A tail gas filtering device of a continuous reaction kettle

Abstract

The utility model relates to the technical field of chemical production equipment, especially to a tail gas filtering device of continuous reaction kettle, its technical scheme includes: the treatment box, the side wall fixed plug of treatment box has the air inlet pipe, the front of treatment box is slidably installed with multistage filtration and adsorption subassembly, the inside fixed mounting of treatment box has the mounting panel, and the mounting panel is located multistage filtration and adsorption subassembly top, the top fixed mounting of mounting panel has the photocatalytic oxidation subassembly, the top fixed mounting of photocatalytic oxidation subassembly has the plasma processing subassembly, and the top wall fixed plug of treatment box has the exhaust pipe. The utility model not only can gradually remove different types of harmful substances in the reaction kettle tail gas through multistage filtration and adsorption, but also can utilize the synergies of photocatalysis and plasma, improve the reaction kettle tail gas processing efficiency.

Description

Technical Field

[0001] This utility model relates to the field of chemical production equipment technology, and in particular to a tail gas filtration device for a continuous reaction vessel. Background Technology

[0002] In a broad sense, a reaction vessel is a container that carries out physical or chemical reactions. Through structural design and parameter configuration, it achieves the heating, evaporation, cooling, and low-to-high-speed mixing functions required by the process. Reactors are widely used in the chemical industry, and the materials generally include carbon manganese steel, stainless steel, and other composite materials. Chemical reaction vessels generate a large amount of exhaust gas during the production process. Exhaust gas is a mixture of gases and dust, which is a major cause of atmospheric pollution. Therefore, exhaust gas treatment devices are required.

[0003] In the prior art, patent number CN215654544U discloses a reactor tail gas treatment device, including a device body. The device body includes a tail gas inlet pipe, a condenser, a tail gas transition chamber, an airflow baffle, a tar collection chamber, and a tail gas discharge pipe. One end of the tail gas inlet pipe is connected to the condenser; the end of the condenser facing away from the tail gas inlet pipe is connected to the tail gas transition chamber; the tail gas transition chamber is connected to the tail gas discharge pipe; the top of the tar collection chamber is connected to the bottom of the tail gas transition chamber; and the airflow baffle is fixed inside the tail gas transition chamber. This utility model provides a reactor tail gas treatment device that prevents the emission of dust from reactor tail gas and is more environmentally friendly.

[0004] Although the above-mentioned reactor tail gas treatment device can achieve the effect of tail gas filtration and purification through condenser and tar collection chamber, it still has the following shortcomings in practical application: the reactor tail gas contains different types of harmful substances, and the filter element installed in the discharge pipe cannot effectively filter different types of harmful substances in the tail gas, resulting in the presence of certain harmful substances in the emitted gas. Utility Model Content

[0005] The purpose of this invention is to address the problems existing in the background technology by proposing a tail gas filtration device for a continuous reaction vessel.

[0006] To achieve this objective, the present invention adopts the following technical solution: a tail gas filtration device for a continuous reaction vessel, comprising a treatment box, an inlet pipe fixedly inserted into the side wall of the treatment box, a multi-stage filtration and adsorption assembly slidably installed on the front of the treatment box, an installation plate fixedly installed inside the treatment box, and the installation plate being located above the multi-stage filtration and adsorption assembly, a photocatalytic oxidation assembly fixedly installed on the top of the installation plate, a plasma treatment assembly fixedly installed on the top of the photocatalytic oxidation assembly, and an exhaust pipe fixedly inserted into the top wall of the treatment box.

[0007] Preferably, the multi-stage filtration and adsorption assembly includes a filter drawer that is slidably mounted on the front of the treatment box, a sealing ring is provided at the connection between the filter drawer and the treatment box, and a rectangular opening is provided on the bottom wall of the filter drawer.

[0008] Preferably, a coarse filter screen is placed on the bottom inner wall of the filter tray, a high-efficiency particulate filter is placed on top of the coarse filter screen, and an activated carbon filter is placed on top of the high-efficiency particulate filter.

[0009] Preferably, the photocatalytic oxidation component includes a photocatalytic reaction vessel fixedly installed on the top of the mounting plate, and a connecting pipe is fixedly inserted into both the mounting plate and the bottom wall of the photocatalytic reaction vessel.

[0010] Preferably, multiple ultraviolet lamps are uniformly fixedly installed on the inner wall of the photocatalytic reaction vessel, and the inner wall of the photocatalytic reaction vessel is coated with a photocatalytic material layer.

