Electromagnetic coil assembly and semiconductor processing equipment

Abstract

The utility model provides an electromagnetic coil assembly and semiconductor processing equipment. The electromagnetic coil assembly comprises a direct current power supply; an electromagnetic coil; the current steering device is connected between the electromagnetic coil and the direct-current power supply; the current steering gear comprises a first magnetic switch and a second magnetic switch, and the first magnetic switch and the second magnetic switch comprise a movable contact, a normally open contact and a normally closed contact; a movable contact of the first magnetic switch is connected with a first end of the electromagnetic coil, and a normally open contact and a normally closed contact are respectively connected with a positive electrode and a negative electrode of the direct current power supply; a movable contact of the second magnetic switch is connected with the second end of the electromagnetic coil, a normally open contact and a normally closed contact are connected with the negative electrode and the positive electrode of the direct-current power source respectively, and the first magnetic switch and the second magnetic switch are switched synchronously. The current direction of the electromagnetic coil can be conveniently controlled, and the stability of the deposition process and the product quality are improved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor equipment technology, and in particular to an electromagnetic coil assembly and semiconductor processing equipment. Background Technology

[0002] Physical vapor deposition (PVD) equipment uses an electric and magnetic field in a vacuum environment to bombard a target material with ionized inert gas ions. The target material is ejected in the form of ions, atoms, or molecules, and deposited on a substrate to form a thin film. It is commonly used for depositing thin films of metals such as aluminum and copper to form metal contacts and metal interconnects.

[0003] In PVD equipment, electromagnetic coils are usually placed around the outside of the reaction chamber. When the electromagnetic coils are energized, they generate a magnetic field. This magnetic field can constrain the movement trajectory of ions, causing the ions to move in a spiral motion around the magnetic field lines under the influence of the magnetic field. This increases the movement path and residence time of the ions in the reaction chamber, thereby increasing the probability of collision between the ions and the target material. It also allows the sputtered target material to be more uniformly distributed on the substrate, thereby improving the uniformity of the thin film.

[0004] During the process, the current direction of the electromagnetic coil needs to be switched according to process requirements to adjust the magnetic field distribution within the reaction chamber. Therefore, there is an urgent need to provide an electromagnetic coil assembly that can easily control the current direction, thereby improving the stability of the deposition process and product quality. Utility Model Content

[0005] The purpose of this invention is to provide an electromagnetic coil assembly and semiconductor processing equipment that can conveniently control the current direction of the electromagnetic coil, thereby improving the stability of the deposition process and product quality.

[0006] To achieve the above objectives, this utility model is implemented through the following technical solution:

[0007] An electromagnetic coil assembly includes: a DC power supply; an electromagnetic coil; and a current diverter connected between the electromagnetic coil and the DC power supply. The current diverter includes a first magnetic switch and a second magnetic switch, each including a moving contact, a normally open contact, and a normally closed contact. The moving contact of the first magnetic switch is connected to a first end of the electromagnetic coil, and the normally open and normally closed contacts are respectively connected to the negative and positive terminals of the DC power supply. The moving contact of the second magnetic switch is connected to a second end of the electromagnetic coil, and the normally open and normally closed contacts are respectively connected to the positive and negative terminals of the DC power supply. The first and second magnetic switches switch synchronously.

[0008] Optionally, the number of electromagnetic coils and the current diverters are the same and they are arranged in a one-to-one correspondence.

[0009] Optionally, the number of DC power supplies is the same as the number of current diverters and they are configured in a one-to-one correspondence.

[0010] Optionally, the number of DC power supplies is less than the number of current diverters, and at least two of the current diverters are connected to the same DC power supply.

[0011] Optionally, the current diverter is connected to a power supply unit to simultaneously supply power to the first magnetic switch and the second magnetic switch, so that the first magnetic switch and the second magnetic switch switch switch synchronously.

[0012] Optionally, the DC power supply and the current diverter are integrated.

[0013] A semiconductor processing apparatus includes: a reaction chamber, wherein a base for supporting a substrate is disposed within the reaction chamber, and an electromagnetic coil assembly as described above, wherein an electromagnetic coil in the electromagnetic coil assembly is located outside the reaction chamber and surrounds the base.

[0014] Optionally, the plurality of electromagnetic coils are arranged sequentially along the axial direction of the reaction chamber.

