Accurately-aligned photoetching printing-down machine

Abstract

The utility model relates to a photoetching printing-down machine with accurate alignment, and belongs to the technical field of photoetching printing-down machines. The photoetching printing-down machine with the precise alignment function comprises a workbench, the top end of the workbench is rotationally connected with a plurality of evenly-arranged conveying rollers, a laser projector is installed in the middle of the top end of the workbench, and an alignment mechanism is arranged at the top end of the workbench; a laser projector on a workbench generates a horizontal laser which is aligned with the center of a photoetching printing-down machine, a photosensitive plate is calibrated by taking the axis of the photoetching printing-down machine and a laser level line as a base line, a plurality of positioning rods are embedded into fixing grooves aligned with the two sides of the photosensitive plate, and the positioning rods are in contact with the photosensitive plate through balls at one ends of fixing frames. The two sides of a photosensitive plate can be limited, a threaded rod can drive a limiting block and a rubber pad to make contact with a fixing rod, the position of a rotating ring is fixed, the photoetching printing-down machine can be accurately aligned, and the machining quality of the photoetching printing-down machine is improved.

Description

Technical Field

[0001] This utility model relates to the field of photolithography exposure machine technology, and in particular to a photolithography exposure machine with precise alignment. Background Technology

[0002] A plate-making machine is a contact exposure imaging device used to create printing plates. It uses pressure to tightly bond the original plate and a photosensitive plate, and utilizes a photochemical reaction to precisely transfer the image onto the photosensitive plate. It consists of a light source, exposure chamber, vacuum chamber, electrical components, and a base, and is widely used in printing, screen printing, and other fields. When using photolithography to create plates in a plate-making machine, the photosensitive plate needs to be aligned.

[0003] Most existing photolithography exposure machines align the photoresist by matching alignment marks on the photoresist with alignment marks on the photomask. These alignment marks are typically crosshairs, circles, squares, etc., and their positions on the photoresist and photomask are fixed, thus achieving precise alignment of the photolithographic pattern. However, when the photolithography exposure machine is making the photosensitive plate, the photosensitive plate is prone to deviation due to external touch or misalignment of the markings, resulting in insufficient alignment accuracy of the photosensitive plate. This affects the layout quality of the photolithography exposure machine, makes it inconvenient to accurately align the photolithography exposure machine, and reduces the effectiveness of the photolithography exposure machine. Utility Model Content

[0004] Therefore, it is necessary to provide a photolithography exposure machine with precise alignment to address the problem of inconvenience in accurately aligning the photolithography exposure machine.

[0005] The device includes a worktable, with several uniformly arranged conveyor rollers rotatably connected to the top of the worktable. A laser projector is installed in the center of the top of the worktable, and an alignment mechanism is provided at the top of the worktable. The alignment mechanism includes several uniformly arranged fixing slots formed at the top of the worktable. Several uniformly arranged positioning rods that fit into the fixing slots are installed at the top of the worktable. One end of each positioning rod is rotatably connected to a rotating ring. A fixing frame is fixedly connected to one side of the rotating ring. A ball bearing is rotatably connected to one end of the fixing frame. Limiting components are provided on both sides of the top of the worktable.

[0006] In one embodiment, the alignment mechanism further includes a limiting block slidably connected to one side of the inner wall of the rotating ring, and a threaded rod is threadedly connected to one side of the rotating ring, one end of which passes through the rotating ring and is rotatably connected to the limiting block.

[0007] In one embodiment, a rubber pad is fixedly connected to the inner wall of the limiting block.

[0008] In one embodiment, two support rods are fixedly connected to one side of the limiting block, and one end of the support rod is slidably connected to the inner wall of the rotating ring.

[0009] In one embodiment, the two support rods are respectively disposed on both sides of the threaded rod.

[0010] In one embodiment, the limiting component includes limiting plates slidably connected to both sides of the top of the workbench, and several evenly arranged support blocks are fixedly connected to the bottom end of the inner wall of the limiting plates.

[0011] In one embodiment, the support block is positioned above the conveyor roller.

[0012] In one embodiment, electric slide rails are installed on both sides of the inner wall of the workbench, and the electric slide rails are fixedly connected to the bottom end of the limiting plate.

[0013] Beneficial effects

[0014] 1. The aforementioned precision-aligned photolithography exposure machine uses a laser projector on the worktable to emit a horizontal laser beam aligned with the center of the machine. The laser level line and the machine's axis serve as the baseline for calibrating the photosensitive plate. Multiple positioning rods are embedded in fixed slots aligned with both sides of the photosensitive plate. These rods contact the plate via ball bearings at one end of the mounting bracket, limiting the plate's position on both sides and allowing for movement via the ball bearings. The mounting bracket, through a rotating ring, adjusts the position of the ball bearings to ensure they are in contact with the plate. A threaded rod drives a limiting block and rubber pad to contact the fixing rod, fixing the position of the rotating ring. Two support rods move with the limiting block and provide support, enabling precise alignment of the photolithography exposure machine and improving its processing quality.

