Uniform flow structure and cross section passivation device

Abstract

The application relates to the photovoltaic and semiconductor technical field, in particular to a flow uniformizing structure and a section passivation device. According to some embodiments of the utility model, the flow uniformizing structure comprises: a flow uniformizing substrate for adjusting the direction of gas flowing to the multilayer aluminum boat, a first gas inlet and at least one second gas inlet are sequentially and interval arranged from top to bottom in the height direction, the flow uniformizing substrate is configured to converge the process gas input into the reaction cavity to the first gas inlet and the second gas inlet; a first adjusting plate shields part of the first gas inlet and forms a first gas converging gap, the first gas converging gap is arranged in alignment with the gas inlet gap of the uppermost layer of the multilayer aluminum boat; a second adjusting plate, the number of the second adjusting plate is consistent with the number of the second gas inlet, each second adjusting plate shields part of the second gas inlet and forms a second gas converging gap, and at least one second gas converging gap is arranged in one-to-one alignment with the gas inlet gap of the non-uppermost layer of the multilayer aluminum boat.

Description

Technical Field

[0001] This application relates to the fields of photovoltaic and semiconductor technology, and in particular to a flow uniform structure and cross-sectional passivation device. Background Technology

[0002] In the semiconductor field, slicing photovoltaic silicon wafers in half offers several advantages, including improved power output and efficiency, reduced temperature effects, reduced shading effects, increased material utilization, and reduced costs. Therefore, half-cutting and multi-cutting of silicon wafers have become common processing techniques. After slicing, the silicon wafer will have a cross-section. Repairing this cross-section improves the overall photovoltaic conversion efficiency of the wafer. Thus, cross-section repair equipment is needed to repair the cross-sections of the silicon wafer after slicing. Among these methods, Edge Passivation Deposition (EPD) equipment provides the best passivation effect. The EPD process uses atomic layer deposition (ALD) for coating, making it the widely used method for repairing silicon wafer cross-sections.

[0003] Because the aluminum boats of conventional ALD equipment and EPD equipment are quite different, the flow equalization structure of EPD equipment cannot be the same as that of conventional equipment. The conventional ALD aluminum boat structure consists of two side plates and upper and lower toothed bars. The toothed bars are milled with equidistant grooves, and silicon wafers are inserted into the grooves. The front end of the aluminum boat has a flow equalization structure. The grooves of the flow equalization structure are also milled with grooves equidistant from those of the aluminum boat, but offset by half a tooth pitch. Flow equalization plates are inserted into the grooves, so that the airflow introduced through the gap formed between the two flow equalization plates blows directly onto the silicon wafer, improving the uniformity of the silicon wafer coating.

[0004] EPD equipment uses an aluminum boat structure where a small material box is placed inside a larger one. To allow only the cross-section of the silicon wafer to be coated, while other sides are excluded, the cross-section of the wafer must be exposed to gas before being placed in the material box. Then, the other sides of the wafer are completely enclosed, leaving only gaps for the gas to enter and exit. Due to the large internal space of the reaction chamber, without a flow equalization structure, the airflow into the gaps in the cross-section material box would be too small. This would require a large gas supply volume and long gas supply time, as well as larger pumps and dust collection devices to achieve the desired uniform film coating. This results in excessively long coating times, significant waste of gas supply, and higher costs for larger pumps and dust collection devices. Utility Model Content

[0005] In view of this, embodiments of this application provide a uniform flow structure and a cross-section passivation device, which can uniformly flow the process gas in the reaction chamber of the cross-section passivation device and accurately inject it into the air inlet gap of the aluminum boat, thereby shortening the coating time and reducing the waste of process gas.

[0006] According to one aspect of the inventive concept of this utility model, a uniform flow structure is provided, suitable for a cross-section passivation device. The cross-section passivation device includes a reaction chamber and a multi-layer aluminum boat placed in the reaction chamber. The multi-layer aluminum boat has multiple air inlet gaps, including: a uniform flow substrate for adjusting the flow of gas towards the multi-layer aluminum boat, which has a first air inlet and at least one second air inlet spaced sequentially from top to bottom along the height direction. The uniform flow substrate is configured to converge the process gas input into the reaction chamber to the first air inlet and the second air inlet; a first adjusting plate for partially blocking the first air inlet and forming a first gas-gathering gap, which is aligned with the uppermost air inlet gap of the multi-layer aluminum boat; and second adjusting plates, the number of which is the same as the number of second air inlets. Each second adjusting plate blocks a portion of a second air inlet and forms a second gas-gathering gap, and at least one second gas-gathering gap is aligned with each non-uppermost air inlet gap of the multi-layer aluminum boat.

