Chemical vapor deposition equipment with efficient gas diversion structure

Abstract

The utility model discloses chemical vapor deposition equipment with an efficient gas flow guide structure, which comprises a chemical vapor deposition instrument, a deposition bin arranged at the top of the chemical vapor deposition instrument, a gas supply mechanism arranged at the top of one side of the chemical vapor deposition instrument, a rotating table arranged at the bottom of the inner wall of the deposition bin, and a bottom lining plate arranged at the top of the rotating table, a fixing box is arranged on the side, close to the deposition bin, in the chemical vapor deposition instrument, a driving motor is installed in the fixing box, the output end of the driving motor is connected with a rotating rod connected with the rotating table, a flow guide pipe is installed at the top of the inner wall of the deposition bin, and a gas supply pipe is arranged on one side of the gas supply mechanism and communicates with one side of the flow guide pipe. According to the chemical vapor deposition equipment with the efficient gas flow guide structure, the driving motor can drive the rotating rod and the rotating table to rotate, and the bottom lining plate rotates along with the rotating rod and is matched with continuously, uniformly and efficiently introduced gas, so that a generated film is more uniform, and the deposition effect is better.

Description

Technical Field

[0001] This utility model relates to the field of chemical vapor deposition, specifically a chemical vapor deposition device with a highly efficient gas flow guiding structure. Background Technology

[0002] Chemical vapor deposition (CVD) is a chemical engineering technique that utilizes one or more gaseous compounds or elements containing thin-film elements to chemically react on a substrate surface to form a thin film. CVD has been widely used for purifying substances, developing new crystals, and depositing various single-crystal, polycrystalline, or glassy inorganic thin-film materials, and has become a new field in inorganic synthetic chemistry. However, existing CVD equipment lacks effective gas flow guidance during operation; directly transferring gas into the deposition chamber leads to uneven gas distribution on the substrate, affecting the quality of the deposited film. Utility Model Content

[0003] The purpose of this invention is to provide a chemical vapor deposition device with a highly efficient gas flow guiding structure to solve the problems mentioned in the background art.

[0004] To achieve the above objectives, this utility model provides the following technical solution: a chemical vapor deposition (CVD) device with a high-efficiency gas flow guiding structure, comprising a CVD apparatus, a deposition chamber at the top of the CVD apparatus, a gas supply mechanism at the top of one side of the CVD apparatus, a rotating platform at the bottom of the inner wall of the deposition chamber, a bottom liner plate installed on the top of the rotating platform, a fixed box inside the CVD apparatus near the deposition chamber, a drive motor installed inside the fixed box, a rotating rod connected to the rotating platform at the output end of the drive motor, a flow guide pipe installed at the top of the inner wall of the deposition chamber, a gas supply pipe on one side of the gas supply mechanism, the gas supply pipe communicating with one side of the flow guide pipe, several branch short pipes at the bottom of the flow guide pipe, the gas supply mechanism comprising an installation box, a corrosion-resistant gas pump installed inside the installation box, an absorption pipe connected to the input end of the corrosion-resistant gas pump, and an air inlet mechanism on one side of the installation box, and a switch panel on one side of the CVD apparatus.

[0005] Preferably, the drive motor and the corrosion-resistant air pump are both electrically connected to an external power supply through a switch panel. The bottom of the chemical vapor deposition instrument is equipped with a base box, and casters are installed at the corners of the bottom of the chemical vapor deposition instrument to facilitate the movement of the device.

[0006] Preferably, the bottom of the rotating rod is connected to the output end of the drive motor, the top of the rotating rod is connected to the bottom of the rotary table, a plurality of the guide pipes are evenly distributed, the two ends of the guide pipes are sealed, the bottom of the corrosion-resistant air pump is connected to a base frame, and the base frame is connected to the bottom of the inner wall of the mounting box.

[0007] Preferably, the output end of the corrosion-resistant air pump is connected to the end of the air supply pipe away from the guide pipe, and the mounting box is connected to the surface of the chemical vapor deposition instrument.

[0008] Preferably, one end of the absorption tube is connected to the air intake mechanism, and the other end of the air intake mechanism is connected to an air source tube. The absorption tube includes a tube shell, a first filter screen and a second filter screen installed on both sides of the inner wall of the tube shell, and the air intake mechanism is used to filter the air source.