[0011] Preferably, the plasma processing assembly includes a plasma reaction chamber fixedly installed on the top of the photocatalytic reaction tank, with a connecting pipe 2 fixedly inserted into the bottom wall of the plasma reaction chamber and the top wall of the photocatalytic reaction tank, and a plasma generator fixedly installed on the side wall of the plasma reaction chamber.

[0012] Preferably, a post-treatment filter is fixedly installed on the top of the plasma reaction chamber. The air inlet of the post-treatment filter is connected to the top wall of the plasma reaction chamber, and the air outlet of the post-treatment filter is connected to the exhaust pipe. A particulate filter layer is fixedly installed inside the post-treatment filter. An activated carbon adsorption layer is fixedly installed on the top of the particulate filter layer, and a catalytic oxidation layer is fixedly installed on the top of the activated carbon adsorption layer.

[0013] The beneficial effects of this invention are as follows: When using this device, the tail gas from the reactor enters the treatment chamber through the inlet pipe, and then enters the filter drawer through the rectangular opening at the bottom of the filter drawer. After entering the filter drawer, the tail gas first passes through a coarse filter to initially filter large particles, protecting subsequent filters. Then, it passes through a high-efficiency particulate filter 33 to remove fine particles, ensuring the tail gas is clean. Finally, it passes through an activated carbon filter 34 to adsorb volatile organic compounds, reducing harmful gases. This allows the device to gradually remove different types of harmful substances from the reactor tail gas through multi-stage filtration and adsorption. The tail gas filtered by the activated carbon filter enters the photocatalytic reaction tank through a connecting pipe, activating the ultraviolet light. The external lamp provides an ultraviolet light source, activating the photocatalytic material layer. Under ultraviolet light irradiation, the photocatalytic material layer generates strong oxidizing free radicals, which decompose harmful substances. The plasma generator can generate plasma inside the plasma reaction chamber. Subsequently, the exhaust gas enters the plasma reaction chamber through the second connecting pipe and is directly exposed to the plasma environment. The plasma further decomposes the harmful substances in the exhaust gas. When the exhaust gas enters the post-treatment filter, the post-treatment filter removes the residual substances after decomposition, ensuring the cleanliness of the exhaust gas. Finally, it is discharged into the external environment through the exhaust pipe. This device can improve the exhaust gas treatment efficiency of the reactor by utilizing the synergistic effect of photocatalysis and plasma. Attached Figure Description

[0014] Figure 1 This is a front view of the overall structure of an embodiment of the tail gas filtration device for a continuous reaction vessel according to this utility model.

[0015] Figure 2 This is a front sectional view of the overall structure of an embodiment of the tail gas filtration device for a continuous reaction vessel according to this utility model.

[0016] Figure 3 This is a cross-sectional schematic diagram of the overall structure of the photocatalytic oxidation component in an embodiment of a tail gas filtration device for a continuous reactor according to this utility model.

[0017] Figure 4 This is a schematic diagram of the overall structure of the plasma treatment component in an embodiment of the tail gas filtration device for a continuous reactor according to this utility model.

[0018] Reference numerals: 1. Processing box; 2. Inlet pipe; 3. Multi-stage filtration and adsorption assembly; 31. Filter tray; 32. Coarse filter screen; 33. High-efficiency particulate filter; 34. Activated carbon filter; 4. Mounting plate; 5. Photocatalytic oxidation assembly; 51. Photocatalytic reaction vessel; 52. Connecting pipe one; 53. Ultraviolet lamp; 54. Photocatalytic material layer; 6. Plasma treatment assembly; 61. Plasma reaction box; 62. Connecting pipe two; 63. Plasma generator; 64. Post-treatment filter; 641. Particulate filter layer 641; 642. Activated carbon adsorption layer 642; 643. Catalytic oxidation layer 643; 7. Exhaust pipe. Detailed Implementation

[0019] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the present invention, not the entire structure.

[0020] In the description of this utility model, unless otherwise explicitly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0021] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0022] In the description of this embodiment, the terms "upper," "lower," "right," etc., refer to the orientation or positional relationship shown in the accompanying drawings. They are used only for ease of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. In addition, the terms "first" and "second" are only used for distinction in description and have no special meaning.

