Mask supporting device suitable for high-precision photoetching

Abstract

The utility model relates to the technical field of template supporting devices, and provides a mask template supporting device suitable for high-precision photoetching, which comprises a base and a supporting seat, a supporting seat is arranged above the base, and limiting structures are evenly arranged at the top end of the supporting seat. By arranging the limiting structure, the clamping block slides in the sliding groove through the limiting block, the clamping block is not prone to position deviation in the sliding groove, and the clamping electric push rod is conveniently started to push the clamping block to move in the sliding groove; furthermore, the clamping blocks are used for limiting the mask plate, and a rubber pad has a buffering and protecting effect, so that the purpose of conveniently clamping and limiting the mask plate is achieved.

Description

Technical Field

[0001] This utility model relates to the technical field of template support devices, and in particular to a mask support device suitable for high-precision photolithography. Background Technology

[0002] With the development of the times, in order to perform precision processing on parts, the use of lithography machines is indispensable. When operating a lithography machine, it is necessary to frequently change masks for different processes to meet actual needs. In addition, the masks need to be positioned and installed in a limited manner during use, so the use of mask support devices is essential.

[0003] Traditional mask support devices are difficult to use to quickly clamp and limit the mask, and it is not convenient to adjust its position and height, making it difficult to meet actual use requirements. Utility Model Content

[0004] The purpose of this invention is to provide a mask support device suitable for high-precision lithography, in order to solve the shortcomings of existing mask support devices for high-precision lithography that are not convenient for quick clamping and positioning or for adjusting the position and height.

[0005] To solve the above-mentioned technical problems, this utility model provides the following technical solution: a mask support device suitable for high-precision photolithography, including a base and a support seat;

[0006] A support base is provided above the base, and a limit structure is evenly provided at the top of the support base;

[0007] The limiting structure includes a slide groove evenly opened at the top of the support base, a clamping block is provided inside the slide groove, a clamping electric push rod is installed on one side of the clamping block, a limiting block is fixed on both sides of the bottom of the clamping block, and a rubber pad is provided on one side of the top of the clamping block.

[0008] Adjustment structures are evenly installed on the top of the base.

[0009] Preferably, the grooves are evenly distributed at the top of the support base, and the limiting blocks are symmetrically distributed at the bottom of the clamping block.

[0010] Preferably, the limiting blocks are all disposed inside the slide groove, and the clamping block and the slide groove are slidably connected through the limiting blocks.

[0011] Preferably, the side of the clamping electric push rod away from the clamping block is fixedly connected to one side inside the slide groove.

[0012] Preferably, the adjustment structure includes lifting electric push rods evenly installed on the top of the base, the top of the lifting electric push rods being disposed on the lifting seat, a motor being installed on one side of the lifting seat, a lead screw being disposed on one side of the motor, a movable seat being disposed inside the lifting seat, a movable slot being opened at the top of the movable seat, and a movable electric push rod being installed on one side of the top of the movable slot.

[0013] Preferably, the lifting electric push rods are symmetrically distributed at the top of the base, and the lead screw is threadedly connected to the movable seat.

[0014] Preferably, the bottom of the support base is disposed inside the movable groove, and the support base and the movable base are slidably connected through the movable groove. One side of the movable electric push rod is connected to one side of the support base.

[0015] The mask support device provided by this utility model, suitable for high-precision photolithography, has the following advantages:

[0016] By setting a limiting structure, the clamping block slides inside the slide groove through the limiting block, making it less likely for the clamping block to shift position inside the slide groove. It is also easy to move the clamping block inside the slide groove by activating the clamping electric push rod, thereby limiting the clamping block to the mask and allowing the rubber pad to provide a buffering and protective effect, thus achieving the purpose of facilitating the clamping and limiting of the mask.

[0017] With an adjustable structure, the bottom of the support base is located inside the moving groove. This allows the electric push rod to move the support base within the moving groove. The moving base is threadedly connected to a lead screw, which in turn starts the motor to rotate the lead screw, thus allowing the moving base to move and adjust. To facilitate height adjustment of the moving base, two sets of lifting electric push rods are activated to push the moving base, thereby achieving the purpose of easily adjusting the position and height of the support base. Attached Figure Description

[0018] Figure 1 This is a front-view three-dimensional structural schematic diagram of the present invention;

[0019] Figure 2 This is a frontal three-dimensional structural diagram of the present invention;

[0020] Figure 3 This is a partial cross-sectional three-dimensional structural schematic diagram of the present invention;

[0021] Figure 4 This is a frontal cross-sectional three-dimensional structural schematic diagram of the present invention;

[0022] Figure 5 This is a partial frontal cross-sectional three-dimensional structural schematic diagram of the present invention.

[0023] The following are the annotations in the figure: 1. Base; 2. Support seat; 3. Limiting structure; 301. Slide groove; 302. Clamping block; 303. Clamping electric push rod; 304. Limiting block; 305. Rubber pad; 4. Adjustment structure; 401. Lifting electric push rod; 402. Lifting seat; 403. Motor; 404. Lead screw; 405. Moving seat; 406. Moving groove; 407. Moving electric push rod. Detailed Implementation

[0024] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0025] Please see Figures 1-5 The present invention provides a mask support device suitable for high-precision photolithography, comprising a base 1 and a support seat 2.

