An etching apparatus for mask fabrication

By designing an etching apparatus for mask fabrication, a combination of conveyor belts and vibrating motors was used to achieve continuous etching of semiconductor circuit boards, solving the problems of low etching efficiency and poor results, and improving etching quality.

CN224290188UActive Publication Date: 2026-05-26NINGXIA HUICHUAN GARMENT CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
NINGXIA HUICHUAN GARMENT CO LTD
Filing Date
2025-05-06
Publication Date
2026-05-26

AI Technical Summary

Technical Problem

Existing photomask etching equipment suffers from low etching efficiency and poor etching effect. In particular, immersion etching cannot process multiple semiconductor circuit boards continuously, and spray etching solution does not have sufficient contact with the board surface.

Method used

An etching device was designed, comprising a mounting frame, a conveyor belt, a drive roller, a support rod, a vertical plate, and a vibration motor. The semiconductor circuit board is continuously immersed in the etching solution by the circular rotation of the conveyor belt, and the vibration motor eliminates air bubbles and improves the contact effect.

Benefits of technology

It enables continuous etching of semiconductor circuit boards, improves etching efficiency and effect, ensures full contact between the etching solution and the board surface, and enhances etching quality.

✦ Generated by Eureka AI based on patent content.

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Abstract

This utility model discloses an etching device for photomask fabrication, belonging to the field of micro-etching equipment technology. It includes a mounting frame and a conveyor belt. Multiple sets of horizontal plates are symmetrically arranged above the mounting frame, and a drive roller is rotatably mounted between the two ends of each set of horizontal plates. The conveyor belt is rotatably sleeved onto the outside of the multiple drive rollers. Multiple support rods are symmetrically fixedly mounted on the inner wall of the mounting frame, and the ends of the support rods are respectively fixedly mounted to corresponding horizontal plates. Connecting rods are cross-mounted between the multiple horizontal plates. Multiple connecting plates are fixedly mounted on the outer wall of the conveyor belt. Connecting rods are fixedly mounted on the top surface of the connecting plates, and fixing plates are fixedly mounted on the ends of the multiple connecting rods. Two vertical plates are symmetrically fixedly mounted on the top surface of the fixing plates, and each of the two vertical plates has a slot on its opposite side. Compared with the prior art, this device can improve the etching efficiency of semiconductor circuit boards and further improve the etching effect of semiconductor circuit boards.
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Description

Technical Field

[0001] This invention belongs to the field of micro-etching equipment technology, and in particular to an etching device for mask production. Background Technology

[0002] Etching technology is an indispensable process in the semiconductor circuit board manufacturing industry. Before etching, the semiconductor circuit board has blind holes. Through etching solution, the oxides and copper burrs on the surface of the copper foil react chemically with the micro-etching solution, and the oxides and copper burrs on the surface of the copper foil can be cleaned, so that a qualified semiconductor circuit board can be obtained for further surface treatment in subsequent processes.

[0003] Most existing etching apparatuses for mask fabrication involve immersing the material in an etching bath or spraying the etching solution onto the surface of the semiconductor circuit board. Immersion etching can only etch a single or a fixed number of semiconductor circuit boards at a time, which cannot be done continuously, thus greatly reducing etching efficiency. Furthermore, spray etching can result in insufficient contact between the etching solution and the semiconductor circuit board, and the contact time is too short, which directly affects the etching effect. Therefore, there is an urgent need for an etching apparatus for mask fabrication to solve these problems. Utility Model Content

[0004] The purpose of this invention is to provide an etching apparatus for mask fabrication to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, the present invention provides the following technical solution: an etching device for mask fabrication, comprising a mounting frame for mounting the etching device for mask fabrication and a conveyor belt for mask etching conveying, wherein multiple sets of horizontal plates are symmetrically arranged above the mounting frame, and a drive roller is rotatably mounted between the two ends of each set of horizontal plates, and the conveyor belt is rotatably sleeved to the outside of the multiple drive rollers.