[0015] 2. When aligning the photosensitive plate using a laser projector, the bottom ends of the two limiting plates are connected to the sliders on the electric slide rail. As the electric slide rail moves from both sides to the center, it can limit the two sides of the photosensitive plate, aligning the axis of the photosensitive plate with the axis of the worktable. This improves the processing accuracy of the photolithography exposure machine. The support blocks at the bottom of the inner wall of the limiting plates enhance the support effect of the limiting plates on the photosensitive plate, limiting and fixing the photosensitive plate, and improving the alignment effect of the photolithography exposure machine. Attached Figure Description

[0016] To more clearly illustrate the technical solutions in this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram of the external structure of this utility model;

[0018] Figure 2 This is a schematic diagram of the alignment mechanism structure of this utility model;

[0019] Figure 3 This is a partial structural diagram of the alignment mechanism of this utility model;

[0020] Figure 4 This utility model Figure 3 Enlarged view of point A in the middle;

[0021] Figure 5 This is a schematic diagram of the limiting component structure of this utility model.

[0022] Figure label:

[0023] 100. Workbench; 200. Conveyor roller; 300. Laser projector; 400. Alignment mechanism; 410. Fixing groove; 420. Positioning rod; 430. Rotating ring; 440. Fixing frame; 450. Ball bearing; 460. Limiting block; 461. Threaded rod; 462. Rubber pad; 463. Support rod; 470. Limiting assembly; 471. Limiting plate; 472. Support block; 473. Electric slide rail. Detailed Implementation

[0024] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. All other embodiments obtained by those skilled in the art based on the embodiments of this utility model without creative effort are within the scope of protection of this utility model.

[0025] The following is combined Figure 1 - Figure 5 This invention describes a precision-aligned photolithography exposure machine.

[0026] In one embodiment, a precision-aligned photolithography exposure machine includes a worktable 100, with a plurality of uniformly arranged conveyor rollers 200 rotatably connected to the top of the worktable 100, a laser projector 300 installed in the middle of the top of the worktable 100, and an alignment mechanism 400 provided at the top of the worktable 100. The alignment mechanism 400 includes a plurality of uniformly arranged fixing grooves 410 formed at the top of the worktable 100, and a plurality of uniformly arranged positioning rods 420 fitted into the fixing grooves 410 at the top of the worktable 100. One end of the positioning rod 420 is rotatably connected to a rotating ring 430, one side of the rotating ring 430 is fixedly connected to a fixing frame 440, one end of the fixing frame 440 is rotatably connected to a ball bearing 450, and limit components 470 are provided on both sides of the top of the worktable 100.

[0027] It should be noted that the photolithography exposure machine with model number "CTS500" is manufactured by:

[0028] Optical components: Composed of optical elements such as lenses and mirrors, responsible for scaling down the circuit pattern on the mask and accurately projecting it onto the silicon wafer, while compensating for various optical errors.

[0029] Light source components: provide high-intensity, high-stability light beams.

[0030] Dual stage components: including mask stage and wafer stage.

[0031] Control components: include precision motion control, sensor components, and computer components.

[0032] Mechanical structure: machine tools, guide rails, drive components, etc.

[0033] When aligning the photolithography exposure machine, the alignment mechanism 400, in conjunction with the rotating ring 430 on the positioning rod 420 via the laser projector 300, can calibrate and position the photolithography exposure machine. The rotating ring 430, in conjunction with the ball bearing 450 via the fixing frame 440, contacts the photosensitive plate and can limit the movement of the photosensitive plate. The limiting component 470, via the electric slide rail 473, can drive the limiting plate 471 and the support block 472 to fix the photosensitive plate. The alignment mechanism 400 and the limiting component 470, in conjunction, can optimize the photosensitive plate without affecting the normal operation of the photolithography exposure machine.

[0034] like Figure 2 , Figure 3 and Figure 4As shown, the alignment mechanism 400 also includes a limiting block 460 slidably connected to one side of the inner wall of the rotating ring 430. A threaded rod 461 is threadedly connected to one side of the rotating ring 430. One end of the threaded rod 461 passes through the rotating ring 430 and is rotatably connected to the limiting block 460. A rubber pad 462 is fixedly connected to the inner wall of the limiting block 460. Two support rods 463 are fixedly connected to one side of the limiting block 460. One end of the support rod 463 is slidably connected to the inner wall of the rotating ring 430. The two support rods 463 are respectively disposed on both sides of the threaded rod 461.

[0035] In this embodiment, the worktable 100 emits a laser beam through the laser projector 300. The photosensitive plate can be calibrated and placed according to the horizontal laser line. One end of multiple positioning rods 420 is inserted into the fixing grooves 410 close to both sides of the photosensitive plate. By rotating the rotating ring 430, the ball bearings 450 at one end of the fixing frame 440 are driven to contact the surfaces on both sides of the photosensitive plate, which can limit and guide the photosensitive plate and prevent it from shifting when moving. The threaded rod 461 is threadedly connected to the rotating ring 430, which drives the limiting block 460 to contact the positioning rod 420, which can fix the rotating ring 430. The rubber pad 462 contacts the positioning rod 420 through the limiting block 460, which increases the friction coefficient between the limiting block 460 and the positioning rod 420. The two support rods 463 move to one side as the limiting block 460 moves, which can improve the alignment accuracy of the photolithography exposure machine and improve the processing quality of the photolithography exposure machine.