[0007] According to some embodiments of the present invention, a first fixing hole is provided on the periphery of the first air inlet, and a first strip-shaped hole extending along the height direction is provided on the first adjusting plate. The flow equalization structure further includes: a first fastening bolt, which, together with the first fixing hole and the first strip-shaped hole, fixes the first adjusting plate on the flow equalization substrate and blocks part of the first air inlet.

[0008] According to some embodiments of the present invention, the flow uniform structure further includes:

[0009] A third adjusting plate is sandwiched between the uniform flow substrate and the first adjusting plate. The third adjusting plate has a third air inlet located within the range of the first air inlet. The first adjusting plate blocks at least a portion of the third air inlet to form the first air-gathering gap.

[0010] According to some embodiments of the present invention, a second fixing hole is provided on the periphery of the first air inlet, and a second strip-shaped hole extending along the height direction is provided on the third adjusting plate. The flow equalization structure further includes a second fastening bolt, which, together with the second fixing hole and the second strip-shaped hole, fixes the third adjusting plate on the flow equalization substrate. The second fastening bolt is configured to adjust the height of the second air inlet.

[0011] According to some embodiments of the present invention, the flow uniform structure further includes:

[0012] A fourth adjusting plate is sandwiched between the flow equalization substrate and the second adjusting plate. The fourth adjusting plate has an air supply port, and a fourth air inlet is formed below the air supply port. The air supply port and the second air inlet are located above the second air inlet. Both the air supply port and the fourth air inlet are within the range of the second air inlet. The second adjusting plate partially blocks the fourth air inlet and forms the second air gathering gap. The flow equalization structure further includes a fifth adjusting plate, which is installed on the fourth adjusting plate. The fifth adjusting plate blocks at least a portion of the air supply port and forms an air supply gap above the second air gathering gap.

[0013] According to some embodiments of the present invention, a third fixing hole is provided on the periphery of the air inlet, and a third strip-shaped hole extending along the height direction is provided on the fourth adjusting plate. The flow equalization structure further includes a third fastening bolt, which, together with the third fixing hole and the third strip-shaped hole, fixes the fifth adjusting plate on the fourth adjusting plate. The third fastening bolt is configured to adjust the width of the air inlet gap.

[0014] According to some embodiments of the present invention, the flow uniform structure further includes:

[0015] A base plate is mounted on the flow uniform substrate, and the base plate is used to support the flow uniform substrate to maintain a vertical state.

[0016] According to some embodiments of the present invention, the flow uniform structure further includes side plates, which are installed on both sides of the flow uniform substrate.

[0017] According to some embodiments of the present invention, a fourth fixing hole is provided on the side of the flow equalization substrate, and the flow equalization structure further includes:

[0018] The horizontal air-gathering regulating plate has a fourth strip-shaped hole extending in the horizontal direction;

[0019] The fourth fastening bolt, in conjunction with the fourth fixing hole and the fourth strip hole, mounts the transverse gas-gathering adjustment plate onto the side of the uniform flow substrate. The fourth fastening bolt is configured to adjust the length of the transverse gas-gathering adjustment plate extending beyond the side of the uniform flow substrate; and / or

[0020] The top edge of the flow equalization substrate is provided with a fifth fixing hole, and the flow equalization structure further includes:

[0021] The vertical air-gathering regulating plate has a fifth strip-shaped hole extending along the height direction;

[0022] The fifth fastening bolt, in conjunction with the fifth fixing hole and the fifth strip hole, installs the vertical air-gathering adjustment plate on the top edge of the uniform flow substrate. The fifth fastening bolt is configured to adjust the height of the vertical air-gathering adjustment plate beyond the top edge of the uniform flow substrate.

[0023] According to another aspect of the present invention, a cross-sectional passivation device is also provided, comprising: a reaction chamber; and a flow equalization structure as described in the foregoing embodiments, wherein the flow equalization structure is placed within the reaction chamber.