[0026] Reference Figures 1-3 As shown, a support base 2 is provided above the base 1. A limiting structure 3 is evenly provided at the top of the support base 2. The limiting structure 3 includes a sliding groove 301 evenly provided at the top of the support base 2. A clamping block 302 is provided inside the sliding groove 301. A clamping electric push rod 303 is installed on one side of each clamping block 302. Limiting blocks 304 are fixed on both sides of the bottom of the clamping block 302. A rubber pad 305 is provided on one side of the top of each clamping block 302. The sliding grooves 301 are evenly distributed at the top of the support base 2. The limiting blocks 304 are symmetrically distributed at the bottom of the clamping blocks 302. The limiting blocks 304 are all provided inside the sliding grooves 301. The clamping blocks 302 and the sliding grooves 301 are slidably connected through the limiting blocks 304. The side of the clamping electric push rod 303 away from the clamping block 302 is fixedly connected to one side inside the sliding groove 301.

[0027] The use of photomasks is essential in the production process of photolithography machines. To prevent positional displacement during use, a limiting structure 3 is installed. During use, the photomask is placed on top of the support base 2, and multiple sets of clamping electric push rods 303 are activated, which push the clamping blocks 302 to slide inside the slide groove 301. The clamping blocks 302 are placed inside the slide groove 301 by limiting blocks 304 on both sides, which makes it less likely to tilt during sliding. Thus, multiple sets of clamping blocks 302 clamp and limit the photomask. Rubber pads 305 are provided on one side of each clamping block 302 to provide a buffering effect during clamping, thereby preventing damage to the photomask and greatly increasing the practicality of the device.

[0028] Reference Figure 1 , Figure 2 , Figure 4 and Figure 5 As shown, an adjustment structure 4 is evenly installed on the top of the base 1. The adjustment structure 4 includes lifting electric push rods 401 evenly installed on the top of the base 1. The top of the lifting electric push rods 401 is set on the lifting seat 402. A motor 403 is installed on one side of the lifting seat 402. A lead screw 404 is set on one side of the motor 403. A movable seat 405 is set inside the lifting seat 402. A movable groove 406 is opened on the top of the movable seat 405. A movable electric push rod 407 is installed on one side of the top of the movable groove 406. The lifting electric push rods 401 are symmetrically distributed on the top of the base 1. The lead screw 404 is threadedly connected to the movable seat 405. The bottom of the support seat 2 is set inside the movable groove 406. The support seat 2 and the movable seat 405 are slidably connected through the movable groove 406. One side of each movable electric push rod 407 is connected to one side of the support seat 2.

[0029] In order to meet the actual needs of the use of the device, the position of the mask plate needs to be adjusted. The adjustment structure 4 is set up so that the lifting electric push rod 401 is activated to push the lifting seat 402 to lift and lower, thereby adjusting the height. The motor 403 is activated to make the lead screw 404 rotate inside the lifting seat 402, which in turn makes the moving seat 405 rotate inside the lifting seat 402. The top of the moving seat 405 has a moving groove 406, and the moving electric push rod 407 inside it is activated to push the support seat 2 to move inside the moving groove 406, thereby adjusting the position and height of the support seat 2, which greatly increases the practicality of the device.

[0030] Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A mask support device suitable for high-precision photolithography, comprising a base (1) and a support seat (2); Its features are: A support seat (2) is provided above the base (1), and a limit structure (3) is evenly provided at the top of the support seat (2); The limiting structure (3) includes a slide groove (301) evenly opened at the top of the support base (2). Each slide groove (301) is provided with a clamping block (302). Each clamping block (302) is equipped with a clamping electric push rod (303) on one side. Each clamping block (302) has a limiting block (304) fixed on both sides of the bottom of the clamping block (302). Each clamping block (302) has a rubber pad (305) on one side of the top. Adjustment structures (4) are evenly installed on the top of the base (1).

2. The mask support device for high-precision photolithography according to claim 1, characterized in that: The grooves (301) are evenly distributed at the top of the support base (2), and the limiting blocks (304) are symmetrically distributed at the bottom of the clamping block (302).

3. A mask support device suitable for high-precision photolithography according to claim 1, characterized in that: The limiting blocks (304) are all disposed inside the slide groove (301), and the clamping block (302) and the slide groove (301) are slidably connected through the limiting blocks (304).

4. A mask support device suitable for high-precision photolithography according to claim 1, characterized in that: The side of the clamping electric push rod (303) away from the clamping block (302) is fixedly connected to one side inside the slide groove (301).

5. A mask support device suitable for high-precision photolithography according to claim 1, characterized in that: The adjustment structure (4) includes lifting electric push rods (401) evenly installed on the top of the base (1). The top of the lifting electric push rods (401) is set on the lifting seat (402). A motor (403) is installed on one side of the lifting seat (402). A lead screw (404) is set on one side of the motor (403). A movable seat (405) is set inside the lifting seat (402). A movable groove (406) is opened on the top of the movable seat (405). A movable electric push rod (407) is installed on one side of the top of the movable groove (406).

6. A mask support device suitable for high-precision photolithography according to claim 5, characterized in that: The lifting electric push rods (401) are symmetrically distributed at the top of the base (1), and the lead screw (404) is threadedly connected to the moving seat (405).

7. A mask support device suitable for high-precision photolithography according to claim 5, characterized in that: The bottom of the support base (2) is located inside the moving groove (406). The support base (2) and the moving base (405) are slidably connected through the moving groove (406). One side of the moving electric push rod (407) is connected to one side of the support base (2).

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