeves A. A left protective plate is connected to the left end of the two T-slot lifting sleeves B. A front protective plate is connected to the front end of the left and right protective plates. A mounting base is connected to the bottom ends of the two T-shaped slide rails on the right end and the two T-shaped slide rails on the left end of the device housing. The mounting base can block the T-slot lifting sleeves A and B.

[0006] Preferably, both the T-slot lifting sleeve A and the T-slot lifting sleeve B can move up and down outside the T-slot rail. The length of the T-slot rail is equal to the height of the device housing. The lengths of the T-slot lifting sleeve A and the T-slot lifting sleeve B are equal to the length of the T-slot rail. The front protective plate, the left protective plate, and the right protective plate are located on the front, left, and right sides of the device housing, respectively.

[0007] Preferably, the adjustable protective device further includes a height-locking block, a locking plate, and a rectangular movable hole. A height-locking block is provided at the center of the bottom front end of the front protective plate. The lower half of the height-locking block is exposed on the lower side of the bottom end of the front protective plate. A rectangular movable hole is provided inside the lower half of the height-locking block. A locking plate is inserted into the rectangular movable hole. The locking plate can move back and forth in the rectangular movable hole.

[0008] Preferably, after the front protective plate moves upward to the top of the device chassis, the locking plate moves backward to block the top of the device chassis. After the rear end of the locking plate blocks the top of the device chassis, it can prevent the T-slot lifting sleeve A and the T-slot lifting sleeve B from moving downward to the rear end outside the T-slot rail.

[0009] Preferably, a heat insulation mounting base is provided at the center of the inner wall of the heat insulation inner substrate, and a resistance heating cover is fixed at the top edge of the heat insulation mounting base, with the front end of the resistance heating cover being open.

[0010] Preferably, a reaction platform is provided at the top center of the heat insulation mounting base, the resistance heating cover is located outside the reaction platform, and multiple catalyst supply pipes are provided at the bottom of the catalyst supply box. The lower half of each catalyst supply pipe is vertically located on the upper side of the center inside the heat insulation lining, and the bottom of each catalyst supply pipe is aligned with the reaction platform.

[0011] Preferably, the device chassis has mounting feet at all four corners of the bottom, and a replacement and maintenance window is provided inside the front of the device chassis. The replacement and maintenance window has a replacement and maintenance door fixed inside by embedded screws.

[0012] Compared with the prior art, this utility model provides a chemical vapor deposition apparatus for carbon nanotube processing, which has the following beneficial effects:

[0013] This invention adds adjustable protective devices to the left and right ends and the front end of the carbon nanotube chemical vapor deposition (CVD) apparatus housing. When the apparatus is not in use, the adjustable protective devices are located outside the housing. When the apparatus is in use, the adjustable protective devices can be slid upwards to adjust to a suitable height. On the one hand, this adjustable protective device effectively prevents injury to operators from reactant splashes or leaks caused by accidents during the CVD process, providing reliable protection for personnel safety. On the other hand, the protective plates prevent accidental collisions between external objects and the housing and internal equipment, preventing damage from external impacts and extending the equipment's service life. Moreover, the adjustable feature allows the protective devices to flexibly change their position and height according to actual operational needs and different working scenarios, enhancing the applicability and versatility of the apparatus and greatly improving the overall performance and practicality of the CVD apparatus. Attached Figure Description

[0014] Figure 1 This is a front-view three-dimensional structural diagram of a chemical vapor deposition apparatus for carbon nanotube processing according to the present invention.

[0015] Figure 2 This is a front view schematic diagram of a chemical vapor deposition apparatus for carbon nanotube processing according to the present invention.

[0016] Figure 3 This is a right-side plan view of a chemical vapor deposition apparatus for carbon nanotube processing according to the present invention.

[0017] Figure 4 This is a three-dimensional structural diagram of the adjustable protective device of this utility model in its stored state.

[0018] Figure 5 This is a three-dimensional structural diagram of the adjustable protective device of this utility model in use.