[0024] According to the uniform flow structure and cross-section passivation equipment of this utility model embodiment, the process gas in the reaction chamber is concentrated by the uniform flow substrate, and a gas concentration gap is formed by the first air inlet and the first regulating plate. The concentrated process gas is accurately delivered to the air inlet gap of the multi-layer aluminum boat through the gas concentration gap, thereby shortening the coating time and reducing the waste of process gas. Attached Figure Description

[0025] The above and other objects, features, and advantages of this application will become more apparent from the more detailed description of the embodiments of this application in conjunction with the accompanying drawings. The drawings are provided to further illustrate the embodiments of this application and form part of the specification. They are used together with the embodiments of this application to explain this application and do not constitute a limitation thereof. In the drawings, the same reference numerals generally represent the same components or steps.

[0026] Figure 1 The diagram shown is a block diagram illustrating the working principle of a uniform flow structure provided in an embodiment of this application.

[0027] Figure 2 As shown Figure 1 A three-dimensional view of a multi-layered aluminum boat.

[0028] Figure 3 The image shown is a perspective view of a uniform flow structure provided in an embodiment of this application.

[0029] Figure 4 The image shown is a perspective view of a flow uniform substrate with a flow uniform structure provided in an embodiment of this application.

[0030] Figure 5 The image shown is a perspective view of the second adjusting plate of the flow uniform structure provided in an embodiment of this application.

[0031] Figure 6 The image shown is a perspective view of another second adjusting plate of the flow uniform structure provided in one embodiment of this application.

[0032] Figure 7 The image shown is a front view of a flow uniform structure provided in an embodiment of this application.

[0033] Figure label:

[0034] 1. Uniform flow substrate; 110. First air inlet; 120. Second air inlet; 130. Third air inlet; 140. Fourth air inlet; 150. Air replenishment port; 21. First adjusting plate; 210. First strip hole; 22. Second adjusting plate; 23. Third adjusting plate; 24. Fourth adjusting plate; 25. Fifth adjusting plate; 320. Second strip hole; 410. Third strip hole; 5. Base plate; 6. Side plate; 7. Horizontal gas gathering adjusting plate; 710. Fourth strip hole; 8. Vertical gas gathering adjusting plate; 9. Reaction chamber; 10. Uniform flow structure; 11. Multilayer aluminum boat; 1110. Air inlet gap; S1. First gas gathering gap; S2. Second gas gathering gap; S3. Air replenishment gap. Detailed Implementation

[0035] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0036] Figure 1 The diagram shown is a block diagram illustrating the working principle of a flow uniform structure provided in an embodiment of this application. Figure 2 As shown Figure 1 A three-dimensional view of a multi-layered aluminum boat; Figure 3 The image shown is a perspective view of a flow uniform structure provided in an embodiment of this application; Figure 4 The figure shown is a perspective view of a uniform flow substrate with a uniform flow structure provided in an embodiment of this application; Figure 5 The image shown is a perspective view of the second adjusting plate of the flow uniform structure provided in an embodiment of this application; Figure 6 The figure shown is a perspective view of another second adjusting plate of the flow uniform structure provided in one embodiment of this application; Figure 7 The image shown is a front view of a flow uniform structure provided in an embodiment of this application.

[0037] According to one aspect of the inventive concept of this utility model, such as Figures 1 to 7As shown, a flow equalization structure 10 is provided, suitable for a cross-section passivation device. The cross-section passivation device includes a reaction chamber 9 and a multi-layer aluminum boat 11 placed within the reaction chamber 9. The multi-layer aluminum boat 11 has multiple air inlet slots 1110, including: a flow equalization substrate 1, a first adjusting plate 21, and a second adjusting plate 22. The flow equalization substrate 1 is used to adjust the flow of gas towards the multi-layer aluminum boat 11. It has a first air inlet 110 and at least one second air inlet 120 arranged sequentially from top to bottom along the height direction. The size of the flow equalization substrate 1 is adapted to the cross-sectional size of the multi-layer aluminum boat 11. The flow equalization substrate 1 is configured to converge the process gas input into the reaction chamber 9 to the first air inlet 110 and the second air inlet 120. The first adjusting plate 21 blocks at least a portion of the first air inlet 110 and forms a first air-gathering gap S1, which is aligned with the uppermost air inlet gap 1110 of the multi-layer aluminum boat 11; the second adjusting plate 22 has the same number as the second air inlets 120, and each second adjusting plate 22 blocks a portion of a second air inlet 120 and forms a second air-gathering gap S2, with at least one second air-gathering gap S2 aligned with a non-uppermost air inlet gap 1110.