[0015] Optionally, the semiconductor processing equipment further includes a controller for controlling the synchronous switching of the first magnetic switch and the second magnetic switch in each of the current diverters, so that the current direction in each of the electromagnetic coils changes, generating a changing magnetic field in the reaction chamber.

[0016] Optionally, the DC power supply and the current diverter are integrated in a remote cabinet.

[0017] Optionally, the semiconductor processing equipment is a PVD (Polymerization and Deposition) device.

[0018] Compared with the prior art, the present invention has the following advantages:

[0019] The electromagnetic coil assembly and semiconductor processing equipment provided by this utility model, when the first magnetic switch and the second magnetic switch are both in the open state, the first end of the electromagnetic coil is connected to the positive terminal of the DC power supply through the moving contact and normally closed contact of the first magnetic switch, and the second end is connected to the negative terminal of the DC power supply through the moving contact and normally closed contact of the second magnetic switch, so that the direction of the current in the electromagnetic coil is from the first end to the second end. When the first magnetic switch and the second magnetic switch are both in the closed state, the first magnetic switch and the second magnetic switch switch from normally closed contacts to normally open contacts, so that the first end of the electromagnetic coil is connected to the negative terminal of the DC power supply through the moving contact and normally open contact of the first magnetic switch, and the second end is connected to the positive terminal of the DC power supply through the moving contact and normally open contact of the second magnetic switch, thereby changing the direction of the current in the electromagnetic coil from the second end to the first end, thus achieving the purpose of switching the current direction in the electromagnetic coil. The electromagnetic coil assembly provided by this utility model has a simple structure and is easy to control. By controlling the direction of the current in the electromagnetic coil through two magnetic switches, it can ensure that the high voltage and large current provided by the DC power supply can pass through and be applied to the electromagnetic coil, while simplifying the control process of switching the direction of the electromagnetic coil current. Attached Figure Description

[0020] To more clearly illustrate the technical solution of this utility model, the drawings used in the description will be briefly introduced below. Obviously, the drawings in the following description are one embodiment of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort:

[0021] Figure 1 This is a schematic diagram of the structure of an electromagnetic coil assembly provided in an embodiment of the present invention;

[0022] Figure 2 This is a schematic diagram of another electromagnetic coil assembly provided in an embodiment of the present invention;

[0023] Figure 3 This is a schematic diagram of the structure of a semiconductor processing equipment provided in an embodiment of the present invention. Detailed Implementation

[0024] The following detailed description, in conjunction with the accompanying drawings and specific embodiments, further illustrates the proposed solution of this utility model. The advantages and features of this utility model will become clearer from the following description. It should be noted that the drawings are in a very simplified form and use non-precise proportions, intended only to facilitate and clearly illustrate the embodiments of this utility model. Please refer to the drawings to make the objectives, features, and advantages of this utility model more apparent and understandable. It should be understood that the structures, proportions, sizes, etc., depicted in the accompanying drawings are only for illustrative purposes to aid those skilled in the art and are not intended to limit the implementation conditions of this utility model. Therefore, they have no substantial technical significance. Any modifications to the structure, changes in proportions, or adjustments to the size, without affecting the effects and objectives achieved by this utility model, should still fall within the scope of the technical content disclosed in this utility model.

[0025] like Figure 1 As shown, an embodiment of this utility model provides an electromagnetic coil assembly comprising: a DC power supply DC having a positive and a negative terminal for outputting DC current; an electromagnetic coil 10 having two pins as a first terminal 11 and a second terminal 12; and a current diverter 20 connected between the electromagnetic coil 10 and the DC power supply DC. The current diverter 20 includes a first magnetic switch S1 and a second magnetic switch S2, the first magnetic switch and the second magnetic switch including a moving contact a, a normally open contact b, and a normally closed contact c. The moving contact a of the first magnetic switch S1 is connected to the first terminal 11 of the electromagnetic coil 10, and the normally open contact b and the normally closed contact c are respectively connected to the negative and positive terminals of the DC power supply DC. The moving contact a of the second magnetic switch S2 is connected to the second terminal 12 of the electromagnetic coil 10, and the normally open contact b and the normally closed contact c are respectively connected to the positive and negative terminals of the DC power supply DC. The first magnetic switch S1 and the second magnetic switch S2 switch synchronously.