[0009] Compared with the prior art, the beneficial effects of this utility model are:

[0010] During operation, gas is supplied through a gas supply mechanism. The corrosion-resistant gas pump delivers the gas through the gas supply pipe to the deposition chamber of the chemical vapor deposition instrument. The gas is then evenly guided through the guide pipe and several branch short pipes. The start-up drive motor drives the rotating rod and the rotating table to rotate, and the bottom liner plate rotates accordingly. With the continuous, even, and efficient introduction of gas, the generated film is more uniform and the deposition effect is better. When the equipment is in use, the gas is processed through the air intake mechanism. The first and second filter screens of the air intake mechanism can filter the gas and improve the quality of the intake gas. Attached Figure Description

[0011] Figure 1 This is a schematic diagram of the structure of this utility model;

[0012] Figure 2 This is a connection structure diagram of the sedimentation chamber of this utility model;

[0013] Figure 3 This is a structural diagram of the gas supply mechanism of this utility model;

[0014] Figure 4 This is a structural diagram of the air intake mechanism of this utility model.

[0015] In the diagram: 1. Chemical vapor deposition apparatus; 2. Deposition chamber; 3. Switch panel; 4. Gas supply mechanism; 5. Base box; 6. Gas supply pipe; 7. Rotary table; 8. Base plate; 9. Fixing box; 10. Drive motor; 11. Rotating rod; 12. Guide pipe; 13. Branch short pipe; 14. Corrosion-resistant air pump; 15. Base frame; 16. Air inlet mechanism; 17. Absorption pipe; 18. Gas source pipe; 19. Mounting box; 20. Tube shell; 21. First filter screen; 22. Second filter screen; 23. Casters. Detailed Implementation

[0016] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0017] Please see Figure 1-4 This utility model provides a chemical vapor deposition (CVD) apparatus with a high-efficiency gas flow guiding structure, including a CVD apparatus 1. A deposition chamber 2 is located at the top of the CVD apparatus 1, and a gas supply mechanism 4 is located at the top of one side of the CVD apparatus 1. A rotating stage 7 is located at the bottom of the inner wall of the deposition chamber 2, and a bottom liner 8 is installed on the top of the rotating stage 7. A fixed box 9 is located inside the CVD apparatus 1 near the deposition chamber 2, and a drive motor 10 is installed inside the fixed box 9. The output end of the drive motor 10 is connected to... The rotating rod 11 is connected to the rotating table 7. A guide pipe 12 is installed on the top of the inner wall of the deposition chamber 2. A gas supply pipe 6 is provided on one side of the gas supply mechanism 4. The gas supply pipe 6 is connected to one side of the guide pipe 12. Several branch short pipes 13 are provided at the bottom of the guide pipe 12. The gas supply mechanism 4 includes a mounting box 19, a corrosion-resistant gas pump 14 installed inside the mounting box 19, an absorption pipe 17 connected to the input end of the corrosion-resistant gas pump 14, and an air inlet mechanism 16 provided on one side of the mounting box 19. A switch panel 3 is provided on one side of the chemical vapor deposition instrument 1.

[0018] See Figure 1-4 The drive motor 10 and the corrosion-resistant air pump 14 are both electrically connected to an external power supply through the switch panel 3. The bottom of the chemical vapor deposition instrument 1 is provided with a base box 5. Universal wheels 23 are installed on the corners of the bottom of the chemical vapor deposition instrument 1. The bottom of the rotating rod 11 is connected to the output end of the drive motor 10, and the top of the rotating rod 11 is connected to the bottom of the rotating table 7. Several guide tubes 12 are evenly distributed, and the two ends of the guide tubes 12 are sealed. The bottom of the corrosion-resistant air pump 14 is connected to a base frame 15, and the base frame 15 is connected to the bottom of the inner wall of the mounting box 19.

[0019] In this embodiment, gas is supplied through the gas supply mechanism 4 during use. The corrosion-resistant gas pump 14 delivers the gas through the gas supply pipe 6 to the deposition chamber 2 of the chemical vapor deposition instrument 1. The gas is then uniformly guided through the guide pipe 12 and several branch short pipes 13. The start of the drive motor 10 can drive the rotating rod 11 and the rotating table 7 to rotate. The bottom plate 8 rotates accordingly. With the continuous, uniform and efficient introduction of gas, film deposition is carried out.

[0020] See Figure 1-4The output end of the anti-corrosion air pump 14 is connected to the end of the air supply pipe 6 away from the guide pipe 12. The mounting box 19 is connected to the surface of the chemical vapor deposition instrument 1. The absorption pipe 17 is connected to one end of the air intake mechanism 16. The other end of the air intake mechanism 16 is connected to the air source pipe 18. The absorption pipe 17 includes a pipe shell 20, a first filter screen 21 and a second filter screen 22 installed on both sides of the inner wall of the pipe shell 20.