[0019] In the diagram: 1. Mounting feet; 2. Equipment casing; 3. Replacement and maintenance door; 4. Adjustable protective device; 5. Insulated box door; 6. Chemical reaction chamber; 7. Insulated lining; 8. Resistance heating cover; 9. Gas supply box; 10. Catalyst supply box; 11. Reaction table; 12. Insulated mounting base; 13. Catalyst supply pipe; 14. T-slot lifting slide A; 15. T-slot slide rail; 16. Right protective plate; 17. Mounting base; 18. Front protective plate; 19. Height-fixing locking block; 20. Locking insert plate; 21. Rectangular movable hole; 22. T-slot lifting slide B; 23. Left protective plate. Detailed Implementation

[0020] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0021] This utility model provides, for example Figure 1-5 The carbon nanotube processing chemical vapor deposition apparatus shown includes a chassis 2 and a chemical reaction chamber 6 located at the top of the chassis 2. The front end of the chemical reaction chamber 6 is open, and an insulating liner 7 is fixed to the inner wall of the chemical reaction chamber 6. An insulating door 5 is located at the front end of the chemical reaction chamber 6, and the left end of the insulating door 5 is rotatably connected to the chemical reaction chamber 6 via a hinge, with the hinge allowing the insulating door 5 to rotate at an angle greater than 120 degrees. A gas supply box 9 is located at the left end of the chemical reaction chamber 6, and a catalyst supply box 10 is located at the top of the chemical reaction chamber 6. The chemical reaction chamber 6 is the core component of this apparatus; its open front end facilitates operation and material loading and unloading, and the insulating liner 7 on its inner wall effectively reduces heat loss and ensures the stability of the reaction environment. The hinge allows for flexible rotation, with an opening angle greater than 120 degrees, facilitating equipment maintenance and material placement. The gas supply box 9, located at the left end of the chemical reaction tank 6, continuously provides the necessary gaseous raw materials for the reaction. These gases participate in the reaction under specific conditions and are the material basis for the formation of carbon nanotubes. The device housing 2 has mounting feet 1 at each of the four corners at the bottom. The front of the device housing 2 has a replacement and maintenance window, with a replacement and maintenance door 3 fixed inside the window by embedded screws. The device housing 2 provides stable support for the entire system, the mounting feet 1 at the four corners at the bottom ensure the stability of the device, and the replacement and maintenance window at the front facilitates regular inspection, maintenance, and replacement of internal components by staff, ensuring that the device is always in good operating condition.

[0022] like Figure 1 , Figure 2 and Figure 3 As shown, a heat-insulating mounting base 12 is provided at the center of the bottom inner wall of the heat-insulating lining 7. A resistance heating cover 8 is fixed to the top edge of the heat-insulating mounting base 12, and the front end of the resistance heating cover 8 is open. The heat-insulating mounting base 12 is located at the center of the bottom inner wall of the heat-insulating lining 7, and the reaction platform 11 at its top is the "stage" for the generation of carbon nanotubes. The resistance heating cover 8 surrounds the outside of the reaction platform 11, converting electrical energy into heat energy to provide a suitable temperature environment for the reaction. A suitable temperature is one of the key factors for the smooth progress of the chemical reaction. It can promote the chemical reaction of gaseous raw materials on the reaction platform 11 under the action of a catalyst, and gradually deposit to form carbon nanotubes. The reaction platform 11 is provided at the center of the top of the heat-insulating mounting base 12, and the resistance heating cover 8 is also present. 8 is located outside the reaction platform 11. Multiple catalyst supply pipes 13 are provided at the bottom of the catalyst supply box 10. The lower half of each catalyst supply pipe 13 is vertically located on the upper side of the center inside the heat insulation liner 7, and the bottom of each catalyst supply pipe 13 is aligned with the reaction platform 11. The catalyst supply box 10 is installed at the top of the chemical reaction box 6. The catalyst is accurately delivered to the reaction platform 11 through the multiple catalyst supply pipes 13. The catalyst plays a key role in the synthesis of carbon nanotubes. It can reduce the activation energy of the reaction, accelerate the reaction rate, and improve the generation efficiency and quality of carbon nanotubes. The multiple catalyst supply pipes 13 are vertically aligned with the reaction platform 11 to ensure that the catalyst is evenly distributed in the reaction area, making the reaction more complete and stable.