[0036] like Figure 5 As shown, the limiting assembly 470 includes limiting plates 471 that are slidably connected to both sides of the top of the worktable 100. Several evenly arranged support blocks 472 are fixedly connected to the bottom of the inner wall of the limiting plate 471. The support blocks 472 are positioned above the conveying roller 200. Electric slide rails 473 are installed on both sides of the inner wall of the worktable 100. The electric slide rails 473 are fixedly connected to the bottom of the limiting plate 471.

[0037] In this embodiment, when processing the photosensitive plate, the two limiting plates 471 move to one side via the slider on the electric slide rail 473. The two limiting plates 471 drive multiple support blocks 472 to move simultaneously from one side to the middle, which can fix the photosensitive plate in the middle of the worktable 100, and can perform alignment processing on the photosensitive plate, thereby improving the layout quality of the photolithography exposure machine.

[0038] Working principle: The laser projector 300 is driven by the control component to emit a laser beam, which is projected onto the worktable 100. The photosensitive plate is aligned and calibrated by the laser beam. Multiple positioning rods 420 are manually inserted into the appropriately positioned fixing slots 410. The rotating ring 430 is manually rotated, which causes the ball bearings 450 at one end of the fixing frame 440 to rotate to one side and contact the two sides of the photosensitive plate. The threaded rod 461 is manually rotated and threaded to the rotating ring 430, which can drive the limiting block 460 and the rubber pad 462 to contact the positioning rod 420 and fix the rotating ring 430. The photosensitive plate can be moved. The two electric slide rails 473 are driven by the control component to move the two limiting plates 471 from the sides to the middle. The limiting plates 471 can limit and fix the photosensitive plate through the support block 472.

[0039] It should be noted that the laser projector 300 and motorized slide rail 473 mentioned above are all devices with relatively mature existing technologies. The specific model can be selected according to actual needs. At the same time, the laser projector 300 and motorized slide rail 473 can be powered by the built-in power supply or by AC power. The specific power supply method should be selected according to the situation, which will not be elaborated here.

[0040] The above embodiments are only used to illustrate the technical solutions of this utility model, and are not intended to limit it. Although this utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions will not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of this utility model.

Claims

1. A precision-aligned photolithography exposure machine, characterized in that, include: A workbench (100) is provided with a number of uniformly arranged conveyor rollers (200) rotatably connected to the top of the workbench (100), a laser projector (300) is installed in the middle of the top of the workbench (100), and an alignment mechanism (400) is provided at the top of the workbench (100). The alignment mechanism (400) includes several evenly arranged fixing slots (410) on the top of the worktable (100). Several evenly arranged positioning rods (420) are installed on the top of the worktable (100) and fit into the fixing slots (410). One end of the positioning rod (420) is rotatably connected to a rotating ring (430). One side of the rotating ring (430) is fixedly connected to a fixing frame (440). One end of the fixing frame (440) is rotatably connected to a ball bearing (450). Limiting components (470) are provided on both sides of the top of the worktable (100).

2. The precise alignment photolithography exposure machine according to claim 1, characterized in that, The alignment mechanism (400) further includes a limiting block (460) slidably connected to one side of the inner wall of the rotating ring (430). A threaded rod (461) is threadedly connected to one side of the rotating ring (430). One end of the threaded rod (461) passes through the rotating ring (430) and is rotatably connected to the limiting block (460).

3. The precise alignment photolithography exposure machine according to claim 2, characterized in that, A rubber pad (462) is fixedly connected to the inner wall of the limiting block (460).

4. The precise alignment photolithography exposure machine according to claim 2, characterized in that, Two support rods (463) are fixedly connected to one side of the limiting block (460), and one end of the support rod (463) is slidably connected to the inner wall of the rotating ring (430).

5. The precise alignment photolithography exposure machine according to claim 4, characterized in that, The two support rods (463) are respectively disposed on both sides of the threaded rod (461).

6. The precise alignment photolithography exposure machine according to claim 1, characterized in that, The limiting component (470) includes a limiting plate (471) slidably connected to both sides of the top of the worktable (100), and a number of evenly arranged support blocks (472) are fixedly connected to the bottom of the inner wall of the limiting plate (471).

7. The precise alignment photolithography exposure machine according to claim 6, characterized in that, The support block (472) is positioned above the conveying roller (200).

8. The precise alignment photolithography exposure machine according to claim 6, characterized in that, Electric slide rails (473) are installed on both sides of the inner wall of the workbench (100), and the electric slide rails (473) are fixedly connected to the bottom end of the limiting plate (471).

Images