Adjustable magnetic plate applied to evaporation alignment mechanism

Abstract

The utility model discloses an adjustable magnetic plate applied to an evaporation counterpoint mechanism, the evaporation counterpoint mechanism is provided with a magnetic plate, the magnetic plate is provided with permanent magnets, each permanent magnet is of a columnar structure, a wire for generating magnetic force is wound outside the permanent magnet, the magnetic plate is provided with a plurality of magnetic force monitoring sensors, and the magnetic force monitoring sensors are connected with the magnetic plate. According to the vapor deposition alignment mechanism magnetic plate magnetic force automatic adjusting device, through the combination of the wire wound with the direct current on the permanent magnet as a component of the vapor deposition alignment mechanism magnetic plate and the magnetic force detection sensor, automatic adjustment of the magnetic force of the vapor deposition alignment mechanism magnetic plate is achieved, and automatic adjustment of the magnetic force of the vapor deposition alignment mechanism magnetic plate is achieved. Therefore, the technical problem that the magnetic force and the magnetic force uniformity of the magnetic plate of the evaporation alignment mechanism cannot be monitored and adjusted in the production process is solved.

Description

Technical Field

[0001] This utility model relates to the field of display technology, and in particular to a novel silicon-based vapor deposition feeding device. Background Technology

[0002] In the micro LED industry, alignment devices are generally used to ensure the accuracy of coating. In order to ensure the bonding between the mask and the substrate, the alignment device usually includes a magnetic plate. Through magnetic attraction, the mask and the substrate are better bonded.

[0003] For example, the published document with publication number CN108396285B, publication date 2021-01-26, and patent title "Mask, Display Substrate and Manufacturing Method Thereof, Display Device" discloses a mask comprising: a mask body made of semiconductor material, the mask body including a plurality of first openings; and a magnetic semiconductor material layer located on the mask body, the magnetic semiconductor material layer including a plurality of second openings, the orthographic projection of the second openings on the mask body coinciding with the first openings.

[0004] However, the magnitude and uniformity of the magnetic force of similar magnetic plates will affect the bonding effect between the mask and the substrate. If the magnetic force is not within the process specifications or the magnetic force distribution is uneven, it will affect the product yield to varying degrees. Summary of the Invention

[0005] This invention aims to solve the technical problem of the inability to monitor and adjust the magnetic force and uniformity of the magnetic plate in the vapor deposition alignment mechanism during production, and to realize an adjustable magnetic plate for use in the vapor deposition alignment mechanism.

[0006] To achieve the above objectives, the technical solution adopted by this utility model is as follows: an adjustable magnetic plate applied to a vapor deposition alignment mechanism. The vapor deposition alignment mechanism is provided with a magnetic plate, and permanent magnets are provided on the magnetic plate. Each permanent magnet is a columnar structure, and a wire for generating magnetic force is wound around the permanent magnet. Multiple magnetic force monitoring sensors are provided on the magnetic plate, and the magnetic force monitoring sensors are connected to and output sensing signals to the controller.

[0007] The magnetic plate has a plate-like structure and mounting holes are provided on the magnetic plate, and the permanent magnet is fixed in the mounting holes.

[0008] The mounting holes are cylindrical countersunk holes, all located on the same side of the magnetic plate. The length of the permanent magnet is slightly less than the length of the mounting hole, or the same as the length of the mounting hole.

[0009] The magnetic monitoring sensors are provided in five locations, which are situated at the four corners and the center of the magnetic plate.

[0010] The magnetic monitoring sensor is embedded in the magnetic plate.

[0011] The output of the controller is connected to a display and / or an alarm device.

[0012] Each wire is connected to a power supply at both ends, and the power supply is equipped with an input adjustment mechanism to control the current output to each wire.

[0013] This invention achieves automatic adjustment of the magnetic force of the magnetic plate in the vapor deposition alignment mechanism by winding a DC-current-carrying wire around the permanent magnet, a component of the magnetic plate, and combining it with a magnetic force detection sensor. This solves the technical problem that the magnitude and uniformity of the magnetic force of the magnetic plate in the vapor deposition alignment mechanism cannot be monitored and adjusted during the production process. Attached Figure Description

[0014] The following is a brief explanation of the content and markings in each of the accompanying drawings in this utility model specification: Figure 1 This is a schematic diagram of an adjustable magnetic plate structure used in a vapor deposition alignment mechanism.

[0015] The markings in the above figures are: 1. Magnetic monitoring sensor; 2. Permanent magnet; 3. Controller; 4. Magnetic plate. Detailed Implementation

[0016] The following description, with reference to the accompanying drawings, details the specific implementation of this utility model, including the shape and structure of each component, the relative positions and connections between the parts, the function and working principle of each part, the manufacturing process, and the operation and use methods. This will help those skilled in the art to have a more complete, accurate, and in-depth understanding of the inventive concept and technical solution of this utility model.