[0038] In this embodiment, the process gas in the reaction chamber 9 is concentrated by the uniform flow substrate 1, and the first gas inlet 110, the second gas inlet 120, the first adjustment plate 21 and the second adjustment plate 22 are used to form the first gas concentration gap S1 and the second gas concentration gap S2. The concentrated process gas is accurately delivered to the gas inlet gap 1110 of the multilayer aluminum boat 11 by means of the gas concentration gap, thereby shortening the coating time and reducing the waste of process gas.

[0039] According to some embodiments of this utility model, such as Figure 1 As shown, the process gas is input from one end of the reaction chamber 9 (the arrow indicates the flow direction of the process gas). A multilayer aluminum boat 11 is placed inside the reaction chamber 9. The inlet slit 1110 on the multilayer aluminum boat 11 is very small compared to the cross-section of the reaction chamber 9, meaning that most of the process gas cannot enter the inlet slit 1110 to deposit the silicon wafer cross-section. Therefore, the uniform flow structure 10 of this embodiment is placed on the side of the multilayer aluminum boat 11 closer to the inlet direction. The uniform flow structure 10 gathers the process gas and allows it to flow out through the gathering slit. Since the gathering slit is very narrow and opposite to the inlet slit, most of the process gas can enter the internal space of the multilayer aluminum boat 11 to passivate the silicon wafer cross-section.

[0040] According to some embodiments of the present invention, a first fixing hole is provided on the periphery of the first air inlet 110, a first strip hole 210 extending along the height direction is provided on the first adjusting plate 21, and the flow equalization structure 10 also includes a first fastening bolt. The first fastening bolt, together with the first fixing hole and the first strip hole 210, fixes the first adjusting plate 21 on the flow equalization substrate 1 and blocks part of the first air inlet 110.

[0041] In this embodiment, by adjusting the tightness of the first fastening bolt, the relative position of the first adjusting plate 21 and the uniform flow substrate 1 in the vertical direction can be adjusted, thereby adjusting the width of the gas gathering gap. Combined with the adjustment of the air intake, the flow rate of the process gas input into the multilayer aluminum boat 11 can be controlled more precisely.

[0042] According to some embodiments of this utility model, the number and position of the first strip hole 210 correspond one-to-one with the number of the first fixing hole.

[0043] According to some embodiments of the present invention, the flow equalization structure 10 further includes a third adjusting plate 23, which is sandwiched between the flow equalization substrate 1 and the first adjusting plate 21. A third air inlet 130 is provided on the third adjusting plate 23, which is located within the range of the first air inlet 110. The first adjusting plate 21 blocks at least a portion of the third air inlet 130 to form a first air-gathering gap S1.

[0044] According to some embodiments of the present invention, by adjusting the relative position of the third adjusting plate 23 to the uniform flow substrate 1, the height of the second air inlet 120 can be adjusted, that is, the height of the gas gathering gap can be adjusted. By adjusting the height of the gas gathering gap, the uniform flow structure 10 can be adapted to different types of silicon wafers and different types of aluminum boats, making it more versatile.

[0045] According to some embodiments of the present invention, a second fixing hole is provided on the periphery of the first air inlet 110, and a second strip hole 320 extending along the height direction is provided on the third adjusting plate 23. The flow equalization structure 10 also includes a second fastening bolt. The second fastening bolt cooperates with the second fixing hole and the second strip hole 320 to fix the third adjusting plate 23 on the flow equalization substrate 1. The second fastening bolt is configured to adjust the height of the second air inlet 120.

[0046] In this embodiment, the third adjusting plate 23 is fixedly installed on the flow equalization substrate 1 by the second fastening bolt. The height of the third adjusting plate 23 relative to the flow equalization substrate 1 is adjustable. Compared with the above embodiment where the third adjusting plate 23 is clamped between the first adjusting plate 21 and the flow equalization substrate 1, it has stronger operability, higher operation accuracy and controllability.