[0006] Multiple support rods are symmetrically fixedly installed on the inner wall of the mounting frame, and the ends of the multiple support rods are fixedly installed to the corresponding horizontal plates, and connecting rods are installed crosswise between the multiple horizontal plates.

[0007] Multiple connecting plates are fixedly installed on the outer wall of the conveyor belt. Connecting rods are fixedly installed on the top surface of the connecting plates, and fixing plates are fixedly installed at the ends of the multiple connecting rods. Two vertical plates are symmetrically fixedly installed on the top surface of the fixing plates, and slots are provided on the opposite side of the two vertical plates.

[0008] The slot has a vertical groove, and an abutment block is slidably installed in the vertical groove. A push spring is fixedly installed between the side wall of the abutment block and the inner wall of the vertical groove.

[0009] Preferably, a damping rod is fixedly installed between the side wall of the abutment block and the inner wall of the vertical groove, and the damping rod is slidably sleeved into the inside of the push spring.

[0010] Preferably, the sidewalls of the abutment block are symmetrically fixedly installed with limiting blocks, and the inner wall of the vertical groove is symmetrically provided with two limiting grooves.

[0011] Preferably, the two limiting blocks fixedly installed on the side wall of the abutment block are slidably connected to the inside of the limiting groove opened on the inner wall of the vertical groove.

[0012] Preferably, a vibration motor is fixedly installed at the bottom of the fixing plate.

[0013] Preferably, the primary contact end between the abutment block and the mask to be clamped is arc-shaped.

[0014] Compared with the prior art, the technical effects and advantages of this utility model are as follows:

[0015] This etching apparatus for mask fabrication benefits from the arrangement of support rods, horizontal plates, multiple drive rollers, and a conveyor belt. The multiple drive rollers installed between the horizontal plates are arranged in a U-shape, which causes the conveyor belt to rotate in a U-shape. The support rods support the structure inside the mounting frame. Therefore, the semiconductor circuit board to be etched, which is mounted on its side wall, can be immersed into the etching solution by rotating the conveyor belt. The semiconductor circuit board can be continuously immersed into the etching solution, thereby greatly improving the etching efficiency.

[0016] This etching apparatus for mask fabrication benefits from the setup of a connecting plate, connecting rod, fixing plate, and two vertical plates. The connecting plate is fixedly installed on the outer wall of the conveyor belt and can clamp the semiconductor circuit board to be etched between the two vertical plates, which facilitates the installation and removal of the semiconductor circuit and thus improves its etching efficiency.

[0017] This etching apparatus for mask fabrication benefits from the vibration motor fixedly installed at the bottom of the fixed plate. When the semiconductor circuit board is immersed in the etching solution, the vibration motor is activated to drive the fixed plate, the vertical plate and the semiconductor circuit board to vibrate, thereby shaking out the air bubbles on the side wall of the semiconductor circuit board, thereby further improving the contact effect between the etching solution and the semiconductor circuit board.

[0018] This etching apparatus for mask fabrication improves the etching efficiency of semiconductor circuit boards and further enhances the etching effect compared to existing technologies. Attached Figure Description

[0019] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0020] Figure 1 This is a schematic diagram of the structure of this utility model;

[0021] Figure 2 This is a schematic diagram showing the connection of the connecting plate, connecting rod, fixing plate, and slot in this utility model;

[0022] Figure 3 This is a schematic diagram showing the structural connection between the fixing plate and the vibration motor in this utility model;

[0023] Figure 4 This is a schematic diagram of the structure of the abutment block, push spring, etc. in this utility model.

[0024] Explanation of reference numerals in the attached figures:

[0025] In the diagram: 1. Mounting frame; 2. Support rod; 3. Horizontal plate; 4. Drive roller; 5. Conveyor belt; 7. Connecting plate; 8. Connecting rod; 9. Fixing plate; 10. Vertical plate; 11. Slot; 12. Abutment block; 13. Push spring; 14. Vertical groove; 15. Damping rod; 16. Limiting block; 17. Vibration motor. Detailed Implementation

[0026] In the following description, numerous specific details are set forth in order to provide a more thorough understanding of the present invention. However, it will be apparent to those skilled in the art that the present invention can be practiced without one or more of these details. In other instances, certain technical features well-known in the art have not been described in order to avoid confusion with the present invention.

