Multi-compatible lifting block of ALD equipment

Abstract

The utility model relates to the technical field of ALD (atomic layer deposition) equipment, and discloses a multi-compatible lifting block of ALD equipment, which comprises two groups of sectional materials symmetrically distributed along a runner; the two sets of lifting cushion blocks are installed at the top ends of the sets of sectional materials in a one-to-one correspondence mode. The silicon wafer lifting device comprises a plurality of groups of lifting cushion blocks and lifting blocks, four lifting blocks form a sub-lifting unit for lifting a silicon wafer, a plurality of groups of sub-lifting units are distributed on a lifting platform consisting of two groups of lifting cushion blocks, each lifting block is of a triangular structure, and the right-angle flange side of each lifting block lifts the right-angle edge end of the silicon wafer. The multi-compatible lifting block of the ALD equipment is fast and convenient to disassemble and assemble, a large amount of time and manpower can be saved, the lifting block is compatible with almost all conventional sizes in the market at present due to the arrangement of the multiple limiting holes, and when order transformation requirements except for the three sizes of 182, 183.75 and 210 exist, the lifting block can be replaced by the lifting block, and the lifting block is convenient to use. Holes can be formed in the corresponding positions of the lifting cushion blocks through calculation, and the lifting blocks with the corresponding sizes can be manufactured.

Description

Technical Field

[0001] This utility model relates to the field of ALD device technology, and more specifically, to a multi-compatible support block for ALD devices. Background Technology

[0002] The automated loading lifting block of the atomic layer deposition (ALD) equipment is used to improve production efficiency. During the process of the chuck sucking the silicon wafer on the flow channel to the carrier, the flow channel continues to transfer wafers. When the flow channel is full of silicon wafers, the lifting block lifts the silicon wafer on the flow channel and waits for the chuck to pick up and transport it. After the silicon wafer is lifted, the flow channel can continue to transfer wafers, which can greatly increase the machine's capacity.

[0003] Currently, the standard sizes of silicon wafers on the market are: 182×182mm, 182×183.75mm, 182×210mm, 183.75×182mm, 183.75×183.75mm, 183.75×210mm, 210×182mm, 210×183.75mm, and 210×210mm. When modifying orders involving different specifications (such as 183→210), it is necessary to modify the size and adjust the position of all support blocks. Each silicon wafer requires 4 support blocks, and each support block is fixed with 2 bolts. The modification process wastes a lot of time and manpower. Utility Model Content

[0004] To address the aforementioned problems, this utility model discloses a multi-compatible support block for ALD devices, comprising:

[0005] Profiles, two sets of profiles are symmetrically distributed along the flow channel;

[0006] Lifting pads, two sets of lifting pads are installed one-to-one on the top of each set of profiles;

[0007] The lifting blocks consist of four blocks forming a sub-lifting unit for lifting silicon wafers. Multiple sub-lifting units are distributed on a lifting platform consisting of two sets of lifting pads. The lifting blocks are arranged in a triangular structure. The right-angle flange side of each lifting block supports the right-angle edge of the silicon wafer. A fixing pin is installed at the bottom of the lifting block, and a limiting hole is opened at the top of the lifting pad to facilitate the insertion of the fixing pin.

[0008] Preferably, the profile is 40×40×2500mm.

[0009] Preferably, the lifting pads are arranged in the form of sheets, the distance between two sets of lifting pads is 160mm, and multiple sets of waist-shaped holes are opened at equal intervals on the lifting pads. The fixing bolts are inserted through the waist-shaped holes and fixed to the top of the profile.

[0010] Preferably, the right-angle flange side of the lifting block is beveled to facilitate the lifting of the right-angle edge of the silicon wafer.

[0011] Preferably, there are multiple limiting holes, which are distributed at predetermined positions on the top of the supporting pad according to the different sizes of the silicon wafer, and each limiting hole is labeled.

[0012] Preferably, an auxiliary lifting block is integrally formed and installed on the right-angle flange side of the lifting block, and the auxiliary lifting block is coplanar with the bottom end of the lifting block.

[0013] Preferably, both the fixing pin and the limiting hole adopt a square structure.