[0023] like Figure 1 , Figure 4 and Figure 5As shown, adjustable protective devices 4 are connected to the left and right ends and the front of the device housing 2. The adjustable protective devices 4 include a T-slot lifting sleeve A14, a T-slot rail 15, a right protective plate 16, a mounting base 17, a front protective plate 18, a T-slot lifting sleeve B22, and a left protective plate 23. T-slot rails 15 are fixed to the outer walls of the left and right ends at the four corners of the device housing 2. Multiple T-slot rails 15 are vertically arranged. T-slot lifting sleeves A14 are fitted onto the two T-slot rails 15 on the right end of the device housing 2, and T-slot lifting sleeves B22 are fitted onto the two T-slot rails 15 on the left end of the device housing 2. The right ends of the two T-slot lifting sleeves A14 are connected to… The right protective plate 16 has a left protective plate 23 connected to the left end of the two T-slot lifting sleeves B22. The left protective plate 23 is connected to the front end of the right protective plate 16 by a front protective plate 18. The bottom ends of the two T-slot slide rails 15 on the right end and the two T-slot slide rails 15 on the left end of the device housing 2 are all connected to a mounting frame 17. The mounting frame 17 can block the T-slot lifting sleeves A14 and B22. Both the T-slot lifting sleeves A14 and B22 can move up and down outside the T-slot slide rails 15. The length of the T-slot slide rails 15 is equal to the height of the device housing 2. The lengths of the T-slot lifting sleeves A14 and B22 are equal to the height of the T-slot slide rails 15. The slide rails 15 are of equal length. The front protective plate 18, left protective plate 23, and right protective plate 16 are located on the front, left, and right sides of the device housing 2, respectively. The adjustable protective device 4 also includes a height-fixed locking block 19, a locking insert 20, and a rectangular movable hole 21. The height-fixed locking block 19 is located at the center of the bottom front end of the front protective plate 18. The lower half of the height-fixed locking block 19 is exposed on the lower side of the bottom end of the front protective plate 18. A rectangular movable hole 21 is provided inside the lower half of the height-fixed locking block 19. The locking insert 20 is inserted into the rectangular movable hole 21 and can move back and forth in the rectangular movable hole 21. The device mainly consists of a T-slot lifting slide sleeve A14, a T-slot slide rail 15, and a right... The device consists of components such as protective plate 16, mounting base 17, front protective plate 18, T-slot lifting sleeve B22, and left protective plate 23. T-slot slide rails 15, which are vertically fixed to the outer walls of the left and right ends at the four corners of the device housing 2, provide tracks for the T-slot lifting sleeves A14 and B22 to slide up and down. Since the T-slot lifting sleeves A14 and B22 are respectively fitted onto the T-slot slide rails 15 at the right and left ends of the device housing 2, and their lengths are equal to those of the T-slot slide rails 15, they can move up and down smoothly on the slide rails, thereby driving the right protective plate 16, left protective plate 23, and front protective plate 18 connected to them to move synchronously.

[0024] like Figure 1 , Figure 4 and Figure 5As shown, the adjustable protective device 4 also includes a height-locking block 19, a locking plate 20, and a rectangular movable hole 21. A height-locking block 19 is located at the center of the bottom front end of the front protective plate 18. The lower half of the height-locking block 19 protrudes below the bottom of the front protective plate 18. A rectangular movable hole 21 is located inside the lower half of the height-locking block 19. The locking plate 20 is inserted into the rectangular movable hole 21 and can move back and forth within the rectangular movable hole 21. After the front protective plate 18 moves upward to the top of the device housing 2, the locking plate 20 moves backward to block the top of the device housing 2. The rear end of the locking plate 20, after blocking the top of the device housing 2, prevents the T-slot lifting sleeve A14 and T-slot lifting sleeve B22 from moving downward outside the T-slot rail 15. When the device is not in use, the protective plate is in a lower position, providing basic protection for the device housing 2. When the device is put into use and the protective height needs to be adjusted, the operator can manually slide the plate upward. The T-slot lifting sleeves A14 and B22 are moved to push the right protective plate 16, left protective plate 23, and front protective plate 18 to a suitable height to meet the protection requirements under different operating scenarios. In addition, the adjustable protective device 4 is also equipped with a locking structure consisting of a height locking block 19, a locking insert 20, and a rectangular movable hole 21. The height locking block 19 at the center of the bottom front end of the front protective plate 18 has its lower half exposed and has a rectangular movable hole 21 inside. The locking insert 20 can move back and forth in the rectangular movable hole 21. After the front protective plate 18 slides upward to the top of the device housing 2, the locking insert 20 is pushed backward to block it at the top of the device housing 2. At this time, the locking insert 20 can prevent the T-slot lifting sleeves A14 and B22 from sliding downward on the T-slot slide rail 15, thereby fixing the protective plate stably at the set height and ensuring that the protective device maintains a stable and reliable protective state during equipment operation.