[0027] Unless otherwise defined, the directions mentioned herein, such as up, down, left, right, front, back, inside, and outside, are based on the directions shown in the figures of this utility model, and are explained here together.

[0028] The connection method can be any existing method, such as bonding, welding, or bolting, depending on the actual needs.

[0029] like Figures 1 to 4The main structure of the etching apparatus for mask production is a mounting frame 1 for mounting the etching apparatus for mask production and a conveyor belt 5 for conveying the mask etching. Multiple sets of horizontal plates 3 are symmetrically arranged above the mounting frame 1, and a drive roller 4 is rotatably mounted between the two ends of each set of horizontal plates 3. The conveyor belt 5 is rotatably sleeved to the outside of the multiple drive rollers 4. The drive rollers 4 rotatably mounted between the ends of the multiple horizontal plates 3 are arranged in a U-shape, so the conveyor belt 5 will also rotate in a U-shape under the drive of the drive rollers 4.

[0030] Multiple support rods 2 are symmetrically fixedly installed on the inner wall of the mounting frame 1, and the ends of the multiple support rods 2 are respectively fixedly installed with the corresponding horizontal plates 3. The multiple horizontal plates 3 are cross-installed with connecting rods. The multiple cross-installed connecting rods between the upper and lower horizontal plates 3 can effectively provide stable support for the horizontal plates 3 and the drive roller 4.

[0031] Multiple connecting plates 7 are fixedly installed on the outer wall of the conveyor belt 5. Connecting rods 8 are fixedly installed on the top surface of the connecting plates 7. Both the connecting plates 7 and the connecting rods 8 are made of soft rubber material, so they can deform at the turning point of the conveyor belt 5 without affecting the bending of the conveyor belt 5.

[0032] Furthermore, a fixing plate 9 is fixedly installed at the end of multiple connecting rods 8. Two vertical plates 10 are symmetrically fixedly installed on the top surface of the fixing plate 9, and each of the two vertical plates 10 has a slot 11 on its opposite side. A vertical groove 14 is opened in the slot 11, and an abutment block 12 is slidably installed in the vertical groove 14. The preferred contact end of the abutment block 12 with the mask to be clamped is arc-shaped, and a push spring 13 is fixedly installed between the side wall of the abutment block 12 and the inner wall of the vertical groove 14. The preferred contact end of the abutment block 12 with the semiconductor circuit board to be etched is arc-shaped, and the semiconductor circuit board to be etched is inserted. Inside the slots 11 opened on opposite sides of the two vertical plates 10, when the side wall of the semiconductor circuit board contacts the two abutment blocks 12 provided in the slots 11, since the preferred contact end of the abutment block 12 with the semiconductor circuit board is arc-shaped, the abutment block 12 can be pushed down by the semiconductor circuit board to retract into the vertical groove 14 and compress the push spring 13. When the semiconductor circuit board is inserted into the predetermined position, the push spring 13 pushes the abutment block 12 in the opposite direction to fit tightly against the outer wall of the semiconductor circuit board, thereby effectively fixing the semiconductor circuit board.

[0033] A damping rod 15 is fixedly installed between the side wall of the abutment block 12 and the inner wall of the vertical groove 14, and the damping rod 15 is slidably sleeved into the inside of the push spring 13. The damping rod 15 can effectively buffer the push spring 13, thereby improving the stability of the abutment block 12.

[0034] Limiting blocks 16 are symmetrically fixedly installed on the side wall of the abutment block 12. Two limiting grooves are symmetrically opened on the inner wall of the vertical groove 14. The two limiting blocks 16 fixedly installed on the side wall of the abutment block 12 are slidably connected to the inside of the limiting grooves opened on the inner wall of the vertical groove 14. The limiting blocks 16 can effectively limit the sliding direction of the abutment block 12 and further improve the stability of the abutment block 12 when sliding.