[0017] The adjustable magnetic plate used in the vapor deposition alignment mechanism is an improvement on the existing magnetic plate 4. The magnetic plate 4 has a plate-like structure and is generally made into a rectangular or normal plate according to the requirements of the application equipment. The current magnetic plate 4 has permanent magnets uniformly embedded in it. This application forms a coil by winding wires around the outside of each permanent magnet, thereby enabling active fine adjustment of the magnetic force of each permanent magnet. The two ends of the wires on each permanent magnet are respectively connected to a pair of output terminals of the power supply. The input terminal of the power supply is connected to the mains power. The power supply is equipped with an input adjustment mechanism to control the current output to each wire, that is, to control the input current to each wire and the direction of the input current. The adjustment mechanism can be an operation panel (tablet computer) that can input values, or an operation knob installed on the power supply, depending on the selected power supply.

[0018] The permanent magnet is installed on the magnetic plate 4 by embedding. Therefore, the magnetic plate 4 is provided with multiple mounting holes in advance. The mounting holes are cylindrical countersunk holes, all located on the same side of the magnetic plate 4. The depth and inner diameter of each mounting hole are the same, and the mounting holes are evenly distributed on the magnetic plate 4. The permanent magnet has a columnar structure. The length of the permanent magnet is slightly less than the length of the mounting hole, or the same as the length of the mounting hole. The outer surface is wound with wire and placed into the mounting hole. Then, the mounting hole can be sealed with glue and the permanent magnet can be fixed in the mounting hole.

[0019] In addition, multiple magnetic force monitoring sensors 1 are provided on the magnetic plate 4. The magnetic force monitoring sensors 1 are embedded in the magnetic plate 4. The magnetic force monitoring sensors 1 are used to obtain the magnetic force of the detected area. Each magnetic force monitoring sensor 1 is connected to and outputs a sensing signal to the controller 3. In order to obtain the magnetic force of different areas, there are five magnetic force monitoring sensors 1, which are located at the four corners and the middle position of the magnetic plate 4 respectively.

[0020] Controller 3 is a monitoring device, mainly for displaying monitoring data. It needs to have a display and an alarm. The output of controller 3 is connected to the display and / or the alarm device. During operation, magnetic force monitoring sensor 1 monitors the magnetic force of the magnetic plate 4 of the alignment device in real time. Controller 3 can automatically analyze the data fed back by magnetic force monitoring sensor 1 to determine whether the magnetic force in the area is uniform. Alternatively, manual monitoring can be used for judgment. When controller 3 or manual judgment determines that the magnetic force exceeds the process specifications, an alarm message is issued. After personnel recognize the alarm, they determine whether the magnetic force needs to be adjusted. When personnel determine that the magnetic force needs to be adjusted, they need to control the adjustment mechanism of the power supply. The power supply can then input positive or negative current to the winding magnet wire. After the current in the winding magnet wire stabilizes, magnetic force monitoring sensor 1 collects the magnetic force and feeds it back to controller 3. After receiving the magnetic force data, controller 3 determines whether the magnetic force meets the process specifications. If the magnetic force does not meet the process specifications, the current of the winding magnet wire needs to be adjusted again. If the magnetic force meets the process specifications, the adjustment of the magnetic force of the magnetic plate 4 of the alignment device is completed.

[0021] This invention achieves variable adjustment of the magnetic force of the magnetic plate 4 of the vapor deposition alignment mechanism by winding a DC-current-carrying wire and a magnetic force detection sensor around the permanent magnet 2, a component of the magnetic plate 4 of the vapor deposition alignment mechanism.

[0022] The present invention has been described above by way of example with reference to the accompanying drawings. Obviously, the specific implementation of the present invention is not limited to the above-described manner. Any non-substantial improvements made using the inventive concept and technical solution of the present invention, or the direct application of the inventive concept and technical solution of the present invention to other occasions without modification, are all within the protection scope of the present invention.

Claims

1. An adjustable magnetic plate for use in a vapor deposition alignment mechanism, wherein the vapor deposition alignment mechanism is provided with a magnetic plate, and a permanent magnet is disposed on the magnetic plate, characterized in that: Each of the permanent magnets is a columnar structure, and a wire for generating magnetic force is wound around the outside of the permanent magnet. The magnetic plate is provided with multiple magnetic force monitoring sensors, which are connected to and output sensing signals to the controller.

2. The adjustable magnetic plate applied to the vapor deposition alignment mechanism according to claim 1, characterized in that: The magnetic plate has a plate-like structure and mounting holes are provided on the magnetic plate, and the permanent magnet is fixed in the mounting holes.

3. The adjustable magnetic plate applied to the vapor deposition alignment mechanism according to claim 2, characterized in that: The mounting holes are cylindrical countersunk holes, all located on the same side of the magnetic plate. The length of the permanent magnet is less than the length of the mounting hole, or the same as the length of the mounting hole.

4. The adjustable magnetic plate applied to the vapor deposition alignment mechanism according to claim 1, 2, or 3, characterized in that: The magnetic monitoring sensors are provided in five locations, which are situated at the four corners and the center of the magnetic plate.

5. The adjustable magnetic plate applied to the vapor deposition alignment mechanism according to claim 4, characterized in that: The magnetic monitoring sensor is embedded in the magnetic plate.

6. The adjustable magnetic plate for use in a vapor deposition alignment mechanism according to claim 1 or 5, characterized in that: The output of the controller is connected to a display and / or an alarm device.

7. The adjustable magnetic plate applied to the vapor deposition alignment mechanism according to claim 6, characterized in that: Each wire is connected to a power supply at both ends, and the power supply is equipped with an input adjustment mechanism to control the current output to each wire.

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