[0021] In this embodiment, the corrosion-resistant air pump 14 delivers gas through the gas supply pipe 6 to the deposition chamber 2 of the chemical vapor deposition instrument 1. When the equipment is used, the gas is processed by the air intake mechanism 16. The first filter screen 21 and the second filter screen 22 of the air intake mechanism 16 can filter the gas and improve the quality of the intake gas.

[0022] In practical use, the chemical vapor deposition equipment of this utility model with a high-efficiency gas guiding structure supplies gas through the gas supply mechanism 4. The corrosion-resistant gas pump 14 delivers the gas through the gas supply pipe 6 to the deposition chamber 2 of the chemical vapor deposition instrument 1. The gas is then evenly guided through the guide pipe 12 and several branch short pipes 13. The start of the drive motor 10 drives the rotating rod 11 and the rotating table 7 to rotate, and the bottom plate 8 rotates accordingly. With the continuous, even, and efficient introduction of gas, the generated film is more uniform and the deposition effect is better. When the equipment is used, the gas is processed through the air intake mechanism 16. The first filter screen 21 and the second filter screen 22 of the air intake mechanism 16 can filter the gas and improve the quality of the intake gas.

[0023] Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A chemical vapor deposition apparatus with a high-efficiency gas flow guiding structure, comprising a chemical vapor deposition instrument (1), characterized in that: The chemical vapor deposition apparatus (1) has a deposition chamber (2) on top, a gas supply mechanism (4) on one side of the top of the chemical vapor deposition apparatus (1), a rotating platform (7) on the bottom of the inner wall of the deposition chamber (2), a bottom liner (8) on the top of the rotating platform (7), a fixed box (9) on the side of the chemical vapor deposition apparatus (1) near the deposition chamber (2), a drive motor (10) installed inside the fixed box (9), and a rotating rod (11) connected to the rotating platform (7) at the output end of the drive motor (10). A guide pipe (12) is installed on the top of the inner wall. A gas supply pipe (6) is provided on one side of the gas supply mechanism (4). The gas supply pipe (6) is connected to one side of the guide pipe (12). Several branch short pipes (13) are provided at the bottom of the guide pipe (12). The gas supply mechanism (4) includes a mounting box (19), a corrosion-resistant gas pump (14) installed inside the mounting box (19), an absorption pipe (17) connected to the input end of the corrosion-resistant gas pump (14), and an air inlet mechanism (16) provided on one side of the mounting box (19). A switch panel (3) is provided on one side of the chemical vapor deposition instrument (1).

2. The chemical vapor deposition apparatus with a high-efficiency gas flow guiding structure according to claim 1, characterized in that: The drive motor (10) and the corrosion-resistant air pump (14) are both electrically connected to an external power source through the switch panel (3).

3. A chemical vapor deposition apparatus with a high-efficiency gas flow guiding structure according to claim 1, characterized in that: The bottom of the chemical vapor deposition instrument (1) is provided with a bottom box (5), and universal wheels (23) are installed at the corners of the bottom of the chemical vapor deposition instrument (1).

4. A chemical vapor deposition apparatus with a high-efficiency gas flow guiding structure according to claim 1, characterized in that: The bottom of the rotating rod (11) is connected to the output end of the drive motor (10), and the top of the rotating rod (11) is connected to the bottom of the rotary table (7).

5. A chemical vapor deposition apparatus with a high-efficiency gas flow guiding structure according to claim 1, characterized in that: Several of the aforementioned guide pipes (12) are evenly distributed, and both ends of the guide pipes (12) are sealed. The bottom of the anti-corrosion air pump (14) is connected to a base frame (15), and the base frame (15) is connected to the bottom of the inner wall of the mounting box (19).

6. A chemical vapor deposition apparatus with a high-efficiency gas flow guiding structure according to claim 1, characterized in that: The output end of the anti-corrosion air pump (14) is connected to the end of the air supply pipe (6) away from the guide pipe (12), and the mounting box (19) is connected to the surface of the chemical vapor deposition instrument (1).

7. A chemical vapor deposition apparatus with a high-efficiency gas flow guiding structure according to claim 1, characterized in that: The absorption tube (17) is connected to one end of the air intake mechanism (16), and the other end of the air intake mechanism (16) is connected to the air source tube (18). The absorption tube (17) includes a tube shell (20), a first filter screen (21) and a second filter screen (22) installed on both sides of the inner wall of the tube shell (20).

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