[0047] According to some optional embodiments of this utility model, the first fixing hole is opened on the third adjusting plate 23, and the first fastening bolt, together with the first fixing hole and the first strip hole 210, fixes the first adjusting plate 21 on the third adjusting plate 23, making disassembly and adjustment more convenient.

[0048] According to some embodiments of this utility model, the number and position of the second strip hole 320 correspond one-to-one with those of the second fixing hole.

[0049] According to some embodiments of the present invention, the flow equalization structure 10 further includes a fourth adjusting plate 24, which is sandwiched between the flow equalization substrate 1 and the second adjusting plate 22. The fourth adjusting plate 24 also has an air inlet 150 located above the second air inlet 120. Both the air inlet 150 and the second air inlet 120 are within a certain range of the second air inlet 120. The second adjusting plate 22 blocks a portion of the fourth air inlet 140 and forms a second air-gathering gap S2. The flow equalization structure 10 also includes a fifth adjusting plate 25, which is mounted on the fourth adjusting plate 24. The fifth adjusting plate 4 blocks at least a portion of the air inlet 150 and forms an air-gathering gap S3 above the second air-gathering gap.

[0050] In this embodiment, the flow equalization structure 10 has two sets of gas-gathering gaps, one above the other, aligned with the top (first gas-gathering gap S1) and the other (second gas-gathering gap S2) of the multilayer aluminum boat 11, respectively. To facilitate the removal, placement, and position adjustment of the flow equalization structure 10, the top of the flow equalization structure 10 typically has a gap with the inner top surface of the reaction chamber 9. Consequently, some process gas passes through the gap between the top of the flow equalization device and the reaction chamber 9 and then enters the gas inlet gap 1110 of the upper aluminum boat, resulting in different gas intake volumes for the upper and lower aluminum boats. Therefore, a supplementary gas gap is formed above the second gas inlet gap of the aluminum boat using the fifth adjusting plate 25 in conjunction with the supplementary gas inlet 150. This compensates for the process gas passing through the gap between the top of the flow equalization device and the reaction chamber 9, thereby ensuring consistent gas intake volumes in the upper and lower aluminum boats and guaranteeing the uniformity of the silicon wafer cross-section coating.

[0051] According to some embodiments of the present invention, a third fixing hole is provided on the periphery of the air inlet 150, and a third strip hole 410 extending along the height direction is provided on the fourth adjusting plate 24. The flow equalization structure 10 also includes a third fastening bolt. The third fastening bolt, together with the third fixing hole and the third strip hole 410, fixes the fifth adjusting plate 25 on the fourth adjusting plate 24. The third fastening bolt is configured to adjust the width of the air inlet gap.

[0052] In this embodiment, the width of the air supply gap is adjusted by the third fastening bolt to be approximately the same as the gap width between the top of the uniform flow structure 10 and the reaction chamber 9, thereby ensuring that the air intake of the upper and lower aluminum boats is the same.

[0053] According to some embodiments of this utility model, the aluminum boat can have two, three or more layers. Correspondingly, the number of the second air inlet 120 and the second air-gathering gap S2 is one less than the number of layers of the aluminum boat.

[0054] According to some embodiments of the present invention, the flow uniform structure 10 further includes a base plate 5, which is mounted on the flow uniform substrate 1 and is used to support the flow uniform substrate 1 to maintain a vertical state.

[0055] According to some embodiments of the present invention, the flow uniform structure 10 further includes a side plate 6, which is installed on both sides of the flow uniform substrate 1.

[0056] In this embodiment, the bottom plate 5 and the side plate 6 ensure the orientation of the uniform flow substrate 1, so that as much process gas as possible is intercepted and concentrated, preventing gas leakage caused by gaps between the uniform flow structure 10 and the reaction chamber 9.

[0057] According to some embodiments of the present invention, a fourth fixing hole is provided on the side of the flow equalization substrate 1, and the flow equalization structure 10 also includes a transverse gas gathering adjustment plate 7 and a fourth fastening bolt. The transverse gas gathering adjustment plate 7 is provided with a fourth strip-shaped hole 710 extending in the horizontal direction. The fourth fastening bolt, in conjunction with the fourth fixing hole and the fourth strip-shaped hole 710, installs the transverse gas gathering adjustment plate 7 on the side of the flow equalization substrate 1. The fourth fastening bolt is configured to adjust the length of the transverse gas gathering adjustment plate 7 extending beyond the side of the flow equalization substrate 1.