[0026] In this embodiment, when the first magnetic switch S1 and the second magnetic switch S2 are both in the open state, the first end 11 of the electromagnetic coil 10 is connected to the positive terminal of the DC power supply through the moving contact a and normally closed contact c of the first magnetic switch S1, and the second end 12 is connected to the negative terminal of the DC power supply through the moving contact a and normally closed contact c of the second magnetic switch S2, so that the direction of the current in the electromagnetic coil 10 is from the first end 11 to the second end 12. When the first magnetic switch S1 and the second magnetic switch S2 are both in the closed state... In the closed state, the first magnetic switch S1 and the second magnetic switch S2 switch from normally closed contact c to normally open contact b, so that the first end 11 of the electromagnetic coil 10 is connected to the negative terminal of the DC power supply through the moving contact a and normally open contact b of the first magnetic switch S1, and the second end 12 is connected to the positive terminal of the DC power supply through the moving contact a and normally open contact b of the second magnetic switch S2. This causes the direction of the current in the electromagnetic coil 10 to change from the second end 12 to the first end 11, thereby achieving the purpose of switching the current direction in the electromagnetic coil 10. The electromagnetic coil assembly in this embodiment has a simple structure and is easy to control. By controlling the direction of the current in the electromagnetic coil 10 through two magnetic switches, it ensures that the high voltage and large current provided by the DC power supply can pass through and be applied to the electromagnetic coil 10, while simplifying the control process for switching the current direction of the electromagnetic coil.

[0027] In this embodiment, the number of electromagnetic coils 10 and current diverters 20 are the same and they are arranged in a one-to-one correspondence; that is, one current diverter 20 is used to control the switching of the current direction in one electromagnetic coil 10. In one implementation, the number of DC power supplies is the same as the number of current diverters 20 and they are arranged in a one-to-one correspondence; that is, different current diverters 20 are connected to different DC power supplies, so that each electromagnetic coil 10 is powered by a different DC power supply. In another implementation, the number of DC power supplies is less than the number of current diverters 20, and at least two current diverters 20 are connected to the same DC power supply; that is, at least two electromagnetic coils 10 are powered by the same DC power supply. This parallel connection of multiple electromagnetic coils 10 reduces the number of DC power supplies and lowers costs. Figure 2 As shown, there are three electromagnetic coils 10 and three current diverters 20, and one DC power supply. The three electromagnetic coils 10 are connected to the same DC power supply through the three current diverters 20.

[0028] In order to enable the first magnetic switch S1 and the second magnetic switch S2 to switch synchronously, the current diverter 20 is connected to a power supply unit 21, which is used to supply power to the first magnetic switch S1 and the second magnetic switch S2 at the same time. The power supply unit 21 can provide 24V voltage, so that the two magnetic switches are closed, thereby realizing the switching of current direction.

[0029] The current diverter 20 can be integrated with the DC power supply to simplify the structure. Specifically, the current diverter 20 is installed inside the power supply box of the DC power supply.

[0030] This utility model embodiment also provides a semiconductor processing equipment, such as... Figure 3 As shown, the semiconductor processing equipment includes a reaction chamber 100, within which a base 200 for supporting a substrate W is disposed. It also includes an electromagnetic coil assembly as described above, wherein an electromagnetic coil 10 is located outside the reaction chamber 100 and surrounds the base 200, so that the magnetic field generated by the electromagnetic coil 10 is uniformly distributed along the circumference of the reaction chamber 10. The specific structure and principle of the electromagnetic coil assembly can be the same as in the above embodiment, and will not be repeated here.

[0031] The semiconductor processing equipment can be a PVD (Polymerization and Deposition) device. The target 300 is disposed above the substrate 200 and is used to provide deposition materials for depositing a thin film on the substrate W. The permanent magnet 400 is disposed above the target 300. The permanent magnet 400 forms a magnetic field and rotates, attracting ionized inert gas ions to selectively bombard the target 300.

[0032] Multiple electromagnetic coils 10 are arranged sequentially along the axial direction of the reaction chamber 100, and the multiple electromagnetic coils 10 can be arranged in one or more rows along the axial direction of the reaction chamber 100. By controlling the direction and magnitude of the current in each electromagnetic coil 10, a magnetic field that uniformly distributes the particles sputtered from the target material can be generated in the reaction chamber 100.