[0025] Finally, it should be noted that the above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Although the present utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A chemical vapor deposition apparatus for carbon nanotube processing, comprising an apparatus housing (2) and a chemical reaction chamber (6) disposed at the top of the apparatus housing (2), wherein the front end of the chemical reaction chamber (6) is open, the inner wall of the chemical reaction chamber (6) is fixed with a heat-insulating liner (7), the front end of the chemical reaction chamber (6) is provided with a heat-insulating door (5), the left end of the heat-insulating door (5) is rotatably connected to the chemical reaction chamber (6) by a hinge, and the heat-insulating door (5) can rotate at an angle greater than 120 degrees, a gas supply box (9) is provided at the left end of the chemical reaction chamber (6), and a catalyst supply box (10) is provided at the top of the chemical reaction chamber (6), characterized in that: The device chassis (2) has adjustable protective devices (4) connected to its left and right ends and front end. The adjustable protective device (4) includes a T-slot lifting sleeve A (14), a T-slot rail (15), a right protective plate (16), a mounting base (17), a front protective plate (18), a T-slot lifting sleeve B (22), and a left protective plate (23). T-slot rails (15) are fixed to the outer walls of the left and right ends of the four corners of the device housing (2). Multiple T-slot rails (15) are vertically arranged. T-slot lifting sleeves A (14) are sleeved on the outside of the two T-slot rails (15) on the right end of the device housing (2), and T-slot lifting sleeves A (14) are sleeved on the outside of the two T-slot rails (15) on the left end of the device housing (2). The T-slot lifting slide sleeve B (22) has a right protective plate (16) connected to the right end of the two T-slot lifting slide sleeves A (14) and a left protective plate (23) connected to the left end of the two T-slot lifting slide sleeves B (22). The left protective plate (23) and the front end of the right protective plate (16) are connected to a front protective plate (18). The bottom ends of the two T-slot slide rails (15) on the right end and the two T-slot slide rails (15) on the left end of the device housing (2) are all connected to a mounting base (17). The mounting base (17) can block the T-slot lifting slide sleeves A (14) and B (22).

2. The carbon nanotube processing chemical vapor deposition apparatus according to claim 1, characterized in that: The T-slot lifting sleeve A (14) and the T-slot lifting sleeve B (22) can both move up and down outside the T-slot rail (15). The length of the T-slot rail (15) is equal to the height of the device housing (2). The lengths of the T-slot lifting sleeve A (14) and the T-slot lifting sleeve B (22) are equal to the lengths of the T-slot rail (15). The front protective plate (18), the left protective plate (23), and the right protective plate (16) are located on the front, left, and right sides of the device housing (2), respectively.

3. The carbon nanotube processing chemical vapor deposition apparatus according to claim 2, characterized in that: The adjustable protective device (4) further includes a height locking block (19), a locking plate (20), and a rectangular movable hole (21). The height locking block (19) is provided at the center of the bottom front end of the front protective plate (18). The lower half of the height locking block (19) is exposed on the lower side of the bottom end of the front protective plate (18). A rectangular movable hole (21) is provided inside the lower half of the height locking block (19). The locking plate (20) is inserted into the rectangular movable hole (21). The locking plate (20) can move back and forth in the rectangular movable hole (21).

4. The carbon nanotube processing chemical vapor deposition apparatus according to claim 3, characterized in that: After the front protective plate (18) moves upward to the top of the device housing (2), the locking plate (20) moves backward to block the top of the device housing (2). After the rear end of the locking plate (20) blocks the top of the device housing (2), it can prevent the T-slot lifting sleeve A (14) and the T-slot lifting sleeve B (22) from moving downward to the rear end outside the T-slot rail (15).

5. The carbon nanotube processing chemical vapor deposition apparatus according to claim 1, characterized in that: A heat insulation mounting base (12) is provided at the center of the bottom inner wall of the heat insulation liner (7). A resistance heating cover (8) is fixed at the top edge of the heat insulation mounting base (12), and the front end of the resistance heating cover (8) is open.

6. The carbon nanotube processing chemical vapor deposition apparatus according to claim 5, characterized in that: A reaction platform (11) is provided at the center of the top of the heat insulation mounting base (12). The resistance heating cover (8) is located outside the reaction platform (11). Multiple catalyst supply pipes (13) are provided at the bottom of the catalyst supply box (10). The lower half of the multiple catalyst supply pipes (13) is vertically located on the upper side of the center inside the heat insulation liner (7), and the bottom of the multiple catalyst supply pipes (13) is aligned with the reaction platform (11).

7. The carbon nanotube processing chemical vapor deposition apparatus according to claim 1, characterized in that: The device housing (2) is provided with mounting feet (1) at the four corners of the bottom. The front end of the device housing (2) is provided with a replacement and maintenance window. The replacement and maintenance window is fixed with a replacement and maintenance door (3) by embedded screws.

Images