[0058] In this embodiment, the overall width of the uniform flow structure 10 can be adjusted by using the fourth fastening bolt in conjunction with the four fixing holes and the fourth strip hole 710 to adapt to reaction chambers 9 of different sizes, ensuring that there are no gaps between the two sides of the uniform flow structure 10 and the inner side of the reaction chamber 9, thus preventing air leakage.

[0059] According to some embodiments of this utility model, a fifth fixing hole is provided on the top edge of the flow equalization substrate 1, and the flow equalization structure 10 further includes: a vertical air-gathering adjustment plate 8 and a fifth fastening bolt. The vertical air-gathering adjustment plate 8 has a fifth strip-shaped hole (not shown in the figure) extending along the height direction. The fifth fastening bolt, in conjunction with the fifth fixing hole and the fifth strip-shaped hole, mounts the vertical air-gathering adjustment plate on the top edge of the flow equalization substrate 1, and the fifth fastening bolt is configured to adjust the height of the vertical air-gathering adjustment plate beyond the top edge of the flow equalization substrate 1.

[0060] In this embodiment, the fifth fastening screw, together with the fifth fixing hole and the fifth strip hole, can adjust the overall height of the flow equalization structure 10, minimize the width of the gap between the flow equalization structure 10 and the inner top surface of the reaction chamber 9, and reduce the impact of air leakage on the air intake of the upper and lower aluminum boats.

[0061] According to another aspect of the present invention, a cross-section passivation device is also provided, comprising: a reaction chamber 9; and a flow equalization structure 10 as described in the foregoing embodiment, wherein the flow equalization structure 10 is placed inside the reaction chamber 9.

[0062] In the embodiments of this disclosure, unless otherwise specified, the connection can be a detachable connection using bolts, nuts, screws, clips, magnets, etc. In some connections where there is no particular requirement for a detachable fit, a non-detachable connection can be achieved through welding, bonding, etc.

[0063] The basic principles of this application have been described above with reference to specific embodiments. However, it should be noted that the advantages, benefits, and effects mentioned in this application are merely examples and not limitations, and should not be considered as essential features of each embodiment of this application. Furthermore, the specific details disclosed above are for illustrative and facilitative purposes only, and are not limitations. These details do not limit the application to the necessity of employing the aforementioned specific details for implementation.

[0064] The block diagrams of devices, apparatuses, devices, and systems involved in this application are merely illustrative examples and are not intended to require or imply that they must be connected, arranged, or configured in the manner shown in the block diagrams. As those skilled in the art will recognize, these devices, apparatuses, devices, and systems can be connected, arranged, and configured in any manner. Words such as “comprising,” “including,” “having,” etc., are open-ended terms meaning “including but not limited to,” and are used interchangeably with them. The terms “or” and “and” as used herein refer to the terms “and / or,” and are used interchangeably with them unless the context clearly indicates otherwise. The term “such as” as used herein refers to the phrase “such as but not limited to,” and is used interchangeably with it.

[0065] It should also be noted that in the apparatus, equipment, and methods of this application, the components or steps can be disassembled and / or recombined. These disassemblies and / or recombinations should be considered as equivalent solutions of this application.

[0066] The above description of the disclosed aspects is provided to enable any person skilled in the art to make or use this application. Various modifications to these aspects will be readily apparent to those skilled in the art, and the general principles defined herein can be applied to other aspects without departing from the scope of this application. Therefore, this application is not intended to be limited to the aspects shown herein, but rather to be accorded the widest scope consistent with the principles and novel features disclosed herein.

[0067] The above description has been given for purposes of illustration and description. Furthermore, this description is not intended to limit the embodiments of this application to the forms disclosed herein. Although numerous exemplary aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, alterations, additions, and sub-combinations thereof.

Claims

1. A uniform flow structure, characterized in that, This is applicable to a section passivation device, which includes a reaction chamber and a multi-layer aluminum boat placed within the reaction chamber. The multi-layer aluminum boat has multiple air inlet gaps, including: A flow equalization substrate is used to adjust the flow of gas toward the multilayer aluminum boat. A first air inlet and at least one second air inlet are arranged at intervals from top to bottom along the height direction. The flow equalization substrate is configured to converge the process gas input into the reaction chamber to the first air inlet and the second air inlet. The first adjusting plate partially blocks the first air inlet and forms a first air-gathering gap, which is aligned with the air inlet gap of the uppermost layer of the multi-layer aluminum boat. The number of second adjustment plates is the same as the number of second air inlets. Each second adjustment plate blocks a portion of a second air inlet and forms a second air-gathering gap. At least one second air-gathering gap is aligned with the air inlet gap of the non-uppermost layer of the multi-layer aluminum boat.