[0014] Compared with the prior art, the present invention has the following advantages:

[0015] This utility model provides a multi-compatible support block for ALD equipment, which is quick and easy to assemble and disassemble, saving a lot of time and manpower. The design of multiple limiting holes makes the support block compatible with almost all conventional sizes currently on the market. When there is an order modification requirement other than the three sizes of 182, 183.75, and 210, the corresponding holes can be drilled in the corresponding positions of the support block and the support block of the corresponding size can be made after calculation. Attached Figure Description

[0016] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0017] Figure 1 This is an assembly drawing of the present utility model;

[0018] Figure 2 This is a top view of the present invention (from left to right: a series sub-lifting unit, b series sub-lifting unit, c series sub-lifting unit, and d series sub-lifting unit);

[0019] Figure 3 for Figure 2 Installation diagram of the lifting block for the A series;

[0020] Figure 4 for Figure 2 Outline drawing of the lifting block in the A series;

[0021] Figure 5 for Figure 2 Installation diagram of the lifting block for the B series;

[0022] Figure 6 for Figure 2 Outline drawing of the lifting block in the B series;

[0023] Figure 7 for Figure 2 Installation diagram of the lifting block for the C series;

[0024] Figure 8 for Figure 2 Outline drawing of the lifting block in the C series;

[0025] Figure 9 for Figure 2 Installation diagram of the lifting block for the D series;

[0026] Figure 10 for Figure 2 Outline drawing of the lifting block of the D series.

[0027] In the diagram: 10. Profile; 11. Support pad; 12. Support block; 13. Silicon wafer; 14. Waist-shaped hole; 15. Fixing pin; 16. Limiting hole; 17. Auxiliary support block. Detailed Implementation

[0028] The technical solution of this utility model will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this invention. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0029] Example

[0030] The present invention will now be further described with reference to the accompanying drawings.

[0031] like Figures 1 to 10 As shown, this embodiment provides a multi-compatible support block for an ALD device, comprising:

[0032] Profile 10, two sets of profile 10 are symmetrically distributed along the flow channel;

[0033] Lifting pads 11, two sets of lifting pads 11 are installed one-to-one on the top of each set of profiles 10;

[0034] The lifting blocks 12, four lifting blocks 12 form a sub-lifting unit for lifting silicon wafers 13. Multiple sets of sub-lifting units are distributed on the lifting platform composed of two sets of lifting pads 11. The lifting blocks 12 are set in a triangular structure. The right-angle flange side of each lifting block 12 lifts the right-angle edge of the silicon wafer 13. The bottom end of the lifting block 12 is equipped with a fixing pin 15. The top end of the lifting pad 11 is provided with a limiting hole 16 to facilitate the insertion of the fixing pin 15.

[0035] The working principle and beneficial effects of the above technical solution are as follows:

[0036] This utility model discloses a multi-compatible support block for ALD (Alternating Current Display) devices. Depending on the size and specifications of the silicon wafers, the support block 11 can be directly inserted into the corresponding limiting hole 16 using a fixing pin 15 located at its bottom. The multi-compatible support block for ALD devices provided by this utility model is quick and easy to assemble and disassemble, saving significant time and manpower. Furthermore, the multiple limiting holes 16 ensure that the support block 12 is compatible with almost all currently available standard sizes. When there are modification requirements for orders other than the 182, 183.75, and 210 sizes, holes can be drilled at the corresponding positions on the support block 11, and a support block 12 of the corresponding size can be manufactured through calculation.

[0037] In one embodiment, the profile 10 has a specification of 40×40×2500mm.

[0038] In one embodiment, the lifting pad 11 is arranged in the form of a sheet, the distance between two sets of lifting pads 11 is 160mm, and multiple sets of waist-shaped holes 14 are equally spaced on the lifting pad 11. The fixing bolts are inserted through the waist-shaped holes 14 and fixed to the top of the profile 10.

[0039] The working principle and beneficial effects of the above technical solution are as follows:

[0040] Use bolts to fix the lifting pads to the profile through the waist holes. The width can be adjusted appropriately according to the waist holes (to adapt to different flow channel widths). The distance between the two lifting pads 11 is required to be 160mm.

[0041] The waist-shaped hole 14 limits the two sets of lifting pads 11 to only change the lateral distance between them, and the setting of multiple limiting holes 16 limits the planar adjustment position of the lifting block 12.

[0042] In one embodiment, the right-angle flange side of the lifting block 12 is beveled to facilitate the lifting of the right-angle edge of the silicon wafer 13.

[0043] The beneficial effects of the above technical solution are as follows:

[0044] The beveled design facilitates the support of the right-angled edge of the silicon wafer.