[0033] To facilitate current diversion control of each of the electromagnetic coils 10, the semiconductor processing equipment is also equipped with a controller for synchronously switching the first magnetic switch S1 and the second magnetic switch S2 in each of the current diverters 20, thereby changing the current direction in each of the electromagnetic coils 10 and generating a changing magnetic field within the reaction chamber 100. Specifically, according to process requirements, the controller can individually control the power supply unit 21 of the current diverters 20 connected to electromagnetic coils 10 at different locations to start and stop power supply, thereby controlling the synchronous switching of the first magnetic switch S1 and the second magnetic switch S2 in each of the current diverters 20, and thus switching the current direction of each electromagnetic coil 10, meeting the semiconductor processing equipment's requirement for precise control of the electromagnetic coil current direction.

[0034] In this embodiment, the current diverter 20 can be integrated with the DC power supply and installed in a remote cabinet.

[0035] In this embodiment of the semiconductor processing equipment, two magnetic switches are used in the electromagnetic coil assembly to control the switching of the current direction in the electromagnetic coil. The control process for switching the current direction of the electromagnetic coil is simplified by controlling the two magnetic switches to close and open simultaneously. This allows the semiconductor processing equipment to accurately control the current direction of the electromagnetic coil, thereby improving the stability of the deposition process and the product quality.

[0036] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0037] Although the present invention has been described in detail through the above preferred embodiments, it should be understood that the above description should not be considered as a limitation of the present invention. Various modifications and substitutions to the present invention will be apparent to those skilled in the art after reading the above content. Therefore, the scope of protection of the present invention should be defined by the appended claims.

Claims

1. An electromagnetic coil assembly, characterized in that, include: DC power supply; Electromagnetic coil; A current diverter is connected between the electromagnetic coil and the DC power supply; The current diverter includes a first magnetic switch and a second magnetic switch. The first magnetic switch and the second magnetic switch each include a moving contact, a normally open contact, and a normally closed contact. The moving contact of the first magnetic switch is connected to the first end of the electromagnetic coil, and the normally open contact and the normally closed contact are respectively connected to the negative and positive terminals of the DC power supply. The moving contact of the second magnetic switch is connected to the second end of the electromagnetic coil, and the normally open contact and the normally closed contact are respectively connected to the positive and negative terminals of the DC power supply. The first magnetic switch and the second magnetic switch switch synchronously.

2. The electromagnetic coil assembly as described in claim 1, characterized in that, The number of electromagnetic coils and the current diverters are the same and they are set in a one-to-one correspondence.

3. The electromagnetic coil assembly as described in claim 2, characterized in that, The number of DC power supplies is the same as the number of current diverters, and they are configured in a one-to-one correspondence.

4. The electromagnetic coil assembly as described in claim 2, characterized in that, The number of DC power supplies is less than the number of current diverters, and at least two of the current diverters are connected to the same DC power supply.

5. The electromagnetic coil assembly as claimed in claim 1, characterized in that, The current diverter is connected to a power supply unit to simultaneously supply power to the first magnetic switch and the second magnetic switch, so that the first magnetic switch and the second magnetic switch switch switch synchronously.

6. The electromagnetic coil assembly as claimed in claim 1, characterized in that, The DC power supply and the current diverter are integrated.

7. A semiconductor processing apparatus, characterized in that, include: The reaction chamber includes a base for supporting a substrate and further includes an electromagnetic coil assembly as described in any one of claims 1 to 6, wherein the electromagnetic coil in the electromagnetic coil assembly is located outside the reaction chamber and surrounds the base.

8. The semiconductor processing equipment as described in claim 7, characterized in that, The plurality of electromagnetic coils are arranged sequentially along the axial direction of the reaction chamber.

9. The semiconductor processing equipment as described in claim 8, characterized in that, It also includes a controller for controlling the synchronous switching of the first magnetic switch and the second magnetic switch in each of the current diverters, so that the current direction in each of the electromagnetic coils changes, generating a changing magnetic field in the reaction chamber.

10. The semiconductor processing equipment as described in claim 7, characterized in that, The DC power supply and the current diverter are integrated and housed in a remote cabinet.

11. The semiconductor processing equipment as described in claim 7, characterized in that, The semiconductor processing equipment is a PVD (Polymerization) device.

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