2. The uniform flow structure according to claim 1, characterized in that, A first fixing hole is provided on the periphery of the first air inlet, and a first strip-shaped hole extending along the height direction is provided on the first adjusting plate. The flow equalization structure further includes: The first fastening bolt, in conjunction with the first fixing hole and the first strip hole, fixes the first adjusting plate on the flow equalization substrate and blocks part of the first air inlet.

3. The uniform flow structure according to claim 1, characterized in that, The flow uniform structure further includes: A third adjusting plate is sandwiched between the uniform flow substrate and the first adjusting plate. The third adjusting plate has a third air inlet located within the range of the first air inlet. The first adjusting plate partially blocks the third air inlet and forms the first air-gathering gap.

4. The uniform flow structure according to claim 3, characterized in that, A second fixing hole is provided on the periphery of the first air inlet, and a second strip-shaped hole extending along the height direction is provided on the third adjusting plate. The flow equalization structure further includes: The second fastening bolt, in conjunction with the second fixing hole and the second strip hole, fixes the third adjusting plate on the flow equalization substrate. The second fastening bolt is configured to adjust the height of the second air inlet.

5. The uniform flow structure according to claim 3, characterized in that, The flow uniform structure further includes: A fourth regulating plate is sandwiched between the flow equalization substrate and the second regulating plate. The fourth regulating plate has a replenishing air port, and a fourth air inlet is located below the replenishing air port. Both the replenishing air port and the fourth air inlet are within the range of the second air inlet. The second regulating plate partially blocks the fourth air inlet and forms a second air-gathering gap. The flow equalization structure further includes: A fifth adjusting plate is installed on the fourth adjusting plate, the fifth adjusting plate blocking at least a portion of the air inlet and forming an air inlet gap above the second air gathering gap.

6. The uniform flow structure according to claim 5, characterized in that, A third fixing hole is provided on the periphery of the air inlet, and a third strip-shaped hole extending along the height direction is provided on the fourth adjusting plate. The flow equalization structure also includes: The third fastening bolt, in conjunction with the third fixing hole and the third strip hole, fixes the fifth adjusting plate to the fourth adjusting plate. The third fastening bolt is configured to adjust the width of the air filling gap.

7. The uniform flow structure according to any one of claims 1 to 6, characterized in that, The flow uniform structure further includes: A base plate is mounted on the flow uniform substrate, and the base plate is used to support the flow uniform substrate to maintain a vertical state.

8. The uniform flow structure according to claim 7, characterized in that, The flow uniform structure also includes side plates, which are installed on both sides of the flow uniform substrate.

9. The uniform flow structure according to claim 7, characterized in that, The flow equalization substrate has a fourth fixing hole on its side, and the flow equalization structure further includes: The horizontal air-gathering regulating plate has a fourth strip-shaped hole extending in the horizontal direction; The fourth fastening bolt, in conjunction with the fourth fixing hole and the fourth strip hole, mounts the transverse gas-gathering adjustment plate onto the side of the uniform flow substrate. The fourth fastening bolt is configured to adjust the length of the transverse gas-gathering adjustment plate extending beyond the side of the uniform flow substrate; and / or The top edge of the flow equalization substrate is provided with a fifth fixing hole, and the flow equalization structure further includes: The vertical air-gathering regulating plate has a fifth strip-shaped hole extending along the height direction; The fifth fastening bolt, in conjunction with the fifth fixing hole and the fifth strip hole, installs the vertical air-gathering adjustment plate on the top edge of the uniform flow substrate. The fifth fastening bolt is configured to adjust the height of the vertical air-gathering adjustment plate beyond the top edge of the uniform flow substrate.

10. A cross-section passivation device, characterized in that, include: Reaction chamber; The flow equalization structure as described in any one of claims 1 to 9, wherein the flow equalization structure is placed within the reaction chamber.

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