[0045] In one embodiment, multiple limiting holes 16 are provided and distributed at predetermined positions on the top of the supporting pad 11 according to the different sizes of the silicon wafer 13. Each limiting hole 16 is labeled.

[0046] The working principle and beneficial effects of the above technical solution are as follows:

[0047] Both the lifting block 12 and the limiting hole 16 are labeled, and the corresponding lifting block and limiting hole can be selected according to the actual needs and order size.

[0048] This utility model configures different series of sub-support units according to silicon wafers of different sizes and specifications, and the specific correspondence is as follows:

[0049] (1) Series a sub-support unit: used for supporting 210×182mm silicon wafers, select the support block marked 210 and the limiting hole marked 182;

[0050] (2) Series b sub-support unit: used for supporting silicon wafers with specifications of 183.75×183.75mm, select the support block marked 83.75 and the limiting hole marked 183.75;

[0051] (3) C-series sub-support unit: used for supporting 182×210mm silicon wafers, select the support block marked 182 and the limiting hole marked 210;

[0052] (4) d series sub-support unit: used for supporting silicon wafers of 182×183.75mm or 210×183.75mm size. Select the support block marked 182 / 210 and the limiting hole marked 183.75.

[0053] In one embodiment, an auxiliary support block 17 is integrally formed and installed on the right-angle flange side of the support block 12, and the auxiliary support block 17 is coplanar with the bottom end of the support block 12.

[0054] The beneficial effects of the above technical solution are as follows:

[0055] The configuration of auxiliary lifting block 17 improves the compatibility of lifting block 12.

[0056] In one embodiment, both the fixing pin 15 and the limiting hole 16 adopt a square structure.

[0057] The working principle and beneficial effects of the above technical solution are as follows:

[0058] Both the fixing pin 15 and the limiting hole 16 adopt a square structure to ensure that the lifting block will not rotate.

[0059] Obviously, the above embodiments are merely illustrative examples for clear explanation and are not intended to limit the implementation. Those skilled in the art will recognize that other variations or modifications can be made based on the above description. It is neither necessary nor possible to exhaustively list all possible implementations here. However, obvious variations or modifications derived therefrom are still within the scope of protection of this invention.

Claims

1. A multi-compatible support block for an ALD device, characterized in that, include: Profiles (10) and lifting pads (11) are symmetrically distributed along the flow channel. Two sets of lifting pads (11) are installed one-to-one on the top of each set of profiles (10). Four lifting blocks (12) form a sub-lifting unit for lifting silicon wafers (13). Multiple sets of sub-lifting units are distributed on the lifting platform composed of two sets of lifting pads (11). The lifting blocks (12) are set in a triangular structure. The right-angle flange side of each lifting block (12) lifts the right-angle edge of the silicon wafer (13). The bottom end of the lifting block (12) is equipped with a fixing pin (15). The top of the lifting pad (11) is provided with a limiting hole (16) to facilitate the insertion of the fixing pin (15).

2. The multi-compatible support block for an ALD device according to claim 1, characterized in that, The profile (10) has a specification of 40×40×2500mm.

3. The multi-compatible support block for an ALD device according to claim 1, characterized in that, The lifting pad (11) is in the form of a sheet, and the distance between the two sets of lifting pads (11) is 160mm. Multiple sets of waist-shaped holes (14) are opened at equal intervals on the lifting pad (11). The fixing bolts are inserted through the waist-shaped holes (14) and fixed to the top of the profile (10).

4. The multi-compatible support block for an ALD device according to claim 1, characterized in that, The right-angle flange side of the lifting block (12) is set with an inclined surface to facilitate the lifting of the right-angle edge of the silicon wafer (13).

5. A multi-compatible support block for an ALD device according to claim 1, characterized in that, Multiple limiting holes (16) are provided and are distributed at predetermined positions on the top of the supporting pad (11) according to the different sizes of the silicon wafer (13). Each limiting hole (16) is labeled.

6. A multi-compatible support block for an ALD device according to claim 4, characterized in that, An auxiliary lifting block (17) is integrally formed and installed on the right-angle flange side of the lifting block (12), and the auxiliary lifting block (17) and the bottom end of the lifting block (12) are coplanar.

7. A multi-compatible support block for an ALD device according to claim 5, characterized in that, Both the fixing pin (15) and the limiting hole (16) adopt a square structure.

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