[0035] A vibration motor 17 is fixedly installed at the bottom of the fixing plate 9. Thanks to the vibration motor 17 fixedly installed at the bottom of the fixing plate 9, when the semiconductor circuit board is immersed in the etching solution, the vibration motor 17 is activated to drive the fixing plate 9, the vertical plate 10 and the semiconductor circuit board to vibrate, thereby shaking out the air bubbles on the side wall of the semiconductor circuit board, thereby further improving the contact effect between the etching solution and the semiconductor circuit board.

[0036] Working principle

[0037] In this etching apparatus for mask fabrication, the semiconductor circuit board to be etched is first inserted into the slots 11 on opposite sides of the two vertical plates 10. When the side wall of the semiconductor circuit board contacts the two abutment blocks 12 in the slots 11, the abutment blocks 12 are arc-shaped, so pressing down on the semiconductor circuit board causes the abutment blocks 12 to retract into the vertical grooves 14 and compress the push spring 13. When the semiconductor circuit board is inserted to the predetermined position, the push spring 13 pushes the abutment blocks 12 in the opposite direction to fit tightly against the outer wall of the semiconductor circuit board, thus effectively fixing the semiconductor circuit board. Then, the start drive roller 4 drives the conveyor belt 5 to rotate at a constant speed, and immerses the inserted semiconductor circuit board into the etching solution in the mounting frame 1. After etching, the conveyor belt 5 will carry the semiconductor circuit board out of the mounting frame 1. At this time, the semiconductor circuit board can be pulled out from between the two vertical plates 10, thus realizing continuous etching of the semiconductor circuit board.

[0038] It should be noted that, in this document, relational terms such as "one" and "two" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, the phrase "comprising an element defined as..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0039] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. An etching apparatus for mask manufacturing, comprising a mounting frame (1) for mounting of the etching apparatus for mask manufacturing and a conveyor belt (5) for conveying of the mask etching, characterized in that: Multiple sets of horizontal plates (3) are symmetrically arranged above the mounting frame (1), and a drive roller (4) is rotatably installed between the two ends of each set of horizontal plates (3). The conveyor belt (5) is rotatably sleeved to the outside of the multiple drive rollers (4). Multiple support rods (2) are symmetrically fixedly installed on the inner wall of the mounting frame (1), and the ends of the multiple support rods (2) are fixedly installed with the corresponding horizontal plates (3), and connecting rods are installed crosswise between the multiple horizontal plates (3). Multiple connecting plates (7) are fixedly installed on the outer wall of the conveyor belt (5). Connecting rods (8) are fixedly installed on the top surface of the connecting plates (7), and fixing plates (9) are fixedly installed at the ends of the multiple connecting rods (8). Two vertical plates (10) are symmetrically fixedly installed on the top surface of the fixing plates (9), and slots (11) are provided on the opposite side of the two vertical plates (10). A vertical groove (14) is provided in the slot (11), and an abutment block (12) is slidably installed in the vertical groove (14), and a push spring (13) is fixedly installed between the side wall of the abutment block (12) and the inner wall of the vertical groove (14).

2. The etching apparatus for mask fabrication according to claim 1, characterized in that: A damping rod (15) is fixedly installed between the side wall of the abutment block (12) and the inner wall of the vertical groove (14), and the damping rod (15) is slidably sleeved into the inside of the push spring (13).

3. An etching apparatus for mask fabrication according to claim 2, characterized in that: The sidewall of the abutment block (12) is symmetrically fixed with a limiting block (16), and the inner wall of the vertical groove (14) is symmetrically provided with two limiting grooves.

4. An etching apparatus for mask fabrication according to claim 3, characterized in that: The two limiting blocks (16) fixedly installed on the side wall of the abutment block (12) are respectively slidably connected to the inside of the limiting groove opened on the inner wall of the vertical groove (14).

5. An etching apparatus for mask fabrication according to claim 1, characterized in that: A vibration motor (17) is fixedly installed at the bottom of the fixing plate (9).

6. An etching apparatus for mask fabrication according to claim 1, characterized in that: The abutment block (12) and the mask plate to be clamped are arranged in an arc shape at their preferred contact ends.