[0023] Example 1

[0024] like Figure 1-4 As shown, the present invention proposes a tail gas filtration device for a continuous reactor, comprising a processing box 1, an inlet pipe 2 fixedly inserted into the side wall of the processing box 1, a multi-stage filtration and adsorption assembly 3 slidably installed on the front of the processing box 1, an installation plate 4 fixedly installed inside the processing box 1, and the installation plate 4 being located above the multi-stage filtration and adsorption assembly 3, a photocatalytic oxidation assembly 5 fixedly installed on the top of the installation plate 4, a plasma treatment assembly 6 fixedly installed on the top of the photocatalytic oxidation assembly 5, and an exhaust pipe 7 fixedly inserted into the top wall of the processing box 1.

[0025] In this embodiment: the multi-stage filtration and adsorption assembly 3 includes a filter drawer 31 slidably mounted on the front of the treatment chamber 1. A sealing ring is provided at the connection between the filter drawer 31 and the treatment chamber 1. A rectangular opening is provided on the bottom wall of the filter drawer 31. This arrangement allows the exhaust gas from the reactor to enter the treatment chamber 1 through the inlet pipe 2 and then enter the interior of the filter drawer 31 through the rectangular opening at the bottom. The filter drawer 31 can also be slidably pulled out for easy replacement of its internal parts. A coarse filter screen 32 is placed on the bottom inner wall of the filter drawer 31. A high-efficiency particulate filter 33 is placed on top of the coarse filter screen 32, and an activated carbon filter 34 is placed on top of the high-efficiency particulate filter 33. This arrangement allows the exhaust gas to first pass through the coarse filter screen 32 to pre-filter large particles, protecting subsequent filters, and then pass through... The high-efficiency particulate filter 33 removes fine particles to ensure clean exhaust gas. Finally, the activated carbon filter 34 adsorbs volatile organic compounds to reduce harmful gases. The photocatalytic oxidation component 5 includes a photocatalytic reaction tank 51 fixedly installed on the top of the mounting plate 4. The mounting plate 4 and the bottom wall of the photocatalytic reaction tank 51 are connected by a connecting pipe 52. This allows the exhaust gas filtered by the activated carbon filter 34 to enter the interior of the photocatalytic reaction tank 51 through the connecting pipe 52. Multiple ultraviolet lamps 53 are uniformly fixedly installed on the inner wall of the photocatalytic reaction tank 51. The inner wall of the photocatalytic reaction tank 51 is coated with a photocatalytic material layer 54. This allows the ultraviolet lamps 53 to provide an ultraviolet light source when activated, activating the photocatalytic material layer 54. Under ultraviolet light irradiation, the photocatalytic material layer 54 generates strong oxidizing free radicals, which decompose harmful substances.

[0026] Example 2

[0027] like Figure 1-4As shown, the exhaust gas filtration device for a continuous reaction vessel proposed in this utility model, compared with Embodiment 1, further includes a plasma treatment component 6 comprising a plasma reaction chamber 61 fixedly installed on the top of the photocatalytic reaction vessel 51. A connecting pipe 62 is fixedly inserted into the bottom wall of the plasma reaction chamber 61 and the top wall of the photocatalytic reaction vessel 51. A plasma generator 63 is fixedly installed on the side wall of the plasma reaction chamber 61. This arrangement allows the plasma generator 63 to generate plasma inside the plasma reaction chamber 61. After the exhaust gas enters the plasma reaction chamber 61 through the connecting pipe 62, it is directly exposed to the plasma environment, where harmful substances in the exhaust gas are decomposed by the plasma. A post-treatment filter 64 is fixedly installed on the top of the plasma reaction chamber 61. The air inlet of the device 64 is connected to the top wall of the plasma reaction chamber 61, and the air outlet of the aftertreatment filter 64 is connected to the exhaust pipe 7. A particulate filter layer 641 is fixedly installed inside the aftertreatment filter 64, an activated carbon adsorption layer 642 is fixedly installed on the top of the particulate filter layer 641, and a catalytic oxidation layer 643 is fixedly installed on the top of the activated carbon adsorption layer 642. With this configuration, after the exhaust gas enters the aftertreatment filter 64, the particulate filter layer 641 removes the solid particles generated after the plasma reaction, the activated carbon adsorption layer 642 adsorbs the residual small organic molecules or odorous gases, and the catalytic oxidation layer 643 further decomposes the residual harmful gas components, such as low-concentration ozone or volatile organic compounds (VOCs), to ensure that the exhaust gas meets the emission standards and is finally discharged into the external environment through the exhaust pipe 7.

[0028] Working Principle: When using this device, the exhaust gas from the reactor enters the treatment chamber 1 through the inlet pipe 2. It then enters the filter drawer 31 through the rectangular opening at the bottom. Inside the filter drawer 31, the exhaust gas first passes through the coarse filter 32 to filter large particles, protecting subsequent filters. Next, it passes through the high-efficiency particulate filter 33 to remove fine particles, ensuring the exhaust gas is clean. Finally, it passes through the activated carbon filter 34 to adsorb volatile organic compounds, reducing harmful gases. The exhaust gas filtered by the activated carbon filter 34 then enters the photocatalytic reaction tank 51 through the connecting pipe 52. The ultraviolet lamp 53 is then activated to enhance the... An ultraviolet light source is provided to activate the photocatalytic material layer 54. Under ultraviolet light irradiation, the photocatalytic material layer 54 generates strong oxidizing free radicals, which decompose harmful substances. Plasma can be generated inside the plasma reaction chamber 61 through the plasma generator 63. Then, the exhaust gas enters the plasma reaction chamber 61 through the connecting pipe 62 and is directly exposed to the plasma environment. The plasma further decomposes the harmful substances in the exhaust gas. When the exhaust gas enters the after-treatment filter 64, the after-treatment filter 64 removes the residual substances after decomposition, ensuring that the exhaust gas is clean. Finally, it is discharged into the external environment through the exhaust pipe 7.

[0029] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating the present utility model, and are not intended to limit the implementation of the present utility model. Those skilled in the art can make various obvious changes, readjustments, and substitutions without departing from the protection scope of this utility model. It is neither necessary nor possible to exhaustively describe all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the protection scope of the claims of this utility model.

Claims

1. A tail gas filtration device for a continuous reactor, comprising a treatment box (1), characterized in that: An air inlet pipe (2) is fixedly inserted into the side wall of the treatment box (1). A multi-stage filtration and adsorption assembly (3) is slidably installed on the front of the treatment box (1). An installation plate (4) is fixedly installed inside the treatment box (1), and the installation plate (4) is located above the multi-stage filtration and adsorption assembly (3). A photocatalytic oxidation assembly (5) is fixedly installed on the top of the installation plate (4). A plasma treatment assembly (6) is fixedly installed on the top of the photocatalytic oxidation assembly (5). An exhaust pipe (7) is fixedly inserted into the top wall of the treatment box (1).

2. The tail gas filtration device for a continuous reaction vessel according to claim 1, characterized in that, The multi-stage filtration and adsorption assembly (3) includes a filter drawer (31) that is slidably installed on the front of the treatment box (1). A sealing ring is provided at the connection between the filter drawer (31) and the treatment box (1). A rectangular opening is provided on the bottom wall of the filter drawer (31).

3. The tail gas filtration device for a continuous reaction vessel according to claim 2, characterized in that, A coarse filter screen (32) is placed on the bottom inner wall of the filter tray (31), a high-efficiency particulate filter (33) is placed on top of the coarse filter screen (32), and an activated carbon filter (34) is placed on top of the high-efficiency particulate filter (33).

4. The tail gas filtration device for a continuous reactor according to claim 1, characterized in that, The photocatalytic oxidation component (5) includes a photocatalytic reaction vessel (51) fixedly installed on the top of the mounting plate (4), and a connecting pipe (52) is fixedly inserted into the bottom wall of the mounting plate (4) and the photocatalytic reaction vessel (51).

5. The tail gas filtration device for a continuous reaction vessel according to claim 4, characterized in that, Multiple ultraviolet lamps (53) are uniformly fixed on the inner wall of the photocatalytic reaction vessel (51), and a photocatalytic material layer (54) is coated on the inner wall of the photocatalytic reaction vessel (51).

6. The tail gas filtration device for a continuous reactor according to claim 4, characterized in that, The plasma processing assembly (6) includes a plasma reaction box (61) fixedly installed on the top of the photocatalytic reaction tank (51). The bottom wall of the plasma reaction box (61) and the top wall of the photocatalytic reaction tank (51) are connected together by a connecting pipe (62). A plasma generator (63) is fixedly installed on the side wall of the plasma reaction box (61).

7. The tail gas filtration device for a continuous reactor according to claim 6, characterized in that, A post-treatment filter (64) is fixedly installed on the top of the plasma reaction chamber (61). The air inlet of the post-treatment filter (64) is connected to the top wall of the plasma reaction chamber (61), and the air outlet of the post-treatment filter (64) is connected to the exhaust pipe (7). A particulate filter layer (641) is fixedly installed inside the post-treatment filter (64). An activated carbon adsorption layer (642) is fixedly installed on the top of the particulate filter layer (641), and a catalytic oxidation layer (643) is fixedly installed on the top of the activated carbon adsorption layer (642).

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